JPH07194928A - Multitubular gas-liquid contact apparatus - Google Patents

Multitubular gas-liquid contact apparatus

Info

Publication number
JPH07194928A
JPH07194928A JP5351224A JP35122493A JPH07194928A JP H07194928 A JPH07194928 A JP H07194928A JP 5351224 A JP5351224 A JP 5351224A JP 35122493 A JP35122493 A JP 35122493A JP H07194928 A JPH07194928 A JP H07194928A
Authority
JP
Japan
Prior art keywords
gas
liquid
gas introduction
partition member
liquid tank
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5351224A
Other languages
Japanese (ja)
Inventor
Takashi Kimura
隆志 木村
Mamoru Iwasaki
守 岩▲崎▼
Kenji Kobayashi
健二 小林
Ikurou Kuwabara
育朗 桑原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Chiyoda Corp
Chiyoda Chemical Engineering and Construction Co Ltd
Original Assignee
Chiyoda Corp
Chiyoda Chemical Engineering and Construction Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chiyoda Corp, Chiyoda Chemical Engineering and Construction Co Ltd filed Critical Chiyoda Corp
Priority to JP5351224A priority Critical patent/JPH07194928A/en
Publication of JPH07194928A publication Critical patent/JPH07194928A/en
Pending legal-status Critical Current

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  • Gas Separation By Absorption (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

PURPOSE:To obtain an apparatus in which a large vibration of the froth layer in a liquid tank is prevented in advance by a method in which the lower end of a partition member is positioned at the same level with the gas exhaust nozzle of a gas introduction pipe or below the nozzle, while the upper end is located between the exhaust nozzle and the surface of the froth layer. CONSTITUTION:A partition member 3 is a partition wall in a bubble passage area (a). The lower end of the partition member 3 is positioned at the same level with the gas exhaust nozzle 2 of a gas introduction pipe l, or close to or below the nozzle 2. The upper end of the partition member 3 is located at an optional position between the exhaust nozzle 2 and the surface 5 of a froth layer, for example, between a stationary liquid surface 4 before the operation of an apparatus, close to the stationary liquid surface 4, or in the intermediate part between the exhaust nozzle 2 and the stationary liquid surface 4. A plurality of gas introduction pipes 1 are supported by these partition members 3 so that a plurality of bubble passage ares (a) are formed by the partition members 3 in the liquid tank.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、気体と液体(スラリー
液体を含む)とを接触させる多管式気液接触装置、特に
排煙脱硫装置として好適な多管式気液接触装置に関する
ものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a multi-tube gas-liquid contactor for contacting a gas with a liquid (including slurry liquid), and more particularly to a multi-tube gas-liquid contactor suitable as a flue gas desulfurization device. is there.

【0002】[0002]

【従来の技術】大型液槽内に液体を収容させ、その液体
内に下部周壁面にガス噴出孔を有するガス導入管の多数
を垂設し、そのガス導入管内に導入させたガスをガス噴
出孔から液体中に噴出させて気液接触を行わせる装置は
広く知られている(特公昭55−37295号、特公昭
57−6375号、特公昭59−11322号等)。
2. Description of the Related Art A liquid is contained in a large liquid tank, and a large number of gas introducing pipes having gas ejection holes on the lower peripheral wall are vertically provided in the liquid, and the gas introduced into the gas introducing pipe is ejected. Apparatuses for ejecting gas into a liquid through a hole to make gas-liquid contact are widely known (Japanese Patent Publication No. 55-37295, Japanese Patent Publication No. 57-6375, Japanese Patent Publication No. 59-11322, etc.).

【0003】図8に、排煙脱硫装置として用いられてい
る従来の気液接触装置の模式図を示す。図8において、
SO2を含む排煙は、ガス導管101からガス導入管1
03を通り、そのガス導入管103の下部周壁面に設け
たガス噴出口から水酸化カルシウムや水酸化カルシウム
等のカルシウム化合物のスラリー液中に噴出される。こ
の場合のガス導入管103は、図9又は図10に示すよ
うに、その下部周壁面に配設されたガス噴出孔104を
有する。液槽内のカルシウム化合物のスラリー液中に噴
出された排煙は、そのスラリー液と接触し、排煙中に含
まれるSO2がカルシウム化合物と反応してCaSO3
なる。そして、このCaSO3は、液槽下部の空気導入
管106から液中に導入された空気中酸素と反応してC
aSO4(石こう)になる。なお、112はガス中の液
体を捕捉する気液分離器を示し、105は攪拌羽根を示
し、108は石こうスラリー抜出管を示す。図8に示し
た排煙脱硫装置は、実際には極めて大型の装置であり、
その液槽102の内径は10m以上、通常25m以上も
あり、また、そのガス導入管103の数も1,000本
以上という極めて多い数である。
FIG. 8 shows a schematic view of a conventional gas-liquid contactor used as a flue gas desulfurizer. In FIG.
Flue gas containing SO 2 is discharged from the gas conduit 101 to the gas introduction pipe 1
A gas jet port provided on the lower peripheral wall surface of the gas introduction pipe 103 passes through 03 and is jetted into a slurry liquid of a calcium compound such as calcium hydroxide or calcium hydroxide. In this case, the gas introduction pipe 103 has a gas ejection hole 104 arranged on the lower peripheral wall surface thereof, as shown in FIG. 9 or 10. The flue gas ejected into the slurry liquid of the calcium compound in the liquid tank comes into contact with the slurry liquid, and SO 2 contained in the flue gas reacts with the calcium compound to become CaSO 3 . Then, this CaSO 3 reacts with oxygen in the air introduced into the liquid from the air introducing pipe 106 at the lower part of the liquid tank to form C.
It becomes aSO 4 (gypsum). Incidentally, 112 is a gas-liquid separator for capturing the liquid in the gas, 105 is a stirring blade, and 108 is a gypsum slurry withdrawal pipe. The flue gas desulfurization device shown in FIG. 8 is actually a very large device,
The inner diameter of the liquid tank 102 is 10 m or more, usually 25 m or more, and the number of the gas introducing pipes 103 is an extremely large number of 1,000 or more.

【0004】このような気液接触装置においては、ガス
導入管のガス噴出孔からガスを液中に噴出させることか
ら、このことが原因となって、液槽内フロス層(泡沫
層)に全体として定常的で周期的な大きな動揺が生じる
場合が特定の条件下で稀に生じる。そして、そのフロス
層の動揺により、液槽内のフロス層上面が大きく変動す
るようになる。このフロス層の定常的動揺は、液槽が大
型のものになるに従って大きなものとなり、気液接触効
率悪化の原因となる等の問題を生じる。
In such a gas-liquid contact device, gas is ejected into the liquid from the gas ejection holes of the gas introduction pipe, and this causes the entire floss layer (foam layer) in the liquid tank. As a result, there is a rare case where a steady and periodic large fluctuation occurs under certain conditions. Then, due to the fluctuation of the floss layer, the upper surface of the floss layer in the liquid tank largely changes. The steady fluctuation of the floss layer increases as the size of the liquid tank increases, which causes problems such as deterioration of gas-liquid contact efficiency.

【0005】[0005]

【発明が解決しようとする課題】本発明は、下部周壁面
にガス噴出孔を有するガス導入管を多数静止液体中に垂
設した構造の多管式気液接触装置において、そのガス噴
出孔から液体中へのガス噴出に起因する液槽内フロス層
の大きな動揺の発生を未然に防止する装置を提供するこ
とをその課題とする。
DISCLOSURE OF THE INVENTION The present invention provides a multi-tube type gas-liquid contactor having a structure in which a large number of gas introduction pipes having gas ejection holes on the lower peripheral wall are suspended in a stationary liquid. It is an object of the present invention to provide a device that prevents the occurrence of large fluctuations of the floss layer in the liquid tank due to the ejection of gas into the liquid.

【0006】[0006]

【課題を解決するための手段】本発明者らは、前記課題
を解決すべく鋭意研究を重ねた結果、本発明を完成する
に至った。即ち、本発明によれば、大型液槽内に下部周
壁面にガス噴出孔を有するガス導入管の多数をそのガス
噴出孔が液槽内静止液面より下方に位置するように垂設
した構造を有する気液接触装置において、複数の仕切部
材をその下端がガス導入管のガス噴出孔と同一レベル又
はその近傍もしくは下方に位置し、その上端がガス噴出
孔とフロス層上面との中間部に位置するように液槽内に
垂設するとともに、それら仕切部材を複数のガス導入管
に支持させ、その液槽内にそれら仕切部材により包囲さ
れた気泡通過区画を複数形成させたことを特徴とする多
管式気液接触装置が提供される。
The present inventors have completed the present invention as a result of intensive studies to solve the above problems. That is, according to the present invention, a large number of gas introduction pipes having gas ejection holes on the lower peripheral wall surface in the large liquid tank are vertically installed so that the gas ejection holes are located below the stationary liquid surface in the liquid tank. In the gas-liquid contactor having a plurality of partition members, the lower end thereof is located at the same level as or near or below the gas ejection hole of the gas introduction pipe, and the upper end thereof is located at an intermediate portion between the gas ejection hole and the upper surface of the floss layer. It is characterized in that it is vertically installed in the liquid tank so as to be positioned, and that the partition members are supported by a plurality of gas introduction pipes, and a plurality of bubble passage sections surrounded by the partition members are formed in the liquid tank. A multi-tubular gas-liquid contactor is provided.

【0007】本発明で用いる仕切部材としては、液体中
に垂設したガス導入管に支持させることのできる形状で
あれば板状や板体構造物等の任意の形状のものを用いる
ことができる。仕切部材の材質は、金属の他、プラスチ
ックやセラミック等であることができる。また、仕切部
材は多孔体(金網や多孔質板、繊維板等)や、波板等で
あることができる。
The partitioning member used in the present invention may have any shape such as a plate shape or a plate structure as long as it can be supported by a gas introducing pipe vertically provided in a liquid. . The material of the partition member may be metal, plastic, ceramic, or the like. Further, the partition member can be a porous body (wire mesh, porous plate, fiber plate, etc.), corrugated plate, or the like.

【0008】図1に、仕切部材により形成される気泡通
過区画の一例についての説明図を示す。図1(a)はそ
の斜視図を示し、図1(b)はその水平断面図を示す。
図2に、仕切部材により形成される気泡通過区画の他の
例についての説明図を示す。図2(a)はその斜視図を
示し、図2(b)はその水平断面図を示す。図3に、仕
切部材により形成される気泡通過区画のさらに他の例に
ついての水平断面図を示す。図4に、仕切部材を用いて
形成した気泡通過区画内を気泡が通過する際の状態説明
図を示す。図4(a)はその水平断面図を示し、図4
(b)は、図4(a)のB−B断面図を示す。
FIG. 1 shows an explanatory view of an example of a bubble passage section formed by a partition member. FIG. 1A shows a perspective view thereof, and FIG. 1B shows a horizontal sectional view thereof.
FIG. 2 shows an explanatory view of another example of the bubble passage section formed by the partition member. 2A shows a perspective view thereof, and FIG. 2B shows a horizontal sectional view thereof. FIG. 3 shows a horizontal sectional view of still another example of the bubble passage section formed by the partition member. FIG. 4 shows a state explanatory view when bubbles pass through the bubble passage section formed by using the partition member. FIG. 4 (a) shows a horizontal sectional view thereof.
4B is a sectional view taken along line BB of FIG.

【0009】これらの図において、1、1’はガス導入
管、2はその下部周壁面に形成されたガス噴出孔、3は
仕切部材、4は液槽内の静止液面、5は液槽内のフロス
層の上面(膨張液面)、6はガス噴出孔2のレベルから
その上方に形成されたフロス層を示す。aは仕切部材に
よって形成された気泡通過区画を示す。
In these figures, 1 and 1'denotes a gas inlet pipe, 2 a gas ejection hole formed in the lower peripheral wall surface thereof, 3 a partition member, 4 a stationary liquid surface in the liquid tank, 5 a liquid tank. The upper surface (expanded liquid surface) of the floss layer in the inside, 6 shows the floss layer formed above the level of the gas ejection holes 2. Reference symbol a denotes a bubble passage section formed by the partition member.

【0010】図1に示された気泡通過区画aは、板状の
仕切部材を隣接するガス導入管1の間に配設し、ガス導
入管に支持させて形成した例を示すものであり、4個の
ガス導入管に支持された4個の仕切部材3によって1つ
の気泡通過区画aが形成される。図2に示された気泡通
過区画aは、あらかじめ4枚羽根を有するように作製し
た仕切部材3を4個のガス導入管で形成される4辺形の
中心部に配置し、その羽根の先端を隣接するガス導入管
1に支持させて形成した例であり、その4枚の羽根によ
って1つの気泡通過区画aが形成される。図3は、仕切
部材によって包囲される気泡通過区画a内に、仕切部材
が支持されていない独立したガス導入管1’が存在する
例を示す。
The bubble passage section a shown in FIG. 1 shows an example in which a plate-shaped partition member is arranged between adjacent gas introduction pipes 1 and is supported by the gas introduction pipes. One partition passage a is formed by the four partition members 3 supported by the four gas introduction pipes. In the bubble passage section a shown in FIG. 2, the partition member 3 which is prepared in advance to have four blades is arranged at the center of a quadrangle formed by four gas introduction pipes, and the tip of the blade is arranged. Is formed by supporting adjacent gas introduction pipes 1, and the four blades form one bubble passage section a. FIG. 3 shows an example in which an independent gas introduction pipe 1 ′ in which the partition member is not supported is present in the bubble passage section a surrounded by the partition member.

【0011】仕切部材3は、気泡通過区画aにおける仕
切壁を構成し、図1に示すように板体であることができ
る他、図2に示すようにあらかじめ作製された板体構造
物等であることができる。この仕切部材3の下端は、ガ
ス導入管1のガス噴出孔2と同一レベル又はその近傍
(ガス噴出孔2のレベルよりやや上方又はやや下方)も
しくは下方に位置するように配設する。仕切部材3の上
端の位置はガス噴出孔2とフロス層との中間部、即ち、
ガス噴出孔2とフロス層上面5との間の任意の位置、例
えば、装置運転開始前の静止液面4とフロス層上面5と
の間、静止液面4の近傍、あるいはガス噴出孔2と静止
液面4との間の中間部(図4参照)、ガス噴出孔2とフ
ロス層上面5との間の中央部等の位置に配設することが
できる。図4に示すように、仕切部材3の上端をガス噴
出孔2と静止液面4との間に配置した場合、仕切部材3
の上端は、ガス噴出孔2のレベルからの高さが、ガス噴
出孔2と静止液面4との間の距離に対して、25〜10
0%、好ましくは40〜85%になるように位置させる
のがよい。一般的には、その上端は、ガス噴出孔2のレ
ベルからの高さで、5〜50cm、好ましくは10〜3
0cmである。仕切部材3の下端をガス噴出孔2よりや
や上方に位置させる場合、その下端の位置は、ガス噴出
孔2のレベルからの高さで7.5cm以下、好ましくは
0〜5cmの範囲に規定するのがよい。気泡通過区画a
の横断面積を小さくすれば、区画内での噴出ガスによる
リフト効果が大きくなり、液体を区画内にすい込み上昇
させる効果も大きくなり、液体の循環もよくなり、液体
の攪拌動力の節約にもなる。
The partition member 3 constitutes a partition wall in the bubble passage section a and can be a plate as shown in FIG. 1 or a plate structure or the like prepared in advance as shown in FIG. Can be The lower end of the partition member 3 is arranged so as to be located at the same level as the gas ejection hole 2 of the gas introduction pipe 1, or in the vicinity thereof (slightly above or slightly below the level of the gas ejection hole 2) or below. The position of the upper end of the partition member 3 is at an intermediate portion between the gas ejection hole 2 and the floss layer, that is,
An arbitrary position between the gas ejection hole 2 and the floss layer upper surface 5, for example, between the stationary liquid surface 4 and the floss layer upper surface 5 before the start of the operation of the apparatus, the vicinity of the stationary liquid surface 4, or the gas ejection hole 2 It can be arranged at a position such as an intermediate portion between the stationary liquid surface 4 (see FIG. 4), a central portion between the gas ejection hole 2 and the floss layer upper surface 5, and the like. As shown in FIG. 4, when the upper end of the partition member 3 is arranged between the gas ejection hole 2 and the stationary liquid surface 4, the partition member 3
The height from the level of the gas ejection hole 2 is 25 to 10 with respect to the distance between the gas ejection hole 2 and the stationary liquid level 4 at the upper end of
It is good to position it so as to be 0%, preferably 40 to 85%. Generally, the upper end thereof is at a height from the level of the gas ejection hole 2 and is 5 to 50 cm, preferably 10 to 3 cm.
It is 0 cm. When the lower end of the partition member 3 is located slightly above the gas ejection hole 2, the position of the lower end is 7.5 cm or less, preferably 0 to 5 cm, in height from the level of the gas ejection hole 2. Is good. Bubble passage section a
If the cross-sectional area of the tank is reduced, the lift effect due to the jetted gas in the compartment will increase, the effect of sinking and raising the liquid in the compartment will also increase, the circulation of the liquid will improve, and the power to stir the liquid will be saved. Become.

【0012】図3においては、仕切部材を用いて形成し
た気泡通過区画a内に仕切部材と接合していない独立し
たガス導入管の1本を存在させた例を示したが、その区
画a内には独立したガス導入管の複数本を存在させるこ
とができる。この種の気液接触装置は大型のもので、液
槽内に配設されるガス導入管は数千本と極めて多数であ
る。本発明では、気泡通過区画a内には、これらの独立
したガス導入管1’の複数本、例えば、2〜16本、好
ましくは4〜9本を存在させることができる。
FIG. 3 shows an example in which one independent gas introducing pipe which is not joined to the partition member is present in the bubble passage compartment a formed by using the partition member. There may be a plurality of independent gas introduction pipes. This type of gas-liquid contactor is large in size, and the number of gas introduction pipes arranged in the liquid tank is as large as several thousand. In the present invention, a plurality of these independent gas introduction pipes 1 ′, for example, 2 to 16 and preferably 4 to 9 can be present in the bubble passage section a.

【0013】図5に、その内部に多数の独立したガス導
入管を存在させた気泡通過区画aを多数含む液槽内部の
説明平面図を示す。この図において、10は液槽壁を示
す。図5の液槽は、仕切部材3を仕切壁とする多数の気
泡通過区画aからなる構造のものである。これらの各気
泡通過区画aには、独立した複数のガス導入管(図示さ
れず)が配設されている。また、各気泡通過区画aにお
ける縦の寸法:n及び横の寸法:mは、そのうちの大き
い寸法の方のn又はmの長さが1m以下、好ましくは
0.25〜0.5mになるように規定するのがよい。本
発明により液槽内に配設する仕切部材3は、任意の方法
で液槽内に支持させることができる。例えば、その液槽
内の静止液面上方又は液面下に支持体を配設し、これに
支持させることができる他、ガス導入管を支持させるた
めに格子状に配設された支持体に支持させることができ
る。従来の気液接触装置においては、液面上方にガス導
入管を支持させるために配設された格子状の支持体が配
設され、この格子状支持体は図6に示すように、ガス導
入管を支持固定化するガス導入管支持部11と、その支
持部間を連結する板体部12とから構成されている。本
発明では、この格子状のガス導入管支持体をフロス層内
下方に配設し、これにガス導入管を支持させるときに
は、その4個の板体部12が本発明で用いる仕切部材の
役割を果たし、本発明による気泡通過区画が形成され
る。従って、本発明による気泡通過区画aは、従来の装
置に用いられているガス導入管支持体をフロス層内下方
に配設することによっても形成することができる。
FIG. 5 shows an explanatory plan view of the inside of the liquid tank including a large number of bubble passage sections a in which a large number of independent gas introduction pipes are present. In this figure, 10 indicates a liquid tank wall. The liquid tank of FIG. 5 has a structure including a large number of bubble passage sections a having the partition member 3 as a partition wall. A plurality of independent gas introduction pipes (not shown) are arranged in each of the bubble passage sections a. The vertical dimension: n and the horizontal dimension: m in each bubble passage section a are such that the length of n or m of the larger dimension is 1 m or less, preferably 0.25 to 0.5 m. It is better to prescribe. The partition member 3 arranged in the liquid tank according to the present invention can be supported in the liquid tank by any method. For example, a support can be provided above or below the stationary liquid level in the liquid tank and supported by the support, or in a support arranged in a grid to support the gas introduction pipe. Can be supported. In the conventional gas-liquid contact device, a lattice-shaped support body is provided above the liquid surface to support the gas introduction pipe, and this lattice-shaped support body is used for introducing the gas as shown in FIG. It is composed of a gas introduction pipe support portion 11 for supporting and fixing the pipe, and a plate body portion 12 connecting the support portions. In the present invention, when the lattice-shaped gas introduction pipe support is arranged in the lower part of the floss layer and the gas introduction pipe is supported by the floss layer, the four plate members 12 serve as partition members used in the present invention. And a bubble passage compartment according to the invention is formed. Therefore, the bubble passage section a according to the present invention can also be formed by disposing the gas introduction pipe support used in the conventional apparatus below the floss layer.

【0014】本発明の気液接触装置の原理を図4を参照
して示すと、ガス導入管1内にガスを導入し、そのガス
をガス導入管1のガス噴出孔2から噴出させると、その
ガス噴出により生じた微細気泡は、その噴出後、上方に
移動し、仕切部材3で形成された気泡通過区画a内に入
り、区画a内を上昇し、その区画aのガス噴出孔2のレ
ベルからその上方には気泡と液体の混合物からなるフロ
ス層6が生じ、そのフロス層の上面は静止液面より上方
に位置するようになる。図4において、4は、ガス導入
管1内にガスを導入する以前の静止液面を示し、5は、
ガス導入管1内にガスを導入した後に形成されるフロス
層の上面(膨張液面)を示す。液槽内の液体は、仕切部
材3により形成される区画aの下端開口部からその区画
aに吸込まれ、区画a内の気泡とともに上昇し、その区
画aの上端開口部から排出される。液槽内に噴出された
ガスは、微細気泡となって区画a内を上昇する間に液体
と効率的に接触する。そして、ガス導入管1のガス噴出
孔2から噴出されたガスの気泡は、区画a内に集合さ
れ、区画a内を上昇することから、気泡の上昇に際して
起る液体流の運動エネルギーはその区画a内に封止さ
れ、他の部分へ伝達することが防止され、その結果、液
槽内のフロス層の大きな動揺の発生が防止される。
The principle of the gas-liquid contactor of the present invention will be described with reference to FIG. 4. When a gas is introduced into the gas introduction pipe 1 and the gas is ejected from the gas ejection holes 2 of the gas introduction pipe 1, The fine bubbles generated by the gas ejection move upward after the ejection, enter the bubble passage section a formed by the partitioning member 3, rise in the section a, and form the gas ejection holes 2 of the section a. Above the level, a floss layer 6 composed of a mixture of bubbles and a liquid is generated above the level, and the upper surface of the floss layer is located above the stationary liquid level. In FIG. 4, 4 indicates a stationary liquid level before the gas is introduced into the gas introduction pipe 1, and 5 indicates
The upper surface (expansion liquid level) of the floss layer formed after introducing gas into the gas introducing pipe 1 is shown. The liquid in the liquid tank is sucked into the compartment a from the lower end opening of the compartment a formed by the partition member 3, rises together with the bubbles in the compartment a, and is discharged from the upper end opening of the compartment a. The gas jetted into the liquid tank becomes fine bubbles and efficiently contacts the liquid while rising in the compartment a. Then, the gas bubbles ejected from the gas ejection holes 2 of the gas introduction pipe 1 are gathered in the compartment a and rise in the compartment a, so that the kinetic energy of the liquid flow generated when the bubbles ascend is in that compartment. It is sealed in a and is prevented from being transmitted to other parts, and as a result, the large fluctuation of the floss layer in the liquid tank is prevented.

【0015】本発明の気液接触装置は、仕切部材の上端
をガス噴出孔2とフロス層上面5との中間部に位置させ
たことにより(図4参照)、その液槽内のフロス層の上
部を水平方向に連絡させることができる。フロス層の上
部をこのようにして水平方向に連絡させることにより、
フロス層の流動をその1つの気泡通過区画内のみなら
ず、他の区画との間において行わせることができるの
で、液槽内に収容させた液体中に含まれる溶解成分の濃
度を全体的に均一化させることができる。また、このよ
うにして、フロス層上部を水平方向に連絡させても、ガ
ス噴出孔付近には仕切部材による仕切壁が存在し、ガス
噴出孔からガスが噴出する際に起る液体の急激な流動エ
ネルギーの他の部分への伝達が防止されることから、液
槽内におけるフロス層の大きな動揺の発生は防止され
る。
In the gas-liquid contactor of the present invention, the upper end of the partition member is located at the intermediate portion between the gas ejection hole 2 and the upper surface 5 of the floss layer (see FIG. 4), so that the floss layer in the liquid tank is formed. The upper part can be connected horizontally. By connecting the upper part of the floss layer horizontally in this way,
Since the flow of the floss layer can be performed not only in the one bubble passage section but also between the other sections, the concentration of the dissolved components contained in the liquid contained in the liquid tank is totally It can be made uniform. Further, even when the upper portion of the floss layer is connected in the horizontal direction in this manner, a partition wall by a partition member exists near the gas ejection holes, and the liquid generated suddenly when gas is ejected from the gas ejection holes Since the transfer of the flow energy to other parts is prevented, the occurrence of large fluctuations of the floss layer in the liquid tank is prevented.

【0016】[0016]

【実施例】次に本発明を実施例によりさらに詳細に説明
する。
EXAMPLES Next, the present invention will be described in more detail by way of examples.

【0017】実施例1 縦0.65m、横1.5m、高さ3mの槽型液槽内に、
全体で8本のガス導入管を、横方向2列、縦方向4列で
垂設した構造のテスト装置を用いた。この場合、ガス導
入管は、長さ:2000mm、内径:100mmの円筒
管の下端から150mmの位置の周壁面に孔径:20〜
30mmの孔を横一列に穿設した構造のものを用いた。
また、このガス導入管は、そのガス噴出孔が静止水面下
10〜25cmの深さになるように配設した。このテス
ト装置において、その液槽内を図7に示すように、仕切
板により仕切るとともに、これをガス導入管及び液槽壁
に支持させて、液槽内に15個の気泡通過区画を形成し
た。この場合、仕切板の上端を静止水面からの深さで4
cmの位置に、そしてその下端をガス噴出孔のレベルか
らの高さで3cmの位置に配置した。このようなテスト
装置の液槽内に液体として水の高さ:100cmの位置
まで入れ、ガス導入管1本当りのガス流量が200m3
/時の条件で、空気をそのガス導入管のガス噴出口から
噴出させて気液接触を行った。このような気液接触を2
時間継続したところ、液槽内のフロス層には実質的に大
きな動揺は生じず、また、フロス層上面の大きな変動も
実質上生じなかった。
Example 1 In a tank type liquid tank having a length of 0.65 m, a width of 1.5 m and a height of 3 m,
A test device having a structure in which a total of eight gas introduction pipes were vertically arranged in two rows in the horizontal direction and four rows in the vertical direction was used. In this case, the gas introduction pipe has a length of 2000 mm and an inner diameter of 100 mm.
A structure having 30 mm holes formed in a horizontal row was used.
Further, the gas introduction pipe was arranged so that the gas ejection holes had a depth of 10 to 25 cm below the stationary water surface. In this test apparatus, the inside of the liquid tank was partitioned by a partition plate as shown in FIG. 7, and this was supported by the gas introducing pipe and the wall of the liquid tank to form 15 bubble passage sections in the liquid tank. . In this case, the top of the partition plate is 4
It was placed at a position of cm, and its lower end was placed at a position of 3 cm in height from the level of the gas ejection hole. The height of water as a liquid was put into the liquid tank of such a test device up to a position of 100 cm, and the gas flow rate per gas introduction pipe was 200 m 3
Air was ejected from the gas ejection port of the gas introduction pipe under the condition of / hour to perform gas-liquid contact. 2 such gas-liquid contact
After continuing for a period of time, substantially no fluctuating motion occurred in the floss layer in the liquid tank, and no substantial fluctuation of the upper surface of the floss layer occurred.

【0018】一方、前記テスト装置において、仕切板を
配設しないで同様の実験を行ったところ、この場合に
は、液槽内のフロス層の大きな動揺が起り、フロス層上
面の変動を生じた。このフロス層上面の変動は、静止水
面に対し、フロス層上面の最も高い位置で+約40c
m、フロス層上面の最も低い位置で−約40cmであっ
た。
On the other hand, when the same experiment was conducted in the test apparatus without disposing the partition plate, in this case, a large fluctuation of the floss layer in the liquid tank occurred and the upper surface of the floss layer fluctuated. . The fluctuation of the upper surface of the floss layer is + 40c at the highest position on the upper surface of the floss layer with respect to the stationary water surface.
m, the lowermost position on the upper surface of the floss layer was about -40 cm.

【0019】[0019]

【発明の効果】本発明によれば、液槽内を複数の気泡通
過区画に構成したことから、ガス導入管のガス噴出孔か
ら液体中にガスを噴出させる際に起る液体の急激な流動
エネルギーは、一次的にその区画内に封止され、その液
体の流動エネルギーが他の区画に伝達されることが非常
に少なくなり、その結果、液槽内での大きなフロス層の
動揺の発生が防止される。従来の気液接触装置において
は、条件によっては各ガス導入管のガス噴出孔から液体
中にガスを噴出させる際に起る液体の各流動エネルギー
は、仕切部材が存在しないことから、相互に干渉しあっ
て、全体として定常的で周期的な大きなフロス層の動揺
を生じさせ、フロス層上面を変動させて気液接触効率の
悪化を生じさせる等の問題を生じるが、本発明の場合に
は、前記したように、液槽内を複数の気泡通過区画に構
成したことから、ガス噴出孔からのガスの噴出によって
起る急激な液体の流動エネルギーは、この区画内に封止
され、他の気泡通過区画への伝達が防止されているた
め、従来の気液接触装置に見られた如き前記問題は一挙
に解決される。その上、気泡通過区画においては、噴出
ガスによるリフト効果が得られるため、その区画内には
ガス導入管の下方に存在する新鮮な液体が上方にすい込
まれ、区画内で気泡と混合されるという利点がある。本
発明の気液接触装置は、各種の気液接触を伴う反応装置
として利用され、例えば、亜硫酸ガスを含む排ガスと炭
酸カルシウムや水酸化カルシウム等のカルシウム化合物
のスラリー液等のアルカリ性液体との接触を行う排煙脱
硫装置や、炭酸ガスを含む排ガスとアルカリ性液体との
接触を行う脱炭酸ガス装置等として好ましく適用され
る。特に、本発明の装置は、液槽の直径が10m以上、
特に20m以上という大型の排煙脱硫装置として有利に
用いることができる。
According to the present invention, since the inside of the liquid tank is configured to have a plurality of bubble passage sections, the rapid flow of the liquid that occurs when the gas is ejected from the gas ejection holes of the gas introduction pipe into the liquid. Energy is primarily sealed within that compartment, and the flow energy of the liquid is much less transferred to other compartments, resulting in the occurrence of large froth layer wobble in the bath. To be prevented. In the conventional gas-liquid contact device, the flow energies of the liquid generated when the gas is ejected from the gas ejection holes of the gas introduction pipes into the liquid depending on the conditions do not interfere with each other because the partition member does not exist. Therefore, as a whole, a steady and periodic large fluctuation of the floss layer is generated, which causes a problem that the upper surface of the floss layer is fluctuated and the gas-liquid contact efficiency is deteriorated.However, in the case of the present invention, As described above, since the inside of the liquid tank is configured to have a plurality of bubble passage sections, the rapid flow energy of the liquid caused by the gas jet from the gas jet holes is sealed in this section, and Since the transfer to the air bubble passage section is prevented, the above problems as found in the conventional gas-liquid contact device are solved all at once. Moreover, in the bubble passage section, since the lift effect due to the jetted gas is obtained, the fresh liquid existing below the gas introduction pipe is swept upward in the section and mixed with the bubbles in the section. There is an advantage. The gas-liquid contactor of the present invention is used as a reaction apparatus involving various gas-liquid contacts, for example, contact between an exhaust gas containing sulfurous acid gas and an alkaline liquid such as a slurry liquid of a calcium compound such as calcium carbonate or calcium hydroxide. It is preferably applied as a flue gas desulfurization device for performing the above, a carbon dioxide gas device for contacting an exhaust gas containing carbon dioxide with an alkaline liquid, and the like. Particularly, the device of the present invention has a liquid tank having a diameter of 10 m or more,
In particular, it can be advantageously used as a large flue gas desulfurization device having a length of 20 m or more.

【図面の簡単な説明】[Brief description of drawings]

【図1】仕切部材により形成される気泡通過区画の1例
についての説明図を示す。 a:斜視図 b:水平断面図
FIG. 1 is an explanatory view of an example of a bubble passage section formed by a partition member. a: perspective view b: horizontal sectional view

【図2】仕切部材により形成される気泡通過区画の他の
例についての説明図を示す。 a:斜視図 b:水平断面図
FIG. 2 is an explanatory view of another example of a bubble passage section formed by a partition member. a: perspective view b: horizontal sectional view

【図3】仕切部材により形成される気泡通過区画のさら
に他の例についての水平断面図を示す。
FIG. 3 is a horizontal sectional view of still another example of the bubble passage section formed by the partition member.

【図4】仕切部材を用いて形成した気泡通過区画内を気
泡が通過する際の状態説明図を示す。 a:水平断面図 b:図4(a)のB−B断面図
FIG. 4 is an explanatory view of a state when bubbles pass through a bubble passage section formed by using a partition member. a: Horizontal sectional view b: BB sectional view of FIG.

【図5】複数の独立したガス導入管を存在させた気泡通
過区画を多数含む液槽内部の説明平面図を示す。
FIG. 5 is an explanatory plan view of the inside of a liquid tank including a large number of bubble passage sections in which a plurality of independent gas introduction pipes are present.

【図6】従来の装置に配設されているガス導入管を支持
固定化するための支持体の斜視図を示す。
FIG. 6 shows a perspective view of a support body for supporting and fixing a gas introduction pipe arranged in a conventional device.

【図7】実施例で用いた液槽内部の説明平面図を示す。FIG. 7 shows an explanatory plan view of the inside of the liquid tank used in the examples.

【図8】排煙脱硫装置として用いられている従来の気液
接触装置の模式図を示す。
FIG. 8 shows a schematic diagram of a conventional gas-liquid contactor used as a flue gas desulfurizer.

【図9】ガス導入管の1例についての構造説明図を示
す。
FIG. 9 is a structural explanatory view of an example of a gas introduction pipe.

【図10】ガス導入管の他の例についての構造説明図を
示す。
FIG. 10 is a structural explanatory view of another example of the gas introduction pipe.

【符号の説明】[Explanation of symbols]

1、1’、103 ガス導入管 2、104 ガス噴出孔 3 仕切部材 4 静止液面 5 フロス層の上面 6 フロス層 101 ガス導管 102 液槽 105 攪拌羽根 106 空気導入管 108 石こうスラリー抜出管 a 気泡通過区画 1, 1 ', 103 Gas introduction pipe 2, 104 Gas ejection hole 3 Partition member 4 Still liquid surface 5 Upper surface of floss layer 6 Floss layer 101 Gas conduit 102 Liquid tank 105 Stirring blade 106 Air introduction pipe 108 Gypsum slurry extraction pipe a Bubble passage section

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 B01D 53/77 B01J 10/00 104 8822−4G B01D 53/34 125 E (72)発明者 小林 健二 神奈川県横浜市鶴見区鶴見中央二丁目12番 1号 千代田化工建設株式会社内 (72)発明者 桑原 育朗 神奈川県横浜市鶴見区鶴見中央二丁目12番 1号 千代田化工建設株式会社内─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification code Internal reference number FI Technical display location B01D 53/77 B01J 10/00 104 8822-4G B01D 53/34 125 E (72) Inventor Kenji Kobayashi 2-12-1, Tsurumi Chuo, Tsurumi-ku, Yokohama-shi, Kanagawa Chiyoda Kakoh Construction Co., Ltd. (72) Inventor, Ikuro Kuwahara 2--12-1, Tsurumi Chuo, Tsurumi-ku, Yokohama-shi, Kanagawa Chiyoda Kakoh Construction Co., Ltd.

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 大型液槽内に下部周壁面にガス噴出孔を
有するガス導入管の多数をそのガス噴出孔が液槽内静止
液面より下方に位置するように垂設した構造を有する気
液接触装置において、複数の仕切部材をその下端がガス
導入管のガス噴出孔と同一レベル又はその近傍もしくは
下方に位置し、その上端がガス噴出孔とフロス層上面と
の中間部に位置するように液槽内に垂設するとともに、
それら仕切部材を複数のガス導入管に支持させ、その液
槽内にそれら仕切部材により包囲された気泡通過区画を
複数形成させたことを特徴とする多管式気液接触装置。
1. A gas having a structure in which a large number of gas introduction pipes each having a gas ejection hole on a lower peripheral wall surface in a large liquid tank are vertically installed so that the gas ejection hole is located below a stationary liquid surface in the liquid tank. In the liquid contact device, the plurality of partition members are arranged such that the lower ends thereof are located at the same level as or near or below the gas ejection holes of the gas introduction pipe, and the upper ends thereof are located in the intermediate portion between the gas ejection holes and the upper surface of the floss layer. In the liquid tank,
A multi-tube gas-liquid contactor characterized in that the partition members are supported by a plurality of gas introduction pipes, and a plurality of bubble passage sections surrounded by the partition members are formed in the liquid tank.
【請求項2】 隣接するガス導入管の間に仕切部材を垂
設し、ガス導入管に支持させてなる請求項1の気液接触
装置。
2. The gas-liquid contact device according to claim 1, wherein a partition member is vertically provided between adjacent gas introduction pipes and supported by the gas introduction pipes.
【請求項3】 仕切部材により包囲された気泡通過区画
内に少なくとも1個の独立したガス導入管が存在する請
求項1又は2の気液接触装置。
3. The gas-liquid contactor according to claim 1, wherein at least one independent gas introduction pipe is present in the bubble passage section surrounded by the partition member.
【請求項4】 酸性ガスを含むガスとアルカリ性液体と
の接触反応を行うための請求項1〜3のいずれかの気液
接触装置。
4. The gas-liquid contactor according to claim 1, which is for carrying out a catalytic reaction between a gas containing an acidic gas and an alkaline liquid.
JP5351224A 1993-12-30 1993-12-30 Multitubular gas-liquid contact apparatus Pending JPH07194928A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5351224A JPH07194928A (en) 1993-12-30 1993-12-30 Multitubular gas-liquid contact apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5351224A JPH07194928A (en) 1993-12-30 1993-12-30 Multitubular gas-liquid contact apparatus

Publications (1)

Publication Number Publication Date
JPH07194928A true JPH07194928A (en) 1995-08-01

Family

ID=18415890

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5351224A Pending JPH07194928A (en) 1993-12-30 1993-12-30 Multitubular gas-liquid contact apparatus

Country Status (1)

Country Link
JP (1) JPH07194928A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008094800A (en) * 2006-10-16 2008-04-24 Kao Corp Method for producing tertiary amine

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008094800A (en) * 2006-10-16 2008-04-24 Kao Corp Method for producing tertiary amine

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