JPH07155545A - Production of deodorizing device - Google Patents
Production of deodorizing deviceInfo
- Publication number
- JPH07155545A JPH07155545A JP5302743A JP30274393A JPH07155545A JP H07155545 A JPH07155545 A JP H07155545A JP 5302743 A JP5302743 A JP 5302743A JP 30274393 A JP30274393 A JP 30274393A JP H07155545 A JPH07155545 A JP H07155545A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- catalyst layer
- glass enamel
- glass
- deodorizing catalyst
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exhaust Gas Treatment By Means Of Catalyst (AREA)
- Air Filters, Heat-Exchange Apparatuses, And Housings Of Air-Conditioning Units (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は空気調和機の脱臭方法に
関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a deodorizing method for an air conditioner.
【0002】[0002]
【従来の技術】空気中の臭気成分を取り除く脱臭触媒の
焼成は、高温であるほうが触媒の成分であるアルミナや
シリカ等が焼結されやすく、一方で低温で焼成すると発
熱体の電気絶縁のための乾燥が不完全になる場合があ
る。このような理由により、従来は、焼成温度はできる
限り高いほうが良いという考え方のもとに、脱臭触媒の
変化が起きない上限付近の温度で行われていた。2. Description of the Related Art When burning a deodorizing catalyst that removes odorous components from the air, it is easier to sinter the catalyst components such as alumina and silica at higher temperatures, while firing at a lower temperature causes electrical insulation of the heating element. May be incompletely dried. For this reason, conventionally, the firing temperature has been considered to be as high as possible, and the temperature has been around the upper limit at which the deodorizing catalyst does not change.
【0003】[0003]
【発明が解決しようとする課題】しかし、従来の焼成温
度ではガラスホーローの内部エネルギ、エントロピ等は
変化せず、比熱、膨張率、圧縮率等が不連続的に変わる
ガラス転移点温度を越えてしまうため、ガラスホーロー
と脱臭触媒の熱膨張率の差が大きくなりガラスホーロー
層の伸びに脱臭触媒層がついて行かず、そのために生じ
る引っ張り応力によって脱臭触媒層が割れ、結果として
ガラスホーロー層への脱臭触媒層の密着力が低下し、脱
臭触媒層の剥がれにつながり、剥がれた脱臭触媒が脱臭
装置の組み込まれた空調機より吐き出されてくるという
問題があった。本発明は上記従来技術の課題を解決する
ためになされたものであり、脱臭装置の焼成温度を最適
化することにより脱臭触媒層とガラスホーロー層との密
着性の向上を図ることを目的とするものである。However, at the conventional firing temperature, the internal energy, entropy, etc. of the glass enamel do not change, and the specific heat, expansion coefficient, compressibility, etc., exceed the glass transition temperature which changes discontinuously. Therefore, the difference in the coefficient of thermal expansion between the glass enamel and the deodorizing catalyst becomes large, and the deodorizing catalyst layer does not follow the elongation of the glass enamel layer, and the resulting tensile stress causes the deodorizing catalyst layer to crack, resulting in the glass enamel layer There is a problem that the adhesion of the deodorizing catalyst layer is reduced, the deodorizing catalyst layer is peeled off, and the peeled deodorizing catalyst is discharged from an air conditioner incorporating a deodorizing device. The present invention has been made in order to solve the above-mentioned problems of the prior art, and an object thereof is to improve the adhesion between the deodorizing catalyst layer and the glass enamel layer by optimizing the firing temperature of the deodorizing device. It is a thing.
【0004】[0004]
【課題を解決するための手段】上記課題を解決するた
め、本発明は脱臭装置の焼成温度をガラスホーローのガ
ラス転移点以下にするものである。In order to solve the above-mentioned problems, the present invention sets the firing temperature of the deodorizing device to be equal to or lower than the glass transition point of the glass enamel.
【0005】[0005]
【作用】焼成温度をガラスホーローのガラス転移点温度
以下にし、ガラスホーロー層と脱臭触媒層の伸びの差を
小さくすることにより脱臭触媒層の密着力低下による剥
離を抑えることができる。[Function] By controlling the firing temperature to be equal to or lower than the glass transition temperature of the glass enamel and reducing the difference in elongation between the glass enamel layer and the deodorizing catalyst layer, the deodorizing catalyst layer can be prevented from peeling due to a decrease in adhesion.
【0006】[0006]
【実施例】以下、本発明の一実施例を示す。EXAMPLE An example of the present invention will be described below.
【0007】本発明の脱臭装置製造方法で製造した脱臭
装置の構成を図1に示す。1は発熱体、2は発熱体1に
対して、熱的に一体化させた金属基材、3は金属基材上
に塗布したガラスホーロー層、4はガラスホーロー層上
に塗布した脱臭触媒層である。FIG. 1 shows the configuration of a deodorizing device manufactured by the method for manufacturing a deodorizing device of the present invention. Reference numeral 1 is a heating element, 2 is a metal base material that is thermally integrated with the heating element 1, 3 is a glass enamel layer applied on the metal base material, 4 is a deodorizing catalyst layer applied on the glass enamel layer Is.
【0008】脱臭触媒層4を塗布後、焼成炉において、
ガラスホーロー層3のガラス転移点温度Tg以下の温度
Tで焼成を行う。この時の焼成温度がガラスホーロー層
のガラス転移点温度であるTgを越えると、図2のよう
にガラスホーローの熱膨張率が急激に大きくなり脱臭触
媒層4の熱膨張との差が非常に大きくなる。そのため脱
臭触媒層4が大きな引っ張り応力を受けることになる
が、脱臭触媒層4はセラミックであるため引っ張り応力
には弱い。このため脱臭触媒層4に無数のひびが発生
し、脱臭触媒層4のガラスホーロー層3への密着強度を
著しく損なわれてしまう。しかし、この焼成の工程は発
熱体1の電気絶縁抵抗を得るための乾燥の工程も兼ねて
いるため、焼成温度をむやみに低くすると、発熱体が充
分な電気絶縁抵抗を得ることができず、電気絶縁不良と
なる可能性がある。そのためガラス転移点温度Tgを越
えない温度でできるだけ高い温度を利用する必要があ
る。そのために本発明では、ガラス転移点温度Tg以下
で、しかもなるべく高い温度で焼成を行う。このように
焼成温度をガラス転移点温度以下にすることにより脱臭
触媒層4の密着強度を上げることができる。また焼成温
度をガラス転移点温度以上にしていたことにより、脱臭
触媒の密着性を良くするために行っていたガラスホーロ
ー層3の表面の粗度がガラスホーロー層の軟化により平
滑化してしまっていたが、焼成温度を下げることにより
その粗度を保つことができ、脱臭触媒層との密着強度を
上げることができる。After applying the deodorizing catalyst layer 4, in a firing furnace,
Firing is performed at a temperature T that is equal to or lower than the glass transition temperature Tg of the glass enamel layer 3. When the firing temperature at this time exceeds Tg which is the glass transition temperature of the glass enamel layer, the coefficient of thermal expansion of the glass enamel rapidly increases as shown in FIG. 2 and the difference from the thermal expansion of the deodorizing catalyst layer 4 becomes very large. growing. Therefore, the deodorizing catalyst layer 4 receives a large tensile stress, but since the deodorizing catalyst layer 4 is a ceramic, it is weak against the tensile stress. Therefore, countless cracks are generated in the deodorizing catalyst layer 4, and the adhesion strength of the deodorizing catalyst layer 4 to the glass enamel layer 3 is significantly impaired. However, since this firing step also serves as a drying step for obtaining the electric insulation resistance of the heating element 1, if the firing temperature is unduly lowered, the heating element cannot obtain a sufficient electric insulation resistance, Poor electrical insulation may result. Therefore, it is necessary to utilize as high a temperature as possible without exceeding the glass transition temperature Tg. Therefore, in the present invention, firing is performed at a glass transition temperature Tg or lower and at a temperature as high as possible. By setting the firing temperature to the glass transition temperature or lower as described above, the adhesion strength of the deodorizing catalyst layer 4 can be increased. In addition, since the firing temperature was set to the glass transition temperature or higher, the surface roughness of the glass enamel layer 3 which was used to improve the adhesion of the deodorizing catalyst was smoothed by softening the glass enamel layer. However, the roughness can be maintained by lowering the firing temperature, and the adhesion strength with the deodorizing catalyst layer can be increased.
【0009】[0009]
【発明の効果】以上のように本発明では焼成温度をホー
ローのガラス転移点温度以下にすることによってガラス
ホーロー層に対する脱臭触媒のひび割れを低減すること
ができ、その結果、脱臭触媒層の剥がれを低減すること
ができる。また、ガラスホーロー面の粗度を保つことが
できるため脱臭触媒層の密着力が保たれ、これによって
も脱臭触媒層の剥離を防ぐことができる。As described above, in the present invention, cracking of the deodorizing catalyst with respect to the glass enamel layer can be reduced by setting the firing temperature to the glass transition temperature of the enamel or less, and as a result, peeling of the deodorizing catalyst layer can be prevented. It can be reduced. Further, since the roughness of the glass enamel surface can be maintained, the adhesion of the deodorizing catalyst layer can be maintained, and this can also prevent peeling of the deodorizing catalyst layer.
【図1】本発明の一実施例における脱臭装置の構成図FIG. 1 is a configuration diagram of a deodorizing device according to an embodiment of the present invention.
【図2】ガラスホーローの熱膨張曲線図Fig. 2 Thermal expansion curve diagram of glass enamel
1 発熱体 2 金属基材 3 ガラスホーロー層 4 脱臭触媒層 1 Heating Element 2 Metal Substrate 3 Glass Enamel Layer 4 Deodorizing Catalyst Layer
───────────────────────────────────────────────────── フロントページの続き (72)発明者 川勝 真理子 大阪府門真市大字門真1006番地 松下電器 産業株式会社内 ─────────────────────────────────────────────────── ─── Continued Front Page (72) Inventor Mariko Kawakatsu 1006 Kadoma, Kadoma City, Osaka Prefecture Matsushita Electric Industrial Co., Ltd.
Claims (1)
金属基材と、前記金属基材上に形成されたガラスホーロ
ー層、及び前記ガラスホーロー層上に形成された脱臭用
触媒層とから脱臭装置を構成し、前記脱臭装置を前記ガ
ラスホーロー層のガラス転移点温度以下の温度で焼成す
ることを特徴とする脱臭装置の製造方法。1. A heating element, a metal substrate thermally integrated with the heating element, a glass enamel layer formed on the metal substrate, and a deodorizing catalyst formed on the glass enamel layer. A method for producing a deodorizing device, comprising forming a deodorizing device with a layer, and firing the deodorizing device at a temperature not higher than the glass transition temperature of the glass enamel layer.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5302743A JPH07155545A (en) | 1993-12-02 | 1993-12-02 | Production of deodorizing device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5302743A JPH07155545A (en) | 1993-12-02 | 1993-12-02 | Production of deodorizing device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH07155545A true JPH07155545A (en) | 1995-06-20 |
Family
ID=17912619
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5302743A Pending JPH07155545A (en) | 1993-12-02 | 1993-12-02 | Production of deodorizing device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH07155545A (en) |
-
1993
- 1993-12-02 JP JP5302743A patent/JPH07155545A/en active Pending
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