JPH0723957Y2 - プラズマ処理装置 - Google Patents
プラズマ処理装置Info
- Publication number
- JPH0723957Y2 JPH0723957Y2 JP4279089U JP4279089U JPH0723957Y2 JP H0723957 Y2 JPH0723957 Y2 JP H0723957Y2 JP 4279089 U JP4279089 U JP 4279089U JP 4279089 U JP4279089 U JP 4279089U JP H0723957 Y2 JPH0723957 Y2 JP H0723957Y2
- Authority
- JP
- Japan
- Prior art keywords
- permanent magnet
- plasma
- holder
- diffusion chamber
- annular
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000009792 diffusion process Methods 0.000 claims description 42
- 239000000758 substrate Substances 0.000 description 7
- 239000000498 cooling water Substances 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005219 brazing Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229920006332 epoxy adhesive Polymers 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 230000005415 magnetization Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Landscapes
- Drying Of Semiconductors (AREA)
- Electron Sources, Ion Sources (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4279089U JPH0723957Y2 (ja) | 1989-04-11 | 1989-04-11 | プラズマ処理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4279089U JPH0723957Y2 (ja) | 1989-04-11 | 1989-04-11 | プラズマ処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02132939U JPH02132939U (enrdf_load_stackoverflow) | 1990-11-05 |
| JPH0723957Y2 true JPH0723957Y2 (ja) | 1995-05-31 |
Family
ID=31554639
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4279089U Expired - Fee Related JPH0723957Y2 (ja) | 1989-04-11 | 1989-04-11 | プラズマ処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0723957Y2 (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN119111620B (zh) * | 2024-09-02 | 2025-08-05 | 哈尔滨商业大学 | 一种冷等离子体果蔬保鲜杀菌系统 |
-
1989
- 1989-04-11 JP JP4279089U patent/JPH0723957Y2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH02132939U (enrdf_load_stackoverflow) | 1990-11-05 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |