JPH07171528A - Washing apparatus - Google Patents

Washing apparatus

Info

Publication number
JPH07171528A
JPH07171528A JP34567793A JP34567793A JPH07171528A JP H07171528 A JPH07171528 A JP H07171528A JP 34567793 A JP34567793 A JP 34567793A JP 34567793 A JP34567793 A JP 34567793A JP H07171528 A JPH07171528 A JP H07171528A
Authority
JP
Japan
Prior art keywords
water
tank
cleaning
separation tank
work
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP34567793A
Other languages
Japanese (ja)
Inventor
Yasuo Kodama
泰雄 児玉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SONITSUKU FUEROO KK
Original Assignee
SONITSUKU FUEROO KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SONITSUKU FUEROO KK filed Critical SONITSUKU FUEROO KK
Priority to JP34567793A priority Critical patent/JPH07171528A/en
Publication of JPH07171528A publication Critical patent/JPH07171528A/en
Pending legal-status Critical Current

Links

Landscapes

  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

PURPOSE:To peel and remove the washing water attached to a work substitutionally with high efficiency by water substituting oil in water washing not generating an environmental pollution problem and an environmental disruption problem. CONSTITUTION:A washing tank 3' is formed in a first separation tank 7' and a stagnation weir 14 is formed to the second separation tank 7'' adjacent to the separation tank 7' and a flooding weir 15 is formed to the water substituting oil recovery tank 8' further adjacent to the tank 7'' to be faced to the weir 14. Shaking is applied to a work 1 and drain 6' is stored in the lower part of the second separation tank 7'' and water substituting oil 6'' is stored in the water substituting oil recovery tank 8' through a sufficient stagnation time to be refluxed to the nozzle 13 disposed in the upper part of the washing tank 3' by a reflux passage 17. By this constitution, the washing water attached to the work is substitutionally and certainly removed and discharged in a full- automatic manner by the water substituting oil and the reutilization of the water substituting oil due to recovery is certainly performed and precise washing and cost reduction are certainly performed.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】開示技術は、半導体ウエハ等の電
子部品や光学機械製品等の精密部品の前段工程に於て加
工されたものを精密洗浄する技術の分野に属する。
BACKGROUND OF THE INVENTION The disclosed technology belongs to the field of technology for precisely cleaning an electronic component such as a semiconductor wafer or a precision component such as an optical mechanical product that has been processed in the preceding step.

【0002】[0002]

【従来の技術】周知の如く、近代文明の発達は科学技術
の隆盛に負うところが大であり、特に、近時の精密機械
や電気,電子装置類の発達に支えられていることが極め
て大である。
2. Description of the Related Art As is well known, the development of modern civilization largely depends on the rise of science and technology, and in particular, it is extremely important that it is supported by the recent development of precision machinery, electric and electronic devices. is there.

【0003】したがって、該種精密機械部品等の製造は
その精密さが著しく厳しく要求されるようになってい
る。
Therefore, the precision of the kind of precision machine parts is required to be extremely high.

【0004】而して、該種さまざまの機械電子装置や光
学機械装置の部品は複雑な機能を有しているがために、
各部品自体は勿論のこと、これらの取り合い機構は所謂
ミクロン単位を越えてサブミクロン単位の精巧さがより
更に高度に要求されるようになっているが、これらの精
巧さは単に製造時の加工工程における精巧さのみなら
ず、仕上げ工程における清浄さについても同様にミクロ
ン単位を越えてサブミクロン単位の清浄さが求められ、
かかるサブミクロン単位の清浄さが得られなければ装置
類の本来的な機能が設計通りに発揮されないようにまで
もなってきている。
Therefore, since the components of the various types of mechanical electronic devices and optical mechanical devices have complicated functions,
Not only the individual parts themselves, but also the assembling mechanism of these sub-micron units have been required to exceed the so-called micron unit, and the sophistication is simply required at the time of manufacturing. Not only the sophistication in the process but also the cleanliness in the finishing process requires submicron-level cleanliness beyond the micron level.
Unless such cleanliness in submicron units can be obtained, the essential functions of the devices cannot be achieved as designed.

【0005】したがって、装置部品にあっては単に加工
工程における精密さのみならず、仕上げ工程における精
密洗浄も不可欠となっている。
Therefore, not only the precision in the working process but also the precision cleaning in the finishing process is indispensable for the device parts.

【0006】そのため、かかる精密工業製品は前段工程
における製造工程にあっては、切削,研摩等の種々の工
程があるところから、ワークには不可避的に切粉,油
脂,作業環境周辺からの塵埃付着等微細な好ましくない
付着物が多く、したがって、これらの微細付着物は当該
装置部品等の本来的な機能発揮には著しい障害を及ぼす
ために最終製品の前に仕上げ工程にて洗浄作業を介して
これらの付着物を剥離,除去することが必要不可欠であ
り、当該洗浄作業にあっては洗浄剤を用いて複数段の洗
浄工程を経て最終的に乾燥等して次段の組付工程等仕上
げ工程へと搬送されてゆくようにされている。
Therefore, in the manufacturing process of such a precision industrial product, there are various processes such as cutting and polishing in the manufacturing process in the first stage, so that the work inevitably has chips, oils, and dust from the surroundings of the working environment. There are many fine and undesirable deposits such as deposits.Therefore, since these fine deposits significantly impair the original functioning of the device parts, etc., cleaning work is performed before the final product in the finishing process. It is indispensable to peel off and remove these deposits by using the cleaning agent, and in the cleaning operation, the cleaning agent is used to go through a plurality of cleaning steps and finally dry, etc. It is supposed to be transported to the finishing process.

【0007】これに対処するに仕上げ工程の精密洗浄に
あってこれまでフロンやトリクロロエタン等の各種の有
機系,無機系の洗浄液が用いられてこれに応えてはいた
が、反面かかるフロンやトリクロロエタン等の洗浄液は
大気汚染等の公害問題を引き起こすばかりでなく、オゾ
ン層破壊等の環境問題が全地球規模で無視出来ないほど
クローズアップされるようになり、地域的な、或いは、
特定のメーカーによる問題のみならず、国際的な社会的
問題ともなって、例えば、1995年までに使用は勿
論、製造も出来ないようになり、法規制の介入さえ止む
を得ないものとなってきており、そのため、かかるフロ
ンやトリクロロエタン等の公害問題や環境問題に重要な
影響のある洗浄剤の不使用の条件は次第に水洗浄にとっ
て代えられるようになり、多くの製造現場にあっては、
例えば、純水による洗浄が導入実施されつつある。
In order to deal with this, in the precision cleaning in the finishing process, various organic and inorganic cleaning liquids such as CFC and trichloroethane have been used so far to meet the demand. Not only causes pollution problems such as air pollution, but also environmental problems such as ozone layer depletion have come to the point of not being ignored on a global scale.
Not only problems by specific manufacturers but also international social problems, for example, by 1995, it became impossible to use and manufacture, and even the intervention of laws and regulations became unavoidable. Therefore, the non-use condition of the cleaning agent, which has an important influence on pollution problems and environmental problems such as Freon and trichloroethane, is gradually replaced by water cleaning, and in many manufacturing sites,
For example, cleaning with pure water is being introduced.

【0008】そして、さまざまな洗浄技術、例えば、超
音波洗浄等の付加により純水洗浄が所望通りに行えるレ
ベルに達してはきているが、これまた新たな問題がネッ
クとして浮上してきている。
Although various cleaning techniques such as ultrasonic cleaning have been added to a level where pure water cleaning can be performed as desired, a new problem is emerging as a neck.

【0009】[0009]

【発明が解決しようとする課題】即ち、純水による洗浄
はフロンやトリクロロエタン等の問題をクリアーする技
術とはされているものの、当該洗浄工程において、ワー
クに付着した水は乾燥工程を経て除去されるようにはさ
れているものの、複雑機構部にあっては必ずしも充分に
乾燥除去されるとは限らない場合もあり、付着状態のま
ま残留する場合には、当該ワークの錆発生にもつながり
かねないという不都合さがある。
That is, although cleaning with pure water is said to be a technique for clearing the problems such as freon and trichloroethane, the water adhering to the work is removed through a drying process in the cleaning process. However, the complicated mechanism may not always be sufficiently dried and removed, and if it remains in the adhered state, it may lead to rust on the work. There is the inconvenience of not having it.

【0010】そこで、これに対処するに、水洗浄後に付
着した水に対しこれを除去し錆発生等を防止するべく、
所謂水置換油(MNS)が開発されて洗浄に使用される
ようになってきた。
Therefore, in order to deal with this, in order to prevent water from adhering after washing with water to prevent rust from occurring,
So-called water displacement oils (MNS) have been developed and used for cleaning.

【0011】かかる水置換油(MNS)はワークに付着
している水を除去するように洗浄工程にあって当該ワー
クに対し2相的に処理されているところから、作業上次
のような問題が生じている。
Since such water-displacing oil (MNS) is treated in a cleaning process so as to remove water adhering to the work in a two-phase manner, the work has the following problems. Is occurring.

【0012】即ち、ワークに対し付着している洗浄水と
水置換油の置換時に当該ワークから剥離される排水の処
理と新たな水置換油の補給、乃至、均一濃度保持等が一
律に行い得ないという難点があり、これに対処するに、
図2に示す様なシステムが考えられはする。
That is, it is possible to uniformly treat the wastewater separated from the work when the cleaning water adhering to the work is replaced with the water replacement oil, supply new water replacement oil, or maintain a uniform concentration. There is a difficulty that there is not, and to deal with this,
A system like that shown in FIG. 2 is conceivable.

【0013】即ち、前段工程にて所定に加工されたワー
クとしての被洗浄物1は液面計2を有する洗浄槽3内に
ケージ4ごと所定の搬出入機構5により搬入され、該洗
浄槽3内に所定量貯留されている水置換油6によりその
前段の水による洗浄工程で付着している洗浄水と該水置
換油6が置換されて洗浄作用を受け、次段の乾燥工程へ
と移送されるようにされ、而して、該洗浄槽3に於て洗
浄作業に供された水置換油6と剥離,除去された排水と
はこれに接続する分離槽7に排出されて比重差による沈
降排水6' は適宜に排出され、上位の水置換油6''は回
収槽8に供給されてポンプ9、フィルタ10を経て洗浄
槽3に循環して回収的に再利用に供されるようにされ、
各槽に於ける液面制御,貯留量制御はリミットスイッチ
11、電磁弁12,12…により制御装置13を介して
電気的に制御されるようにする。
That is, the object to be cleaned 1 as a workpiece which has been processed in a predetermined manner in the previous step is carried into a cleaning tank 3 having a liquid level gauge 2 together with a cage 4 by a predetermined loading / unloading mechanism 5, and the cleaning tank 3 The water replacement oil 6 stored in a predetermined amount replaces the cleaning water adhering in the cleaning process with water in the preceding stage and the water replacement oil 6 to undergo a cleaning action, and is transferred to the next drying process. Thus, the water displacement oil 6 that has been used for the cleaning operation in the cleaning tank 3 and the waste water that has been peeled off and removed are discharged to the separation tank 7 connected to the water replacement oil 6 and the difference in specific gravity is caused. The settling wastewater 6'is appropriately discharged, and the upper water replacement oil 6 '' is supplied to the recovery tank 8 and circulated to the cleaning tank 3 through the pump 9 and the filter 10 so that it can be recovered and reused. To be
Liquid level control and storage amount control in each tank are electrically controlled by a limit switch 11, solenoid valves 12, 12, ... Through a control device 13.

【0014】しかしながら、かかるシステムにおいて
は、当該図2に示す様に、複数槽が間接的に通路により
接続され、構造が複雑であり、又、各液面,貯留量の制
御管理が煩瑣であり、又、各通路に於ける流過抵抗や圧
損等の関係からプラント稼動がコスト高を招く不利点と
もある。
However, in such a system, as shown in FIG. 2, a plurality of tanks are indirectly connected by a passage, the structure is complicated, and the control management of each liquid level and storage amount is complicated. Further, there is also a disadvantage that the plant operation causes high cost due to flow resistance and pressure loss in each passage.

【0015】そして、高価な水置換油6''の循環回収に
おけるそれ自体の清浄度が保証がされ難いという不都合
さもある。
There is also the disadvantage that it is difficult to guarantee the cleanliness of the expensive water-displaced oil 6 ″ in the circulating recovery.

【0016】又、上述の制約によりシステムの自動運転
がスムーズになされないという虞がある不具合もある。
There is also a problem that the automatic operation of the system may not be performed smoothly due to the above-mentioned restrictions.

【0017】[0017]

【発明の目的】この出願の発明の目的は上述従来技術に
基づく公害問題や環境調和問題に重大な影響のあるフロ
ンやトリクロロエタン等の洗浄液に代えて水洗浄による
ワークに付着する洗浄水を剥離排除して錆発生防止等を
図り得る水置換油による洗浄に際しての当該水置換油と
ワーク付着水の排水との種々の問題点を解決すべき技術
的課題とし、該ワークに対する精密洗浄が行え、且つ、
公害問題,環境調和問題にも充分対処することが出来、
高価な水置換油の有効循環回収再利用が図れ、又、シス
テム全体の管理制御が確実に行われるようにして精密機
械製造産業における仕上げ技術利用分野に益する優れた
洗浄装置を提供せんとするものである。
OBJECT OF THE INVENTION The object of the invention of this application is to remove the cleaning water adhering to the work by water cleaning instead of the cleaning liquid such as CFC or trichloroethane, which has a serious influence on the pollution problem and environmental harmony problem based on the above-mentioned prior art. Then, when cleaning with a water replacement oil capable of preventing rust generation, etc., it is a technical subject to solve various problems of the water replacement oil and drainage of water adhering to the work, and precision cleaning can be performed on the work, and ,
We can fully deal with pollution problems and environmental harmony problems,
We aim to provide an excellent cleaning device that will benefit the field of finishing technology application in the precision machinery manufacturing industry by ensuring effective circulation recovery and reuse of expensive water-displacing oil and ensuring that the entire system is managed and controlled. It is a thing.

【0018】[0018]

【課題を解決するための手段・作用】上述目的に沿い先
述特許請求の範囲を要旨とするこの出願の発明の構成
は、前述課題を解決するために、半導体ウエハ等の電子
部品や光学機械装置部品等の精密機械製品の前段工程に
おける所定の加工等の処理の後に水洗浄が行われ、該水
洗浄による付着水を有するワークを水置換油により当該
ワークに付着している水を置換適に剥離除去し、次段の
乾燥工程等の仕上げ工程へ移送するに、洗浄槽に於て搬
入されたワークは該洗浄槽中に於て所定の旋回動等の揺
動作用を受け、機械的,物理的に付着水を水置換油によ
り置換的に剥離,除去され、比重差により、沈降させ、
該洗浄槽の下端部から洗浄槽を通して設けられている第
1の分離槽内に排水されて下部に沈降し、水置換油は洗
浄槽の上部、及び、第1の分離槽から溢流して第1の分
離槽に一体的に併設された第2の分離槽に充分な滞留時
間を介し滞留堰を介し流入し、又、第1の分離槽の下端
部から第2の分離槽の下部に排水が流入され、該第2の
分離槽にあって下部に排水が上部に水置換油が積層状に
貯留され、而して、第2の分離槽の上部からは溢流堰を
介し水置換油が充分な滞留時間を介して溢流して水置換
油回収槽に溢流し、第2の分離槽の下部の排水は適宜に
排出され、又、該水置換油回収槽の水置換油は還流通路
を介しポンプによりフィルタを通り、所定に清浄化され
て洗浄槽の上部に還流されて有効再利用に供され、而し
て、各槽は一体的に設けられて制御装置を介しフロート
スイッチ式のリミットスイッチにより電磁弁が動作され
て完全自動的に管理制御され、確実なワークに対する洗
浄が行われるようにした技術的手段を講じたものであ
る。
In order to solve the above-mentioned problems, an electronic component such as a semiconductor wafer or an optical mechanical device has It is suitable to replace the water adhering to the work with the water replacement oil by performing water cleaning after the predetermined processing in the preceding process of precision machinery products such as parts etc. When peeled and removed and transferred to the finishing process such as the next drying process, the work carried in the cleaning tank is subjected to a swinging action such as a predetermined swiveling motion in the cleaning tank, and mechanical, Physically adhered water is removed and removed by substitution with water displacement oil and settles due to the difference in specific gravity,
From the lower end of the cleaning tank, the water is drained into the first separation tank provided through the cleaning tank and settles in the lower part, and the water replacement oil overflows from the upper part of the cleaning tank and the first separation tank and It flows into the second separation tank integrally attached to the first separation tank through the retention weir for a sufficient retention time, and drains from the lower end of the first separation tank to the lower part of the second separation tank. Of the second separation tank, the drainage is stored in the lower portion of the second separation tank, and the water displacement oil is accumulated in the upper portion of the second separation tank in a laminated manner. Thus, the water displacement oil is accumulated from the upper portion of the second separation tank through the overflow weir. Spills over a sufficient residence time and overflows into the water displacement oil recovery tank, the drainage in the lower part of the second separation tank is appropriately discharged, and the water displacement oil in the water replacement oil recovery tank is returned to the reflux passage. After passing through the filter through the filter, it is cleaned to a predetermined degree and is returned to the upper part of the washing tank for effective reuse, and each tank is integrated. The provided limit switch float switched via the control unit fully automatically manage the control solenoid valve is operated, in which cleaning of reliable work took technical means to be performed.

【0019】[0019]

【実施例】次に、この出願の発明の1実施例を図1に基
づいて説明すれば以下の通りである。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The following will describe one embodiment of the invention of this application with reference to FIG.

【0020】尚、図2と同一態様部分は同一符号を用い
て説明するものとする。
The same parts as in FIG. 2 will be described using the same reference numerals.

【0021】図示実施例は半導体ウエハの仕上げ洗浄を
水置換油によって行う態様であり、16はこの出願の発
明の要旨を成す洗浄装置であり、全体システムがプラン
ト式に稼動されるようにされており、洗浄槽3' は第1
の分離槽7' 内の上部に設けられ、一種の二重槽タイプ
にされており、又、該第1の分離槽7' に対し第2の分
離槽7''が一体的に併設され、更に、水置換油回収槽8
' は第2の分離槽7''に対し隔壁8''を介し一体的に併
設され、したがって、これらの洗浄槽3' 、及び、第1
の分離槽7' 、第2の分離槽7''、水置換油回収槽8'
は全て一体的に連設されている。
The illustrated embodiment is an embodiment in which the final cleaning of semiconductor wafers is carried out by water displacement oil, and 16 is a cleaning device which is the subject matter of the invention of this application, and the whole system is operated in a plant manner. The cleaning tank 3'is the first
Is provided in the upper part of the separation tank 7'of a type of double tank, and the second separation tank 7 "is integrally attached to the first separation tank 7 '. Furthermore, the water replacement oil recovery tank 8
'Is integrally attached to the second separation tank 7''through the partition wall 8'', and therefore these cleaning tanks 3'and the first separation tank 7'
Separation tank 7 ', second separation tank 7 ", water replacement oil recovery tank 8'
Are all linked together.

【0022】そして、洗浄槽3' の底部は傾斜式にさ
れ、第2の分離槽7''寄りの排水口3''が形成され、第
1の分離槽7' はその下部が先細テーパ式に絞られてお
り、電磁弁12を介しその底部が第2の分離槽7''の下
部に接続されている。
Then, the bottom of the cleaning tank 3'is made to have an inclined shape to form a drainage port 3 "near the second separation tank 7", and the lower portion of the first separation tank 7'is tapered. The bottom of the second separation tank 7 ″ is connected to the bottom of the second separation tank 7 ″ via a solenoid valve 12.

【0023】尚、洗浄槽3' 、及び、第1の分離槽7'
の底部、及び、第2の分離槽7''、水置換油回収槽8'
にあってはそれぞれフロートスイッチ式のリミットスイ
ッチ11,11,11が設けられて制御装置13' に電
気的に接続されている。
The cleaning tank 3'and the first separation tank 7 '
Bottom, second separation tank 7 ″, water replacement oil recovery tank 8 ′
In this case, limit switches 11, 11, 11 of the float switch type are respectively provided and electrically connected to the control device 13 '.

【0024】又、第2の分離槽7''底部は電磁弁12を
介し適宜の排水処理部に接続されると共に、その電磁弁
12,12、ポンプ9' を介し、適宜の浄化機能を有す
る排水槽7''' に連通的に接続されている。
Further, the bottom of the second separation tank 7 '' is connected to an appropriate waste water treatment section via an electromagnetic valve 12 and has an appropriate purifying function via the electromagnetic valves 12 and 12 and a pump 9 '. It is connected to the drainage tank 7 '''.

【0025】又、該排水槽7''には上述同様フロートス
イッチ式のリミットスイッチ11が設けられて制御装置
13' に電気的に接続されて適宜の排水処理装置に排水
することが出来るようにされている。
Further, the drain tank 7 '' is provided with a float switch type limit switch 11 as described above, and is electrically connected to the control device 13 'so that it can be drained to an appropriate drainage treatment device. Has been done.

【0026】又、水置換油回収槽8' にあってはその底
部は電磁弁12を介し水置換油槽8''' に水置換油を戻
すことが出来るようにされると共に、他の電磁弁12を
介し還流通路17を介しポンプ9、フィルタ10を介し
洗浄槽3' の上部に設けられたノズル13,13に電磁
弁12,12を介し接続されて水置換油回収槽8' から
の水置換油6''を回収して循環式に有効再利用に供する
ことが出来るようにされている。
Further, in the water displacement oil recovery tank 8 ', the bottom portion of the water displacement oil recovery tank 8'is made to be able to return the water displacement oil to the water displacement oil tank 8 "' via the solenoid valve 12 and another solenoid valve. The water from the water replacement oil recovery tank 8'is connected to the nozzles 13 and 13 provided on the upper portion of the cleaning tank 3'via the pump 9 and the filter 10 via the reflux passage 17 and the solenoid valves 12 and 12. The replacement oil 6 ″ can be collected and recycled for effective reuse.

【0027】而して、該洗浄槽3' 内には所定量貯留さ
れる水置換油6''内に浸漬されたワーク1を所定角度旋
回揺動するケージ4' が揺動装置5' に連係されてい
る。
A cage 4'for swinging and swinging the work 1 immersed in the water displacement oil 6 ", which is stored in a predetermined amount in the cleaning tank 3 ', at a predetermined angle is provided in the swinging device 5'. It is linked.

【0028】そして、揺動装置5' 、各電磁弁12、リ
ミットスイッチ11、そして、ポンプ9,9' ,9''、
フィルタ10は制御装置13' に電気的に接続されて所
定のプログラムにより作動することが出来るようにされ
ている。
The rocking device 5 ', each solenoid valve 12, the limit switch 11, and the pumps 9, 9', 9 ",
The filter 10 is electrically connected to the control device 13 'so that it can be operated by a predetermined program.

【0029】2は液面計であり、当該実施例にあっては
水置換油回収槽8' に併設されているが、設計によって
第1,第2の分離槽7' ,7''、及び、洗浄槽3' に付
設することも可能である。
Reference numeral 2 is a liquid level gauge, which is installed in the water displacement oil recovery tank 8'in this embodiment, but by design, the first and second separation tanks 7 ', 7 ", and It is also possible to attach it to the cleaning tank 3 '.

【0030】尚、18,18' は蓋体である。Reference numerals 18 and 18 'are lids.

【0031】上述構成において、所定の加工がなされた
ワーク1が純水等により前段で所定に洗浄されケージ4
' に収納されて洗浄槽3' に所定に貯留されている水置
換油(MNS)6''に浸漬され、制御装置13' を介し
揺動装置5' により所定時間所定傾斜角度旋回揺動さ
れ、物理的機械的に該水置換油6''により水置換作用を
受けて前段の水洗浄工程でワーク1に付着している水を
剥離除去させ、置換された水6' は比重差による沈降を
介し、洗浄槽3' の下端開口の排水口3''より第1の分
離槽7' 内に排水されその下部に重力沈降を介し貯留さ
れる。
In the above-mentioned structure, the work 1 which has been subjected to the predetermined processing is washed in a predetermined stage with pure water or the like, and the cage 4
It is immersed in water replacement oil (MNS) 6 ″ stored in the cleaning tank 3 ′ and stored in the cleaning tank 3 ′, and is swung by the rocking device 5 ′ through the control device 13 ′ for a predetermined time at a predetermined tilt angle. , The water that is physically and mechanically affected by the water replacement oil 6 ″ removes the water adhering to the work 1 in the previous water washing step, and the replaced water 6 ′ settles due to the difference in specific gravity. Through the drainage port 3 ″ at the lower end opening of the cleaning tank 3 ′ into the first separation tank 7 ′ and stored in the lower portion thereof by gravity settling.

【0032】そして、該第1の分離槽7' に所定量の排
水6' が貯留されると、リミットスイッチ11がこれを
検出し、制御装置13' が電磁弁12を開いて併設され
ている第2の分離槽7''の下部に排出する。
When a predetermined amount of waste water 6'is stored in the first separation tank 7 ', the limit switch 11 detects it and the control device 13' opens the solenoid valve 12 and is installed side by side. It is discharged to the lower part of the second separation tank 7 ″.

【0033】尚、この場合、設計によっては該電磁弁1
2の排水通路にポンプを介装して調整的に排水するよう
にしても良い。
In this case, depending on the design, the solenoid valve 1
A drainage passage of No. 2 may be provided with a pump so as to drain the water in a controlled manner.

【0034】一方、洗浄槽3' に於て水置換された水置
換油6''が次述するノズル13からの供給量に合せて設
定量より多くなった場合にはその上部から溢流されて併
設する分離槽7''の上部に供給されて下部の排水6' は
上部にも貯留され得るが、第2の分離槽7''にあっては
滞留堰14が設けられていることにより液面に擾乱を生
ずることなく、静かに溢流して該第2の分離槽7''に於
ける水置換油6''の分離貯留は充分な滞留時間をかけて
確実に行われ、又、他側に設けられている溢流堰15よ
り水置換油回収槽8' に於ける水置換油6''の純度を充
分に保証する。
On the other hand, when the amount of the water-displaced oil 6 ″, which has been water-displaced in the cleaning tank 3 ′, exceeds the set amount in accordance with the supply amount from the nozzle 13 described below, it is overflowed from the upper part. The drainage 6'of the lower part which is supplied to the upper part of the separation tank 7 '' that is also installed can be stored also in the upper part, but in the second separation tank 7 '', the retention weir 14 is provided. The water replacement oil 6 ″ in the second separation tank 7 ″ is separated and stored in the second separation tank 7 ″ without causing a disturbance on the liquid surface, and the separation and storage is reliably performed over a sufficient retention time. From the overflow weir 15 provided on the other side, the purity of the water replacement oil 6 ″ in the water replacement oil recovery tank 8 ′ is sufficiently ensured.

【0035】又、第2の分離槽7''の上部に滞留されて
貯留された水置換油6''は溢流堰15により所定量を越
えると、溢流して隣設する水置換油回収槽8' に貯留さ
れる。
Further, when the water replacement oil 6 ″ accumulated and stored in the upper portion of the second separation tank 7 ″ exceeds a predetermined amount by the overflow weir 15, it overflows and the adjacent water replacement oil recovery is performed. Stored in tank 8 '.

【0036】そして、該第2の分離槽7''の底部の排水
6' が所定量になると、リミットスイッチ11が制御装
置13' にその検出量のデータを送信して電磁弁12を
開き、所定の排水処理装置、或いは、排水槽7''' に供
給するようにされ、そのため、第2の分離槽7''の上部
の水置換油6''の貯留量が増え、又、滞留時間が更に充
分にとられて水置換油回収槽8' に於ける溢流水置換油
6''の純度がより充分に保証されることとなる。
When the drainage 6'at the bottom of the second separation tank 7 "reaches a predetermined amount, the limit switch 11 sends data of the detected amount to the control device 13 'to open the solenoid valve 12, It is designed to be supplied to a predetermined wastewater treatment device or drainage tank 7 ''', so that the storage amount of the water replacement oil 6''at the upper part of the second separation tank 7''increases and the retention time Is more sufficiently taken, and the purity of the overflow water replacement oil 6 ″ in the water replacement oil recovery tank 8 ′ is more sufficiently guaranteed.

【0037】そして、水置換油回収槽8' のリミットス
イッチ11、又は、洗浄槽3' のリミットスイッチ11
の相互独立の動作により水置換油回収槽8' のリミット
スイッチ11が作動して水置換油6''をポンプ9、フィ
ルタ10を介し洗浄槽3' の上部に設けられたノズル1
3,13から該洗浄槽3' 内へ水置換油6''を循環適に
供給する。
Then, the limit switch 11 of the water replacement oil recovery tank 8'or the limit switch 11 of the cleaning tank 3 '
The limit switch 11 of the water replacement oil recovery tank 8'operates by the mutually independent operations of the nozzles 1 provided above the cleaning tank 3'through the water replacement oil 6 '' via the pump 9 and the filter 10.
Water-displacing oil 6 ″ is appropriately circulated from 3, 13 into the cleaning tank 3 ′.

【0038】尚、該各ノズル13は洗浄槽3' の液面に
擾乱を与えないように、即ち、ワーク1の水置換作用に
変化を与えないように静的に供給するための設計であ
る。
The nozzles 13 are designed for static supply so as not to disturb the liquid surface of the cleaning tank 3 ', that is, to change the water displacement action of the work 1. .

【0039】したがって、洗浄槽3' に貯留される水置
換油6''の液面は静的であり、第2の分離槽7''への溢
流も静的に行われて当該第2の分離槽7''に於ける滞留
堰14、及び、溢流堰15による充分な滞留時間を介し
水置換油回収槽8' に貯留される水置換油6''はその純
度が充分に保証され、そのため、該水置換油回収槽8'
の底部での排水6' の貯留は避けられ、回収して循環さ
れる水置換油6''の純度は充分に清浄であり、そのた
め、洗浄槽3' に於けるワーク1に付着している水の置
換的除去排水は確実になされ、各電磁弁12の動作、及
び、ポンプ9、フィルタ10の作動も確実に行われ、シ
ステムの全自動的な設計通りの確実な稼動が保証される
ことになる。
Therefore, the liquid level of the water displacement oil 6 ″ stored in the cleaning tank 3 ′ is static, and the overflow to the second separation tank 7 ″ is also statically performed. Of the water replacement oil 6 ″ stored in the water replacement oil recovery tank 8 ′ through the retention weir 14 in the separation tank 7 ″ of FIG. Therefore, the water replacement oil recovery tank 8 ′
The storage of drainage water 6'at the bottom of the tank is avoided, and the purity of the water replacement oil 6 '' that is collected and circulated is sufficiently clean and therefore adheres to the work 1 in the cleaning tank 3 '. Substitution of water Water is drained reliably, operation of each solenoid valve 12 and operation of pump 9 and filter 10 are also performed reliably, and reliable operation of the system as fully designed is guaranteed. become.

【0040】尚、この出願の発明の実施態様は上述実施
例に限るものでないことは勿論であり、例えば、ワーク
の揺動については傾斜方向の旋回揺動ばかりでなく、平
行姿勢での上下方向等も可能である等種々の態様が採用
可能である。
Of course, the embodiment of the invention of this application is not limited to the above-mentioned embodiment. For example, the swinging of the work is not limited to the swing swing in the tilt direction, but the vertical direction in the parallel posture. It is possible to adopt various modes such as the above.

【0041】[0041]

【発明の効果】以上、この出願の発明によれば、基本的
にフロンやトリクロロエタン等環境破壊や公害問題を引
き起こす可能のある洗浄剤に代えて水洗浄が採用される
に際し、該水洗浄においてワークに付着する洗浄水が仕
上げ工程以降のワークに対する錆発生等を阻止するべく
洗浄に併せて、或いは、その後の工程での水置換油を介
してのワークに付着している水の剥離除去の洗浄にあっ
てワークに付着している洗浄水の排水分と水置換油分と
の分離が確実に行われ、又、用いられる水置換油の有効
回収再利用が確実に図れ、省資源,低コスト化が図れ、
そのうえ、ワークの付着洗浄水の確実な除去が図られる
という優れた効果が奏される。
As described above, according to the invention of this application, when water cleaning is adopted in place of a cleaning agent that may cause environmental damage or pollution problems such as CFC or trichloroethane, the work in the water cleaning is basically adopted. Cleaning water that adheres to the work is cleaned together with the cleaning to prevent rust generation on the work after the finishing process, or in the subsequent process to remove the water that has adhered to the work via the water displacement oil. Therefore, the waste water of the cleaning water adhering to the work can be reliably separated from the water-displacing oil, and the water-displacing oil used can be effectively recovered and reused, saving resources and reducing costs. ,
In addition, the excellent effect that the adherent cleaning water of the work can be reliably removed is achieved.

【0042】又、プラント全体のシステム稼動が全自動
的に行われるために、極めて効率が良く、当該プラント
の保守点検整備がほとんど要らず、高効率での稼動が行
えるという優れた効果が奏される。
Further, since the system operation of the entire plant is carried out fully automatically, there is an excellent effect that it is extremely efficient, requires almost no maintenance and inspection of the plant, and can be operated with high efficiency. It

【0043】又、プラント全体がコンパクトに出来、こ
の点からイニシャルコストは勿論のこと、ランニングコ
ストも低減され、製品コストも低減出来るというメリッ
トがある。
Further, the entire plant can be made compact, and in this respect, not only the initial cost but also the running cost and the product cost can be reduced.

【0044】又、排水も水置換油も相互に純度が高く処
理されることから、排水においても工場排水等による公
害問題発生の虞もないという利点もある。
Further, since both the wastewater and the water-displacing oil are treated with high purity, there is also an advantage that there is no risk of pollution problems due to factory wastewater.

【図面の簡単な説明】[Brief description of drawings]

【図1】この出願の発明の1実施例の全体概略模式図で
ある。
FIG. 1 is an overall schematic diagram of one embodiment of the invention of this application.

【図2】従来技術に基づく水置換油洗浄システムの概略
模式図である。
FIG. 2 is a schematic diagram of a water displacement oil cleaning system based on the prior art.

【符号の説明】[Explanation of symbols]

6'' 水置換油 3' 洗浄槽 6' 水 7' 分離槽(第1の分離槽) 7'' 第2の分離槽 16 洗浄装置 8' 水置換油回収槽 5' 揺動装置 17 還流通路 14 滞留堰 15 溢流堰 6 '' Water displacement oil 3'Washing tank 6'Water 7 'Separation tank (first separation tank) 7' 'Second separation tank 16 Cleaning device 8'Water displacement oil recovery tank 5'Swing device 17 Reflux passage 14 Retaining weir 15 Overflow weir

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】水置換油を貯留する洗浄槽に該水置換油と
水の分離槽が併設されている洗浄装置において、上記洗
浄槽が第1の分離槽内に設けられ、該第1の分離槽に堰
を有する第2の分離槽が設けられ、更に該第2の分離槽
を介して水置換油回収槽が併設されていることを特徴と
する洗浄装置。
1. A cleaning apparatus in which a water replacement oil and a water separation tank are installed side by side in a cleaning tank for storing the water replacement oil, wherein the cleaning tank is provided in a first separation tank. A cleaning device, wherein a second separation tank having a weir is provided in the separation tank, and a water replacement oil recovery tank is also provided side by side through the second separation tank.
【請求項2】上記洗浄槽に被洗浄物揺動装置が配設され
ていることを特徴とする特許請求の範囲第1項記載の洗
浄装置。
2. The cleaning device according to claim 1, wherein an object swinging device is arranged in the cleaning tank.
【請求項3】上記水置換油回収槽から洗浄槽に還流通路
が介設されていることを特徴とする特許請求の範囲第1
項記載の洗浄装置。
3. A reflux passage is provided from the water-replacing oil recovery tank to the cleaning tank.
The cleaning device according to the item.
【請求項4】上記堰が第1の分離槽に対する滞留堰と水
置換油回収槽に対する溢流堰にされていることを特徴と
する特許請求の範囲第1項記載の洗浄装置。
4. The cleaning apparatus according to claim 1, wherein the weir is a retention weir for the first separation tank and an overflow weir for the water replacement oil recovery tank.
【請求項5】上記全ての槽が一体的に連設されているこ
とを特徴とする特許請求の範囲第1項記載の洗浄装置。
5. The cleaning apparatus according to claim 1, wherein all the tanks are integrally connected.
JP34567793A 1993-12-22 1993-12-22 Washing apparatus Pending JPH07171528A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP34567793A JPH07171528A (en) 1993-12-22 1993-12-22 Washing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP34567793A JPH07171528A (en) 1993-12-22 1993-12-22 Washing apparatus

Publications (1)

Publication Number Publication Date
JPH07171528A true JPH07171528A (en) 1995-07-11

Family

ID=18378223

Family Applications (1)

Application Number Title Priority Date Filing Date
JP34567793A Pending JPH07171528A (en) 1993-12-22 1993-12-22 Washing apparatus

Country Status (1)

Country Link
JP (1) JPH07171528A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4574083B2 (en) * 2001-08-20 2010-11-04 株式会社三社電機製作所 Cleaning device
JP2014111532A (en) * 2009-08-31 2014-06-19 Mitsubishi Materials Corp Method for cleaning polycrystalline silicon lump

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4574083B2 (en) * 2001-08-20 2010-11-04 株式会社三社電機製作所 Cleaning device
JP2014111532A (en) * 2009-08-31 2014-06-19 Mitsubishi Materials Corp Method for cleaning polycrystalline silicon lump

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