JPH07171553A - Regenerating process for washing water for non-silver salt photosensitive material - Google Patents

Abstract

PURPOSE:To reduce the water washing waste liquid amount by heating, evaporating and condensing a part of washing water, cooling and condensing evaporated gas, removing sludge and then returning condensed water to a water washing process. CONSTITUTION:A part of washing water for a water washing process is heated and evaporated by a heating component 115 of an evaporator 110 (heat condensing process), and then gas evaporated in a heat condensing process is cooled by passing through a heat exchanger 172 and a condenser 152 and condensed (condensing process). On the other hand, sludge separated during water washing in the heat condensing process is separated from water by a sludge separator 130 and discharged. Then, sludge is condensed by the condenser 152, and water from which sludge is separated is returned to the water washing process by the sludge separator 130. The water washing waste liquid amount can be reduced by the arrangement.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of processing a non-silver salt light-sensitive material, and more specifically, a non-silver salt light-sensitive material is automatically conveyed while being developed, and then washed in a processing apparatus having a means for washing with water. The present invention relates to a method for reclaiming water.

[0002]

2. Description of the Related Art Conventionally, an automatic developing machine for a photosensitive lithographic printing plate having a non-silver salt photosensitive material, for example, a photosensitive layer containing a photosensitive substance such as an o-quinonediazide compound and a diazo compound on a lithographic printing plate support. In general, the treatment by means of carrying out a developing treatment in which a developing solution is supplied to the photosensitive layer while the photosensitive lithographic printing plate is being conveyed to elute the photosensitive layer imagewise, and then the eluate adhered to the plate surface is contained. A washing process is performed in which the developer is washed with water and washed away. Then, as a form of use of rinsing water in the rinsing treatment, water in the rinsing tank is sprayed from the shower nozzle onto the surface of the photosensitive lithographic printing plate for rinsing, and the water used for rinsing is returned to the rinsing tank and circulated. How to reuse,
A method of disposing the wash water or a method of replenishing the wash water to be circulated and used in accordance with the carry-in from the developing step is used.

[0003]

However, in each of the above cases, there are problems that the amount of waste liquid for washing is large, and therefore the waste liquid recovery cost is high and the environment is polluted by the discharge to the sewer. Also, when the wash water is recycled and reused, the wash water tank becomes dirty due to carry-in of scales, fibers, etc.
As a result, the processed light-sensitive material becomes dirty and the shower nozzle is clogged, so that it was necessary to frequently replace the washing water.

Therefore, an object of the present invention is to develop a non-silver salt light-sensitive material by an automatic developing machine. Firstly, by keeping the washing process after development stable for a long time, the non-silver salt light-sensitive material is free from stains. A second object is to provide a method for processing a material, a second object is to provide a method for processing a non-silver salt light-sensitive material which can reduce a waste liquid processing cost by reducing a washing liquid waste amount, and a third object is to provide: It is an object of the present invention to provide a method of processing a non-silver salt light-sensitive material which eliminates the need for cleaning by eliminating dirt and clogging of a shower nozzle in a water washing process of an automatic processor.

[0005]

The constitution of the present invention which achieves the above object of the present invention is the following (1), (2), (3) or (4).

(1) In a method of reclaiming washing water used in the washing step in a processing method including a step of developing a non-silver salt light-sensitive material while automatically conveying it and a subsequent washing step, The regeneration method is a heating concentration step of heating and evaporating and concentrating a part of the washing water used in the washing step, a condensation step of cooling and condensing the gas evaporated in the heating concentration step, and a washing water in the heating concentration step. A method of reclaiming washing water in the processing of a non-silver salt light-sensitive material, comprising a sludge discharging step of discharging sludge to be deposited and a step of returning condensed water condensed in the condensing step to the water washing step.

(2) The method for reclaiming washing water according to (1) above, which comprises a chemical treatment step before or after the heating and concentration step or at the same time as the step.

(3) The method for reclaiming washing water according to (1) above, wherein the heating concentration step and / or the condensation step is performed under reduced pressure.

(4) The sludge discharged in the sludge discharging step is separated into a solid content and water, and the water is returned to the water washing step. Method.

Here, the sludge means a mixture of a solid content and a liquid produced in the heating concentration step, and the solid content means a residue obtained by removing the liquid from the sludge by a separating operation.

The present invention will be described in detail below.

First, a method for reclaiming washing water according to the first aspect of the present invention will be described with reference to the drawings. An apparatus for carrying out the heating concentration step, the condensation step and the sludge discharge step of the invention according to claim 1 is configured as shown in the schematic view of FIG. 1, for example.

A washing water tank 1 of an automatic developing machine (not shown) for processing a non-silver salt light-sensitive material is a tubular portion 111 of an evaporator 110.
The pump P1 and the filter F1 are connected in series to the inlet 119 of the pipe.

An evaporator 110, which constitutes a container by a cylindrical portion 111, a conical wall portion 112 on the upper side, and a liquid reservoir 126 having a constricted portion 125 on the lower side, moves from a sludge discharge port 114 on the lower side to a sludge receiving port 131 of a sludge separator 130. The sludge separator 130 is piped and is connected to the lower sludge tank 140 by a connecting portion 135 at the lower part of the sludge separator 130.

A liquid circulation device 145 is arranged between the evaporator 110, the sludge separator 130, and the sludge tank 140 so that the liquid is returned by the pump P2 and circulated. 142 is a pressure adjusting valve.

Further, the evaporator 110 is provided with a heat generating member 11 filled with a fired semiconductor which generates heat and ultrasonic waves when energized.
5 and mesh members 116 and 117 are provided. Either one of the mesh members may be used. A liquid level gauge 122 is also provided.

Evaporated gas from the wash water passes through the outlet 113, the heat exchanger 172, the condenser 152 and the lower part of the absorption tank 162, and the condensate (water) is discharged from the outlet 165 to the filter F2.
Pipes (not shown) are provided so as to return to the flush water tank 1 via the.

From the upper part to the lower part of the absorption tank 162, a pipe of a reflux device 170 for promoting the circulation of the non-condensed gas and the reflux of the condensate to the evaporator 110 via the partial heat exchanger 172 and the feeding of the condensate into the washing water tank 1 is provided. Has been done.

Inside the evaporator 110, it is preferable to provide one or both of the mesh members 116 and 117 in the passage of the vaporized gas to the vaporized gas outlet 113 near the vaporized gas outlet 113.

With this net-like member, it is possible to prevent the inconvenience that the liquid droplets scattered from the surface of the liquid together with the bubbles generated in the liquid are mixed with the evaporated gas and discharged from the discharge port.

The mesh members 116 and 117 have an eye opening of 0.5 to
A diameter of about 1.3 mm is suitable.

Specifically, for example, 0.2 mmφ, pitch 1.0 mm
A degree of stainless steel wire mesh or the like can be used. Further, it is preferable that the mesh members are provided in double as shown in the drawing in order to complete the above effects.

In the evaporator 110, it is preferable that the evacuation gas outlet 113 is provided at the center of the upper end of the conical wall 112, and the sludge outlet 114 is provided at the lower end. In such an embodiment, the inner wall surface between the tubular portion 111 of the main body of the evaporator 110 and the evaporative gas discharge port 113 has a ridgeline angle of 40 degrees.
It is preferable to have the conical wall portion 112 of ˜80 ° from the viewpoint that the liquid droplets scattered from the liquid surface that adhere to the inner wall surface of the liquid droplets with the evaporation of the waste liquid easily flow down.

It is desirable to provide a liquid level gauge 122 inside the evaporator 110. Then, by providing a device for controlling the operation of the pump P1 for supplying the washing water so as to maintain the liquid level of the liquid inside the evaporator at a predetermined height based on the result detected by the level gauge, The supply work to the evaporator 110 can be simplified.

The volume of the portion of the evaporator 110 in which the washing water is stored varies depending on the heat generating member, but 1 to 10 liters per 1 kW of the supply electrode to the heat generating member is suitable, and preferably 1.5 to 8 liters. In addition, the volume of the upper void is 0.5 of the volume of the liquid containing part to prevent bubbles from flowing out and bumping.
It is suitable to be 4 times, more preferably 0.7 to 2.5 times. The pressure inside the evaporator 110 is preferably 0 to 700 mmHg, more preferably 200 to 600 mmHg.

The apparatus for carrying out the sludge discharging step in the apparatus shown in FIG. 1 mainly comprises a sludge separator 130 and a sludge tank 140. The sludge separator 130 is a device that separates and stores sludge generated by the treatment of washing water in the evaporator 110 from the inside of the evaporator 110, and connects the sludge tank 140 to the lower end of the sludge tank 140 so that the sludge tank 140 can be engaged with the sludge tank 140. A liquid circulation device 145 that connects the evaporator 110 and / or the sludge separator 130 with a pipe and circulates the liquid so that the liquid inside the sludge separator 130 flows from the sludge separator 130 through the connecting portion 135 to the sludge tank 140. It is preferable to add. By adding such a liquid circulation device 145, the workability of sludge discharge work is improved.

The sludge is separated into a solid content and a liquid by a filter 180, and the solid content is opened to the outside by opening the lid 181.

When the washing water to be treated with the evaporator contains a dispersion of the polymer compound, it is preferable to remove it with the filter F1 in advance and add it to the evaporator. By adding such processing steps,
It is possible to avoid viscous solids generated from rinsing water by heating by the heat generating member inside the evaporator, and to generate free-flowing and easy-to-handle solids.

By adding the following vaporized gas processing device 150 to the evaporator 110, harmful gases contained in the vaporized gas (for example, ammonia gas, sulfurous acid gas, various organic solvents, etc.) are extremely effective. Can be removed selectively.

The apparatus 150 for processing the vaporized gas includes a condenser 15
2, the absorption tank 162 and the evaporative gas discharge port 113 of the evaporator 110 and the condenser 152, has a pipe connecting the condenser 152 and the absorption tank 162, the absorption tank 162 inside the absorbent container 164, at the lower end It has a piping device 171 for circulating the non-condensed gas from the upper part to the lower part of the condensation outlet 165 and the absorption tank 162.

As the cooling means in the condenser 152, for example, an apparatus in which cooling water is passed through a large number of thin tubes inside the condenser is used.

The absorption tank 162 is usually a vertical cylindrical shell, and the absorbent may be activated carbon selected as appropriate for other purposes. The size of the absorbent accommodating portion 164 may be appropriately selected according to the treatment amount, type, etc. of the washing water, but as a guide, the washing water in the washing step following the development step of a normal positive or negative PS plate is 10 l / 24 When processing at a percentage of time,
An inner diameter of 20 to 100 mm and a height of 200 to 1000 mm are suitable.

It is preferable to add the following non-condensable gas recirculation pipe 173 to the vaporized gas processing device 150. According to this aspect, absorption of the harmful gas in the non-condensed gas is further improved.

The reflux device 170 including the piping device 171 and the reflux pipe 173 pumps the non-condensed gas into the evaporator 110 from the middle of the piping of the piping device 171 that sends the gas at the top of the absorption tank 162 to the bottom thereof. And a heat exchanger 172 for exchanging heat with the vaporized gas discharged from the evaporator 110.

Further, it is preferable that the condensate discharge port of the absorption tank 162 is connected to the filter device F2.
By passing through this filter device F2, the impurity content of the condensate can be further reduced.

As a preferred embodiment of the heat generating member 115 used for heating and concentrating, as described above, the inner diameter is 5 to 30 mm and the wall thickness is 1 to 5 mm.
A pipe made of a material having a certain degree of corrosion resistance, heat resistance and heat conductivity (for example, stainless steel), the inside of which is insulated and coated with silicon resin or the like, but which has at least a part of the semiconductor composition inside the liquid An example is a member filled with a sintered body of material powder, which has a shape such that the required length of the semiconductor-filled portion can be immersed in the waste liquid (for example, the submerged portion is coiled). Both ends of the semiconductor member 115 are connected to the connector 123 provided on the evaporator wall surface 112 or 124 on the upper side from the liquid surface, and are connected to an external power source. In such an embodiment, the length of the semiconductor-filled portion of the semiconductor member 115 in the liquid is preferably about 4 to 20 mm per 1 g / min of washing water treatment capacity.

CuO, Cu ₂ O, ZnO, and Ni are used as the burning bio-semiconductors that generate heat and ultrasonic waves by applying electricity to the heat generating member.
O, Ni ₂ O ₃ , CdO, BaO, WO ₂ , WO ₃ , MoO ₂ , Yb ₂ O ₃ , Y ₂ O ₃ , F
e ₂ O ₃ , Fe ₃ O ₄ , FeO, C, Si, Ga, Ge, Se, TiO ₂ , TiO, Ti
₂ O ₃ , CoO, Co ₂ O ₃ , Co ₃ O ₄ , Al ₂ O ₃ , CrO, P, As, Cr
Examples include a calcined product of a metal oxide or element such as ₂ O ₃ , CrO ₃ , MnO, MnO ₂ , and Mn ₂ O ₃ and a mixture selected from components such as SiC. Metal element of the above metal oxide or other element (Ag, Au, Pt, etc.) or a conductive agent or binder
_{SiO 2, Na 2 O, K} 2 O, CaO, MgO , etc. may be added.

Preferred embodiments include those having the following composition.

Fe ₂ O ₃ 50-90%; MnO, CoO, NiO, FeO, Cu
The total of at least one selected from O, CdO and ZnO is 2-3
0%; a composition containing at least one selected from Na ₂ O, K ₂ O, SiO ₂ , CaO, and Al ₂ O _{3 in a} total amount of 5 to 30% is a preferable semiconductor composition.

As a preferred embodiment of heating and concentrating the washing water with the baked semiconductor, a powdery semiconductor mixture is filled inside a corrosion-resistant, heat-resistant and heat-conducting hollow pipe whose inside is coated with silicon resin or the like, There is a mode in which a fired product semiconductor heater produced by sintering this granular material by energization is immersed in a liquid to be treated and energized to generate heat and ultrasonic waves.

In such an embodiment, the particle size of the above-mentioned granular semiconductor mixture is about 0.01 to 0.2 mm, and the inner diameter is 5 to 30 m.
For example, a hollow pipe made of stainless steel, the inside of which is m and has a wall thickness of about 1 to 5 mm and whose inside is insulated, is filled with a granular fired product semiconductor to a filling portion length of about 4 to 20 mm per washing water treatment capacity of 1 g / min. Can be used. Also,
Nichrome quartz heater, Teflon heater, cartridge heater, rod heater, panel heater,
A ceramic heater, a heat pump, or the like having excellent corrosion resistance, heat resistance, and thermal conductivity can be preferably used.

Next, the chemical treatment step of the invention according to claim 2 will be described. The chemical treatment step includes a step of neutralizing wash water, a step of adding an acid or an alkali, and a treatment step of adding a flocculant to precipitate a solid matter. In the present invention, at least one of neutralization, addition of acid, and addition of coagulant is preferably performed.

As the acid used for neutralizing the washing water solution,
Examples thereof include sulfuric acid, hydrochloric acid, phosphoric acid, oxalic acid, citric acid, tartaric acid and the like, and examples of the alkali include slaked lime, caustic soda, caustic potash, organic amine and the like. Of these, odorless or almost odorless are preferable, and inorganic compounds are preferable.

In the chemical treatment, it is preferable to neutralize the pH of the liquid to be treated with an acid or an alkali to a range of 5 to 9, more preferably a range of 6 to 8.

As the aggregating agent, for example, aluminum sulfate, magnesium sulfate, polyaluminum chloride, calcium chloride, magnesium chloride, polyacrylamide polymer, polyacrylic acid (salt) and the like can be preferably used. Of these, inorganic compounds are preferable, and they can be used as a solution dissolved in a solvent such as water.

When the coagulant is used, it is preferable to use filtration with a filter in order to remove the coagulated material.
The coagulant is preferably added at the same time as or after the addition of the acid or alkali. It is preferable to provide a step of removing solids or sludge after the chemical treatment step including the neutralization treatment with acid or alkali.

As a preferred embodiment of the chemical treatment step, the chemical treatment step is performed before the heating and concentrating step, and the solid content or sludge precipitated from the washing water between the chemical treatment step and the heating and concentrating step is removed. There is an aspect in which a step of providing a step of adding a step of removing solids and sludge is added to the washing water subjected to the heating and concentration step.

When the solid content and sludge are removed from the treated waste liquid subjected to the heat concentration step, it is preferable to add an acid, a neutralizing agent or a coagulant to the treated waste liquid.

An apparatus for carrying out the method for reclaiming washing water according to the second aspect of the present invention is constructed, for example, as shown in FIG. The washing water in the washing water tank 1 containing the washing water used for the washing after the development by the automatic developing machine (not shown) is sent to the chemical treatment tank 200 by the pump P1 to perform the chemical treatment.
The chemical treatment is performed by adding a neutralizing agent and a flocculating agent from the treating agent tanks 201 and 202 into the chemical treating tank 200 by a pump P3, adding the washing water, and agitating them with a stirrer 203 to neutralize and agglomerate. I do. The solid matter generated in the wash water by this treatment is filtered and removed by the filter F3, and is sent by the pump P2 to the evaporator 205 for heating and concentration. This liquid is sent by the liquid level sensor 206.
Detects the liquid level in the evaporator 205, and controls the operation of the pump P2 by a control mechanism (not shown) to control the liquid level to reach a predetermined range. In the evaporator 205, the washing water is heated by the heating device 207 to evaporate and evaporate the evaporated components. Upon concentration, sludge composed of resin is generated in the liquid. This sludge is discharged by opening the valve 208 provided at the bottom of the evaporator 205. As means for discharging sludge, the means shown in FIG. 1 can be applied in addition to the above. On the other hand, the evaporated components are
It is cooled in 9 and condensed to be stored in the liquid receiver 210. In addition, in the above chemical treatment, the addition of the neutralizing agent is not shown in the figure.
Measure the pH of the liquid with a meter and control mechanism
The operation of the pump P3 for adding the neutralizing agent is controlled so as to fall within the range, and the addition of the aggregating agent is performed by adding an amount of the aggregating agent corresponding to the liquid amount sent into the chemical treatment tank 200.

The chemical treatment bath 200 is preferably a cylindrical bath made of metal such as stainless steel or fluororesin (eg Teflon) having a protective film. As the filter F3, for example, a filter such as TC-100 (manufactured by Tosel) can be used. The filtrate filtered by the filter F3 may not be directly sent to the heating concentration tank 205, but may be temporarily stored therein by providing a liquid storage tank in the middle. Further, the means for adding the treating agent such as the neutralizing agent and the coagulant may be appropriately selected depending on the form (liquid, powder, etc.) of the treating agent to be added. As the evaporator, known ones described in, for example, JP-A-62-118346 can be used.

Next, the method for reclaiming washing water according to the third aspect of the present invention will be described with reference to the drawings. FIG. 3 is a schematic configuration diagram showing an example of an apparatus for carrying out the invention according to claim 3. In the figure, 1 is a washing water tank containing washing water used in a washing process after development of an automatic developing machine (not shown) for processing a non-silver photosensitive material, and 301 is a processing waste liquid heated to evaporate moisture and the like. An evaporator for concentrating and concentrating, 303 is a pipe for sending the treatment waste liquid in the washing water tank 1 to the evaporator 301, and 305 is a pipe 303.
A filter for removing the dispersion in the processing waste liquid provided in the middle of the process, 306 is an electromagnetic valve, 307 is a heating member that generates heat by energization for heating the processing waste liquid, and is a spiral shape suspended from the top of the evaporator 301. It has a heat generating part. 310
Is a liquid level detection unit for detecting the liquid level of the processing waste liquid in the evaporator 301. A communication pipe 311 is provided outside the side wall of the evaporator 301, and a liquid level sensor 312 is internally provided in the communication pipe 311.
The detection signal of the liquid level detected by the liquid level sensor 312 is input to a control mechanism (not shown), and an opening / closing of the solenoid valve 306 is controlled by a timer (not shown) to control the opening / closing of the solenoid valve 306, and the process from the flush water tank 1 to the evaporator 301 is performed. The liquid level in the evaporator 301 is kept within a certain range by controlling the inflow of the waste liquid.

315 is a condenser for cooling and condensing the vapor evaporated from the processing waste liquid in the evaporator 301, and 316 is a condenser 315
Is a fan for cooling. 318 is an evaporator 301
The sludge recovery tank, which contains the concentrate (sludge) produced by heating and concentrating the treatment waste liquid inside, 319 is the evaporator 3
A sludge discharge valve (preferably a butterfly valve) provided in the pipe line between 01 and the sludge tank 318, 320 releases the processing waste liquid in the evaporator 301 to the sludge tank 318 when bumping occurs in the evaporator 301. Plumbing for, 3
Reference numeral 21 is a solenoid valve provided in the middle of the pipe 320.

In the evaporator 301, 323 is an evaporator for improving the flow of the fluid in the pipeline for sending the vapor from the evaporator 301 to the condenser 315 to eliminate clogging of the pipeline.
An air inlet for letting air into the 301, a solenoid valve 324 for adjusting the amount of air sucked from the air inlet 323, and a valve for shutting off the air as necessary, 326 for detecting the liquid level in the evaporator 301. The liquid level sensor detects abnormalities of the liquid level when the exhaust pump P4 and the electromagnetic valve 306 are out of order, and stops the operation of the processing device by a control mechanism (not shown). A temperature sensor 327 detects the temperature of the upper void portion in the evaporator 301 to prevent an accident such as bumping when an abnormal overheat occurs in the evaporator 301 in operation, and the detected temperature is a predetermined value. When the temperature becomes higher than the temperature, the solenoid valve 321 is opened to discharge the liquid in the evaporator 301 to the recovery tank, and at the same time the solenoid valve 324 is closed to prevent the liquid in the evaporator 301 from overflowing to the outside. There is. 330 is a liquid receiver for containing the liquid condensed in the condenser 315, P2 is a pump for sending the liquid in the liquid receiver 330 to the washing water tank 1, P4 is a vapor which depressurizes the inside of the evaporator 301 and is evaporated in the evaporator 301. Is an exhaust pump for sucking into the condenser 315. A liquid level sensor 335 operates so that when the liquid level detects the upper limit of a predetermined range, the pump P2 operates, and when the lower limit is detected, the pump P2 stops operating. 336 is also a liquid level sensor, and the operation of the device is stopped when an abnormality that the liquid level reaches the liquid level sensor 336 occurs. A temperature sensor 337 is for stopping the operation of the device when a high-temperature fluid that is not condensed due to a failure of the fan 316 for air cooling enters the liquid receiver 315.

Next, the method of reclaiming washing water according to the third aspect of the present invention will be described with reference to the apparatus shown in FIG.

First, the inside of the evaporator 301 is depressurized by the operation of the exhaust pump P4, and the processing waste liquid in the washing water tank 1 is sent to the evaporator 301 through the pipe 303. This is the liquid level sensor 312 and a control mechanism (not shown). By solenoid valve 3
The opening / closing of 06 is controlled to control the inflow of the processing liquid from the flush water tank 1 into the evaporator 301, and the processing waste liquid flows into the evaporator 301 until the liquid surface level in the evaporator 301 reaches a certain range, and thereafter. The opening / closing of the solenoid valve is controlled so that the liquid level falls within a certain range. Evaporator 301
As for the pressure condition inside, it is appropriate to set the pressure of the upper void portion in the evaporator 301 within a range of 0 to −700 mmHg,
More preferably, it is in the range of -200 to -600 mmHg.

The washing water sent to the evaporator 301 is heated by the heating member 307. The gas that has been heated and evaporated from the processing waste liquid is sent to the condenser 315 together with the air sucked from the upper portion of the evaporator 301 through the electromagnetic valve 324, condensed and stored in the liquid receiver 330, and the gas that is not condensed is exhaust pump P4. Is released to the outside. The liquid stored in the liquid receiver 330 is sent to the flush water tank 1 by the pump 331.

In such processing, the evaporator 30
Although the liquid level of the processing waste liquid in 1 is gradually lowered due to evaporation, the liquid level is detected by the liquid level sensor 312, and the solenoid valve 306 is operated so that a constant liquid level level range is maintained. Controlled.

If an overheated state or bumping occurs in the evaporator 301 for some reason, the temperature sensor 32
The temperature abnormality of the upper void portion inside the evaporator 301 is detected by 7 and the solenoid valves 321 and 324 are opened by a control mechanism (not shown), the liquid inside the evaporator 301 is discharged to the sludge tank 318, and at the same time the air suction port 323 is closed. Air intake 323
From this, the liquid in the evaporator 301 is prevented from overflowing to the outside of the evaporator 301. When the temperature sensor 337 detects an abnormality in the temperature inside the liquid receiver 330, the operation of the processing device is stopped by the control mechanism (not shown).

The non-silver salt light-sensitive material to which the washing water reclaiming method of the present invention is applied and its treatment (treatment for producing washing water mixed with the developer used for development) include the following. It For example, a photosensitive lithographic printing plate having a negative photosensitive layer using a diazo compound as a photosensitive component and its treatment,
A photosensitive lithographic printing plate having a positive type photosensitive layer using an o-quinonediazide compound as a photosensitive component and its treatment, for example, JP-A-62-175757, page 5, lower left column, line 18 to page 7, upper right column. Photosensitive lithographic printing plates as described in line 11 and, for example, JP-A Nos. 62-24263, 62-24264, and 62-25761.
No. 62, No. 62-35351, No. 62-73271, No. 62-75535, No. 62
-89060, 62-125357, 62-133460, 62-15914
No. 8, No. 62-168160, No. 62-175757, No. 62-175758,
No. 63-200154, 63-205658 and a photosensitive lithographic printing plate as described in JP-A 1-149043
No. 1-150142, No. 1-154157, No. 1-154158, etc., and a plate-making material having a constitution in which a silicone layer is laminated on a substrate as a photosensitive layer and an ink repellent layer, and the treatment thereof. , A photosensitive material in which a photosensitive layer whose solubility is changed by light irradiation is coated on a support, and an image-like resist layer provided by an electrophotographic method as described in JP-A-57-210347 A light-sensitive material in which the soluble layer to be obtained is provided on a support, and its treatment and the like.

The method of reclaiming washing water according to the present invention can be preferably applied to washing water in a washing step following a developing step of developing with a developer containing a developer component as described below.

Alkali silicates such as potassium silicate,
Sodium silicate, sodium metasilicate, potassium metasilicate, ammonium silicate, etc. Alkali hydroxide, such as potassium hydroxide, sodium hydroxide, lithium hydroxide and the like.

Alkali agents other than alkali silicates and alkali hydroxides such as sodium triphosphate, sodium diphosphate, potassium triphosphate, potassium diphosphate, ammonium triphosphate, diphosphorus. Inorganic alkali agents such as ammonium acidate, sodium metasilicate, sodium bicarbonate, sodium carbonate, potassium carbonate, ammonium carbonate and the like, organic alkali agents such as mono-, di- or triethanolamine and tetraalkyl hydroxide.

Nonionic surfactants such as polyethylene glycol, polyoxyethylene lauryl ether,
Polyoxyethylene nonyl ether, polyoxyethylene cetyl ether, polyoxyethylene stearyl ether, polyoxyethylene oleyl ether, polyoxyethylene behenyl ether, polyoxyethylene polyoxypropylene cetyl ether, polyoxyethylene polyoxypropylene behenyl ether, polyoxy Ethylene nonyl phenyl ether, polyoxyethylene octyl phenyl ether, polyoxyethylene stearyl amine, polyoxyethylene oleyl amine, polyoxyethylene stearic acid amide, polyoxyethylene oleic acid amide, polyoxyethylene castor oil, polyoxyethylene abiethyl ether, Polyoxyethylene lanolin ether, polyoxyethylene monolaurate, polyoxye Ren monostearate, polyoxyethylene glyceryl monooleate, polyoxyethylene glycer monostearate, polyoxyethylene propylene glycol monostearate, oxyethylene oxypropylene block polymer, distyrenated phenol polyethylene oxide adduct, tribenzylphenol polyethylene oxide adduct Substance, octylphenol polyoxyethylene polyoxypropylene adduct, glycerol monostearate, sorbitan monolaurate,
Polyoxyethylene sorbitan monolaurate etc.

Anionic surfactants such as higher alcohol (C ₈ -C ₂₂ ) sulfate ester salts [eg sodium salt of lauryl alcohol sulfate, sodium salt of octyl alcohol sulfate, ammonium salt of lauryl alcohol sulfate, "Teepol- 81 ''
(Trade name, manufactured by Ciel Chemical Co., Ltd.), secondary sodium alkyl sulfate, etc.], aliphatic alcohol phosphate ester salts (eg, cetyl alcohol phosphate ester sodium salt), alkylaryl sulfonates (eg, dodecylbenzene sulfonic acid) Sodium salt, isopropylnaphthalenesulfonic acid sodium salt, dinaphthalenedisulfonic acid sodium salt, metanitrobenzenesulfonic acid sodium salt, etc., alkylamide sulfonates (for example, C ₁₇ H ₃₃ CON (CH ₃ ) CH ₂ SO ₃ Na, etc.), sulfonates of dibasic fatty acid ester (for example, dioctyl sodium sulfosuccinate, dihexyl sodium sulfosuccinate, etc.) and the like.

Examples of cationic surfactants such as amine type are polyoxyethylene alkyl amine, N-alkyl propylene amine, N-alkyl polyethylene polyamine, N-alkyl polyethylene polyamine dimethyl sulfate, alkyl biguanide, long chain amine. Oxide, alkylimidazoline, 1-hydroxyethyl-2-alkylimidazoline, 1-acetylaminoethyl-2-alkylimidazoline, 2-alkyl-4-methyl-4-hydroxymethyloxazoline and the like. Examples of the quaternary ammonium salt type include long-chain primary amine salt, alkyl trimethyl ammonium salt,
Dialkyldimethylethylammonium salt, alkyldimethylammonium salt, alkyldimethylbenzylammonium salt, alkylpyridinium salt, alkylquinolinium salt, alkylisoquinolinium salt, alkylpyridinium sulfate, stearamidomethylpyridinium salt,
Acylaminoethyldiethylamine salt, acylaminoethylmethyldiethylammonium salt, alkylamidopropyldimethylbenzylammonium salt, fatty acid polyethylene polyamide, acylaminoethylpyridinium salt, acylcholaminoformylmethylpyridinium salt, stearooxymethylpyridinium salt, fatty acid triethanol Amine, fatty acid triethanolamine formate, trioxyethylene fatty acid triethanolamine, fatty acid dibutylaminoethanol, cetyloxymethylpyridinium salt, p-isooctylphenoxyethoxyethyl dimethylbenzylammonium salt and the like.

Inorganic reducing agents, for example, sodium sulfite, potassium sulfite, ammonium sulfite, sodium bisulfite, sulfites such as potassium bisulfite, sodium phosphite, potassium phosphite, sodium hydrogen phosphite, phosphorous acid Phosphates such as potassium hydrogen, sodium dihydrogen phosphite and dipotassium hydrogen phosphite, hydrazine, sodium thiosulfate and sodium dithionite.

Organic reducing agents such as hydroquinone,
Phenol compounds such as metol and methoxyquinone, amine compounds such as phenylenediamine and phenylhydrazine.

Organic carboxylic acids, for example having 6 to 6 carbon atoms
20 aliphatic carboxylic acids and aromatic carboxylic acids in which a benzene ring or naphthalene ring is substituted with a carboxyl group.

Aliphatic carboxylic acids, for example caproic acid,
Enanthic acid, caprylic acid, pelargonic acid, capric acid, lauric acid, myristic acid, palmitic acid, stearic acid, etc.

Aromatic carboxylic acids such as benzoic acid, o-
Chlorobenzoic acid, p-chlorobenzoic acid, o-hydroxybenzoic acid, p-hydroxybenzoic acid, p-tert-butylbenzoic acid, o-aminobenzoic acid, p-aminobenzoic acid, 2,4-dihydroxybenzoic acid, 2,5-dihydroxybenzoic acid, 2,3-dihydroxybenzoic acid, 3,5-dihydroxybenzoic acid, gallic acid, 1-hydroxy-2-naphthoic acid, 3-hydroxy-2-naphthoic acid, 2-hydroxy-1 -Naphthoic acid, 1-naphthoic acid, 2-naphthoic acid and the like.

Solvents, for example, organic solvents having a solubility in water at 20 ° C. of not more than 10% by weight, such as ethyl acetate, propyl acetate, butyl acetate, benzyl acetate, ethylene glycol monobutyl acetate, butyl lactate and butyl repurate. Carboxylic acid ester; ethyl butyl ketone,
Ketones such as methyl isobutyl ketone and cyclohexanone; alcohols such as ethylene glycol monobutyl ether, ethylene glycol benzyl ether, ethylene glycol monophenyl ether, benzyl alcohol, methylphenyl carbinol, n-amyl alcohol and methyl amyl alcohol; xylene Alkyl-substituted aromatic hydrocarbons such as; methylene dichloride,
Halogenated hydrocarbons such as ethylene dichloride and monochlorobenzene.

Further added to enhance the developability,
For example, neutral salts such as NaCl, KCl and KBr described in JP-A-58-75152, EDTA and NT described in JP-A-58-190952.
Chelating agents such as A, [Co (N
H ₃ )] ₆ Cl ₃ , CoCl ₂ .6H ₂ O complex, sodium alkylnaphthalene sulfonate described in JP-A-50-51324, N-
Anionic or amphoteric surfactants such as tetradecyl-N, N-dihydroxyethylbetaine, nonionic surfactants such as tetramethyldecynediol described in U.S. Pat.No. 4,374,920, JP 55-95946 A An amphoteric polymer electrolyte such as a cationic polymer such as a methyl chloride quaternary product of p-methylaminomethyl polystyrene, a copolymer of vinylbenzyltrimethylammonium chloride and sodium acrylate described in JP-A-56-142528, and the like. Reducing inorganic salts such as sodium sulfite described in JP-A-57-192952, inorganic lithium compounds such as lithium chloride described in JP-A-58-59444, lithium benzoate described in JP-A-50-34442, etc. Organolithium compound, JP
Quaternary organic metal surfactants containing Si, Ti, etc. described in JP-A-59-75255, organoboron compounds described in JP-A-59-84241, and tetraalkylammonium oxides described in EP 101,010. Ammonium salt and the like.

[0073]

EXAMPLES Next, the present invention will be described more specifically by way of examples.

Example 1 A negative photosensitive lithographic printing plate and a positive photosensitive plate were prepared using PSZ-1315 (manufactured by Konica Corporation) as an automatic processor and SD-51 (manufactured by Konica Corporation) as a developer. Processing of planographic printing plates (development,
After washing with water and desensitization, the washing water of this automatic processor was treated with the apparatus shown in FIG. Evaporator of Figure 1
The washing water content of 110 is 5 liters, the volume of the void is 7 liters,
A ceramic heater is used as the heat generating member, and the energizing power A
C100V, 10A. TC-1 (made by Tosel) is used for the filter F1 and about 1% of coconut shell activated carbon is used as the absorbent in the absorption tank 162.
000 g was used for the filter F2, and an activated carbon cartridge AP-117 manufactured by Cuno Co. was used. As the photosensitive lithographic printing plate, after treating 20 and 5 chrysanthemums of a positive PS plate KM and a negative PS plate SWN-X (manufactured by Konica Corp.), respectively, 5 l of washing water in a washing water tank Was treated with the treatment apparatus shown in FIG. 1, the recovered treatment liquid was colorless and transparent and was similar to distilled water. When such a regenerating process was repeated for every 25 photosensitive lithographic printing plates and repeated for about 1 month while processing 100 plates per day, the washing water tank of the automatic processor was not contaminated, and shower pipes, nozzles, etc. Stable processing could be performed without clogging. The following shows the turbidity of the washing water in the circulating water washing tank at this time (after treatment for about 1 month) (H
Table 1 shows the results of examining the adhesion of precipitates to the photosensitive lithographic printing plate treated with this washing water) and measured with a Ratio XR turbidimeter manufactured by ACH).

Comparative Example 1 An experiment was conducted under the same conditions as in Example 1 except that the washing water was not regenerated and the treatment period was set to 1 week. The results are shown in Table 1.

[0076]

[Table 1]

Example 2 The same experiment as in Example 1 was conducted except that the apparatus for reclaiming washing water shown in FIG. 2 was used. As the treatment tank 200, a cylindrical one made of stellen steel with a rinsing water capacity of 5 l was used, 9% sulfuric acid 100 ml as a neutralizing agent, and 8% as a coagulant.
When 10 ml of aluminum sulfate was added and stirred at room temperature for 5 minutes, aggregates were precipitated. This suspension was passed through the filter F3 and sent to the heating evaporator 205, where it was separated into solid matter and water. A 1 kW Teflon heater was used for the heat treatment 207, and energization power was AC100V, 10A. When such a regenerating process was repeated for about one month as in Example 1, the same result as in Example 1 was obtained.

Example 3 The same experiment as in Example 1 was conducted except that the apparatus for reclaiming washing water shown in FIG. 3 was used. The washing water capacity of the evaporator 301 is 5 liters, the capacity of the voids is 5 liters, a ceramic heater is used as the heating member 307, and the energizing power AC100
V and 10A. In addition, the pressure inside the evaporator 301 should be 350-
It was 420 mmHg. When such a regenerating process was repeated for about 1 month as in Example 1, the same result as in Example 1 was obtained.

[0079]

According to the present invention, in the development processing of the non-silver salt light-sensitive material by the automatic processor, the washing process after development is kept stable for a long period of time so that the stain-free non-silver salt light-sensitive material can be treated. , A processing method of a non-silver salt light-sensitive material capable of reducing the processing cost of the waste liquid by reducing the amount of the washing waste liquid,
Further, there is provided a method of processing a non-silver salt light-sensitive material which eliminates the need for cleaning by eliminating dirt and clogging of a shower nozzle in a water washing process of an automatic processor.

[Brief description of drawings]

FIG. 1 is a schematic configuration diagram showing an example of a processing apparatus for carrying out the invention according to claim 1.

FIG. 2 is a schematic configuration diagram showing an example of a processing device for carrying out the invention according to claim 2.

FIG. 3 is a schematic configuration diagram showing an example of a processing device for carrying out the invention according to claim 3.

[Explanation of symbols]

 1 Washing water tank 110, 205, 301 Evaporator 130 Sludge separator 140, 318 Sludge tank 152, 209, 315 Condenser 162 Absorption tank 200 Chemical treatment tank 201, 202 Treatment agent tank F1 to F3 filter P1 to P3 pump P4 exhaust pump

 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Shinya Watanabe, Konica Stock Market, Hino City, Tokyo, 1st Konica Stock Company (72) Inventor, Iku Fukumuro, 1st Sakura City, Hino City, Tokyo, Konica Stock Company

Claims (4)

[Claims] 1. A method of reclaiming washing water used in the washing step in a processing method including a step of automatically developing a non-silver salt light-sensitive material and a subsequent washing step. The regeneration method is a heating concentration step of heating and evaporating and concentrating a part of the washing water used in the washing step, a condensation step of cooling and condensing the gas evaporated in the heating concentration step, and a precipitation in washing water in the heating concentration step. And a step of returning the condensed water condensed in the condensing step to the water washing step. 2. The method for reclaiming washing water according to claim 1, further comprising a chemical treatment step before or after the heating concentration step or simultaneously with the step. 3. The method for reclaiming washing water according to claim 1, wherein the heating concentration step and / or the condensation step is performed under reduced pressure. 4. The method for reclaiming washing water according to claim 1, wherein the sludge discharged in the sludge discharging step is separated into solid content and water, and the water is returned to the washing step.