JPH07120879A - Silver halide photographic sensitive material for laser exposure - Google Patents

Abstract

PURPOSE:To provide a silver halide photographic sensitive material for laser exposure of which the antistatic performance (static mark and sticking of films to each other) is improved and with which the nonuniform development is eliminated in rapid processing. CONSTITUTION:The silver halide emulsion layer is spectrally sensitized to >=600nm, the protective layer of the emulsion layer contains at least one kind of fluorine-contg. nonionic surfactant and an inorg. salt, and at least one kind of nonionic surfactant to decrease the surface resistivity of the layer at 23 deg.C and 20% RH to <=1X10<12>OMEGA/cm is incorporated to the backing layer and/or its protective layer to constitute the silver halide photographic sensitive material for laser exposure.

Description

Detailed Description of the Invention

[0001]

FIELD OF THE INVENTION The present invention improves antistatic performance,
The present invention also relates to a silver halide photographic light-sensitive material for laser exposure, which is free from uneven development during rapid processing.

[0002]

2. Description of the Related Art In the medical light-sensitive material market, rapid processing is strongly required for reasons such as emergency medical care and intraoperative diagnosis.
It is important to increase the drying speed after processing for rapid processing of a light-sensitive material. Therefore, generally, the amount of binder is reduced or the degree of film hardening is increased to reduce the amount of water absorption to reduce the drying load.

However, the reduction of the amount of the binder causes a failure such as a scratch-like pressure and the generation of roller marks in the rapid processing by the automatic developing machine, and the reduction of the amount is limited.

Further, while increasing the degree of film hardening improves the drying speed, it causes problems such as deterioration of developability and uneven development.

In recent years, in a recording system using a laser light source for a silver halide photographic light-sensitive material, image quality has been improved due to the spread of semiconductor lasers and the like, and a 633 nm light source typified by a conventional He-Ne laser is used. Recently, exposure with a semiconductor laser of 680 nm to 690 nm has been performed.

In the recording method using these laser light sources, since the transportation, exposure, and development of the photosensitive material are all automated, a photosensitive material having strong physical properties is required in order to prevent failures that occur during transportation. For example, it is required to have the ability to withstand contact with various rollers and devices or contact friction between the photosensitive materials in the process of manufacturing the photosensitive material, film loading, photographing, transportation, automatic development processing, and the like.

The light-sensitive material is generally composed of an electrically insulating support and a photographic emulsion layer. Therefore, during the manufacturing process of the light-sensitive material or during use, electrostatic charges are easily accumulated due to contact with the surface of the same kind or different kinds of substances, peeling friction, and the like. The photosensitive layer is exposed to light by the discharge, and after development processing, spot-like spots or dendritic or feather-like spots, so-called static marks are produced. This not only significantly impairs the commercial value of the light-sensitive material, but also involves the risk of misdiagnosis in medical films. In addition, the accumulated electrostatic charge also causes a secondary failure such as adhesion of dust to the photosensitive material.

Further, the phenomenon that the films after development process stick to each other due to static electricity occurs, which is very inconvenient in handling the films.

In addition to the above-mentioned contact friction, the chance of generating static marks is increasing more and more due to the recent high-speed conveyance of photosensitive materials, high-speed automatic processing and high sensitivity of photosensitive materials.

Many proposals have heretofore been made as antistatic methods for photosensitive materials. For example, use of various surfactants or polymers has been disclosed as a method for improving the conductivity of the surface of the photosensitive material. However, many of these substances adversely affect photographic performance. Further, there is a method of preventing the generation of static electricity due to friction or contact by reducing the power generation property of the surface of a photosensitive material, for example, Japanese Patent Laid-Open No. 51-3.
No. 2322 discloses an anionic fluorine-containing surfactant and the like. Photosensitive materials containing these anionic fluorine-containing surfactants are generally negatively charged with respect to various materials with which they come into contact, and the power generation property is adjusted by using a combination of coating agents having positive chargeability. To prevent electrostatic damage. However, if the materials are not uniform, the antistatic performance is often insufficient, and if used in large amounts, there is the drawback that the photographic performance is adversely affected.

On the other hand, the processing speed of recent films has entered the age of ultra-rapid large-volume processing, and in diagnostic equipment such as CT and MRI for medical use, dedicated processing directly connected to the photographing equipment is performed. It is desired to further improve the processing performance in the development with a low replenishment amount by the ultra-rapid processing of less than a second. As a silver halide photographic light-sensitive material, there has been a demand for a light-sensitive material having stable photographic performance, suitability for rapid processing by an automatic processor, and excellent antistatic performance.

[0012]

SUMMARY OF THE INVENTION It is, therefore, an object of the present invention to provide a silver halide photographic light-sensitive material for laser exposure, which has improved antistatic performance and eliminates uneven development during rapid processing.

[0013]

The above objects of the present invention are as follows.
The following has been achieved by the present invention. That is, in a silver halide photographic light-sensitive material having at least one silver halide emulsion layer and a protective layer on one side of a support and a backing layer and a protective layer on the other side, the silver halide is The emulsion layer is spectrally sensitized to 600 nm or more, and the protective layer of the silver halide emulsion layer contains at least one fluorine-containing nonionic surfactant and an inorganic salt, and the backing layer and / or In the protective layer, the surface resistivity of the layer is
A silver halide photographic light-sensitive material for laser exposure characterized by containing at least one nonionic surfactant in an amount of 1 × 10 ¹² Ω / cm or less in an environment of 23 ° C. and RH of 20%. It was

The present invention will be described in detail below.

At least one fluorine-containing nonionic surfactant is used in the protective layer on the photosensitive silver halide emulsion layer of the silver halide photographic light-sensitive material for a laser light source according to the present invention.

The fluorine-containing nonionic surfactant preferably used in the present invention has a fluoroalkyl group, an alkenyl group or an aryl group having 4 or more carbon atoms, and the nonionic group is a substituted or unsubstituted polyoxyethylene group, The compound which has a polyglyceryl group or a sorbitan residue is mentioned.

Particularly preferred is a C 6-14 perfluoroalkyl group, an alkenyl group or an aryl group,
Examples of the nonionic group include a fluorine-containing nonionic surfactant having a substituted or specific substituted polyoxyethylene group (5 to 50 is preferable as the oxyethylene group). Hereinafter, examples of preferable specific compounds will be given.

[0018]

[Chemical 1]

[0019]

[Chemical 2]

In addition to the above, the fluorine-containing nonionic surfactant used in the present invention includes, for example, JP-A-49-10722, British Patent 1,330,356, JP-A-53-84712, and JP-A-54-14224.
Those described in No. 50-113221 can be used.

The above-mentioned fluorine-containing nonionic surfactant according to the present invention is preferably added to the outermost surface layer on the light-sensitive emulsion layer of the light-sensitive material of the present invention, specifically, a protective layer or a protective layer. It is used for a hydrophilic colloid layer according to the layer. The amount of the above-mentioned fluorine-containing nonionic surfactant according to the present invention to be used may be 0.0001 g to 5 g, and more preferably 0.001 g to 0.6 g per 1 m ² of the light-sensitive material. The fluorine-containing nonionic surfactant in the present invention may be used in combination with other known surfactants. At the time of addition, it is dissolved in water or a hydrophilic solvent and added to the coating solution for protective layer to be coated on the emulsion layer.

Next, the inorganic salt added to the outermost surface layer on the photosensitive emulsion layer of the light-sensitive material of the present invention will be described in the same manner as the above-mentioned fluorine-containing nonionic surfactant.

Examples of the inorganic salt used in the present invention include alkali metal, alkaline earth metal, ammonium halide, sulfuric acid compound, nitric acid compound, phosphoric acid compound and thiocyanic acid compound. Particularly preferred are alkali metal halides, sulfuric acid compounds and nitric acid compounds.

Specific examples of compounds are shown below.

G-1: sodium chloride G-2: sodium bromide G-3: potassium bromide G-4: potassium chloride G-5: calcium chloride G-6: potassium nitrate G-7: potassium sulfate G-8: Ammonium chloride G-9: Sodium phosphate G-10: Potassium phosphate G-11: Sodium nitrate G-12: Potassium thiocyanate G-13: Sodium sulfate G-14: Ammonium bromide , 0.005g per 1m ^{2 of} photosensitive material
˜0.5 g, preferably 0.01 g to 0.2 g. At the time of addition, it may be dissolved in water or a hydrophilic solvent, and may be added separately or in combination with the above-mentioned fluorine-containing nonionic surfactant.

Next, the nonionic surfactant added to the backing layer and / or its protective layer of the silver halide photographic light-sensitive material according to the present invention will be described.

Examples of the nonionic surfactant used in the present invention include those represented by the following general formulas [1], [2] and [3].

General formula [1] RL- (CH ₂ CH ₂ O) _m -H In the formula, R represents a substituted or unsubstituted alkyl group, alkenyl group or aryl group, and L represents an oxygen atom or a sulfur atom. , -N
Represents a (R ')-group, -C (= O) -N (R')-group or -C (= O) -O- group,
R'is a hydrogen atom-substituted or unsubstituted alkyl group or-(CH ₂ C
Represents H ₂ O) _m -H, _m is an integer of 2 to 50.

[0029]

[Chemical 3]

In the formula, R ₁ and R ₂ represent a hydrogen atom, a halogen atom, an alkoxycarbonyl group, a substituted or unsubstituted alkyl group, an alkoxy group or a phenyl group, and R ₃ represents a hydrogen atom, a methyl group or α-. Represents a furyl group, n and m
Represents an integer of 2 to 5.

[0031]

[Chemical 4]

In the formula, R ₁ and R ₃ each represent a substituted or unsubstituted alkyl group, alkoxy group, halogen atom, acyl group, amide group, sulfonamide group, carbamoyl group or sulfamoyl group.

In the general formula [3], the substituent on the phenyl ring may be left-right asymmetric. R ₅ and R ₆ represent a hydrogen atom, a substituted or unsubstituted alkyl group or aryl group, and R ₅ and R ₆ , R ₁
And R ₂ and R ₃ and R ₄ may be bonded to each other to form a substituted or unsubstituted ring. n ₁ and n ₂ are average polymerization degrees of ethylene oxide and are integers of 2 to 50.

Specific examples of compounds of the above nonionic surfactants used in the present invention are shown below, but the present invention is not limited to these compounds.

[0035]

[Chemical 5]

[0036]

[Chemical 6]

[0037]

[Chemical 7]

The above nonionic surfactant according to the present invention is disclosed in JP-A-1-14744 by the same applicant as the present invention.
[II]-(1)-[1], which are the same compounds as those described in No. 9 and are specific compound examples described on pages 25 to 40 of the same specification including the above. II]-(2
2), III- (1) to III- (20), IV- (1) to IV-
(12) can be preferably used.

The above-mentioned nonionic surfactant is contained in the backing layer of the silver halide photographic light-sensitive material of the present invention and / or its protective layer when the surface resistivity of the layer is 23 ° C. and RH.
The amount used to reduce it to 1 × 10 ¹² Ω / cm or less under a 20% environment is used.

The nonionic surfactants may be used alone or in combination, and are dissolved in water or a hydrophilic solvent and added to the backing layer and / or the protective layer thereof.

The addition amount is not uniform depending on the conditions, but usually 0.005 g to 1 per 1 m ^{2 of} silver halide photographic light-sensitive material.
g, preferably 0.005 g to 0.5 g.

A laser light source is used for exposure of the silver halide photographic light-sensitive material according to the present invention. Examples of lasers include those having spectral sensitization at 633 nm for He-Ne lasers and those having spectral sensitization at 680 to 690 nm for semiconductor lasers. The silver halide photographic light-sensitive material of the present invention has the following general formulas (I) and (I
It is spectrally sensitized to 600 nm or more by at least one selected from the group of compounds represented by I).

[0043]

[Chemical 8]

In the formula (I), R ₁ and R ₅ may be the same or different and each represents a hydrogen atom, an alkyl group, an alkoxy group, a halogen atom or a carboxy group.

R ₂ and R ₄ may be the same or different and each represents an alkyl group, and R ₃ represents an alkyl group. X ₁ and X ₂ may be the same or different and each represents a sulfur atom or a selenium atom. Y ₁ ⁻ represents a counter ion, m represents 0 or 1, and m is 0 when an intramolecular salt is formed.

In the formula (II), R ₆ , R ₇ , R ₁₁ and R ₁₂ may be the same or different and each represents a hydrogen atom, an alkyl group, an alkoxy group, a halogen atom, a hydroxy group or a carboxy group. Represent R ₈ and R _{10, which} may be the same or different, each represents an alkyl group or an aralkyl group, and R 8
₉ represents an alkyl group. X ₃ and X ₄ may be the same or different and each represents a sulfur atom or a selenium atom. Y ₂ ⁻ represents a counter ion, m represents 0 or 1, and m is 0 when an intramolecular salt is formed.

Specific examples of the spectral sensitizing dyes represented by the general formulas (I) and (II) are shown below.

[0048]

[Chemical 9]

[0049]

[Chemical 10]

[0050]

[Chemical 11]

[0051]

[Chemical 12]

[0052]

[Chemical 13]

The spectral sensitizing dyes that can be used in the present invention include dyes within the range represented by the general formulas (I) and (II), including the above, for example, by the same applicant as the present invention. I-1 to II-29 described on pages 9 to 16 of Japanese Patent Application No. 5-72219 can be used.

These spectral sensitizing dyes used in the present invention are, for example, FM Hamer, “Heterocyclic Compounds The Cyan
ine Dyes and Related Compound "John wiley & Sons
(New York, London 1964) for easy synthesis.

The amount of the spectral sensitizing dye used in the present invention is not uniform depending on the kind of silver halide and the amount of silver, but is usually 0.005 g in total per mol of silver halide.
˜1.0 g, preferably 0.01 g to 0.6 g.

The silver halide emulsion of the silver halide photographic light-sensitive material for laser exposure of the present invention is silver bromide, silver iodobromide, or silver iodochlorobromide emulsion milk containing a small amount of silver chloride. Good. The halogenated grain may be of any crystal type as long as it has the constitution of the present invention, for example, a single crystal such as a cube, an octahedron or a tetrahedron, and may have various shapes. It may be twin crystal grains.

The emulsion used in the silver halide photographic light-sensitive material of the present invention can be produced by a known method. For example, Research Disclosure (RD) No.17643 (December 1978), 22
Can be prepared by the method described in "Emulsion Preparation and Types" on page 23 or the method described in (RD) No. 18716 (November 1979), page 648.

The emulsion used in the silver halide photographic light-sensitive material of the present invention is, for example, "The Theory of the" by TH James.
Photographic process ”4th edition, published by Macmillan (1977
Year) Method described on pages 38-104, GF Duffin, “Photograph
ic Emulsion Chemistry ”, published by Focal Press (1966),
“Chimie et Physique Photographique” by P. Glafkides
Published by Paul Montel (1967) or VL Zelikman et al. “Makin
g And Coating Photographic Emulsion "can be prepared by the method described in Focal Press (1964).

That is, the mixing conditions such as the forward mixing method, the reverse mixing method, the double jet method and the control double jet method under the solution conditions such as the acidic method, the ammonia method and the neutral method,
It can be produced using a particle preparation condition such as a conversion method, a core / shell method, or a combination thereof.

A preferred embodiment of the emulsion used in the silver halide photographic light-sensitive material of the present invention is a monodisperse emulsion in which silver iodide is localized inside the grains. The monodisperse referred to here, when measuring the average particle diameter by a conventional method,
At least 95% by number or weight of grains are silver halide grains having an average grain size within ± 40%, preferably within ± 30%.

The grain size distribution of silver halide may be either a monodisperse emulsion having a narrow distribution or a polydisperse emulsion having a wide distribution. The crystal structure of silver halide may be composed of different silver halide compositions inside and outside,
For example, a core / shell type monodisperse emulsion having a clear two-layer structure in which a high silver iodide core portion is covered with a low silver iodide shell layer may be used.

The method for producing the above monodisperse emulsion is known, and for example,
J. Phot. Sci, 12.242 to 251, (1963), JP-A-48-36890,
52-16364, 55-142329, 58-49938, British Patent 1,413,748, US Patents 3,574,628, 3,655,394 and the like.

For the emulsion used in the silver halide photographic light-sensitive material of the present invention, a seed crystal is used as a method for obtaining the above monodisperse emulsion, and silver ions and halide ions are supplied with this seed crystal as a growth nucleus. A grown emulsion may be used.

A method for producing the above-mentioned core / shell type emulsion is known, for example, J. Phot. Sci, 24.198. (1976), US Pat.
The methods described in 250, 3,505,068, 4,210,450, 4,444,877 or JP-A-60-143331 can be referred to.

The emulsion used in the silver halide photographic light-sensitive material of the present invention has an aspect ratio (ratio of grain size / grain thickness).
It may be 3 or more tabular grains. As an advantage of such tabular grains, it is disclosed in, for example, British Patent No. 2,112,157, U.S. Patents 4,414,310, 4,434,226 etc. as improvement in spectral sensitization efficiency and improvement in image graininess and sharpness can be obtained. The emulsion can be prepared by the methods described in these publications.

The above-mentioned emulsion may be either a surface latent image type which forms a latent image on the grain surface, an internal latent image type which forms a latent image inside the grain, or a type which forms a latent image on both the surface and the inside. It may be an emulsion.

These emulsions are used at the stage of physical ripening or grain preparation by using, for example, cadmium salt, lead salt, zinc salt, thallium salt, iridium salt or its complex salt, rhodium salt or its complex salt, iron salt or its complex salt and the like. May be.

The emulsion may be subjected to a Nudel water washing method, a flocculation sedimentation method or the like in order to remove soluble salts, and a preferable water washing method is, for example, an aromatic hydrocarbon containing a sulfo group described in JP-B-35-16086. Examples thereof include a method using a system aldehyde resin, and a desalting method using a polymer flocculant such as Exemplified G-3 and G-8 described in JP-A-63-158644.

The emulsion used in the silver halide photographic light-sensitive material of the present invention can use various photographic additives in the steps before and after physical ripening or chemical ripening. Examples of the compound used in such a step include (RD) No. 1 described above.
Various compounds described in 7643, (RD) No. 18716 and (RD) No. 308119 (December 1989) can be used. The types and locations of the compounds described in these three (RD) Research Disclosures are listed below.

Additive RD-17643 RD-18716 RD-308119 Page Classification Page Page Classification Chemical sensitizer 23 III 648 Upper right 996 III Sensitizing dye 23 IV 648-649 996-8 IV A Desensitizing dye 23 IV 998 IV B Dye 25-26 VIII 649-650 1003 VIII Development accelerator 29 XXI 648 Upper right fog inhibitor / stabilizer 24 IV 649 Upper right 1006-7 VI Whitening agent 24 V 998 V Hardener 26 X 651 Left 1004-5 X Interface Activator 26-27 XI 650 Right 1005-6 XI Plasticizer 27 XII 650 Right 1006 XII Sliding Agent 27 XII Matting Agent 28 XVI 650 Right 1008-9 XVI Binder 26 XXII 1003-4 IX Support 28 XVII 1009 XVII Examples of the support used for the silver halide photographic light-sensitive material include those described in the above RD,
A suitable support is a polyethylene terephthalate film or the like, and the surface of the support may be provided with an undercoat layer to improve the adhesiveness of the coating layer, or may be subjected to corona discharge or ultraviolet irradiation.

Photographic processing of the light-sensitive material of the present invention can be carried out, for example, by RD-17643, XX to XXI, pages 29 to 30 or 308119, XX to XX.
I, pp. 1011-1012, treatment with a treatment solution may be performed. This process may be either a black and white photographic process for forming a silver image or a color photographic process for forming a dye image. The treatment temperature is usually in the range of 18 ° C to 50 ° C.

Developers for black and white photographic processing include dihydroxybenzenes (eg hydroquinone), 3-pyrazolidones (eg 1-phenyl-3-pyrazolidone), aminophenols (eg N-methyl-P-aminophenol). Etc. can be used alone or in combination. For the developer, known agents such as preservatives, alkali agents, pH buffers, antifoggants, hardeners, development accelerators, surfactants,
A defoaming agent, a toning agent, a water softening agent, a dissolution aid, a viscosity imparting agent and the like may be used as necessary.

A fixing agent such as thiosulfate or thiocyanate is used in the fixing solution, and a water-soluble aluminum salt such as aluminum sulfate or potassium alum may be contained as a hardening agent. In addition, it may contain a preservative, a pH adjuster, a water softener and the like.

[0074]

EXAMPLES The present invention will be described below with reference to examples, but the embodiments of the present invention are not limited thereto.

Example 1 Using a silver iodobromide (silver iodide content 2 mol%) seed emulsion having an average grain size of 0.1 μm, an aqueous ammoniacal silver nitrate solution and an aqueous potassium bromide solution were added by the double jet method, and the average Particle size 0.25μ
A cubic monodisperse emulsion of silver iodobromide (average silver iodide content: 0.1 mol%) of m was grown. The coefficient of variation (σ / r) was 0.17.

The above emulsion was dissolved immediately before chemical ripening, and when the temperature became constant, 90 mg of Illustrative dye II-9 was added per mol of silver halide, and ammonium thiocyanate was added.
Chloroauric acid and sodium thiosulfate were added for chemical sensitization, and then 4-hydroxy-6-methyl-1,3,3a, 7-tetrazaindene (1.5 g / Aglmol) was added.

Further, this emulsion was mixed with an unchemically ripened emulsion prepared as follows in the ratio shown in Table 1.

(Preparation of unchemically ripened emulsion) Average particle size 0.3 μm
Silver iodobromide (silver iodide content 2 mol%) seed emulsion of
A monodisperse emulsion having an average grain size of 1.10 μm and a silver iodide content of 3 mol% was grown by the ammonia method. The coefficient of variation was 0.17.

The following additives were added to the emulsion coating solution per mol of silver halide.

Nitrophenyl-triphenylphosphonium chloride 30 mg 1,3-dihydroxybenzene-4-sulphonic acid ammonium 1 g 2-mercaptobenzimidazole-5-sodium sulfonate 10 mg 2-mercaptobenzothiazole 10 mg trimethylolpropane 9 g 1,1- Dimethylol-1-bromo-1-nitromethane 10mg C ₄ H ₉ OCH ₂ CH (OH) CH ₂ N (CH ₂ COOH) ₂ 1g

[0081]

[Chemical 14]

(Emulsion side protective layer liquid) It has the following composition. The added amount is shown as an amount per 1 liter of the coating liquid.

Lime-treated inert gelatin 68 g Acid-treated gelatin 2 g Sulfo-succinic acid (i-amyl decyl) ester sodium salt 1 g Polymethyl methacrylate 4 μm particles Silicon dioxide particles (matting agent having an area average particle size of 1.2 μm) 0.5 g Ludox AM ( DuPont colloidal silica) 30g 2-4-dichloro-6-hydroxy-1,3,5-triazine sodium salt 2% aqueous solution (hardener) 10cc

[0084]

[Chemical 15]

35% formalin (hardening agent) 2 cc 40% aqueous solution of glyoxal (hardening agent) 1.5 cc Further, the compound according to the present invention was added to this emulsion side protective layer solution as shown in Table 1.

As a backing layer, 400 g of gelatin, 2 g of polymethylmethacrylate having an average particle size of 6 μm, 24 g of potassium nitrate, 6 sodium dodecylbenzenesulfonate.
g, the following antihalation dye-1 20 g of a dye emulsion dispersion corresponding to 2 g / m ² and a backing layer liquid containing glyoxal are prepared, and glycidyl methacrylate is prepared.
-Methyl acrylate-butyl methacrylate copolymer (50:10:40 weight ratio) was diluted to a concentration of 10 wt% and the resulting aqueous copolymer dispersion was applied as a subbing liquid. Polyethylene terephthalate. On one side of the base,
A backed support obtained by coating with a protective layer liquid comprising gelatin, a matting agent, glyoxal and the compounds shown in Table 1 was prepared.

The coating amount for both the backing layer and the protective layer is 2.0 g / m ² as the gelatin coating amount.

[0088]

[Chemical 16]

A sample was obtained by simultaneously coating the emulsion coating solution and the protective layer on the backed base with a slide hopper in two layers. Coating amount 3.0 g / m ² of silver amount conversion, gelatin weight emulsion layer 2.4 g / m ^2, the protective layer was 1.2 g / m ^2.

The addition amount of the compound according to the present invention used in the emulsion layer and the backing layer and the value of the surface resistivity of the backing layer are shown in Table 1 below.

[0091]

[Table 1]

The performance of each of the samples thus obtained was evaluated. The formalization method is as follows.

Evaluation Method <Charging Properties> The prepared sample was conditioned in a dark room at 23 ° C. and 25% RH for 2 hours, and then the roller made of neoprene rubber and the roller made of epoxy resin were each exposed 10 times. ,
After violent passage, development was carried out, and the state of generation of static marks was visually evaluated in the following 5 grades.

For development, an automatic processor FPM-9000 was used,
The developing solution was RD-7, and the fixing solution was Fuji F (both manufactured by Fuji Film Co., Ltd.) for 45 seconds with Dry to Dry.

1: Innumerable static marks were generated 3: Generation of static marks was recognized, but the limit level allowed in the market 5: No static marks were generated <Charging property after development> Sample Cut into half size,
Under the conditions of 23 ° C and 20% RH, using an automatic processor FPM-9000, the developing solution is RD-7 and the fixing solution is Fuji-F (both manufactured by FUJIFILM Corporation) and processed in Dry to Dry for 45 seconds. Was repeated 20 times. At this time, the degree of sticking of the treated films to each other was evaluated according to the following 5 grades.

1: The films stick to each other exactly,
Level where handling is very inconvenient 3: Films stick to each other to some extent, but the lower limit level allowed in the market 5: Films do not stick at all.

<Development unevenness> The sample was cut into half-size pieces,
After uniform exposure with a light amount to give a density of 1.2, it was processed for 45 seconds in the same manner as above. The development unevenness generated at this time was visually evaluated in the following 5 grades.

1: Level where development unevenness is severely generated and cannot be used. 3: Level where development unevenness is generated but is a minimum level that is acceptable in the market. 5: Level where development unevenness does not occur at all. Results obtained Is shown in Table 1 below.

[0099]

[Table 2]

As is clear from the table, the sample according to the present invention can suppress the generation of static marks even on a roller made of neoprene rubber or epoxy resin, and has a sticking property between the films after the treatment based on static electricity. Has been improved less. Further, the occurrence of uneven development was small in the rapid processing.

Example 2 The spectral sensitizing dyes used in Example 1 are exemplified as I-1.
A sample was prepared in the same manner as in Example 1 except that II-14 was used.

The addition amount of the spectral sensitizing dye is exemplified as Example I-1.
II-14 was added to 90 mg and 45 mg per mol of silver halide, respectively.
mg was added. As a result of testing the obtained sample, as in Example 1, the sample according to the present invention showed less static marks, uneven development, and the degree of sticking between films, which was an improvement over the comparative sample.

[0103]

According to the present invention, a silver halide photographic light-sensitive material for laser exposure can be obtained in which stickiness between static marks and films is prevented and uneven development during rapid processing is eliminated.

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Claims (1)

[Claims] 1. A silver halide photographic light-sensitive material having at least one silver halide emulsion layer and a protective layer on one side of a support and a backing layer and a protective layer on the other side. The silver halide emulsion layer is spectrally sensitized to 600 nm or more, and the protective layer of the silver halide emulsion layer contains at least one fluorine-containing nonionic surfactant and an inorganic salt, and the backing layer And / or its protective layer contains at least one nonionic surfactant in an amount such that the surface resistivity of the layer is reduced to 1 × 10 ¹² Ω / cm or less in an environment of a temperature of 23 ° C. and RH of 20%. A silver halide photographic light-sensitive material for laser exposure, which is characterized in that