JPH07128253A - Glide flaw detecting optical system for aluminium disc - Google Patents

Glide flaw detecting optical system for aluminium disc

Info

Publication number
JPH07128253A
JPH07128253A JP29608193A JP29608193A JPH07128253A JP H07128253 A JPH07128253 A JP H07128253A JP 29608193 A JP29608193 A JP 29608193A JP 29608193 A JP29608193 A JP 29608193A JP H07128253 A JPH07128253 A JP H07128253A
Authority
JP
Japan
Prior art keywords
glide
light
parallel beam
flaw
diameter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP29608193A
Other languages
Japanese (ja)
Other versions
JP3329539B2 (en
Inventor
Hozumi Yamamoto
穂積 山本
Kenji Aiko
健二 愛甲
Makio Asano
真樹夫 浅野
Tsutomu Nakadai
勉 中台
Hirohito Kato
啓仁 加藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Corp
Original Assignee
Hitachi Electronics Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Electronics Engineering Co Ltd filed Critical Hitachi Electronics Engineering Co Ltd
Priority to JP29608193A priority Critical patent/JP3329539B2/en
Publication of JPH07128253A publication Critical patent/JPH07128253A/en
Application granted granted Critical
Publication of JP3329539B2 publication Critical patent/JP3329539B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)

Abstract

PURPOSE:To converge the scattered light necessary for detection and improve inspection efficiency and detecting precision by converting the laser beam of a laser beam source into a parallel beam having a diameter corresponding to the minimum width of a glide flaw, and then projecting it. CONSTITUTION:A helium-neon gas laser tube 313 for oscillating a parallel beam LT, about 1mm in diameter phi1 is used as a laser beam source, and a converting lens system 314 for converting the diameter phi1 of the parallel beam LT, to phi2 two times. The parallel beam LT, incident thereto is converted into a parallel beam LT'' abut 2 mm in diameter phi2 corresponding to a minimum glide flaw width Wmi, and projected to a disc 1 rotated by a spindle mechanism 2 to spirally scan the surface. The positive reflected light LRS and scattered light LRR are converged by a converging lens 321, and divided into transmitted light and reflected light by a half mirror 322, and the transmitted light is incident on a space filter 323. The positive reflected light LRS contained in the transmitted light is shielded by a stopper, and only the scattered light LRR necessary for the detection of the glide flaw is incident to a light receiver 324.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】この発明は、磁気ディスクの素材
のアルミディスクのグライド傷を検出する光学系に関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an optical system for detecting glide scratches on an aluminum disk which is a material for a magnetic disk.

【0002】[0002]

【従来の技術】情報記録媒体として多用されている磁気
ディスクは、素材としてガラスディスクまたはアルミデ
ィスクが使用されている。アルミディスクの場合は、そ
の表面にニッケルメッキを加工してニッケルメッキ層が
形成される。ここではニッケルメッキされたアルミディ
スクを対象とし、これによる磁気ディスクの製造過程
と、その際生ずるグライド傷について簡単に説明する。
図3(a) において、素材のアルミディスク1は、その中
心孔1a と外周1b の間が、図示のように、ディスク1
の半径に比較して小円形の研磨を繰り返しながら、逐次
に全面に移動して均一に研磨される。研磨が終了する
と、研磨面はニッケルメッキ加工されてニッケルメッキ
層(Ni)が形成され、さらにその上に磁気膜が塗布さ
れて磁気ディスクが完成される。上記の研磨において
は、アルミディスク1の表面は極力平滑化されるが、し
かし多少の研磨跡、すなわちグライド傷Gが残存するこ
とがあり、このグライド傷に倣ってニッケルメッキ層に
もグライド傷Gが生ずる。グライド傷Gの形状は研磨と
同様に円形で、その断面は図(b) のように、皿状の凹面
をなす。グライド傷Gの長さと、幅w、深さdはさまざ
まであり、幅wと深さdがある程度以上のときは、塗布
された磁気膜の性能に影響して有害となるので、グライ
ド傷Gはニッケルメッキ層が形成された段階で、グライ
ド傷検査装置により検査される。なお、グライド傷Gの
有害の程度は、例えば幅wが約2mm、深さdが約20
0μm以上とされている。
2. Description of the Related Art A magnetic disk, which is widely used as an information recording medium, uses a glass disk or an aluminum disk as a material. In the case of an aluminum disk, a nickel plating layer is formed by processing nickel plating on the surface of the aluminum disk. Here, a nickel-plated aluminum disk is targeted, and a brief description will be given of a magnetic disk manufacturing process using the aluminum disk and glide scratches generated at that time.
In FIG. 3 (a), the aluminum disc 1 made of a material has a disc 1 between the center hole 1a and the outer periphery 1b as shown in the figure.
While repeating the polishing of a small circle in comparison with the radius of the, the entire surface is sequentially moved and uniformly polished. When the polishing is completed, the polished surface is nickel-plated to form a nickel-plated layer (Ni), and a magnetic film is further applied thereon to complete the magnetic disk. In the above-mentioned polishing, the surface of the aluminum disk 1 is smoothed as much as possible, but some polishing marks, that is, glide scratches G may remain. Occurs. The glide scratch G has a circular shape similar to that of polishing, and its cross section has a dish-like concave surface as shown in FIG. The glide scratches G have various lengths, widths w, and depths d. When the widths w and the depths d are above a certain level, they affect the performance of the coated magnetic film and are harmful. Is inspected by a glide flaw inspection device when the nickel plating layer is formed. The degree of harmfulness of the glide scratch G is, for example, about 2 mm in width w and about 20 in depth d.
It is set to 0 μm or more.

【0003】一般に、各種のディスクの傷や凹凸、また
は付着異物などの欠陥に対して、光学式の欠陥検査装置
が使用されており、上記のグライド傷Gに対してこのよ
うな検査装置を適用することが試みられている。図4
(a) は上記の一般に使用されている欠陥検査装置の概略
構成を示し、被検査のディスク1を装着して回転するス
ピンドル機構2と、投光系31と受光系32よりなる検出光
学系3を有する。投光系31のレーザ光源311 よりのレー
ザビームLT は、集束レンズ312 により微小な直径Δ
φ、例えば30μmφのスポットSpに集束されてディ
スク1の表面に投射される。図示しない移動機構により
検出光学系3はディスク1の半径Rの方向に連続して移
動し、スポットSp が表面をスパイラル状に走査する。
欠陥のない表面ではスポットSp は正反射し、欠陥があ
るとスポットSp は散乱する。正反射光LRsと散乱光L
RRは受光系32の集光レンズ321 により集光され、ハーフ
ミラー322 により透過光と反射光に分割される。ハーフ
ミラー322 の透過光は空間フィルタ323 に入射し、これ
に含まれる正反射光LRsは、そのストッパMにより遮断
されて散乱光LRRのみが第1の受光器324に受光され
る。一方、反射光はスリット板325 に入射し、正反射光
Rsのみがその孔Hを透過して第2の受光器326 に受光
される。両受光器の各受光信号は図示しない信号処理回
路に入力して、両受光信号の差分信号が作成され、これ
により正反射光LRsが排除されてS/N比が向上し、欠
陥が良好に検出されるものである。
In general, an optical defect inspection apparatus is used for various kinds of defects such as scratches and irregularities on discs, and adhered foreign matter, and such an inspection apparatus is applied to the above-mentioned glide scratches G. Is being attempted. Figure 4
(a) shows a schematic configuration of the above-mentioned generally used defect inspection apparatus, in which a spindle mechanism 2 for mounting and rotating a disc 1 to be inspected, a detection optical system 3 including a light projecting system 31 and a light receiving system 32 is shown. Have. The laser beam L T from the laser light source 311 of the light projecting system 31 is caused by the focusing lens 312 to have a minute diameter Δ.
It is focused on a spot S p of φ, for example, 30 μmφ and projected onto the surface of the disc 1. The detection optical system 3 continuously moves in the radius R direction of the disk 1 by a moving mechanism (not shown), and the spot S p scans the surface in a spiral shape.
The spot S p is specularly reflected on a defect-free surface, and the spot S p is scattered when there is a defect. Specular reflection light L Rs and scattered light L
The RR is condensed by the condenser lens 321 of the light receiving system 32, and split by the half mirror 322 into transmitted light and reflected light. The transmitted light of the half mirror 322 enters the spatial filter 323, the specularly reflected light L Rs contained therein is blocked by the stopper M, and only the scattered light L RR is received by the first light receiver 324. On the other hand, the reflected light enters the slit plate 325, and only the specularly reflected light L Rs passes through the hole H and is received by the second light receiver 326. The light reception signals of both light receivers are input to a signal processing circuit (not shown) to create a difference signal between the two light reception signals, whereby specular reflection light L Rs is eliminated, the S / N ratio is improved, and defects are good. Is detected by.

【0004】[0004]

【発明が解決しようとする課題】いま、上記の欠陥検査
装置によりグライド傷Gを検査するとする。この場合
は、図4(b) に示すように、グライド傷Gの有害な最小
限の約2mmの幅wに対して、スポットSp の直径Δφ
は30μmに過ぎないので、グライド傷Gの一部分しか
照射されず、また、深さdが幅wに比較して浅いために
凹面の曲率が非常に小さので、グライド傷Gを検出する
に必要かつ十分な散乱光LRRがえられない。このような
欠点により、上記の検出光学系3はグライド傷Gを良好
に検出できないので、この欠点を改善することが要請さ
れている。この発明は上記の欠点を改善して、アルミデ
ィスクのグライド傷Gを良好に検出できる検出光学系を
提供することを目的とする。
Now, it is assumed that the glide scratch G is inspected by the above defect inspection apparatus. In this case, as shown in FIG. 4B, the diameter Δφ of the spot S p is reduced with respect to the harmful minimum width w of the glide defect G of about 2 mm.
Is only 30 μm, only a part of the glide scratch G is irradiated, and since the depth d is shallower than the width w, the curvature of the concave surface is very small. Sufficient scattered light L RR cannot be obtained. Due to such a defect, the detection optical system 3 cannot detect the glide scratch G satisfactorily, and therefore it is required to improve this defect. It is an object of the present invention to provide a detection optical system which can improve the above-mentioned drawbacks and can detect glide scratches G on an aluminum disk in a good condition.

【0005】[0005]

【課題を解決するための手段】この発明はアルミディス
クのグライド傷検出光学系であって、前記のグライド傷
検査装置において、レーザ光源のレーザビームを、グラ
イド傷の有害な最小限の幅に対応した直径を有する平行
ビームに変換して投射する投光系と、最小限の幅を有す
るグライド傷の散乱光を、一括して集光する集光レンズ
と、正反射光に対する排除機能とを有する受光系とによ
り構成される。上記において、グライド傷の有害な最小
限の幅wmiを約2mmとし、レーザ光源として、約1m
mの直径φ1 の平行ビームを発振するヘリウムネオンの
ガスレーザ管を使用し、投光系にこの平行ビームの直径
φ1 を2倍のφ2 に変換する変換レンズ系を設けたもの
である。
SUMMARY OF THE INVENTION The present invention is a glide flaw detection optical system for an aluminum disk, wherein the laser beam of the laser light source is adapted to a minimum harmful width of the glide flaw in the glide flaw inspection apparatus. Having a projection system for converting into a parallel beam having a specified diameter and projecting it, a collective lens for collectively collecting scattered light of glide scratches having a minimum width, and a function of eliminating specularly reflected light. And a light receiving system. In the above, the harmful minimum width w mi of the glide scratch is set to about 2 mm, and the laser light source is set to about 1 m.
diameter phi 1 of the parallel beam of m using the gas laser tube of the helium neon oscillating, is the light projecting system that provided a conversion lens system for converting the diameter phi 1 of the parallel beam of double phi 2.

【0006】[0006]

【作用】上記の検出光学系においては、投光系のレーザ
光源のレーザビームは、グライド傷の有害な最小限の幅
に対応する直径の平行ビームに変換されて、ニッケルメ
ッキ層の表面に投射されるので、最小限の幅を有するグ
ライド傷は、その幅の範囲が同時にレーザビームに照射
されて、検出に必要な散乱光が散乱される。この散乱光
は受光系の集光レンズにより一括して集光され、さらに
その排除機能により正反射光が排除されてS/N比が向
上する結果、グライド傷を良好に検出することができ
る。上記において、グライド傷の有害な最小限の幅wmi
は約2mmとされ、レーザ光源には、約1mmの直径φ
1 の平行ビームを発振するヘリウムネオンのガスレーザ
管が使用され、ガスレーザ管の発振した平行ビームは、
投光系に設けた変換レンズ系により、グライド傷の最小
限の幅に対応する約2mmの直径φ2 を有する平行ビー
ムに変換されて、ニッケルメッキ層に投射されるので、
上記した検出に必要な散乱光がえられる。なお、集光レ
ンズとしては、なるべく集光角度が広いものを使用す
る。なお上記においては、投射される平行ビームの直径
φ2 は、従来の検出光学系のレーザスポットの直径Δφ
に比較して、約70倍に拡大されるので、検査時間は約
70分の1の大幅に短縮されて、検査効率が格段に向上
する。
In the above detection optical system, the laser beam of the laser light source of the light projecting system is converted into a parallel beam having a diameter corresponding to the harmful minimum width of glide scratches and projected on the surface of the nickel plating layer. Therefore, the glide scratch having the minimum width is simultaneously irradiated with the laser beam in the range of the width, and scattered light necessary for detection is scattered. The scattered light is collectively collected by the condenser lens of the light receiving system, and the specular reflection light is eliminated by the elimination function to improve the S / N ratio. As a result, glide scratches can be favorably detected. In the above, the harmful minimum width w mi of the glide wound
Is about 2 mm, and the laser light source has a diameter φ of about 1 mm.
A helium-neon gas laser tube that oscillates 1 parallel beam is used, and the oscillated parallel beam of the gas laser tube is
By the conversion lens system provided in the light projecting system, it is converted into a parallel beam having a diameter φ 2 of about 2 mm corresponding to the minimum width of glide scratches and projected onto the nickel plating layer.
The scattered light necessary for the above detection can be obtained. As the condensing lens, one having a condensing angle as wide as possible is used. In the above, the diameter φ 2 of the projected parallel beam is the diameter Δφ of the laser spot of the conventional detection optical system.
Compared with the above, since the inspection time is expanded by about 70 times, the inspection time is greatly reduced by about 1/70, and the inspection efficiency is remarkably improved.

【0007】[0007]

【実施例】図1は、この発明の一実施例における、検出
光学系3’の概略の構成図を示し、図2は図1に対する
グライド傷Gの検出作用の説明図である。図1に示す検
出光学系3’は、前記した図4(a) の検出光学系3と同
一の受光系32を有し、スピンドル機構2も同一である。
ただし投光系31は、図4(a) の場合と異なり、レーザ光
源として、約1mmの直径φ1 の平行ビームLT ’を発
振するヘリウムネオンのガスレーザ管313 を使用し、図
示の位置に平行ビームLT’の直径φ1 を2倍のφ2
変換する変換レンズ系314 を設けて構成される。変換レ
ンズ系314 としては、いわゆるエキスパンダを使用すれ
ばよい。これに入射した平行ビームLT ’は、最小限の
幅wmiに対応した直径φ2 が約2mmの平行ビームL
T ”に変換され、そのスポットSp ’がスピンドル機構
2に装着されて回転するディスク1に投射される。ディ
スク1のニッケルメッキ層(Ni)に存在するグライド
傷GにスポットSp ’が投射されると、これが散乱光L
RRを散乱するとともに、正反射光LRsも反射する。この
散乱と反射の状態を図2によりやや詳しく説明する。
1 is a schematic block diagram of a detection optical system 3'according to an embodiment of the present invention, and FIG. 2 is an explanatory view of a glide flaw G detecting operation with respect to FIG. The detection optical system 3'shown in FIG. 1 has the same light receiving system 32 as the detection optical system 3 shown in FIG. 4 (a), and the spindle mechanism 2 is also the same.
However, unlike the case of FIG. 4A, the light projecting system 31 uses a helium-neon gas laser tube 313 that oscillates a parallel beam L T ′ having a diameter φ 1 of about 1 mm as a laser light source, and configured to provide a conversion lens system 314 for converting the diameter phi 1 of the parallel beam L T 'double phi 2. A so-called expander may be used as the conversion lens system 314. The parallel beam L T ′ incident on this is a parallel beam L having a diameter φ 2 of about 2 mm corresponding to the minimum width w mi.
It is converted into T ″ and the spot S p ′ is projected onto the rotating disk 1 mounted on the spindle mechanism 2. The spot S p ′ is projected onto the glide scratch G existing on the nickel plating layer (Ni) of the disk 1. When this is done, this is the scattered light L
In addition to scattering RR , specular reflection light L Rs is also reflected. The state of scattering and reflection will be described in some detail with reference to FIG.

【0008】図2において、グライド傷Gは最小限の幅
miを有するものとし、その曲面は正しい円弧であると
仮定する。幅wmiに対応した直径φ2 のスポットSp
は走査移動して、例えばグライド傷Gの左側の点p1
9 の間をカバーして投射される。この状態では、点p
1 と点p6 (グライド傷Gの左右の中心点)では正反射
光LRsが反射され、これ以外の各点では反射方向が変化
して散乱光LRRが散乱される。スポットSp ’が右方向
に走査移動すると、カバー範囲は逐次に点p2〜p10
点p3 〜p11、………に移行し、点p11では正反射す
る。要するに、グライド傷Gの前後と中心点では正反射
し、これ以外の各点では散乱する。上記の反射状態をみ
ると、正反射光LRsに比較して散乱光LRRの占める割合
が大きく、これを集光レンズ321 により一括して集光
し、さらに受光系32の前記した正反射光LRsの排除作用
により、グライド傷Gを良好に検出することができるわ
けである。また前記したように、検査時間は従来の検査
光学系に比較して約70分の1の大幅に短縮されもので
ある。
In FIG. 2, it is assumed that the glide flaw G has a minimum width w mi and the curved surface is a correct arc. Spot S p 'with diameter φ 2 corresponding to width w mi
Scans and moves, for example, the point p 1 on the left side of the glide scratch G
It is projected while covering the space between p 9 . In this state, the point p
The specular reflection light L Rs is reflected at 1 and the point p 6 (the center point on the left and right of the glide scratch G), and the reflection direction changes at each other point to scatter the scattered light L RR . When the spot S p ′ scans and moves to the right, the coverage area is sequentially changed from the points p 2 to p 10 ,
Point p 3 ~p 11, goes to ........., regularly reflected at the point p 11. In short, specular reflection occurs before and after the glide scratch G and at the center point, and scatters at other points. Looking at the above reflection state, the proportion of the scattered light L RR is larger than that of the regular reflection light L Rs , and this is collectively collected by the condenser lens 321, and further the regular reflection of the light receiving system 32 is performed. The glide scratch G can be satisfactorily detected by the action of eliminating the light L Rs . Further, as described above, the inspection time is considerably shortened by about 1/70 as compared with the conventional inspection optical system.

【0009】[0009]

【発明の効果】以上の説明のとおり、この発明によるグ
ライド傷検出光学系においては、レーザビームを、ディ
スクに対してグライド傷の有害な最小限の幅に対応した
直径の平行ビームとして投射し、グライド傷の散乱光を
正反射光に比較して多くし、これを一括して集光レンズ
により集光し、さらに受光系の排除作用により正反射光
を排除してグライド傷を良好に検出するもので、グライ
ド傷検査装置の検査の信頼性の向上と検査時間の短縮に
寄与するところには大きいものがある。
As described above, in the glide flaw detection optical system according to the present invention, the laser beam is projected onto the disk as a parallel beam having a diameter corresponding to the harmful minimum width of the glide flaw, The scattered light of glide scratches is made larger than that of specular reflection light, and this is collectively collected by a condenser lens, and the specular reflection light is eliminated by the action of the light receiving system to detect glide scratches well. However, there is a great contribution to the improvement of the inspection reliability of the glide inspection device and the reduction of the inspection time.

【図面の簡単な説明】[Brief description of drawings]

【図1】 この発明の一実施例における、検出光学系
3’の概略の構成図である。
FIG. 1 is a schematic configuration diagram of a detection optical system 3 ′ in one embodiment of the present invention.

【図2】 図1に対するグライド傷Gの検出作用の説明
図である。
FIG. 2 is an explanatory diagram of a detection action of a glide flaw G with respect to FIG.

【図3】 (a) は磁気ディスクの製造工程の説明図、
(b) は製造の際に生ずるグライド傷Gの説明図である。
FIG. 3A is an explanatory diagram of a magnetic disk manufacturing process,
(b) is an explanatory view of a glide scratch G generated during manufacturing.

【図4】 (a) は一般に使用されている欠陥検査装置の
概略構成図、(b) は(a) の欠陥検査装置によりグライド
傷を検査する場合の問題点の説明図である。
FIG. 4A is a schematic configuration diagram of a commonly used defect inspection apparatus, and FIG. 4B is an explanatory diagram of problems when inspecting glide scratches by the defect inspection apparatus of FIG.

【符号の説明】[Explanation of symbols]

1…アルミディスク、1a …中心孔、1b …外周、2…
スピンドル機構、3…従来の検出光学系、3’…この発
明の検出光学系、31…投光系、311 …レーザ光源、312
…集束レンズ、313 …ヘリウムネオンのガスレーザ管に
よるレーザ光源、314 …変換レンズ系(エキスパン
ダ)、32…受光系、321 …集光レンズ、322 …ハーフミ
ラー、323 …空間フィルタ、324 …第1の受光器、325
…スリット板、326 …第2の受光器、Ni…ニッケルメ
ッキ層、R…ディスクの半径、G…グライド傷、w…グ
ライド傷の幅、wmi…有害な最小限の幅、d…グライド
傷の深さ、LT ’, LT ”…平行ビーム、φ12 …平
行ビームの直径、Sp ,Sp ’…スポット、LRs…正反
射光、LRR…散乱光。
1 ... Aluminum disk, 1a ... Center hole, 1b ... Outer periphery, 2 ...
Spindle mechanism, 3 ... Conventional detection optical system, 3 '... Detection optical system of the present invention, 31 ... Projection system, 311 ... Laser light source, 312
... Focusing lens, 313 ... Laser light source by helium-neon gas laser tube, 314 ... Conversion lens system (expander), 32 ... Light receiving system, 321 ... Condensing lens, 322 ... Half mirror, 323 ... Spatial filter, 324 ... 1st Receiver of the, 325
... Slit plate, 326 ... Second light receiver, Ni ... Nickel plated layer, R ... Disk radius, G ... Glide scratch, w ... Glide scratch width, w mi ... Harmful minimum width, d ... Glide scratch Depth, L T ', L T "... parallel beam, φ 1 , φ 2 ... diameter of parallel beam, S p , S p ' ... spot, L Rs ... specular reflection light, L RR ... scattered light.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 中台 勉 東京都千代田区大手町二丁目6番2号 日 立電子エンジニアリング株式会社内 (72)発明者 加藤 啓仁 東京都千代田区大手町二丁目6番2号 日 立電子エンジニアリング株式会社内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Tsutomu Nakadai 2-6-2 Otemachi, Chiyoda-ku, Tokyo Within Nitrate Electronics Engineering Co., Ltd. (72) Hirohito Kato 2-6, Otemachi, Chiyoda-ku, Tokyo No. 2 in Nitrate Electronics Engineering Co., Ltd.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 表面にニッケルメッキ層が形成された、
磁気ディスクの素材のアルミディスクを検査対象とし、
レーザ光源よりレーザビームを投射する投光系と、該ニ
ッケルメッキ層の散乱光に対する受光系とを具備し、前
記アルミディスクの研磨により生じ、前記ニッケルメッ
キ層に残存するグライド傷を検査するグライド傷検査装
置において、前記レーザ光源のレーザビーム、前記グラ
イド傷の有害な最小限の幅に対応する直径を有する平行
ビームに変換して投射する投光系と、該最小限の幅を有
する前記グライド傷の散乱光を、一括して集光する集光
レンズと、正反射光に対する排除機能とを有する受光系
とにより構成されたことを特徴とする、アルミディスク
のグライド傷検出光学系。
1. A nickel plating layer is formed on the surface,
The inspection target is the aluminum disk, which is the material of the magnetic disk,
A glide flaw for inspecting a glide flaw remaining on the nickel plating layer, which is provided with a light projecting system for projecting a laser beam from a laser light source and a light receiving system for scattered light of the nickel plating layer, which is caused by polishing the aluminum disk. In the inspection device, a laser beam of the laser light source, a projection system for converting and projecting into a parallel beam having a diameter corresponding to a harmful minimum width of the glide scratch, and the glide scratch having the minimum width. An optical system for detecting glide scratches on an aluminum disk, which is configured by a condenser lens that collectively collects the scattered light of 1. and a light receiving system that has a function of eliminating specularly reflected light.
【請求項2】 前記グライド傷の有害な最小限の幅wmi
を約2mmとし、前記レーザ光源として、約1mmの直
径φ1 の平行ビームを発振するヘリウムネオンのガスレ
ーザ管を使用し、前記投光系に該平行ビームの直径φ1
を2倍のφ2に変換する変換レンズ系を設けたことを特
徴とする、請求項1記載のニッケルメッキディスクのグ
ライド傷検出光学系。
2. A detrimental minimum width w mi of the glide scar.
Was about 2 mm, as the laser light source, using a gas laser tube of the helium neon oscillating the diameter phi 1 of the parallel beam of about 1 mm, the parallel beam of diameter phi 1 to the light projecting system
2. A glide flaw detection optical system for a nickel-plated disk according to claim 1, further comprising a conversion lens system for converting the optical axis into twice as large as φ 2 .
JP29608193A 1993-11-01 1993-11-01 Glide scratch detection optical system for aluminum disk Expired - Lifetime JP3329539B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP29608193A JP3329539B2 (en) 1993-11-01 1993-11-01 Glide scratch detection optical system for aluminum disk

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP29608193A JP3329539B2 (en) 1993-11-01 1993-11-01 Glide scratch detection optical system for aluminum disk

Publications (2)

Publication Number Publication Date
JPH07128253A true JPH07128253A (en) 1995-05-19
JP3329539B2 JP3329539B2 (en) 2002-09-30

Family

ID=17828877

Family Applications (1)

Application Number Title Priority Date Filing Date
JP29608193A Expired - Lifetime JP3329539B2 (en) 1993-11-01 1993-11-01 Glide scratch detection optical system for aluminum disk

Country Status (1)

Country Link
JP (1) JP3329539B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011075426A (en) * 2009-09-30 2011-04-14 Hitachi High-Technologies Corp Apparatus and method for inspecting surface irregularity in resist film and dtm manufacturing line
CN105372256A (en) * 2014-08-20 2016-03-02 上海微电子装备有限公司 Surface detection system and method thereof
CN110595398A (en) * 2019-09-06 2019-12-20 广东兴发铝业(江西)有限公司 Aluminum profile finished product quality detection device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011075426A (en) * 2009-09-30 2011-04-14 Hitachi High-Technologies Corp Apparatus and method for inspecting surface irregularity in resist film and dtm manufacturing line
CN105372256A (en) * 2014-08-20 2016-03-02 上海微电子装备有限公司 Surface detection system and method thereof
CN110595398A (en) * 2019-09-06 2019-12-20 广东兴发铝业(江西)有限公司 Aluminum profile finished product quality detection device

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