JPH07154067A - Insulating adhesive layer structure for metal based board - Google Patents

Insulating adhesive layer structure for metal based board

Info

Publication number
JPH07154067A
JPH07154067A JP30075393A JP30075393A JPH07154067A JP H07154067 A JPH07154067 A JP H07154067A JP 30075393 A JP30075393 A JP 30075393A JP 30075393 A JP30075393 A JP 30075393A JP H07154067 A JPH07154067 A JP H07154067A
Authority
JP
Japan
Prior art keywords
adhesive layer
insulating adhesive
interface
inorganic powder
conductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP30075393A
Other languages
Japanese (ja)
Inventor
Seiji Mimori
誠司 三森
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Denko Materials Co Ltd
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP30075393A priority Critical patent/JPH07154067A/en
Publication of JPH07154067A publication Critical patent/JPH07154067A/en
Pending legal-status Critical Current

Links

Landscapes

  • Laminated Bodies (AREA)
  • Insulated Metal Substrates For Printed Circuits (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

PURPOSE:To improve the intimate contact between a conductor and an insulating adhesive layer by providing a specific interface adhesive layer at the interface between the insulating adhesive layer and a conductor wiring layer. CONSTITUTION:At least one conductor wiring layer 1 is provided and an insulating adhesive layer 4 is formed of a resin containing an inorganic powder between a base metal plate 5 and the conductor wiring layer 1. In such insulating adhesive layer structure for metal base board, an interface adhesive layer 3 containing 10wt.% or less of inorganic powder having the particle size of 1mum or less is provided at the interface between the insulating adhesive layer 4 and the conductor wiring layer 1. For example, a resin principally comprising an epoxy resin is added with alumina powder to provide an insulating adhesive layer 4 which is then applied, before being cured, with a varnish of resin having identical composition but containing no inorganic powder thus forming an interface adhesive layer 3 of 10mum thick. The interface adhesive layer 3 is placed on a base metal plate 5 of Al and a copper foil 1 of 70mum thick having a roughened face 2 as coarse as 15mum is applied thereto and hot pressed thus obtaining an insulating adhesive layer structure for metal baseboard.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は電子部品に使用する金属
ベース基板用絶縁性接着層の構造に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a structure of an insulating adhesive layer for a metal base substrate used for electronic parts.

【0002】[0002]

【従来の技術】近年、電子機器製品の小型化や高機能化
の要求に対応するために、所謂ハイブリットIC等の電
子部品に使用されるIC等の高集積化や高密度実装によ
って、基板の単位面積当りの発熱量が増加する傾向にあ
る。このため、発生した熱の放散が設計上重要な問題に
なってきた。そこで、従来の所謂ガラスエポキシ基板等
のプリント板に代り、放熱性に優れた金属ベース基板の
使用が増加している。この基板の絶縁性接着層は、特開
昭60−7195号公報に示されるように、高熱伝導性
フィラーを樹脂に均一分散させた構造である。例えば図
3に示すように、その絶縁性接着層4の一方の面にベー
ス金属板5を配し、他方の面に粗化面2を有する導体の
銅箔1を配して熱圧着成形したものである。
2. Description of the Related Art In recent years, in order to meet the demands for miniaturization and high functionality of electronic equipment products, the high integration and high density mounting of ICs used for electronic parts such as so-called hybrid ICs have made it possible to reduce the board size. The calorific value per unit area tends to increase. Therefore, the dissipation of generated heat has become an important issue in design. Therefore, in place of the conventional printed board such as a so-called glass epoxy board, the use of a metal base board excellent in heat dissipation is increasing. The insulating adhesive layer of this substrate has a structure in which a high thermal conductive filler is uniformly dispersed in a resin, as disclosed in JP-A-60-7195. For example, as shown in FIG. 3, a base metal plate 5 is arranged on one surface of the insulating adhesive layer 4, and a conductor copper foil 1 having a roughened surface 2 is arranged on the other surface, and thermocompression molding is performed. It is a thing.

【0003】[0003]

【発明が解決しようとする課題】前記した絶縁性接着層
構造では、接着層中に含まれる無機粉体が導体やベース
金属板の界面に存在した場合、局所的な密着力が確保出
来ず、ばらつきや導体の引き剥がし強さが低くなるとい
う問題点がある。また、ベース金属板の表面に傷や突起
等の欠陥が存在した場合は、積層で欠陥部及びその周囲
に気泡が発生し、基板の耐電圧を低下させる。本発明
は、上記した問題点に鑑みてなされたものであり、導体
と絶縁性接着層との密着性を改善した金属ベース基板用
の絶縁性接着層構造を提供するものである。
In the above-mentioned insulating adhesive layer structure, when the inorganic powder contained in the adhesive layer exists at the interface between the conductor and the base metal plate, local adhesion cannot be secured, There is a problem in that the variation and the peeling strength of the conductor become low. Further, when there are defects such as scratches and protrusions on the surface of the base metal plate, bubbles are generated in the defective portion and its periphery in the lamination, and the withstand voltage of the substrate is lowered. The present invention has been made in view of the above problems, and provides an insulating adhesive layer structure for a metal base substrate in which the adhesion between the conductor and the insulating adhesive layer is improved.

【0004】[0004]

【課題を解決するための手段】本発明は、少なくとも1
層の導体配線層を有し、ベース金属板と該導体配線層と
の間に無機粉体を含む樹脂からなる絶縁性接着層を形成
した金属ベース基板用絶縁性接着層構造において、前記
絶縁性接着層と導体配線層との界面に1μm以下の無機
粉体の含有率が10重量%以下である界面接着層を設け
た金属ベース基板用絶縁性接着層構造に関する。本発明
において、界面接着層は、絶縁性接着層の一部(表面)を
無機粉体量の少ない層に形成したものであるが、便宜上
この用語を用いる。ベース金属板としてはアルミニウ
ム、銅、鉄等が用いられ、導体配線層用の導体箔として
は通常銅箔が用いられる。導体箔の絶縁性接着層と接す
る面は接着性を良くするために粗化面を形成する。無機
粉体は、熱伝導率が常温で10W/m・K以上の高熱伝
導性のものが好ましく用いられ、その代表的なものはア
ルミナ粉である。
SUMMARY OF THE INVENTION The present invention comprises at least one
Insulating adhesive layer structure for a metal base substrate, which has an insulating adhesive layer made of resin containing inorganic powder between the base metal plate and the conductive wiring layer, The present invention relates to an insulating adhesive layer structure for a metal base substrate, which is provided with an interface adhesive layer having an inorganic powder content of 1 μm or less of 10% by weight or less at the interface between the adhesive layer and the conductor wiring layer. In the present invention, the interfacial adhesive layer is formed by forming a part (surface) of the insulating adhesive layer into a layer having a small amount of inorganic powder, but this term is used for convenience. Aluminum, copper, iron or the like is used as the base metal plate, and copper foil is usually used as the conductor foil for the conductor wiring layer. The surface of the conductor foil in contact with the insulating adhesive layer is formed with a roughened surface in order to improve the adhesiveness. As the inorganic powder, one having high thermal conductivity having a thermal conductivity of 10 W / m · K or more at room temperature is preferably used, and a typical one is alumina powder.

【0005】界面接着層及び絶縁性接着層の樹脂として
は、電子部品に使用される基板に必要な電気的、機械的
及び熱的な特性を有し、信頼性が確保できる材料であれ
ばよく、特に制限は無いが、例えばエポキシが使用され
る。また、界面接着層と絶縁性接着層とは同一の樹脂で
あることが好ましい。界面接着層における1μm以下の
無機粉体の含有率が10重量%を越えると、その無機粉
体が導体配線層の導体箔の粗化面内に入り込んで絶縁性
接着層と導体配線層との密着性を低下させる。無機粉体
の含有率は5重量%以下が好ましく、特に好ましくは無
機粉体を全く含まないようにすることである。無機粉体
として1μmより大きい粒子が存在すると、導体箔の粗
化面と樹脂との接触が阻害されて、密着力が低下する。
The resin for the interface adhesive layer and the insulating adhesive layer may be any material as long as it has electrical, mechanical and thermal characteristics necessary for a substrate used for electronic parts and can ensure reliability. Although not particularly limited, for example, epoxy is used. The interface adhesive layer and the insulating adhesive layer are preferably made of the same resin. When the content of the inorganic powder of 1 μm or less in the interfacial adhesive layer exceeds 10% by weight, the inorganic powder enters the roughened surface of the conductor foil of the conductor wiring layer to form the insulating adhesive layer and the conductor wiring layer. Decrease adhesion. The content of the inorganic powder is preferably 5% by weight or less, and particularly preferably the inorganic powder is not contained at all. If particles larger than 1 μm are present as the inorganic powder, the contact between the roughened surface of the conductor foil and the resin is hindered, and the adhesion is lowered.

【0006】界面接着層の厚さは、導体配線層の導体箔
粗化面の足の長さの50%以上にすれば、絶縁性接着層
と導体配線層との密着力が向上して好ましく、更に20
μm以下にすれば粉体による放熱性も保持出来て好まし
い。また、ベース金属板と絶縁性接着層との界面にも、
導体配線層と絶縁性接着層との界面に設けたものと同様
の界面接着層を設ければ、ベース金属板表面の傷や突起
等の欠陥に由来する基板の耐電圧の低下を防止出来て好
ましい。この界面接着層の厚さは20μm以下が好まし
い。
If the thickness of the interfacial adhesive layer is 50% or more of the length of the foot of the roughened conductor foil of the conductor wiring layer, the adhesion between the insulating adhesive layer and the conductor wiring layer is improved, which is preferable. , 20 more
It is preferable that the thickness be less than or equal to μm because the heat dissipation of the powder can be maintained. Also, at the interface between the base metal plate and the insulating adhesive layer,
By providing an interface adhesive layer similar to that provided at the interface between the conductor wiring layer and the insulating adhesive layer, it is possible to prevent a decrease in the withstand voltage of the substrate due to defects such as scratches and protrusions on the surface of the base metal plate. preferable. The thickness of this interface adhesive layer is preferably 20 μm or less.

【0007】[0007]

【実施例】次に本発明の実施例を説明する。 実施例1 重量でエポキシ樹脂のエピコート828(油化シェル
製)75部及びDEN−431(ダウケミカル製)25
部、エポキシ化ポリブタジエンのR45−EPT(出光
石油化学製)25部、硬化剤のジシアミンジアミド(日
本カーバイド製)4部、硬化促進剤の2PZ−CN(四
国化成工業製)0.3部からなる組成の樹脂に、無機粉
体としてアルミナ粉(昭和電工製、平均粒径3.0μ
m)280部を添加し、更に有機溶剤のメチルエチルケ
トン(長瀬産業製)を加えてビーズミルで良く混練した
後真空脱気してスラリーを作製した。このスラリーを離
型剤を塗布したポリエステルフイルムにドクターブレー
ド法により塗布した後、120℃で15分乾燥して厚さ
100μmの硬化前の絶縁性接着シートを作製した。
EXAMPLES Examples of the present invention will be described below. Example 1 75 parts by weight of Epicoat 828 (manufactured by Yuka Shell) of epoxy resin and 25 DEN-431 (manufactured by Dow Chemical)
From 25 parts of epoxidized polybutadiene R45-EPT (manufactured by Idemitsu Petrochemical), 4 parts of curing agent disiamine diamide (manufactured by Nippon Carbide), 0.3 parts of curing accelerator 2PZ-CN (manufactured by Shikoku Chemicals) Alumina powder (Showa Denko, average particle size 3.0μ)
m) 280 parts were added, and further, methyl ethyl ketone (manufactured by Nagase & Co., Ltd.) as an organic solvent was added and well kneaded with a bead mill, and then vacuum deaeration was performed to prepare a slurry. This slurry was applied to a polyester film coated with a release agent by the doctor blade method, and then dried at 120 ° C. for 15 minutes to prepare a 100 μm thick pre-cured insulating adhesive sheet.

【0008】この硬化前の絶縁性接着シートを図1に示
すように絶縁性接着層4とし、前記組成の樹脂に有機溶
剤を加えて混練した無機粉体を含まないワニスをこの絶
縁性接着層4のポリエステルフイルムのない方の面に塗
布して120℃で15分乾燥し、無機粉体を含まない1
0μm厚さの界面接着層3を形成した。次に、絶縁性接
着層4のポリエステルフイルムを剥離し、厚さ2mmのア
ルミニウムのベース金属板5に載置し、更に厚さ70μ
mで粗化面2の足の長さが15μmの銅箔1を界面接着
層3の上に設置して、熱圧着プレスで100℃で10分
間保持した後、10kg/cm2で加圧しながら200℃で
15分間保持し、その後自然冷却して片面1層導体の金
属ベース基板用絶縁性接着層構造体を得た。
This insulative adhesive sheet before curing is used as an insulative adhesive layer 4 as shown in FIG. 1, and a varnish containing no inorganic powder is kneaded by kneading an organic solvent with a resin having the above composition. 4 coated on the non-polyester film side and dried at 120 ° C for 15 minutes, containing no inorganic powder 1
The interface adhesive layer 3 having a thickness of 0 μm was formed. Next, the polyester film of the insulating adhesive layer 4 is peeled off and placed on the aluminum base metal plate 5 having a thickness of 2 mm, and the thickness is 70 μm.
A copper foil 1 having a roughened surface 2 and a foot length of 15 μm is placed on the interfacial adhesion layer 3 and held at 100 ° C. for 10 minutes by a thermocompression bonding press, while applying a pressure of 10 kg / cm 2. It was held at 200 ° C. for 15 minutes and then naturally cooled to obtain an insulating adhesive layer structure for a metal base substrate having a single-sided single-layer conductor.

【0009】実施例2 実施例1で作製した界面接着層を有する絶縁性接着層の
ポリエステルフイルムを剥離し、この剥離面に実施例1
と同一組成の無機粉体を含まないワニスを塗布し、12
0℃で15分乾燥して、図2に示すように絶縁性接着層
4のもう一方の面にも12μmの厚さの界面接着層3´
を形成した。この界面接着層3´にベース金属板5を配
し、他方の界面接着層3に銅箔1を配して、以下実施例
1と同様にして熱圧着プレスし、片面1層導体の金属ベ
ース基板用絶縁性接着層構造体を得た。
Example 2 The polyester film of the insulating adhesive layer having the interfacial adhesive layer prepared in Example 1 was peeled off, and the peeled surface of Example 1 was peeled off.
Apply a varnish containing no inorganic powder with the same composition as
After drying at 0 ° C. for 15 minutes, as shown in FIG. 2, the interface adhesive layer 3 ′ having a thickness of 12 μm is formed on the other surface of the insulating adhesive layer 4.
Was formed. The base metal plate 5 is placed on the interface adhesive layer 3 ', the copper foil 1 is placed on the other interface adhesive layer 3, and thermocompression-bonding pressing is performed in the same manner as in Example 1 below to obtain a metal base of a single-sided single-layer conductor. An insulating adhesive layer structure for a substrate was obtained.

【0010】実施例3 実施例2における界面接着層3´に代えてその絶縁性接
着層4の面に、実施例1の場合と同一組成の樹脂に平均
粒径が0.5μmのアルミナ粉の5重量部を添加し、更
にメチルエチルケトンを加えて混練したスラリーを塗布
し、120℃で15分乾燥して12μmの厚さの界面接
着層を形成し、以下実施例2と同様にして片面1層導体
の金属ベース基板用絶縁性接着層構造体を得た。 実施例4 ベース金属板の表面に0.1mmの径及び深さの傷をつけ
た以外は実施例2と同様にして片面1層導体の金属ベー
ス基板用絶縁性接着層構造体を得た。
Example 3 Instead of the interface adhesive layer 3'in Example 2, the resin of the same composition as in Example 1 was used on the surface of the insulating adhesive layer 4 of alumina powder having an average particle size of 0.5 μm. 5 parts by weight was added, methyl ethyl ketone was further added, and the kneaded slurry was applied and dried at 120 ° C. for 15 minutes to form an interface adhesive layer having a thickness of 12 μm. An insulating adhesive layer structure for a metal base substrate of a conductor was obtained. Example 4 An insulating adhesive layer structure for a metal base substrate having a single-sided single-layer conductor was obtained in the same manner as in Example 2 except that the surface of the base metal plate was scratched with a diameter and depth of 0.1 mm.

【0011】比較例 図3に示すように、実施例1における絶縁性接着シート
からなる絶縁性接着層4の一方の面にアルミニウムのベ
ース金属板5を配し、他方の面に実施例1と同じ銅箔を
配して、以下実施例1と同様にして熱圧着プレスし、片
面1層導体の金属ベース基板用絶縁性接着層構造体を得
た。
Comparative Example As shown in FIG. 3, an aluminum base metal plate 5 was arranged on one surface of an insulating adhesive layer 4 made of an insulating adhesive sheet in Example 1, and the other surface was treated as in Example 1. The same copper foil was placed, and the same thermocompression bonding was performed as in Example 1 to obtain a single-sided, single-layer conductor insulating adhesive layer structure for a metal base substrate.

【0012】[0012]

【表1】 [Table 1]

【0013】前記各実施例及び比較例で作製した片面1
層導体の金属ベース基板用絶縁性接着層構造体につい
て、その性能として、銅箔の引き剥がし強さ、絶縁破壊
電圧及び熱抵抗を測定比較した。その結果を表1に示
す。表1から明らかなように、実施例のものは比較例の
ものに比べて、引き剥がし強さが大きく、大面積の導体
においても面積効果による耐電圧の低下が無く、熱抵抗
も同等である。
One side 1 produced in each of the examples and comparative examples
Regarding the performance of the insulating adhesive layer structure for a metal base substrate of the layer conductor, the peeling strength of the copper foil, the breakdown voltage and the thermal resistance were measured and compared as the performance. The results are shown in Table 1. As is clear from Table 1, the peeling strength of the example is larger than that of the comparative example, the withstand voltage does not decrease due to the area effect even in a large area conductor, and the thermal resistance is the same. .

【0014】[0014]

【発明の効果】本発明によれば、絶縁性接着層と導体配
線層との界面に1μmを越える無機粉体を含まないた
め、導体箔の粗化面の樹脂の接触面積が広くなり、実効
的には密着に寄与しない無機粉体と導体との接触を排除
したことにより、局部的な密着力の低下を防止し、長期
にわたり密着力を確保することが出来る。また、ベース
金属板と導体配線層との界面にも1μmを越える無機粉
体が存在しないようにすれば、ベース金属板の表面の欠
陥に由来する基板の耐電圧の低下を防止することが出来
る。
According to the present invention, since the interface between the insulative adhesive layer and the conductor wiring layer does not contain the inorganic powder exceeding 1 μm, the contact area of the resin on the roughened surface of the conductor foil is widened and the effect is increased. In particular, by eliminating the contact between the inorganic powder and the conductor, which does not contribute to the adhesion, it is possible to prevent a local decrease in the adhesion force and ensure the adhesion force for a long time. Further, if the inorganic powder exceeding 1 μm does not exist at the interface between the base metal plate and the conductor wiring layer, it is possible to prevent the withstand voltage of the substrate from lowering due to the defects on the surface of the base metal plate. .

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の実施例になる金属ベース基板用絶縁性
接着層構造を示す拡大断面図である。
FIG. 1 is an enlarged sectional view showing an insulating adhesive layer structure for a metal base substrate according to an embodiment of the present invention.

【図2】本発明の実施例になる金属ベース基板用絶縁性
接着層構造を示す拡大断面図である。
FIG. 2 is an enlarged sectional view showing an insulating adhesive layer structure for a metal base substrate according to an embodiment of the present invention.

【図3】従来の金属ベース基板用絶縁性接着層構造を示
す拡大断面図である。
FIG. 3 is an enlarged cross-sectional view showing a conventional insulating adhesive layer structure for a metal base substrate.

【符号の説明】[Explanation of symbols]

1…銅箔、2…粗化面、3、3´…界面接着層、4…絶
縁性接着層、5…ベース金属板
DESCRIPTION OF SYMBOLS 1 ... Copper foil, 2 ... Roughened surface, 3 3 '... Interface adhesive layer, 4 ... Insulating adhesive layer, 5 ... Base metal plate

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】 少なくとも1層の導体配線層を有し、ベ
ース金属板と該導体配線層との間に無機粉体を含む樹脂
からなる絶縁性接着層を形成した金属ベース基板用絶縁
性接着層構造において、前記絶縁性接着層と導体配線層
との界面に1μm以下の無機粉体の含有率が10重量%
以下である界面接着層を設けた金属ベース基板用絶縁性
接着層構造。
1. An insulating adhesive for a metal base substrate, which has at least one conductor wiring layer, and an insulating adhesive layer made of a resin containing inorganic powder is formed between the base metal plate and the conductor wiring layer. In the layered structure, the content of the inorganic powder of 1 μm or less at the interface between the insulating adhesive layer and the conductor wiring layer is 10% by weight.
An insulating adhesive layer structure for a metal base substrate provided with the following interface adhesive layer.
【請求項2】 界面接着層が無機粉体を含まない請求項
1記載の金属ベース基板用絶縁性接着層構造。
2. The insulating adhesive layer structure for a metal base substrate according to claim 1, wherein the interface adhesive layer contains no inorganic powder.
【請求項3】 無機粉体の熱伝導率が常温で10W/m
・K以上である請求項1又は2記載の金属ベース基板用
絶縁性接着層構造。
3. The thermal conductivity of the inorganic powder is 10 W / m at room temperature.
The insulating adhesive layer structure for a metal base substrate according to claim 1 or 2, which is K or more.
【請求項4】 界面接着層の樹脂が、絶縁性接着層の樹
脂と同一である請求項1〜3記載の金属ベース基板用絶
縁性接着層構造。
4. The insulating adhesive layer structure for a metal base substrate according to claim 1, wherein the resin of the interface adhesive layer is the same as the resin of the insulating adhesive layer.
【請求項5】 界面接着層の厚さを、導体配線層の導体
箔粗化面の足の長さの50%以上で且つ20μm以下に
形成した請求項1〜4記載の金属ベース基板用絶縁性接
着層構造。
5. The insulation for a metal base substrate according to claim 1, wherein the thickness of the interface adhesive layer is 50% or more and 20 μm or less of the length of the foot of the roughened conductor foil of the conductor wiring layer. Adhesive layer structure.
【請求項6】 絶縁性接着層とベース金属板との界面
に、20μm以下の厚さの界面接着層を形成した請求項
1〜5記載の金属ベース基板用絶縁性接着層構造。
6. The insulating adhesive layer structure for a metal base substrate according to claim 1, wherein an interface adhesive layer having a thickness of 20 μm or less is formed at an interface between the insulating adhesive layer and the base metal plate.
JP30075393A 1993-12-01 1993-12-01 Insulating adhesive layer structure for metal based board Pending JPH07154067A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP30075393A JPH07154067A (en) 1993-12-01 1993-12-01 Insulating adhesive layer structure for metal based board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP30075393A JPH07154067A (en) 1993-12-01 1993-12-01 Insulating adhesive layer structure for metal based board

Publications (1)

Publication Number Publication Date
JPH07154067A true JPH07154067A (en) 1995-06-16

Family

ID=17888686

Family Applications (1)

Application Number Title Priority Date Filing Date
JP30075393A Pending JPH07154067A (en) 1993-12-01 1993-12-01 Insulating adhesive layer structure for metal based board

Country Status (1)

Country Link
JP (1) JPH07154067A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001036205A (en) * 1999-07-23 2001-02-09 Mitsubishi Plastics Ind Ltd Metal base printed wiring board, metal base multilayer printed wiring board and manufacture thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001036205A (en) * 1999-07-23 2001-02-09 Mitsubishi Plastics Ind Ltd Metal base printed wiring board, metal base multilayer printed wiring board and manufacture thereof

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