JPH11157827A - New silicon dioxide - Google Patents

New silicon dioxide

Info

Publication number
JPH11157827A
JPH11157827A JP9338077A JP33807797A JPH11157827A JP H11157827 A JPH11157827 A JP H11157827A JP 9338077 A JP9338077 A JP 9338077A JP 33807797 A JP33807797 A JP 33807797A JP H11157827 A JPH11157827 A JP H11157827A
Authority
JP
Japan
Prior art keywords
pore
silicon dioxide
pore volume
δvp
δrp
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9338077A
Other languages
Japanese (ja)
Inventor
Yasutaka Chikaki
康高 親木
Tsuneto Aoki
恒人 青木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shionogi and Co Ltd
Original Assignee
Shionogi and Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shionogi and Co Ltd filed Critical Shionogi and Co Ltd
Priority to JP9338077A priority Critical patent/JPH11157827A/en
Publication of JPH11157827A publication Critical patent/JPH11157827A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To provide a silicon dioxide having excellent performance as an adsorbent, filler or the like. SOLUTION: In the distribution curve of pores of the silicon dioxide, the max. value of ΔVp/ΔRp (wherein Vp is the pore volume and Rp is the pore radius) is present in the region of <10 nm pore radius, the max. ΔVp/ΔRp is >=100 mm<3> /nmg, and the proportion of the pore volume corresponding to the range of the peak radius (the pore radius at the max. ΔVp/ΔRp)±1 nm is >=20% of the whole pore volume.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、食品用吸着剤、ク
ロマト用充填剤、触媒担体や紙用充填剤などとして使用
した場合に、被吸着・保持成分の大きさに対して、選択
的に吸着、保持する新規二酸化ケイ素に関する。
BACKGROUND OF THE INVENTION The present invention relates to a method for selectively adsorbing and holding components when used as an adsorbent for food, a filler for chromatography, a catalyst carrier or a filler for paper. It relates to a novel silicon dioxide that adsorbs and retains.

【0002】[0002]

【従来の技術及び発明が解決しようとする課題】従来、
二酸化ケイ素はその比表面積の大きさ、細孔容積の大き
さから乾燥剤、吸着精製剤、クロマト用充填剤、触媒担
体、紙用充填剤等の用途で汎用されている。二酸化ケイ
素の細孔構造は1次粒子の大きさ、凝集程度によって決
まり、各用途に適した細孔構造を持つ二酸化ケイ素が使
用されている。上記用途に関する技術としては、例えば
吸着精製剤として食用油の再生、ビール、ワイン、清酒
等の濁り成分の除去剤、特殊紙用充填剤としてはインク
ジェット記録紙用の充填剤等が知られている。
2. Description of the Related Art
Silicon dioxide is widely used in applications such as a desiccant, an adsorption / purification agent, a filler for chromatography, a catalyst carrier, and a filler for paper because of its specific surface area and pore volume. The pore structure of silicon dioxide is determined by the size and degree of aggregation of the primary particles, and silicon dioxide having a pore structure suitable for each application is used. As the technology relating to the above-mentioned applications, for example, regeneration of edible oil, remover of turbid components such as beer, wine, sake, and the like as an adsorption refining agent, and filler for inkjet recording paper as a filler for special paper are known. .

【0003】上記用途に関する技術においては、二酸化
ケイ素の細孔構造に関わる物性として主に比表面積、細
孔容積、平均細孔径が規定されている。
In the technology relating to the above-mentioned applications, the specific surface area, the pore volume, and the average pore diameter are mainly defined as physical properties related to the pore structure of silicon dioxide.

【0004】例えば、ビール用の吸着精製剤としては、
特開平5−177132号公報において、粒径が5〜1
00μm、細孔容積が0.2〜1.5ml/g、比表面
積が100〜1000m2/gの薄片状、鱗片状、棒状
の二酸化ケイ素が記載されている。また、食用油の再生
剤として、例えば特開昭62−100597号公報にお
いて、劣化した食用油の再生方法として比表面積が30
0〜800m2/g、細孔容積が0.3〜2.0ml/
g、平均細孔直径が20〜150Åであるシリカゲルを
接触処理する方法が記載されている。このように、いず
れの用途においても比表面積、細孔容積、平均細孔径を
規定しているものが多い。
[0004] For example, as an adsorption purifying agent for beer,
In JP-A-5-177132, the particle size is 5 to 1;
A flaky, scaly, or rod-shaped silicon dioxide having a diameter of 00 µm, a pore volume of 0.2 to 1.5 ml / g, and a specific surface area of 100 to 1000 m 2 / g is described. Further, as a regenerating agent for edible oil, for example, JP-A-62-100597 discloses a method for regenerating degraded edible oil having a specific surface area of 30.
0-800 m 2 / g, pore volume 0.3-2.0 ml /
g, a method of contact-treating silica gel having an average pore diameter of 20 to 150 °. As described above, in many applications, the specific surface area, the pore volume, and the average pore diameter are often specified.

【0005】しかし、平均細孔径では細孔分布の形状が
明確にはならず、その結果、上記範囲の物性値であって
も、その性能を十分発現しないものも含まれていた。
[0005] However, the shape of the pore distribution is not clear from the average pore diameter, and as a result, even if the physical property values are in the above-mentioned range, some of them do not sufficiently exhibit their performance.

【0006】一方で、二酸化ケイ素の細孔分布のシャー
プさに関する技術として、特開平9−143461号公
報に、蓄熱剤として二酸化ケイ素多孔体を使用すること
が記載されており、多孔体の細孔は細孔分布曲線におけ
る最大ピークを示す中心細孔直径が1〜10nmの範囲
にあり、多孔体の細孔容積の60〜100%が中心細孔
直径±40%の範囲内にあることが記載されている。た
だし、この技術では細孔容積の範囲の記載はない。
On the other hand, as a technique relating to the sharpness of the pore distribution of silicon dioxide, Japanese Patent Application Laid-Open No. 9-143461 discloses the use of a silicon dioxide porous body as a heat storage agent. Describes that the central pore diameter showing the maximum peak in the pore distribution curve is in the range of 1 to 10 nm, and 60 to 100% of the pore volume of the porous body is in the range of the central pore diameter ± 40%. Have been. However, this technique does not describe the range of the pore volume.

【0007】また、特開平9−30809号公報には、
BET比表面積、細孔容積及び平均細孔径を所望の範囲
に変化制御させるシリカゲルの製造方法であって、細孔
分布がシャープなシリカゲルを得ることができる製造方
法が記載されている。更に、細孔径分布でのピークのメ
ジアン径をA、半値幅をBとすると、B/Aが0.6以
下、好ましくは0.5未満のシリカゲルが得られること
が記載されているが、制御可能な比表面積、細孔容積、
メジアン径の範囲が規定されていない。
Japanese Patent Application Laid-Open No. 9-30809 discloses that
It describes a method for producing silica gel in which the BET specific surface area, pore volume and average pore diameter are controlled to be changed in desired ranges, and a production method capable of obtaining silica gel having a sharp pore distribution. Furthermore, it is described that silica gel having a B / A of 0.6 or less, preferably less than 0.5 is obtained when the median diameter of the peak in the pore diameter distribution is A and the half width is B. Possible specific surface area, pore volume,
The range of the median diameter is not specified.

【0008】本発明の目的は、上記従来技術の二酸化ケ
イ素を超える優れた吸着性能を有し、吸着剤、充填剤と
しての高い特性を有する二酸化ケイ素を提供することに
ある。
An object of the present invention is to provide silicon dioxide having excellent adsorption performance over the above-mentioned conventional silicon dioxide, and having high properties as an adsorbent and a filler.

【0009】[0009]

【課題を解決するための手段及び発明の実施の形態】本
発明者らは、上記目的を達成するため鋭意検討を重ねた
結果、アルカリ金属ケイ酸塩水溶液と鉱酸との反応にお
いて、アルカリ金属ケイ酸塩水溶液中のケイ酸濃度を1
0重量/容量(w/v)%以下としたある条件において
得られた二酸化ケイ素が、細孔分布曲線において、細孔
半径10nm以下にΔVp/ΔRp値(但し、Vpは細
孔容積、Rpは細孔半径)の最大値を有し、そのΔVp
/ΔRp値の最大値が100mm3/nm・g以上であ
り、かつ全細孔容積に対して細孔ピーク半径(ΔVp/
ΔRpが最大値を示す細孔半径)±1nmに相当する細
孔容積の割合が20%以上であり、この性状を示す二酸
化ケイ素が吸着剤、充填剤として使用した場合に優れた
性能を示すことを知見した。
Means for Solving the Problems and Embodiments of the Invention The present inventors have conducted intensive studies to achieve the above object, and as a result, have found that in the reaction between an aqueous solution of an alkali metal silicate and a mineral acid, an alkali metal is produced. The concentration of silicic acid in the aqueous silicate solution is 1
In a pore distribution curve, the silicon dioxide obtained under certain conditions of 0% weight / volume (w / v)% or less has a ΔVp / ΔRp value at a pore radius of 10 nm or less (where Vp is the pore volume and Rp is (Pore radius) and its ΔVp
/ ΔRp value is 100 mm 3 / nm · g or more, and the pore peak radius (ΔVp /
The ratio of the pore volume corresponding to ± 1 nm (pore radius at which ΔRp shows the maximum value) is 20% or more, and the silicon dioxide exhibiting this property exhibits excellent performance when used as an adsorbent or a filler. Was found.

【0010】即ち、本発明にかかる二酸化ケイ素は、比
表面積が300〜500m2/g、細孔容積が0.8〜
1.4ml/gという一般的な物性値を有する二酸化ケ
イ素でありながら、細孔分布曲線において、細孔半径1
0nm以下の領域にΔVp/ΔRp値の最大値を有し、
その最大値のΔVp/ΔRp値が100mm3/nm・
g以上であり、かつ全細孔容積に対して細孔ピーク半径
±1nmに相当する細孔容積の割合が20%以上である
という特徴を有している。この特徴は細孔分布がシャー
プであることを示しており、吸着剤、充填剤として用い
た場合に優れた性能を示す。
That is, the silicon dioxide according to the present invention has a specific surface area of 300 to 500 m 2 / g and a pore volume of 0.8 to 500 m 2 / g.
Although it is silicon dioxide having a general physical property value of 1.4 ml / g, a pore radius of 1
Having a maximum value of ΔVp / ΔRp in a region of 0 nm or less,
The maximum value ΔVp / ΔRp is 100 mm 3 / nm ·
g or more, and the ratio of the pore volume corresponding to the pore peak radius ± 1 nm to the total pore volume is 20% or more. This feature shows that the pore distribution is sharp, and shows excellent performance when used as an adsorbent and a filler.

【0011】以下、本発明について更に詳しく説明す
る。本発明の二酸化ケイ素は、細孔分布曲線において、
細孔半径10nm以下の範囲にΔVp/ΔRp値の最大
値を有し、その最大値のΔVp/ΔRp値が100mm
3/nm・g以上であり、かつ全細孔容積に対して細孔
ピーク半径±1nmに相当する細孔容積の割合が20%
以上であるという特徴を有する二酸化ケイ素である。
Hereinafter, the present invention will be described in more detail. Silicon dioxide of the present invention, in the pore distribution curve,
The maximum value of the ΔVp / ΔRp value is within a range of a pore radius of 10 nm or less, and the maximum value ΔVp / ΔRp value is 100 mm.
3 / nm · g or more, and the ratio of the pore volume corresponding to the pore peak radius ± 1 nm to the total pore volume is 20%.
A silicon dioxide having the characteristics described above.

【0012】ここで、ΔVp/ΔRp値の最大値が細孔
半径10nm以下にあることが本発明の目的を達成する
上で重要である。10nmを超えるところにΔVp/Δ
Rp値の最大値があると、特に蛋白質等の高分子物質の
吸着剤として用いる場合の性能が低下する。より好まし
くはΔVp/ΔRp値の最大値は3〜8nm、更に好ま
しくは3〜5nmの範囲にあることが良い。この場合、
ΔVp/ΔRpの最大値は3nmを超えたところにある
ことが望ましい。
Here, it is important for achieving the object of the present invention that the maximum value of the ΔVp / ΔRp value be within a pore radius of 10 nm or less. Where ΔVp / Δ exceeds 10 nm
When there is a maximum value of the Rp value, the performance particularly when used as an adsorbent for a polymer substance such as a protein is reduced. More preferably, the maximum value of the ΔVp / ΔRp value is in the range of 3 to 8 nm, more preferably, in the range of 3 to 5 nm. in this case,
It is desirable that the maximum value of ΔVp / ΔRp be over 3 nm.

【0013】次に、本発明の二酸化ケイ素は、その最大
値のΔVp/ΔRp値が100mm3/nm・g以上で
ある。100mm3/nm・g未満の場合はこの細孔半
径範囲の細孔容積が少なくなり、シャープさが損なわ
れ、吸着の選択性が低下するか、選択性は維持されても
吸着量が低下する。より好ましくは、最大値のΔVp/
ΔRp値が200mm3/nm・g以上、更に好ましく
は400mm3/nm・g以上である。
Next, the silicon dioxide of the present invention has a maximum value ΔVp / ΔRp of 100 mm 3 / nm · g or more. If it is less than 100 mm 3 / nm · g, the pore volume in this pore radius range will be small, sharpness will be impaired, and the selectivity of adsorption will decrease, or the amount of adsorption will decrease even if the selectivity is maintained. . More preferably, the maximum value ΔVp /
The ΔRp value is 200 mm 3 / nm · g or more, more preferably 400 mm 3 / nm · g or more.

【0014】更に、本発明の二酸化ケイ素は、全細孔容
積に対して細孔ピーク半径±1nmに相当する細孔容積
の割合が20%以上、より好ましくは40%以上であ
る。20%未満の場合は、細孔分布のシャープさは損な
われ、吸着の選択性は低下する。
Further, in the silicon dioxide of the present invention, the ratio of the pore volume corresponding to the pore peak radius ± 1 nm to the total pore volume is at least 20%, more preferably at least 40%. If it is less than 20%, the sharpness of the pore distribution is impaired, and the selectivity of adsorption is reduced.

【0015】本発明の二酸化ケイ素は、BET法による
窒素吸着法での比表面積が300〜500m2/gであ
り、細孔容積が0.8〜1.4ml/gであることが好
ましい。一般に二酸化ケイ素においては比表面積が小さ
くなると、細孔径及び細孔容積は大きくなり、細孔分布
はブロードになる傾向がある。また、比表面積が大きく
なると、細孔容積は小さくなり、細孔分布はシャープに
なる傾向がある。従って、300m2/g未満の場合は
細孔分布のシャープさが損なわれるおそれがあり、50
0m2/gを超えると細孔分布はよりシャープになる
が、細孔容積が小さくなり、吸着量が低下するおそれが
ある。
The silicon dioxide of the present invention preferably has a specific surface area of 300 to 500 m 2 / g and a pore volume of 0.8 to 1.4 ml / g by a nitrogen adsorption method by a BET method. In general, as the specific surface area of silicon dioxide decreases, the pore diameter and the pore volume increase, and the pore distribution tends to be broad. Also, as the specific surface area increases, the pore volume tends to decrease and the pore distribution tends to be sharp. Therefore, if it is less than 300 m 2 / g, the sharpness of the pore distribution may be impaired,
If it exceeds 0 m 2 / g, the pore distribution becomes sharper, but the pore volume becomes smaller, and the amount of adsorption may decrease.

【0016】また、本発明の二酸化ケイ素は、その平均
粒径が1〜30μm、より好ましくは5〜20μmであ
ることが好ましい。平均粒径が1μm未満の場合には、
吸着剤として使用した場合、二酸化ケイ素自身を除去す
ることが困難になる場合が生じ、また30μmを超える
と、吸着性能が低下する場合が生じる。
The average particle diameter of the silicon dioxide of the present invention is preferably 1 to 30 μm, more preferably 5 to 20 μm. When the average particle size is less than 1 μm,
When used as an adsorbent, it may be difficult to remove silicon dioxide itself, and when it exceeds 30 μm, adsorption performance may be reduced.

【0017】更に、本発明の二酸化ケイ素は吸油量が1
50ml/100g以上であることが好ましい。吸油量
は紙用充填剤として使用した場合、媒体である水分や水
溶性高分子の保持に必要であり、150ml/100g
未満では十分な性能が期待できない場合が生じる。
Further, the silicon dioxide of the present invention has an oil absorption of 1
It is preferably at least 50 ml / 100 g. When used as a filler for paper, the oil absorption is necessary to retain water and water-soluble polymer as a medium, and 150 ml / 100 g
If it is less than 1, sufficient performance may not be expected.

【0018】また更に、本発明の二酸化ケイ素は、5重
量%スラリーのpHが8以下、特に4〜8であることが
好ましい。pHが8より高い場合は、経時変化により比
表面積の低下、細孔ピーク半径の増大をもたらすおそれ
がある。
Further, the pH of the 5% by weight slurry of the silicon dioxide of the present invention is preferably 8 or less, particularly preferably 4 to 8. If the pH is higher than 8, the specific surface area may decrease and the pore peak radius may increase due to aging.

【0019】本発明にかかる二酸化ケイ素は、アルカリ
金属ケイ酸塩水溶液と鉱酸との中和反応による、いわゆ
る湿式法シリカの製法に準じた方法により得ることがで
きる。この場合、アルカリ金属ケイ酸塩水溶液中のケイ
酸濃度を10w/v%以下、より好ましくは2〜8w/
v%として反応を行うことが推奨される。
The silicon dioxide according to the present invention can be obtained by a method according to a so-called wet process silica production method by a neutralization reaction between an aqueous solution of an alkali metal silicate and a mineral acid. In this case, the silicic acid concentration in the alkali metal silicate aqueous solution is 10 w / v% or less, more preferably 2 to 8 w / v.
It is recommended to run the reaction as v%.

【0020】アルカリ金属ケイ酸塩としては、経済的見
地から3号ケイ酸ナトリウムを使用することが好まし
い。また、鉱酸としては同じく経済的見地から硫酸、塩
酸が好ましい。鉱酸の濃度は6〜16規定が好ましい。
As the alkali metal silicate, it is preferable to use sodium silicate No. 3 from an economic viewpoint. Also, as the mineral acid, sulfuric acid and hydrochloric acid are preferable from the same economic point of view. The concentration of the mineral acid is preferably 6 to 16N.

【0021】上記アルカリ金属ケイ酸塩水溶液を加温
し、所定濃度の硫酸を添加する。添加時の温度は50〜
100℃が好ましい。必要ならば、硫酸を数回に分割し
て添加してもよい。最終の中和率は80〜95%が好ま
しい。必要ならば、硫酸の添加終了後、80℃以上に加
熱することができる。反応終了後はpHを5.5以下、
特に3〜5に下げることが好ましい。
The alkali metal silicate aqueous solution is heated, and sulfuric acid of a predetermined concentration is added. The temperature at the time of addition is 50 ~
100 ° C. is preferred. If necessary, sulfuric acid may be added in several portions. The final neutralization ratio is preferably 80 to 95%. If necessary, after completion of the addition of sulfuric acid, the mixture can be heated to 80 ° C. or higher. After the completion of the reaction, the pH is 5.5 or less,
In particular, it is preferable to reduce it to 3 to 5.

【0022】得られた二酸化ケイ素スラリーは、これを
濾過、洗浄し、水に再分散すると共に、pHを5.5以
下、特に3〜5に再調整することが好ましい。その後、
濾過、洗浄、乾燥により二酸化ケイ素を得、更に粉砕、
分級により所定粒度の二酸化ケイ素を得ることができ
る。
It is preferable that the obtained silicon dioxide slurry is filtered, washed, redispersed in water, and readjusted to a pH of 5.5 or less, particularly 3 to 5. afterwards,
Filtration, washing, drying to obtain silicon dioxide, further pulverized,
By classification, silicon dioxide having a predetermined particle size can be obtained.

【0023】本発明の二酸化ケイ素は、従来より二酸化
ケイ素が用いられている用途に使用することができ、特
に吸着剤、触媒担体、充填剤として適している。吸着剤
としては食用油、ビール、ワイン等の精製剤などとして
使用でき、クロマト用充填剤、紙用充填剤等としても有
効である。この場合、本発明の二酸化ケイ素は、分子量
25000〜50000程度の分子量を有する物質、特
に蛋白質に対し特異的な吸着性能を有するものである。
The silicon dioxide of the present invention can be used for applications where silicon dioxide is conventionally used, and is particularly suitable as an adsorbent, a catalyst carrier and a filler. The adsorbent can be used as a refining agent for edible oils, beer, wine and the like, and is also effective as a filler for chromatography, a filler for paper, and the like. In this case, the silicon dioxide of the present invention has a specific adsorption performance for a substance having a molecular weight of about 25,000 to 50,000, particularly for a protein.

【0024】[0024]

【発明の効果】本発明の二酸化ケイ素は、吸着剤、充填
剤等として優れた性能を有する。
The silicon dioxide of the present invention has excellent performance as an adsorbent, a filler and the like.

【0025】[0025]

【実施例】以下、実施例及び比較例を示し、本発明を具
体的に説明するが、本発明は下記の実施例に制限される
ものではない。なお、下記の例において、二酸化ケイ素
の物性測定法及び蛋白質に対する吸着特性の測定法は下
記の通りである。
EXAMPLES The present invention will be described below in detail with reference to Examples and Comparative Examples, but the present invention is not limited to the following Examples. In the following examples, the methods for measuring the physical properties of silicon dioxide and the methods for measuring the adsorption characteristics for proteins are as follows.

【0026】二酸化ケイ素の物性測定法 [平均粒径]コールター(株)製コールターカウンター
TA−II型粒度測定装置により100μmのアパーチ
ャーを用いて粒度分布を測定し、そのメジアン径(50
%径)を平均粒径とした。 [製品pH]試料5gをイオン交換水100mlに分散
させ、一旦沸騰させた後、室温まで冷却し、スラリーの
pHを測定した。 [比表面積]日本ベル(株)製全自動比表面積/細孔分
布測定装置(BELSORP28)を用いて、窒素吸着
法(BET法)により測定した。なお、試料の前処理は
160℃で2時間、真空脱気した。(参考文献:S.B
runauer,P.H.Emmett,E.Tell
er,J.Amer.Chem.Soc.,60,30
9(1938)) [細孔容積]前述のBELSORP28を用いて、窒素
の吸着等温線を求め、JIS−K1150に準拠してド
リモア・ヒールの解析法により細孔半径1〜100nm
の細孔容積を求めた。この数値を全細孔容積とした。ま
た、細孔ピーク半径±1nmの範囲の細孔容積は、同方
法による細孔半径に対する積分値をプロットした曲線か
ら求めた。 [細孔分布]前述のBELSORP28を用いて、窒素
吸着法により細孔分布を測定した。細孔分布の計算は、
ドリモア・ヒールの方法(D.Dollimore,
G.R.Heal,J.Appl.Chem.,14
109(1964))により解析を行った。なお、試料
の前処理は160℃で2時間、真空脱気した。 [細孔ピーク半径]図1に示す各試料の細孔分布図より
求めた。ΔVp/ΔRpの最大値を示す細孔半径であ
る。 [平均細孔半径] 平均細孔半径(nm) =2000×(細孔容積(ml/g)/比表面積(m2
/g)) より算出した。 [吸油量]JIS−K−5101の方法で測定した。 [蛋白質の吸着特性]蛋白質を10v/v%エタノール
水溶液に溶解し、蛋白質100ppmの溶液を調製し
た。この液に二酸化ケイ素を500ppm添加し、20
分間撹拌した。濾過後、280nmでの吸光度を測定し
た。使用した蛋白質は、トリプシンインヒビター(分子
量20100)、カルボニックアンハイドラーゼ(分子
量30000)、牛血清アルブミン(分子量6900
0)、カタラーゼ(分子量230000)である。吸着
率は以下の式より算出した。 吸着率=100−[(二酸化ケイ素処理液の吸光度)/
(二酸化ケイ素未処理液の吸光度)]×100 なお、図2に各試料の結果を示す。
Measurement of Physical Properties of Silicon Dioxide [Average Particle Size] The particle size distribution was measured using a 100 μm aperture with a Coulter Counter TA-II type particle size analyzer manufactured by Coulter Co., Ltd.
% Diameter) was taken as the average particle diameter. [Product pH] A 5 g sample was dispersed in 100 ml of ion-exchanged water, and after boiling once, cooled to room temperature, and the pH of the slurry was measured. [Specific surface area] It was measured by a nitrogen adsorption method (BET method) using a fully automatic specific surface area / pore distribution measuring device (BELSORP28) manufactured by Bell Japan. The sample was pretreated at 160 ° C. for 2 hours under vacuum. (Reference: SB
runauer, P .; H. Emmett, E .; Tell
er, J. et al. Amer. Chem. Soc. , 60 , 30
9 (1938)) [Pore volume] A nitrogen adsorption isotherm was determined using the above-mentioned BELSORP28, and a pore radius of 1 to 100 nm was obtained by a Drillmore-Heel analysis method in accordance with JIS-K1150.
Was determined. This value was taken as the total pore volume. The pore volume in the range of the pore peak radius ± 1 nm was determined from a curve plotting the integral value with respect to the pore radius by the same method. [Pore distribution] The pore distribution was measured by the nitrogen adsorption method using BELSORP28 described above. The calculation of the pore distribution is
The method of Dolimore Heal (D. Dolimore,
G. FIG. R. Heal, J.M. Appl. Chem. , 14 ,
109 (1964)). The sample was pretreated at 160 ° C. for 2 hours under vacuum. [Pore peak radius] It was determined from the pore distribution diagram of each sample shown in FIG. This is the pore radius indicating the maximum value of ΔVp / ΔRp. [Average pore radius] Average pore radius (nm) = 2000 × (pore volume (ml / g) / specific surface area (m 2
/ G)). [Oil absorption] Measured according to the method of JIS-K-5101. [Protein adsorption property] The protein was dissolved in a 10 v / v% ethanol aqueous solution to prepare a 100 ppm protein solution. 500 ppm of silicon dioxide was added to this solution, and 20
Stirred for minutes. After filtration, the absorbance at 280 nm was measured. The proteins used were trypsin inhibitor (molecular weight 20100), carbonic anhydrase (molecular weight 30000), bovine serum albumin (molecular weight 6900)
0), catalase (molecular weight 230,000). The adsorption rate was calculated from the following equation. Adsorption rate = 100 − [(absorbance of silicon dioxide treatment liquid) /
(Absorbance of Untreated Silicon Dioxide)] × 100 FIG. 2 shows the results of each sample.

【0027】〔実施例1〕ケイ酸濃度が6w/v%であ
る3号ケイ酸ナトリウム水溶液75Lを60℃に加温
し、撹拌下、12規定濃度の硫酸2.4Lを添加した。
次に30分間撹拌し、12規定濃度の硫酸を0.70L
添加した。更に10分間60℃で加熱した。次に12規
定濃度の硫酸を0.53L添加し、更に30分間60℃
で加熱した。pHを4.0に調整した後、スラリーを濾
過、洗浄し、水に再分散した。pHを4.0に再調整し
た後、濾過、洗浄し、更に乾燥、粉砕、分級により所定
の粒度のシリカを得た。得られたシリカの物性値及び蛋
白質の吸着特性を表1に示した。
[Example 1] 75 L of an aqueous solution of sodium silicate No. 3 having a silicic acid concentration of 6 w / v% was heated to 60 ° C, and 2.4 L of 12 N sulfuric acid was added with stirring.
Next, stir for 30 minutes and add 0.70 L
Was added. Heat at 60 ° C. for another 10 minutes. Next, 0.53 L of 12N sulfuric acid was added, and the temperature was further increased to 60 ° C for 30 minutes.
And heated. After adjusting the pH to 4.0, the slurry was filtered, washed and redispersed in water. After re-adjusting the pH to 4.0, the mixture was filtered, washed, dried, pulverized, and classified to obtain silica having a predetermined particle size. Table 1 shows the physical property values and protein adsorption characteristics of the obtained silica.

【0028】〔実施例2〕ケイ酸濃度が5w/v%であ
る3号ケイ酸ナトリウム水溶液75Lを70℃に加温
し、撹拌下、12規定濃度の硫酸2.0Lを添加した。
次に30分間撹拌し、12規定濃度の硫酸を1.0L添
加した。更に30分間加熱した。pHを4.0に調整し
た後、スラリーを濾過、洗浄し、水に再分散した。pH
を4.0に再調整した後、濾過、洗浄し、更に乾燥、粉
砕、分級により所定の粒度のシリカを得た。得られたシ
リカの物性値及び蛋白質の吸着特性を表1に示した。
Example 2 75 L of an aqueous solution of sodium silicate No. 3 having a silicic acid concentration of 5 w / v% was heated to 70 ° C., and 2.0 L of sulfuric acid having a 12N concentration was added with stirring.
Next, the mixture was stirred for 30 minutes, and 1.0 L of 12N sulfuric acid was added. Heat for an additional 30 minutes. After adjusting the pH to 4.0, the slurry was filtered, washed and redispersed in water. pH
Was readjusted to 4.0, filtered, washed, dried, pulverized and classified to obtain silica having a predetermined particle size. Table 1 shows the physical property values and protein adsorption characteristics of the obtained silica.

【0029】〔比較例1〕ケイ酸濃度が11w/v%で
ある3号ケイ酸ナトリウム水溶液50Lを60℃に加温
し、撹拌下、12規定濃度の硫酸2.1Lを注加した。
更に30分間撹拌した後、90℃に昇温した。再び12
規定濃度の硫酸2.3Lを注加した。注加終了後、更に
95℃で30分間撹拌した。pHを4.0に調整した
後、濾過、洗浄し、水に再分散した。pHを4.0に再
調整した後、更に乾燥、粉砕、分級により所定の粒度の
シリカを得た。得られたシリカの物性値及び蛋白質の吸
着特性を表1に示した。
Comparative Example 1 50 L of an aqueous solution of sodium silicate No. 3 having a silicic acid concentration of 11 w / v% was heated to 60 ° C., and 2.1 L of sulfuric acid having a 12N concentration was poured under stirring.
After further stirring for 30 minutes, the temperature was raised to 90 ° C. Again 12
2.3 L of sulfuric acid at a specified concentration was added. After the addition was completed, the mixture was further stirred at 95 ° C. for 30 minutes. After adjusting the pH to 4.0, the mixture was filtered, washed, and redispersed in water. After the pH was readjusted to 4.0, silica having a predetermined particle size was obtained by further drying, pulverizing, and classifying. Table 1 shows the physical property values and protein adsorption characteristics of the obtained silica.

【0030】〔比較例2〕ケイ酸濃度が7w/v%であ
る3号ケイ酸ナトリウム水溶液50Lに硫酸ナトリウム
2.5kgを添加した後、40℃に加温し、撹拌下、1
2規定濃度の硫酸0.8Lを注加した。更に30分間撹
拌した後、再び12規定濃度の硫酸1.6Lを注加し
た。注加終了後、濾過、洗浄し、水に再分散した。pH
を4.0に再調整した後、更に乾燥、粉砕、分級により
所定の粒度のシリカを得た。得られたシリカの物性値及
び蛋白質の吸着特性を表1に示した。
Comparative Example 2 After adding 2.5 kg of sodium sulfate to 50 L of an aqueous solution of sodium silicate No. 3 having a silicic acid concentration of 7 w / v%, the mixture was heated to 40 ° C., and stirred.
0.8 L of sulfuric acid having a 2N concentration was added. After further stirring for 30 minutes, 1.6 L of 12N sulfuric acid was again added. After the addition was completed, the mixture was filtered, washed, and redispersed in water. pH
Was readjusted to 4.0, and further dried, pulverized and classified to obtain silica having a predetermined particle size. Table 1 shows the physical property values and protein adsorption characteristics of the obtained silica.

【0031】〔比較例3〕ケイ酸濃度が19w/v%で
ある3号ケイ酸ナトリウム水溶液20L及び12規定濃
度の硫酸3.3Lを、予め60℃に加温しておいた水5
0Lに撹拌しながら、同時に30分間かけて添加した。
添加中のpHは4〜6であった。添加終了後、スラリー
のpHを4に調整し、オートクレーブ中で200℃、6
0分間加熱した。冷却後、濾過、洗浄し、水に再分散し
た。pHを4.0に再調整した後、更に乾燥、粉砕、分
級により所定の粒度のシリカを得た。得られたシリカの
物性値及び蛋白質の吸着特性を表1に示した。
COMPARATIVE EXAMPLE 3 20 L of an aqueous solution of sodium silicate No. 3 having a silicic acid concentration of 19 w / v% and 3.3 L of sulfuric acid having a 12N concentration were added to water 5 which had been heated to 60 ° C. in advance.
While stirring to 0 L, it was added simultaneously over 30 minutes.
The pH during the addition was 4-6. After the addition was completed, the pH of the slurry was adjusted to 4, and the temperature was adjusted to 200 ° C.
Heated for 0 minutes. After cooling, the mixture was filtered, washed, and redispersed in water. After the pH was readjusted to 4.0, silica having a predetermined particle size was obtained by further drying, pulverizing, and classifying. Table 1 shows the physical property values and protein adsorption characteristics of the obtained silica.

【0032】[0032]

【表1】 [Table 1]

【0033】上記結果、特に図2の結果にみられるよう
に、実施例の二酸化ケイ素は、特定の分子量を有する物
質(蛋白質)に対し特異的な吸着特性を示すことが認め
られた。
As can be seen from the above results, in particular, from the results shown in FIG. 2, it was confirmed that the silicon dioxide of the examples exhibited specific adsorption characteristics for substances (proteins) having a specific molecular weight.

【図面の簡単な説明】[Brief description of the drawings]

【図1】実施例,比較例の細孔分布図である。FIG. 1 is a pore distribution diagram of an example and a comparative example.

【図2】実施例,比較例の各種蛋白質に対する吸着性能
を示すグラフである。
FIG. 2 is a graph showing the adsorption performance of Examples and Comparative Examples for various proteins.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 FI B01J 32/00 B01J 32/00 C12H 1/04 C12H 1/04 ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 6 Identification code FI B01J 32/00 B01J 32/00 C12H 1/04 C12H 1/04

Claims (9)

【特許請求の範囲】[Claims] 【請求項1】 細孔分布曲線において、細孔半径10n
m以下にΔVp/ΔRp値(但し、Vpは細孔容積、R
pは細孔半径)の最大値を有し、そのΔVp/ΔRp値
の最大値が100mm3/nm・g以上であり、かつ全
細孔容積に対して細孔ピーク半径(ΔVp/ΔRpが最
大値を示す細孔半径)±1nmの範囲に相当する細孔容
積の割合が全細孔容積の20%以上である二酸化ケイ
素。
In the pore distribution curve, the pore radius is 10n.
m or less, ΔVp / ΔRp value (where Vp is the pore volume, R
p has the maximum value of the pore radius), the maximum value of the ΔVp / ΔRp value is 100 mm 3 / nm · g or more, and the pore peak radius (ΔVp / ΔRp is the maximum value) with respect to the total pore volume. Silicon dioxide having a pore volume ratio corresponding to a range of ± 1 nm of the pore volume, which is 20% or more of the total pore volume.
【請求項2】 細孔分布曲線において、細孔半径3〜8
nmにΔVp/ΔRp値(但し、Vpは細孔容積、Rp
は細孔半径)の最大値を有し、そのΔVp/ΔRp値の
最大値が200mm3/nm・g以上であり、かつ全細
孔容積に対して細孔ピーク半径(ΔVp/ΔRpが最大
値を示す細孔半径)±1nmの範囲に相当する細孔容積
の割合が全細孔容積の20%以上である請求項1記載の
二酸化ケイ素。
2. In the pore distribution curve, the pore radius is 3 to 8
In nm, ΔVp / ΔRp value (where Vp is pore volume, Rp
Has the maximum value of the pore radius), the maximum value of the ΔVp / ΔRp value is 200 mm 3 / nm · g or more, and the pore peak radius (ΔVp / ΔRp is the maximum value) with respect to the total pore volume. 2. The silicon dioxide according to claim 1, wherein a ratio of a pore volume corresponding to a range of ± 1 nm is 20% or more of a total pore volume.
【請求項3】 細孔分布曲線において、細孔半径3〜5
nmにΔVp/ΔRp値(但し、Vpは細孔容積、Rp
は細孔半径)の最大値を有し、そのΔVp/ΔRp値の
最大値が400mm3/nm・g以上であり、かつ全細
孔容積に対して細孔ピーク半径(ΔVp/ΔRpが最大
値を示す細孔半径)±1nmの範囲に相当する細孔容積
の割合が全細孔容積の40%以上である請求項2記載の
二酸化ケイ素。
3. A pore distribution curve, wherein the pore radius is 3-5.
In nm, ΔVp / ΔRp value (where Vp is pore volume, Rp
Has the maximum value of the pore radius), the maximum value of ΔVp / ΔRp is 400 mm 3 / nm · g or more, and the pore peak radius (ΔVp / ΔRp is the maximum value) with respect to the total pore volume. 3. The silicon dioxide according to claim 2, wherein the ratio of the pore volume corresponding to the range of ± 1 nm of the pore volume is 40% or more of the total pore volume.
【請求項4】 比表面積が300〜500m2/gで、
かつ細孔容積が0.8〜1.4ml/gである請求項
1,2又は3記載の二酸化ケイ素。
4. A specific surface area of 300 to 500 m 2 / g,
4. The silicon dioxide according to claim 1, wherein the pore volume is 0.8 to 1.4 ml / g.
【請求項5】 平均粒径が1〜30μmである請求項1
乃至4のいずれか1項記載の二酸化ケイ素。
5. The method according to claim 1, wherein the average particle size is 1 to 30 μm.
The silicon dioxide according to any one of claims 1 to 4.
【請求項6】 平均粒径が5〜20μmである請求項5
記載の二酸化ケイ素。
6. An average particle size of 5 to 20 μm.
The silicon dioxide as described.
【請求項7】 5重量%スラリーのpHが8以下である
請求項1乃至6のいずれか1項記載の二酸化ケイ素。
7. The silicon dioxide according to claim 1, wherein the pH of the 5% by weight slurry is 8 or less.
【請求項8】 吸油量が150ml/100g以上であ
る請求項1乃至7のいずれか1項記載の二酸化ケイ素。
8. The silicon dioxide according to claim 1, which has an oil absorption of 150 ml / 100 g or more.
【請求項9】 ケイ酸濃度が10重量/容量%以下のア
ルカリ金属ケイ酸塩水溶液と鉱酸とを反応させることに
より得られた請求項1乃至8のいずれか1項記載の二酸
化ケイ素。
9. The silicon dioxide according to claim 1, which is obtained by reacting an aqueous solution of an alkali metal silicate having a silicic acid concentration of 10% by weight or less with a mineral acid.
JP9338077A 1997-11-21 1997-11-21 New silicon dioxide Pending JPH11157827A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Application Number Priority Date Filing Date Title
JP9338077A JPH11157827A (en) 1997-11-21 1997-11-21 New silicon dioxide

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Publication Number Publication Date
JPH11157827A true JPH11157827A (en) 1999-06-15

Family

ID=18314696

Family Applications (1)

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Country Link
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JP2003171116A (en) * 2001-09-25 2003-06-17 Mitsubishi Chemicals Corp Silica
JP2003171113A (en) * 2001-09-25 2003-06-17 Mitsubishi Chemicals Corp Silica hydrogel and silica
JP2003171115A (en) * 2001-09-25 2003-06-17 Mitsubishi Chemicals Corp Silica
JP2003221223A (en) * 2001-09-25 2003-08-05 Mitsubishi Chemicals Corp Silica
US6838068B2 (en) 2000-06-30 2005-01-04 Mitsubishi Chemical Corporation Silica gel
JP2005162504A (en) * 2003-11-28 2005-06-23 Tokuyama Corp Binary porous silica particle
US7488533B2 (en) 2003-08-05 2009-02-10 Dsl Japan Co., Ltd. Highly oil absorbing amorphous silica particles
JP2016508502A (en) * 2013-02-01 2016-03-22 ダブリュー・アール・グレース・アンド・カンパニー−コーンW R Grace & Co−Conn Porous silica gel as a carrier for liquid technology
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Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000127615A (en) * 1998-10-27 2000-05-09 Nippon Silica Ind Co Ltd Filler for paper for color ink-jet
US6838068B2 (en) 2000-06-30 2005-01-04 Mitsubishi Chemical Corporation Silica gel
US7074376B2 (en) 2000-06-30 2006-07-11 Mitsubishi Chemical Corporation Silica gel
JP2003171116A (en) * 2001-09-25 2003-06-17 Mitsubishi Chemicals Corp Silica
JP2003171113A (en) * 2001-09-25 2003-06-17 Mitsubishi Chemicals Corp Silica hydrogel and silica
JP2003171115A (en) * 2001-09-25 2003-06-17 Mitsubishi Chemicals Corp Silica
JP2003221223A (en) * 2001-09-25 2003-08-05 Mitsubishi Chemicals Corp Silica
US7488533B2 (en) 2003-08-05 2009-02-10 Dsl Japan Co., Ltd. Highly oil absorbing amorphous silica particles
JP2005162504A (en) * 2003-11-28 2005-06-23 Tokuyama Corp Binary porous silica particle
JP2016508502A (en) * 2013-02-01 2016-03-22 ダブリュー・アール・グレース・アンド・カンパニー−コーンW R Grace & Co−Conn Porous silica gel as a carrier for liquid technology
JP2018050568A (en) * 2016-09-30 2018-04-05 日東富士製粉株式会社 Meat product, method for reducing smell of meat product and agent for reducing smell of meat product

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