JPH07159640A - Production of optical waveguide - Google Patents

Production of optical waveguide

Info

Publication number
JPH07159640A
JPH07159640A JP30318993A JP30318993A JPH07159640A JP H07159640 A JPH07159640 A JP H07159640A JP 30318993 A JP30318993 A JP 30318993A JP 30318993 A JP30318993 A JP 30318993A JP H07159640 A JPH07159640 A JP H07159640A
Authority
JP
Japan
Prior art keywords
optical waveguide
mold
solvent
silica
fine particles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP30318993A
Other languages
Japanese (ja)
Inventor
Takeshi Yagi
健 八木
Tsugio Sato
継男 佐藤
Kazuaki Yoshida
和昭 吉田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Furukawa Electric Co Ltd
Original Assignee
Furukawa Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Furukawa Electric Co Ltd filed Critical Furukawa Electric Co Ltd
Priority to JP30318993A priority Critical patent/JPH07159640A/en
Publication of JPH07159640A publication Critical patent/JPH07159640A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B20/00Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00Other methods of shaping glass
    • C03B19/06Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00Other methods of shaping glass
    • C03B19/06Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
    • C03B19/066Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction for the production of quartz or fused silica articles

Abstract

PURPOSE:To provide a process for production of optical waveguides by which the optical waveguides having arbitrary shapes are easily and efficiently obtainable. CONSTITUTION:This process for production has a stage for installing a mold formed with a groove 11 corresponding to the optical waveguide into a solvent 14, a stage for charging silica particulates 15 for a core into this solvent 14 and packing the silica particulates 15 for the core into the groove 11 by gravity settlement, a stage for charging silica particulates 17 for a clad into the solvent 14 and depositing these silica particulates 17 for the clad on the mold packed with the silica particulates 15 for the core into the groove 11 by gravity settlement, a stage for taking the mold deposited with the silica particulates 17 for the clad out of the solvent 14 and obtaining an optical waveguide pattern body 19 by removing the mold and a stage for forming the optical waveguide by subjecting the optical waveguide pattern body 19 to a transparent vitrification treatment.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、通信、光学の分野で用
いられる光導波路を作製するための製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a manufacturing method for manufacturing an optical waveguide used in the fields of communication and optics.

【0002】[0002]

【従来の技術およびその課題】従来の光導波路の製造
は、基板上にCVD法等によりクラッド層およびコア層
を順次形成し、フォトリソグラフィー技術を用いてコア
層をパターニングし、さらにその上にクラッド層を形成
することにより行われる。
2. Description of the Related Art A conventional optical waveguide is manufactured by sequentially forming a clad layer and a core layer on a substrate by a CVD method or the like, patterning the core layer by a photolithography technique, and further forming a clad layer thereon. This is done by forming layers.

【0003】このフォトリソグラフィー技術を用いた方
法は、任意の構造の光導波路を製造することができる
が、光導波路が得られるまでに要する工程数が非常に多
く、しかも複雑であるため、上記方法による製造効率は
低い。
The method using this photolithography technique can manufacture an optical waveguide having an arbitrary structure, but the number of steps required until an optical waveguide is obtained is very large and complicated, so that the above method is used. Manufacturing efficiency is low.

【0004】一方、特開平4−124042号公報にお
いて開示されている押出成形法、特開平4−12404
3号公報において開示されている加圧成形法、特開昭6
4−56331号公報において開示されている鋳込成形
法等の粉末成形法を用いて光導波路を製造する方法も検
討されている。
On the other hand, the extrusion molding method disclosed in Japanese Patent Laid-Open No. 4-124042, Japanese Patent Laid-Open No. 4-12404.
The pressure molding method disclosed in Japanese Patent Laid-Open No.
A method of manufacturing an optical waveguide by using a powder molding method such as a casting molding method disclosed in Japanese Patent Laid-Open No. 4-56331 has also been studied.

【0005】しかしながら、粉末成形法を用いた方法
は、光ファイバ用の直線状の光導波路を効率良く製造す
る場合に適しているが、交差、分岐等の複雑な構成の光
導波路を製造することができない。本発明はかかる点に
鑑みてなされたものであり、任意の形状の光導波路を容
易に効率よく得ることができる光導波路の製造方法を提
供することを目的とする。
However, the method using the powder molding method is suitable for efficiently manufacturing a linear optical waveguide for an optical fiber, but it is necessary to manufacture an optical waveguide having a complicated structure such as intersections and branches. I can't. The present invention has been made in view of the above points, and an object of the present invention is to provide a method for manufacturing an optical waveguide, which can easily and efficiently obtain an optical waveguide having an arbitrary shape.

【0006】[0006]

【課題を解決するための手段】本発明は、光導波路に対
応する溝が形成された型を溶媒中に設置する工程と、前
記溶媒中にコア用シリカ系微粒子を投入して自然沈降に
より前記コア用シリカ系微粒子を前記溝内に充填する工
程と、前記溶媒中にクラッド用シリカ系微粒子を投入し
て自然沈降により前記コア用シリカ系微粒子を前記溝内
に充填した前記型上に前記クラッド用シリカ系微粒子を
堆積させる工程と、前記クラッド用シリカ系微粒子を堆
積させた前記型を前記溶媒から取り出し、前記型を取り
除いて光導波路パターン体を得る工程と、前記光導波路
パターン体に透明ガラス化処理を施して光導波路とする
工程とを具備することを特徴とする光導波路の製造方法
を提供する。
Means for Solving the Problems The present invention comprises the steps of placing a mold having grooves corresponding to an optical waveguide in a solvent, and introducing silica-based fine particles for a core into the solvent to spontaneously precipitate the particles. Filling the groove with silica-based fine particles for the core, and adding the silica-based fine particles for the clad to the solvent and allowing the silica-based fine particles for the core to be filled in the groove by spontaneous precipitation to form the clad on the mold. For depositing silica-based fine particles for use, removing the mold on which the silica-based fine particles for cladding are deposited from the solvent, and removing the mold to obtain an optical waveguide pattern body, and transparent glass for the optical waveguide pattern body. And a step of forming an optical waveguide by subjecting it to an optical waveguide.

【0007】ここで、本発明において使用されるコア用
およびクラッド用シリカ系微粒子としては、気相合成法
あるいはゾルゲル法で合成された球状であり、粒径が光
導波路のパターン幅より充分に小さい、すなわち型の溝
の幅よりも充分に小さいサブミクロンの粒子を用いるこ
とができる。
Here, the silica-based fine particles for core and clad used in the present invention are spherical particles synthesized by a vapor phase synthesis method or a sol-gel method, and their particle diameter is sufficiently smaller than the pattern width of the optical waveguide. , I.e. submicron particles well below the width of the mold grooves can be used.

【0008】特に、粒径が揃った単一粒径のシリカ系微
粒子は、型の溝内に自然沈降させた場合に最密に充填し
易いので好ましい。さらに、単一粒径のシリカ系微粒子
を用いることにより、透明ガラス化処理時の収縮率にバ
ラツキが生じず、歪や曲りのない光導波路を製造するこ
とができる。このような単一粒径のシリカ系微粒子は、
W.Stober,A.Fink and E.Bohn,J. Collo.Interface Sc
i.,26,26(1968)等において開示されているアルコキシド
の加水分解法を利用して合成することができる。
In particular, silica-based fine particles having a uniform particle size and having a uniform particle size are preferable because they are easy to be packed most closely when they are naturally settled in the grooves of the mold. Furthermore, by using silica-based fine particles having a single particle size, the shrinkage factor during the transparent vitrification treatment does not vary, and an optical waveguide without distortion or bending can be manufactured. Such a silica-based fine particle having a single particle size,
W. Stober, A. Fink and E. Bohn, J. Collo. Interface Sc
i., 26, 26 (1968) and the like, and can be synthesized by utilizing the hydrolysis method of alkoxide.

【0009】単一粒径のコア用シリカ系微粒子を合成す
る際に、Ge,P,Ti,Al等の屈折率制御用元素を
添加してもよく、増幅作用等の機能性を光導波路に付与
するためにEr等の希土類元素を添加してもよい。
When synthesizing silica-based fine particles for a core having a single particle diameter, an element for controlling the refractive index such as Ge, P, Ti and Al may be added, and the optical waveguide is provided with a function such as an amplification effect. A rare earth element such as Er may be added for the purpose of imparting.

【0010】本発明において使用される溶媒としては、
エチルアルコール、メチルアルコール等を用いることが
できる。また、使用する型の材料としては、ポリビニル
アルコール(PVA)、ポリビニルブチラール(PV
B)等の樹脂、パラフィン、臘、ゴム等を用いることが
できる。溝を有する型を作製する場合、上記型材料を用
いた射出成形、圧縮成形、トランスファー成形を用いて
もよいし、上記型材料で型本体を作製し、それに溝を形
成してもよい。
The solvent used in the present invention includes
Ethyl alcohol, methyl alcohol and the like can be used. Further, as the material of the mold used, polyvinyl alcohol (PVA), polyvinyl butyral (PV
Resins such as B), paraffin, barley, rubber and the like can be used. When producing a mold having a groove, injection molding, compression molding or transfer molding using the above-mentioned mold material may be used, or a mold body may be prepared from the above-mentioned mold material and the groove may be formed therein.

【0011】本発明において、型の材料として樹脂を用
いる場合、型を取り除く方法として、型を加熱して焼失
あるいは融解させる方法、または型を溶剤に浸して溶出
させる方法を用いることができる。このような方法で型
を取り除くことにより、損傷なく光導波路パターン体を
得ることができる。本発明において行われる透明ガラス
化処理は、He雰囲気中、1000〜1200℃で行わ
れる。
In the present invention, when a resin is used as the material of the mold, a method of removing the mold can be a method of heating the mold to burn it off or melt it, or a method of immersing the mold in a solvent to elute it. By removing the mold by such a method, the optical waveguide pattern body can be obtained without damage. The transparent vitrification treatment performed in the present invention is performed at 1000 to 1200 ° C in a He atmosphere.

【0012】[0012]

【作用】本発明の光導波路の製造方法は、光導波路に対
応する溝が形成された型を溶媒中に設置し、この溶媒中
にコア用シリカ系微粒子を投入して自然沈降させて溝内
に充填し、クラッド用シリカ系微粒子を投入して自然沈
降させて堆積させ、型を取り除いて得られた光導波路パ
ターン体に透明ガラス化処理を施すことを特徴としてい
る。
According to the method of manufacturing an optical waveguide of the present invention, a mold in which a groove corresponding to the optical waveguide is formed is placed in a solvent, and the silica-based fine particles for the core are put into this solvent to spontaneously settle in the groove. It is characterized in that the silica-based fine particles for clad are charged and spontaneously settled to be deposited, and the optical waveguide pattern obtained by removing the mold is subjected to a transparent vitrification treatment.

【0013】この方法によれば、光導波路パターンに対
応する溝が型に形成することができれば、分岐、交差等
の複雑な構成を有する光導波路を得ることができる。し
たがって、微細なパターンの光導波路を製造するのに適
している。しかもシリカ系微粒子を自然沈降させるだけ
で堆積層が形成できるので、比較的簡単な製造工程で効
率よく光導波路を製造することができる。また、シリカ
系微粒子の粒径を揃えることにより、透明ガラス化処理
の際の収縮が均一となり、歪や曲りのない光導波路を得
ることができる。
According to this method, if the groove corresponding to the optical waveguide pattern can be formed in the mold, an optical waveguide having a complicated structure such as branching and crossing can be obtained. Therefore, it is suitable for manufacturing an optical waveguide having a fine pattern. Moreover, since the deposited layer can be formed only by spontaneously precipitating the silica-based fine particles, the optical waveguide can be efficiently manufactured by a relatively simple manufacturing process. Further, by making the particle diameters of the silica-based fine particles uniform, the shrinkage during the transparent vitrification treatment becomes uniform, and an optical waveguide without distortion or bending can be obtained.

【0014】[0014]

【実施例】以下、本発明の実施例を図面を参照して具体
的に説明する。図1(A)〜(H)は、本発明の方法の
一実施例を説明するための工程図である。
Embodiments of the present invention will be specifically described below with reference to the drawings. 1A to 1H are process drawings for explaining one embodiment of the method of the present invention.

【0015】まず、必要とされる光導波路のパターンに
対応する溝11を有するメス型12を作製する。このと
き、溝11の寸法は透明ガラス化処理での収縮を考慮
し、透明ガラス化処理後に所望の形状になるように設定
する。次いで、図1(A)に示すように、メス型12
を、溝11が上方に開口するようにして容器13内に設
置し、溶媒14としてエチルアルコールを投入する。
First, a female die 12 having a groove 11 corresponding to a required optical waveguide pattern is prepared. At this time, the dimensions of the groove 11 are set so as to have a desired shape after the transparent vitrification treatment in consideration of shrinkage in the transparent vitrification treatment. Then, as shown in FIG.
Is placed in the container 13 so that the groove 11 opens upward, and ethyl alcohol is charged as the solvent 14.

【0016】次いで、図1(B)に示すように、溶媒1
4中に約0.3μmの単一粒径のコア用シリカ系粒子1
5を投入し、撹拌した後に静置する。次いで、メス型1
2上にコア用シリカ微粒子15を自然沈降させ、図1
(C)に示すように、コア堆積層16を形成する。
Then, as shown in FIG. 1 (B), the solvent 1
Silica-based particles for core 1 having a single particle size of about 0.3 μm in 4
Add 5 and stir after standing. Then female 1
As shown in FIG.
As shown in (C), the core deposition layer 16 is formed.

【0017】次いで、メス型12を溶媒14から取り出
して溝11以外の領域に堆積した堆積層を除去し、再び
溶媒14中に設置し、図1(D)に示すように、溶媒1
4中に約0.5μmの単一粒径のクラッド用シリカ系微
粒子17を投入し、撹拌した後に静置する。メス型12
と溝11内のコア堆積層16上にクラッド用シリカ系微
粒子17を自然沈降させ、図1(E)に示すように、ク
ラッド堆積層18を形成する。このとき、コア堆積層1
6およびクラッド堆積層18は、厳密には図1(F)に
示すような状態となる。
Then, the female die 12 is taken out of the solvent 14 to remove the deposited layer deposited on the region other than the groove 11, and is placed again in the solvent 14, and the solvent 1 is removed as shown in FIG. 1 (D).
The silica-based fine particles 17 for clad having a single particle diameter of about 0.5 μm are put into 4 and the mixture is left standing after stirring. Female 12
The silica-based fine particles 17 for cladding are allowed to spontaneously settle on the core deposition layer 16 in the groove 11 to form a cladding deposition layer 18 as shown in FIG. 1 (E). At this time, the core deposition layer 1
Strictly speaking, 6 and the clad deposition layer 18 are in a state as shown in FIG.

【0018】次いで、図1(G)に示すように、メス型
12を溶媒14から取り出し、乾燥した後に700℃程
度の温度で加熱してメス型12を焼失させると共にコア
堆積層16およびクラッド堆積層18を仮焼し、図1
(H)に示すような光導波路パターン体19を得る。
Then, as shown in FIG. 1G, the female die 12 is taken out from the solvent 14, dried and then heated at a temperature of about 700 ° C. to burn off the female die 12, and at the same time, the core deposition layer 16 and the clad deposition are deposited. Layer 18 is calcined, FIG.
An optical waveguide pattern body 19 as shown in (H) is obtained.

【0019】次いで、光導波路パターン体19を、コア
堆積層16が上方になるようにして溶媒14内に設置
し、溶媒14中に約0.5μmの単一粒径のクラッド用
シリカ系微粒子を投入し、前記と同様にしてクラッド堆
積層を形成する。その後、これを溶媒から取り出して乾
燥した後、He,Cl2 雰囲気中、900℃で精製処
理、He雰囲気中、1100℃で透明ガラス化処理を順
次施して光導波路を作製する。
Next, the optical waveguide pattern body 19 is placed in the solvent 14 with the core deposition layer 16 facing upward, and the silica-based fine particles for cladding having a single particle diameter of about 0.5 μm are placed in the solvent 14. It is charged and a clad deposition layer is formed in the same manner as described above. After that, this is taken out from the solvent and dried, and then subjected to a refining treatment in a He, Cl 2 atmosphere at 900 ° C. and a transparent vitrification treatment in a He atmosphere at 1100 ° C. in order to manufacture an optical waveguide.

【0020】本実施例では、単一粒径のシリカ系微粒子
は、あらかじめ合成しておき、それを溶媒中に投入して
いるが、容器中で合成しながら直接沈降させる用にして
もよい。シリカ系微粒子の堆積量を厳密に制御したい場
合は前者が適しており、工程を簡略化したい場合は後者
が適している。
In this embodiment, the silica-based fine particles having a single particle size are synthesized in advance and put in a solvent, but they may be directly precipitated while being synthesized in a container. The former is suitable for strictly controlling the deposition amount of silica-based fine particles, and the latter is suitable for simplifying the process.

【0021】また、本実施例では、自然沈降により形成
された堆積層をそのまま使用しているが、堆積層が形成
された後に、例えば一軸加圧により堆積層を加圧して堆
積層の充填密度を調整したり、堆積層を構成する粒子の
密着性を向上させてもよい。
Further, in this embodiment, the deposited layer formed by natural sedimentation is used as it is. However, after the deposited layer is formed, the packed layer is pressed by, for example, uniaxial pressing to fill the packed layer. May be adjusted or the adhesiveness of the particles forming the deposited layer may be improved.

【0022】さらに、本実施例では、1つのメス型を溶
媒中に設置して光導波路を製造しているが、複数のメス
型を溶媒中に設置し、同時に複数の光導波路を製造して
もよい。あるいは、1つのメス型に光導波路パターンに
対応する溝を複数形成しておき、一度に複数の光導波路
を製造し、その後に切り出すことにより、一度の工程で
複数の光導波路を製造することもできる。
Further, in this embodiment, one female mold is placed in a solvent to manufacture an optical waveguide, but a plurality of female molds are placed in a solvent to simultaneously manufacture a plurality of optical waveguides. Good. Alternatively, a plurality of grooves corresponding to the optical waveguide pattern may be formed in one female type, a plurality of optical waveguides may be manufactured at a time, and then cut out to manufacture a plurality of optical waveguides in one step. it can.

【0023】[0023]

【発明の効果】以上説明した如く本発明の光導波路の製
造方法は、光導波路に対応する溝が形成された型を溶媒
中に設置し、この溶媒中にコア用シリカ系微粒子を投入
して自然沈降させて溝内に充填し、クラッド用シリカ系
微粒子を投入して自然沈降させて堆積させ、型を取り除
いて得られた光導波路パターン体に透明ガラス化処理を
施すので、分岐、交差等の複雑な構成を有する光導波路
を容易にしかも効率よく得ることができる。
As described above, according to the method of manufacturing an optical waveguide of the present invention, a mold having grooves corresponding to the optical waveguide is placed in a solvent, and silica-based fine particles for cores are added to the solvent. It is allowed to spontaneously settle and fill the groove, and the silica-based fine particles for clad are added, and the particles are allowed to spontaneously settle and deposited, and the optical waveguide pattern obtained by removing the mold is subjected to transparent vitrification treatment, so branching, crossing, etc. It is possible to easily and efficiently obtain an optical waveguide having a complicated structure of.

【図面の簡単な説明】[Brief description of drawings]

【図1】(A)〜(H)は本発明の方法の一実施例を説
明するための工程図。
1A to 1H are process drawings for explaining an embodiment of the method of the present invention.

【符号の説明】[Explanation of symbols]

11…溝、12…メス型、13…容器、14…溶媒、1
5…コア用シリカ系粒子、16…コア堆積層、17…ク
ラッド用シリカ系微粒子、18…クラッド堆積層、19
…光導波路パターン体。
11 ... Groove, 12 ... Female type, 13 ... Container, 14 ... Solvent, 1
5 ... Silica-based particles for core, 16 ... Core-deposited layer, 17 ... Silica-based fine particles for clad, 18 ... Clad deposited layer, 19
... Optical waveguide pattern body.

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】光導波路に対応する溝が形成された型を溶
媒中に設置する工程と、 前記溶媒中にコア用シリカ系微粒子を投入して自然沈降
により前記コア用シリカ系微粒子を前記溝内に充填する
工程と、 前記溶媒中にクラッド用シリカ系微粒子を投入して自然
沈降により前記コア用シリカ系微粒子を前記溝内に充填
した前記型上に前記クラッド用シリカ系微粒子を堆積さ
せる工程と、 前記クラッド用シリカ系微粒子を堆積させた前記型を前
記溶媒から取り出し、前記型を取り除いて光導波路パタ
ーン体を得る工程と、 前記光導波路パターン体に透明ガラス化処理を施して光
導波路とする工程とを具備することを特徴とする光導波
路の製造方法。
1. A step of placing a mold in which a groove corresponding to an optical waveguide is formed in a solvent, and adding silica-based fine particles for a core to the solvent to spontaneously settle the silica-based fine particles for a core to the groove. And a step of charging the silica-based fine particles for cladding into the solvent and depositing the silica-based fine particles for cladding on the mold in which the silica-based fine particles for core are filled in the groove by spontaneous precipitation. A step of taking out the mold in which the silica-based fine particles for cladding are deposited from the solvent and removing the mold to obtain an optical waveguide pattern body; A method of manufacturing an optical waveguide, comprising:
【請求項2】 前記コア用およびクラッド用シリカ系微
粒子は、粒径が揃っており球状である請求項1記載の光
導波路の製造方法。
2. The method for producing an optical waveguide according to claim 1, wherein the silica-based fine particles for core and clad have a uniform particle size and are spherical.
【請求項3】 前記型に樹脂製の型を用い、加熱による
焼失あるいは融解、または溶剤による溶出させることに
より前記型を取り除く請求項1記載の光導波路の製造方
法。
3. The method for producing an optical waveguide according to claim 1, wherein a resin mold is used as the mold, and the mold is removed by burning or melting by heating, or by elution with a solvent.
JP30318993A 1993-12-03 1993-12-03 Production of optical waveguide Pending JPH07159640A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP30318993A JPH07159640A (en) 1993-12-03 1993-12-03 Production of optical waveguide

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP30318993A JPH07159640A (en) 1993-12-03 1993-12-03 Production of optical waveguide

Publications (1)

Publication Number Publication Date
JPH07159640A true JPH07159640A (en) 1995-06-23

Family

ID=17917958

Family Applications (1)

Application Number Title Priority Date Filing Date
JP30318993A Pending JPH07159640A (en) 1993-12-03 1993-12-03 Production of optical waveguide

Country Status (1)

Country Link
JP (1) JPH07159640A (en)

Similar Documents

Publication Publication Date Title
US7286739B2 (en) Porous optical fiber and method for manufacturing the same
US5271801A (en) Process of production of integrated optical components
US5776222A (en) Method of eliminating light scattering bubbles in optical fiber preforms
JPH07159640A (en) Production of optical waveguide
FR2540638A1 (en) PROCESS FOR PRODUCING A BLADE-SHAPED LENS HAVING A GRADIENT OF ITS REFRACTIVE INDEX IN THE SINGLE DIRECTION OF ITS THICKNESS
JPH0971431A (en) Production of silica glass-based multicore optical fiber
CN1029307C (en) Method for manufacturing lightwave conductor blank
JPH07294760A (en) Production of optical waveguide
JPH05297236A (en) Manufacture of planar optical waveguide and resulted device
JPS61256937A (en) Production of optical fiber base material
JP3070018B2 (en) Quartz optical waveguide and method of manufacturing the same
JP3196797B2 (en) Manufacturing method of laminated quartz optical waveguide
JPH09222525A (en) Production of optical waveguide
WO2004097488A1 (en) Method of manufacturing hybrid aspherical lens
JPH02244104A (en) Glass optical wave guide
CN102050569B (en) Porous glass deposition is adopted to form the optical fiber preform of microstructure
JPH06222232A (en) Manufacture of optical waveguide
JPH01131031A (en) Production of glass transfer body
JPH06222231A (en) Manufacture of optical waveguide
JPH075329A (en) Production of plastic optical fiber preform and device therefor
JPS6021215A (en) Manufacture of fine pattern
JPH04124044A (en) Production of quartz-based glass preform
JPS607404A (en) Manufacture of convergent type glass waveguide
JPS61210304A (en) Production of optical plane waveguide
JP2003287641A (en) Method for manufacturing laminated structure element for optical communication