JPH0719771B2 - Discharge abnormality detection device - Google Patents

Discharge abnormality detection device

Info

Publication number
JPH0719771B2
JPH0719771B2 JP22183886A JP22183886A JPH0719771B2 JP H0719771 B2 JPH0719771 B2 JP H0719771B2 JP 22183886 A JP22183886 A JP 22183886A JP 22183886 A JP22183886 A JP 22183886A JP H0719771 B2 JPH0719771 B2 JP H0719771B2
Authority
JP
Japan
Prior art keywords
discharge
discharge abnormality
signal
power
detection device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP22183886A
Other languages
Japanese (ja)
Other versions
JPS6378532A (en
Inventor
新治 佐々木
裕 斉藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP22183886A priority Critical patent/JPH0719771B2/en
Publication of JPS6378532A publication Critical patent/JPS6378532A/en
Publication of JPH0719771B2 publication Critical patent/JPH0719771B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Drying Of Semiconductors (AREA)

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、高周波スパッタ装置,高周波プラズマエッチ
ング装置等の交流電力利用のプラズマ処理装置に係り、
特に放電状態の異常を検出記録するのに好適な装置に関
する。
TECHNICAL FIELD The present invention relates to a plasma processing apparatus using AC power, such as a high frequency sputtering apparatus and a high frequency plasma etching apparatus,
In particular, the present invention relates to an apparatus suitable for detecting and recording an abnormality in a discharge state.

〔従来の技術〕[Conventional technology]

従来の交流電力利用のプラズマ処理装置では、その放電
状態を知る方法としては、高周波反射電力計、あるい
は、電極直流電圧計が使用されており、放電状態の異常
を検出するためには、上記電力計、又は電圧計の変動を
見るか、処理室内を目視により観察するしかなかった。
In a conventional plasma processing apparatus using AC power, a high-frequency reflection wattmeter or an electrode DC voltmeter is used as a method of knowing the discharge state, and the above power meter is used to detect an abnormality in the discharge state. Or, the only choice was to see the fluctuation of the voltmeter or to visually observe the inside of the processing chamber.

〔発明が解決しようとする問題点〕[Problems to be solved by the invention]

上記従来技術では、比較的大きな放電異常は観測するこ
とができるが、高速なパルス状放電は検知できない。ま
た放電異常の大きさ、頻度、総数といった定量的分析に
ついては配慮されておらず放電異常により、局部温度上
昇や、帯電等が起り処理物に損傷を与えたり、異物が発
生するといった現象に対し、処理中の放電状態を知るこ
とができないため、何ら対策を施すことができなかっ
た。
In the above conventional technique, a relatively large discharge abnormality can be observed, but a high-speed pulsed discharge cannot be detected. In addition, no consideration was given to quantitative analysis such as the magnitude, frequency, and total number of discharge abnormalities.For discharge abnormalities, there is a rise in local temperature, electrostatic charge, etc., which damages the object to be processed and foreign matter occurs. However, since it is not possible to know the discharge state during processing, no measures could be taken.

本発明の目的は、放電異常による処理体の損傷を低減さ
せ、歩留りを向上させるため、放電異常の発生状態を検
知することにある。
An object of the present invention is to detect the occurrence state of the discharge abnormality in order to reduce the damage of the processing body due to the discharge abnormality and improve the yield.

〔問題点を解決するための手段〕[Means for solving problems]

上記目的は、プラズマ処理装置の交流放電電極の電位、
又は高周波電力計出力等の高周波給電系統からの信号
を、定常信号の周波数成分を削除するフィルタを通し、
得られた信号のレベル判別により、異常放電発生を検知
し、記録することにより達成される。
The above-mentioned object is the potential of the AC discharge electrode of the plasma processing apparatus,
Or, the signal from the high frequency power supply system such as the output of the high frequency power meter is passed through a filter that removes the frequency component of the steady signal,
This is achieved by detecting and recording the occurrence of abnormal discharge by discriminating the level of the obtained signal.

〔作用〕[Action]

交流電力給電系で測定される電位レベルは、負荷である
放電場の状態と密接に関わっているため、放電異常によ
るインピーダンスの変化に伴い変動する。この信号は、
電力搬送波をその主成分としているため、このままでは
放電異常を検知することはできないが、定常信号である
電力搬送波の周波数成分をフィルタにより削除すること
により、放電異常によって発生する信号のみが残る。そ
こで、その出力をレベル判別器により、ある閾値以上で
ある場合に放電異常発生と判断できる。
Since the potential level measured in the AC power feeding system is closely related to the state of the discharge field that is the load, it changes with the change in impedance due to abnormal discharge. This signal is
Since the power carrier is the main component, the discharge abnormality cannot be detected as it is, but by deleting the frequency component of the power carrier, which is a stationary signal, by the filter, only the signal generated by the discharge abnormality remains. Therefore, if the output is above a certain threshold value, it can be judged that the discharge abnormality has occurred.

〔実施例〕〔Example〕

以下、本発明の一実施例を第1図〜第3図により説明す
る。第1図は高周波スパッタ装置に本発明を適用したも
のである。
An embodiment of the present invention will be described below with reference to FIGS. FIG. 1 shows the high frequency sputtering apparatus to which the present invention is applied.

真空槽10にはターゲット電極1と基板電極2が設置され
ている。前記基板電極2はコンデンサ11を介して接地し
ている。前記ターゲット電極1は高周波電源6より、電
力計4、及び整合器5を介して13.56MHzの高周波電力を
供給されている。
A target electrode 1 and a substrate electrode 2 are installed in the vacuum chamber 10. The substrate electrode 2 is grounded via a capacitor 11. The target electrode 1 is supplied with a high frequency power of 13.56 MHz from a high frequency power source 6 through a power meter 4 and a matching unit 5.

前記電力計4の電力計反射波出力13は、本発明の放電異
常検出装置12へ入力される。前記放電異常検出装置12
は、信号検出部6,フィルタ部7,比較部8,記録部9で構成
されている。
The power meter reflected wave output 13 of the power meter 4 is input to the discharge abnormality detection device 12 of the present invention. The discharge abnormality detection device 12
Is composed of a signal detection unit 6, a filter unit 7, a comparison unit 8, and a recording unit 9.

以上の構成において、真空槽10は図示しない排気系と図
示しない雰囲気ガス(Ar等の不活性ガス)供給系により
一定圧力に保たれている。高周波電源3より電力計4,整
合器5を介してターゲット電極1に供給される高周波電
力により、電極間にプラズマが発生する。
In the above structure, the vacuum chamber 10 is kept at a constant pressure by an exhaust system (not shown) and an atmosphere gas (inert gas such as Ar) supply system (not shown). Plasma is generated between the electrodes by the high frequency power supplied from the high frequency power supply 3 to the target electrode 1 via the power meter 4 and the matching unit 5.

正常放電時において、電力計反射波出力13の信号の周波
数成分を第2図に示す。この信号には電力搬送波13.56M
Hz成分及び該搬送波電力の変動(高周波電源装置11が商
用電源ラインから電力を供給されていることに起因)よ
り生じる50Hz〜300Hzの低周波成分が定常信号として含
まれている。
The frequency components of the signal of the power meter reflected wave output 13 during normal discharge are shown in FIG. Power carrier 13.56M for this signal
A low frequency component of 50 Hz to 300 Hz generated due to the Hz component and fluctuation of the carrier power (due to the fact that the high frequency power supply 11 is supplied with power from the commercial power supply line) is included as a stationary signal.

前記電力計反射波出力13は、前記放電異常検出装置12の
信号検出部6にてレベル変換,インピーダンス変換を受
け、最適レベルにてフィルター部7に入力される。フィ
ルター部7の周波数特性は前記第2図に基き、第3図に
示されるように、前記電力計反射波出力13より送られる
信号の定常波成分のみをほとんど削除するように設計さ
れている。したがって正常放電時においては、フィルタ
ー部7からは何も出力されない。
The power meter reflected wave output 13 undergoes level conversion and impedance conversion in the signal detection unit 6 of the discharge abnormality detection device 12, and is input to the filter unit 7 at the optimum level. The frequency characteristic of the filter section 7 is designed based on FIG. 2 and as shown in FIG. 3 so that almost only the standing wave component of the signal sent from the power meter reflected wave output 13 is deleted. Therefore, during normal discharge, nothing is output from the filter unit 7.

ここで、ターゲット電極1,基板電極2の両電極間、ある
いは電極と真空槽10の壁との間で放電異常が発生する
と、ターゲット電極1より見た放電系のインピーダンス
変化が起り、整合器5からの反射電力が変動し、電力計
反射波出力13に現われる。放電異常発生に起因するこの
信号は一般に巾広い周波数成分を含む不規則信号である
ため、前記第3図で示される周波数特性を持つフィルタ
部7をほとんど通過する。つまりフィルタ部7の出力
は、放電異常発生時のみ信号を発する。
When a discharge abnormality occurs between the target electrode 1 and the substrate electrode 2 or between the electrode and the wall of the vacuum chamber 10, a change in the impedance of the discharge system seen from the target electrode 1 occurs and the matching device 5 The reflected power from the power source fluctuates and appears at the power meter reflected wave output 13. Since this signal caused by the occurrence of discharge abnormality is generally an irregular signal including a wide frequency component, it almost passes through the filter section 7 having the frequency characteristic shown in FIG. That is, the output of the filter unit 7 emits a signal only when a discharge abnormality occurs.

比較部8では、フィルタ部7及び比較部8の内部で発生
している微小な雑音レベルよりは大きい程度の信号レベ
ルと、フィルタ部7の出力を比較する。フィルタ部7を
通過する信号があれば、つまり放電異常が発生すれば、
比較部8で直に検出されることになる。放電異常発生が
検出されると記録部9に記録され、放電異常の発生時
間,総数,頻度,信号波形を知ることができる。
The comparison unit 8 compares the output of the filter unit 7 with a signal level that is higher than the minute noise level generated inside the filter unit 7 and the comparison unit 8. If there is a signal that passes through the filter unit 7, that is, if a discharge abnormality occurs,
It will be directly detected by the comparison unit 8. When the occurrence of the discharge abnormality is detected, it is recorded in the recording unit 9, and the occurrence time, the total number, the frequency, and the signal waveform of the discharge abnormality can be known.

このように、本実施例によれば、電力搬送波の定常性
と、放電異常信号の非定常不規則性との差を利用するこ
とにより、放電異常発生を検知し、その発生状態を知る
ことができるため、放電異常発生のメカニズムや放電異
常発生による幣害の解析、対策に役立てることができ
る。
As described above, according to the present embodiment, it is possible to detect the discharge abnormality occurrence and to know the occurrence state by utilizing the difference between the stationarity of the power carrier and the non-stationary irregularity of the discharge abnormality signal. Therefore, it is possible to utilize it for the mechanism of occurrence of discharge abnormality, analysis of monetary damage due to occurrence of discharge abnormality, and countermeasures.

〔発明の効果〕〔The invention's effect〕

本発明によれば、交流電力給電系統より、放電異常に起
因する信号のみを検出することができるため、放電異常
の発生回数、大きさ、発生時間を知ることができる。そ
のため、放電異常により発生する、処理物の損傷、異物
の付着といった問題を的確にとらえることができ、これ
ら放電異常に対し十分な対策が可能となり、半導体プラ
ズマ処理工程の歩留り向上の効果がある。
According to the present invention, it is possible to detect only the signal caused by the discharge abnormality from the AC power supply system, and thus it is possible to know the number of occurrences, the magnitude, and the generation time of the discharge abnormality. Therefore, problems such as damage to the processed object and adhesion of foreign matter caused by abnormal discharge can be accurately grasped, sufficient measures can be taken against these abnormal discharge, and the yield of semiconductor plasma processing steps can be improved.

【図面の簡単な説明】[Brief description of drawings]

第1図は、本発明の一実施例での異常放電検出装置の構
成図、第2図は第1図の電力計反射波出力の定常信号の
周波数パワースペクトル分布図、第3図は第1図のフィ
ルタ部7のフィルタ特性図である。 1……ターゲット電極,2……基板電極,3……高周波電
源,4……電力計,5……整合器,6……信号検出部,7……フ
ィルタ部,8……比較部,9……記録部,10……真空槽,11…
…コンデンサ。
FIG. 1 is a configuration diagram of an abnormal discharge detection device according to an embodiment of the present invention, FIG. 2 is a frequency power spectrum distribution diagram of a steady signal of a reflected wave output of a power meter of FIG. 1, and FIG. It is a filter characteristic view of the filter unit 7 in the figure. 1 ... Target electrode, 2 ... Substrate electrode, 3 ... High-frequency power supply, 4 ... Power meter, 5 ... Matching device, 6 ... Signal detection unit, 7 ... Filter unit, 8 ... Comparison unit, 9 …… Recording unit, 10 …… Vacuum chamber, 11 ・ ・ ・
… Capacitor.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】交流電力によりプラズマを発生させて試料
を処理するプラズマ処理装置の放電異常検出装置であっ
て、前記交流電力を検出する信号検出手段と、該信号検
出手段で検出された信号から定常波成分を除去して非定
常波成分だけを出力するフィルタ手段と、前記非定常波
成分の信号レベルを識別する比較手段と、前記非定常波
成分の発生状態を記録する記録部とを有することを特徴
とする放電異常検出装置。
1. A discharge abnormality detecting apparatus for a plasma processing apparatus for processing a sample by generating plasma with AC power, comprising signal detection means for detecting the AC power and a signal detected by the signal detection means. It has a filter means for removing the standing wave component and outputting only the non-standing wave component, a comparing means for identifying the signal level of the non-standing wave component, and a recording unit for recording the generation state of the non-standing wave component. Discharge abnormality detection device.
JP22183886A 1986-09-22 1986-09-22 Discharge abnormality detection device Expired - Lifetime JPH0719771B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22183886A JPH0719771B2 (en) 1986-09-22 1986-09-22 Discharge abnormality detection device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22183886A JPH0719771B2 (en) 1986-09-22 1986-09-22 Discharge abnormality detection device

Publications (2)

Publication Number Publication Date
JPS6378532A JPS6378532A (en) 1988-04-08
JPH0719771B2 true JPH0719771B2 (en) 1995-03-06

Family

ID=16772985

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22183886A Expired - Lifetime JPH0719771B2 (en) 1986-09-22 1986-09-22 Discharge abnormality detection device

Country Status (1)

Country Link
JP (1) JPH0719771B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3149272B2 (en) * 1991-12-10 2001-03-26 幸子 岡崎 How to monitor atmospheric pressure glow discharge plasma
JP2005209935A (en) * 2004-01-23 2005-08-04 Fab Solution Kk Electric discharge detecting apparatus

Also Published As

Publication number Publication date
JPS6378532A (en) 1988-04-08

Similar Documents

Publication Publication Date Title
US5910011A (en) Method and apparatus for monitoring processes using multiple parameters of a semiconductor wafer processing system
US6332961B1 (en) Device and method for detecting and preventing arcing in RF plasma systems
KR101355728B1 (en) Controlling plasma processing using parameters derived through the use of a planar ion flux probing arrangement
US5458732A (en) Method and system for identifying process conditions
US5993615A (en) Method and apparatus for detecting arcs
TWI444107B (en) Method for diagnosing abnormal plasma discharge, abnormal plasma discharge diagnostics system, and recording medium thereof
JP3893276B2 (en) Plasma processing equipment
WO2011001929A1 (en) Abnormality detection system, abnormality detection method, and recording medium
JP2003318115A (en) Window type probe, plasma monitoring apparatus, and plasma treatment apparatus
US20050212450A1 (en) Method and system for detecting electrical arcing in a plasma process powered by an AC source
US7054786B2 (en) Operation monitoring method for treatment apparatus
JP2002203835A (en) Plasma processor
US5025135A (en) Circuit configuration for the recognition of a plasma
JP3653667B2 (en) Abnormal discharge detection apparatus, abnormal discharge detection method, and plasma processing apparatus
US5176032A (en) Method and apparatus for processing electrical signals and a stress wave sensor
KR20100043143A (en) Plasma processing device and plasma discharge state monitoring device
JP2005147890A (en) Insulation abnormality diagnostic device
JPH0719771B2 (en) Discharge abnormality detection device
JPH08330095A (en) Plasma processing device
JP2005156452A5 (en)
CN112505501A (en) Partial discharge severity grade judging and early warning method based on electroacoustic combination
JP3702220B2 (en) Plasma management method
JPH03148035A (en) Apparatus for detecting abnormality of bearing
JPH08122142A (en) Device and method for discrimination
JPH07258853A (en) Method and device for discriminating state of process