JPH07253304A - Multi-axial positioning unit and length measuring method therefor - Google Patents
Multi-axial positioning unit and length measuring method thereforInfo
- Publication number
- JPH07253304A JPH07253304A JP6043868A JP4386894A JPH07253304A JP H07253304 A JPH07253304 A JP H07253304A JP 6043868 A JP6043868 A JP 6043868A JP 4386894 A JP4386894 A JP 4386894A JP H07253304 A JPH07253304 A JP H07253304A
- Authority
- JP
- Japan
- Prior art keywords
- length
- measuring
- length measurement
- stage
- axis
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
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- Instruments For Measurement Of Length By Optical Means (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Machine Tool Sensing Apparatuses (AREA)
- Machine Tool Units (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は半導体露光装置や3次元
座標測定装置などに応用され、特に高精度で広範囲に測
定を行なう多軸位置決めユニットに関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention is applied to a semiconductor exposure apparatus, a three-dimensional coordinate measuring apparatus, and the like, and more particularly to a multi-axis positioning unit for measuring with high accuracy over a wide range.
【0002】[0002]
【従来の技術】図6は、半導体露光装置や3次元座標測
定機などで用いられる従来の高精度位置決めユニットの
構成例を示している。測長用のレーザ光源1から射出さ
れる測長光を反射するための、X−Y移動ステージ9の
移動と共に移動する反射鏡(以下、移動鏡と称する)が
2つ、その反射面8a,8bがそれぞれX軸、Y軸と直
角になるようにX−Y移動ステージ9に固定されてい
る。この2つの移動鏡の反射面を座標系の基準平面とし
て、レーザ干渉測長装置により移動ステージ9の各座標
方向の移動量の測定を行なっている。本図のようにX軸
の測長に2本(5a、5b)の測長光を配した場合に
は、ステージ9の移動量に加えてその傾きの測定も行な
うことができる。したがって、もし移動鏡の反射面に凹
凸が存在した場合、実際のステージ9の移動量とレーザ
干渉測長装置によるステージ9の移動量の測定値とに誤
差が生じるため、移動鏡の反射面の平面度は、ステージ
9の位置決め精度を決める非常に重要な要因である。そ
のため位置決め精度をよくするには、移動鏡の反射面の
平面度を必要となるステージの位置決め精度より良くし
ておくか、あるいはあらかじめ移動鏡の反射面の形状を
測定し、そのデータによりステージ位置の測定値の補正
をするという方法を取っている。2. Description of the Related Art FIG. 6 shows a configuration example of a conventional high-precision positioning unit used in a semiconductor exposure apparatus, a three-dimensional coordinate measuring machine, or the like. Two reflecting mirrors (hereinafter, referred to as moving mirrors) for reflecting the length measuring light emitted from the laser light source 1 for length measuring, which move together with the movement of the XY moving stage 9, and their reflecting surfaces 8a, 8b is fixed to the XY moving stage 9 so that it is perpendicular to the X axis and the Y axis. Using the reflecting surfaces of the two moving mirrors as reference planes of the coordinate system, the laser interference length measuring device measures the moving amount of the moving stage 9 in each coordinate direction. When two (5a, 5b) length measurement lights are arranged for the X-axis length measurement as shown in this figure, the inclination of the stage 9 can be measured in addition to the movement amount of the stage 9. Therefore, if the reflecting surface of the moving mirror has irregularities, an error occurs between the actual moving amount of the stage 9 and the measured value of the moving amount of the stage 9 by the laser interferometer. The flatness is a very important factor that determines the positioning accuracy of the stage 9. Therefore, in order to improve the positioning accuracy, the flatness of the reflecting surface of the moving mirror should be better than the required positioning accuracy of the stage, or the shape of the reflecting surface of the moving mirror should be measured in advance and the The method of correcting the measured value of is taken.
【0003】また、従来のこのような位置決めユニット
の構成においては、移動ステージ9がXあるいはY方向
に移動しても移動鏡が常にレーザ干渉測長装置からの測
長光を反射し続けるように、移動鏡の寸法はX−Y移動
ステージ9の各軸方向の可動範囲以上の大きさが必要と
なる。すなわち、大型のワークを位置決めユニットの移
動ステージ9に乗せて広い範囲でステージ9の位置決め
をするためには、ワークの大きさ以上の大きさの移動鏡
が必要となる。Further, in the conventional structure of such a positioning unit, the moving mirror always keeps reflecting the length measuring light from the laser interference length measuring device even if the moving stage 9 moves in the X or Y direction. The size of the moving mirror needs to be larger than the movable range of the XY moving stage 9 in each axial direction. That is, in order to place a large work on the moving stage 9 of the positioning unit and position the stage 9 in a wide range, a moving mirror larger than the size of the work is required.
【0004】[0004]
【発明が解決しようとする課題】このような理由から、
短波長用光学素子の加工や計測等の用途で、より大型の
ワークを載せたステージをより高精度に位置決めする必
要が高まるにつれ、従来の位置決めユニットの構成では
高精度の形状精度を持つ大型の移動鏡が必要となる。For these reasons,
As it becomes necessary to position a stage with a larger work piece with higher precision in applications such as processing and measurement of short-wavelength optical elements, the conventional positioning unit configuration has a large shape with high precision. A moving mirror is required.
【0005】しかし、ワークが大型化するにつれ、大型
の移動鏡を必要とすること、その大型の移動鏡全体を必
要な精度で加工または測定すること、さらに振動や撓み
を避けて必要な形状精度で保持することが困難になる。However, as the size of the work increases, a large moving mirror is required, the entire large moving mirror must be machined or measured with the required accuracy, and the required shape accuracy must be avoided while avoiding vibration and bending. Difficult to hold in.
【0006】本発明は、このような従来の問題に鑑みて
なされたものであり、その目的は、小型の移動鏡を用い
て大型のワークの全範囲にわたり高精度に測定すること
ができる多軸位置決めユニットを提供することにある。The present invention has been made in view of such a conventional problem, and an object thereof is a multi-axis apparatus capable of measuring with high accuracy over the entire range of a large work using a small moving mirror. It is to provide a positioning unit.
【0007】[0007]
【課題を解決するための手段】上記目的を達成するため
に、本発明による多軸位置決めユニットは、少なくとも
第1軸方向および該第1軸方向に略直角な第2軸方向に
移動する移動ステージと、略平行な複数本の測長光を有
し、前記第1軸方向における前記移動ステージの位置の
測定を行なう第1のレーザ干渉測長装置と、前記移動ス
テージに固定され、前記第1のレーザ干渉測長装置の複
数本の測長光のうち、前記移動ステージの前記第2軸方
向の移動に伴って、順次異なる少なくとも1本の測長光
を受ける第1の移動鏡と、少なくとも1本の測長光を有
し、前記第2軸方向における前記移動ステージの位置の
測定を行なう第2のレーザ干渉測長装置と、前記移動ス
テージに固定され、前記第2のレーザ干渉測長装置の少
なくとも1本の測長光を常時受ける第2の移動鏡と、該
第2のレーザ干渉測長装置の測長値に基づいて、現在前
記第1の移動鏡が前記第1のレーザ干渉測長装置のいず
れの測長光を受けているかを判定し、当該測長光により
前記第1のレーザ干渉測長装置の測長結果を得る演算手
段とを備えたものである。In order to achieve the above object, a multi-axis positioning unit according to the present invention comprises a moving stage which moves at least in a first axial direction and in a second axial direction substantially perpendicular to the first axial direction. And a first laser interferometric length measuring device having a plurality of length-measuring light beams substantially parallel to each other for measuring the position of the moving stage in the first axis direction, and the first laser interferometric length measuring device fixed to the moving stage. A plurality of length-measuring lights of the laser interference length-measuring device, a first movable mirror that receives at least one length-measuring light that is sequentially different as the movable stage moves in the second axis direction; A second laser interferometric length measuring device having one length measuring light for measuring the position of the movable stage in the second axis direction, and the second laser interferometric length fixed to the movable stage. Measure at least one device Based on the length measurement values of the second movable mirror that constantly receives light and the second laser interference length measuring device, any one of the length measuring values of the first laser interference length measuring device is currently measured by the first movable mirror. It is provided with a calculation means for determining whether or not the light is received and obtaining the length measurement result of the first laser interference length measuring device by the length measurement light.
【0008】この多軸位置決めユニットにおいて、前記
第1のレーザ干渉測長装置の複数の測長光は、そのうち
隣接する少なくとも2本が前記移動ステージの特定位置
において前記第1の移動鏡を同時に照射するよう配置さ
れ、前記演算手段は、前記移動ステージの特定位置にお
いて、前記第1のレーザ干渉測長装置の隣接する2本の
測長光を同時に受けたとき、先に受けていた測長光によ
る測長値により新たに受けた測長光による測長値の初期
値を定めることが好ましい。In this multi-axis positioning unit, at least two of the plurality of length measuring lights of the first laser interference length measuring device irradiate the first movable mirror simultaneously at a specific position of the movable stage. When the two measuring lights adjacent to each other by the first laser interferometric measuring device are simultaneously received at the specific position of the moving stage, the calculating means receives the measuring light previously received. It is preferable to determine the initial value of the length measurement value newly received by the length measurement light according to the length measurement value according to.
【0009】[0009]
【作用】前述の問題を解決するための本発明の原理を説
明する。The principle of the present invention for solving the above problems will be described.
【0010】各々独立に第1軸(X軸)方向の測長を行
なうレーザ干渉測長装置からの複数本の測長光をほぼ平
行に、かつ移動ステージが第2軸(Y軸)方向に移動し
ても常に測長光の少なくとも1本が第1の移動鏡に照射
されているように配置する。さらに、第2軸方向のステ
ージ移動を測定する少なくとも1本の測長光を設け、こ
の測長値とあらかじめ得ておいた前記複数の測長光の光
線の位置とを照合することにより、第1の移動鏡に照射
している測長光がどの測長光かを認識する。この認識さ
れた測長光による測長値により第1軸方向の測長値が得
られる。A plurality of measuring light beams from a laser interferometer measuring device for independently measuring the length in the first axis (X axis) direction are substantially parallel to each other, and the moving stage is in the second axis (Y axis) direction. Even if it moves, it is arranged so that at least one of the length measuring lights is always irradiated on the first movable mirror. Further, at least one length measuring light for measuring the stage movement in the second axis direction is provided, and by comparing this length measuring value with the positions of the light beams of the plurality of length measuring light obtained in advance, The length measuring light irradiating the moving mirror of No. 1 is recognized. A length measurement value in the first axis direction is obtained from the recognized length measurement value by the length measurement light.
【0011】移動ステージが第2軸方向に移動した場
合、移動前に移動鏡位置を測長していた測長光による測
長値を、第1の移動鏡の移動につれてこの測長光と同時
に第1の移動鏡を照射するようになった測長光の測長値
の初期値として受け渡す。移動鏡の移動にしたがってこ
の手順を繰り返すことにより、第2軸方向に第1の移動
鏡がその寸法以上に移動しても第1軸方向のステージ位
置の測定値を連続して得ることが可能となる。When the moving stage moves in the direction of the second axis, the length measurement value obtained by the length measuring light measuring the position of the moving mirror before the movement is simultaneously measured with the length measuring light as the first moving mirror moves. It is passed as the initial value of the length measurement value of the length measurement light that has come to illuminate the first movable mirror. By repeating this procedure in accordance with the movement of the movable mirror, it is possible to continuously obtain the measured values of the stage position in the first axis direction even if the first movable mirror moves in the second axis direction by more than that dimension. Becomes
【0012】これにより、小型の移動鏡を用いても、大
型のワークの全範囲にわたり、測定を行なうことができ
る。Thus, even if a small moving mirror is used, the measurement can be performed over the entire range of a large work.
【0013】[0013]
【実施例】以下、本発明の多軸位置決めユニットの実施
例について、図面により詳細に説明する。Embodiments of the multi-axis positioning unit of the present invention will be described in detail below with reference to the drawings.
【0014】図1は、本発明によるY軸方向に広い移動
範囲を持つ位置決めユニットの実施例である。本装置
は、レーザ干渉測長装置、移動鏡8a,8b、X−Y移
動ステージ9、および演算装置10により構成されてい
る。レーザ干渉測長装置は、X−Y移動ステージ9のX
軸方向位置を測長するためのX軸レーザ干渉測長装置
と、Y軸方向位置を測長するためのY軸レーザ干渉測長
装置とからなる。X軸レーザ干渉測長装置は、レーザ光
源1a、ビームスプリッタ2a〜2d、検出器3a〜3
d、干渉計ユニット4a〜4dからなる。Y軸レーザ干
渉測長装置は、レーザ光源1b、検出器3i、干渉計ユ
ニット4iからなる。演算装置10は、両軸レーザ干渉
測長装置に共用される。FIG. 1 shows an embodiment of a positioning unit having a wide movement range in the Y-axis direction according to the present invention. This apparatus is composed of a laser interferometer, a moving mirror 8a, 8b, an XY moving stage 9, and an arithmetic unit 10. The laser interferometric length measuring device is the X-Y moving stage X
It is composed of an X-axis laser interferometer for measuring the axial position and a Y-axis laser interferometer for measuring the Y-axis position. The X-axis laser interferometer length measuring apparatus includes a laser light source 1a, beam splitters 2a to 2d, and detectors 3a to 3
d, interferometer units 4a to 4d. The Y-axis laser interferometer length measuring device comprises a laser light source 1b, a detector 3i, and an interferometer unit 4i. The arithmetic unit 10 is shared by the two-axis laser interferometer.
【0015】図9に、演算装置10の構成例を示す。演
算装置10は、一般的な電子計算機、もしくはパーソナ
ルコンピュータにより構成することができる。すなわ
ち、その主要構成要素として、図示のように、検出器3
(3a〜3d、3iを総称)から検出結果を受ける入出
力制御装置91と、これらのデータおよび処理プログラ
ムを格納するメモリ92と、この処理プログラムを実行
してデータの処理を行なう中央処理装置(CPU)93
と、この処理結果を表示画面に表示する表示装置94と
を備える。FIG. 9 shows a configuration example of the arithmetic unit 10. The arithmetic unit 10 can be configured by a general electronic computer or a personal computer. That is, as shown in the figure, the detector 3 is used as its main component.
An input / output control device 91 that receives the detection results from (3a to 3d and 3i are collectively referred to), a memory 92 that stores these data and a processing program, and a central processing unit that executes the processing program to process the data ( CPU) 93
And a display device 94 for displaying the processing result on the display screen.
【0016】図1に戻り、X軸レーザ干渉測長装置にお
いて、レーザ光源1aより射出されたレーザ光はビーム
スプリッタ2a、2b、2c、2dにより干渉計ユニッ
ト4a、4b、4c、4dに分配される。それぞれのレ
ーザ光は、干渉計ユニット(図示しないビームスプリッ
タと固定鏡とからなる)4a、4b、4c、4d内のビ
ームスプリッタで2分割され内部の固定鏡に向かう光線
と、X−Y移動ステージ9に固定された移動鏡8aに向
かう光線に分けられる。X軸レーザ干渉測長装置の各構
成要素は、その測長光5a〜5dがほぼ平行に射出さ
れ、かつX−Y移動ステージ9がY軸方向に移動しても
常に測長光5a〜5dの少なくとも1つが移動鏡8aに
照射されているように配置される。図示の状態では、移
動鏡8aで反射した測長光は、再び干渉計ユニット4
a、4bに入り、干渉計ユニット4a,4bで各々内の
固定鏡からの光線と干渉し、検出器3a、3bに入射し
て干渉計ユニット3a,3bと移動鏡8aとの間隔を測
長する。Returning to FIG. 1, in the X-axis laser interferometer, the laser light emitted from the laser light source 1a is distributed to the interferometer units 4a, 4b, 4c, 4d by the beam splitters 2a, 2b, 2c, 2d. It Each laser beam is divided into two by the beam splitter in the interferometer unit (which is composed of a beam splitter and a fixed mirror (not shown)) 4a, 4b, 4c, and 4d, and is directed to the fixed mirror inside, and an XY moving stage. It is divided into light rays directed to the movable mirror 8a fixed to 9. Each of the constituent elements of the X-axis laser interferometric length measuring apparatus emits the length-measuring lights 5a to 5d substantially in parallel, and the length-measuring lights 5a to 5d are always emitted even if the XY moving stage 9 moves in the Y-axis direction. Is arranged so that the movable mirror 8a is irradiated with at least one of them. In the illustrated state, the length measuring light reflected by the movable mirror 8a is again reflected by the interferometer unit 4
a, 4b, the interferometer units 4a, 4b interfere with the light beams from the fixed mirrors inside, and enter the detectors 3a, 3b to measure the distance between the interferometer units 3a, 3b and the movable mirror 8a. To do.
【0017】Y軸レーザ干渉測長装置においても、レー
ザ光源1bより出た光線(測長光6a)も同様にして干
渉計4iとX−Y移動ステージ9に固定された移動鏡8
bの間隔を測定する。このY軸方向のステージ9の位置
情報は、X軸測長のどの測長光が移動鏡8aに照射され
ているかを検知するためにも利用される。すなわち、こ
のY軸測長値とあらかじめ得ておいた測長光5a〜5d
の光線の位置とを照合し、移動鏡8aに照射している測
長光がいずれの測長光かを識別する。Also in the Y-axis laser interferometer, the light beam (length measuring light 6a) emitted from the laser light source 1b is similarly moved to the interferometer 4i and the movable mirror 8 fixed to the XY moving stage 9.
Measure the distance in b. The position information of the stage 9 in the Y-axis direction is also used to detect which length measurement light of the X-axis length measurement is applied to the movable mirror 8a. That is, this Y-axis length measurement value and the length measurement lights 5a to 5d previously obtained
And the position of the ray of light is compared to identify which length measuring light is irradiating the movable mirror 8a.
【0018】図1に示した状態において、ステージ9が
Y軸方向に移動した場合、移動前に移動鏡位置を測長し
ていた測長光5aの測長値を、移動鏡8aの移動につれ
て測長光5aと同時に移動鏡8aを照射するようになっ
た測長光5bの測長値として受け渡す。測長値を「受け
渡す」ことが必要となる理由は次のとおりである。すな
わち、この種の測長装置は、ステージのある位置から他
の位置への相対的な移動量を測定するものであり、この
例のように、突如、移動鏡8aを照射するようになった
測長光5bのみによってはその時点のステージ位置は知
りえないからである。移動鏡8aの移動にしたがってこ
の手順を繰り返すことにより、Y軸方向に移動鏡8aが
その寸法以上に移動してもX軸方向のステージ位置の測
定値を連続して得ることが可能となる。In the state shown in FIG. 1, when the stage 9 moves in the Y-axis direction, the length measurement value of the length measuring light 5a, which has measured the position of the movable mirror before the movement, changes with the movement of the movable mirror 8a. At the same time as the length-measuring light 5a, it is passed as a length-measuring value of the length-measuring light 5b, which is emitted from the movable mirror 8a. The reason why it is necessary to "pass" the measured value is as follows. That is, this type of length measuring device measures the amount of relative movement from one position of the stage to another position, and suddenly irradiates the movable mirror 8a as in this example. This is because the stage position at that time cannot be known only by the length measuring light 5b. By repeating this procedure according to the movement of the movable mirror 8a, it becomes possible to continuously obtain the measured values of the stage position in the X-axis direction even if the movable mirror 8a moves in the Y-axis direction by more than the dimension thereof.
【0019】これらの測長値を演算装置10に取り込
み、前項で述べた方法によりステージの位置を得る。These measured values are taken into the arithmetic unit 10 and the position of the stage is obtained by the method described in the previous section.
【0020】図7のフローチャートにより、図1の装置
のステージ位置の測定の手順を説明する。The procedure of measuring the stage position of the apparatus of FIG. 1 will be described with reference to the flowchart of FIG.
【0021】まず、ステージ9を予め定めた初期位置に
移動させ、各測長光の測長値をリセット(初期化)する
(71)。この初期位置からの、X、Y、両軸方向の移
動量が測長装置により求まる。以下のステップ72から
78は周期的に実行される。ステップ72においてステ
ージを移動させる。このステージ移動は、自動、手動の
いずれで行なってもよい。Y軸方向のステージ位置を検
出する測長光6aにより、ステージY座標値を算出する
(73)。次いで、この得られたステージY座標値に基
づいて、測長光5a〜5dのどの測長光が移動鏡8aに
当たっているかを認識する。この認識は、移動鏡8aの
移動鏡8bに対する位置および大きさ、各測長光5a〜
5dのY軸方向位置が予め分かっていることから、容易
に行なえる。移動鏡8aに測長光が1本のみ当たってい
る場合(75、No)、当たっているビームの測長値を
ステージのX座標値として(76)、ステップ72に戻
る。First, the stage 9 is moved to a predetermined initial position, and the length measurement value of each length measurement light is reset (initialized) (71). The amount of movement in the X, Y, and both axis directions from this initial position is obtained by the length measuring device. The following steps 72 to 78 are performed periodically. In step 72, the stage is moved. This stage movement may be performed either automatically or manually. The stage Y coordinate value is calculated by the length measuring light 6a for detecting the stage position in the Y-axis direction (73). Then, based on the obtained stage Y coordinate value, which length measuring light of the length measuring lights 5a to 5d hits the movable mirror 8a is recognized. This recognition is based on the position and size of the movable mirror 8a with respect to the movable mirror 8b, and the length measurement lights 5a to 5a.
Since the position of the 5d in the Y-axis direction is known in advance, it can be easily performed. When only one length measuring light is incident on the movable mirror 8a (75, No), the length measuring value of the impinging beam is set as the X coordinate value of the stage (76), and the process returns to step 72.
【0022】ステップ75において、測長光が同時に2
本当たっていると判断された場合、ステージの移動によ
り新たに移動鏡8aに当たった測長光の測長値を、同時
に移動鏡8aに当たっているもう一方の測長光の測長値
を用いてリセットする(77)。すなわち、先に移動鏡
8aに当たっている測長光の測長値を新たに移動鏡8a
に当たるようになった測長光の測長値として受け渡す。
同時に、この測長値をX座標値とする(78)。続い
て、ステップ72に戻る。新たに移動鏡8aに当たるよ
うになった測長光による測長値は、受け渡された測長値
を基準にして、ステージの移動に伴い増減する。In step 75, the length measuring lights are simultaneously set to 2
When it is determined that it is true, the length measurement value of the length measurement light that newly strikes the moving mirror 8a due to the movement of the stage is reset using the length measurement value of the other length measurement light that also strikes the moving mirror 8a at the same time. Yes (77). That is, the length measurement value of the length-measuring light previously hitting the movable mirror 8a is newly set to the movable mirror 8a.
It is passed as the length measurement value of the length measurement light that hits.
At the same time, the measured value is set as the X coordinate value (78). Then, the process returns to step 72. The length measurement value by the length measurement light that newly strikes the movable mirror 8a increases or decreases with the movement of the stage with reference to the passed length measurement value.
【0023】図1の装置は、所望の既知の位置にステー
ジを移動させる目的にも、あるいは任意の未知の位置に
あるステージの位置を検出する目的にも利用できる。後
述する他の実施例においても、同じである。The apparatus of FIG. 1 can be used for the purpose of moving the stage to a desired known position or for detecting the position of the stage at an arbitrary unknown position. The same applies to other embodiments described later.
【0024】図2は、移動鏡8aに常に2本以上の測長
光が当たるように測長光5a〜5dを配置することによ
り、X−Y移動ステージ9のZ軸まわりの回転(傾き
量)も把握出来るようにした構成の、本発明の他の実施
例である。ステージ9は、Z軸周りの回転を行なえるよ
うにはなっていないが、ステージ9の微小な傾きやがた
つきが存在しうる。より高精度な測長を行なうには、こ
のような微小なZ軸周りの回転をも検出することが好ま
しい。In FIG. 2, by arranging the length-measuring lights 5a to 5d so that two or more length-measuring lights always strike the movable mirror 8a, the XY movement stage 9 rotates about the Z-axis (the amount of tilt). ) Is another embodiment of the present invention having a configuration in which (1) can also be grasped. Although the stage 9 is not designed to rotate about the Z axis, there may be a slight inclination or rattling of the stage 9. In order to perform the length measurement with higher accuracy, it is preferable to detect such minute rotation around the Z axis.
【0025】図2の例で、X−Y移動ステージ9がレー
ザ光源b側に近い側から遠い側へ向けてY方向に移動し
て行く場合を考える。最初、測長光5aと5bとが同時
に移動鏡8aを照射している。ステージ9が移動するに
つれ、測長光5cが測長光5a、5bと同時に移動鏡8
aを照射しはじめる。このとき、測長光5aおよび5b
の測長値と、あらかじめ得ておいた測長光5aと5bの
間隔長さ、測長光5bと5cの間隔長さとによって、測
長光5cの測長値を外挿によって決定する。この外挿処
理において、移動鏡8aは小型なので、その反射面はリ
ニアな傾きを有するとみなす。X−Y移動ステージ9の
Y軸方向への移動に伴いこの手順を繰り返すことによ
り、X−Y移動ステージ9の座標値とともにZ軸まわり
の回転量も把握することが可能となる。In the example of FIG. 2, let us consider a case where the XY moving stage 9 moves in the Y direction from the side closer to the laser light source b side to the side farther from it. First, the length measuring lights 5a and 5b simultaneously illuminate the movable mirror 8a. As the stage 9 moves, the measuring light 5c moves with the moving mirror 8 at the same time as the measuring lights 5a and 5b.
Start irradiating a. At this time, the measuring lights 5a and 5b
The length measurement value of the length measurement light 5c is determined by extrapolation from the length measurement value of, the distance length of the length measurement light 5a and 5b, and the distance length of the length measurement light 5b and 5c which are obtained in advance. In this extrapolation process, since the movable mirror 8a is small, it is assumed that its reflecting surface has a linear inclination. By repeating this procedure with the movement of the XY moving stage 9 in the Y-axis direction, it is possible to grasp the coordinate value of the XY moving stage 9 as well as the rotation amount around the Z-axis.
【0026】図8のフローチャートにより、図2の実施
例におけるステージ位置の測定手順を説明する。The procedure of measuring the stage position in the embodiment of FIG. 2 will be described with reference to the flowchart of FIG.
【0027】まず、ステージ9を予め定めた初期位置に
移動させ、各測長光の測長値をリセットする(81)。
そこで、ステージを移動させる(82)。Y軸方向のス
テージ位置を検出する測長光6aにより、ステージY座
標値を算出する(83)。次いで、この得られたステー
ジY座標値に基づいて、測長光5a〜5hのどの測長光
が移動鏡8aに当たっているかを認識する。この認識
は、移動鏡8aの移動鏡8bに対する位置および大き
さ、各測長光5a〜5hのY軸方向位置が予め分かって
いることから、容易に行なえる。移動鏡8aに測長光が
2本のみ当たっている場合(85、No)、当たってい
る2本のビームの測長値からステージのX座標値および
傾き量を求めて(86)、ステップ82に戻る。ステッ
プ86において、X座標値は、2本のビームのうち予め
定めた方(例えばレーザ光源1aから遠い方)の測長値
を求める。この代わりに、両者の平均値を用いてもよ
い。First, the stage 9 is moved to a predetermined initial position, and the length measurement value of each length measurement light is reset (81).
Then, the stage is moved (82). The stage Y coordinate value is calculated by the length measurement light 6a that detects the stage position in the Y-axis direction (83). Then, based on the obtained stage Y coordinate value, which length measuring light of the length measuring lights 5a to 5h hits the movable mirror 8a is recognized. This recognition can be easily performed because the position and size of the movable mirror 8a with respect to the movable mirror 8b and the positions of the length-measuring lights 5a to 5h in the Y-axis direction are known in advance. When only two length measuring lights hit the moving mirror 8a (85, No), the X coordinate value and the tilt amount of the stage are calculated from the length measuring values of the two hit beams (86), and step 82 Return to. In step 86, as the X coordinate value, a length measurement value of a predetermined one of the two beams (for example, one farther from the laser light source 1a) is obtained. Instead of this, the average value of both may be used.
【0028】ステップ85において、測長光が同時に3
本同時に当たっていると判断された場合、先に移動鏡8
aに同時に当たっている2本の測長光の測長値を用いて
3本目の測長光の測長値を外挿により計算し、ステージ
の移動により新たに移動鏡8aに当たった測長光の測長
値を、その計算値でリセットする(87)。すなわち、
先に移動鏡8aに当たっている測長光により得られた測
長値を新たに移動鏡8aに当たるようになった測長光の
測長値として受け渡す。同時に、移動鏡8aに当たって
いる3本の測長光の測長値のうちの予め定めた2つを用
いて、ステージのX座標値および傾き量を求める(8
8)。この場合のX座標値も、ステップ86と同様にし
て求める。続いて、ステップ82に戻る。新たに移動鏡
8aに当たるようになった測長光による測長値は、受け
渡された測長値を基準にして、ステージの移動に伴い増
減する。In step 85, the length measuring lights are simultaneously set to 3
If it is determined that the two books are hit at the same time, the moving mirror 8
The length measurement value of the third length measurement light is calculated by extrapolation using the length measurement values of the two length measurement lights that hit a at the same time, and the length measurement light newly hits the movable mirror 8a by the movement of the stage. The length measurement value of is reset with the calculated value (87). That is,
The length measurement value obtained by the length measurement light hitting the movable mirror 8a first is transferred as the length measurement value of the length measurement light newly hit on the movable mirror 8a. At the same time, the X coordinate value and the tilt amount of the stage are obtained by using the predetermined two of the length measurement values of the three length measurement lights that strike the movable mirror 8a (8
8). The X coordinate value in this case is also obtained in the same manner as in step 86. Then, the process returns to step 82. The length measurement value by the length measurement light that newly strikes the movable mirror 8a increases or decreases with the movement of the stage with reference to the passed length measurement value.
【0029】図3は、X、Y軸両方向に広い移動範囲を
持ち、Z軸まわりの回転量も把握できるX−Y移動ステ
ージの測長光と移動鏡の配置の本発明の第3の実施例の
平面図である。この実施例では、移動鏡8aに対して測
長光5a〜5cのうち同時に少なくとも1本の測長光が
当たり、移動鏡8bに対して測長光6a〜6eのうち同
時に少なくとも2本の測長光があたる例を示す。測長光
6a〜6eのうち、現在、どの測長光が移動鏡8bに当
たっているかは、その時点のX軸方向ステージ位置によ
って判定でき、測長光5a〜5cのうち、現在、どの測
長光が移動鏡8aに当たっているかは、その時点のY軸
方向ステージ位置によって判定できる。この場合、X、
Y両軸において、測長値の受け渡しが行なわれる。FIG. 3 shows a third embodiment of the present invention in which the measuring light of the XY moving stage and the arrangement of the moving mirror have a wide moving range in both the X and Y axes and can grasp the amount of rotation about the Z axis. It is a top view of an example. In this embodiment, at least one of the length measuring lights 5a to 5c strikes the movable mirror 8a at the same time, and at least two of the length measuring lights 6a to 6e strikes the movable mirror 8b at the same time. Here is an example of long light. Which of the measuring lights 6a to 6e is currently hitting the movable mirror 8b can be determined by the stage position in the X-axis direction at that time, and which of the measuring lights 5a to 5c is currently measuring light. It can be determined whether or not is hitting the movable mirror 8a based on the stage position in the Y-axis direction at that time. In this case, X,
The length measurement values are passed on both Y axes.
【0030】図4、図5は、X、Y、Z軸方向の広い移
動範囲と3軸まわりの回転量を把握可能な本発明の第4
の実施例に係る位置決めユニットの移動鏡と測長光の配
置の模式図の斜視図と平面図である。FIGS. 4 and 5 show the fourth embodiment of the present invention capable of grasping a wide range of movement in the X, Y, and Z axis directions and the amount of rotation around the three axes.
6A and 6B are a perspective view and a plan view of a schematic view of the arrangement of the movable mirror and the length-measuring light of the positioning unit according to the embodiment.
【0031】この場合、X−Y移動ステージのX、Y軸
まわりの回転を把握するためにZ軸方向測長用の移動鏡
8cには、常に3つ以上の測長光(移動鏡8c上の照射
点が一直線上にない3つ以上の測長光)が照射されてい
るように測長光7a〜7oを配置している。測長光7a
〜7oのうち、移動鏡8cに対して、現在どの測長光が
当たっているかは、その時点のXおよびY軸方向ステー
ジ位置によって決まる。測長光7a〜7oについても、
上記実施例と同様の測長値の受け渡しが行なわれる。本
実施例では、XおよびY軸を中心とした移動鏡8cの傾
き量も求めることができる。In this case, in order to grasp the rotation of the XY moving stage about the X and Y axes, the movable mirror 8c for measuring the Z-axis direction always has three or more measuring lights (on the movable mirror 8c). The measuring lights 7a to 7o are arranged so that three or more measuring lights whose irradiation points are not on a straight line are irradiated. Length measuring light 7a
Which length measuring light is currently shining on the movable mirror 8c out of 7 to 7o depends on the stage position in the X and Y axis directions at that time. For the measuring lights 7a-7o,
The length measurement values are transferred in the same manner as in the above embodiment. In this embodiment, the amount of tilt of the movable mirror 8c about the X and Y axes can also be obtained.
【0032】[0032]
【発明の効果】レーザ干渉測長装置を利用した2次元以
上の位置決めユニットにおいて、本発明によれば、各軸
の移動鏡の大きさは測定座標軸に平行に配置された測長
光間隔以上であればよく、ワークの寸法によらない。こ
のため大型のワークに対して従来のように大きな移動鏡
を用意する必要がなく、より高精度に加工しやすく保持
中の変形も少ない小型の移動鏡を用いることができる。
その結果、大型のワークも全範囲にわたり高精度に測定
することが可能になる。さらにまた移動鏡を小型にした
ことにより移動ステージの質量を軽減でき移動ステージ
の位置決め制御をより容易にすることができる。According to the present invention, in the two-dimensional or more positioning unit using the laser interferometer, the size of the movable mirror of each axis is equal to or larger than the distance of the measuring light arranged parallel to the measurement coordinate axis. It only needs to be provided and does not depend on the size of the work. For this reason, it is not necessary to prepare a large moving mirror for a large work as in the conventional case, and a small moving mirror that can be processed with higher accuracy and that is less deformed during holding can be used.
As a result, it becomes possible to measure a large workpiece with high accuracy over the entire range. Furthermore, by making the moving mirror small, the mass of the moving stage can be reduced, and the positioning control of the moving stage can be made easier.
【図1】本発明の第1実施例の説明図FIG. 1 is an explanatory diagram of a first embodiment of the present invention.
【図2】本発明の第2実施例の説明図FIG. 2 is an explanatory diagram of a second embodiment of the present invention.
【図3】本発明の第3実施例の説明図FIG. 3 is an explanatory diagram of a third embodiment of the present invention.
【図4】本発明の第4実施例の説明図FIG. 4 is an explanatory diagram of a fourth embodiment of the present invention.
【図5】本発明の第4実施例の説明図FIG. 5 is an explanatory diagram of a fourth embodiment of the present invention.
【図6】従来の位置決めユニットの構成図FIG. 6 is a configuration diagram of a conventional positioning unit.
【図7】図1の実施例のステージ位置の測定手順を示す
フローチャート7 is a flowchart showing a procedure for measuring the stage position in the embodiment of FIG.
【図8】図2の実施例のステージ位置の測定手順を示す
フローチャートFIG. 8 is a flowchart showing a procedure for measuring the stage position in the embodiment of FIG.
【図9】各実施例における演算装置の構成例を示すブロ
ック図FIG. 9 is a block diagram showing a configuration example of an arithmetic unit in each embodiment.
1,1a,1b:レーザ光源 2a,2b,2c,2d:ビームスプリッタ 3a,3b,3c,3d,3i:検出器 4a,4b,4c,4d,4i:固定鏡およびビームスプリ
ッタからなる干渉計ユニット 5a,5b,5c,5d:X軸方向測長用測長光 6a,6b,6c,6d,6e:Y軸方向測長用測長光 7a〜7o:Z軸方向測長用測長光 8a,8b,8c:移動鏡 9:X−Y移動ステージ 10:演算装置1, 1a, 1b: Laser light source 2a, 2b, 2c, 2d: Beam splitter 3a, 3b, 3c, 3d, 3i: Detector 4a, 4b, 4c, 4d, 4i: Interferometer unit consisting of fixed mirror and beam splitter 5a, 5b, 5c, 5d: Length measuring light for X-axis length measurement 6a, 6b, 6c, 6d, 6e: Length measuring light for Y-axis length measurement 7a to 7o: Length measuring light for Z-axis length measurement 8a , 8b, 8c: moving mirror 9: XY moving stage 10: arithmetic unit
Claims (6)
に略直角な第2軸方向に移動する移動ステージと、 略平行な複数本の測長光を有し、前記第1軸方向におけ
る前記移動ステージの位置の測定を行なう第1のレーザ
干渉測長装置と、 前記移動ステージに固定され、前記第1のレーザ干渉測
長装置の複数本の測長光のうち、前記移動ステージの前
記第2軸方向の移動に伴って、順次異なる少なくとも1
本の測長光を受ける第1の移動鏡と、 少なくとも1本の測長光を有し、前記第2軸方向におけ
る前記移動ステージの位置の測定を行なう第2のレーザ
干渉測長装置と、 前記移動ステージに固定され、前記第2のレーザ干渉測
長装置の少なくとも1本の測長光を常時受ける第2の移
動鏡と、 該第2のレーザ干渉測長装置の測長値に基づいて、現在
前記第1の移動鏡が前記第1のレーザ干渉測長装置のい
ずれの測長光を受けているかを判定し、当該測長光によ
り前記第1のレーザ干渉測長装置の測長結果を得る演算
手段と、 を備えたことを特徴とする多軸位置決めユニット。1. A moving stage that moves in at least a first axis direction and a second axis direction that is substantially perpendicular to the first axis direction, and a plurality of length measurement lights that are substantially parallel to each other, and in the first axis direction. A first laser interferometric length measuring device for measuring the position of the moving stage; and a plurality of length measuring lights of the first laser interferometric length measuring device fixed to the moving stage, of the moving stage, At least one that is sequentially different with the movement in the second axis direction
A first movable mirror for receiving a length measuring light beam; a second laser interference measuring device having at least one length measuring light beam for measuring the position of the movable stage in the second axis direction; A second movable mirror which is fixed to the movable stage and constantly receives at least one length-measuring light of the second laser interferometric length measuring device; and a second movable mirror based on the length measurement value of the second laser interferometric length measuring device. , It is determined which length measurement light of the first laser interference length measurement device is currently being received by the first movable mirror, and the length measurement result of the first laser interference length measurement device is determined by the length measurement light. A multi-axis positioning unit, comprising:
長光は、そのうち隣接する少なくとも2本が前記移動ス
テージの特定位置において前記第1の移動鏡を同時に照
射するよう配置され、前記演算手段は、前記移動ステー
ジの特定位置において、前記第1のレーザ干渉測長装置
の隣接する2本の測長光を同時に受けたとき、先に受け
ていた測長光による測長値により新たに受けた測長光に
よる測長値の初期値を定めることを特徴とする請求項1
記載の多軸位置決めユニット。2. A plurality of length measurement lights of the first laser interferometer length measuring device are arranged such that at least two adjacent length measurement lights irradiate the first movable mirror at a specific position of the movable stage, When the arithmetic unit receives, at a specific position of the moving stage, two adjacent measuring lights of the first laser interferometric measuring device at the same time, the calculating unit obtains a length measurement value of the measuring light received previously. The initial value of the length measurement value by the newly received length measurement light is determined.
The described multi-axis positioning unit.
は、前記移動ステージの前記第2軸方向の可動距離より
短いことを特徴とする請求項1または2記載の多軸位置
決めユニット。3. The multiaxial positioning according to claim 1, wherein the dimension of the first movable mirror in the second axial direction is shorter than the movable distance of the movable stage in the second axial direction. unit.
長光として少なくとも3本の測長光を有し、そのうち隣
接する少なくとも2本が前記移動ステージの位置に関わ
らず常時前記第1の移動鏡を同時に照射するよう配置さ
れ、 前記演算手段は、前記第1の移動鏡に常時照射される2
本の測長光による測長値に基づいて前記移動ステージの
傾き量を求めるとともに、前記移動ステージの特定位置
において、前記第1の移動鏡が前記第1のレーザ干渉測
長装置の隣接する3本の測長光を同時に受けたとき、先
に受けていた2本の測長光による測長値により新たに受
けた測長光による測長値の初期値を定めることを特徴と
する請求項1、2または3記載の多軸位置決めユニッ
ト。4. The at least three length measuring lights are provided as a plurality of length measuring lights of the first laser interference length measuring device, and at least two adjacent ones are always the first length measuring light regardless of the position of the moving stage. It is arranged to irradiate one moving mirror at the same time, and the arithmetic means constantly irradiates the first moving mirror.
The tilt amount of the moving stage is obtained based on the length measurement value of the length measuring light of the book, and the first moving mirror is adjacent to the first laser interference length measuring device at a specific position of the moving stage. When the length measurement light of a book is received at the same time, the initial value of the length measurement value of the newly received length measurement light is determined by the length measurement value of the two length measurement light received previously. The multi-axis positioning unit described in 1, 2, or 3.
に略直角な第2軸方向に移動し、第1軸および第2軸方
向の測長光をそれぞれ反射する第1および第2の移動鏡
を有する移動ステージと、それぞれ前記第1軸方向およ
び第2軸方向の前記移動ステージの位置を測定する第1
および第2のレーザ干渉測長装置とを備えた多軸位置決
めユニットにおける測長方法であって、 前記第1軸方向に沿った移動ステージ位置の測定を各々
独立に行なうよう略平行に2本以上の測長光を配置し、
その際、前記移動ステージの移動範囲内のいかなる位置
においても常に前記2本以上の測長光のいずれか少なく
とも1本が前記移動鏡の反射面を照射するようにし、 前記第2軸方向に沿った移動ステージ位置の測定を行な
うよう前記少なくとも1本の測長光を配置し、その際、
前記移動ステージの移動範囲内のいかなる位置において
も常に前記少なくとも1本の測長光が前記移動鏡の反射
面を照射するようにし、 測長開始時に、前記移動ステージの位置を初期位置に移
動させるとともに、前記第1軸および第2軸方向の測長
値を初期化し、 前記移動ステージの移動に伴い、前記第2軸方向の測長
値を求め、 該求められた前記第2軸方向の測長値に基づいて、前記
略平行な2本以上の測長光のうちいずれの測長光が前記
移動鏡に照射されているかを検知し、 該検知された測長光により前記第1軸方向の測長値を求
め、 前記求められた各方向の測長値により前記移動ステージ
の位置を求めることを特徴とする多軸位置決めユニット
における位置決め方法。5. A first and a second axis which move at least in a first axis direction and a second axis direction substantially perpendicular to the first axis direction and reflect length measurement light in the first axis direction and the second axis direction, respectively. A moving stage having a moving mirror, and a first measuring position of the moving stage in the first axis direction and the second axis direction, respectively.
And a second laser interferometer length measuring device in a multi-axis positioning unit, wherein two or more units are arranged substantially parallel to each other to independently measure the moving stage position along the first axis direction. Place the measuring light of
At that time, at any position within the moving range of the moving stage, at least one of the two or more length-measuring lights always irradiates the reflecting surface of the moving mirror along the second axis direction. The at least one length measuring light is arranged to measure the position of the moving stage,
At any position within the moving range of the moving stage, the at least one length measuring light always irradiates the reflecting surface of the moving mirror, and at the start of length measurement, the position of the moving stage is moved to the initial position. At the same time, the length measurement values in the first axis and second axis directions are initialized, the length measurement values in the second axis direction are obtained as the moving stage moves, and the obtained measurement values in the second axis direction are obtained. Based on the length value, which of the two or more length-measuring lights that are substantially parallel is detected by the movable mirror is detected, and the detected length-measuring light detects the direction of the first axis. Is obtained, and the position of the movable stage is obtained from the obtained measured values in each direction.
に伴い、前記略平行に配置された2本以上の測長光のう
ち複数の測長光が同時に前記移動鏡に照射されたとき、
前記第1の移動鏡に先に照射されていた測長光による測
長値を、前記第1の移動鏡に新たに照射された測長光に
よる測長値の初期値として受け渡すことを特徴とする請
求項5記載の多軸位置決めユニットにおける位置決め方
法。6. A plurality of length-measuring lights of the two or more length-measuring lights arranged substantially in parallel are simultaneously applied to the movable mirror along with the movement of the moving stage in the second axis direction. ,
The length measurement value obtained by the length measurement light previously emitted to the first movable mirror is transferred as an initial value of the length measurement value obtained by the length measurement light newly emitted to the first movable mirror. The positioning method in the multi-axis positioning unit according to claim 5.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6043868A JPH07253304A (en) | 1994-03-15 | 1994-03-15 | Multi-axial positioning unit and length measuring method therefor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6043868A JPH07253304A (en) | 1994-03-15 | 1994-03-15 | Multi-axial positioning unit and length measuring method therefor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH07253304A true JPH07253304A (en) | 1995-10-03 |
Family
ID=12675684
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6043868A Withdrawn JPH07253304A (en) | 1994-03-15 | 1994-03-15 | Multi-axial positioning unit and length measuring method therefor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH07253304A (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6495847B1 (en) | 1998-12-24 | 2002-12-17 | Canon Kabushiki Kaisha | Stage control apparatus and exposure apparatus |
JP2003534541A (en) * | 2000-05-19 | 2003-11-18 | ザイゴ コーポレイション | In-situ mirror characterization |
US6897963B1 (en) | 1997-12-18 | 2005-05-24 | Nikon Corporation | Stage device and exposure apparatus |
JP2005522683A (en) * | 2002-04-09 | 2005-07-28 | ザイゴ コーポレイション | Method and apparatus for stage mirror mapping |
JP2005331542A (en) * | 2004-05-18 | 2005-12-02 | Hitachi High-Tech Electronics Engineering Co Ltd | Exposure apparatus, exposure method and method for manufacturing substrate |
WO2008108423A1 (en) | 2007-03-08 | 2008-09-12 | Nikon Corporation | Position measuring module, position measuring apparatus, stage apparatus, exposure apparatus and device manufacturing method |
DE102011111372A1 (en) * | 2011-08-29 | 2012-10-04 | Carl Zeiss Smt Gmbh | Measuring device for detecting position of lithography mask support structure, has two distance sensor devices among which second device has measuring surfaces whose extension is smaller than movement distance of support structure |
-
1994
- 1994-03-15 JP JP6043868A patent/JPH07253304A/en not_active Withdrawn
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6897963B1 (en) | 1997-12-18 | 2005-05-24 | Nikon Corporation | Stage device and exposure apparatus |
US6495847B1 (en) | 1998-12-24 | 2002-12-17 | Canon Kabushiki Kaisha | Stage control apparatus and exposure apparatus |
JP2003534541A (en) * | 2000-05-19 | 2003-11-18 | ザイゴ コーポレイション | In-situ mirror characterization |
JP4824248B2 (en) * | 2000-05-19 | 2011-11-30 | ザイゴ コーポレイション | In situ mirror characterization |
JP2005522683A (en) * | 2002-04-09 | 2005-07-28 | ザイゴ コーポレイション | Method and apparatus for stage mirror mapping |
JP2005331542A (en) * | 2004-05-18 | 2005-12-02 | Hitachi High-Tech Electronics Engineering Co Ltd | Exposure apparatus, exposure method and method for manufacturing substrate |
JP4522142B2 (en) * | 2004-05-18 | 2010-08-11 | 株式会社日立ハイテクノロジーズ | Exposure apparatus, exposure method, and substrate manufacturing method |
WO2008108423A1 (en) | 2007-03-08 | 2008-09-12 | Nikon Corporation | Position measuring module, position measuring apparatus, stage apparatus, exposure apparatus and device manufacturing method |
DE102011111372A1 (en) * | 2011-08-29 | 2012-10-04 | Carl Zeiss Smt Gmbh | Measuring device for detecting position of lithography mask support structure, has two distance sensor devices among which second device has measuring surfaces whose extension is smaller than movement distance of support structure |
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