JPH07214369A - Joined structure and its manufacture - Google Patents

Joined structure and its manufacture

Info

Publication number
JPH07214369A
JPH07214369A JP6028818A JP2881894A JPH07214369A JP H07214369 A JPH07214369 A JP H07214369A JP 6028818 A JP6028818 A JP 6028818A JP 2881894 A JP2881894 A JP 2881894A JP H07214369 A JPH07214369 A JP H07214369A
Authority
JP
Japan
Prior art keywords
coating
laser
irradiation surface
laser irradiation
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6028818A
Other languages
Japanese (ja)
Other versions
JP3296070B2 (en
Inventor
Akihiko Ogino
明彦 荻野
Manabu Nomura
学 野村
Tsukasa Nakajima
司 中島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Denso Corp
Original Assignee
NipponDenso Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NipponDenso Co Ltd filed Critical NipponDenso Co Ltd
Priority to JP02881894A priority Critical patent/JP3296070B2/en
Publication of JPH07214369A publication Critical patent/JPH07214369A/en
Application granted granted Critical
Publication of JP3296070B2 publication Critical patent/JP3296070B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/34Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
    • H05K3/341Surface mounted components
    • H05K3/3421Leaded components
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/34Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
    • H05K3/3494Heating methods for reflowing of solder

Landscapes

  • Laser Beam Processing (AREA)

Abstract

PURPOSE:To provide an inexpensive joined structure and its manufacturing method where the exprosive scattering of the fusion zone is suppressed, and the laser beam welding can be executed in an excellent and stable manner. CONSTITUTION:A joined structure consists of a first member 1 having a laser beam irradiating surface 15 and a second member 2 which is arranged on the opposite side to the laser beam irradiating surface 15 and whose laser beam absorption ratio is higher than that of the first member 1. A first film 11 whose laser absorption ratio is higher than that of the first member 1 is arranged on the laser beam irradiating surface 15 side of the first member 1. A joining layer 3 is interposed between the first member 1 and the second member 2. The joined structure 3 consists of a third film 23 which is arranged on the first member 1 side and whose laser beam absorption ratio is higher than that of the first member 1 or whose melting point is lower than that of the first member 1, and a second film 22 which is arranged on the second member side and whose laser beam absorption ratio is lower than that of the second member or whose melting point is higher than that of the first member 1.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は,集積回路,センサ等の
回路,又は回路とケースターミナルとの間の配線等に用
いられる接合構造体であって,特に,異種金属を重ね合
わせレーザ溶接する,接合構造体及びその製造方法に関
する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a joining structure used for an integrated circuit, a circuit such as a sensor, or a wiring between a circuit and a case terminal, and in particular, dissimilar metals are superposed and laser-welded. The present invention relates to a bonded structure and a manufacturing method thereof.

【0002】[0002]

【従来技術】レーザ溶接は,エネルギー密度が極めて高
い熱源によるため,照射箇所以外への熱影響が小さく,
微小部や精度の要求される部品を低歪みで溶接できると
いう特徴を有する。かかるレーザ溶接を用いて異種金属
を溶接する場合には,図23に示すごとく,一般に異種
金属同志を重ね合せ構造とし,レーザにより溶融しにく
い第1金属部材91側から,レンズ5を通過したレーザ
50を照射して,第1金属部材91をレーザにより溶融
しやすい第2金属部材92と溶融溶接する。
2. Description of the Related Art Since laser welding uses a heat source with an extremely high energy density, it has a small thermal effect on areas other than the irradiated area
It has the feature that it can weld minute parts and parts that require precision with low distortion. When welding dissimilar metals by using such laser welding, as shown in FIG. 23, the dissimilar metals are generally laminated to each other, and the laser passing through the lens 5 is passed from the side of the first metal member 91 which is difficult to melt by laser. 50 is irradiated to melt-weld the first metal member 91 to the second metal member 92 which is easily melted by the laser.

【0003】このレーザ入力によって,図24に示すご
とく,まず表面の第1金属部材91が溶融し,やがてそ
の溶融部99は,図25に示すごとく,その下方の第2
金属部材92に到達する。これにより,第1,第2金属
部材91,92が溶接接合される。
As shown in FIG. 24, the first metal member 91 on the surface is first melted by this laser input, and the melted portion 99 is, as shown in FIG.
The metal member 92 is reached. As a result, the first and second metal members 91, 92 are welded and joined.

【0004】また,図28に示すごとく,表面の第1金
属部材91にはレーザ溶融し易いめっき膜911を,そ
の下方の第2金属部材92にはレーザ溶接を抑制するめ
っき膜922を施し,レーザ照射により,上記第1,第
2金属部材91,92を溶融部99にて溶接接合する場
合がある。
Further, as shown in FIG. 28, the first metal member 91 on the surface is provided with a plating film 911 which is easily melted by laser, and the second metal member 92 thereunder is provided with a plating film 922 for suppressing laser welding, The first and second metal members 91 and 92 may be welded and joined at the fusion zone 99 by laser irradiation.

【0005】次に,上記第1,第2金属部材を,電子部
品の溶接接合部において用いることが考えられる。例え
ば,図29に示すごとく,第1金属部材910を回路基
板から電子情報を取り出すリード170として用い,ま
た,第2金属部材920を,回路基板収納用の樹脂ケー
ス790と一体化したターミナル端子270として用い
る場合がある。
Next, it can be considered to use the first and second metal members in a welded joint portion of an electronic component. For example, as shown in FIG. 29, the first metal member 910 is used as a lead 170 for taking out electronic information from the circuit board, and the second metal member 920 is integrated with a resin case 790 for housing the circuit board. May be used as.

【0006】ターミナル端子270の一端はリード17
0との溶接部200であり,その他端は樹脂ケース79
0に埋設されるコネクタ部201である。ターミナル端
子270はリード170との溶融接合性に優れたNiめ
っき膜229により被覆されている。そして,コネクタ
部201の表面だけ,電気伝導の耐久性の向上のため
に,Sn(錫)めっき膜239により被覆されている。
One end of the terminal terminal 270 has a lead 17 at one end.
It is a welded part 200 with 0, and the other end is a resin case 79.
The connector portion 201 is embedded in 0. The terminal 270 is covered with a Ni plating film 229 having excellent fusion bondability with the lead 170. Then, only the surface of the connector portion 201 is covered with a Sn (tin) plating film 239 in order to improve the durability of electric conduction.

【0007】上記樹脂ケース790と一体化したターミ
ナル端子の製造方法について,図30を用いて説明す
る。まず,ターミナル端子作製用素材として,Snめっ
き膜が施された黄銅材を準備する。また,樹脂ケース作
製用素材として,樹脂を準備する。
A method of manufacturing a terminal terminal integrated with the resin case 790 will be described with reference to FIG. First, a brass material coated with an Sn plating film is prepared as a material for making terminal terminals. Further, resin is prepared as a material for producing the resin case.

【0008】次に,上記ターミナル端子作製用素材を,
金型を用いて所望の形状にプレス加工し,打ち抜いて,
図29に示すターミナル端子270を得る。次に,表面
処理工程として,ターミナル端子270の表面全体に,
無電解めっき法によりNiめっき膜229を形成し,次
いで,ターミナル端子270のコネクタ部201にのみ
Snめっき膜239を形成する。
Next, the material for making the terminal terminals is
Pressing into a desired shape using a mold, punching,
The terminal terminal 270 shown in FIG. 29 is obtained. Next, as a surface treatment process, the entire surface of the terminal 270 is
The Ni plating film 229 is formed by the electroless plating method, and then the Sn plating film 239 is formed only on the connector portion 201 of the terminal terminal 270.

【0009】次いで,金型内に上記ターミナル端子を所
定の個所に固定する。次いで,この金型内に上記樹脂ケ
ース作製用の軟化樹脂を注入して,樹脂ケースをインサ
ート成形する。次に,余分なターミナル端子をプレス切
断し,175℃程度でアニーリングを行なう。次いで,
ターミナル端子270と樹脂ケース790との間の絶縁
検査を行なう。これにより,樹脂ケースと一体化したタ
ーミナル端子が得られる。その後,これを梱包し,他の
場所へ運搬し,そこで,上記リード170を用いて,回
路を上記樹脂ケース内に搭載する。
Next, the above-mentioned terminal terminals are fixed in predetermined positions in the mold. Then, the softening resin for producing the resin case is injected into the mold to insert-mold the resin case. Next, extra terminal terminals are press-cut and annealed at about 175 ° C. Then,
An insulation test is performed between the terminal 270 and the resin case 790. As a result, a terminal terminal integrated with the resin case can be obtained. After that, this is packed and transported to another place, where the circuit is mounted in the resin case by using the lead 170.

【0010】尚,上記リード170は,はんだめっき9
11を施した軟銅製の第1金属部材910である。ター
ミナル端子270とリード170とは,レーザ照射によ
り溶接接合される。第2金属部材920の厚みは,0.
64〜0.8mmである。無電解Niめっき膜229の
膜厚は,3.5μmである。Snめっき膜239の膜厚
は,3μmである。
The lead 170 is solder plated 9
It is the 1st metal member 910 made from annealed copper which provided 11. The terminal 270 and the lead 170 are welded and joined by laser irradiation. The thickness of the second metal member 920 is 0.
It is 64-0.8 mm. The electroless Ni plating film 229 has a film thickness of 3.5 μm. The thickness of the Sn plating film 239 is 3 μm.

【0011】[0011]

【解決しようとする課題】しかしながら,図26に示す
ごとく,第1金属部材91の溶融部99がその下方の第
2金属部材92に到達した際に,レーザが照射された部
分の第2金属部材92が照射直後に蒸発し,その溶融金
属990が爆飛して,穴明き状態991が生じることが
ある。そこで,爆飛を防止するためにレーザ入力を小さ
くすると,図27に示すごとく,溶融部99が第2金属
部材92まで到達せずに,第1金属部材91の溶融不足
となり,溶接不十分となる。
However, as shown in FIG. 26, when the molten portion 99 of the first metal member 91 reaches the second metal member 92 below the second metal member 92, the portion of the second metal member irradiated by the laser is irradiated. 92 may evaporate immediately after irradiation, the molten metal 990 may be blown, and the perforated state 991 may occur. Therefore, if the laser input is reduced to prevent bombardment, as shown in FIG. 27, the molten portion 99 does not reach the second metal member 92, the first metal member 91 is insufficiently melted, and welding is insufficient. Become.

【0012】また,図28に示すごとく,第1,第2金
属部材91,92の表面に被膜を形成させた場合には,
両部材の溶接性を向上させることができるが,レーザ溶
融を抑制するめっき膜922としてニッケルとリンとの
合金を用いているため,コストがかかる。このめっき膜
930をコストの低いSnめっきに変更すると,レーザ
により第2金属部材92が過剰に加熱され,溶融部が爆
飛し,スパッタが発生するおそれがある。そのため,良
好で,安定したレーザ溶接を行うことが困難である。
Further, as shown in FIG. 28, when a film is formed on the surfaces of the first and second metal members 91 and 92,
Although the weldability of both members can be improved, the cost is high because an alloy of nickel and phosphorus is used as the plating film 922 that suppresses laser melting. If the plating film 930 is replaced with Sn plating, which has a low cost, the second metal member 92 may be excessively heated by the laser, the molten portion may be blown, and spatter may occur. Therefore, it is difficult to perform good and stable laser welding.

【0013】また,図29に示すごとく,第1,第2金
属部材91,92を,それぞれリード170及びターミ
ナル端子270として用いる場合には,前記したごと
く,樹脂ケース790に埋設されるコネクタ部201
を,錫めっき膜239により被覆しなければならない。
そのため,図30に示すごとく,ターミナル端子270
の作製の際に,第2金属部材920の表面に2段階に渡
る複雑なめっき工程を行わなければならない。
Further, as shown in FIG. 29, when the first and second metal members 91, 92 are used as the lead 170 and the terminal terminal 270, respectively, as described above, the connector portion 201 embedded in the resin case 790.
Must be covered with a tin-plated film 239.
Therefore, as shown in FIG. 30, the terminal terminal 270
At the time of manufacturing, the surface of the second metal member 920 must be subjected to a complicated plating process in two steps.

【0014】そのため,ターミナル端子270の作製
に,長時間を必要とし,コストが高くなるという問題が
ある。そこで,本発明はかかる従来の問題点に鑑み,溶
融部の爆飛を抑制し,良好で安定したレーザ溶接をする
ことができる,安価な接合構造体及びその製造方法を提
供しようとするものである。
Therefore, there is a problem that it takes a long time to manufacture the terminal terminal 270 and the cost becomes high. Therefore, in view of such conventional problems, the present invention intends to provide an inexpensive joint structure capable of suppressing the blow-up of the molten portion and performing good and stable laser welding, and a manufacturing method thereof. is there.

【0015】[0015]

【課題の解決手段】本発明は,レーザ照射面を有する第
1部材と,レーザ照射面と反対側に配置され,かつ該第
1部材よりもレーザ吸収率が高い第2部材とよりなる接
合構造体において,上記第1部材のレーザ照射面には,
第1部材よりもレーザ吸収率が高い第1被膜を配設し,
上記第1部材と上記第2部材との間には,第1部材側に
配設された上記第1部材よりもレーザ吸収率が高い第3
被膜と,第2部材側に配設された上記第2部材よりもレ
ーザ吸収率が低い第2被膜とからなる接合層を設けてな
り,これらはレーザ溶接により一体的に溶接されている
ことを特徴とする接合構造体にある。
According to the present invention, there is provided a joining structure comprising a first member having a laser irradiation surface and a second member arranged on the side opposite to the laser irradiation surface and having a laser absorption rate higher than that of the first member. In the body, the laser irradiation surface of the first member,
Disposing a first coating having a higher laser absorption rate than the first member,
A third laser having a higher laser absorptivity between the first member and the second member than the first member disposed on the first member side.
A joining layer comprising a coating and a second coating having a laser absorption rate lower than that of the second member disposed on the second member side is provided, and these are integrally welded by laser welding. It is in the characteristic joint structure.

【0016】本発明において最も注目すべきことは,第
1部材のレーザ照射面にレーザ吸収率が高い第1被膜を
設けていること,及び第1部材における該レーザ照射面
の反対面側に,第1部材及び第2部材に対するレーザ吸
収率が異なる2層構造の接合層を介して,上記第1部材
よりもレーザ吸収率の高い第2部材を設けていることで
ある。
What is most noticeable in the present invention is that the first film having a high laser absorptivity is provided on the laser irradiation surface of the first member, and that the surface of the first member opposite to the laser irradiation surface is provided. That is, the second member having a higher laser absorptivity than that of the first member is provided via the bonding layer having a two-layer structure having different laser absorptivities for the first member and the second member.

【0017】上記第1部材は,第2部材よりもレーザ吸
収率が低い。第1部材としては,例えば,銅,銅合金,
軟銅,無酸素銅等がある。第2部材としては,上記第1
部材よりもレーザ吸収率が高い材料,例えば黄銅,リン
青銅,軟鋼,鉄ニッケル合金,ステンレス等がある。
The first member has a lower laser absorption rate than the second member. As the first member, for example, copper, copper alloy,
There are soft copper, oxygen-free copper, etc. As the second member, the above first
Materials having a higher laser absorptivity than members, such as brass, phosphor bronze, mild steel, iron-nickel alloy, and stainless steel, are available.

【0018】上記第1被膜は,第1部材のレーザ照射面
を被覆している。第1被膜としては,第1部材よりもレ
ーザ吸収率が高い材料,例えば,レーザ吸収が高い低融
点材料を用いることができ,該材料としては,錫,はん
だ(Pb−Sn合金),鉛等がある。第1被膜は,第1
部材の溶融を加速させすぎないよう,かつ第2部材の加
熱を過大とならないように,適切な厚みを選択すること
が好ましい。具体的には,1〜10μmであることが好
ましい。1μm未満の場合には,レーザによる入熱が不
十分となり,溶融が進行しにくくなるため,強度不十分
となるおそれがある。一方,10μmを越えると,溶融
部材の爆飛が発生するおそれがある。
The first coating coats the laser irradiation surface of the first member. As the first coating, a material having a higher laser absorptivity than the first member, for example, a low melting point material having a higher laser absorption can be used, and as the material, tin, solder (Pb-Sn alloy), lead or the like can be used. There is. The first coating is the first
It is preferable to select an appropriate thickness so as not to accelerate the melting of the member too much and not to overheat the second member. Specifically, it is preferably 1 to 10 μm. If the thickness is less than 1 μm, the heat input by the laser becomes insufficient and the melting becomes difficult to proceed, so that the strength may be insufficient. On the other hand, if the thickness exceeds 10 μm, the molten member may explode.

【0019】上記接合層は,第1部材と第2部材との間
に介設されている。接合層は,2層構造をとり,第1部
材側に配設され,該第1部材よりもレーザ吸収率が高い
第3被膜と,第2部材側に配設され,該第2部材よりも
レーザ吸収率が低い第2被膜とよりなる。上記第3被膜
としては,上記第1被膜と略同一のレーザ吸収率を有す
る材料,例えば,錫,はんだ,鉛等を用いることもでき
る。
The joining layer is provided between the first member and the second member. The bonding layer has a two-layer structure, is disposed on the first member side, has a third coating having a higher laser absorptivity than the first member, and is disposed on the second member side, and is more than the second member. The second coating has a low laser absorption rate. As the third coating, a material having substantially the same laser absorptivity as that of the first coating, such as tin, solder, or lead, may be used.

【0020】上記第2被膜は,第2部材よりもレーザ吸
収率が高い材料であれば特に問題はないが,例えば,上
記第1部材と略同一のレーザ吸収率を有する材料とし
て,例えば,銅,銅合金等を用いることもできる。
There is no particular problem with the second coating as long as it is a material having a laser absorptivity higher than that of the second member. For example, as the material having a laser absorptivity substantially the same as that of the first member, for example, copper. , Copper alloy, etc. can also be used.

【0021】上記接合層は,上記第3被膜及び第2被膜
に加えて,上記第1部材と第3被膜との間に介設された
上記第1被膜を有していてもよい。また,上記第1被膜
と第3被膜とは,略同一のレーザ吸収率を有するものを
用いてもよく,例えば,両被膜に同一材料を用いること
もできる。この場合,接合層において,第1被膜も第3
被膜と同様に,第1部材から入力されたレーザの進行を
促進させることができる。
The bonding layer may have the first coating provided between the first member and the third coating in addition to the third coating and the second coating. In addition, the first coating and the third coating may have substantially the same laser absorptance. For example, the same material may be used for both coatings. In this case, in the bonding layer, the first coating is also the third
As with the coating, the progress of the laser input from the first member can be promoted.

【0022】上記接合層の合計膜厚は,レーザ照射によ
る溶融によって,第1部材と第2部材との中間のレーザ
吸収率となる膜厚であることが好ましい。例えば,上記
接合層を構成する第2被膜及び第3被膜の合計厚みは2
0μm以下であることが好ましい。これにより,レーザ
照射による接合層の溶融があたかも制動されながら第2
部材に到達するため,第2部材の過熱による爆飛及びス
パッタの発生を防止することができ,良好で安定したレ
ーザ溶接を行うことができる。
It is preferable that the total film thickness of the above-mentioned bonding layer is a film thickness which has an intermediate laser absorptance between the first member and the second member due to melting by laser irradiation. For example, the total thickness of the second coating and the third coating constituting the bonding layer is 2
It is preferably 0 μm or less. As a result, the melting of the bonding layer due to laser irradiation is damped and the second
Since it reaches the member, it is possible to prevent explosion and spatter from being generated due to overheating of the second member, and it is possible to perform good and stable laser welding.

【0023】上記第2被膜の膜厚は,0.1〜1μmで
あることが好ましい。0.1μm未満の場合には,第1
部材と第2部材との溶接強度が低下するおそれがある。
一方,1μmを越える場合には,スパッタ,爆飛のおそ
れがある。上記第3被膜の膜厚は,0.1〜20μmで
あることが好ましい。0.1μm未満の場合,又は20
μmを越える場合には,良好な溶接を行なうことができ
るレーザ出力の範囲がせまく,その出力の調整が困難で
ある。
The thickness of the second coating is preferably 0.1 to 1 μm. If less than 0.1 μm, the first
The welding strength between the member and the second member may decrease.
On the other hand, if it exceeds 1 μm, there is a risk of spatter and explosion. The thickness of the third coating is preferably 0.1 to 20 μm. If less than 0.1 μm, or 20
When it exceeds μm, the range of the laser output capable of performing good welding is narrow, and it is difficult to adjust the output.

【0024】上記レーザ吸収率は,例えば,赤外レーザ
に対するレーザ吸収率である。赤外レーザとしては,Y
AGレーザ,炭酸ガスレーザ,ルビーレーザ,アルゴン
レーザ等を用いることができる。本発明の接合構造体
は,上記レーザ照射面からレーザを照射して,上記第1
部材と第2部材とを,上記接合層を介して溶接接合され
る。上記レーザは,例えば,上記に示した赤外レーザで
ある。
The laser absorption rate is, for example, a laser absorption rate for an infrared laser. As an infrared laser, Y
An AG laser, a carbon dioxide gas laser, a ruby laser, an argon laser or the like can be used. The bonded structure of the present invention irradiates a laser from the laser irradiation surface,
The member and the second member are welded and joined together via the joining layer. The laser is, for example, the infrared laser shown above.

【0025】上記接合構造体の製造方法としては,例え
ば,第1部材の少なくともレーザ照射面に,第1部材よ
りもレーザ吸収率が高い第1被膜をめっき法により形成
し,次いで,第1部材よりもレーザ吸収率が高い第2部
材を準備し,該第2部材における少なくとも上記第1部
材側の表面に,第2部材よりもレーザ吸収率が低い第2
被膜をめっき法により形成し,次いで,上記第1部材の
レーザ照射面と反対側か,或いは第2部材における第1
部材側のいずれか,または両方の表面に,第1部材より
もレーザ吸収率が高い第3被膜をめっき法により形成
し,次いで,上記第1部材と上記第2部材とを,第1部
材におけるレーザ照射面と反対側と上記第2部材におけ
る第2被膜側とを向い合わせて,積層し,レーザ照射し
て,これらを一体的に接合することを特徴とする接合構
造体の製造方法がある。
As a method of manufacturing the above-mentioned bonded structure, for example, a first coating film having a laser absorption rate higher than that of the first member is formed by plating on at least the laser irradiation surface of the first member, and then the first member is formed. A second member having a laser absorptivity higher than that of the second member, and a second member having a laser absorptivity lower than that of the second member is provided on at least the surface of the second member on the first member side.
The coating is formed by plating, and then on the side opposite to the laser irradiation surface of the first member, or on the first member of the second member.
A third coating having a laser absorptivity higher than that of the first member is formed on one or both surfaces of the member by a plating method, and then the first member and the second member are formed on the first member. There is a method of manufacturing a bonded structure, characterized in that the side opposite to the laser irradiation surface and the second coating side of the second member are faced to each other, stacked, and laser-irradiated to integrally bond them. .

【0026】上記製造方法において,上記第1部材は,
上記第1被膜を形成した後,上記積層に先立って所望の
形状に加工することができる。
In the above manufacturing method, the first member is
After forming the first coating, it can be processed into a desired shape prior to the lamination.

【0027】また,本発明において,上記のごとくレー
ザ吸収率の異なる第1被膜及び第2被膜に代えて,融点
が異なる第1被膜及び第2被膜を用いた接合構造体があ
る。即ち,レーザ照射面を有する第1部材と,レーザ照
射面と反対側に配置され,かつ該第1部材よりもレーザ
吸収率が高い第2部材とよりなる接合構造体において,
上記第1部材のレーザ照射面には,第1部材よりもレー
ザ吸収率が高い上記第1被膜を配設し,上記第1部材と
上記第2部材との間には,第1部材側に配設された上記
第1部材よりも融点が低い第3被膜と,第2部材側に配
設された上記第2部材よりも融点が高い第2被膜とから
なる接合層を設けてなり,これらはレーザ溶接により一
体的に溶接されていることを特徴とする接合構造体であ
る。
Further, in the present invention, there is a bonding structure using the first coating and the second coating having different melting points instead of the first coating and the second coating having different laser absorptivities as described above. That is, in a joint structure including a first member having a laser irradiation surface and a second member arranged on the side opposite to the laser irradiation surface and having a higher laser absorption rate than the first member,
The first coating having a laser absorption rate higher than that of the first member is disposed on the laser irradiation surface of the first member, and the first coating is provided between the first member and the second member. A third coating film having a melting point lower than that of the first member arranged and a second coating film having a melting point higher than that of the second member arranged on the second member side are provided. Is a joined structure which is integrally welded by laser welding.

【0028】上記接合層は,第1部材側に配設され該第
1部材よりも融点が低い第3被膜と,第2部材側に配設
され該第2部材よりも融点が高い第2被膜とよりなる。
上記第3被膜としては,上記第1被膜と略同一の融点を
有する材料,例えば,錫等を用いることもできる。上記
第2被膜は第2部材よりも融点が低い材料であれば特に
問題はないが,例えば,上記第1部材の略同一の融点を
有する材料として銅等を用いることもできる。
The joining layer is a third coating which is disposed on the first member side and has a lower melting point than the first member, and a second coating which is disposed on the second member side and has a higher melting point than the second member. And consists of.
As the third coating, a material having substantially the same melting point as that of the first coating, such as tin, may be used. There is no particular problem as long as the second coating has a lower melting point than that of the second member. For example, copper or the like can be used as the material having substantially the same melting point as that of the first member.

【0029】また,上記第3被膜としては,第1部材よ
りもレーザ吸収率が高く,かつ第1部材よりも融点が低
い材料,例えば,はんだ,鉛等を用いることもできる。
また,上記第2被膜としては,第2部材よりもレーザ吸
収率が低く,かつ第2部材よりも融点が高い材料,例え
ば,銅,銅合金等を用いることもできる。
As the third coating, a material having a higher laser absorptivity than the first member and a lower melting point than the first member, such as solder or lead, may be used.
Further, as the second coating, a material having a lower laser absorptivity than the second member and a higher melting point than the second member, for example, copper or copper alloy can be used.

【0030】上記接合層は,上記第3被膜及び第2被膜
に加えて,上記第1部材と第3被膜との間に介設された
上記第1被膜を有していてもよい。また,上記第1被膜
と第3被膜とは,略同一の融点を有するものを用いても
よく,例えば,両被膜に同一材料を用いることもでき
る。この場合,接合層において,第1被膜も第3被膜と
同様に,第1部材から入力されたレーザによる溶融を促
進させることができる。
The joining layer may have the first coating provided between the first member and the third coating in addition to the third coating and the second coating. Further, the first coating and the third coating may have substantially the same melting point, and for example, the same material may be used for both coatings. In this case, in the bonding layer, like the third coating, the first coating can promote melting by the laser input from the first member.

【0031】上記接合層の合計膜厚は,レーザ照射によ
る溶融によって,第1部材と第2部材との中間の融点と
なる膜厚であることが好ましい。これにより,レーザ照
射による接合層の溶融があたかも制動されながら第2部
材に到達するため,第2部材の過熱による爆飛及びスパ
ッタの発生を防止することができ,良好で安定したレー
ザ溶接を行うことができる。その他は,前記の発明と同
様である。
It is preferable that the total film thickness of the above-mentioned bonding layer is a film thickness which becomes an intermediate melting point between the first member and the second member due to melting by laser irradiation. As a result, the melting of the bonding layer due to laser irradiation reaches the second member while being damped, so that it is possible to prevent explosion and spatter due to overheating of the second member, and perform good and stable laser welding. be able to. Others are the same as the above-mentioned invention.

【0032】上記接合構造体の製造方法としては,例え
ば,第1部材の少なくともレーザ照射面に,第1部材よ
りも融点の低い第1被膜をめっき法により形成し,次い
で,第1部材よりもレーザ吸収率が高い第2部材を準備
し,該第2部材における少なくとも上記第1部材側の表
面に,融点が高い第2被膜をめっき法により形成し,次
いで,上記第1部材のレーザ照射面と反対側か,或いは
第2部材における第1部材側のいずれかまたは両方の表
面に,第1部材よりも融点が低い第3被膜をめっき法に
より形成し,次いで,上記第1部材と上記第2部材と
を,第1部材におけるレーザ照射面と反対側と上記第2
部材における第2被膜側とを向かい合わせて,積層し,
レーザ照射して,これらを一体的に接合することを特徴
とする接合構造体の製造方法がある。
As a method of manufacturing the above-mentioned joined structure, for example, a first coating film having a melting point lower than that of the first member is formed by plating on at least the laser irradiation surface of the first member, and then the first member is formed. A second member having a high laser absorptivity is prepared, a second coating film having a high melting point is formed on at least the surface of the second member on the first member side by a plating method, and then a laser irradiation surface of the first member is formed. A third coating having a melting point lower than that of the first member is formed by plating on either or both surfaces of the second member and the first member side of the second member, and then the first member and the first member are formed. The second member and the second member on the side opposite to the laser irradiation surface of the first member.
Face the second coating side of the member, stack,
There is a method of manufacturing a bonded structure, which is characterized by irradiating a laser to bond them integrally.

【0033】上記製造方法において,上記第1部材は,
上記第1被膜を形成した後,上記積層に先立って所望の
形状に加工することができる。
In the above manufacturing method, the first member is
After forming the first coating, it can be processed into a desired shape prior to the lamination.

【0034】本発明の接合構造体の具体的使用例として
は,ハイブリッド集積基板とケースターミナル間の接
続,センサ内のの端子と端子との接続を銅リード箔で結
線する場合,電子回路に用いられるプリント板どうしの
回路結線等がある。
As a concrete example of use of the joint structure of the present invention, it is used in an electronic circuit when the connection between the hybrid integrated substrate and the case terminal and the connection between the terminals in the sensor are connected by the copper lead foil. There are circuit connections between printed boards.

【0035】[0035]

【作用及び効果】本発明の接合構造体は,第1部材のレ
ーザ照射面に第1被膜が配設されている。該第1被膜
は,第1部材よりもレーザ吸収率が高いため,第1部材
のレーザの吸収を高め,第1部材のレーザ吸収を増加さ
せる。そのため,低いレーザ入力で,第1部材の温度を
上昇させ,第1部材の溶融を促進させることができる。
In the bonded structure of the present invention, the first coating is provided on the laser irradiation surface of the first member. Since the first coating has a higher laser absorption rate than the first member, it enhances the laser absorption of the first member and increases the laser absorption of the first member. Therefore, it is possible to raise the temperature of the first member and accelerate the melting of the first member with a low laser input.

【0036】そうして,第1部材に吸収されたレーザ
は,更に出力を減少させながら進行し,やがて,レーザ
照射面と反対側の第1部材の裏面側に到達する。第1部
材の裏面側には,第2部材との間に,接合層が介在して
いる。接合層は,第1部材側に配設された上記第1部材
よりもレーザ吸収率が高い第3被膜と,第2部材側に配
設された上記第2部材よりもレーザ吸収率が低い第2被
膜とからなる。
Thus, the laser absorbed by the first member proceeds while further reducing the output, and eventually reaches the back surface side of the first member opposite to the laser irradiation surface. A bonding layer is interposed between the second member and the back surface side of the first member. The bonding layer includes a third coating having a laser absorption rate higher than that of the first member provided on the first member side, and a third coating having a laser absorption rate lower than that of the second member provided on the second member side. 2 coatings.

【0037】そのため,レーザが接合層を通過する際に
は,まず第1被膜において一旦その進行を速め,その後
第2被膜において徐々に進行を減速しながら,第2部材
へ到達する。それ故,レーザは,ある程度の出力を維持
しながら,第1部材と溶接接合可能でかつ過剰に溶融し
ない程度に,第2部材に入射する。
Therefore, when the laser passes through the joining layer, it first reaches the second member while accelerating the progress in the first coating and then gradually reducing the progress in the second coating. Therefore, the laser is incident on the second member to the extent that it can be welded to the first member and does not excessively melt while maintaining a certain output.

【0038】その結果,爆飛,スパッタの発生もなく,
少ないレーザ出力で第1部材と第2部材とを,良好に安
定して,レーザ溶接することができる。更に,第1,第
2部材を被覆する第1,第2,及び第3被膜には,安価
な材料を用いているため,接合構造体のコストを削減す
ることができる。また,本発明の接合構造体の製造方法
によれば,上記のごとく優れた特性を有する接合構造体
を作製することができる。
As a result, no explosion or spatter is generated,
The first member and the second member can be laser-welded with good stability in a small laser output. Furthermore, since inexpensive materials are used for the first, second, and third coatings that cover the first and second members, the cost of the bonded structure can be reduced. Further, according to the method for manufacturing a bonded structure of the present invention, it is possible to manufacture a bonded structure having excellent characteristics as described above.

【0039】次に,接合層として,上記の第1,第2部
材に対して融点が異なる第3被膜及び第2被膜を用いた
場合には,レーザによりこの接合層を溶融する際に,ま
ず第1被膜において一旦その溶融速度を速め,その後第
2被膜において徐々にその進行を減速しながら,第2部
材へ到達する。それ故,レーザによる溶融は,ある程度
の速度を維持しながら,第2部材には第1部材と溶接接
合可能でかつ過剰に溶融しない程度に,到達する。
Next, when the third coating and the second coating having different melting points from those of the above-mentioned first and second members are used as the bonding layer, when melting the bonding layer by laser, first, The melting speed of the first coating is once increased, and then the progress of the second coating is gradually reduced to reach the second member. Therefore, the melting by the laser reaches the second member to such an extent that the second member can be welded to the first member and is not excessively melted while maintaining a certain speed.

【0040】その結果,爆飛,スパッタの発生もなく,
少ないレーザ出力で第1部材と第2部材とを,良好に安
定して,レーザ溶接することができる。その他,本発明
においても,上記と同様の効果を得ることができる。以
上のごとく,本発明によれば,溶融部の爆飛を抑制し,
良好で安定したレーザ溶接をすることができる,安価な
接合構造体及びその製造方法を提供することができる。
As a result, no explosion or spatter is generated,
The first member and the second member can be laser-welded with good stability in a small laser output. In addition, also in the present invention, the same effects as described above can be obtained. As described above, according to the present invention, it is possible to suppress the explosion of the fusion zone,
It is possible to provide an inexpensive joint structure capable of performing favorable and stable laser welding and a method for manufacturing the same.

【0041】[0041]

【実施例】【Example】

実施例1 本発明の実施例に係る接合構造体について,図1〜図5
を用いて説明する。本例の接合構造体は,後述するごと
く,電子部品におけるリードとターミナル端子とを接合
した構造を示すもので,リードが第1部材を,ターナル
端子が第2部材を構成している。即ち,本例の接合構造
体は,図1に示すごとく,レーザ照射面15を有する第
1部材1と,レーザ照射面15の反対側に配置され,か
つ該第1部材1よりもレーザ吸収率が高い第2部材2と
よりなる。
Example 1 A joint structure according to an example of the present invention is shown in FIGS.
Will be explained. As will be described later, the joint structure of this example shows a structure in which a lead and a terminal terminal of an electronic component are joined, and the lead constitutes the first member and the terminal constitutes the second member. That is, as shown in FIG. 1, the bonded structure of this example is arranged on the first member 1 having a laser irradiation surface 15 and on the opposite side of the laser irradiation surface 15, and has a laser absorption rate higher than that of the first member 1. Of the second member 2 having a high height.

【0042】第1部材1の全表面は,第1部材1よりも
レーザ吸収率が高い第1被膜11により被覆されてい
る。第2部材2の表裏両面には,第2被膜22及び第3
被膜23により被覆されている。第2被膜22は第2部
材2よりもレーザ吸収率が低く,第3被膜23は第1部
材1よりもレーザ吸収率が高い。
The entire surface of the first member 1 is covered with a first coating 11 having a laser absorption rate higher than that of the first member 1. The second coating 22 and the third coating 22 are formed on both front and back surfaces of the second member 2.
It is covered with the coating 23. The second coating 22 has a lower laser absorptivity than the second member 2, and the third coating 23 has a higher laser absorptivity than the first member 1.

【0043】第1部材1及び第2部材2は,上記接合層
3を介して,積層されている。上記第1被膜11,第3
被膜23,及び第2被膜22は,接合層3を構成してい
る。上記第1部材1は,第2部材2と反対側の面をレー
ザ照射面15とし,該レーザ照射面15からYAGレー
ザ50が照射されて,上記接合層3を介して第2部材2
とレーザ溶接されている。
The first member 1 and the second member 2 are laminated with the bonding layer 3 interposed therebetween. The first coating 11, the third
The coating film 23 and the second coating film 22 form the bonding layer 3. The surface of the first member 1 opposite to the second member 2 is used as a laser irradiation surface 15, the YAG laser 50 is irradiated from the laser irradiation surface 15, and the second member 2 is interposed via the bonding layer 3.
And laser welded.

【0044】第1部材1は一方の電子部品におけるリー
ドであり,銅又は銅合金よりなる。第2部材2は他方の
電子部品におけるターミナル端子であり,銅よりレーザ
吸収率が高く,レーザ反射率が低い,黄銅又は軟鋼より
なる。第1被膜11及び第3被膜23は,第1部材1よ
りもレーザ吸収率が高い,例えば低融点を有する錫の被
膜である。第2被膜22は,第2部材2よりもレーザ吸
収率が低いか或いは第2部材2よりも融点が高い銅の被
膜である。表1に,上記第1部材,第2部材,第1被
膜,第2被膜,及び第3被膜に用いられる上記の各材料
のレーザ吸収率及び融点を示す。
The first member 1 is a lead in one electronic component and is made of copper or copper alloy. The second member 2 is a terminal terminal in the other electronic component, and is made of brass or mild steel having a higher laser absorptivity and a lower laser reflectivity than copper. The first coating 11 and the third coating 23 are tin coatings having a higher laser absorptivity than the first member 1, for example, having a low melting point. The second coating 22 is a coating of copper having a lower laser absorptivity than the second member 2 or a higher melting point than the second member 2. Table 1 shows the laser absorptivities and melting points of the above-mentioned materials used for the first member, the second member, the first coating, the second coating, and the third coating.

【0045】[0045]

【表1】 [Table 1]

【0046】第1被膜11の厚みは1〜10μmであ
り,第3被膜23の厚みは10μm以下である。第1部
材1の裏面を被覆する第1被膜11と第3被膜23との
合計厚みは,20μm以下である。第2被膜22の厚み
は,0.1〜1μmである。第3被膜23の厚みは,1
〜4μmである。第1被膜11,第3被膜23,及び第
2被膜22から構成される接合層3の合計膜厚は,レー
ザ照射による溶融によって,第1部材1と第2部材2と
の中間のレーザ吸収率となる膜厚(1〜20μm)であ
る。
The thickness of the first coating 11 is 1 to 10 μm, and the thickness of the third coating 23 is 10 μm or less. The total thickness of the first coating 11 and the third coating 23 that cover the back surface of the first member 1 is 20 μm or less. The thickness of the second coating 22 is 0.1 to 1 μm. The thickness of the third coating 23 is 1
Is about 4 μm. The total film thickness of the bonding layer 3 composed of the first film 11, the third film 23, and the second film 22 is determined by melting due to laser irradiation, and the laser absorption rate in the middle between the first member 1 and the second member 2. (1 to 20 μm).

【0047】次に,上記接合構造体の製造方法について
説明する。まず,図1に示すごとく,第1部材1の表裏
両面に,電気めっき法により第1被膜11を形成する。
また,第2部材2の片面に,下地めっきとして第2被膜
22を施し,該第2被膜22の表面には電気めっき法に
より第3被膜23を被覆させる。次に,上記第1部材1
と第2部材2とを重ね合わせて,積層し,レーザ照射に
より,これらを一体的に接合して,本例の接合構造体を
作製する。
Next, a method for manufacturing the above bonded structure will be described. First, as shown in FIG. 1, the first coating 11 is formed on both front and back surfaces of the first member 1 by electroplating.
A second coating 22 is applied as a base plating on one surface of the second member 2, and a third coating 23 is coated on the surface of the second coating 22 by electroplating. Next, the first member 1
The second member 2 and the second member 2 are overlapped and laminated, and these are integrally bonded by laser irradiation to manufacture a bonded structure of this example.

【0048】即ち,上記接合構造体においては,第1部
材1のレーザ照射面15としての片面に,集光レンズ5
を経たYAGレーザ50を照射する。これにより,ま
ず,図3に示すごとく,第1部材1のレーザ照射面15
の表面近傍が溶融し,溶融部19が形成される。やが
て,溶融部19は,図4に示すごとく,接合層3に到達
する。そうして,溶融部19は,図5に示すごとく,更
に,第2部材2の表面付近に至る。これにより,図2に
示すごとく,第1部材1,接合層3及び第2部材2に形
成された溶接部19にて,第1部材1と第2部材2とが
レーザ溶接される。
That is, in the above bonded structure, the condenser lens 5 is formed on one surface of the first member 1 as the laser irradiation surface 15.
After that, the YAG laser 50 is irradiated. As a result, first, as shown in FIG. 3, the laser irradiation surface 15 of the first member 1 is
The vicinity of the surface of is melted, and a melted portion 19 is formed. Eventually, the fusion zone 19 reaches the bonding layer 3 as shown in FIG. Then, the fusion zone 19 further reaches near the surface of the second member 2 as shown in FIG. Thereby, as shown in FIG. 2, the first member 1 and the second member 2 are laser-welded at the welded portion 19 formed on the first member 1, the bonding layer 3 and the second member 2.

【0049】次に,本例の作用効果について説明する。
本例の接合構造体は,図1に示すごとく,第1部材1の
レーザ照射面15に第1被膜11が配設されている。第
1被膜11は,第1部材1よりもレーザ吸収率が高いた
め,第1部材1のレーザの吸収を高める。そのため,図
3に示すごとく,低いレーザ入力で,第1部材1の温度
を上昇させ,第1部材1の溶融を促進させることができ
る。
Next, the function and effect of this example will be described.
In the bonded structure of this example, as shown in FIG. 1, the first coating 11 is provided on the laser irradiation surface 15 of the first member 1. Since the first coating 11 has a higher laser absorption rate than the first member 1, it enhances the laser absorption of the first member 1. Therefore, as shown in FIG. 3, it is possible to raise the temperature of the first member 1 and accelerate the melting of the first member 1 with a low laser input.

【0050】そうして,第1部材1に吸収されたレーザ
は,更に出力を減少させながら進行し,やがて,レーザ
照射面15と反対側の第1部材1の裏面側に到達する。
第1部材1の裏面側には,図4に示すごとく,第2部材
2との間に,第1部材1側に配設された第1被膜11及
び第2被膜22と,第2部材側に配設された第2被膜2
2とよりなる接合層3が介在している。
Then, the laser absorbed by the first member 1 proceeds while further reducing the output, and eventually reaches the back surface side of the first member 1 opposite to the laser irradiation surface 15.
As shown in FIG. 4, on the back surface side of the first member 1, between the second member 2 and the first coating film 11 and the second coating film 22 disposed on the first member 1 side, and the second member side. Second coating 2 disposed on
The bonding layer 3 composed of 2 is interposed.

【0051】第1被膜11及び第3被膜23は,錫であ
り,第1部材よりもレーザ吸収率が高く,また第1部材
よりも融点が低い性質を有している。一方,第2被膜2
2は,銅であり,第2部材よりもレーザ吸収率が低く,
第2部材よりも融点が高い性質を有している。
The first coating film 11 and the third coating film 23 are made of tin and have a higher laser absorption rate than the first member and a melting point lower than that of the first member. On the other hand, the second coating 2
2 is copper, which has a lower laser absorption rate than the second member,
It has a higher melting point than the second member.

【0052】そのため,レーザが接合層3を通過する際
には,図4に示すごとく,まず第1被膜11において一
旦その進行を速め,その後第2被膜22において徐々に
進行を減速しながら,第2部材2へ到達する。それ故,
レーザは,ある程度の出力を維持しながら,第2部材2
には第1部材1と溶接接合可能でかつ過剰に溶融しない
程度に,入射する。
Therefore, when the laser passes through the bonding layer 3, as shown in FIG. 4, the progress of the laser is first accelerated in the first coating film 11 and then gradually reduced in the second coating film 22, 2 Reach the member 2. Therefore,
The laser maintains the output to some extent, and the second member 2
Injects to the first member 1 to such an extent that it can be welded to the first member 1 and does not melt excessively.

【0053】また,第3被膜23は第2部材2よりも融
点が低く,第1,第3被膜11,23は第1部材1より
も融点が低いため,図4に示すごとく,レーザによりこ
の接合層3が溶融する際には,まず第1被膜11におい
て一旦その溶融速度を速め,その後第2被膜22におい
て徐々にその進行を減速しながら,第2部材2へ到達す
る。それ故,レーザによる溶融は,ある程度の速度を維
持しながら,第1部材1と溶接接合可能でかつ過剰に溶
融しない程度に,第2部材2に到達する。
The third coating 23 has a lower melting point than the second member 2 and the first and third coatings 11, 23 have a lower melting point than the first member 1. Therefore, as shown in FIG. When the bonding layer 3 melts, first, the melting speed of the first coating 11 is once increased, and then the progress of the second coating 22 is gradually reduced to reach the second member 2. Therefore, the laser melting reaches the second member 2 to such an extent that it can be welded to the first member 1 and does not excessively melt while maintaining a certain speed.

【0054】その結果,図2,図5に示すごとく,爆
飛,スパッタの発生もなく,少ないレーザ出力で第1部
材1と第2部材2とを,良好に安定して,レーザ溶接す
ることができる。
As a result, as shown in FIGS. 2 and 5, the first member 1 and the second member 2 can be laser-welded satisfactorily and stably without generation of bombs or spatters and with a small laser output. You can

【0055】また,接合層3の合計膜厚は,表1に示す
ごとく,レーザ照射による溶融によって,第1部材1と
第2部材2との中間のレーザ吸収率となる膜厚である。
そのため,レーザ照射による接合層3の溶融があたかも
制動されながら第2部材2に到達するため,第2部材2
の過熱による爆飛及びスパッタの発生を防止することが
できる。
Further, as shown in Table 1, the total film thickness of the bonding layer 3 is a film having an intermediate laser absorption rate between the first member 1 and the second member 2 due to melting by laser irradiation.
Therefore, the melting of the bonding layer 3 due to the laser irradiation reaches the second member 2 while being braked, so that the second member 2
It is possible to prevent explosion and spatter due to overheating.

【0056】また,第1被膜11及び第3被膜23は同
じ材料を用いているため,両被膜共に,第1部材1から
入力されたレーザの進行及びレーザによる溶融速度を促
進させることができる。更に,第1,第2部材1,2を
被覆する第1,第2,及び第3被膜11,22,23に
は,安価な材料を用いているため,接合構造体のコスト
を削減することができる。
Further, since the first coating 11 and the third coating 23 are made of the same material, both the coatings can accelerate the progress of the laser input from the first member 1 and the melting rate by the laser. Furthermore, since the first, second, and third coatings 11, 22, and 23 that coat the first and second members 1 and 2 are made of inexpensive materials, the cost of the bonded structure can be reduced. You can

【0057】また,本例の製造方法によれば,上記のご
とく優れた特性を有する接合構造体を作製することがで
きる。
Further, according to the manufacturing method of this example, it is possible to manufacture a bonded structure having excellent characteristics as described above.

【0058】実施例2 本例は,図6に示すごとく,接合層における第1被膜及
び第3被膜の皮膜厚さ(L)とレーザ出力(J)とを種
々に変えた場合の,両部材の接合状態を測定した。本測
定では,実施例1と同様の接合構造体を用いた。皮膜厚
さ(L)は,図7に示すごとく,種々に厚さを変えた第
1被膜11と第3被膜23との合計厚み(μm)であ
る。第1被膜11及び第3被膜23は,いずれも,第1
部材1の材料よりもレーザ吸収率が高い錫の被膜であ
る。
Example 2 In this example, as shown in FIG. 6, both members when the film thickness (L) and the laser output (J) of the first coating and the third coating in the joining layer were variously changed. The bonding state of was measured. In this measurement, the same bonded structure as in Example 1 was used. The film thickness (L) is, as shown in FIG. 7, the total thickness (μm) of the first film 11 and the third film 23 having various thicknesses. The first coating 11 and the third coating 23 are both the first
The tin coating has a higher laser absorption rate than the material of the member 1.

【0059】測定の結果を,図6に示した。同図より,
皮膜厚さ(L)が5〜15μmの範囲にある場合に,最
も広範囲のレーザ出力で,安定した溶接接合を行うこと
ができることがわかる。また,皮膜厚さが15μmを越
えると,図7に示すごとく,溶融金属190が爆飛し,
穴明き状態991が生じやすくなる。これは,第1被膜
11及び第3被膜23に用いられている錫が,第1部材
1に対して高いレーザ吸収率と低い融点を有するため
に,レーザ照射により溶融部が過剰に加熱されたためで
あると考えられる。
The results of the measurement are shown in FIG. From the figure,
It can be seen that when the film thickness (L) is in the range of 5 to 15 μm, stable welding can be performed with the widest laser output. Further, when the film thickness exceeds 15 μm, the molten metal 190 explodes as shown in FIG.
The perforated state 991 is likely to occur. This is because the tin used in the first coating 11 and the third coating 23 has a high laser absorptivity and a low melting point with respect to the first member 1, so that the molten portion was excessively heated by the laser irradiation. Is considered to be.

【0060】一方,第1被膜と第3被膜との合計皮膜厚
さ(L)が0の場合には,第2被膜22があたかも溶融
を制動するように働くが,この場合,溶融が第2部材2
に到達するには,より多くのレーザ出力が必要となる。
そこで,レーザ出力を高くすると,ある範囲の出力に達
すると一時は接合状態が良好となる。しかし,その範囲
は非常に狭く,わずかでもレーザ出力を高くしすぎる
と,図8に示すごとく,溶融金属190が爆飛し,穴明
き状態991が生じることになる。従って,上記皮膜厚
さ(L)が0である場合には,レーザ出力の加減が非常
に困難であることがわかる。
On the other hand, when the total film thickness (L) of the first film and the third film is 0, the second film 22 acts as if to stop the melting, but in this case, the second film is melted. Member 2
More laser power is required to reach
Therefore, if the laser output is increased, the joining state will be good for a while when the output reaches a certain range. However, the range is very narrow, and if the laser output is made too high even slightly, the molten metal 190 is blown and a perforated state 991 occurs as shown in FIG. Therefore, it can be seen that when the film thickness (L) is 0, it is very difficult to adjust the laser output.

【0061】実施例3 本例の接合構造体は,図9に示すごとく,第2部材2に
おける第1部材1と対向する面のみに,第2被膜22及
び第3被膜23を被覆させている。上記第2被膜22及
び第3被膜23は,第1部材1の表面を被覆している第
1被膜11と共に接合層3を構成している。その他は,
実施例1と同様である。本例においても,実施例1と同
様の効果を得ることができる。
Embodiment 3 As shown in FIG. 9, in the joint structure of this embodiment, only the surface of the second member 2 facing the first member 1 is covered with the second coating 22 and the third coating 23. . The second coating film 22 and the third coating film 23 constitute the bonding layer 3 together with the first coating film 11 coating the surface of the first member 1. Others,
This is the same as in the first embodiment. Also in this example, the same effect as that of the first embodiment can be obtained.

【0062】実施例4 本例の接合構造体は,図10に示すごとく,第1部材1
の表面に第1被膜113を被覆させており,第2部材2
における第1部材1と対向する面のみに,第2被膜22
を被覆させている。第1部材1と第2部材2との間に
は,第1被膜113と第2被膜22とから構成された接
合層3が介設されている。第1被膜113は錫であり,
その厚みは1〜10μmである。その他は,実施例1と
同様である。
Example 4 As shown in FIG. 10, the bonded structure of this example has the first member 1
The surface of the second member 2 is covered with the first coating 113.
The second coating 22 is formed only on the surface facing the first member 1 in FIG.
Is covered. A bonding layer 3 including a first coating 113 and a second coating 22 is interposed between the first member 1 and the second member 2. The first coating 113 is tin,
Its thickness is 1 to 10 μm. Others are the same as in the first embodiment.

【0063】本例においては,第2部材2と対向する第
1部材1の表面を被覆する第1被膜113が,実施例1
で用いた第3被膜と同様の役割を果たしている。そのた
め,本例においても,実施例1と同様に,爆飛及びスパ
ッタの発生がなく,良好で安定したレーザ溶接を行うこ
とができる。尚,第1被膜113の厚みを1μm未満に
した場合には,高いレーザ入力が必要とされる傾向にあ
った。一方,その厚みが10μmを越えた場合には,爆
飛及びスパッタの発生頻度が高くなった。
In this example, the first coating 113 that covers the surface of the first member 1 facing the second member 2 is the same as in the first embodiment.
Plays the same role as the third coating used in. Therefore, also in this example, as in the first example, good and stable laser welding can be performed without the occurrence of bombing and spatter. When the thickness of the first coating 113 was less than 1 μm, a high laser input tended to be required. On the other hand, when the thickness exceeds 10 μm, the frequency of explosion and spatter increases.

【0064】実施例5 本例の接合構造体は,図11に示すごとく,第1部材1
のレーザ照射面15にのみ第1被膜11を施している。
第1部材1と第2部材2との間には,第3被膜23及び
第2被膜22より構成される接合層3が介設している。
第1被膜11の厚さは,1〜10μmである。第2被膜
22の厚さは,0.2〜0.8μmである。第3被膜2
3の厚さは,1〜4μmである。その他は,実施例1と
同様である。本例においても,実施例1と同様の効果を
得ることができる。
Fifth Embodiment As shown in FIG. 11, the bonded structure of this embodiment has the first member 1
The first coating 11 is applied only to the laser-irradiated surface 15.
Between the first member 1 and the second member 2, a bonding layer 3 composed of a third coating 23 and a second coating 22 is interposed.
The thickness of the first coating 11 is 1 to 10 μm. The thickness of the second coating 22 is 0.2 to 0.8 μm. Third coating 2
The thickness of 3 is 1 to 4 μm. Others are the same as in the first embodiment. Also in this example, the same effect as that of the first embodiment can be obtained.

【0065】実施例6 本例の接合構造体は,図12に示すごとく,第1部材1
の表裏両面が,第1被膜11により被覆されている。ま
た,第2部材2における第1部材1と対向する面のみ
に,第2被膜22及び第3被膜23が形成されている。
第1部材1及び第2部材2の間には,上記第1被膜1
1,第2被膜22,及び第3被膜23から構成される接
合層3が介設されている。その他は,実施例1と同様で
ある。本例においても,実施例1と同様の効果を得るこ
とができる。
Example 6 As shown in FIG. 12, the bonded structure of this example has the first member 1
Both the front and back surfaces are covered with the first coating 11. Further, the second coating film 22 and the third coating film 23 are formed only on the surface of the second member 2 facing the first member 1.
The first coating 1 is provided between the first member 1 and the second member 2.
The bonding layer 3 composed of the first coating film 22, the second coating film 22, and the third coating film 23 is interposed. Others are the same as in the first embodiment. Also in this example, the same effect as that of the first embodiment can be obtained.

【0066】実施例7 本例の接合構造体は,図13に示すごとく,第1部材1
のレーザ照射面15のみに第1被膜11が形成されてい
る。また,第2部材2における第1部材1と対向する面
のみに,第2被膜22及び第3被膜23が形成されてい
る。第1部材1及び第2部材2の間には,上記第2被膜
22及び第3被膜23から構成される接合層3が介設さ
れている。
Example 7 As shown in FIG. 13, the joining structure of this example has the first member 1
The first coating 11 is formed only on the laser irradiation surface 15. Further, the second coating film 22 and the third coating film 23 are formed only on the surface of the second member 2 facing the first member 1. Between the first member 1 and the second member 2, a joining layer 3 composed of the second coating film 22 and the third coating film 23 is provided.

【0067】第1被膜11の厚さは,1〜10μmであ
る。第2被膜22の厚さは,0.2〜0.8μmであ
る。第3被膜23の厚さは,1〜4μmである。その他
は,実施例1と同様である。本例においても,実施例1
と同様の効果を得ることができる。
The thickness of the first coating 11 is 1 to 10 μm. The thickness of the second coating 22 is 0.2 to 0.8 μm. The third coating 23 has a thickness of 1 to 4 μm. Others are the same as in the first embodiment. Also in this example, Example 1
The same effect as can be obtained.

【0068】実施例8 本例の接合構造体は,図14に示すごとく,第1部材1
の表裏両面に第1被膜11が形成されている。更に,第
1部材1における第2部材2と対向する側には,上記第
1被膜11の表面には,厚み1〜4μmの第3被膜13
が形成されている。
Embodiment 8 As shown in FIG. 14, the bonded structure of this embodiment has the first member 1
The first coating film 11 is formed on both front and back surfaces. Further, on the side of the first member 1 facing the second member 2, the third coating film 13 having a thickness of 1 to 4 μm is formed on the surface of the first coating film 11.
Are formed.

【0069】また,第2部材2における第1部材1と対
向する面のみに,第2被膜22を形成している。その他
は,実施例1と同様である。本例においても,実施例1
と同様の効果を得ることができる。
Further, the second coating 22 is formed only on the surface of the second member 2 facing the first member 1. Others are the same as in the first embodiment. Also in this example, Example 1
The same effect as can be obtained.

【0070】実施例9 本例の接合構造体は,図15に示すごとく,第1部材1
の表裏両面に第1被膜11と同一材料の第3被膜113
が形成されている。また,第2部材2における第1部材
1と対向する面には第2被膜22が形成されている。上
記第1,第3被膜11,113は,電気めっき法によ
り,同時に形成される。
Example 9 The joint structure of this example has the first member 1 as shown in FIG.
The third coating 113 made of the same material as the first coating 11 on both front and back surfaces of
Are formed. A second coating 22 is formed on the surface of the second member 2 facing the first member 1. The first and third coatings 11 and 113 are simultaneously formed by electroplating.

【0071】第1被膜11の厚みは,1〜10μmであ
る。第2被膜22の厚みは,0.2〜0.8μmであ
る。第3被膜113の厚みは,1〜4μmである。その
他は,実施例1と同様である。本例においても,実施例
1と同様の効果を得ることができる。
The thickness of the first coating 11 is 1 to 10 μm. The thickness of the second coating 22 is 0.2 to 0.8 μm. The thickness of the third coating 113 is 1 to 4 μm. Others are the same as in the first embodiment. Also in this example, the same effect as that of the first embodiment can be obtained.

【0072】実施例10 本例の接合構造体は,図16に示すごとく,第1部材1
の表裏両面に第1被膜11が形成されている。更に,第
1部材1における第2部材2と対向する側の,上記第1
被膜11の表面には,厚み1〜4μmの第3被膜13が
形成されている。
Example 10 As shown in FIG. 16, the joining structure of this example has the first member 1
The first coating film 11 is formed on both front and back surfaces. Further, on the side of the first member 1 facing the second member 2, the first member
A third coating 13 having a thickness of 1 to 4 μm is formed on the surface of the coating 11.

【0073】また,第2部材2の表裏両面には,第2被
膜22が形成されている。更に,第2部材2における第
2部材2と対向する面と反対側の面には,コネクタ部の
電気伝導の耐久性向上のため,第3被膜23が形成され
ている。その他は,実施例1と同様である。本例におい
ても,実施例1と同様の効果を得ることができる。
A second coating 22 is formed on both front and back surfaces of the second member 2. Further, a third coating 23 is formed on the surface of the second member 2 opposite to the surface facing the second member 2 in order to improve the durability of electric conduction of the connector portion. Others are the same as in the first embodiment. Also in this example, the same effect as that of the first embodiment can be obtained.

【0074】実施例11 本例の接合構造体は,図17に示すごとく,第1部材1
の表裏両面に第1被膜11を形成している。また,第2
部材2の表裏両面には,第2被膜22が形成されてい
る。更に,第2部材2における第1部材1と対向しない
面に形成された第2被膜22の表面には,コネクタ部の
電気伝導の耐久性向上のため,第3被膜231が形成さ
れている。
Example 11 As shown in FIG. 17, the joining structure of this example has the first member 1
The first coating film 11 is formed on both front and back surfaces of the. Also, the second
A second coating 22 is formed on both front and back surfaces of the member 2. Furthermore, a third coating 231 is formed on the surface of the second coating 22 formed on the surface of the second member 2 that does not face the first member 1 in order to improve the durability of the electrical conduction of the connector portion.

【0075】第1被膜11の厚さは,1〜10μmであ
る。第2被膜22の厚さは,0.2〜0.8μmであ
る。第3被膜231の厚さは,1〜4μmである。その
他は,実施例1と同様である。本例においても,実施例
1と同様の効果を得ることができる。
The thickness of the first coating 11 is 1 to 10 μm. The thickness of the second coating 22 is 0.2 to 0.8 μm. The thickness of the third coating 231 is 1 to 4 μm. Others are the same as in the first embodiment. Also in this example, the same effect as that of the first embodiment can be obtained.

【0076】実施例12 本例の接合構造体は,図18〜図22に示すごとく,電
子部品におけるHIC回路とケース一体型ターミナル端
子との電気的接続を図るために用いた例である。上記接
合構造体は,図18に示すごとく,表裏両面に第1被膜
110を被覆させた第1部材10と,表裏両面に第2被
膜220及び第3被膜230を被覆させた第2部材20
とよりなる。
Embodiment 12 As shown in FIGS. 18 to 22, the joint structure of this embodiment is an example used for electrical connection between a HIC circuit in an electronic component and a case-integrated terminal terminal. As shown in FIG. 18, the bonding structure includes a first member 10 having both surfaces covered with a first coating 110, and a second member 20 having both surfaces coated with a second coating 220 and a third coating 230.
And consists of.

【0077】第1部材10及び第2部材20は,その一
部を重ね合わせ,第1部材10のレーザ照射部100か
らYAGレーザ50を照射することにより,溶接接合さ
れている。 第1被膜110,第3被膜230,及び第
2被膜220は,接合層3を構成している。
The first member 10 and the second member 20 are welded to each other by overlapping a part of them and irradiating the YAG laser 50 from the laser irradiation unit 100 of the first member 10. The first coating 110, the third coating 230, and the second coating 220 form the bonding layer 3.

【0078】図18,図19に示すごとく,第1被膜1
10が施された上記第1部材10は,リード17であ
る。第2被膜220及び第3被膜230が施された第2
部材20は,ケース79と一体的に形成されたターミナ
ル端子27である。第1部材10は軟銅であり,その厚
みは90〜150μmである。第1被膜110ははんだ
めっき膜(Pb−Sn)であり,その厚みは1〜10μ
mである。
As shown in FIGS. 18 and 19, the first coating 1
The first member 10 provided with 10 is a lead 17. The second film having the second film 220 and the third film 230 applied thereto
The member 20 is a terminal terminal 27 formed integrally with the case 79. The first member 10 is annealed copper and has a thickness of 90 to 150 μm. The first coating 110 is a solder plating film (Pb-Sn) and has a thickness of 1 to 10 μm.
m.

【0079】第2部材20は黄銅であり,その厚みは
0.64〜0.8mmである。第2被膜220はCu
(銅)下地めっき膜であり,その厚みは0.3〜0.8
μmである。第3被膜230は仕上Sn(錫)めっき膜
であり,その厚みは0.5〜1.5μmである。表2
に,上記第1部材10,第1被膜110,第2部材2
0,第2被膜220,及び第3被膜230の材料と,そ
のレーザ吸収率及び融点について示す。
The second member 20 is brass and has a thickness of 0.64 to 0.8 mm. The second coating 220 is Cu
(Copper) Underlayer plating film, the thickness is 0.3-0.8
μm. The third coating 230 is a finish Sn (tin) plating film and has a thickness of 0.5 to 1.5 μm. Table 2
In addition, the first member 10, the first coating 110, the second member 2
The materials of 0, the second coating 220, and the third coating 230, and their laser absorptance and melting point are shown.

【0080】[0080]

【表2】 [Table 2]

【0081】上記リード17とターミナル端子27は,
図19に示すごとく,電子部品7の構成部材であり,ハ
イブリッド集積回路基板70(以下,「HIC基板」と
いう。)とケース79との間の接続用として用いた。上
記ターミナル端子27の一端は,電子部品7のケース7
9に埋設されており,その一端をケース79の内壁から
突設させている。上記ケース79の内部には,HIC基
板70が固定されている。
The lead 17 and the terminal terminal 27 are
As shown in FIG. 19, it is a component of the electronic component 7 and is used for connection between the hybrid integrated circuit board 70 (hereinafter referred to as “HIC board”) and the case 79. One end of the terminal 27 is connected to the case 7 of the electronic component 7.
9 is embedded in the case 9, and one end of the case 79 is projected from the inner wall of the case 79. The HIC board 70 is fixed inside the case 79.

【0082】HIC基板70には,半導体チップ75
1,752,及びセラミック基板71が搭載されてお
り,これらは,配線回路73により電気的に接続されて
いる。セラミック基板71とターミナル端子27と間
は,上記リード17により電気的に接続されている。リ
ード17は,溶接部100において,ターミナル端子2
7とレーザ溶接接合されている。また,リード17は,
図20に示すごとく,溶接部101において,上記セラ
ミック基板71に半田710により固定された42アロ
イ製のパッド711と溶接接合されている。
A semiconductor chip 75 is mounted on the HIC substrate 70.
1, 752, and a ceramic substrate 71 are mounted, and these are electrically connected by a wiring circuit 73. The ceramic substrate 71 and the terminal terminal 27 are electrically connected by the lead 17. The lead 17 is connected to the terminal terminal 2 at the welded portion 100.
7 and laser welded. Also, the lead 17 is
As shown in FIG. 20, the welded portion 101 is welded to the 42-alloy pad 711 fixed to the ceramic substrate 71 by the solder 710.

【0083】上記電子部品の製造方法について,図20
〜図22を用いて説明する。まず,図21に示すごと
く,ターミナル端子作製用素材として,錫めっき膜が施
された黄銅材を準備する。また,ケース作製用素材とし
て,樹脂を準備する。
FIG. 20 shows a method of manufacturing the above electronic component.
~ It demonstrates using FIG. First, as shown in FIG. 21, a brass material coated with a tin plating film is prepared as a material for producing a terminal terminal. In addition, resin is prepared as a material for making the case.

【0084】次に,上記ターミナル端子作製用素材を,
金型を用いて所望の形状にプレス加工し,打ち抜いて,
ターミナル端子を得る。次いで,金型内に上記ターミナ
ル端子を所定の箇所に固定する。次いで,この金型内に
上記ケース作製用の軟化樹脂を注入して,ケースをイン
サート成形する。
Next, the material for producing the terminal terminals is
Pressing into a desired shape using a mold, punching,
Get terminal terminals. Then, the terminal terminals are fixed at predetermined positions in the mold. Next, the softening resin for making the case is injected into the mold to insert-mold the case.

【0085】次に,余分なターミナル端子をプレス切断
し,175℃程度でアニーリングを行う。次いで,ター
ミナル端子とケースとの間の絶縁検査を行う。これによ
り,ケース一体型ターミナル端子を得る。尚,場合によ
っては,その後,ケースと一体化したターミナル端子を
梱包し,他の場所に運搬し,そこで,以下の工程を行な
う。
Next, extra terminal terminals are press-cut and annealed at about 175.degree. Then, the insulation between the terminal and the case is inspected. As a result, a case-integrated terminal terminal is obtained. In some cases, the terminal terminals integrated with the case are then packaged and transported to another place, where the following steps are performed.

【0086】次に,図22に示すごとく,ケース79の
内部に上記HIC基板70を搭載する。その一方で,は
んだめっき膜が施された黄銅材を所望の形状に成形し,
リード17を得る。次いで,図20に示すごとく,リー
ド17と上記ターミナル端子27とを,溶接部100に
おいて,レーザ照射により溶接接合する。また,リード
17とHIC基板70のパッド711とを,溶接部10
1において溶接接合する。これにより,図19に示す電
子部品7が得られる。
Next, as shown in FIG. 22, the HIC board 70 is mounted inside the case 79. On the other hand, a brass material with a solder plating film is formed into a desired shape,
Obtain the lead 17. Next, as shown in FIG. 20, the lead 17 and the terminal terminal 27 are welded to each other at the welded portion 100 by laser irradiation. In addition, the lead 17 and the pad 711 of the HIC board 70 are connected to the welded portion 10
Welding is performed at 1. As a result, the electronic component 7 shown in FIG. 19 is obtained.

【0087】本例の作用効果について説明する。本例に
おいては,ターミナル端子27の素材として,下地Cu
めっき膜及びSnめっき膜により被覆された黄銅を用い
ている。そのため,ターミナル端子の素材を標準化する
ことができる。
The operation and effect of this example will be described. In this example, as the material of the terminal terminal 27, the base Cu
The brass coated with the plating film and the Sn plating film is used. Therefore, the material of the terminal terminal can be standardized.

【0088】また,従来のようにターミナル端子27の
溶接部200とコネクタ部201とを同一の皮膜構成で
作製することができ,従来のように異なるめっき構造で
作製する必要がない(図30参照)。そのため,プレ
ス,打ち抜き後のめっき処理を廃止することができ,コ
ストを削減することができる。
Further, unlike the conventional case, the welded portion 200 of the terminal terminal 27 and the connector portion 201 can be formed with the same coating composition, and it is not necessary to form them with different plating structures as in the conventional case (see FIG. 30). ). Therefore, the plating process after pressing and punching can be eliminated, and the cost can be reduced.

【0089】また,第2,第3被膜220,230は第
2被膜220を下地めっきとして形成可能であるため,
このようなめっき方式で作製される低融点めっき材料,
たとえば,錫めっき付黄銅板をプレス等することによっ
て製品を形成することができる。そのため,プレス後の
次工程においてめっきをする必要がなくなり,工程の簡
略化が期待できる。その他は,実施例1と同様の効果を
得ることができる。
Since the second and third coatings 220 and 230 can be formed by using the second coating 220 as an undercoat,
Low melting point plating material produced by such plating method,
For example, the product can be formed by pressing a tin-plated brass plate. Therefore, there is no need to perform plating in the next process after pressing, and it can be expected to simplify the process. Other than that, the same effects as those of the first embodiment can be obtained.

【図面の簡単な説明】[Brief description of drawings]

【図1】実施例1の接合構造体の,レーザ溶接前におけ
る断面説明図。
FIG. 1 is a cross-sectional explanatory view of a bonded structure of Example 1 before laser welding.

【図2】実施例1の,溶融接合された接合構造体の要部
斜視図。
FIG. 2 is a perspective view of an essential part of the fusion-bonded joint structure according to the first embodiment.

【図3】実施例1の接合構造体にレーザ照射をした時の
第1部材の溶融状態を示す説明図。
FIG. 3 is an explanatory diagram showing a molten state of the first member when the bonded structure of Example 1 is irradiated with laser.

【図4】図3に続く,第1部材及び接合層の溶融状態を
示す説明図。
FIG. 4 is an explanatory view showing a melted state of the first member and the bonding layer, following FIG.

【図5】図4に続く,第1部材及び第2部材が溶融接合
された状態を示す説明図。
FIG. 5 is an explanatory view showing a state in which the first member and the second member are fusion-bonded, following FIG. 4;

【図6】実施例2の,接合層における皮膜厚さ及びレー
ザ出力に対する,接合構造体の溶接状態を測定した結果
を示すグラフ。
FIG. 6 is a graph showing the results of measuring the welding state of the bonded structure with respect to the film thickness of the bonding layer and the laser output in Example 2.

【図7】実施例2の,穴明き状態の溶融部を示す説明
図。
FIG. 7 is an explanatory diagram showing a melted portion of Example 2 in a perforated state.

【図8】実施例2の,皮膜厚さLが0の場合の,穴明き
状態の溶融部を示す説明図。
FIG. 8 is an explanatory diagram showing a melted portion in a perforated state when the coating thickness L is 0 in Example 2.

【図9】実施例3の接合構造体の,レーザ溶接前におけ
る断面説明図。
FIG. 9 is an explanatory cross-sectional view of the joint structure of Example 3 before laser welding.

【図10】実施例4の接合構造体の断面図。FIG. 10 is a cross-sectional view of the bonded structure of Example 4.

【図11】実施例5の接合構造体の断面図。FIG. 11 is a cross-sectional view of the bonded structure of Example 5.

【図12】実施例6の接合構造体の断面図。FIG. 12 is a cross-sectional view of the bonded structure of Example 6.

【図13】実施例7の接合構造体の断面図。FIG. 13 is a cross-sectional view of the bonded structure of Example 7.

【図14】実施例8の接合構造体の断面図。14 is a cross-sectional view of the bonded structure of Example 8. FIG.

【図15】実施例9の接合構造体の断面図。FIG. 15 is a cross-sectional view of the bonded structure of Example 9.

【図16】実施例10の接合構造体の断面図。FIG. 16 is a cross-sectional view of the bonded structure of Example 10.

【図17】実施例11の接合構造体の断面図。FIG. 17 is a cross-sectional view of the bonded structure of Example 11.

【図18】実施例12の接合構造体の断面図。FIG. 18 is a cross-sectional view of the bonded structure of Example 12.

【図19】実施例12の,電子部品の斜視図。FIG. 19 is a perspective view of an electronic component according to a twelfth embodiment.

【図20】実施例12の,ターミナル端子とセラミック
基板との接合状態を示す説明図。
FIG. 20 is an explanatory diagram showing a joined state of the terminal terminal and the ceramic substrate according to the twelfth embodiment.

【図21】実施例12の,ケース一体型ターミナル端子
の製造方法を示す工程説明図。
FIG. 21 is a process explanatory view showing the manufacturing method of the case-integrated terminal terminal according to the twelfth embodiment.

【図22】実施例12の,ケース内にHIC基板を搭載
し,両者をリードにより電気的に接続する方法を示す説
明図。
FIG. 22 is an explanatory diagram showing a method of mounting the HIC substrate in the case and electrically connecting the both by leads according to the twelfth embodiment.

【図23】従来例の接合構造体の断面図。FIG. 23 is a cross-sectional view of a conventional bonded structure.

【図24】従来例の接合構造体において,レーザ照射を
した時の金属部材の溶融状態を示す説明図。
FIG. 24 is an explanatory view showing a molten state of a metal member when laser irradiation is performed in a bonded structure of a conventional example.

【図25】従来例の,接合構造体が溶融接合された状態
を示す説明図。
FIG. 25 is an explanatory view showing a state in which the joining structure body is fusion-joined in the conventional example.

【図26】従来例の,穴明き状態の接合構造体を示す説
明図。
FIG. 26 is an explanatory view showing a conventional bonded structure in a perforated state.

【図27】従来例の,接合不良の接合構造体を示す説明
図。
FIG. 27 is an explanatory view showing a joint structure with a poor joint in the conventional example.

【図28】他の従来例の,接合構造体が溶融接合された
状態を示す説明図。
FIG. 28 is an explanatory view showing a state in which the joining structure of another conventional example is fusion-joined.

【図29】他の従来例の接合構造体を,樹脂ケース一体
型ターミナル端子及びリードとして用いた場合の使用例
を示す説明図。
FIG. 29 is an explanatory diagram showing a usage example in which another conventional joining structure is used as a resin case-integrated terminal terminal and a lead.

【図30】他の従来例の,ターミナル端子の製造方法を
示す工程説明図。
FIG. 30 is a process explanatory view showing a method of manufacturing a terminal terminal of another conventional example.

【符号の説明】[Explanation of symbols]

1,10...第1部材, 11,113,110...第1被膜, 13,23,230...第3被膜, 15...レーザ照射面, 17...リード, 19...溶融部, 2,20...第2部材, 22,220...第2被膜, 27...ターミナル端子, 3...接合層, 1,10. . . First member, 11, 113, 110. . . First coating, 13, 23, 230. . . Third coating, 15. . . Laser irradiation surface, 17. . . Reed, 19. . . Fusion zone, 2, 20. . . Second member, 22, 220. . . Second coating, 27. . . Terminal terminal, 3. . . Bonding layer,

Claims (27)

【特許請求の範囲】[Claims] 【請求項1】 レーザ照射面を有する第1部材と,レー
ザ照射面と反対側に配置され,かつ該第1部材よりもレ
ーザ吸収率が高い第2部材とよりなる接合構造体におい
て,上記第1部材のレーザ照射面には,第1部材よりも
レーザ吸収率が高い第1被膜を配設し,上記第1部材と
上記第2部材との間には,第1部材側に配設された上記
第1部材よりもレーザ吸収率が高い第3被膜と,第2部
材側に配設された上記第2部材よりもレーザ吸収率が低
い第2被膜とからなる接合層を設けてなり,これらはレ
ーザ溶接により一体的に溶接されていることを特徴とす
る接合構造体。
1. A joint structure comprising a first member having a laser irradiation surface and a second member arranged on the side opposite to the laser irradiation surface and having a laser absorption rate higher than that of the first member. A first coating having a laser absorption rate higher than that of the first member is disposed on the laser irradiation surface of the first member, and is disposed on the first member side between the first member and the second member. A third coating film having a higher laser absorptivity than the first member, and a second coating film having a lower laser absorptivity than the second member disposed on the second member side. These are joined structures characterized by being integrally welded by laser welding.
【請求項2】 請求項1において,上記接合層の合計膜
厚は,レーザ照射により接合層を溶融状態としたとき,
上記第1部材と第2部材との中間のレーザ吸収率となる
膜厚であることを特徴とする接合構造体。
2. The total film thickness of the bonding layer according to claim 1, when the bonding layer is melted by laser irradiation,
A bonded structure having a film thickness that provides an intermediate laser absorption coefficient between the first member and the second member.
【請求項3】 請求項1,又は2において,上記第1被
膜と上記第3被膜とは,略同一のレーザ吸収率を有する
ことを特徴とする接合構造体。
3. The bonded structure according to claim 1, wherein the first coating and the third coating have substantially the same laser absorptance.
【請求項4】 請求項1,2,又は3において,上記第
2被膜と上記第1部材とは,略同一のレーザ吸収率を有
することを特徴とする接合構造体。
4. The bonded structure according to claim 1, 2, or 3, wherein the second coating and the first member have substantially the same laser absorptance.
【請求項5】 レーザ照射面を有する第1部材と,レー
ザ照射面と反対側に配置され,かつ該第1部材よりもレ
ーザ吸収率が高い第2部材とよりなる接合構造体におい
て,上記第1部材のレーザ照射面には,第1部材よりも
レーザ吸収率が高い上記第1被膜を配設し,上記第1部
材と上記第2部材との間には,第1部材側に配設された
上記第1部材よりも融点が低い第3被膜と,第2部材側
に配設された上記第2部材よりも融点が高い第2被膜と
からなる接合層を設けてなり,これらはレーザ溶接によ
り一体的に溶接されていることを特徴とする接合構造
体。
5. A joint structure comprising a first member having a laser irradiation surface and a second member arranged on the side opposite to the laser irradiation surface and having a laser absorption rate higher than that of the first member. The first coating having a higher laser absorption rate than the first member is disposed on the laser irradiation surface of the first member, and is disposed on the first member side between the first member and the second member. A third coating having a lower melting point than the first member and a second coating having a higher melting point than the second member disposed on the second member side are provided. A joint structure characterized by being integrally welded by welding.
【請求項6】 請求項5において,上記接合層の合計膜
厚は,レーザ照射により接合層を溶融状態としたとき,
上記第1部材と第2部材との中間の融点となる膜厚であ
ることを特徴とする接合構造体。
6. The total film thickness of the bonding layer according to claim 5, when the bonding layer is melted by laser irradiation,
A bonding structure having a film thickness that is an intermediate melting point between the first member and the second member.
【請求項7】 請求項5,又は6において,上記第1被
膜と上記第3被膜とは,略同一の融点を有することを特
徴とする接合構造体。
7. The bonded structure according to claim 5, wherein the first coating and the third coating have substantially the same melting point.
【請求項8】 請求項5,6,又は7において,上記第
2被膜と上記第1部材とは,略同一の融点を有すること
を特徴とする接合構造体。
8. The bonded structure according to claim 5, 6, or 7, wherein the second coating and the first member have substantially the same melting point.
【請求項9】 請求項1乃至7,又は8において,上記
接合層は,上記第3被膜及び第2被膜に加えて,上記第
1部材と上記第3被膜との間に介設された上記第1被膜
を有することを特徴とする接合構造体。
9. The bonding layer according to claim 1, wherein the bonding layer is interposed between the first member and the third coating, in addition to the third coating and the second coating. A bonded structure having a first coating.
【請求項10】 請求項1乃至8,又は9において,上
記第1被膜は,錫,はんだ,又は鉛であることを特徴と
する接合構造体。
10. The joint structure according to claim 1, wherein the first coating film is tin, solder, or lead.
【請求項11】 請求項1乃至9,又は10において,
上記第1被膜の膜厚は,1〜10μmであることを特徴
とする接合構造体。
11. The method according to any one of claims 1 to 9 or 10,
The thickness of the said 1st film | membrane is 1-10 micrometers, The joining structure characterized by the above-mentioned.
【請求項12】 請求項1乃至10,又は11におい
て,上記第3被膜は,錫,はんだ,又は鉛であることを
特徴とする接合構造体。
12. The joint structure according to claim 1, wherein the third coating film is tin, solder, or lead.
【請求項13】 請求項1乃至11,又は12におい
て,上記第3被膜の膜厚は,0.1〜20μmであるこ
とを特徴とする接合構造体。
13. The bonded structure according to claim 1, wherein the thickness of the third coating film is 0.1 to 20 μm.
【請求項14】 請求項1乃至12,又は13におい
て,上記第2被膜は,銅,又は銅合金であることを特徴
とする接合構造体。
14. The bonded structure according to claim 1, wherein the second coating film is copper or a copper alloy.
【請求項15】 請求項1乃至13,又は14におい
て,上記第2被膜の膜厚は,0.1〜10μmであるこ
とを特徴とする接合構造体。
15. The bonded structure according to claim 1, wherein the second coating has a thickness of 0.1 to 10 μm.
【請求項16】 請求項1乃至14,又は15におい
て,上記第2被膜及び第3被膜の合計厚みは20μm以
下であることを特徴とする接合構造体。
16. The bonded structure according to claim 1, wherein the total thickness of the second coating and the third coating is 20 μm or less.
【請求項17】 請求項1乃至15,又は16におい
て,上記第1部材は,銅,銅合金,軟鋼,又は無酸素銅
であることを特徴とする接合構造体。
17. The bonded structure according to claim 1, wherein the first member is copper, a copper alloy, mild steel, or oxygen-free copper.
【請求項18】 請求項1乃至16,又は17におい
て,上記第2部材は,黄銅,リン青銅,軟鋼,又は鉄ニ
ッケル合金,ステンレスであることを特徴とする接合構
造体。
18. The joint structure according to claim 1, wherein the second member is brass, phosphor bronze, mild steel, iron nickel alloy, or stainless steel.
【請求項19】 請求項1乃至17,又は18におい
て,上記レーザ吸収率は,赤外レーザに対するレーザ吸
収率であることを特徴とする接合構造体。
19. The bonded structure according to claim 1, wherein the laser absorption rate is a laser absorption rate for an infrared laser.
【請求項20】 請求項1乃至18,又は19におい
て,上記第1部材は銅又は銅合金であり,上記第2部材
は黄銅又は軟鋼であって,上記第1部材のレーザ照射面
だけでなく,該レーザ照射面と反対側にも,第1被膜が
設けられており,上記第1被膜及び第3被膜は錫であ
り,上記第2被膜は銅であることを特徴とする接合構造
体。
20. The method according to claim 1, wherein the first member is copper or a copper alloy, and the second member is brass or mild steel, not only the laser irradiation surface of the first member. A bonding structure, wherein a first coating is provided on the side opposite to the laser irradiation surface, the first coating and the third coating are tin, and the second coating is copper.
【請求項21】 請求項1乃至18,又は19におい
て,上記第1部材は軟銅であり,上記第2部材は黄銅で
あって,上記第1部材のレーザ照射面だけでなく,該レ
ーザ照射面と反対側にも,第1被膜が設けられており,
上記第1被膜ははんだであり,上記第2被膜は銅であ
り,上記第3被膜は錫であることを特徴とする接合構造
体。
21. The laser irradiation surface of claim 1, wherein the first member is annealed copper and the second member is brass. The first coating is also provided on the opposite side,
A joint structure, wherein the first coating is solder, the second coating is copper, and the third coating is tin.
【請求項22】 請求項1乃至20,又は21におい
て,上記接合構造体は,上記レーザ照射面からレーザを
照射して,上記第1部材と第2部材とを,上記接合層を
介して溶接接合されることを特徴とする接合構造体。
22. The joint structure according to claim 1, wherein the joint structure is irradiated with a laser from the laser irradiation surface to weld the first member and the second member through the joint layer. A joined structure characterized by being joined.
【請求項23】 請求項22において,上記レーザは,
赤外レーザであることを特徴とする接合構造体。
23. The laser according to claim 22, wherein the laser is
A bonded structure characterized by being an infrared laser.
【請求項24】 第1部材の少なくともレーザ照射面
に,第1部材よりもレーザ吸収率が高い第1被膜をめっ
き法により形成し,次いで,第1部材よりもレーザ吸収
率が高い第2部材を準備し,該第2部材における少なく
とも上記第1部材側の表面に,第2部材よりもレーザ吸
収率が低い第2被膜をめっき法により形成し,次いで,
上記第1部材のレーザ照射面と反対側か,或いは第2部
材における第1部材側のいずれか,または両方の表面
に,第1部材よりもレーザ吸収率が高い第3被膜をめっ
き法により形成し,次いで,上記第1部材と上記第2部
材とを,第1部材におけるレーザ照射面と反対側と上記
第2部材における第2被膜側とを向い合わせて,積層
し,レーザ照射して,これらを一体的に接合することを
特徴とする接合構造体の製造方法。
24. A first coating having a laser absorption rate higher than that of the first member is formed on at least a laser irradiation surface of the first member by a plating method, and then a second member having a laser absorption rate higher than that of the first member. Is prepared, a second coating film having a laser absorption rate lower than that of the second member is formed on at least the surface of the second member on the first member side by a plating method, and then,
A third coating having a laser absorptivity higher than that of the first member is formed by plating on either the surface opposite to the laser irradiation surface of the first member, the first member side of the second member, or both surfaces. Then, the first member and the second member are laminated with the side opposite to the laser irradiation surface of the first member and the side of the second coating of the second member facing each other, and laser-irradiated, A method for manufacturing a bonded structure, which comprises integrally bonding these.
【請求項25】 請求項24において,上記第1部材
は,上記第1被膜を形成した後,上記積層に先立って所
望の形状に加工することを特徴とする接合構造体の製造
方法。
25. The method for manufacturing a bonded structure according to claim 24, wherein the first member is formed into a desired shape prior to the stacking after forming the first coating.
【請求項26】 第1部材の少なくともレーザ照射面
に,第1部材よりも融点の低い第1被膜をめっき法によ
り形成し,次いで,第1部材よりもレーザ吸収率が高い
第2部材を準備し,該第2部材における少なくとも上記
第1部材側の表面に,融点が高い第2被膜をめっき法に
より形成し,次いで,上記第1部材のレーザ照射面と反
対側か,或いは第2部材における第1部材側のいずれか
または両方の表面に,第1部材よりも融点が低い第3被
膜をめっき法により形成し,次いで,上記第1部材と上
記第2部材とを,第1部材におけるレーザ照射面と反対
側と上記第2部材における第2被膜側とを向かい合わせ
て,積層し,レーザ照射して,これらを一体的に接合す
ることを特徴とする接合構造体の製造方法。
26. A first coating having a melting point lower than that of the first member is formed on at least the laser irradiation surface of the first member by a plating method, and then a second member having a higher laser absorption rate than the first member is prepared. Then, a second coating film having a high melting point is formed on at least the surface of the second member on the first member side by a plating method, and then, on the opposite side of the laser irradiation surface of the first member or in the second member. A third coating having a melting point lower than that of the first member is formed on one or both surfaces of the first member by a plating method, and then the first member and the second member are provided with a laser in the first member. A method for manufacturing a bonded structure, characterized in that the side opposite to the irradiation surface and the side of the second coating of the second member are faced to each other, laminated, and laser-irradiated to integrally bond them.
【請求項27】 請求項26において,上記第1部材
は,上記第1被膜を形成した後,上記積層に先立って所
望の形状に加工することを特徴とする接合構造体の製造
方法。
27. The method for manufacturing a joined structure according to claim 26, wherein the first member is formed into a desired shape prior to the stacking after forming the first coating.
JP02881894A 1994-01-31 1994-01-31 Joint structure and manufacturing method thereof Expired - Lifetime JP3296070B2 (en)

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