JPH07138013A - Silica gel having high specific surface area and controlled high structural property and its production - Google Patents

Silica gel having high specific surface area and controlled high structural property and its production

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Publication number
JPH07138013A
JPH07138013A JP28495893A JP28495893A JPH07138013A JP H07138013 A JPH07138013 A JP H07138013A JP 28495893 A JP28495893 A JP 28495893A JP 28495893 A JP28495893 A JP 28495893A JP H07138013 A JPH07138013 A JP H07138013A
Authority
JP
Japan
Prior art keywords
silica gel
surface area
specific surface
pore diameter
pore
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP28495893A
Other languages
Japanese (ja)
Other versions
JP3016681B2 (en
Inventor
Tadayuki Akasaki
忠行 赤崎
Akiyoshi Kono
昭義 河野
Kazuhiro Takasuga
和宏 高菅
Osamu Nakamura
修 中村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tosoh Silica Corp
Original Assignee
Nippon Silica Industrial Co Ltd
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Filing date
Publication date
Application filed by Nippon Silica Industrial Co Ltd filed Critical Nippon Silica Industrial Co Ltd
Priority to JP28495893A priority Critical patent/JP3016681B2/en
Publication of JPH07138013A publication Critical patent/JPH07138013A/en
Application granted granted Critical
Publication of JP3016681B2 publication Critical patent/JP3016681B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

PURPOSE:To obtain a new silica gel having a high specific surface area and a controlled high structural property and useful as an adsorbent for low molecular organic compounds, a separator for chromatography, a filtering material for beers, etc. CONSTITUTION:A silica gel has a BET specific surface area of 700-1100m<2>/g, a pore volume of 0.5-2.5cc/g, a pore diameter of 20-50Angstrom in the pores occupying 90% of the pore volume, and a relation: AXB>=25000 wherein A (m<2>/g) is the BET specific surface area and B (Angstrom ) is the median pore diameter.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、高い比表面積とコント
ロールされた高構造性を有する新規なシリカゲル、更に
は該物性を有するシリカゲルの製造方法に関するもので
ある。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a novel silica gel having a high specific surface area and a controlled high structural property, and a method for producing silica gel having the physical properties.

【0002】かかる新規なシリカゲルは、低分子有機化
合物の吸着剤、クロマト用分離剤、ビール用濾過剤とし
て有用である。
The novel silica gel is useful as an adsorbent for low molecular weight organic compounds, a separating agent for chromatography, and a filtering agent for beer.

【0003】[0003]

【従来の技術】シリカヒドロゲルの製造方法は、USP
2,466,842号に詳細に述べられている。すなわ
ちシリカヒドロゲルは、ケイ酸ナトリウムと硫酸を過剰
硫酸量が0.5Nの条件下において、混合ノズルを用い
て定量的に混合することによりシリカヒドロゲルを得、
ついでゲル化してシリカヒドロゲルを得ることができ
る。
2. Description of the Prior Art US Pat.
No. 2,466,842. That is, silica hydrogel is obtained by quantitatively mixing sodium silicate and sulfuric acid under the condition that the amount of excess sulfuric acid is 0.5 N using a mixing nozzle,
It can then be gelled to give a silica hydrogel.

【0004】かかるシリカヒドロゲルは、USPl,9
00,859号記載のように、水熱処理によって種々の
比表面積に調整される。
Such silica hydrogel is disclosed in USP 1,9
As described in No. 00,859, various specific surface areas are adjusted by hydrothermal treatment.

【0005】さらにシリカヒドロゲルは、乾燥されるこ
とにより、種々の細孔容積を有するシリカゲルとなる。
Further, the silica hydrogel is dried to give silica gel having various pore volumes.

【0006】その乾燥方法については、USP2,85
6,268号記載のように、過熱蒸気下において、瞬時
に乾燥する方法が知られている。
Regarding the drying method, USP 2,85
As described in No. 6,268, a method of instantaneously drying under superheated steam is known.

【0007】この様にして得られたシリカゲルは、粉砕
により所望の粒度に調整されるか、上述した様な方法に
よって、乾燥と粉砕を同時に行うことにより種々の粒子
径に調整することができる。
The silica gel thus obtained can be adjusted to a desired particle size by pulverization, or can be adjusted to various particle sizes by simultaneously performing drying and pulverization by the method as described above.

【0008】一般的に5μm以下の微細な平均2次粒子
径を有するものは、塗料の艶消し剤、フィルムのアンチ
ブロッキング剤、粘度調整剤等として利用されており、
5μm以上の平均2次粒子径を有するものは、クロマト
用分離剤、ビール用濾過剤として利用されている。
Generally, those having a fine average secondary particle diameter of 5 μm or less are used as a delustering agent for paints, an antiblocking agent for films, a viscosity modifier, and the like.
Those having an average secondary particle size of 5 μm or more are used as a separating agent for chromatography and a filtering agent for beer.

【0009】上述の一方シリカゲルの吸着機能は、表面
に存在するシラノール基による機能と、細孔による吸着
機能により説明される。このことから、高い比表面積を
有しながら、コントロールされた高構造性を有するシリ
カゲルが兼ねてより所望されていた。ここでコントロー
ルされた高構造性のシリカゲルとは、細孔容積0.5〜
2.5cc/g、細孔容積の90%以上が細孔直径20
〜50Åであるものをいう。
The adsorption function of the above-mentioned one silica gel is explained by the function of the silanol groups present on the surface and the adsorption function of the pores. For this reason, silica gel having a high specific surface area and a controlled high structure is also desired. The highly structured silica gel controlled here has a pore volume of 0.5 to
2.5 cc / g, 90% or more of the pore volume has a pore diameter of 20
What is ~ 50Å.

【0010】しかしながら、上述した高い比表面積を有
しながら、コントロールされた高構造性を有するシリカ
ゲル、例えば、BET比表面積をA(m2 /g)としメ
ジアン細孔直径をB(Å)としたときに、これらの関係
が下記の式 A×B≧25000 で表わされるシリカゲルは従来提供されていなかった。
However, silica gel having a controlled high structure while having the above-mentioned high specific surface area, for example, BET specific surface area is A (m 2 / g) and median pore diameter is B (Å). At times, silica gel having these relationships represented by the following formula A × B ≧ 25000 has not been provided so far.

【0011】このような高い比表面積と高構造性を有す
るシリカゲルは、A×Bが25000未満のシリカゲル
に比べて、表面シラノール基による吸着能に優れ、さら
に特定の細孔径を有するので、選択吸着性に優れてい
る。
Silica gel having such a high specific surface area and a high structural property is more excellent in adsorptivity by surface silanol groups than silica gel having A × B of less than 25,000 and further has a specific pore diameter, so that it is selectively adsorbed. It has excellent properties.

【0012】[0012]

【発明が解決しようとする課題】高い比表面積とコント
ロールされた高構造性を有するシリカゲルが従来得られ
ていなかった理由としては次の如き点が考えられる。
The following points can be considered as the reason why silica gel having a high specific surface area and controlled high structure has not been obtained in the past.

【0013】一般的にシリカゲルは、ケイ酸ナトリウム
と硫酸をpHが2程度の酸性側で混合ノズル等を用いて
反応させてシリカヒドロゾルを得る。この時、2〜3n
m程度のシリカの一次粒子が析出する。かかる一次粒子
は1000〜1500m2 /gの比表面積を有する。こ
の一次粒子が3次元網目構造を形成し、シリカヒドロゲ
ルとなる。シリカヒドロゲルは70〜90wt%程度の
水分を含んでおり、その全細孔容積は約2.0〜9.0
cc/gも存在している。
In general, silica gel is obtained by reacting sodium silicate and sulfuric acid on the acidic side having a pH of about 2 using a mixing nozzle or the like to obtain a silica hydrosol. At this time, 2-3n
m primary particles of silica are deposited. Such primary particles have a specific surface area of 1000 to 1500 m 2 / g. The primary particles form a three-dimensional network structure and become silica hydrogel. Silica hydrogel contains about 70 to 90 wt% of water, and its total pore volume is about 2.0 to 9.0.
cc / g is also present.

【0014】この様な、シリカヒドロゲルを水洗・水熱
処理すると、比表面積の低下がおこる。
When such a silica hydrogel is washed with water and hydrothermally treated, the specific surface area is reduced.

【0015】水洗は、通常連続式で行なわれる。その形
態は、カラム中にシリカヒドロゲルを充填し、その上部
あるいは下部より水洗水を連続的に流し込むことによっ
て行なわれる。また水洗水の、温度、pHをコントロー
ルすることによって、水洗と併せて水熱処理の効果をも
たせることができる。
Washing with water is usually carried out continuously. The form is performed by packing silica hydrogel in a column and continuously pouring washing water from the upper part or the lower part. Further, by controlling the temperature and pH of the washing water, the effect of hydrothermal treatment can be obtained together with the washing.

【0016】この時、比表面積を700m2 /g程度に
たもつためには、USPl,900,859号記載のよ
うに、水洗の際30℃程度の低い温度で水洗することが
知られている。
At this time, in order to maintain a specific surface area of about 700 m 2 / g, it is known to wash with water at a low temperature of about 30 ° C. as described in USP 1,900,859. .

【0017】この様な工程の後、続いて乾燥が行なわれ
るが、この時シリカヒドロゲルは激しく収縮し、細孔容
積は約0.3〜0.5cc/g程度まで著しく減少す
る。
After such a step, drying is subsequently carried out. At this time, the silica hydrogel shrinks violently and the pore volume is remarkably reduced to about 0.3 to 0.5 cc / g.

【0018】この理由は定かではないが、シリカヒドロ
ゲルの比表面積を保つ為に、低温で水洗を行なうことか
ら、シリカの溶解・析出がほとんどなく、3次元網目構
造中の一次粒子同士のシロキサン結合が究めて少なく、
その構造が弱いものとなり、その結果、水の蒸発時に起
こるといわれている毛管凝集力によって極度に収縮する
ためであると考えられる。
The reason for this is not clear, but since the silica hydrogel is washed with water at a low temperature in order to maintain its specific surface area, there is almost no dissolution / precipitation of silica, and siloxane bonds between the primary particles in the three-dimensional network structure. There are few,
It is considered that the structure becomes weak, and as a result, it contracts extremely due to the capillary cohesive force that is said to occur when water evaporates.

【0019】一方、比表面積と細孔直径の関係は、比表
面積が高いと細孔直径が小さくなる傾向があり、本発明
の如き高い比表面積の領域において (BET比表面積):A(m2 /g),(メジアン細孔
直径):B(Å) A×B≧25000 の条件を満たすシリカゲルは得られていなかった。
On the other hand, regarding the relationship between the specific surface area and the pore diameter, the pore diameter tends to decrease as the specific surface area increases, and in the high specific surface area as in the present invention, (BET specific surface area): A (m 2 / G), (median pore diameter): B (Å) A × B ≧ 25000, the silica gel satisfying the condition was not obtained.

【0020】そこで、本発明者等は、従来製造し得なか
った、高い比表面積でありながら、細孔容積が高く、か
つ細孔直径も高く維持された新規なシリカゲルについて
かねてより鋭意研究を重ね、体系的な検討を進めたとこ
ろ、本発明による方法によって一挙に解決できることを
見出すに至った。
Therefore, the inventors of the present invention have been earnestly researching a novel silica gel which has a high specific surface area and which has a high pore volume and a high pore diameter, which has not been conventionally produced. As a result of systematic examination, it has been found that the method according to the present invention can solve the problems all at once.

【0021】すなわち本発明は、高い比表面積とコント
ロールされた高構造性を有するシリカゲルを提供するこ
とを目的とする。
That is, the object of the present invention is to provide a silica gel having a high specific surface area and a controlled high structural property.

【0022】また本発明の別の目的は、かかる新規なシ
リカゲルを製造する方法を提供するところにある。
Another object of the present invention is to provide a method for producing such a novel silica gel.

【0023】[0023]

【課題を解決するための手段】本発明者等は、上記物性
を有するシリカゲルについて鋭意研究を重ねた結果、本
発明で特定する条件下で、水熱処理を行なう行なうこと
により、従来製造するに至らなかった新規なシリカゲル
を容易に製造できる知見を見いだし、本発明を完成する
に至ったものである。
Means for Solving the Problems As a result of intensive studies on the silica gel having the above-mentioned physical properties, the inventors of the present invention have achieved conventional production by carrying out hydrothermal treatment under the conditions specified in the present invention. The present inventors have completed the present invention by discovering the finding that a novel silica gel which could not be produced can be easily produced.

【0024】すなわち本発明のシリカゲルは、BET比
表面積700〜1100m2 /g、細孔容積0.5〜
2.5cc/g、細孔容積の90%以上が細孔直径20
〜50Åにあり、かつBET比表面積をA(m2 /g)
としメジアン細孔直径をB(Å)としたときにこれらの
関係が下記の式 A×B≧25000 で表わされる特性を有する。
That is, the silica gel of the present invention has a BET specific surface area of 700 to 1100 m 2 / g and a pore volume of 0.5 to
2.5 cc / g, 90% or more of the pore volume has a pore diameter of 20
~ 50Å, and has a BET specific surface area of A (m 2 / g)
When the median pore diameter is B (Å), these relations have the characteristics represented by the following formula A × B ≧ 25000.

【0025】そして、この様な特性を有するシリカゲル
は、ケイ酸ナトリウムと硫酸を混合して得られたシリカ
ヒドロゲルを、比表面積を低下させずに一次粒子の結合
のみを増加させる目的で、80℃〜200℃、好ましく
は90℃〜150℃、pH4.0未満、好ましくは3.
0未満で水熱処理した後、水洗・乾燥することにより得
ることができる。
The silica gel having such characteristics is a silica hydrogel obtained by mixing sodium silicate and sulfuric acid at 80 ° C. for the purpose of increasing only the bond of primary particles without decreasing the specific surface area. ~ 200 ° C, preferably 90 ° C to 150 ° C, pH less than 4.0, preferably 3.
It can be obtained by hydrothermal treatment at less than 0, followed by washing with water and drying.

【0026】本発明のシリカゲルはその比表面積が70
0m2 /g未満では、表面シラノール基による吸着機能
が不十分である。反対に1100m2 /gを越えるもの
は、理由は定かではないが、吸着機能が安定せず、使用
に際してシリカゲルの物性が著しく変化するという問題
があるため上記の範囲とされる。
The silica gel of the present invention has a specific surface area of 70.
If it is less than 0 m 2 / g, the adsorption function of the surface silanol groups is insufficient. On the other hand, if the amount exceeds 1100 m 2 / g, the reason is not clear, but the adsorption function is not stable, and there is a problem that the physical properties of silica gel change remarkably during use, so that it is within the above range.

【0027】また上記シリカゲルはコントロールされた
高構造性を有することが必要であり、細孔容積が0.5
cc/g未満では吸着量が不十分である。反対に2.5
cc/gを越えるものは、本発明による方法では得るこ
とができない。更に、細孔容積20〜50Åのものが9
0%未満であると吸着性能が著しく悪くなり本発明の目
的が達成できない。そして、BET比表面積をA(m2
/g)としメジアン細孔直径をB(Å)としたときにA
×Bが25000未満であると、前述したように、吸着
性能が良くない。
Further, the above silica gel needs to have a controlled high structural property and has a pore volume of 0.5.
If it is less than cc / g, the amount of adsorption is insufficient. On the contrary 2.5
Those exceeding cc / g cannot be obtained by the method according to the present invention. Furthermore, the pore volume of 20 to 50Å is 9
If it is less than 0%, the adsorption performance is remarkably deteriorated and the object of the present invention cannot be achieved. Then, the BET specific surface area is A (m 2
/ G) and the median pore diameter is B (Å), A
If xB is less than 25,000, the adsorption performance is not good, as described above.

【0028】更に上述の内容について詳細に説明する。Further, the above contents will be described in detail.

【0029】シリカヒドロゲルは、例えば、SiO2
25wt%、モル比3.3のケイ酸ナトリウムと、H2
SO4 42wt%の硫酸を混合ノズルを用いて、pH
0.5〜2.0、温度60℃以下の条件で混合し、シリ
カヒドロゾルを得、このシリカヒドロゾルが10分以内
にゲル化してシリカヒドロゲルを得ることができる。ま
たバッチ反応槽において、ケイ酸ナトリウムと硫酸をp
H0.5〜2.0の条件で同時に滴下しながら得ること
もでき、更にまた硫酸にケイ酸ナトリウムを加えること
によって得ることもできる。なお本発明は、これらの方
法に限定されるものではなく、シリカヒドロゲル生成時
の比表面積が700m2 /g以上であればよい。
Silica hydrogels are, for example, SiO 2
25 wt% sodium silicate with a molar ratio of 3.3 and H 2
42% by weight of SO 4 sulfuric acid was added to the pH using a mixing nozzle.
The silica hydrosol can be obtained by mixing under conditions of 0.5 to 2.0 and a temperature of 60 ° C. or lower, and the silica hydrosol can be gelated within 10 minutes to obtain a silica hydrogel. In a batch reactor, sodium silicate and sulfuric acid are added
It can also be obtained by dropping at the same time under the condition of H 0.5 to 2.0, or by adding sodium silicate to sulfuric acid. The present invention is not limited to these methods, and the specific surface area at the time of silica hydrogel formation may be 700 m 2 / g or more.

【0030】このようにして得られたシリカヒドロゲル
を、次いで水洗、水熱処理する。
The silica hydrogel thus obtained is then washed with water and hydrothermally treated.

【0031】ここで重要なことは、比表面積を低下させ
ずに、3次元網目構造中の一次粒子の構造を強化させ、
次いで行なわれる乾燥の工程において収縮の影響を受け
ないようにすることである。
What is important here is that the structure of the primary particles in the three-dimensional network structure is strengthened without reducing the specific surface area,
The next step is to prevent the shrinkage from being affected in the subsequent drying step.

【0032】水洗、水熱処理は前述したように、同時に
行うことも出来るが、かかる操作の場合、水熱処理の影
響が不均一になる可能性がある。細孔の分布のコントロ
ールを考慮した場合、好ましくは、水熱処理の後水洗を
行なうか、或は水洗の後水熱処理を行なうかして、水洗
と水熱処理を別々に実施するのが良い。例えば、バッチ
式で水熱処理をし、ついで水洗を行なうことが望まし
い。
As described above, the washing with water and the hydrothermal treatment can be performed at the same time, but in such an operation, the influence of the hydrothermal treatment may be non-uniform. Considering the control of the distribution of pores, it is preferable to carry out the water washing and the hydrothermal treatment separately, preferably by carrying out the hydrothermal treatment and then the water washing or the water washing and the hydrothermal treatment. For example, it is desirable to carry out hydrothermal treatment in a batch system and then wash with water.

【0033】ここで、水熱処理とは、水の存在下におい
て一定の時間、一定の温度、pH条件にシリカヒドロゲ
ルを保持することを言う。
Here, the hydrothermal treatment means holding the silica hydrogel in the presence of water for a certain period of time at a constant temperature and pH condition.

【0034】この時、pHが4.0以上になると、シリ
カゲルの一次粒子の成長がおこり高い比表面積を維持す
ることができない。高い比表面積を維持することは温度
を下げることによりできるが、温度が80℃以下では、
次いで行なわれる乾燥により極度にシリカゲルが収縮
し、高い細孔容積と高い細孔直径を維持することが出来
ない。
At this time, if the pH is 4.0 or higher, the primary particles of silica gel grow and the high specific surface area cannot be maintained. It is possible to maintain a high specific surface area by lowering the temperature, but at temperatures below 80 ° C,
Subsequent drying causes excessive shrinkage of the silica gel, making it impossible to maintain a high pore volume and a high pore diameter.

【0035】比表面積を変化させないためには、以下に
示す比較例l、2で明らかな様に、pH4未満で水洗す
ることが重要であるが、かかる操作のみでは、高い比表
面積のものは得られるものの、本発明によるところのコ
ントロールされた高構造性を有するには至らず、形成さ
れた細孔の径はかかる比較的弱い構造の為か非常に小さ
い状態で存在する。
In order to prevent the specific surface area from changing, it is important to wash with water at a pH of less than 4, as is clear in Comparative Examples 1 and 2 below, but only such an operation gives a high specific surface area. However, it does not have the controlled high structural property according to the present invention, and the diameter of the formed pores is very small, probably because of the relatively weak structure.

【0036】一方、以下に示す実施例l〜3で明らかな
ように、本発明によるところの条件において水熱処理を
行なったものについては、十分な細孔容積を保ちかつ細
孔の分布も非常に狭い分布で存在する。
On the other hand, as is clear from Examples 1 to 3 shown below, those hydrothermally treated under the conditions according to the present invention maintained a sufficient pore volume and had a very fine pore distribution. Exists in a narrow distribution.

【0037】この理由は定かではないが、上述した様に
pH4.0未満において温度が不十分であると、一次粒
子の結合を増加させる効果が不十分となり、乾燥時の収
縮の影響を受けるためと考えられる。
The reason for this is not clear, but as described above, if the temperature is insufficient at a pH of less than 4.0, the effect of increasing the binding of the primary particles becomes insufficient, and it is affected by shrinkage during drying. it is conceivable that.

【0038】一方本発明によるところの条件において水
熱処理を行なったものについては、一次粒子の結合が増
加し構造が強固になったためか、乾燥時の収縮の影響が
均一に起り、その為にコントロールされた高構造性を有
すると考えられる。
On the other hand, in the case of hydrothermal treatment under the conditions according to the present invention, the influence of shrinkage during drying occurs uniformly, probably because the bond of primary particles is increased and the structure is strengthened. It is considered to have a high structural property.

【0039】一方、pHが4以上になった場合、本発明
によるところの細孔容積と細孔径、細孔分布は有するも
のの、比表面積を保つことができない。
On the other hand, when the pH is 4 or more, the specific surface area cannot be maintained although the pore volume, the pore diameter and the pore distribution according to the present invention are present.

【0040】[0040]

【作用】このようにして得られたシリカゲルは、BET
比表面積700〜ll00m2/g、細孔容積0.5〜
2.5cc/g、細孔容積の90%以上が細孔直径20
〜50Åにあり、かつBET比表面積とメジアン細孔直
径の関係が下記の式 (BET比表面積):A(m2 /g),(メジアン細孔
直径):B(Å) A×B≧25000 で表わされる特性を有する新規なシリカゲルであり、上
述した製造法により容易に得ることができる。
The silica gel thus obtained is BET
Specific surface area 700 to 100 m 2 / g, pore volume 0.5 to
2.5 cc / g, 90% or more of the pore volume has a pore diameter of 20
˜50Å, and the relationship between the BET specific surface area and the median pore diameter is the following formula (BET specific surface area): A (m 2 / g), (median pore diameter): B (Å) A × B ≧ 25000 It is a novel silica gel having the characteristics represented by and can be easily obtained by the above-mentioned production method.

【0041】本発明の上記特徴を有するシリカゲルは、
その得意な吸着性能を利用した用途に適しており、例え
ばフィルムのアンチブロッキング剤としての使用にあっ
ては、フィルム性能を悪くする樹脂のモノマー成分の吸
着に効果を発揮し、クロマト用分離剤にあっては、分子
径10〜30Åの有機物の吸着剤用として、またビール
用濾過剤としては、ビールの保存安定性を損なうタンパ
ク質等を吸着するのに効果を発揮する。
The silica gel having the above characteristics of the present invention is
It is suitable for applications that make use of its strong adsorption performance.For example, when it is used as an anti-blocking agent for films, it exerts an effect in adsorbing the monomer component of the resin that deteriorates film performance, and is used as a chromatographic separation agent. Then, it is effective as an adsorbent for organic substances having a molecular diameter of 10 to 30Å, and as a filter agent for beer, it is effective in adsorbing proteins and the like that impair the storage stability of beer.

【0042】本発明による新規なシリカゲルは、上記有
機物の吸着特性が著しく優れており、工業的に極めて有
用である。
The novel silica gel according to the present invention is remarkably excellent in the adsorption property of the above-mentioned organic substances and is industrially very useful.

【0043】[0043]

【発明の効果】本発明によれば、BET比表面積700
〜ll00m2 /g、細孔容積0.5〜2.5cc/
g、細孔容積の90%以上が細孔直径20〜50Åにあ
り、かつBET比表面積とメジアン細孔直径の関係が下
記の式 (BET比表面積):A(m2 /g),(メジアン細孔
直径):B(Å) A×B≧25000 で表わされることを特徴とする新規なシリカゲルを得る
ことができ、かかる新規なシリカゲルは、低分子有機化
合物の吸着剤、クロマト用分離剤、ビール用濾過剤とし
て有用である。
According to the present invention, the BET specific surface area of 700
~ L100 m 2 / g, pore volume 0.5-2.5 cc /
g, 90% or more of the pore volume is in the pore diameter 20 to 50Å, and the relationship between the BET specific surface area and the median pore diameter is expressed by the following formula (BET specific surface area): A (m 2 / g), (median Pore diameter): B (Å) A × B ≧ 25000 can be obtained to obtain a novel silica gel, which is an adsorbent for a low-molecular organic compound, a chromatographic separation agent, It is useful as a filtering agent for beer.

【0044】[0044]

【実施例】以下本発明の特定の具体化例を示す。EXAMPLES Specific embodiments of the present invention will be shown below.

【0045】各物性の測定は次に示す方法により測定し
た。
Each physical property was measured by the following methods.

【0046】(l)BET比表面積 ASAP2400(島津製作所社製)を用いて、窒素の
吸脱着等温線を測定の後、S.Brunauer,P.H.Emett,E.Tel
ler 法(J.Am.Chem.Soc.,60,309(1938) )を用いて行な
った。
(L) BET Specific Surface Area After measuring the nitrogen adsorption-desorption isotherm using ASAP2400 (manufactured by Shimadzu Corp.), S. Brunauer, PHEmett, E. Tel
The ler method (J. Am. Chem. Soc., 60, 309 (1938)) was used.

【0047】(2)細孔容積 ASAP2400(島津製作所社製)を用いて、窒素の
吸脱着等温線を測定の後、Barrett-Joyner-Halenda法
(J.Am.Chem.Soc.,73,373(1951) )を用いて行なった。
(2) Pore Volume ASAP2400 (manufactured by Shimadzu Corporation) was used to measure adsorption and desorption isotherms of nitrogen, and then Barrett-Joyner-Halenda method (J. Am. Chem. Soc., 73,373 (1951) )).

【0048】(3)細孔直径 窒素の相対圧力と細孔直径の関係を、Barrett-Joyner-H
alenda法(J.Am.Chem.Soc.,73,373(1951) )を用いて決
定し、細孔容積との関係を表2に記載の如く求め、その
メジアンを細孔直径とした。
(3) Pore Diameter The relationship between the relative pressure of nitrogen and the pore diameter was calculated by Barrett-Joyner-H
alenda method (J. Am. Chem. Soc., 73, 373 (1951)) was used to determine the relationship with the pore volume as shown in Table 2, and the median was defined as the pore diameter.

【0049】実施例1 ケイ酸ナトリウム SiO2 25wt%、モル比3.3
と硫酸H2 SO4 42wt%を、ケイ酸ナトリウム流
量約l5リットル/min、硫酸流量約7.0リットル
/minの条件で、混合ノズルを用いて混合し、シリカ
ヒドロゾルを得た。この時の温度は約50℃であった。
Example 1 Sodium silicate SiO 2 25 wt%, molar ratio 3.3
And 42 wt% of sulfuric acid H 2 SO 4 were mixed using a mixing nozzle under the conditions of a sodium silicate flow rate of about 15 l / min and a sulfuric acid flow rate of about 7.0 l / min to obtain a silica hydrosol. The temperature at this time was about 50 ° C.

【0050】該シリカヒドロゾルは約5分でゲル化しシ
リカヒドロゲルを得た。
The silica hydrosol gelled in about 5 minutes to obtain a silica hydrogel.

【0051】次いで該シリカヒドロゲルを篩を用いて約
10mmに粉砕したのち、90℃、pH2.6の条件に
おいて4.0時間水熱処理を行なった。
Next, the silica hydrogel was pulverized to about 10 mm using a sieve, and then hydrothermally treated for 4.0 hours under the conditions of 90 ° C. and pH 2.6.

【0052】さらに、水熱処理を行なったシリカヒドロ
ゲルを水洗し、200℃で乾燥してシリカゲルを得た。
Further, the hydrothermally treated silica hydrogel was washed with water and dried at 200 ° C. to obtain silica gel.

【0053】この時の細孔直径と累積細孔容積、累積細
孔存在率の関係を下記表1に記載した。
The relationship among the pore diameter, the cumulative pore volume, and the cumulative pore existence rate at this time is shown in Table 1 below.

【0054】また、細孔直径と細孔存在率の関係を下記
表2に記載した。
The relationship between pore diameter and pore existence rate is shown in Table 2 below.

【0055】シリカゲルの比表面積、細孔容積、細孔直
径を下記表3に記載した。
The specific surface area, pore volume and pore diameter of silica gel are shown in Table 3 below.

【0056】さらに、ポリプロピレン樹脂100重量
部、スリップ剤0.1重量部に対し、上記実施例1のシ
リカゲルを粉砕の後、0.4重量部添加したものをミキ
サーで混合の後、一軸押出機により溶融混連してしペレ
ットを作成し、次いでこのペレットを水冷インフレーシ
ョンフィルム製造装置を用いてフィルムを製造した。
Further, 100 parts by weight of the polypropylene resin and 0.1 part by weight of the slip agent were pulverized with the silica gel of Example 1 and then 0.4 parts by weight of the silica gel was added. Was melt-blended to prepare pellets, and then the pellets were manufactured into a film using a water-cooled blown film manufacturing apparatus.

【0057】製造したフィルムを30℃で24時間保存
した後、フィルム表面にブリードしてくる有機物量を目
視により観察した結果を参考例として表4に記載した。
After the produced film was stored at 30 ° C. for 24 hours, the results of visually observing the amount of organic substances bleeding to the film surface are shown in Table 4 as a reference example.

【0058】[0058]

【表1】 [Table 1]

【0059】[0059]

【表2】 [Table 2]

【0060】[0060]

【表3】 [Table 3]

【0061】[0061]

【表4】 [Table 4]

【0062】実施例2 水熱処理を、90℃、pH2.6、l時間行なった以外
は、実施例lと同様にしてシリカゲルを得た。
Example 2 Silica gel was obtained in the same manner as in Example 1 except that the hydrothermal treatment was performed at 90 ° C., pH 2.6 for 1 hour.

【0063】この時の細孔直径と累積細孔容積、累積細
孔存在率の関係を上記表1に記載した。
The relationship between the pore diameter at this time, the cumulative pore volume, and the cumulative pore existence rate is shown in Table 1 above.

【0064】また、細孔直径と細孔存在率の関係を上記
表2に記載した。
The relationship between the pore diameter and the pore existence rate is shown in Table 2 above.

【0065】シリカゲルの比表面積、細孔容積、細孔直
径を上記表3に記載した。
The specific surface area, pore volume and pore diameter of silica gel are shown in Table 3 above.

【0066】さらに上記実施例1と同様にして、実施例
2のシリカゲルを添加,混合、混連して作成したペレッ
トによりフィルムを製造し、製造したフィルムを30℃
で24時間保存した後、フィルム表面にブリードしてく
る有機物量を目視により観察した結果を参考例として上
記表4に記載した。
Further, in the same manner as in Example 1 above, a film was produced from pellets prepared by adding, mixing and continuously mixing the silica gel of Example 2, and the produced film was heated at 30 ° C.
After storing for 24 hours in the above, the results of visually observing the amount of organic substances bleeding to the film surface are shown in Table 4 above as a reference example.

【0067】実施例3 水熱処理を、90℃、pH2.8、2時間行なった以外
は、実施例1と同様にしてシリカゲルを得た。
Example 3 Silica gel was obtained in the same manner as in Example 1 except that the hydrothermal treatment was performed at 90 ° C. and pH 2.8 for 2 hours.

【0068】この時の細孔直径と累積細孔容積、累積細
孔存在率の関係を上記表1に記載した。
The relationship between the pore diameter at this time, the cumulative pore volume, and the cumulative pore existence rate is shown in Table 1 above.

【0069】また、細孔直径と細孔存在率の関係を上記
表2に記載した。
The relationship between the pore diameter and the pore existence rate is shown in Table 2 above.

【0070】シリカゲルの比表面積、細孔容積、細孔直
径を上記表3に記載した。
The specific surface area, pore volume and pore diameter of silica gel are shown in Table 3 above.

【0071】さらに上記実施例1と同様にして、実施例
3のシリカゲルを添加,混合、混連して作成したペレッ
トによりフィルムを製造し、製造したフィルムを30℃
で24時間保存した後、フィルム表面にブリードしてく
る有機物量を目視により観察した結果を参考例として上
記表4に記載した。
Further, in the same manner as in Example 1 above, a film was produced from pellets prepared by adding, mixing and continuously mixing the silica gel of Example 3, and the produced film was heated at 30 ° C.
After storing for 24 hours in the above, the results of visually observing the amount of organic substances bleeding to the film surface are shown in Table 4 above as a reference example.

【0072】比較例1 水熱処理を、30℃、pH2.5、4時間行なった以外
は、実施例1と同様にしてシリカゲルを得た。
Comparative Example 1 Silica gel was obtained in the same manner as in Example 1 except that hydrothermal treatment was carried out at 30 ° C., pH 2.5 for 4 hours.

【0073】この時の細孔直径と累積細孔容積、累積細
孔存在率の関係を上記表1に記載した。
The relationship between the pore diameter at this time, the cumulative pore volume, and the cumulative pore existence rate is shown in Table 1 above.

【0074】また、細孔直径と細孔存在率の関係を上記
表2に記載した。
The relationship between the pore diameter and the pore existence rate is shown in Table 2 above.

【0075】シリカゲルの比表面積、細孔容積、細孔直
径を上記表3に記載した。
The specific surface area, pore volume and pore diameter of silica gel are shown in Table 3 above.

【0076】さらに上記実施例1と同様にして、比較例
1のシリカゲルを添加,混合、混連して作成したペレッ
トによりフィルムを製造し、製造したフィルムを30℃
で24時間保存した後、フィルム表面にブリードしてく
る有機物量を目視により観察した結果を参考例として上
記表4に記載した。
Further, in the same manner as in Example 1 above, the silica gel of Comparative Example 1 was added, mixed, and mixed to prepare a film, and a film was produced.
After storing for 24 hours in the above, the results of visually observing the amount of organic substances bleeding to the film surface are shown in Table 4 above as a reference example.

【0077】比較例2 水熱処理を、70℃、pH2.5、4時間行なった以外
は、実施例lと同様にしてシリカゲルを得た。
Comparative Example 2 Silica gel was obtained in the same manner as in Example 1 except that the hydrothermal treatment was carried out at 70 ° C., pH 2.5 for 4 hours.

【0078】この時の細孔直径と累積細孔容積、累積細
孔存在率の関係を上記表1に記載した。
The relationship between the pore diameter at this time, the cumulative pore volume, and the cumulative pore existence rate is shown in Table 1 above.

【0079】また、細孔直径と細孔存在率の関係を上記
表2に記載した。
The relationship between the pore diameter and the pore existence rate is shown in Table 2 above.

【0080】シリカゲルの比表面積、細孔容積、細孔直
径を上記表3に記載した。
The specific surface area, pore volume and pore diameter of silica gel are shown in Table 3 above.

【0081】さらに上記実施例1と同様にして、比較例
2のシリカゲルを添加,混合、混連して作成したペレッ
トによりフィルムを製造し、製造したフィルムを30℃
で24時間保存した後、フィルム表面にブリードしてく
る有機物量を目視により観察した結果を参考例として上
記表4に記載した。
Further, in the same manner as in Example 1 above, a film was produced from pellets prepared by adding, mixing and continuously mixing the silica gel of Comparative Example 2, and the produced film was heated at 30 ° C.
After storing for 24 hours in the above, the results of visually observing the amount of organic substances bleeding to the film surface are shown in Table 4 above as a reference example.

【0082】比較例3 水熱処理を、90℃、pH4.5、4時間行なった以外
は、実施例1と同様にしてシリカゲルを得た。
Comparative Example 3 Silica gel was obtained in the same manner as in Example 1 except that hydrothermal treatment was performed at 90 ° C., pH 4.5 for 4 hours.

【0083】この時のシリカゲルの比表面積、細孔容
積、細孔直径を上記表1に記載した。この時の細孔直径
と累積細孔容積、累積細孔存在率の関係を上記表1に記
載した。
The specific surface area, pore volume and pore diameter of the silica gel at this time are shown in Table 1 above. The relationships among the pore diameter, the cumulative pore volume, and the cumulative pore existence rate at this time are shown in Table 1 above.

【0084】また、シリカゲルの比表面積、細孔容積、
細孔直径を上記表1に記載した。
Further, specific surface area of silica gel, pore volume,
The pore diameters are listed in Table 1 above.

【0085】また、細孔直径と細孔存在率の関係を上記
表2に記載した。
The relationship between the pore diameter and the pore existence rate is shown in Table 2 above.

【0086】シリカゲルの比表面積、細孔容積、細孔直
径を上記表3に記載した。
The specific surface area, pore volume and pore diameter of silica gel are shown in Table 3 above.

【0087】さらに上記実施例1と同様にして、比較例
3のシリカゲルを添加,混合、混連して作成したペレッ
トによりフィルムを製造し、製造したフィルムを30℃
で24時間保存した後、フィルム表面にブリードしてく
る有機物量を目視により観察した結果を参考例として上
記表4に記載した。
Further, in the same manner as in Example 1 above, a film was produced from pellets prepared by adding, mixing and continuously mixing the silica gel of Comparative Example 3, and the produced film was heated at 30 ° C.
After storing for 24 hours in the above, the results of visually observing the amount of organic substances bleeding to the film surface are shown in Table 4 above as a reference example.

【0088】比較例4 水熱処理を、90℃、pH7.0、4時間行なった以外
は、実施例1と同様にしてシリカゲルを得た。
Comparative Example 4 Silica gel was obtained in the same manner as in Example 1 except that the hydrothermal treatment was carried out at 90 ° C., pH 7.0 for 4 hours.

【0089】この時の細孔直径と累積細孔容積、累積細
孔存在率の関係を上記表lに記載した。
The relationship between the pore diameter at this time, the cumulative pore volume, and the cumulative pore existence rate is shown in Table 1 above.

【0090】また、細孔直径と細孔存在率の関係を上記
表2に記載した。
The relationship between the pore diameter and the pore existence rate is shown in Table 2 above.

【0091】シリカゲルの比表面積、細孔容積、細乳直
径を上記表3に記載した。
The specific surface area, pore volume and fine milk diameter of silica gel are shown in Table 3 above.

【0092】さらに上記実施例1と同様にして、比較例
4のシリカゲルを添加,混合、混連して作成したペレッ
トによりフィルムを製造し、製造したフィルムを30℃
で24時間保存した後、フィルム表面にブリードしてく
る有機物量を目視により観察した結果を参考例として上
記表4に記載した。
Further, in the same manner as in Example 1 above, a film was produced from pellets prepared by adding, mixing and continuously mixing the silica gel of Comparative Example 4, and the produced film was heated at 30 ° C.
After storing for 24 hours in the above, the results of visually observing the amount of organic substances bleeding to the film surface are shown in Table 4 above as a reference example.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 BET比表面積700〜ll00m2
g、細孔容積0.5〜2.5cc/g、細孔容積の90
%以上が細孔直径20〜50Åにあり、かつBET比表
面積をA(m2 /g)としメジアン細孔直径をB(Å)
としたときにこれらの関係が下記の式 A×B≧25000 で表わされることを特徴とするシリカゲル。
1. A BET specific surface area of 700 to 100 m 2 /
g, pore volume 0.5 to 2.5 cc / g, pore volume 90
% Or more in the pore diameter of 20 to 50Å, and the BET specific surface area is A (m 2 / g), and the median pore diameter is B (Å)
The silica gel is characterized in that these relationships are represented by the following formula A × B ≧ 25000.
【請求項2】 ケイ酸ナトリウムと硫酸を混合して得ら
れたシリカヒドロゲルを80℃〜200℃、pH4.0
未満で水熱処理した後、水洗・乾燥することを特徴とす
る請求項1に記載のシリカゲルの製造方法。
2. A silica hydrogel obtained by mixing sodium silicate and sulfuric acid at 80 ° C. to 200 ° C., pH 4.0.
The method for producing silica gel according to claim 1, which comprises hydrothermally treating at a temperature lower than that, followed by washing with water and drying.
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