JP2796546B2 - Multi-tube gas-liquid contact device - Google Patents

Multi-tube gas-liquid contact device

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Publication number
JP2796546B2
JP2796546B2 JP5346515A JP34651593A JP2796546B2 JP 2796546 B2 JP2796546 B2 JP 2796546B2 JP 5346515 A JP5346515 A JP 5346515A JP 34651593 A JP34651593 A JP 34651593A JP 2796546 B2 JP2796546 B2 JP 2796546B2
Authority
JP
Japan
Prior art keywords
gas
liquid
liquid tank
partition member
contact device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP5346515A
Other languages
Japanese (ja)
Other versions
JPH07178310A (en
Inventor
健二 小林
育朗 桑原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHODA KAKO KENSETSU KK
Original Assignee
CHODA KAKO KENSETSU KK
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Filing date
Publication date
Application filed by CHODA KAKO KENSETSU KK filed Critical CHODA KAKO KENSETSU KK
Priority to JP5346515A priority Critical patent/JP2796546B2/en
Publication of JPH07178310A publication Critical patent/JPH07178310A/en
Application granted granted Critical
Publication of JP2796546B2 publication Critical patent/JP2796546B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Gas Separation By Absorption (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、気体と液体(スラリー
液を含む)とを接触させる多管式気液接触装置、特に排
煙脱硫装置として好適な多管式気液接触装置に関するも
のである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a multi-tube gas-liquid contact device for bringing a gas into contact with a liquid (including a slurry liquid), and more particularly to a multi-tube gas-liquid contact device suitable as a flue gas desulfurization device. is there.

【0002】[0002]

【従来の技術】大型液槽内に液体を収容させ、その液体
内に下部周壁面にガス噴出孔を有するガス導入管の多数
を垂設し、そのガス導入管内に導入させたガスをガス噴
出孔から液体中に噴出させて気液接触を行わせる装置は
広く知られている(特公昭55−37295号、特公昭
57−6375号、特公昭59−11322号等)。
2. Description of the Related Art A liquid is accommodated in a large liquid tank, and a large number of gas introduction pipes having gas ejection holes on the lower peripheral wall are vertically suspended in the liquid, and the gas introduced into the gas introduction pipe is ejected with gas. Apparatuses for causing gas-liquid contact by ejecting the liquid from a hole into a liquid are widely known (JP-B-55-37295, JP-B-57-6375, JP-B-59-11322, etc.).

【0003】図3に、排煙脱硫装置として用いられてい
る気液接触装置の模式図を示す。図3において、SO2
を含む排煙は、導管101からガス導入管103を通
り、そのガス導入管103の下部周壁面に設けたガス噴
出口から炭酸カルシウムや水酸化カルシウム等のカルシ
ウム化合物のスラリー液中に噴出される。この場合のガ
ス導入管103は、図4に示すように、その下部周壁面
に配設されたガス噴出孔104を有する。液槽内のカル
シウム化合物スラリー液中に噴出された排煙は、そのス
ラリー液と接触し、排煙中に含まれるSO2がカルシウ
ム化合物と反応してCaSO3になる。そして、このC
aSO3は、液槽下部の空気導入管106から液中に導
入された空気中酸素と反応してCaSO4(石こう)に
なる。なお、112はガス中の液体を捕捉する気液分離
器を示し、105は攪拌羽根を示し、108は石こうス
ラリー抜出管を示す。図3に示した排煙脱硫装置は、実
際には極めて大型の装置であり、その液槽102の内径
は10m以上、通常25m以上もあり、また、そのガス
導入管103の数も1,000本以上という極めて多い
数である。
FIG. 3 is a schematic view of a gas-liquid contact device used as a flue gas desulfurization device. In FIG. 3, SO 2
Is passed through the gas introduction pipe 103 from the conduit 101 and is ejected from a gas ejection port provided on the lower peripheral wall surface of the gas introduction pipe 103 into a slurry of a calcium compound such as calcium carbonate or calcium hydroxide. . As shown in FIG. 4, the gas introduction pipe 103 in this case has a gas ejection hole 104 provided on the lower peripheral wall surface. The smoke exhausted into the calcium compound slurry in the liquid tank comes into contact with the slurry, and SO 2 contained in the smoke reacts with the calcium compound to become CaSO 3 . And this C
The aSO 3 reacts with oxygen in the air introduced into the liquid from the air introduction pipe 106 at the lower part of the liquid tank to become CaSO 4 (gypsum). Reference numeral 112 denotes a gas-liquid separator for capturing the liquid in the gas, 105 denotes a stirring blade, and 108 denotes a gypsum slurry extraction pipe. The flue gas desulfurization device shown in FIG. 3 is actually a very large device, and the inner diameter of the liquid tank 102 is 10 m or more, usually 25 m or more, and the number of gas introduction pipes 103 is 1,000. This is an extremely large number of books.

【0004】このような気液接触装置においては、ガス
導入管のガス噴出孔からガスを液中に噴出させることか
ら、このことが原因となって、液槽内のフロス層(泡沫
層)に全体として定常的で周期的な大きな動揺が生じる
場合がある。そして、そのフロス層の動揺により、液槽
内のフロス層上面が大きく変動するようになる。このフ
ロス層の定常的動揺は、液槽が大型のものになるに従っ
て大きなものとなり、気液接触効率悪化の原因となった
り、場合によっては、液槽壁や液槽内に設置したガス導
入管等の設備に大きな外力を与え、それらの設備の故障
の原因となることが考えられる。
[0004] In such a gas-liquid contact device, gas is ejected into the liquid from the gas ejection hole of the gas introduction pipe, and this causes a floss layer (foam layer) in the liquid tank. As a whole, a steady and periodic large fluctuation may occur. Then, due to the fluctuation of the floss layer, the upper surface of the floss layer in the liquid tank fluctuates greatly. This steady fluctuation of the floss layer becomes larger as the liquid tank becomes larger, which may cause a decrease in gas-liquid contact efficiency, and in some cases, a gas introduction pipe installed in the liquid tank wall or in the liquid tank. It is conceivable that a large external force is applied to the equipment such as the above, causing a failure of the equipment.

【0005】[0005]

【発明が解決しようとする課題】本発明は、下部周壁面
にガス噴出孔を有するガス導入管を多数液体中に垂設し
た構造の多管式気液接触装置において、そのガス噴出孔
から液体中へのガス噴出に起因する液槽内フロス層の大
きな動揺の発生を未然に防止し、液槽壁やガス導入管等
の設備に大きな外力を与えることの少ない装置を提供す
ることをその課題とする。
SUMMARY OF THE INVENTION The present invention relates to a multi-tube gas-liquid contact device having a structure in which a number of gas introduction pipes having gas ejection holes on the lower peripheral wall are suspended in a liquid. It is an object of the present invention to provide a device that prevents large fluctuations of a floss layer in a liquid tank due to gas injection into the liquid tank, and that does not apply a large external force to equipment such as a liquid tank wall and a gas introduction pipe. And

【0006】[0006]

【課題を解決するための手段】本発明者らは、前記課題
を解決すべく鋭意研究を重ねた結果、本発明を完成する
に至った。即ち、本発明によれば、大型液槽内に下部周
壁面にガス噴出孔を有するガス導入管の多数をそのガス
噴出孔が液槽内静止液面より下方に位置するように垂設
した構造を有する気液接触装置において、その液槽内に
1本又は複数本のガス導入管を包囲するように仕切部材
を配設し、気泡通過区画を複数形成させたことを特徴と
する多管式気液接触装置が提供される。また、本発明に
よれば、大型液槽内に下部周壁面にガス噴出孔を有する
ガス導入管の多数をそのガス噴出孔が液槽内静止液面よ
り下方に位置するように垂設した構造を有する気液接触
装置において、仕切部材をその下端がガス導入管のガス
噴出孔より下方に位置するように液槽内に垂設して、そ
の液槽内に1本又は複数本のガス導入管を包囲する気泡
通過区画を複数形成させたことを特徴とする多管式気液
接触装置が提供される。
Means for Solving the Problems The present inventors have conducted intensive studies to solve the above-mentioned problems, and as a result, have completed the present invention. That is, according to the present invention, a structure in which a large number of gas introduction pipes having gas ejection holes in the lower peripheral wall surface are provided vertically in a large liquid tank such that the gas ejection holes are located below the stationary liquid level in the liquid tank. In the gas-liquid contact device having a multi-tube type, a partition member is disposed in the liquid tank so as to surround one or more gas introduction pipes, and a plurality of bubble passage sections are formed. A gas-liquid contact device is provided. Further, according to the present invention, a large number of gas introduction pipes having gas ejection holes in the lower peripheral wall surface in a large-sized liquid tank are vertically provided such that the gas ejection holes are located below the stationary liquid level in the liquid tank. In the gas-liquid contacting device having the above, the partition member is vertically suspended in the liquid tank such that the lower end thereof is located below the gas ejection hole of the gas introduction pipe, and one or a plurality of gas introductions into the liquid tank. A multi-tube gas-liquid contact device is provided, wherein a plurality of bubble passage sections surrounding a tube are formed.

【0007】本発明者らは、多管式気液接触装置におけ
る前述のように定常的フロス層の動揺がガス噴出に起因
することを突きとめ、かかるガス噴出エネルギーを分散
又は吸収せしめることによって液槽内フロス層面の大き
な動揺の発生を未然に防止できることを発見したもので
ある。すなわち、1本又は複数のガス導入管を包囲する
ように仕切部材を液槽内に設置するときには、該仕切部
材によってガス噴出による造波エネルギーの集積重畳が
きわめて効果的に抑制されることを見出し本発明を完成
したものである。
The present inventors have found that the steady fluctuation of the floss layer in the multi-tube type gas-liquid contact device is caused by gas ejection as described above, and by dispersing or absorbing such gas ejection energy, It has been discovered that large fluctuation of the floss layer surface in the tank can be prevented. That is, when the partition member is installed in the liquid tank so as to surround one or a plurality of gas introduction pipes, it has been found that the partition member suppresses the accumulation and superposition of wave-making energy due to gas ejection extremely effectively. The present invention has been completed.

【0008】本発明で用いる仕切部材は、液体中に垂設
した多数のガス導入管を、1本毎又は複数本毎に設置し
実質的に槽内液を仕切ることができる形状であればよ
い。また、その仕切形態は、三角形、正方形、矩形、多
角形、円形、多重円形、楕円形、車軸形、放射形あるい
はこれらの組合せ等が用いられる。仕切部材の形状はガ
ス導入管から吹込まれたガス噴出エネルギーを吸収分散
し、あるいは、および液槽液面付近の造波エネルギーを
吸収分散できるものであれば任意のものを用いることが
できる。したがって仕切部材の形状としては通常の平板
又は円筒の他に、波板、格子板、多孔板およびこれらの
円筒状のもの、並びにこれらの表面に凹凸等の消波構造
を取付けたもの、あるいはそれらの組合せからなる形状
のもの等を用いることができる。仕切部材の材質は、金
属の他、プラスチックやセラミック並びにこれらの複合
材、組合せ材等および金属あるいは合成高分子等からな
る編物又は布並びにこれらの組合せ等であることができ
る。仕切部材は通常、液槽内液通に垂直に設置される
が、仕切部材の形状等によって液面に水平に固定または
浮遊させて設置することもできる。この場合、ガス導入
管の支持のために通常配設される格子状支持体を兼ねさ
せることもできる。また液槽内において仕切部材をフロ
ス層面上に露出させることによって、フロス層面動揺が
他の仕切区画に拡散することを防止することもできる
が、フロス層面下に設置してもよい。即ち、仕切部材の
上端がフロス層中に設置してあっても、その下端部にガ
ズ導入管から噴出されるガス仕切部に衝突すればガス噴
出エネルギーが分散されるために、造波エネルギーの集
積重畳が抑制される。したがって仕切部材の前記下端部
付近をガス吹込管のガス噴出孔より下方に位置するのが
好ましいが、仕切部材の仕切形態、仕切られるガス吹込
管数、仕切部材の形状あるいは気液接触装置の運転条件
等により該ガス噴出孔よりも上部に位置してもよい。
[0008] The partition member used in the present invention may have any shape as long as a large number of gas introduction pipes vertically provided in the liquid are provided for each or a plurality of pipes, and the liquid in the tank can be substantially partitioned. . Further, as the partition form, a triangle, a square, a rectangle, a polygon, a circle, a multiple circle, an ellipse, an axle, a radial, a combination thereof, or the like is used. Any shape can be used as the shape of the partition member as long as it can absorb and disperse the gas ejection energy blown from the gas introduction pipe or absorb and disperse the wave forming energy near the liquid surface of the liquid tank. Therefore, as a shape of the partition member, in addition to a normal flat plate or a cylinder, a corrugated plate, a lattice plate, a perforated plate and a cylindrical member thereof, and a member having a wave-absorbing structure such as unevenness attached to the surface thereof, or And the like having a shape composed of combinations of the above. In addition to metal, the material of the partition member may be plastic or ceramic, a composite material thereof, a combination material thereof, a knitted or cloth made of metal or synthetic polymer, or a combination thereof. Usually, the partition member is installed vertically to the liquid passage in the liquid tank, but it can also be fixed or floated horizontally on the liquid surface depending on the shape of the partition member. In this case, a lattice-shaped support usually provided for supporting the gas introduction pipe can also be used. By exposing the partition member on the floss layer surface in the liquid tank, it is possible to prevent the fluctuation of the floss layer surface from diffusing to other partition sections, but it may be installed below the floss layer surface. That is, even if the upper end of the partition member is set in the floss layer, the gas ejection energy is dispersed if the lower end collides with the gas partition portion ejected from the gas introduction pipe, so that the wave forming energy is reduced. Accumulation and superposition are suppressed. Therefore, it is preferable that the vicinity of the lower end of the partition member is located below the gas ejection hole of the gas injection pipe. It may be located above the gas ejection hole depending on conditions and the like.

【0009】図1に、仕切部材を用いて多数のガス導入
管を1本毎仕切って形成した本発明の1つの実施例の気
泡通過区画の説明図を示す。図1において、1はガス導
入管、2はその下部周壁面に形成されたガス噴出孔、3
は仕切部材、4は液槽内の静止液面、5は液槽内に形成
されたフロス層の上面(膨張液面)、6は気泡と液体と
の混合物からなるフロス層を示す。aは仕切部材3によ
って形成された気泡通過区画で、その内部にガス導入管
1を含む。
FIG. 1 is an explanatory view of a bubble passage section according to one embodiment of the present invention in which a large number of gas introduction pipes are formed one by one using a partition member. In FIG. 1, reference numeral 1 denotes a gas introduction pipe, 2 denotes a gas ejection hole formed in a lower peripheral wall thereof,
Denotes a partition member, 4 denotes a stationary liquid level in the liquid tank, 5 denotes an upper surface (expanded liquid level) of the floss layer formed in the liquid tank, and 6 denotes a floss layer made of a mixture of bubbles and liquid. a is a bubble passage section formed by the partition member 3 and includes the gas introduction pipe 1 therein.

【0010】図1には仕切部材を用いて多数のガス導入
管を1本毎に仕切って形成した気泡通過区画の説明図を
示したが、ガス導入管を1本毎に仕切る必要はなく、複
数本毎に仕切ることができる。この種の気液接触装置は
大型のもので、液槽内に配設されるガス導入管は数千本
と極めて多数である。仕切部材によって区画されるガズ
導入管数は、仕切部材の前記仕切形態、形状、設置方式
あるいは気液接触装置の運転条件等によって決められ
る。また仕切部材によって区画されるガス導入管数が少
ないほど、一般的にガス噴出による造波エネルギーが集
積重畳しにくくなるが、設置コストが多くなる他にも反
応原料(石灰石など)や生成物(石こうなど)が液槽内
に均一に拡散しにくくなる傾向がある。このため本発明
では、これらのガス導入管は、複数本、例えば、2〜2
0本、好ましくは4〜40本毎に仕切るのがよい。しか
し前述のような理由から数10本ないし数100本ごと
に仕切ることによって、より好ましい気液接触反応を行
なうことができる場合もある。また、仕切部材によって
仕切られるガス導入管数は液槽内全体において必ずしも
一定とする必要はない。
FIG. 1 is an explanatory view of a bubble passage section formed by partitioning a large number of gas introduction pipes one by one using a partition member. However, it is not necessary to partition the gas introduction pipes one by one. It can be divided into multiple pieces. This type of gas-liquid contact device is large, and the number of gas introduction pipes provided in the liquid tank is as large as several thousand. The number of gas introduction pipes divided by the partition member is determined by the partition form, shape, installation method, operating conditions of the gas-liquid contact device, and the like of the partition member. In general, the smaller the number of gas introduction pipes divided by the partition member, the more difficult it is for the wave-making energy to be accumulated and superimposed by gas ejection. Gypsum) tends to be difficult to uniformly diffuse in the liquid tank. For this reason, in the present invention, a plurality of these gas introduction pipes, for example, 2 to 2
It is good to partition every 0, preferably every 4-40. However, in some cases, more preferable gas-liquid contact reaction can be performed by partitioning every tens to hundreds of tubes for the reasons described above. Further, the number of gas introduction pipes divided by the partition member does not necessarily have to be constant throughout the liquid tank.

【0011】図2に、多数のガス導入管を複数本毎に仕
切って形成した多数の気泡通過区画を含む液槽内部の説
明平面図を示す。この図において、10は液槽壁を示
す。図2の液槽は、板体を液槽内に縦横に配設して、液
槽内に断面4角形の筒体状の仕切部材3を仕切壁とす
る、多数の気泡通過区画aを形成した構造のものであ
る。これらの各区画aには、複数のガス導入管(図示さ
れず)が配設されている。また、各区画aにおける縦の
寸法:n及び横の寸法:mは、その区画aの水平断面積
が10m2以下、好ましくは1〜4m2になるように規定
するのがよい。しかし、これらの水平断面積は必ずしも
一定とすることは必要なく、また前述のごとく仕切形
態、仕切部材の形状、設置方式あるいは気液接触装置の
運転条件等によって数10m2〜100m2になるように
規定する場合もある。本発明により液槽内に配設する仕
切部材3は、任意の方法で液槽内に支持させることがで
きる。例えば、その液槽内液面上方又は液面下に支持体
を配設し、これに支持させることができる他、ガス導入
管を支持させるために格子状に配設された支持体に支持
させることができる。
FIG. 2 is an explanatory plan view showing the inside of a liquid tank including a large number of gas passage sections formed by dividing a large number of gas introduction pipes into a plurality of pipes. In this figure, reference numeral 10 denotes a liquid tank wall. In the liquid tank of FIG. 2, a large number of bubble passage sections a are formed in which a plate is disposed vertically and horizontally in the liquid tank, and a cylindrical partition member 3 having a rectangular cross section is used as a partition wall in the liquid tank. It is of the structure that was done. In each of these sections a, a plurality of gas introduction pipes (not shown) are provided. The vertical dimension of each compartment a: n and horizontal dimensions: m, the horizontal cross-sectional area of the partition a is 10 m 2 or less, and it is preferably defined to be 1 to 4 m 2. However, these horizontal cross-sectional area without necessarily be a constant and the partition forms as described above, the shape of the partition member, so that several 10m 2 ~100m 2 by operating conditions such as the installation method or gas-liquid contact device May be specified. The partition member 3 provided in the liquid tank according to the present invention can be supported in the liquid tank by an arbitrary method. For example, a support may be provided above or below the liquid level in the liquid tank and supported by the support, or may be supported by a support arranged in a grid to support the gas introduction pipe. be able to.

【0012】本発明の気液接触装置において、仕切部材
の上端をフロス層上面(膨張液面)5より下方に位置さ
せた場合には(図1参照)、その液槽内に収容させたフ
ロス層の上部を水平方向に連絡させることができる。フ
ロス層上部をこのようにして水平方向に連絡させること
により、フロス層の流動をその1つの区画内のみなら
ず、他の区画との間において流動させることができるの
で、液槽内に収容させた液体中に含まれる溶解成分の濃
度を全体的に均一化させることができる。この場合、仕
切部材の上端は、ガス噴出孔2のレベルからの高さが、
ガス噴出孔2と静止液面4との間の距離に対して、70
〜130%になるように位置させるのがよい。一般的に
は、その上端は、静止液面4のレベルからの高さで、−
5〜+10cmである。また、このようにして、上部フ
ロス層を水平方向に連絡させても、ガス噴出孔付近には
仕切部材による仕切壁が存在し、ガス噴出孔からガスが
噴出する際に液体の与える流動エネルギーの他の部分へ
の伝達が防止されることから、液槽内におけるフロス層
の波及び動揺の沈静化が図られる。
In the gas-liquid contact device of the present invention, when the upper end of the partition member is located below the upper surface (expanded liquid level) 5 of the floss layer (see FIG. 1), the floss contained in the liquid tank The top of the layer can be connected horizontally. By connecting the upper portion of the floss layer in the horizontal direction in this way, the flow of the floss layer can be caused to flow not only in one of the compartments but also with the other compartments. The concentration of the dissolved component contained in the liquid thus obtained can be made uniform throughout. In this case, the upper end of the partition member has a height from the level of the gas ejection holes 2.
For the distance between the gas outlet 2 and the stationary liquid level 4, 70
It is good to position so that it may be ~ 130%. Generally, the upper end is the height from the level of the stationary liquid level 4,
5 to +10 cm. Further, even when the upper floss layer is connected in the horizontal direction in this way, a partition wall by the partition member exists near the gas ejection hole, and the flow energy of the liquid given by the liquid when the gas is ejected from the gas ejection hole. Since the transmission to other parts is prevented, the waves and fluctuations of the floss layer in the liquid tank are suppressed.

【0013】[0013]

【発明の効果】本発明によれば、液槽内を複数の気泡通
過区画に構成したことから、ガス導入管のガス噴出孔か
ら液体中にガスを噴出させる際に起る液体の造波エネル
ギーの伝幡は、一次的にその区画内に封止され、その液
体の造波エネルギーが他の区画に伝達されることが非常
に少なくなり、その結果、液槽内でのフロス層の波及び
フロス層の動揺の発生が防止される。従来の気液接触装
置においては、各ガス導入管のガス噴出孔から液体中に
ガスを噴出させる際に起る液体の各流動は、仕切部材が
存在しないことから、相互に干渉しフロス層の動揺を生
じやすい。このため、時として液体の流動が重畳し合っ
て全体として定常的で周期的な大きなフロス層の波動揺
となり、液面を変動させて気液接触効率の悪化を生じさ
せることもある。場合によっては液槽内設備の故障の原
因となることも考えられるが、本発明の場合には、前記
したように、液槽内を複数の気泡通過区画に構成したこ
とから、ガス噴出により起る気液の接線方向の流動は、
この区画内に封止され、他の区画への伝達が防止されて
いるため、従来の気液接触装置に見られた如き前記問題
は一挙に解決される。その上、気泡通過区画において
は、噴出ガスによるリフト効果が得られるため、気泡通
過区画内にはガス導入管の下方に存在する新鮮な液体が
上方にすい込まれ、区画内において気泡と混合されると
いう利点がある。
According to the present invention, since the inside of the liquid tank is constituted by a plurality of bubble passage sections, the wave-making energy of the liquid generated when the gas is jetted into the liquid from the gas jet holes of the gas inlet tube. Is primarily sealed in that compartment, and the wave-making energy of the liquid is very unlikely to be transmitted to other compartments, resulting in floss layer waves and Oscillation of the floss layer is prevented. In the conventional gas-liquid contact device, the respective flows of the liquid generated when the gas is jetted into the liquid from the gas ejection holes of the respective gas introduction pipes interfere with each other due to the absence of the partition member, thereby causing the flow of the floss layer. It is easy to get upset. For this reason, the flows of the liquids sometimes overlap with each other, resulting in a steady and periodic large fluctuation of the floss layer as a whole, and the liquid level may fluctuate, thereby deteriorating the gas-liquid contact efficiency. In some cases, this may cause a failure of the equipment in the liquid tank, but in the case of the present invention, as described above, since the liquid tank is configured with a plurality of bubble passage sections, it is caused by gas ejection. The tangential flow of gas-liquid
Since the cell is sealed in the compartment and prevented from being transmitted to other compartments, the above-mentioned problem as seen in the conventional gas-liquid contact device can be solved at once. In addition, in the bubble passage section, since a lift effect by the ejected gas is obtained, fresh liquid existing below the gas introduction pipe is sunk upward in the bubble passage section and mixed with bubbles in the section. The advantage is that

【0014】本発明の気液接触装置は、各種の気液接触
を伴う反応装置として利用され、例えば、亜硫酸ガスを
含む排ガスと炭酸カルシウムスラリー液等のアルカリ性
液体との接触を行う排煙脱硫装置や、炭酸ガスを含む排
ガスとアルカリ性液体との接触を行う脱炭酸ガス装置等
として好ましく適用される。特に、本発明の装置は、液
槽の直径が10m以上、特に20m以上という大型の排
煙脱硫装置として有利に用いることができる。
The gas-liquid contact device of the present invention is used as a reaction device involving various gas-liquid contacts. For example, a flue gas desulfurization device for contacting an exhaust gas containing a sulfurous acid gas with an alkaline liquid such as a calcium carbonate slurry solution. Also, the present invention is preferably applied as a decarbonation device for contacting an exhaust gas containing carbon dioxide with an alkaline liquid. In particular, the apparatus of the present invention can be advantageously used as a large flue gas desulfurization apparatus having a liquid tank having a diameter of 10 m or more, particularly 20 m or more.

【0015】[0015]

【実施例】次に本発明を実施例によりさらに詳細に説明
する。
Next, the present invention will be described in more detail with reference to examples.

【0016】実施例1 縦1m、横2m、高さ1mの槽型液槽内に、全体で8本
のガス導入管を、横方向2列、縦方向4列で配設した構
造のテスト装置を用いた。この場合、ガス導入管は、長
さ:2000mm、内径:100mmの円筒管の下端か
ら150〜300mmの位置の周壁面に孔径:20〜3
0mmの孔を横一列に穿設した構造のものを用いた。ま
た、このガス導入管は、そのガス噴出孔が静止水面下1
0〜25cmの深さになるように配設した。このテスト
装置において、その液槽内を、仕切板により、2本のガ
ス導入管毎に仕切って液槽内に4個の気泡通過区画を形
成した。この場合、仕切板の上端を静止水面上の位置
に、そしてその下端を静止水面下30〜40cmの深さ
になるように位置させた。このようなテスト装置の液槽
内に液体として水を高さ100cmの位置まで入れ、ガ
ス導入管1本当りのガス流量を30〜200m3/時の
条件で、空気をそのガス導入管のガス噴出口から噴出さ
せて空気−水系の気液接触を行った。このような気液接
触においては、繰返し、継続して実験を行ったところ、
液槽内のフロス層には有意な波動揺は生じず、また、フ
ロス層面の変動も実質上生じなかった。
Example 1 A test apparatus having a structure in which a total of eight gas inlet pipes are arranged in two rows in a horizontal direction and four rows in a vertical direction in a tank type liquid tank having a length of 1 m, a width of 2 m and a height of 1 m. Was used. In this case, the gas introduction pipe has a hole diameter of 20 to 3 on the peripheral wall at a position of 150 to 300 mm from the lower end of the cylindrical pipe having a length of 2000 mm and an inner diameter of 100 mm.
One having a structure in which 0 mm holes were formed in a horizontal row was used. In addition, this gas introduction pipe has a
It was arranged to have a depth of 0 to 25 cm. In this test apparatus, the inside of the liquid tank was partitioned by a partition plate into two gas introduction pipes, and four bubble passage sections were formed in the liquid tank. In this case, the upper end of the partition plate was located at a position on the still water surface, and the lower end thereof was positioned at a depth of 30 to 40 cm below the still water surface. Water is introduced as a liquid into the liquid tank of such a test device up to a height of 100 cm, and air is supplied from the gas inlet tube under the condition of a gas flow rate per gas inlet tube of 30 to 200 m 3 / hour. Air-water contact was made by jetting from the spout. In such gas-liquid contact, repeated and continuous experiments showed that
No significant wave fluctuation occurred in the floss layer in the liquid tank, and substantially no fluctuation of the floss layer surface occurred.

【0017】一方、前記テスト装置において、仕切板を
用いないで同様の実験を行ったところ、この場合には、
フロス層面の変動を生じた。
On the other hand, when a similar experiment was conducted without using a partition plate in the test apparatus, in this case,
The floss layer surface fluctuated.

【図面の簡単な説明】[Brief description of the drawings]

【図1】仕切部材を用いて多数のガス導入管を1本毎に
仕切って形成した気泡通過区画の説明図を示す。
FIG. 1 is an explanatory view of a bubble passage section formed by partitioning a large number of gas introduction pipes one by one using a partition member.

【図2】仕切部材を用いて多数のガス導入管を複数本毎
に仕切って形成した気泡通過区画を含む液槽内部の説明
平面図を示す。
FIG. 2 is an explanatory plan view showing the inside of a liquid tank including a bubble passage section formed by dividing a plurality of gas introduction pipes into a plurality of pipes using a partition member.

【図3】排煙脱硫装置として用いられている従来の気液
接触装置の一例についての模式図を示す。
FIG. 3 is a schematic view showing an example of a conventional gas-liquid contact device used as a flue gas desulfurization device.

【図4】ガス導入管の一例についての構造説明図であ
る。
FIG. 4 is a structural explanatory view of an example of a gas introduction pipe.

【符号の説明】[Explanation of symbols]

1、103 ガス導入管 2、104 ガス噴出孔 3 仕切部材 4 静止液面 5 フロス層上面 6 フロス層 101 ガス導管 102 液槽 105 攪拌羽根 106 空気導入管 a 気泡通過区画 DESCRIPTION OF SYMBOLS 1, 103 Gas introduction pipe 2, 104 Gas ejection hole 3 Partition member 4 Static liquid level 5 Floss layer upper surface 6 Floss layer 101 Gas conduit 102 Liquid tank 105 Stirring blade 106 Air introduction pipe a Bubble passage section

───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.6,DB名) B01D 53/14 - 53/18 B01D 53/34 B01J 10/00 - 12/02 B01D 47/00 - 47/18──────────────────────────────────────────────────の Continued on the front page (58) Field surveyed (Int.Cl. 6 , DB name) B01D 53/14-53/18 B01D 53/34 B01J 10/00-12/02 B01D 47/00-47 / 18

Claims (3)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 大型液槽内に下部周壁面にガス噴出孔を
有するガス導入管の多数をそのガス噴出孔が液槽内静止
液面より下方に位置するように垂設した構造を有する気
液接触装置において、その液槽内に1本又は複数本のガ
ス導入管を包囲するように仕切部材を配設し、気泡通過
区画を複数形成させたことを特徴とする多管式気液接触
装置。
1. A gas having a structure in which a large number of gas introduction pipes having gas ejection holes on the lower peripheral wall surface in a large liquid tank are vertically provided such that the gas ejection holes are located below a stationary liquid level in the liquid tank. In a liquid contact device, a multi-tube gas-liquid contact is characterized in that a partition member is disposed in the liquid tank so as to surround one or more gas introduction pipes, and a plurality of bubble passage sections are formed. apparatus.
【請求項2】 仕切部材をその下端がガス噴出孔より下
方に位置するように液槽内に垂設した請求項1の気液接
触装置。
2. The gas-liquid contact device according to claim 1, wherein the partition member is vertically provided in the liquid tank such that a lower end thereof is located below the gas ejection hole.
【請求項3】 酸性ガスを含むガスとアルカリ性液体と
の接触反応を行うための請求項1の気液接触装置。
3. The gas-liquid contact device according to claim 1, which performs a contact reaction between a gas containing an acid gas and an alkaline liquid.
JP5346515A 1993-12-22 1993-12-22 Multi-tube gas-liquid contact device Expired - Lifetime JP2796546B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5346515A JP2796546B2 (en) 1993-12-22 1993-12-22 Multi-tube gas-liquid contact device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5346515A JP2796546B2 (en) 1993-12-22 1993-12-22 Multi-tube gas-liquid contact device

Publications (2)

Publication Number Publication Date
JPH07178310A JPH07178310A (en) 1995-07-18
JP2796546B2 true JP2796546B2 (en) 1998-09-10

Family

ID=18383949

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5346515A Expired - Lifetime JP2796546B2 (en) 1993-12-22 1993-12-22 Multi-tube gas-liquid contact device

Country Status (1)

Country Link
JP (1) JP2796546B2 (en)

Also Published As

Publication number Publication date
JPH07178310A (en) 1995-07-18

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