JPH07242730A - Epoxy resin composition and sealed semiconductor device - Google Patents

Epoxy resin composition and sealed semiconductor device

Info

Publication number
JPH07242730A
JPH07242730A JP5996594A JP5996594A JPH07242730A JP H07242730 A JPH07242730 A JP H07242730A JP 5996594 A JP5996594 A JP 5996594A JP 5996594 A JP5996594 A JP 5996594A JP H07242730 A JPH07242730 A JP H07242730A
Authority
JP
Japan
Prior art keywords
epoxy resin
resin composition
inorganic filler
composition
curing accelerator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5996594A
Other languages
Japanese (ja)
Inventor
Koichi Ibuki
浩一 伊吹
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Chemical Corp
Original Assignee
Toshiba Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Chemical Corp filed Critical Toshiba Chemical Corp
Priority to JP5996594A priority Critical patent/JPH07242730A/en
Publication of JPH07242730A publication Critical patent/JPH07242730A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To obtain an epoxy resin composition for semiconductor chip sealing by mixing as essential ingredients a specific epoxy resin, a specific phenolic resin, a specific amount of an inorganic filler, and a curing accelerator. CONSTITUTION:This composition comprises as essential components an epoxy resin represented by formula I, a phenolic resin represented by formula II (wherein R<1> is a group represented by CjH2j+1; R<2> is a group represented by CkH2k+1; and j, k, and n each is an integer of 0 or larger), an inorganic filler, e.g. silica particles having an average particle diameter of 30mum or smaller, and a curing accelerator, e.g. a phosphorus or imidazole compound, the amount of the filler being 25-90wt.% based on the whole composition. This device is obtained by sealing a semiconductor chip with this composition and curing the composition.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、耐湿性、半田耐熱性に
優れたエポキシ樹脂組成物および半導体封止装置に関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an epoxy resin composition having excellent moisture resistance and solder heat resistance, and a semiconductor encapsulation device.

【0002】[0002]

【従来の技術】近年、半導体集積回路の分野において、
高集積化、高信頼性化の技術開発と同時に半導体装置の
実装工程の自動化が推進されている。例えばフラットパ
ッケージ型の半導体装置を回路基板に取り付ける場合
に、従来、リードピン毎に半田付けを行っていたが、最
近では半田浸漬方式や半田リフロー方式が採用されてい
る。
2. Description of the Related Art In recent years, in the field of semiconductor integrated circuits,
At the same time as technology development for high integration and high reliability, automation of the mounting process of semiconductor devices is being promoted. For example, when mounting a flat package type semiconductor device on a circuit board, conventionally, soldering is performed for each lead pin, but recently, a solder dipping method or a solder reflow method has been adopted.

【0003】[0003]

【発明が解決しようとする課題】従来のノボラック型エ
ポキシ樹脂等のエポキシ樹脂、ノボラック型フェノール
樹脂およびシリカ粉末からなる樹脂組成物によって封止
した半導体装置は、装置全体の半田浴浸漬を行うと耐湿
性が低下するという欠点があった。特に吸湿した半導体
装置を浸漬すると、封止樹脂と半導体チップ、あるいは
封止樹脂とリードフレームの間の剥がれや、内部樹脂ク
ラックが生じて著しい耐湿性劣化を起こし、電極の腐蝕
による断線や水分によるリーク電流を生じ、その結果、
半導体装置は、長期間の信頼性を保証することができな
いという欠点があった。
A semiconductor device sealed with a conventional resin composition comprising an epoxy resin such as a novolac type epoxy resin, a novolac type phenolic resin and silica powder has a moisture resistance when the entire device is immersed in a solder bath. There was a drawback that the property deteriorated. Especially when a semiconductor device that has absorbed moisture is immersed, peeling between the encapsulating resin and the semiconductor chip, or between the encapsulating resin and the lead frame, and internal resin cracks cause significant deterioration in moisture resistance, which may cause wire breakage or moisture due to electrode corrosion. Leakage current, resulting in
The semiconductor device has a drawback in that it cannot guarantee long-term reliability.

【0004】本発明は、上記の欠点を解消するためにな
されたもので、吸湿の影響が少なく、特に半田浴浸漬後
の耐湿性、半田耐熱性に優れ、封止樹脂と半導体チップ
或いは封止樹脂とリードフレームとの剥がれや内部樹脂
クラックの発生がなく、また電極の腐蝕による断線や水
分によるリーク電流の発生もなく、長期信頼性を保証で
きるエポキシ樹脂組成物および半導体封止装置を提供し
ようとするものである。
The present invention has been made in order to solve the above-mentioned drawbacks, has little influence of moisture absorption, is particularly excellent in moisture resistance and solder heat resistance after immersion in a solder bath, and has a sealing resin and a semiconductor chip or sealing. Epoxy resin composition and semiconductor encapsulation device capable of ensuring long-term reliability without peeling between resin and lead frame or internal resin cracks, and without breakage due to electrode corrosion or leakage current due to moisture It is what

【0005】[0005]

【課題を解決するための手段】本発明者は、上記の目的
を達成しようと鋭意研究を重ねた結果、特定のエポキシ
樹脂と硬化剤として特定のフェノール樹脂を用いること
によって、耐湿性、半田耐熱性に優れた樹脂組成物が得
られることを見いだし、本発明を完成したものである。
Means for Solving the Problems As a result of intensive studies aimed at achieving the above object, the present inventor has found that by using a specific epoxy resin and a specific phenol resin as a curing agent, moisture resistance and solder heat resistance can be improved. It was found that a resin composition having excellent properties can be obtained, and the present invention has been completed.

【0006】即ち、本発明は、 (A)次の一般式で示されるエポキシ樹脂、That is, the present invention provides (A) an epoxy resin represented by the following general formula:

【0007】[0007]

【化5】 (B)次の一般式で示されるフェノール樹脂[Chemical 5] (B) Phenolic resin represented by the following general formula

【0008】[0008]

【化6】 (但し、式中R1 はCj 2j+1基を、R2 はCk 2k+1
基をそれぞれ表し、各基におけるj およびk 並びにn は
0又は 1以上の整数を表す) (C)無機質充填剤および (D)硬化促進剤 を必須成分とし、全体の樹脂組成物に対して前記(C)
の無機質充填剤を25〜90重量%の割合で含有してなるこ
とを特徴とするエポキシ樹脂組成物である。また、この
エポキシ樹脂組成物の硬化物によって、半導体チップが
封止されてなることを特徴とする半導体封止装置であ
る。
[Chemical 6] (However, in the formula, R 1 is a C j H 2j + 1 group, and R 2 is C k H 2k + 1.
Represents a group, and j and k in each group and n are
0 or an integer of 1 or more) (C) an inorganic filler and (D) a curing accelerator are essential components, and the above (C) is used for the entire resin composition.
An epoxy resin composition comprising the inorganic filler of 25 to 90% by weight. A semiconductor encapsulation device is obtained by encapsulating a semiconductor chip with a cured product of this epoxy resin composition.

【0009】以下、本発明を詳細に説明する。The present invention will be described in detail below.

【0010】本発明に用いる(A)エポキシ樹脂は、前
記の一般式化5で示されるものが使用される。このエポ
キシ樹脂には、ノボラック系エポキシ樹脂やエピビス系
エポキシ樹脂、その他の公知のエポキシ樹脂を併用する
ことができる。
As the epoxy resin (A) used in the present invention, the one represented by the above general formula 5 is used. A novolac-based epoxy resin, an epibis-based epoxy resin, and other known epoxy resins can be used in combination with this epoxy resin.

【0011】本発明に用いる(B)フェノール樹脂とし
ては、前記の一般式化6で示されるものが使用すること
ができる。具体的な化合物としては、例えば、
As the (B) phenol resin used in the present invention, those represented by the above general formula 6 can be used. Specific compounds include, for example,

【0012】[0012]

【化7】 が挙げられる。また、このフェノール樹脂の他にフェー
ル、アルキルフェノール等のフェノール類とホルムアル
デヒドあるいはパラホルムアルデヒドとを反応させて得
られるノボラック型フェノール樹脂およびこれらの変性
樹脂を併用することができる。
[Chemical 7] Is mentioned. In addition to this phenol resin, a novolac type phenol resin obtained by reacting phenols such as fail and alkylphenol with formaldehyde or paraformaldehyde and modified resins thereof can be used in combination.

【0013】本発明に用いる(C)無機質充填剤として
は、一般に使用されているものが広く使用されるが、そ
れらの中でも不純物濃度が低く、平均粒径30μm 以下の
シリカ粉末が好ましく使用される。平均粒径30μm を超
えると耐湿性および成形性が劣り好ましくない。無機質
充填剤の配合割合は、全体の樹脂組成物に対して25〜90
重量%含有するように配合することが好ましい。その割
合が25重量%未満では樹脂組成物の吸湿性が高く、半田
浸漬後の耐湿性に劣り、また90重量%を超えると極端に
流動性が悪くなり、成形性に劣り好ましくない。
As the inorganic filler (C) used in the present invention, generally used ones are widely used. Among them, silica powder having a low impurity concentration and an average particle diameter of 30 μm or less is preferably used. . If the average particle size exceeds 30 μm, the moisture resistance and moldability are poor, which is not preferable. The blending ratio of the inorganic filler is 25 to 90 with respect to the entire resin composition.
It is preferable to mix them so as to contain them by weight. When the proportion is less than 25% by weight, the hygroscopicity of the resin composition is high and the moisture resistance after solder immersion is poor, and when it exceeds 90% by weight, the fluidity is extremely deteriorated and the moldability is poor, which is not preferable.

【0014】本発明に用いる(D)硬化促進剤として
は、リン系硬化促進剤、イミダゾール系硬化促進剤、D
BU系硬化促進剤、その他の硬化促進剤等を広く使用す
ることができる。これらは単独又は2 種以上併用するこ
とができる。硬化促進剤の配合割合は、全体の樹脂組成
物に対して0.01〜5 重量%含有するように配合すること
が望ましい。その割合が0.01重量%未満では樹脂組成物
のゲルタイムが長く、硬化特性も悪くなり、また、5 重
量%を超えると極端に流動性か悪くなって成形性に劣り
さらに電気特性も悪くなり耐湿性に劣り好ましくない。
As the curing accelerator (D) used in the present invention, a phosphorus curing accelerator, an imidazole curing accelerator, D
BU-based curing accelerators and other curing accelerators can be widely used. These can be used alone or in combination of two or more kinds. It is desirable that the curing accelerator is blended in an amount of 0.01 to 5% by weight based on the total resin composition. If the proportion is less than 0.01% by weight, the gel time of the resin composition will be long and the curing properties will be poor, and if it exceeds 5% by weight, the fluidity will be extremely poor and the moldability will be poor and the electrical properties will be poor and the moisture resistance will be poor. Unfavorably poor.

【0015】本発明のエポキシ樹脂組成物は、前述した
特定のエポキシ樹脂、特定のフェノール樹脂、無機質充
填剤および硬化促進剤を必須成分とするが、本発明の目
的に反しない限度において、また必要に応じて例えば、
天然ワックス類、合成ワックス類、直鎖脂肪酸の金属
塩、酸アミド、エステル類、パラフィン等の離型剤、三
酸化アンチモン等の難燃剤、カーボンブラック等の着色
剤、シランカップリング剤、ゴム系やシリコーン系の低
応力付与剤等を適宜添加配合することができる。
The epoxy resin composition of the present invention contains the above-mentioned specific epoxy resin, specific phenolic resin, inorganic filler and curing accelerator as essential components, but it is also necessary as long as the object of the present invention is not impaired. Depending on, for example,
Natural waxes, synthetic waxes, metal salts of straight chain fatty acids, acid amides, esters, release agents such as paraffin, flame retardants such as antimony trioxide, colorants such as carbon black, silane coupling agents, rubbers A silicone-based low stress-imparting agent or the like can be appropriately added and blended.

【0016】本発明のエポキシ樹脂組成物を成形材料と
して調製する場合の一般的方法は、前述した特定のエポ
キシ樹脂、特定のフェノール樹脂、無機質充填剤、硬化
促進剤およびその他の成分を配合し、ミキサー等によっ
て十分均一に混合し、さらに熱ロールによる溶融混合処
理またはニーダ等による混合処理を行い、次いで冷却固
化させ適当な大きさに粉砕して成形材料とすることがで
きる。こうして得られた成形材料は、半導体装置をはじ
めとする電子部品あるいは電気部品の封止、被覆、絶縁
等に適用すれば優れた特性と信頼性を付与させることが
できる。
The general method for preparing the epoxy resin composition of the present invention as a molding material is to add the above-mentioned specific epoxy resin, specific phenol resin, inorganic filler, curing accelerator and other components, A molding material can be obtained by sufficiently uniformly mixing with a mixer or the like, further performing melt mixing treatment with a hot roll or mixing treatment with a kneader, and then cooling and solidifying and pulverizing to an appropriate size. When the molding material thus obtained is applied to sealing, coating, insulation, etc. of electronic parts or electric parts such as semiconductor devices, excellent properties and reliability can be imparted.

【0017】また、本発明の半導体封止装置は、上述の
成形材料を用いて半導体チップを封止することにより容
易に製造することができる。封止を行う半導体チップと
しては、例えば集積回路、大規模集積回路、トランジス
タ、サイリスタ、ダイオード等で特に限定されるもので
はない。封止の最も一般的な方法としては、低圧トラン
スファー成形法があるが、射出成形、圧縮成形、注形等
による封止も可能である。成形材料で封止後、加熱して
硬化させ、最終的にはこの硬化物によって封止された半
導体封止装置が得られる。加熱による硬化は、150 ℃以
上に加熱して硬化させることが望ましい。
The semiconductor encapsulation device of the present invention can be easily manufactured by encapsulating a semiconductor chip using the above-mentioned molding material. The semiconductor chip to be sealed is not particularly limited to, for example, an integrated circuit, a large scale integrated circuit, a transistor, a thyristor, a diode and the like. The most common method of sealing is a low-pressure transfer molding method, but sealing by injection molding, compression molding, casting or the like is also possible. After sealing with a molding material, it is heated and cured, and finally a semiconductor sealing device sealed with this cured product is obtained. For curing by heating, it is desirable to heat and cure at 150 ° C or higher.

【0018】[0018]

【作用】本発明のエポキシ樹脂組成物および半導体封止
装置は、特定のエポキシ樹脂、特定フェノール樹脂を用
いることによって、樹脂組成物のガラス転移温度が上昇
し、熱機械的特性と低応力性が向上し、半田浸漬、半田
リフロー後の樹脂クラックの発生がなくなり、耐湿性劣
化が少なくなるものである。
In the epoxy resin composition and semiconductor encapsulation device of the present invention, by using a specific epoxy resin or a specific phenol resin, the glass transition temperature of the resin composition rises, and the thermomechanical properties and low stress properties are improved. It is improved, the occurrence of resin cracks after solder immersion and solder reflow is eliminated, and the deterioration of moisture resistance is reduced.

【0019】[0019]

【実施例】次に本発明を実施例によって説明するが、本
発明はこれらの実施例によって限定されるものではな
い。以下の実施例および比較例において「%」とは「重
量%」を意味する。
EXAMPLES Next, the present invention will be described with reference to examples, but the present invention is not limited to these examples. In the following examples and comparative examples, “%” means “% by weight”.

【0020】実施例1 前述した化5のエポキシ樹脂6.0 %、前述した化7のフ
ェノール樹脂6.0 %、シリカ粉末87%、硬化促進剤 0.3
%、エステルワックス類 0.3%およびシランカップリン
グ剤 0.4%を常温で混合し、さらに90〜95℃で混練冷却
した後、粉砕して成形材料(A)を製造した。
Example 1 6.0% of the above-mentioned epoxy resin of Chemical formula 5, 6.0% of the above-mentioned phenolic resin of Chemical formula 7, 87% of silica powder, 0.3% of curing accelerator
%, Ester waxes 0.3% and silane coupling agent 0.4% were mixed at room temperature, further kneaded and cooled at 90 to 95 ° C., and then pulverized to produce a molding material (A).

【0021】実施例2 実施例1で用いた化5のエポキシ樹脂10.1%、実施例1
で用いた化7のフェノール樹脂9.9 %、シリカ粉末79
%、硬化促進剤 0.3%、エステルワックス類 0.3%およ
びシランカップリング剤 0.4%を常温で混合し、さらに
90〜95℃で混練冷却した後、粉砕して成形材料(B)を
製造した。
Example 2 10.1% of the epoxy resin of Chemical formula 5 used in Example 1, Example 1
Chemical formula 7 phenolic resin 9.9%, silica powder 79
%, Curing accelerator 0.3%, ester waxes 0.3% and silane coupling agent 0.4% are mixed at room temperature, and
The mixture was kneaded and cooled at 90 to 95 ° C, and then pulverized to produce a molding material (B).

【0022】比較例1 o-クレゾールノボラック型エポキシ樹脂13.1%、ノボラ
ック型フェノール樹脂6.9 %、シリカ粉末79%、硬化促
進剤 0.3%、エステルワックス類 0.3%およびシランカ
ップリング剤 0.4%を常温で混合し、さらに90〜95℃で
混練冷却した後、粉砕して成形材料(C)を製造した。
Comparative Example 1 o-Cresol Novolac type epoxy resin 13.1%, novolac type phenol resin 6.9%, silica powder 79%, curing accelerator 0.3%, ester waxes 0.3% and silane coupling agent 0.4% are mixed at room temperature. After further kneading and cooling at 90 to 95 ° C., the mixture was pulverized to produce a molding material (C).

【0023】比較例2 エピビス型エポキシ樹脂(エポキシ当量 450)16.2%、
ノボラック型フェノール樹脂3.8 %、シリカ粉末79%、
硬化促進剤 0.3%、エステルワックス類 0.3%およびシ
ランカップリング剤 0.4%を常温で混合し、さらに90〜
95℃で混練冷却した後、粉砕して成形材料(D)を製造
した。
Comparative Example 2 Epibis-type epoxy resin (epoxy equivalent 450) 16.2%,
Novolac-type phenol resin 3.8%, silica powder 79%,
0.3% of curing accelerator, 0.3% of ester waxes and 0.4% of silane coupling agent are mixed at room temperature, and
After kneading and cooling at 95 ° C., it was pulverized to produce a molding material (D).

【0024】こうして製造した成形材料(A)〜(D)
を用いて 170℃に加熱した金型内にトランスファー注
入、半導体チップを封止し硬化させて半導体封止装置を
製造した。これらの半導体封止装置について、諸試験を
行ったのでその結果を表1に示したが、本発明のエポキ
シ樹脂組成物および半導体封止装置は、耐湿性、半田耐
熱性に優れており、本発明の顕著な効果を確認すること
ができた。
Molding materials (A) to (D) thus produced
Was used to transfer transfer into a mold heated to 170 ° C., and the semiconductor chip was sealed and cured to manufacture a semiconductor sealing device. Various tests were conducted on these semiconductor encapsulation devices, and the results are shown in Table 1. The epoxy resin composition and the semiconductor encapsulation device of the present invention are excellent in moisture resistance and solder heat resistance. The remarkable effect of the invention could be confirmed.

【0025】[0025]

【表1】 *1 :トランスファー成形によって直径50mm、厚さ3mm
の成形品を作り、これを127℃, 2.5気圧の飽和水蒸気
中に24時間放置し、増加した重量によって測定した。 *2 :吸水率の場合と同様な成形品を作り、 175℃,8
時間の後硬化を行い、適当な大きさの試験片とし、熱機
械分析装置を用いて測定した。 *3 :JIS−K−6911に準じて試験した。 *4 :成形材料を用いて、2 本以上のアルミニウム配線
を有するシリコン製チップを、通常の42アロイフレーム
に接着し、175 ℃,2 分間トランスファー成形した後、
175 ℃,8 時間の後硬化を行った。こうして得た成形品
を、予め40℃,95%RH,100 時間の吸湿処理した後、
250 ℃の半田浴に10秒間浸漬した。その後、127 ℃,
2.5気圧の飽和水蒸気中でPCTを行い、アルミニウム
の腐蝕による50%断線を不良として評価した。 *5 : 8×8mm ダミーチップをQFP(14×14× 1.4m
m)パッケージ納め、成形材料を用いて175 ℃,2 分間
トランスファー成形した後、175 ℃,8 時間の後硬化を
行った。こうして得た半導体封止装置を85℃,85%,24
時間の吸湿処理した後、240 ℃の半田浴に 1分間浸漬し
た。その後、実体顕微鏡でパッケージ表面を観察し、外
部樹脂クラックの発生の有無を評価した。
[Table 1] * 1: Diameter 50 mm, thickness 3 mm by transfer molding
The molded product of No. 1 was prepared, and it was left in saturated steam at 127 ° C. and 2.5 atm for 24 hours and measured by the increased weight. * 2: Make a molded product similar to the case of water absorption, 175 ℃, 8
After post-curing for a certain time, a test piece of an appropriate size was prepared and measured using a thermomechanical analyzer. * 3: Tested according to JIS-K-6911. * 4: Using a molding material, a silicon chip with two or more aluminum wires is bonded to a normal 42 alloy frame and transfer molded at 175 ° C for 2 minutes.
Post-curing was performed at 175 ° C for 8 hours. The molded product thus obtained is subjected to moisture absorption treatment at 40 ° C., 95% RH for 100 hours in advance, and then
It was immersed in a solder bath at 250 ° C for 10 seconds. After that, 127 ℃,
PCT was performed in saturated steam of 2.5 atm and 50% disconnection due to corrosion of aluminum was evaluated as defective. * 5: QFP (14 × 14 × 1.4m) with 8 × 8mm dummy chip
m) The package was placed, transfer molding was performed for 2 minutes at 175 ° C using the molding material, and post-curing was performed at 175 ° C for 8 hours. The semiconductor encapsulation device obtained in this way was used at 85 ℃, 85%, 24
After absorbing moisture for a period of time, it was immersed in a solder bath at 240 ° C for 1 minute. Then, the package surface was observed with a stereoscopic microscope to evaluate the presence or absence of external resin cracks.

【0026】[0026]

【発明の効果】以上の説明および表1から明らかなよう
に、本発明のエポキシ樹脂組成物および半導体封止装置
は、耐湿性、半田耐熱性に優れ、吸湿による影響が少な
く、電極の腐蝕による断線や水分によるリーク電流の発
生等を著しく低減することができ、しかも長期間にわた
って信頼性を保証することができる。
As is clear from the above description and Table 1, the epoxy resin composition and the semiconductor encapsulation device of the present invention have excellent moisture resistance and solder heat resistance, are less affected by moisture absorption, and are not affected by electrode corrosion. It is possible to remarkably reduce the generation of leakage current due to disconnection and moisture, and it is possible to guarantee the reliability for a long period of time.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 (A)次の一般式で示されるエポキシ樹
脂、 【化1】 (B)次の一般式で示されるフェノール樹脂 【化2】 (但し、式中R1 はCj 2j+1基を、R2 はCk 2k+1
基をそれぞれ表し、各基におけるj およびk 並びにn は
0又は 1以上の整数を表す) (C)無機質充填剤および (D)硬化促進剤 を必須成分とし、全体の樹脂組成物に対して前記(C)
の無機質充填剤を25〜90重量%の割合で含有してなるこ
とを特徴とするエポキシ樹脂組成物。
1. An epoxy resin represented by the following general formula (A): (B) Phenolic resin represented by the following general formula: (However, in the formula, R 1 is a C j H 2j + 1 group, and R 2 is C k H 2k + 1.
Represents a group, and j and k in each group and n are
0 or an integer of 1 or more) (C) an inorganic filler and (D) a curing accelerator are essential components, and the above (C) is used for the entire resin composition.
An epoxy resin composition, characterized by containing the inorganic filler according to the above in a proportion of 25 to 90% by weight.
【請求項2】 (A)次の一般式で示されるエポキシ樹
脂、 【化3】 (B)次の一般式で示されるフェノール樹脂 【化4】 (但し、式中R1 はCj 2j+1基を、R2 はCk 2k+1
基をそれぞれ表し、各基におけるj およびk 並びにn は
0又は 1以上の整数を表す) (C)無機質充填剤および (D)硬化促進剤 を必須成分とし、全体の樹脂組成物に対して前記(C)
の無機質充填剤を25〜90重量%の割合で含有したエポキ
シ樹脂組成物の硬化物によって、半導体チップが封止さ
れてなることを特徴とする半導体封止装置。
2. An epoxy resin represented by the following general formula (A): (B) Phenolic resin represented by the following general formula: (However, in the formula, R 1 is a C j H 2j + 1 group, and R 2 is C k H 2k + 1.
Represents a group, and j and k in each group and n are
0 or an integer of 1 or more) (C) an inorganic filler and (D) a curing accelerator are essential components, and the above (C) is used for the entire resin composition.
A semiconductor encapsulation device, wherein a semiconductor chip is encapsulated with a cured product of an epoxy resin composition containing the inorganic filler in a proportion of 25 to 90% by weight.
JP5996594A 1994-03-05 1994-03-05 Epoxy resin composition and sealed semiconductor device Pending JPH07242730A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5996594A JPH07242730A (en) 1994-03-05 1994-03-05 Epoxy resin composition and sealed semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5996594A JPH07242730A (en) 1994-03-05 1994-03-05 Epoxy resin composition and sealed semiconductor device

Publications (1)

Publication Number Publication Date
JPH07242730A true JPH07242730A (en) 1995-09-19

Family

ID=13128400

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5996594A Pending JPH07242730A (en) 1994-03-05 1994-03-05 Epoxy resin composition and sealed semiconductor device

Country Status (1)

Country Link
JP (1) JPH07242730A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021246341A1 (en) * 2020-06-04 2021-12-09 日鉄ケミカル&マテリアル株式会社 Epoxy resin composition and cured product thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021246341A1 (en) * 2020-06-04 2021-12-09 日鉄ケミカル&マテリアル株式会社 Epoxy resin composition and cured product thereof

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