JPH07161776A - Manufacture of two-layered tab tape - Google Patents

Manufacture of two-layered tab tape

Info

Publication number
JPH07161776A
JPH07161776A JP31142093A JP31142093A JPH07161776A JP H07161776 A JPH07161776 A JP H07161776A JP 31142093 A JP31142093 A JP 31142093A JP 31142093 A JP31142093 A JP 31142093A JP H07161776 A JPH07161776 A JP H07161776A
Authority
JP
Japan
Prior art keywords
polyamic acid
film
acid film
conductor foil
tab tape
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP31142093A
Other languages
Japanese (ja)
Inventor
Yoshiyuki Yamamori
義之 山森
Hideaki Sasajima
秀明 笹嶋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Priority to JP31142093A priority Critical patent/JPH07161776A/en
Publication of JPH07161776A publication Critical patent/JPH07161776A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Abstract

PURPOSE:To obtain a two-layered TAB tape material excellent in productivity without deteriorating it in dimensional stability and evenness by a method wherein device holes are provided crosswise to a polyamic acid film, and a set of sprocket holes are provided in both the edges of the film per device hole, the polyamic acid film is bonded to a conductor foil by pressure and turned into imide by burning as it is kept wide. CONSTITUTION:Device holes are provided crosswise to a polyamic acid film which is not completely turned into imide yet by heating and drying through a conventional polyimide film manufacturing device and a set of sprocket holes are provided in both the edges of the film per device hole, the wide polyamic acid film is bonded to a conductor foil by pressure, and the wide polyamic acid film provided with the conductor foil is fully turned into imide by a continuous dryer used in a conventional two-layered flexible printed circuit board manufacturing process to form a conductor wire. By this setup, a two-layered TAB tape can be easily obtained high in productivity and yield and low in cost.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、半導体素子実装用のT
AB(Tape Automated Bonding)テープの製造方法に関
し、より詳細には2層TABテープの製造方法に関する
ものである。
BACKGROUND OF THE INVENTION The present invention relates to a T for mounting a semiconductor element.
The present invention relates to a method for manufacturing an AB (Tape Automated Bonding) tape, and more particularly to a method for manufacturing a double-layer TAB tape.

【0002】[0002]

【従来の技術】近年の半導体実装技術の進歩は著しい
が、中でもTABは、極めて高密度に導体パターンが形
成できるために、多ピン化に容易に対応でき、またボン
ディングの際にはワイヤーを用いる事なく、リード全体
を一度に半導体素子と配線接続することが可能であるた
め、高密度実装技術が必要とされている現在、活発に開
発が進められている。
2. Description of the Related Art Although semiconductor packaging technology has made remarkable progress in recent years, TAB, in particular, can easily cope with an increase in the number of pins because a conductor pattern can be formed with extremely high density, and a wire is used for bonding. Since it is possible to wire-connect the entire lead to the semiconductor element at a time without incident, high-density mounting technology is currently required, and development is actively underway.

【0003】TABテープとしては、2層構造と3層構
造との2種類あるが、3層構造(以下、3層TABと略
す)は一般的に銅箔等の導体箔と耐熱性の樹脂フィルム
を接着剤で張り合わせたものであり、フィルムとして耐
熱性及び耐薬品性等の優れた特性を持つポリイミドを用
いても耐熱性に劣る接着剤層を持つため、その特性を充
分に生かすことが出来なかった。
There are two types of TAB tapes, a two-layer structure and a three-layer structure. The three-layer structure (hereinafter abbreviated as three-layer TAB) generally has a conductor foil such as copper foil and a heat-resistant resin film. It is made by sticking together with an adhesive, and even if a polyimide film with excellent properties such as heat resistance and chemical resistance is used as a film, it has an adhesive layer with poor heat resistance, so it is possible to make full use of that property. There wasn't.

【0004】一方、一般に2層構造TAB(以下、2層
TABと略す)は、ベースフィルムに接着剤層を持たな
いためにTABとしての耐熱性に優れるが、その製造法
の困難さ故に実用に供されることが少なかった。すなわ
ち2層TABの製造法としてはポリイミド等の耐熱フィ
ルム上に、スパッタリング、蒸着、メッキ等の薄膜形成
技術を用いて導体層を設けた後、ベースフィルム及び導
体層にエッチング処理を施しデバイスホールやスプロケ
ットホールといった所定の開孔部、及び導体パターンを
形成する方法と銅箔等の導体箔上にポリイミド等耐熱樹
脂のワニスを直接塗布、乾燥させ2層基板を形成した
後、樹脂層及び導体箔にエッチング処理を施して所定の
開孔部や導体パターンを形成する方法の2種類の方法で
製造されているが、前者では、屈曲性の優れた圧延箔や
強度の優れたFe−Ni合金箔等を使用できないといっ
た問題点や、ベースフィルム開孔部の形成にエッチング
法を用いて開孔部を設けなくてはならないために、3層
TABの打ち抜き法と比較して生産性が著しく低下して
しまう。一方、後者においても、カールやシワの発生を
防ぐために、用いる樹脂の線膨張係数を導体層である銅
箔と一致させる必要があるが、この様な樹脂は、一般に
剛直で耐溶剤性に優れるためアルカリエッチングが困難
なものが多く、フィルム層に開孔部を設けるためにエキ
シマレーザー等のドライエッチングを行わなくてはなら
ず、生産性やコストが不利であるといった問題点を有し
ている。
On the other hand, a two-layer structure TAB (hereinafter abbreviated as two-layer TAB) is generally excellent in heat resistance as a TAB because it does not have an adhesive layer on the base film, but is practically used because of its difficult manufacturing method. It was rarely offered. That is, as a method for manufacturing a two-layer TAB, a conductor layer is provided on a heat-resistant film such as polyimide by using a thin film forming technique such as sputtering, vapor deposition, and plating, and then etching treatment is performed on the base film and the conductor layer to form device holes and A method of forming a predetermined opening such as a sprocket hole and a conductor pattern, and a varnish of a heat-resistant resin such as polyimide is directly applied on a conductor foil such as a copper foil and dried to form a two-layer substrate, and then a resin layer and a conductor foil. It is manufactured by two kinds of methods, that is, a method for forming a predetermined opening portion or a conductor pattern by performing an etching treatment on the. In the former, a rolled foil having excellent flexibility and a Fe-Ni alloy foil having excellent strength are used. Since it is necessary to use the etching method to form the openings in the base film, it is not possible to use a 3-layer TAB. Productivity as compared to come method significantly decreases. On the other hand, also in the latter, in order to prevent the occurrence of curls and wrinkles, it is necessary to match the linear expansion coefficient of the resin used with that of the copper foil which is the conductor layer, but such a resin is generally rigid and excellent in solvent resistance. Therefore, alkali etching is difficult in many cases, and dry etching such as excimer laser must be performed to provide an opening in the film layer, which is disadvantageous in productivity and cost. .

【0005】さらにポリアミック酸フィルムに孔加工を
施し導体箔に熱圧着後、焼成を加える方法を用いること
により、これらの問題点の大部分が解決されるが、焼成
時にアミック酸フィルム部分が他の部分と接触しないよ
うに保持しながら1本づつ高温にて乾燥させる必要があ
るため、一度に大量のテープを熱処理することが難しか
った。
Most of these problems can be solved by using a method in which the polyamic acid film is perforated, thermocompression-bonded to the conductor foil, and then fired, but most of these problems are solved during firing. Since it is necessary to dry each tape at a high temperature while holding it so that it does not come into contact with any part, it was difficult to heat-treat a large amount of tape at a time.

【0006】[0006]

【発明が解決しようとする課題】本発明の目的とすると
ころは、接着剤層を持たない2層TABを製造するに当
たって、幅方向に複数のデバイスホール及び各デバイス
ホール1つにつきその両端部にスプロケットホールを1
組設けた後、その幅広のポリアミック酸フィルムを導体
箔に圧着後、広幅のまま焼成イミド化することにより、
寸法安定性、平滑性等を損ねることなく、生産性の優れ
た2層TAB用テープ素材の製造方法を提供するもので
ある。
SUMMARY OF THE INVENTION It is an object of the present invention to manufacture a two-layer TAB having no adhesive layer, and a plurality of device holes in the width direction, and one end of each device hole at each end. Sprocket hall 1
After providing the set, by pressing the wide polyamic acid film to the conductor foil, by baking and imidizing the wide width,
The present invention provides a method for producing a two-layer TAB tape material having excellent productivity without impairing dimensional stability and smoothness.

【0007】[0007]

【課題を解決するための手段】本発明は、半硬化状態の
ポリアミック酸フィルム幅方向に複数のデバイスホール
及び各デバイスホール1つにつきその両端部にスプロケ
ットホールを1組設けた後、導体箔に圧着し、加熱処理
することによりイミド化を完結させることにより得られ
る幅広の2層TAB用テープ素材を利用することを特徴
とする2層TABテープの製造方法に関するものであ
り、該テープを広幅のまま導体箔に所要のパターンを形
成する、あるいはデバイスホールとその両端部に形成さ
れた1組のスプロケットホール単位の幅でスリットし、
通常のTABテープと同等の幅を持つ独立したTABテ
ープとした後、導体箔に所要のパターンを形成すること
を特徴とする2層TABテープの製造方法である。
According to the present invention, a semi-cured polyamic acid film is provided with a plurality of device holes in the width direction and one set of sprocket holes at each end of each device hole, and then a conductor foil is formed. The present invention relates to a method for producing a two-layer TAB tape, characterized by using a wide two-layer TAB tape material obtained by completing the imidization by pressure bonding and heat treatment. Form the required pattern on the conductor foil as it is, or slit it in the width of the device hole and one set of sprocket holes formed at both ends,
This is a method for producing a two-layer TAB tape, which comprises forming an independent TAB tape having the same width as a normal TAB tape and then forming a required pattern on the conductor foil.

【0008】本発明における、半硬化状態のポリアミッ
ク酸フィルムの製造方法は、離型フィルム上にポリアミ
ック酸溶液を塗布し、タックフリー状態になるまで乾燥
させ、ポリアミック酸フィルムを形成する。さらに同一
組成または異なる組成の他のポリアミック酸フィルムを
ポリアミック酸フィルム面を合わせて、必要によりこの
間にポリアミック酸フィルムを所定の枚数挿入し2枚以
上同時に加熱・圧着し、厚みの厚いポリアミック酸フィ
ルムとすることも出来る。
In the method for producing a semi-cured polyamic acid film in the present invention, a polyamic acid solution is applied onto a release film and dried until a tack-free state is formed to form a polyamic acid film. Further, another polyamic acid film having the same composition or a different composition is aligned with the polyamic acid film surface, and if necessary, a predetermined number of polyamic acid films are inserted between them, and two or more sheets are simultaneously heated and pressure-bonded to form a thick polyamic acid film. You can also do it.

【0009】次に、ポリアミック酸フィルムを通常の方
法、例えば、打ち抜き、切断、アルカリエッチング、レ
ーザー等によって離型フィルムと共に或はポリアミック
酸フィルムのみを開孔させてデバイスホール、スプロケ
ットホール等の孔加工を行うが、生産性、コストの面か
ら打ち抜き加工が好ましい。
Next, the polyamic acid film is processed by a conventional method, for example, punching, cutting, alkali etching, laser or the like together with the release film, or only the polyamic acid film is opened to form holes such as device holes and sprocket holes. However, punching is preferable in terms of productivity and cost.

【0010】孔加工が終了したポリアミック酸フィルム
は導体箔に加熱・圧着後、焼成を加えることにより充分
にイミド化を行い、必要によりデバイスホールとその両
端部に形成された1組のスプロケットホール単位の幅で
スリットし、通常のTABテープと同等の幅を持つ独立
したTABテープとした後、導体パターンを形成する。
このとき、導体箔に圧着された幅広のポリアミック酸フ
ィルムを乾燥させる方法としては通常のキャスティング
方式の2層フレキシブルプリント回路用基板を製造する
際に用いるのと同様の連続乾燥器すなわち300℃以上
加熱可能なエアーサポートのフローティングドライヤー
もしくはロールサポートのドライヤーを用いることがで
きる。また、導体箔酸化防止の意味からドライヤー内部
は窒素ガス等で置換し不活性な雰囲気になっていること
が望ましい。幅広のまま回路加工を行う設備を所有する
場合は、生産性の点から幅広のまま回路加工を行うこと
が好ましい。一方、幅広で回路加工可能な装置を持ち合
わせていない場合でも、通常のTABテープと同等の幅
にスリットし、独立したTABテープとすることで一般
の加工装置を利用することができる。
The polyamic acid film that has been subjected to hole processing is sufficiently imidized by heating and pressure bonding to the conductor foil and then baking, and if necessary, a device hole and a set of sprocket hole units formed at both ends thereof. After slitting with a width of 1 to form an independent TAB tape having a width equal to that of a normal TAB tape, a conductor pattern is formed.
At this time, as a method for drying the wide polyamic acid film pressure-bonded to the conductor foil, the same continuous dryer as that used when manufacturing a normal casting type two-layer flexible printed circuit board, that is, heating at 300 ° C. or more is used. A possible air-supported floating dryer or roll-support dryer can be used. Further, from the viewpoint of preventing the conductor foil from being oxidized, it is desirable that the inside of the dryer is replaced with nitrogen gas or the like to create an inert atmosphere. In the case of owning equipment for performing circuit processing in a wide width, it is preferable to perform circuit processing in a wide width from the viewpoint of productivity. On the other hand, even when a wide device capable of processing a circuit is not provided, a general processing device can be used by slitting it into a width equal to that of a normal TAB tape and forming an independent TAB tape.

【0011】本発明において、ポリアミック酸溶液を乾
燥させ、半硬化状態のポリアミック酸フィルムを形成さ
せる条件としては、80〜200℃、5〜30分が適当である。
これより温度が低く時間が短い場合、導体箔と加熱・圧
着する際、流動性が大きく、開孔部でのにじみ、しみ出
しが大きく、フィルム厚のバラツキも大きくなり、イミ
ド化後の寸法変化が大きくなる。またこれより温度が高
く時間が長い場合、導体箔と加熱・圧着する際、流動性
が小さすぎ、導体箔とのピール強度が低下し、ボイドの
発生が多くなる。アミック酸の塗布厚みとしては、イミ
ド化後の状態で200μm以下が適当である。これより厚
い場合は、フィルム層が厚いため溶剤の蒸発速度が遅
く、生産性が著しく低下する。ポリアミック酸フィルム
同士もしくはポリアミック酸フィルムを導体箔に加熱・
圧着する条件としては、プレス形式の場合は70〜200
℃、5〜100kg/cm2、5〜30分、ロール式ラミネータの場
合は70〜200℃、1〜50kg/cm、0.1〜10m/分の条
件が適当であり、特に温度としてはポリアミック酸フィ
ルムの乾燥温度より10〜30℃低い温度で実施することが
揮発物の発生もなく望ましい。
In the present invention, suitable conditions for drying the polyamic acid solution to form a semi-cured polyamic acid film are 80 to 200 ° C. and 5 to 30 minutes.
If the temperature is lower than this and the time is short, the fluidity is large when heating and crimping with the conductor foil, bleeding and bleeding at the opening are large, and the variation in the film thickness is large, and the dimensional change after imidization Grows larger. If the temperature is higher and the time is longer than this, the fluidity is too small when heated and pressure-bonded to the conductor foil, the peel strength with the conductor foil decreases, and voids increase. Appropriate coating thickness of the amic acid is 200 μm or less after imidization. When the thickness is thicker than this, the film layer is thick, so that the evaporation rate of the solvent is slow and the productivity is remarkably lowered. Heat the polyamic acid films to each other or the polyamic acid film on the conductor foil.
The conditions for crimping are 70 to 200 for the press type.
℃, 5~100kg / cm 2, 5~30 minutes, 70 to 200 ° C. in the case of a roll laminator, 1 to 50 kg / cm, a 0.1 to 10 m / min conditions appropriate polyamic acid film is a particularly temperature It is desirable to carry out the reaction at a temperature 10 to 30 ° C. lower than the drying temperature because no volatile matter is generated.

【0012】本発明におけるポリアミック酸は、通常ジ
アミンと酸無水物とを反応させることにより得られる。
ジアミンとしては、フェニレンジアミン、ジアミノジフ
ェニルメタン、ジアミノジフェニルスルホン、ジアミノ
ジフェニルエーテルなどを、酸無水物としては、トリメ
リット酸無水物、ピロメリット酸二無水物、ビフェニル
テトラカルボン酸二無水物、ベンゾフェノンテトラカル
ボン酸二無水物などを使用することができ、それぞれ1
種又は2種以上を適宜組み合わせて用いることができ
る。ポリアミック酸フィルムの状態におけるイミド化率
は10〜50%、望むべくは20〜40%が望ましい。イミド化
率が10%未満ではタック性が残り作業性が悪いばかり
か、巻取った後に、離型フィルム背面に接着しフィルム
を一枚ずつ単離することが難しくなり、また50%以上イ
ミド化を施すと溶融特性が悪くなりアミック酸面を合わ
せて熱圧着しても充分に一体化しなくなる。
The polyamic acid in the present invention is usually obtained by reacting a diamine with an acid anhydride.
Examples of the diamine include phenylenediamine, diaminodiphenylmethane, diaminodiphenyl sulfone, and diaminodiphenyl ether, and examples of the acid anhydride include trimellitic anhydride, pyromellitic dianhydride, biphenyltetracarboxylic dianhydride, and benzophenonetetracarboxylic acid. It is possible to use dianhydride and the like, one for each
One kind or two or more kinds can be appropriately combined and used. The imidization ratio in the state of the polyamic acid film is preferably 10 to 50%, and more preferably 20 to 40%. If the imidization ratio is less than 10%, the tackiness remains and the workability is poor, and it becomes difficult to isolate the films one by one by adhering them to the backside of the release film after winding, and imidization of 50% or more. When the above is applied, the melting property deteriorates, and even if the amic acid surfaces are aligned and thermocompression bonded, they cannot be sufficiently integrated.

【0013】離型フィルムとして用いることのできる材
料としては、ポリプロピレン、ポリエステル、ポリエー
テルサルフォン、ポリイミド、ポリエチレン等のプラス
チックフィルムがあげられる。
Materials that can be used as the release film include plastic films such as polypropylene, polyester, polyether sulfone, polyimide and polyethylene.

【0014】導体層として用いることのできる材料とし
ては、銅、アルミニウム、ニッケル等の単体の金属箔に
加え、Fe−Ni合金、Fe−Cr−Al合金等の金属
箔が挙げられる。
Examples of materials that can be used as the conductor layer include metal foils such as Fe—Ni alloys and Fe—Cr—Al alloys in addition to simple metal foils such as copper, aluminum and nickel.

【0015】[0015]

【作用】本発明は、通常のポリイミドフィルム製造装置
を用い完全にイミド化するまで加熱乾燥を行わずポリア
ミック酸フィルムの状態で幅方向に複数のデバイスホー
ル及び各デバイスホール1つにつきその両端部にスプロ
ケットホールを1組設けた後、その幅広のポリアミック
酸フィルムを導体箔に圧着後し、この幅広の導体箔付ポ
リアミック酸フィルムごと通常の2層フレキシブルプリ
ント回路用基板製造にもちいる連続乾燥器によってイミ
ド化を完結させ、導体線を形成する工程をとることによ
り、容易にかつ安価に、生産性・収率よく2層TABテ
ープを得ることができる。一方、幅広で回路加工可能な
装置を持ち合わせていない場合でも、通常のTABテー
プと同等の幅にスリットし、独立したTABテープとす
ることで一般の加工装置を利用することができる。
According to the present invention, a general polyimide film manufacturing apparatus is used, and heating and drying are not performed until completely imidized, and a plurality of device holes are formed in the width direction in the state of a polyamic acid film, and both end portions of each device hole are formed. After providing one set of sprocket holes, the wide polyamic acid film is pressure-bonded to the conductor foil, and this wide polyamic acid film with conductor foil is used together with the continuous dryer used for manufacturing a normal two-layer flexible printed circuit board. By completing the imidization and forming the conductor wire, a two-layer TAB tape can be obtained easily and inexpensively with good productivity and yield. On the other hand, even when a wide device capable of processing a circuit is not provided, a general processing device can be used by slitting it into a width equal to that of a normal TAB tape and forming an independent TAB tape.

【0016】[0016]

【実施例】(実施例1)温度計、撹拌装置、還流コンデ
ンサー及び乾燥窒素ガス吹込み口を備えた4つ口セパラ
ブルフラスコに、精製した無水のパラフェニレンジアミ
ン108gと4,4'-ジアミノジフェニルエーテル200gをと
り、これに無水のN-メチル-2-ピロリドン90重量%とト
ルエン10重量%の混合溶剤を、全仕込原料中の固形分割
合が20重量%になるだけの量を加えて溶解した。乾燥窒
素ガスは反応の準備段階より生成物取り出しまでの全工
程にわたり流しておいた。次いで、精製した無水の3,
3',4,4'-ビフェニルテトラカルボン酸二無水物294gと
ピロメリット酸二無水物218gを撹拌しながら少量ずつ
添加するが、発熱反応であるため、外部水槽に約15℃の
冷水を循環させてこれを冷却した。添加後、内部温度を
20℃に設定し、5時間撹拌し、反応を終了してポリアミ
ック酸溶液を得た。
Example 1 In a four-neck separable flask equipped with a thermometer, a stirrer, a reflux condenser and a dry nitrogen gas inlet, 108 g of purified anhydrous paraphenylenediamine and 4,4′-diamino were placed. Take 200 g of diphenyl ether and dissolve it in a mixed solvent of anhydrous N-methyl-2-pyrrolidone (90% by weight) and toluene (10% by weight) in an amount sufficient to give a solid content of 20% by weight in the total raw materials. did. Dry nitrogen gas was allowed to flow in all steps from the reaction preparation stage to the product removal. Then purified anhydrous 3,
294 g of 3 ', 4,4'-biphenyltetracarboxylic dianhydride and 218 g of pyromellitic dianhydride are added little by little while stirring, but since it is an exothermic reaction, cold water of about 15 ° C is circulated in the external water tank. Allowed to cool. After adding the internal temperature
The temperature was set to 20 ° C., the mixture was stirred for 5 hours, the reaction was terminated, and a polyamic acid solution was obtained.

【0017】市販の540mm幅のポリエステルフィルム上
に、このポリアミック酸溶液をバーコーターで幅500mm
イミド化後の厚みが50μmになるように塗布し、130
℃、15分乾燥を行いポリアミック酸フィルムを得た後、
金型を用いて幅方向にデバイスホールが10個及び各デバ
イスホール1つにつきその両端部にスプロケットホール
を1組形成するように孔加工を行い(48mm幅テープが10
組幅方向に並んだ配置)、540mm幅の市販の銅箔粗化面
上に銅箔両端が20mmずつ露出するようにポリアミック酸
フィルム面を重ね合わせ、ロール式ラミネータを用いて
110℃、15kg/cm、0.5m/分の条件で分加熱・圧着を行
った。その後、離型フィルムを剥し窒素雰囲気に置換で
きるフローティングドライヤーを用いて100℃,200℃,
300℃,380℃のゾーンをそれぞれ10分間かけて通過する
条件で加熱を行い、イミド化を完結し、幅方向にデバイ
スホールを10個持つ2層TAB用基板を得た。
On a commercially available polyester film having a width of 540 mm, this polyamic acid solution was applied with a bar coater to a width of 500 mm.
Apply so that the thickness after imidization is 50 μm, and apply 130
After obtaining a polyamic acid film by drying at ℃ for 15 minutes,
Holes are formed using a die so that 10 device holes are formed in the width direction and one set of sprocket holes is formed at each end of each device hole (48 mm wide tape is 10
Arranged side by side in the assembly width direction), using a roll-type laminator, superimpose the polyamic acid film surface so that both ends of the copper foil are exposed 20 mm each on the roughened surface of the commercially available copper foil of 540 mm width.
Partial heating and pressure bonding were performed under the conditions of 110 ° C, 15 kg / cm, 0.5 m / min. After that, using a floating dryer that can remove the release film and replace it with a nitrogen atmosphere,
Heating was performed under the conditions of passing through the zones of 300 ° C. and 380 ° C. for 10 minutes respectively, imidization was completed, and a two-layer TAB substrate having 10 device holes in the width direction was obtained.

【0018】得られた2層基板を用い、スプロケットホ
ール部分の銅箔をエッチング除去し、スプロケットホー
ルを露出させた後、導体箔上に所定のレジストパターン
及び穴埋め処理を施し、エッチング処理を施すことによ
り導体パターンを形成した後、導体箔上に残留するレジ
スト及び穴埋め材を除去することにより2層TABテー
プを得た。
Using the obtained two-layer substrate, the copper foil in the sprocket hole portion is removed by etching to expose the sprocket hole, and then the conductor foil is subjected to a predetermined resist pattern and hole filling treatment, and then subjected to etching treatment. After forming the conductor pattern by, the resist and the filling material remaining on the conductor foil were removed to obtain a two-layer TAB tape.

【0019】(実施例2)実施例1で得られた2層TA
B用基板を用い、デバイスホールとその両端部に形成さ
れた1組のスプロケットホール単位の幅(48mm)でスリ
ットし、通常のTABテープと同等の48mm幅を持つ独立
したTABテープとした後、スプロケットホール部分の
銅箔をエッチング除去し、スプロケットホールを露出さ
せた後、導体箔上に所定のレジストパターン及び穴埋め
処理を施し、エッチング処理を施すことにより導体パタ
ーン形成後、導体箔上に残留するレジスト及び穴埋め材
を除去することにより2層TABテープを得た。
(Example 2) Two-layer TA obtained in Example 1
Using the board for B, slit the device hole and a set of sprocket hole units (48 mm) formed on both ends of the device hole to make an independent TAB tape having a width of 48 mm, which is the same as a normal TAB tape. After removing the copper foil in the sprocket hole part by etching to expose the sprocket hole, a predetermined resist pattern and hole filling process are performed on the conductor foil, and after the conductor pattern is formed by performing the etching process, it remains on the conductor foil A two-layer TAB tape was obtained by removing the resist and the hole filling material.

【0020】[0020]

【発明の効果】本発明によれば、生産性の優れた打ち抜
き加工によりデバイスホールを設けることができ、更に
通常の2層フレキシブルプリント回路用基板焼成用連続
乾燥器を用いて幅広のまま連続乾燥を行うことにより耐
熱性、耐薬品性等に優れた2層TAB用素材とし、必要
により通常のTABテープと同等の幅にスリットし、独
立したTABテープとすることで一般の加工装置を利用
することができる。さらに蒸着法等では使用することの
出来なかった圧延箔を用いた2層TABテープも作製す
ることが可能となるなど、工業的な2層TABテープの
製造方法として好適なものである。
According to the present invention, a device hole can be formed by punching with excellent productivity, and further, continuous drying with a wide width is performed by using an ordinary continuous dryer for firing a two-layer flexible printed circuit substrate. By doing so, a two-layer TAB material having excellent heat resistance, chemical resistance, etc. is formed, and if necessary, slit to a width equal to that of a normal TAB tape, and form an independent TAB tape to use general processing equipment. be able to. Further, it becomes possible to produce a two-layer TAB tape using a rolled foil that could not be used by the vapor deposition method or the like, which is suitable as an industrial two-layer TAB tape production method.

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 半硬化状態のポリアミック酸フィルム幅
方向に複数のデバイスホール及び各デバイスホール1つ
につきその両端部にスプロケットホールを1組設けた
後、導体箔に圧着し、焼成を施しイミド化を完結させる
ことを特徴とする2層TAB用テープ素材の製造方法。
1. A semi-cured polyamic acid film having a plurality of device holes in the width direction and one set of sprocket holes at each end of each device hole, and then pressure-bonded to a conductor foil and baked to imidize. A method for producing a tape material for a two-layer TAB, characterized in that
【請求項2】 請求項1で得られたテープを広幅のまま
導体箔に所要のパターンを形成することを特徴とする2
層TABテープの製造方法。
2. A desired pattern is formed on a conductor foil while keeping the tape obtained in claim 1 wide.
Method for producing multi-layer TAB tape.
【請求項3】 請求項1で得られたテープをデバイスホ
ールとその両端部に形成された1組のスプロケットホー
ル単位の幅でスリットすることを特徴とする2層TAB
用テープ素材の製造方法。
3. A two-layer TAB, wherein the tape obtained in claim 1 is slit with a width of a device hole and a set of sprocket holes formed at both ends thereof.
For manufacturing tape material for automobiles.
【請求項4】 請求項3で得られたテープの導体箔に所
要のパターンを形成することを特徴とする2層TABテ
ープの製造方法。
4. A method for producing a two-layer TAB tape, which comprises forming a required pattern on the conductor foil of the tape obtained in claim 3.
JP31142093A 1993-12-13 1993-12-13 Manufacture of two-layered tab tape Pending JPH07161776A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP31142093A JPH07161776A (en) 1993-12-13 1993-12-13 Manufacture of two-layered tab tape

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP31142093A JPH07161776A (en) 1993-12-13 1993-12-13 Manufacture of two-layered tab tape

Publications (1)

Publication Number Publication Date
JPH07161776A true JPH07161776A (en) 1995-06-23

Family

ID=18016989

Family Applications (1)

Application Number Title Priority Date Filing Date
JP31142093A Pending JPH07161776A (en) 1993-12-13 1993-12-13 Manufacture of two-layered tab tape

Country Status (1)

Country Link
JP (1) JPH07161776A (en)

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