JPH01307755A - Method and device of processing non-silver salt photosensitive material by which workability etc., of waste liquid treatment is improved - Google Patents

Abstract

PURPOSE:To improve the efficiency of a waste liquid treatment by treating at least one of a waste developing soln. and waste washing liquid and separating the same to solids and water. CONSTITUTION:At least one of the waste developing soln. and the waste washing water is treated and is separated to the solids and the water. A waste liquid tank 1 is piped in with a pump P1 and a filter F1 to a feed port 19 of a cylindrical part 11 of an evaporator 10 and an overflow liquid is recovered from an overflow port 18 to the waste liquid tank 1 for the above-mentioned purpose. On the other hand, the evaporator 10 is coupled from a sludge discharge port 14 via a sludge receiving pot 31 of a sludge separator 30 to a sludge tank 40 in the lower part. The solids obtd. by treating the waste liquid are discharged and the water can be discharged to sewerage for its quality. The water is also usable as the diluting water for the processing liquid such as developing soln.

Description

DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for processing non-silver salt photosensitive materials using an automatic developing machine and an apparatus used therefor, and more specifically, to a method for processing non-silver salt photosensitive materials using an automatic developing machine, and more specifically, to a method for performing elution type development using alkaline development. The present invention relates to a method for treating waste liquid from processing and an apparatus used therefor.

[Conventional technology]

The processing process using an automatic developing machine for non-silver salt photosensitive materials includes a development process in which the image forming layer is eluted in an imagewise manner, and other necessary steps such as washing water, desensitizing liquid, and rinsing liquid in the case of photosensitive lithographic printing plates. , includes a treatment process using surface preparation liquid, etc.
In addition to the processing step using a developer, a processing step using washing water is usually added to the processing of materials for color proofing.

When processing a large amount of light-sensitive material, components consumed during processing are replenished, while components that are eluted into the processing solution or concentrated by evaporation are removed during processing to maintain the processing solution components at a constant level. Measures have been taken to replenish the processing solution with a replenisher and discard a portion of the processing solution to remove the concentrated components. In addition, if the performance of the processing liquid falls outside the allowable limits, the entire processing liquid is discarded.

In recent years, systems have been changing to systems in which the amount of replenishment fluid, including washing water, which is used as a replenishment fluid for washing, has been significantly reduced due to pollution and economic reasons. It is diluted with waste water from washing water, cooling water from automatic processors, etc., and then disposed of in sewers, etc.

However, due to the recent tightening of pollution control by the Water Pollution Control Law and the ordinances of each prefecture, it is possible to dispose of flush water and cooling water into sewers and rivers, but it is possible to dispose of other waste liquids (e.g., developer solution, gum solution, etc.). , waste liquid such as rinsing liquid) should be disposed of.
It has become virtually impossible. For this reason, each photo processing company pays a collection fee to a specialized waste liquid processing company to collect the waste liquid, or installs pollution treatment equipment. However, the method of entrusting a waste liquid treatment company to a waste liquid treatment company requires a considerable amount of space to store the waste liquid, and is also extremely expensive. It has drawbacks such as being extremely large and requiring a fairly large area to maintain. More specifically, as a pollution treatment method for reducing the pollution load of waste liquid, activated sludge method (for example,
1-12943 and Japanese Patent Publication No. 51-7952, etc.), evaporation method (Japanese Patent Publication No. 49-89437 and Japanese Patent Publication No. 56-3399, etc.)
6, etc.), electrolytic oxidation method (JP-A-48-84462, JP-A-49-119458, JP-A-53-43478, JP-A-49-119457, etc.), ion exchange method (JP-A-51-37704, etc.) , Japanese Patent Publication No. 53-383, Special Publication No. 5
3-43271, etc.), reverse osmosis method (Japanese Patent Application Laid-Open No. 50-224
63, etc.), Chemical Asahi Riho (JP-A-49-64257, JP-A-57-37396, JP-A-53-12152)
No. 49-58833, No. 53-63763, Japanese Patent Publication No. 57-37395, etc.), but these are still insufficient.

Japanese Utility Model Application No. 60-70841 discloses an apparatus for heating the waste liquid and evaporating the water to dryness in order to easily process the waste liquid from silver salt photographic materials. Since it is directly evaporated and concentrated or dried to dryness, when applied to the treatment of waste liquid from non-silver salt photosensitive materials, solids stick to the inside of the evaporator and the heat source, reducing the evaporation processing efficiency, and the removal of the solids becomes difficult. There are disadvantages such as troublesome maintenance work.

[Purpose of the invention]

An object of the present invention is to provide a method for treating waste liquid of non-silver salt photosensitive materials that can save space required for processing waste liquid.

Another object of the present invention is to provide a method for treating waste liquid of non-silver salt photosensitive materials, which improves the workability of treating waste liquid.

Still another object of the present invention is to provide a method for treating waste liquid from silver salt photosensitive materials, which can reduce the cost of treating waste liquid.

Yet another object of the present invention is to provide an apparatus for use in the above method.

[Structure of the invention]

An object of the present invention is to provide a method for processing a non-silver salt photosensitive material, which includes a step of washing with repeatedly used washing water after alkaline development using an automatic developing machine, the method comprising: A processing method characterized by including a step of treating and separating solid matter and water, a developing processing section and a washing processing section that performs washing using repeatedly used washing water, and the developing processing section and the washing. A processing apparatus characterized by having a conveyance means for sequentially passing through a processing section, and a means for treating waste liquid from the development processing section and the water washing processing section and separating it into at least solids and water. achieved.

The present invention will be explained in detail below.

Non-silver salt photosensitive materials according to the present invention include those in which a photosensitive layer whose solubility changes upon irradiation of light is coated on a support, and those in which an image-like resist layer is formed by an electrophotographic method or the like. Includes those in which the layer is provided on a support.

Typical photosensitive substances contained in the above photosensitive layer include, for example, photosensitive diazo compounds, photosensitive azide compounds,
Examples include a compound having an ethylenically unsaturated double bond, an epoxy compound that polymerizes with an acid catalyst, a silyl ether polymer that decomposes with an acid, a combination of a compound having a c-oc-c group, and a photoacid generator. It will be done. Examples of photosensitive diazo compounds include 0-quinonediazide compounds as positive types that change to alkali solubility upon exposure, and aromatic diazonium salts as negative types that decrease solubility upon exposure.

The alkaline developer used in the present invention is preferably an aqueous alkaline developer, and the alkaline agents used in the developer include sodium silicate, potassium silicate, sodium hydroxide, lithium hydroxide, tribasic sodium phosphate, and Inorganic alkaline agents such as sodium diphosphate, potassium triphosphate, potassium diphosphate, ammonium triphosphate, ammonium diphosphate, sodium metasilicate, sodium bicarbonate, sodium carbonate, potassium carbonate, ammonium carbonate, etc. Organic alkaline agents such as mono-, di-, or triethanolamine and tetraalkylammonium hydroxide, ammonium silicates, and the like are useful.

The content of alkaline agent in the developer composition is 0.05
It is suitable to use it in a range of 30% by weight, more preferably 0.1 to 20% by weight.

The developer used in the present invention can further contain an organic solvent. Examples of organic solvents include ethylene glycol monophenyl ether, benzyl alcohol, n-
Propyl alcohol and the like are useful. The content of the organic solvent in the developer composition is preferably 0.5 to 15% by weight, and more preferably 1 to 5% by weight.

It is preferable that the developer further contains a surfactant, particularly an anionic surfactant. Examples of anionic surfactants include higher alcohol (CS-C22) sulfate ester salts [e.g., sodium salt of lauryl alcohol sulfate, octyl, sodium salt of alcohol sulfate, ammonium salt of lauryl alcohol sulfate, rTeepol B-814 (trade name)・Shell Chemical Co., Ltd.), sodium chloride alkyl sulfate]
, fatty alcohol phosphate ester salts (e.g., sodium salt of cetyl alcohol phosphate ester), alkylaryl sulfonate salts (e.g., sodium salt of dodecylbenzenesulfonic acid, sodium salt of isopropylnaphthalenesulfonic acid, sinaphthalene disulfonic acid) , sodium salt of metanitrobenzenesulfonic acid, etc.), sulfonate salts of alkylamides (
For example, C,7H,,C0NCHICI(,SO,Na
CH.

), sulfonic acid salts of dibasic fatty acid esters (e.g., sodium sulfosuccinate dioctyl ester,
sodium sulfosuccinate dihexyl ester). Among these, sulfonate salts are particularly preferably used.

The following additives can be added to such a developer in order to further improve the developing performance. For example, JP-A-5
Na1jl, KCl2K described in Publication No. 8-75152
Neutral salts such as Br, EDTA described in JP-A-58-190952.

Chelating agents such as NTA, [Co(NHs)]5C(13,C0CQz
' 6 HzO and other complexes, sodium alkylnaphthalene sulfonate described in JP-A No. 50-51324, N
Anionic or amphoteric surfactants such as -tetradecyl-N,N-dihydroxyethylbetaine, U.S. Patent No. 4,3
Nonionic surfactants such as tetramethyldecynediol described in No. 74,920, JP-A-55-95946
Cationic polymers such as the quaternized methyl chloride of p-methylaminomethylpolystyrene described in JP-A-56-142528, and high amphoteric polymers such as the copolymer of vinylbenzyltrimethylammonium chloride and sodium acrylate described in JP-A-56-142528. Molecular electrolyte, JP-A-57-1
Reducing inorganic salts such as sodium sulfite described in Japanese Patent Publication No. 92952, inorganic lithium compounds such as lithium chloride described in JP-A No. 58-59444, organic lithium compounds such as lithium benzoate described in Japanese Patent Publication No. 50-34442,
Organometallic surfactants containing Si, Ti, etc. described in JP-A-59-75255, organoboronic compounds described in JP-A-59-84241, European Patent Road 101,
Quaternary ammonium salts such as tetraalkylammonium oxide described in No. 010, benzyl alcohol,
Examples include organic solvents such as ethylene glycol monophenyl ether, etc.

As a method for developing a non-silver salt photosensitive material with such a developer, various conventionally known methods can be used. Namely, methods include spraying a developing solution from a number of nozzles onto the image-exposed photosensitive layer of a non-silver salt photosensitive material, methods of immersing the photosensitive layer in a large amount of a developing solution, and methods of spraying the photosensitive layer of a non-silver salt photosensitive material onto the surface of the photosensitive layer of the non-silver salt photosensitive material. Examples include a method of applying a developer using a roller.

Alternatively, after supplying a developer to the photosensitive layer of a non-silver salt photosensitive material as described above, or by lightly rubbing the surface of the photosensitive layer with a brush while immersed in the developer, a method may also be used. can.

In the present invention, when it is necessary to treat two or more types of waste liquids, it is preferable from the viewpoint of workability and other aspects that they are treated together.

Next, the means for treating waste liquid and separating it into solid content and water in the present invention will be described.

The apparatus for carrying out the method of the invention is constructed, for example, as shown in the schematic diagram of FIG.

A waste liquid tank 1 containing waste liquid discharged from a processing apparatus for non-silver salt photosensitive materials is piped to an inlet 19 of a cylindrical portion 11 of an evaporator 10 with a pump P1 and a filter F1 connected in series. Further, the overflow liquid from the evaporator lO is collected from an overflow port 18 provided in the conical wall portion 12 of the evaporator to a waste liquid tank l through a silicon tube. The tank is provided with a liquid level gauge 5,
This allows the liquid level to be detected.

Cylindrical part 11, upper conical wall part 12, and lower constricted part 2
The evaporator 10, which constitutes a container by a liquid reservoir 26 having a sludge discharge port 14, is connected to a sludge receiving port 31 of a sludge separator 30 from a lower sludge discharge port 14. It is coupled to tank 40.

And evaporator lO, sludge separator 30,
A liquid circulation device 45 is piped between the sludge tanks 40 so that the liquid is returned and circulated by a pump P2.

Further, the evaporator IO is provided with a heat generating member 15 filled with a fired semiconductor that generates heat and ultrasonic waves when energized, and mesh members 16 and 17. This net-like member may be either one. A liquid level gauge 22 is also provided.

The evaporated gas of the waste liquid passes through the heat exchanger 72 from the outlet 13,
It passes through a cooler 52 and is connected to the lower part of an absorption tank 62, and the condensate (water) is piped from an outlet 65 to a recovery container 68 via a filter F.

Non-condensable gas is circulated from the upper part of the absorption tank 62 to the lower part, and a part of the gas is returned to the evaporator IO through the heat exchanger 72.
A reflux device 70 is provided to facilitate the delivery of the condensate to the collection vessel 38 .

Inside the evaporator IO, one or both of the mesh members 16, 17 are preferably provided near the outlet of the evaporated gas and in the path of the evaporated gas to the outlet.

This net-like member can prevent the inconvenience that the waste liquid droplets scattered from the surface of the waste liquid together with air bubbles generated in the waste liquid are mixed with the evaporated gas and discharged from the discharge port.

This mesh member 16.17 has a mesh opening of 0.5 to 1.3 m.
A suitable size is approximately m. Specifically, for example, 0,
A stainless steel wire mesh having a pitch of about 2n+m- and a pitch of about 1.0 mm can be used. Further, it is preferable to provide this net-like member in two layers as shown in the figure in order to achieve the above-mentioned effect.

In the evaporator IO, it is preferable that the evaporated gas outlet 13 is provided at the center of the upper end of the conical wall portion 12, and the sludge outlet 14 is provided at the lower end. In this embodiment, the inner wall surface between the cylindrical portion 11 of the main body of the evaporator IO and the evaporated gas outlet 13 is at an angle of 20° with respect to the vertical direction.
Having a conical wall 12 with an angle of ~40°,
This is preferable because waste liquid droplets that are scattered from the waste liquid surface as the waste liquid evaporates and adhere to the inner wall surface easily flow downward.

It is desirable to provide a liquid level gauge 22 inside the evaporator IO. Then, by providing a device that controls the operation of the pump P that supplies waste liquid so as to maintain the liquid level of waste liquid inside the evaporator at a predetermined level based on the result detected by the liquid level gauge, the waste liquid The supply work to the evaporator IO becomes simple.

The volume of the portion of the evaporator IO in which waste liquid is accommodated varies depending on the heat generating member, but is suitably 1-10 ff per power I Kw supplied to the heat generating member, preferably 1.5 to 5Q. In addition, the volume of the upper void part to prevent bubbles from flowing out and bumping is 0.5 of the volume of the waste liquid storage part.
~4 times, more preferably 0.7 to 2.5 times is appropriate.

In the apparatus shown in FIG. 1, the sludge separator 30 is a device that separates and stores sludge generated by processing waste liquid in the evaporator 10 from the evaporator 10, and a sludge tank 40 is connectably connected to the lower end of the sludge separator 30. Also, the sludge tank 40, evaporator 10 and/or! This includes a liquid circulation device 45 that connects the sludge separator 30 with piping and circulates the liquid so that the liquid inside the sludge separator 30 flows from the sludge separator 30 through the connection part 35 to the sludge tank 40. It is preferable to do so. By adding such a liquid circulation device 45, the workability of the sludge discharge work is improved.

If the waste liquid to be treated with the evaporator contains a dispersion of a polymer compound, it is preferable to remove these in advance using the filter F1 before introducing it into the evaporator.

By adding such a waste liquid treatment step, it is possible to avoid the solid matter generated from the waste liquid from becoming viscous due to heating by the heat generating member inside the evaporator, and it is possible to generate a smooth and easy-to-handle solid substance.

The evaporator 10 includes the following evaporated gas processing device 5.
By adding 0, harmful gases (for example, ammonia gas, sulfur dioxide gas, various organic solvents, etc.) contained in the evaporated gas can be removed very effectively.

This evaporated gas processing device 50 includes a cooler 52, an absorption tank 62, and an evaporated gas outlet 1 of an evaporator IO.
3 and a cooler 52, and the cooler 52 and an absorption tank 62, and the absorption tank 62 has an absorbent storage section 6 inside.
4. A condensate discharge port 65 at the lower end and a piping device 71 that circulates non-condensable gas from the upper part to the lower part of the absorption tank 62.
has.

As the cooling means in the cooler 52, for example, a device in which cooling water is passed through a large number of thin tubes inside the cooler is used.

The absorption tank 62 may normally have a vertical cylindrical shell, and the absorbent may be activated carbon or other appropriate absorbent depending on the purpose. The size of the absorbent storage section 64 may be selected appropriately depending on the amount of waste liquid to be processed, the type of waste liquid, etc., but as a guide, the processing waste liquid of a normal positive or negative PS plate developer should be 10Q.
When processing at a rate of 724 hours, the inner diameter is 20a + m-1
00■, height of about 200mm-1000m++ is appropriate.

It is preferable that the evaporated gas processing device 50 is provided with a non-condensable gas reflux pipe 73 as described below.

According to this aspect, harmful gases in the non-condensable gas can be absorbed even better.

The reflux device 70 including the piping device 71 and the reflux piping 73 is a reflux piping that pumps non-condensable gas into the evaporator 10 from the middle of the piping of the piping device 71 that sends gas from the upper part of the absorption tank 62 to the bottom thereof. 73, and a heat exchanger 7 that exchanges heat between the non-condensable gas before being introduced into the evaporator IO and the evaporated gas discharged from the evaporator 10.
2.

Further, it is preferable that the absorption tank 62 has its condensate discharge port connected to the filter device F. By passing through this filter device F2, the impurity content of the condensate can be further reduced.

As a preferable embodiment of the heat generating member 15 used in the present invention, as described above, the inner diameter is 5 mm to 30 mm, and the wall thickness is 1 mm to 5 mm.
Corrosion resistant, heat resistant and thermally conductive material (
For example, a pipe made of stainless steel whose inside is insulatingly coated with silicone resin, etc., but at least a part of the part that enters the waste liquid is filled with a sintered body of semiconductor composition powder. Examples include those in which the required length of the filled portion is shaped so that it can be immersed in the waste liquid (for example, the portion submerged in the liquid is coiled). Both ends of the semiconductor member 15 are connected to the upper evaporator wall surface 12 or 24 from the waste liquid level.
Connect it to the connector 23 provided in the main body, and connect it to an external power source. In such an embodiment, the length of the semiconductor filling part in the waste liquid of the semiconductor member 15 is 4 g/min per 1 g/min of waste liquid treatment capacity.
■~20m is appropriate.

The fired semiconductors used in the present invention that generate heat and ultrasonic waves when energized include CuO1Cu, 01ZnO, and Ni.
01N i ,O,,CdO,Bad, ,WO,,W
O,, MOO2, Yb20. ,Y2O,,Fe2O3
, Fe50i Fe01C, Si, Ga, Ge, 5eST
iO,Ti01Ti,O,,Coo,Co,03,Co
,OiAff,03,CrO,P,As,Cr,Ox,
CrO, MnO.

Examples include fired products of mixtures selected from metal oxides or elements such as MnO□, Mn, O, and components such as SiC. Metal elements of the metal oxides or other elements (A g % A u
% P L s etc.) or 5i02, Na2O, Kz
OlCaOlMgO or the like may be added.

Preferred embodiments include those having the following composition.

As a preferred embodiment of treating waste liquid with the fired semiconductor in the present invention, granular fired semiconductor is filled inside a corrosion-resistant, heat-resistant, and thermally conductive hollow pipe, and the pipe is immersed in the waste liquid to be treated and energized. Examples include an embodiment in which heat and ultrasonic waves are generated.

In such an embodiment, the particle size of the granular semiconductor mixture is about 0.01+++m to 0.2mm, and the inner diameter is 5m.
For example, the granular fired semiconductor is placed in a stainless steel hollow pipe with a diameter of 30 mm and a wall thickness of about 1 mra to 5 mm, the inside of which is insulated. The waste liquid treatment capacity is 4 II l per 1 g/min.
l! It is possible to use a material filled to a filled length of about 1 to 20 ma+.

In the method of the present invention, waste liquid is treated to separate solids and water, and the separated water is used as dilution water for a concentrated developer. In this way, by circulating and reusing the active ingredient (solvent) contained in the waste liquid, water resources can be saved and the amount of waste can be extremely reduced. Furthermore, it is also possible to omit water and drainage piping equipment associated with the installation of an automatic developing machine.

As a method of using the separated water, for example, a dilution tank installed in an automatic processing machine that holds dilution water for concentrated developer solution is connected with a collection container that holds water separated from waste liquid, and the dilution tank is connected with piping. An example of this method is to control the amount of liquid in the water tank and automatically send the water in the collection container to the dilution tank.

The method of the present invention combines the above-mentioned specific waste liquid treatment method with a treatment step in which the developer is an alkaline developer and the treatment step includes washing with repeatedly used washing water after treatment with the developer. This combination of methods has made it possible to realize an extremely practical method for processing non-silver salt photosensitive materials, including the treatment of waste liquid and the utilization of resources recovered from the waste liquid. .

The waste liquid to which the waste liquid treatment method of the present invention can be applied includes the above-mentioned developer, washing water from the washing process after development processing, desensitization treatment liquid,
Contains waste liquids such as rinsing liquid and surface preparation liquid.

The automatic developing machine used in the method of the present invention includes a developing step in which an alkaline developer is supplied to the surface of the photosensitive material to perform elution type development;
The non-silver salt photosensitive material has a washing step in which the non-silver salt photosensitive material is automatically transported and sequentially passes through these steps. An embodiment thereof is shown in FIG. In FIG. 2, lot is a developing section, 102 is a washing section for washing with repeatedly used washing water, 103 is a rinse/gum section for rinsing or desensitizing, 101a is a developer tank, and 1olb is a washing section for washing with water for repeated use. 102a is a rinsing water tank; 1O3a is a rinse/gum solution tank that contains rinsing solution or gum solution; lo
4 is a non-silver salt photosensitive material; 105, 106, 107 is a processing liquid supply pipe; 108, 109; 110 is a pump; 111
112 is a dilution water tank that contains dilution water for the concentrated developer; 113 is a mixing tank that mixes the concentrated developer and dilution water. In Fig. 1, *1 and *1, *2 and *2, and *3 and *3 are connected by piping, respectively.

The automatic developing machine shown in FIG. 2 includes the waste liquid processing apparatus shown in FIG. 1, and the developing waste liquid tank 101 of the automatic developing machine.
b. The washing water tank 102a and the rinsing gum liquid tank 103a are connected by piping so that the liquid can be sent to the waste liquid tank l of the waste liquid treatment apparatus shown in FIG.

The solid matter (sludge) obtained by treating waste liquid by the method of the present invention is disposed of, and the water can be discharged into the sewer system depending on its quality, or can be used as dilution water for processing solutions such as developing solutions. be able to.

〔Example〕

Example 1 Using the apparatus shown in FIG. 1, the capacity of the evaporator 10 was set to 1.612. The volume of the void part is 2Q, and the heat generating member is a semiconductor component (main components are Fe, 0.0, Coo,
,WO,,C,^12zOs,Ni,Na2O,SiO
, Ca0) powders (average particle size approximately 50 μm) were filled into a stainless steel pipe (10a+md) whose inside was baked and painted with silicone resin to a filling length of 200n+m, and AClooV, 10A was energized for 15 minutes to sinter it. The energizing power at that time was set to AC 100 V% IOA. The capacity of the waste liquid tank 1 was set to 20 g, and the capacity of the collection container 68 was set to 1off.

Filter F1 uses TC-1 (manufactured by Tocel), approximately 1000 g of coconut grain activated carbon is used as an absorbent in the absorption tank 62, and activated carbon cartridge AP-1 from Kyuno Co., Ltd. is used for filter F2.
No. 17 were used, respectively.

As an automatic developing machine, one of the embodiment shown in FIG. 2 was used.

The developing solution (mother solution and replenisher) is as follows (A) and (B)
Mix these in the following ratio (volume ratio) to make it.

(A) Concentrated developer A Potassium silicate (Nippon Kagaku Kogyo Co., Ltd.) 30g Potassium hydroxide 220g Emulgen 950 (trade name, surfactant, Kako Co., Ltd.) 3gE
DTA 1.5
g water
1Q (B) Water
15Q (A) = (B) Mother liquid 1:5 Replenisher liquid 1:3 (Note) "Mother liquid" is the developer that is put into the developer tank 101a at the beginning of the development process.

As the non-silver salt photosensitive material, a positive type 25th edition SMP-N (trade name, manufactured by Konica Corporation) with a size of 10010O3800 mm was used, and the developer tank 101a was filled with the developer described above.

The developer is injected from the developer supply nozzle 105 and used in circulation, and the amount of replenisher is 50III per PS plate.
I named it Q.

The washing water tank 102a was filled with 1,512 liters of water, which was injected from the processing liquid supply nozzle 106 to the PS plate, and the water that flowed down and returned to the washing water tank 102a was circulated and used.

A rinsing liquid having the following composition was put into the rinsing gum liquid tank 103a, and was supplied to the PS plate from the processing liquid supply nozzle 107, and the liquid flowing down and returning to the rinsing gum liquid tank 103a was circulated and used.

Rinse liquid di(2-ethylhexyl) sulfoko acid ester sodium salt...30 parts by weight Sodium dihydrogen phosphate dihydrate...10 parts by weight Citric acid-hydrate...2 parts by weight phosphorous Acid (85%) ... 0.3 parts by weight Pure water ... 1000 parts by weight After processing 500 PS plates in this manner, 22.5 L of developing waste liquid 1 in the washing water tank 102a
5Q and the waste liquid 10 in the rinse gum liquid tank 103a
When the sample No. 12 was put into the waste liquid tank l of the waste liquid treatment apparatus shown in FIG. 1 and treated with the waste liquid treatment apparatus shown in FIG. 1, the time required for waste liquid treatment was 48 hours. The recovered liquid is approximately 4
The water was clear, colorless, odorless, and similar to distilled water. The recovered sludge was a smooth, non-adhesive granular material with an apparent volume (bulk) of approximately 0.7α.

In the above treatment, 42Q out of 45Q of water contained in the consumed treatment liquid was recovered, and the recovery rate was 93%.

Further, the ratio of the amount of water recovered to the amount of processing liquid consumed was 88% (by weight).

The amount of the mixed waste liquid that can be processed by the filter F1 up to the allowable limit for use is 1500Q, and the amount that can be processed by the absorption tank 62 is 1600Q. In addition, the time required to replace the filter used in the filter F1 and the activated carbon used in the absorption tank 62 is short (about 5 minutes for the former and about 7 minutes for the latter), and the work is easy. Ta.

The cooling water in the cooler 52 was circulated and used, passing through a not-shown heat exchanger to exchange heat with the atmosphere.

Example 2 Negative type 28 plate 5WN (trade name, manufactured by Konica Corporation) Kikuzen plate was used as a non-silver salt photosensitive material, and the following (A) was used as a developer.
and (B) are mixed to make a developer, rinse gum tank 1
The following gum solution was put in 03a, the developer waste solution and the gum solution waste solution were treated together, and the separated and recovered water was used as dilution water for the gum solution. An experiment similar to Example 1 was conducted.

A developing solution (working solution) was prepared by mixing the following (A) and (B) at the following ratio (volume ratio).

(A) Concentrated developer Benzyl alcohol 360g Jetanolamine 210g Perex NBL (trade name, manufactured by Kako Co., Ltd., sodium t-butylnaphthalene sulfonate) 180g Potassium sulfite 90g Water

3Q (B) Water (A) : (B) Mother liquor 1:3 Replenisher 1:3 (Note) "Mother liquor" is the developer that is placed in the developer tank 1ola at the beginning of the development process.

Gum liquid dextrin (manufactured by Hikaku Chemicals) 20g Carboxyl methyl cellulose 1g 75% phosphoric acid 0.6g Nisonokol 0TP-100 (manufactured by Nikko Chemicals) 0.2g
Span 20 (manufactured by Kako Co., Ltd.) 0.2g
Pure water: 200 mQ After processing the above number of 25 plates, the amount of developing waste liquid was 27a1, the amount of washing waste liquid was 15 L, the amount of rinsing and gum liquid waste was 10 ff, and the time required for waste liquid treatment was 42 hours. The recovered liquid was approximately 40 ff of water, colorless and transparent, odorless, and similar to distilled water. The recovered sludge is a smooth, non-adhesive granular material with an apparent volume (bulk) of approximately 0.
It was 5Q.

In the above treatment, 40Q out of 44Q of water contained in the consumed treatment liquid was recovered, and the recovery rate was 93%.

Further, the ratio of the amount of water recovered to the amount of processing liquid consumed was 85% (by weight).

In addition, with respect to the mixed waste liquid, the amount that the filter F could process until reaching the allowable limit for use was 180,012, and the amount that the absorption tank 62 could also process was 1,200Q. Further, the workability for replacing the filter and activated carbon was the same as in Example 1.

Example 3 The water washing section 102 in Fig. 2 was treated with a rinsing liquid, and the conditions were the same as in Example 1), and the rinse/gum section 103 was treated with a gum liquid, and the conditions were the same as in Example 2. When the developer waste solution, rinsing waste solution, and gum waste solution were treated together, almost the same results as in Examples 1 and 2 were obtained.

〔Effect of the invention〕

According to the present invention, the following effects can be obtained. 1 (1
) The space required for waste liquid treatment can be reduced.

(2) Workability of waste liquid treatment work is improved.

(3) The cost required for waste liquid treatment is reduced.

(4) Water resources can be reused.

[Brief explanation of the drawing]

FIG. 1 is a schematic diagram of a waste liquid treatment device used in the present invention;
FIG. 2 is a schematic side sectional view of an automatic developing machine used in an embodiment of the present invention. l... Waste liquid tank F r , F 2... Filter P t, P 2. Ps...Pump lO...Evaporator 11...Cylindrical part 12...
・Conical part 16.17...Mesh member 15...
- Heat generating member 26...Liquid reservoir 30...Sludge separator 40...Sludge tank 45...Liquid circulation device 50...Evaporation gas treatment device 52...Cooler 62...Absorption tank 6
4... Absorbent storage section 68... Collection container 70...
- Circulation device 71...Piping device 72...Heat exchanger 101...Developing section 101a...Developer tank 101b...Developer waste liquid tank 102...Water washing section 102a...Washing water tank 103 ... Rinse gum part 103a ... Rinse gum liquid tank 104 ... Non-silver salt photosensitive material 105, 106, 107 ... Processing liquid supply nozzle 108
．． 109.110... Pump 111... Concentrated developer tank 112... Dilution water tank 113... Mixing tank

Claims (1)

[Claims] (1) A method for processing a non-silver salt photosensitive material, which includes a step of washing with repeatedly used washing water after alkaline development using an automatic developing machine, the method comprising processing at least one of a developing waste solution and a washing waste solution. 1. A method for processing a non-silver salt photosensitive material, comprising a step of separating solid matter and water. (2) It has a development processing section, a washing processing section that performs washing using repeatedly used washing water, and a conveyance means that sequentially passes through the development processing section and the washing processing section, and the development processing section and the washing 1. A processing apparatus for non-silver salt photosensitive materials, comprising means for treating waste liquid from a processing section and separating it into at least solid matter and water.