JPH0715528B2 - Method for producing tapered optical waveguide - Google Patents
Method for producing tapered optical waveguideInfo
- Publication number
- JPH0715528B2 JPH0715528B2 JP61136554A JP13655486A JPH0715528B2 JP H0715528 B2 JPH0715528 B2 JP H0715528B2 JP 61136554 A JP61136554 A JP 61136554A JP 13655486 A JP13655486 A JP 13655486A JP H0715528 B2 JPH0715528 B2 JP H0715528B2
- Authority
- JP
- Japan
- Prior art keywords
- optical waveguide
- substrate
- tapered optical
- tapered
- light incident
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Optical Integrated Circuits (AREA)
Description
【発明の詳細な説明】 産業上の利用分野 本発明はコヒーレント光を使用する光情報処理分野ある
いは光通信,光応用計測制御分野に使用される光導波路
とレーザおよび光ファイバとの高効率結合を可能にする
テーパ状光導波路作製方法に関するものである。The present invention relates to highly efficient coupling between an optical waveguide and a laser or optical fiber used in the field of optical information processing using coherent light, or in the fields of optical communication and optical application measurement control. The present invention relates to a method for manufacturing a tapered optical waveguide that enables the above.
従来の技術 プロトン交換法によりLiNbO3上に光導波路を形成し、TE
/TMモードスプリッタや波長変換素子などが作製されて
いた。上記光導波路への結合効率を向上させるため光入
射部をテーパ状にすることが考えられる。Conventional technology An optical waveguide was formed on LiNbO 3 by the proton exchange method, and TE
/ TM mode splitters and wavelength conversion elements were manufactured. It is conceivable to taper the light incident portion in order to improve the coupling efficiency with the optical waveguide.
従来、テーパ状光導波路の作製方法としてアプライド
オプティックス(Applied Optics)1979年3月号 Vol1
8,No.6 900〜902頁のジェー・シー・キャンベル氏(J.
C.Campbell)による方法がある。この方法は第3図に示
されるように保護マスク7が形成された基板1′を徐々
に硝酸銀5′の溶液に浸していくことにより拡散深さを
変化させてテーパ状光導波路を形成するというものであ
る。Conventionally, it has been applied as a method for manufacturing a tapered optical waveguide.
Applied Optics March 1979 Vol1
8, No.6 900 to 902 JC Campbell (J.
There is a method by C.Campbell). According to this method, as shown in FIG. 3, the substrate 1'on which the protective mask 7 is formed is gradually dipped in a solution of silver nitrate 5'to change the diffusion depth to form a tapered optical waveguide. It is a thing.
発明が解決しようとする問題点 このような従来の方法では基板であるLiNbO3基板に安息
香酸などの酸を用いてテーパ状光導波路を作製する場
合、溶液の蒸気のため光入射部以外の部分もプロトン交
換されてしまうという問題があった。また量産性,制御
性を良くするためには装置自体が大がかりになってしま
うという問題もあった。Problems to be Solved by the Invention When a tapered optical waveguide is prepared by using an acid such as benzoic acid on a LiNbO 3 substrate which is a substrate in such a conventional method, a portion other than the light incident portion is generated due to the vapor of the solution. However, there was a problem that protons would be exchanged. There is also a problem that the device itself becomes large in scale in order to improve mass productivity and controllability.
問題点を解決するための手段 本発明は強誘電体基板の表面に酸を塗布し、光入射部と
光導波部の温度に変化を付けテーパ状導波路を作製しよ
うとするものである。Means for Solving the Problems The present invention intends to fabricate a tapered waveguide by applying an acid to the surface of a ferroelectric substrate and changing the temperatures of the light incident portion and the optical waveguide portion.
作用 本発明の構成によれば蒸気の影響は受けず簡単に制御性
良く、しかも一度の熱処理によりテーパ状光導波路を作
製することができる。Effects According to the structure of the present invention, the tapered optical waveguide can be manufactured easily and with good controllability without being affected by vapor.
実 施 例 第1図は本発明のテーパ状光導波路の作製方法の一実施
例を示す構成図である。同図(a)で1はLiNbO3基板、
2はピロ燐酸、3,4は加熱されたAlブロックである。ピ
ロ燐酸2は純度95%のものを用いスピンナで300r.p.m,1
0秒間塗布を行った。またAlブロック3は230℃,Alブロ
ック4は260℃に加熱されている。このブロック3,4上で
LiNbO3基板1を10分間熱処理し、プロトン交換によりテ
ーパ状光導波路を作製した。同図(b)に上記プロセス
により作製されたテーパ状光導波路の断面図を示す。光
導波部5は厚み0.5μm,光入射部6は厚み1μmとなっ
た。Practical Example FIG. 1 is a constitutional view showing an embodiment of a method for producing a tapered optical waveguide of the present invention. In the figure (a), 1 is a LiNbO 3 substrate,
2 is pyrophosphoric acid, and 3 and 4 are heated Al blocks. Pyrophosphoric acid 2 with a purity of 95% is used with a spinner at 300 rpm.
Application was performed for 0 seconds. The Al block 3 is heated to 230 ° C and the Al block 4 is heated to 260 ° C. On this block 3,4
The LiNbO 3 substrate 1 was heat-treated for 10 minutes, and a tapered optical waveguide was produced by proton exchange. A sectional view of the tapered optical waveguide manufactured by the above process is shown in FIG. The optical waveguide portion 5 had a thickness of 0.5 μm, and the light incident portion 6 had a thickness of 1 μm.
次に厚み方向だけでなく横方向にも光が閉じ込められる
三次元導波路作製について第2図を用いて説明する。ま
ずLiNbO3基板1上に蒸着,フォトプロセスなどによりTa
による保護マスク7および保護マスク7に形成されたス
リット8を形成する。このLiNbO3基板1を先の実施例と
同様にAlブロック4,5を用いて熱処理しスリット8直下
に厚み0.5μmの光導波部と厚み1μmの光入射部が得
られた。He−Neレーザとこのテーパ状光導波路との結合
効率は光導波部だけのときの値30%に対して1.5倍の45
%が得られた。光導波部と光入射部との間には温度分布
によって良好なテーパ部が形成されたと思われる。Next, fabrication of a three-dimensional waveguide in which light is confined not only in the thickness direction but also in the lateral direction will be described with reference to FIG. First, Ta is deposited on the LiNbO 3 substrate 1 by vapor deposition, photo process, etc.
The protective mask 7 and the slit 8 formed in the protective mask 7 are formed. This LiNbO 3 substrate 1 was heat-treated using Al blocks 4 and 5 as in the previous embodiment, and an optical waveguide portion having a thickness of 0.5 μm and a light incident portion having a thickness of 1 μm were obtained immediately below the slit 8. The coupling efficiency between the He-Ne laser and this tapered optical waveguide is 1.5 times 45% of the value of 30% when only the optical waveguide is used.
%was gotten. It is considered that a good taper portion was formed between the optical waveguide portion and the light incident portion due to the temperature distribution.
なお実施例では良質の基板が入手し易いLiNbO3基板を用
いたがLiTaO3基板などの強誘電体にも有効である。また
酸として室温で液状であるピロ燐酸を用いたが塗布でき
るものであればこれに限ることはない。In the embodiment, a LiNbO 3 substrate, which is a good quality substrate that is easily available, is used, but it is also effective for a ferroelectric such as a LiTaO 3 substrate. Although pyrophosphoric acid which is liquid at room temperature is used as the acid, it is not limited to this as long as it can be applied.
またLiNbO3は+Z板または−Z板を用いると、他のX,Y
板等に比べ化学損傷を受けずに良好な光導波路が形成で
きる。Also, LiNbO 3 can be used for other X, Y by using + Z plate or −Z plate.
A good optical waveguide can be formed without being chemically damaged as compared with a plate or the like.
発明の効果 以上のように本発明のテーパ状光導波路作製方法によれ
ば、光入射部,テーパ部,光導波部の三部分が同時に作
製でき大幅にプロセスを簡略化することができる。また
光入射部形成の際に光導波部も同時に形成されるため酸
の蒸気による作製ムラを生じることもなく、制御性の点
でも優れている。また上記のように簡単に制御性良くテ
ーパ状光導波路が作製でき量産性に対しても有利とな
る。EFFECTS OF THE INVENTION As described above, according to the method for producing a tapered optical waveguide of the present invention, the three portions of the light incident portion, the tapered portion, and the optical waveguide portion can be produced simultaneously, and the process can be greatly simplified. Further, since the optical waveguide portion is formed at the same time when the light incident portion is formed, there is no unevenness in production due to acid vapor, and the controllability is also excellent. Further, as described above, a tapered optical waveguide can be easily manufactured with good controllability, which is advantageous for mass production.
第1図は本発明の第一実施例におけるテーパ状光導波路
の作製方法を示す断面図、第2図は同第二の実施例を示
す斜視図、第3図は従来のテーパ状光導波路の作製方法
を示す構成図である。 1……LiNbO3基板、2……ピロ燐酸、5……光導波部、
6……光入射部。FIG. 1 is a sectional view showing a method for manufacturing a tapered optical waveguide in a first embodiment of the present invention, FIG. 2 is a perspective view showing the same second embodiment, and FIG. 3 is a conventional tapered optical waveguide. It is a block diagram which shows a manufacturing method. 1 ... LiNbO 3 substrate, 2 ... pyrophosphoric acid, 5 ... optical waveguide,
6 ... Light incident part.
Claims (2)
に、ピロ燐酸(H4P2O7)を主成分とする酸を塗布する工
程と、 前記LiNbxTa1-xO3(0≦x≦1)基板の光入射部が形成
される部分の温度T1が、光導波部が形成される部分の温
度T2よりも高くなるような熱処理を行う工程とを含んで
なるテーパ状光導波路の作製方法。1. A step of applying an acid containing pyrophosphoric acid (H 4 P 2 O 7 ) as a main component to the surface of a LiNbxTa 1- xO 3 (0 ≦ x ≦ 1) substrate, and the LiNbxTa 1- xO 3 (0 ≦ x ≦ 1) a step of performing heat treatment so that the temperature T 1 of the portion of the substrate where the light incident portion is formed is higher than the temperature T 2 of the portion where the optical waveguide portion is formed. Method for manufacturing tapered optical waveguide.
または−Z板である特許請求の範囲第1項記載のテーパ
状光導波路の作製方法。2. The method for producing a tapered optical waveguide according to claim 1, wherein the LiNbxTa 1- xO 3 (0 ≦ x ≦ 1) substrate is a + Z plate or a −Z plate.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61136554A JPH0715528B2 (en) | 1986-06-12 | 1986-06-12 | Method for producing tapered optical waveguide |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61136554A JPH0715528B2 (en) | 1986-06-12 | 1986-06-12 | Method for producing tapered optical waveguide |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62293203A JPS62293203A (en) | 1987-12-19 |
JPH0715528B2 true JPH0715528B2 (en) | 1995-02-22 |
Family
ID=15177935
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61136554A Expired - Fee Related JPH0715528B2 (en) | 1986-06-12 | 1986-06-12 | Method for producing tapered optical waveguide |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0715528B2 (en) |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS607403A (en) * | 1983-06-28 | 1985-01-16 | Canon Inc | Forming method of thin film type optical waveguide |
JPS60133405A (en) * | 1983-12-22 | 1985-07-16 | Canon Inc | Formation of pattern |
JPS6170541A (en) * | 1984-09-14 | 1986-04-11 | Canon Inc | Thin film type optical element and its manufacture |
-
1986
- 1986-06-12 JP JP61136554A patent/JPH0715528B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPS62293203A (en) | 1987-12-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPH04234005A (en) | Manufacture of lightguide tube by ion exchange method | |
JPH0715528B2 (en) | Method for producing tapered optical waveguide | |
JPH0313907A (en) | Production of substrate type optical waveguide | |
JP3898585B2 (en) | Method for manufacturing member with optical waveguide | |
JPH0731289B2 (en) | Method for producing tapered optical waveguide | |
JPH0736070A (en) | Wavelength converting element and its production | |
JPH0574802B2 (en) | ||
JPH0731287B2 (en) | Method of forming optical element | |
JPH06174908A (en) | Production of waveguide type diffraction grating | |
JP2538161B2 (en) | Method for manufacturing optical waveguide and lens | |
JPH0797170B2 (en) | Optical element manufacturing method | |
JP2962024B2 (en) | Method for manufacturing optical waveguide and method for manufacturing optical wavelength conversion element | |
JPH0462644B2 (en) | ||
JP2590807B2 (en) | Manufacturing method of optical waveguide | |
US20010031123A1 (en) | Method of processing a substrate made of a ferroelectric single crystalline material | |
JPS61189507A (en) | Preparation of tapered optical waveguide | |
JPH0731288B2 (en) | Method of forming optical element | |
JPS6079308A (en) | Production of plane lens | |
JPH0727091B2 (en) | Optical element manufacturing method | |
JPH0774843B2 (en) | Optical element manufacturing method | |
JPS63109402A (en) | Preparation of optical phase operating plate | |
JPH0688913A (en) | Optical waveguide | |
JPH05333224A (en) | Production of optical waveguide | |
JPH0561083A (en) | Nonlinear ferroelectric optical element and its production | |
JPH05264809A (en) | Diffraction grating and its production |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |