JPH02256048A - Antistatic silver halide photographic sensitive material - Google Patents
Antistatic silver halide photographic sensitive materialInfo
- Publication number
- JPH02256048A JPH02256048A JP11585889A JP11585889A JPH02256048A JP H02256048 A JPH02256048 A JP H02256048A JP 11585889 A JP11585889 A JP 11585889A JP 11585889 A JP11585889 A JP 11585889A JP H02256048 A JPH02256048 A JP H02256048A
- Authority
- JP
- Japan
- Prior art keywords
- group
- photographic
- layer
- coating
- silver halide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 title claims abstract description 53
- -1 silver halide Chemical class 0.000 title claims description 41
- 229910052709 silver Inorganic materials 0.000 title claims description 26
- 239000004332 silver Substances 0.000 title claims description 26
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 17
- 125000003342 alkenyl group Chemical group 0.000 claims abstract description 12
- 125000003710 aryl alkyl group Chemical group 0.000 claims abstract description 9
- 125000002947 alkylene group Chemical group 0.000 claims abstract description 7
- 229910052783 alkali metal Inorganic materials 0.000 claims abstract description 3
- 150000001340 alkali metals Chemical group 0.000 claims abstract description 3
- 150000001875 compounds Chemical group 0.000 claims description 18
- 125000004432 carbon atom Chemical group C* 0.000 claims description 12
- 239000000084 colloidal system Substances 0.000 claims description 8
- 239000000126 substance Substances 0.000 claims description 7
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 6
- 125000002877 alkyl aryl group Chemical group 0.000 claims description 3
- 125000005156 substituted alkylene group Chemical group 0.000 claims description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-O ammonium group Chemical group [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims 1
- 239000011248 coating agent Substances 0.000 abstract description 33
- 238000000576 coating method Methods 0.000 abstract description 33
- 230000002411 adverse Effects 0.000 abstract description 6
- 229910052708 sodium Inorganic materials 0.000 abstract description 4
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 abstract description 2
- 229910052700 potassium Inorganic materials 0.000 abstract description 2
- 229910003202 NH4 Inorganic materials 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 47
- 239000000839 emulsion Substances 0.000 description 30
- 108010010803 Gelatin Proteins 0.000 description 16
- 229920000159 gelatin Polymers 0.000 description 16
- 239000008273 gelatin Substances 0.000 description 16
- 235000019322 gelatine Nutrition 0.000 description 16
- 235000011852 gelatine desserts Nutrition 0.000 description 16
- 238000000034 method Methods 0.000 description 13
- ZUNKMNLKJXRCDM-UHFFFAOYSA-N silver bromoiodide Chemical compound [Ag].IBr ZUNKMNLKJXRCDM-UHFFFAOYSA-N 0.000 description 10
- 239000000243 solution Substances 0.000 description 10
- 230000003068 static effect Effects 0.000 description 10
- 239000000203 mixture Substances 0.000 description 9
- 238000012545 processing Methods 0.000 description 9
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 7
- 239000011241 protective layer Substances 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- GJYCVCVHRSWLNY-UHFFFAOYSA-N 2-butylphenol Chemical compound CCCCC1=CC=CC=C1O GJYCVCVHRSWLNY-UHFFFAOYSA-N 0.000 description 6
- 239000012190 activator Substances 0.000 description 6
- DOIRQSBPFJWKBE-UHFFFAOYSA-N dibutyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 230000035945 sensitivity Effects 0.000 description 6
- JKFYKCYQEWQPTM-UHFFFAOYSA-N 2-azaniumyl-2-(4-fluorophenyl)acetate Chemical compound OC(=O)C(N)C1=CC=C(F)C=C1 JKFYKCYQEWQPTM-UHFFFAOYSA-N 0.000 description 5
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 5
- 229910021612 Silver iodide Inorganic materials 0.000 description 5
- 238000011161 development Methods 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- 229940045105 silver iodide Drugs 0.000 description 5
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 4
- 239000000654 additive Substances 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 229910052740 iodine Inorganic materials 0.000 description 4
- 239000011630 iodine Substances 0.000 description 4
- 239000004094 surface-active agent Substances 0.000 description 4
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 3
- 206010070834 Sensitisation Diseases 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 239000002216 antistatic agent Substances 0.000 description 3
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 3
- 229910052794 bromium Inorganic materials 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 239000000975 dye Substances 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 230000008313 sensitization Effects 0.000 description 3
- 239000011734 sodium Substances 0.000 description 3
- 239000003381 stabilizer Substances 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 2
- JASONGFGOLHLGB-UHFFFAOYSA-N Atranol Chemical compound CC1=CC(O)=C(C=O)C(O)=C1 JASONGFGOLHLGB-UHFFFAOYSA-N 0.000 description 2
- 229920002284 Cellulose triacetate Polymers 0.000 description 2
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- 239000004677 Nylon Substances 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 2
- 238000004378 air conditioning Methods 0.000 description 2
- 239000002519 antifouling agent Substances 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- 239000007844 bleaching agent Substances 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 230000001143 conditioned effect Effects 0.000 description 2
- 125000003493 decenyl group Chemical group [H]C([*])=C([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000005066 dodecenyl group Chemical group C(=CCCCCCCCCCC)* 0.000 description 2
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 229920001971 elastomer Polymers 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- LEQAOMBKQFMDFZ-UHFFFAOYSA-N glyoxal Chemical compound O=CC=O LEQAOMBKQFMDFZ-UHFFFAOYSA-N 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 230000001788 irregular Effects 0.000 description 2
- 125000002960 margaryl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 239000006224 matting agent Substances 0.000 description 2
- 125000001421 myristyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000005187 nonenyl group Chemical group C(=CCCCCCCC)* 0.000 description 2
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 229920001778 nylon Polymers 0.000 description 2
- 125000005064 octadecenyl group Chemical group C(=CCCCCCCCCCCCCCCCC)* 0.000 description 2
- 125000004365 octenyl group Chemical group C(=CCCCCCC)* 0.000 description 2
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000002958 pentadecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 230000000865 phosphorylative effect Effects 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 description 2
- 239000001397 quillaja saponaria molina bark Substances 0.000 description 2
- 230000002940 repellent Effects 0.000 description 2
- 239000005871 repellent Substances 0.000 description 2
- 230000001846 repelling effect Effects 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 229930182490 saponin Natural products 0.000 description 2
- 150000007949 saponins Chemical class 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 2
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- UBXAKNTVXQMEAG-UHFFFAOYSA-L strontium sulfate Chemical compound [Sr+2].[O-]S([O-])(=O)=O UBXAKNTVXQMEAG-UHFFFAOYSA-L 0.000 description 2
- 125000005504 styryl group Chemical group 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- 125000005063 tetradecenyl group Chemical group C(=CCCCCCCCCCCCC)* 0.000 description 2
- DLYUQMMRRRQYAE-UHFFFAOYSA-N tetraphosphorus decaoxide Chemical compound O1P(O2)(=O)OP3(=O)OP1(=O)OP2(=O)O3 DLYUQMMRRRQYAE-UHFFFAOYSA-N 0.000 description 2
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 125000005040 tridecenyl group Chemical group C(=CCCCCCCCCCCC)* 0.000 description 2
- 125000002889 tridecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000005065 undecenyl group Chemical group C(=CCCCCCCCCC)* 0.000 description 2
- 125000002948 undecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- GVEYRUKUJCHJSR-UHFFFAOYSA-N (4-azaniumyl-3-methylphenyl)-ethyl-(2-hydroxyethyl)azanium;sulfate Chemical compound OS(O)(=O)=O.OCCN(CC)C1=CC=C(N)C(C)=C1 GVEYRUKUJCHJSR-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- JKTAIYGNOFSMCE-UHFFFAOYSA-N 2,3-di(nonyl)phenol Chemical compound CCCCCCCCCC1=CC=CC(O)=C1CCCCCCCCC JKTAIYGNOFSMCE-UHFFFAOYSA-N 0.000 description 1
- NSENZNPLAVRFMJ-UHFFFAOYSA-N 2,3-dibutylphenol Chemical compound CCCCC1=CC=CC(O)=C1CCCC NSENZNPLAVRFMJ-UHFFFAOYSA-N 0.000 description 1
- AXCGIKGRPLMUDF-UHFFFAOYSA-N 2,6-dichloro-1h-1,3,5-triazin-4-one;sodium Chemical compound [Na].OC1=NC(Cl)=NC(Cl)=N1 AXCGIKGRPLMUDF-UHFFFAOYSA-N 0.000 description 1
- STMDPCBYJCIZOD-UHFFFAOYSA-N 2-(2,4-dinitroanilino)-4-methylpentanoic acid Chemical compound CC(C)CC(C(O)=O)NC1=CC=C([N+]([O-])=O)C=C1[N+]([O-])=O STMDPCBYJCIZOD-UHFFFAOYSA-N 0.000 description 1
- CJWNFAKWHDOUKL-UHFFFAOYSA-N 2-(2-phenylpropan-2-yl)phenol Chemical compound C=1C=CC=C(O)C=1C(C)(C)C1=CC=CC=C1 CJWNFAKWHDOUKL-UHFFFAOYSA-N 0.000 description 1
- CDMGNVWZXRKJNS-UHFFFAOYSA-N 2-benzylphenol Chemical compound OC1=CC=CC=C1CC1=CC=CC=C1 CDMGNVWZXRKJNS-UHFFFAOYSA-N 0.000 description 1
- PYSRRFNXTXNWCD-UHFFFAOYSA-N 3-(2-phenylethenyl)furan-2,5-dione Chemical compound O=C1OC(=O)C(C=CC=2C=CC=CC=2)=C1 PYSRRFNXTXNWCD-UHFFFAOYSA-N 0.000 description 1
- JIGUICYYOYEXFS-UHFFFAOYSA-N 3-tert-butylbenzene-1,2-diol Chemical compound CC(C)(C)C1=CC=CC(O)=C1O JIGUICYYOYEXFS-UHFFFAOYSA-N 0.000 description 1
- ZNBNBTIDJSKEAM-UHFFFAOYSA-N 4-[7-hydroxy-2-[5-[5-[6-hydroxy-6-(hydroxymethyl)-3,5-dimethyloxan-2-yl]-3-methyloxolan-2-yl]-5-methyloxolan-2-yl]-2,8-dimethyl-1,10-dioxaspiro[4.5]decan-9-yl]-2-methyl-3-propanoyloxypentanoic acid Chemical compound C1C(O)C(C)C(C(C)C(OC(=O)CC)C(C)C(O)=O)OC11OC(C)(C2OC(C)(CC2)C2C(CC(O2)C2C(CC(C)C(O)(CO)O2)C)C)CC1 ZNBNBTIDJSKEAM-UHFFFAOYSA-N 0.000 description 1
- CYYZDBDROVLTJU-UHFFFAOYSA-N 4-n-Butylphenol Chemical compound CCCCC1=CC=C(O)C=C1 CYYZDBDROVLTJU-UHFFFAOYSA-N 0.000 description 1
- OSDWBNJEKMUWAV-UHFFFAOYSA-N Allyl chloride Chemical compound ClCC=C OSDWBNJEKMUWAV-UHFFFAOYSA-N 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- QXNVGIXVLWOKEQ-UHFFFAOYSA-N Disodium Chemical compound [Na][Na] QXNVGIXVLWOKEQ-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 241000254158 Lampyridae Species 0.000 description 1
- AFCARXCZXQIEQB-UHFFFAOYSA-N N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CCNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 AFCARXCZXQIEQB-UHFFFAOYSA-N 0.000 description 1
- IGFHQQFPSIBGKE-UHFFFAOYSA-N Nonylphenol Natural products CCCCCCCCCC1=CC=C(O)C=C1 IGFHQQFPSIBGKE-UHFFFAOYSA-N 0.000 description 1
- SJUCACGNNJFHLB-UHFFFAOYSA-N O=C1N[ClH](=O)NC2=C1NC(=O)N2 Chemical class O=C1N[ClH](=O)NC2=C1NC(=O)N2 SJUCACGNNJFHLB-UHFFFAOYSA-N 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- GNPHADHWEUDSJZ-UHFFFAOYSA-M S(=O)([O-])[O-].[Na+].S(=S)(=O)(O)O.[NH4+] Chemical compound S(=O)([O-])[O-].[Na+].S(=S)(=O)(O)O.[NH4+] GNPHADHWEUDSJZ-UHFFFAOYSA-M 0.000 description 1
- 229910021607 Silver chloride Inorganic materials 0.000 description 1
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 description 1
- DWAQJAXMDSEUJJ-UHFFFAOYSA-M Sodium bisulfite Chemical compound [Na+].OS([O-])=O DWAQJAXMDSEUJJ-UHFFFAOYSA-M 0.000 description 1
- 229920000147 Styrene maleic anhydride Polymers 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- YSMRWXYRXBRSND-UHFFFAOYSA-N TOTP Chemical compound CC1=CC=CC=C1OP(=O)(OC=1C(=CC=CC=1)C)OC1=CC=CC=C1C YSMRWXYRXBRSND-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- SJOOOZPMQAWAOP-UHFFFAOYSA-N [Ag].BrCl Chemical compound [Ag].BrCl SJOOOZPMQAWAOP-UHFFFAOYSA-N 0.000 description 1
- XCFIVNQHHFZRNR-UHFFFAOYSA-N [Ag].Cl[IH]Br Chemical compound [Ag].Cl[IH]Br XCFIVNQHHFZRNR-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 229960000583 acetic acid Drugs 0.000 description 1
- 239000013543 active substance Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 1
- SWLVFNYSXGMGBS-UHFFFAOYSA-N ammonium bromide Chemical compound [NH4+].[Br-] SWLVFNYSXGMGBS-UHFFFAOYSA-N 0.000 description 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 125000001204 arachidyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002648 azanetriyl group Chemical group *N(*)* 0.000 description 1
- 125000000751 azo group Chemical group [*]N=N[*] 0.000 description 1
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Chemical compound [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 description 1
- 229910001864 baryta Inorganic materials 0.000 description 1
- CJPQIRJHIZUAQP-MRXNPFEDSA-N benalaxyl-M Chemical compound CC=1C=CC=C(C)C=1N([C@H](C)C(=O)OC)C(=O)CC1=CC=CC=C1 CJPQIRJHIZUAQP-MRXNPFEDSA-N 0.000 description 1
- KXDAEFPNCMNJSK-UHFFFAOYSA-N benzene carboxamide Natural products NC(=O)C1=CC=CC=C1 KXDAEFPNCMNJSK-UHFFFAOYSA-N 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 238000004061 bleaching Methods 0.000 description 1
- 125000004369 butenyl group Chemical group C(=CCC)* 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 239000013256 coordination polymer Substances 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000000586 desensitisation Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 239000003995 emulsifying agent Substances 0.000 description 1
- 230000032050 esterification Effects 0.000 description 1
- 238000005886 esterification reaction Methods 0.000 description 1
- 125000003754 ethoxycarbonyl group Chemical group C(=O)(OCC)* 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000005187 foaming Methods 0.000 description 1
- 239000012362 glacial acetic acid Substances 0.000 description 1
- 229940015043 glyoxal Drugs 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000006038 hexenyl group Chemical group 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910000378 hydroxylammonium sulfate Inorganic materials 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 210000003127 knee Anatomy 0.000 description 1
- 239000004816 latex Substances 0.000 description 1
- 229920000126 latex Polymers 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- DZVCFNFOPIZQKX-LTHRDKTGSA-M merocyanine Chemical compound [Na+].O=C1N(CCCC)C(=O)N(CCCC)C(=O)C1=C\C=C\C=C/1N(CCCS([O-])(=O)=O)C2=CC=CC=C2O\1 DZVCFNFOPIZQKX-LTHRDKTGSA-M 0.000 description 1
- 125000001434 methanylylidene group Chemical group [H]C#[*] 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 229930014626 natural product Natural products 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 231100000989 no adverse effect Toxicity 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 125000001196 nonadecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- SNQQPOLDUKLAAF-UHFFFAOYSA-N nonylphenol Chemical compound CCCCCCCCCC1=CC=CC=C1O SNQQPOLDUKLAAF-UHFFFAOYSA-N 0.000 description 1
- 125000005375 organosiloxane group Chemical group 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 125000002255 pentenyl group Chemical group C(=CCCC)* 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 239000004848 polyfunctional curative Substances 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 1
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 1
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000005070 ripening Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- ADZWSOLPGZMUMY-UHFFFAOYSA-M silver bromide Chemical compound [Ag]Br ADZWSOLPGZMUMY-UHFFFAOYSA-M 0.000 description 1
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 1
- 239000001632 sodium acetate Substances 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 235000010267 sodium hydrogen sulphite Nutrition 0.000 description 1
- 235000010265 sodium sulphite Nutrition 0.000 description 1
- AKHNMLFCWUSKQB-UHFFFAOYSA-L sodium thiosulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=S AKHNMLFCWUSKQB-UHFFFAOYSA-L 0.000 description 1
- 235000019345 sodium thiosulphate Nutrition 0.000 description 1
- SRFKWQSWMOPVQK-UHFFFAOYSA-K sodium;2-[2-[bis(carboxylatomethyl)amino]ethyl-(carboxymethyl)amino]acetate;iron(2+) Chemical compound [Na+].[Fe+2].OC(=O)CN(CC([O-])=O)CCN(CC([O-])=O)CC([O-])=O SRFKWQSWMOPVQK-UHFFFAOYSA-K 0.000 description 1
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 235000012976 tarts Nutrition 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- AVCVDUDESCZFHJ-UHFFFAOYSA-N triphenylphosphane;hydrochloride Chemical compound [Cl-].C1=CC=CC=C1[PH+](C=1C=CC=CC=1)C1=CC=CC=C1 AVCVDUDESCZFHJ-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は帯電防止されたハロゲン化銀写真感光材料に関
し、詳しくは写真特性に悪影響を及ぼすことなく帯電防
止されl;ハロゲン化銀写真感光材料に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a silver halide photographic light-sensitive material that is antistatic, and more specifically, a silver halide photographic light-sensitive material that is antistatic without adversely affecting photographic properties. Regarding.
近年、ハロゲン化銀写真感光材料(以下、写真感光材料
または単に感光材料という)に対する要求は益々複雑多
岐に亙り、特に写真性能が安定した高感度にしてカプリ
の発生が少なく、シかも高画質の感光材料が要望されて
いる。In recent years, the demands on silver halide photographic materials (hereinafter referred to as photographic materials or simply referred to as photosensitive materials) have become increasingly complex and diverse.In particular, the requirements for silver halide photographic materials (hereinafter referred to as photographic materials or simply referred to as photosensitive materials) have become increasingly complex and diverse. Photosensitive materials are in demand.
特にX線用感光材料等においては、人体に対するX線の
被曝量を少なくするために、より少ないX線量で多くの
情報が得られるような高感度、高画質で、しかも早く情
報を得るため迅速現像処理に適合した感光材料が望まれ
ている。In particular, for X-ray photosensitive materials, etc., in order to reduce the amount of X-rays the human body is exposed to, high sensitivity and high image quality are required to obtain a lot of information with a smaller amount of X-rays. A photosensitive material that is suitable for development processing is desired.
感光材料は一般に電気絶縁性の支持体および写真構成層
から成っているので、感光材料の製造工程中ならびに使
用時に同種または異種物質の表面との間の接触摩擦また
は剥離を受けることにより静電電荷が蓄積され易い。現
像処理前に蓄積された静電電荷が放電することによって
感光性乳剤層が感光し、写真フィルムを現像処理した際
に点状スポットまたは樹枝状や羽毛状の線斑、いわゆる
スタチックマークを生ずる。これは写真フィルムの商品
価値を著しく損ねる。例えば医療用または工業用X−レ
イフィルム等に現れるスタチックマークは非常に危険な
判断に繋がるが、この現象は現像してみて初めて明らか
になるもので非常に厄介な問題の1つである。また、こ
れらの蓄積された静電電荷は、フィルム表面へ塵挨が付
着したり、塗布が均一に行えないなどの第2次的故障を
誘起する原因ともなる。このスタチックマークは感光材
料の高感度化および高速塗布、高速撮影、高速自動処理
化等により一層発生し易くなっている。Since photosensitive materials generally consist of an electrically insulating support and photographic constituent layers, they are subject to electrostatic charges due to contact friction or peeling between the surfaces of the same or different materials during the manufacturing process and during use. is likely to accumulate. The photosensitive emulsion layer becomes sensitized by the discharge of electrostatic charges accumulated before processing, resulting in dotted spots or dendritic or feather-like line spots, so-called static marks, when photographic film is processed. . This significantly reduces the commercial value of photographic film. For example, static marks that appear on medical or industrial X-ray films can lead to extremely dangerous judgments, but this phenomenon is one of the most troublesome problems as it becomes apparent only after the film is developed. In addition, these accumulated electrostatic charges may cause secondary failures such as dust adhering to the film surface or inability to apply uniformly. These static marks are becoming more likely to occur due to the increased sensitivity of photosensitive materials, high-speed coating, high-speed photographing, high-speed automatic processing, etc.
従来から感光材料の支持体や各種塗布表面層の導電性を
向上させる方法が考えられ、種々の吸湿性物質や水溶性
無機塩、ある種の界面活性剤、ポリマー等の利用が試み
られてきた。Methods have been considered to improve the conductivity of photosensitive material supports and various coated surface layers, and attempts have been made to use various hygroscopic substances, water-soluble inorganic salts, certain surfactants, polymers, etc. .
しかしながら、これら多くの物質は支持体の種類や写真
組成物の違いによって特異性を示したり写真性能にも悪
影響を及ぼす場合がある。特に親水性コロイド層に対す
る帯電防止は非常に困難で、低温で表面抵抗の低下が十
分でなかったり、高温高湿において感光材料同士または
他の物質との間で接着故障を生ずることがしばしばある
。また、ポリエチレンオキサイド系化合物のように帯電
防止効果を有しながら、カブリの増加、減感、粒状性の
劣化等、写真特性への悪影響を与えるものも多く、医療
用X−レイ感材のように支持体の両面に乳剤層を有する
感光材料への使用に適する帯電防止剤を見い出すのは困
難であった。However, many of these substances may exhibit specificity depending on the type of support or photographic composition, or may have an adverse effect on photographic performance. In particular, it is very difficult to prevent static electricity on a hydrophilic colloid layer, and the reduction in surface resistance is often insufficient at low temperatures, or adhesion failures often occur between photosensitive materials or other substances at high temperatures and high humidity. In addition, although they have an antistatic effect like polyethylene oxide compounds, there are many that have negative effects on photographic properties such as increased fog, desensitization, and deterioration of graininess, such as medical X-ray sensitive materials. However, it has been difficult to find antistatic agents suitable for use in light-sensitive materials having emulsion layers on both sides of the support.
前述の接触摩擦或いは剥離による静電気発生に関連して
、感光材料表面の滑り特性の改良も重要である。In connection with the aforementioned generation of static electricity due to contact friction or peeling, it is also important to improve the sliding properties of the surface of the photosensitive material.
即ち、感光材料の塗布、乾燥、加工包装をはじめとした
製造工程時、さらにはフィルム装填、撮影、自動現像材
処理工程あるいは影写などで各種のローラー、打器や感
材同士などとの接触摩擦の機会が極めて多い。In other words, during manufacturing processes such as coating, drying, processing and packaging of photosensitive materials, as well as during film loading, photographing, automatic developing material processing, or shadow copying, contact with various rollers, punching tools, and photosensitive materials may occur. There are many opportunities for friction.
そのため、感光材料の滑り特性の改良は、帯電防止性と
併せて摩擦による表面の擦り傷、引掻き傷の防止、或は
フィルム送行性改良などのうえから感材の滑り摩擦を減
少させることが要求される。Therefore, improvements in the sliding properties of photosensitive materials are required, in addition to antistatic properties, to prevent scratches and scratches on the surface caused by friction, and to improve film transportability, as well as to reduce the sliding friction of photosensitive materials. Ru.
従来よりこの種の研究として提案されている代表的なも
のにはオルガノシロキサン類を用いた例えば米国特許第
3.042.522号、特開昭60−140342号或
は特開昭62−2649号などがある。Typical studies that have been proposed in the past include those using organosiloxanes, such as U.S. Pat. and so on.
これらの公知の改良手段は、それぞれある程度の滑り性
は向上するものの充分でなかったり、他の特性例えば剥
離帯電性を悪化したりするなど必らずしも満足するもの
ではなかった。Although each of these known improvement means improves the slipperiness to some extent, it is not always satisfactory, as it is not sufficient or deteriorates other properties such as peeling chargeability.
一方、多くの親水性有機コロイド層から形成される写真
感光材料は、その製造に際して、これらの塗布液をハジ
キ、塗布ムラ等を生ぜず均一かつ高速で薄層塗布される
ことが要求される。感光材料を製造するに当って、しば
しば支持体に写真乳剤その他のゼラチンなど親水性有機
コロイドを含む塗布液を同時多層塗布することがある。On the other hand, during the production of photographic light-sensitive materials formed from many hydrophilic organic colloid layers, it is required that these coating solutions be coated in a thin layer uniformly and at high speed without causing repelling or uneven coating. In producing light-sensitive materials, a support is often coated with multiple layers of coating solutions containing photographic emulsions and other hydrophilic organic colloids such as gelatin.
このようなゼラチン等の有機コロイド層にゼラチンまた
は他の有機コロイド液を塗布する場合に必要とされる塗
布特性を得ることは、支持体に直接ゼラチンコロイド液
を塗布する場合に比べ多くの困難を伴う、特に下に塗布
、された層が塗布直後の冷却セットした状態にある場合
には向夏である。Obtaining the required coating characteristics when applying gelatin or other organic colloid liquids to such an organic colloid layer presents many difficulties compared to applying gelatin colloid liquids directly to the support. Especially when the underlying layer is in a cool set state immediately after application, it is early in the summer.
従来から感光材料の各種塗布液の塗布助剤として、乳化
剤として、あるいは写真表面層の表面物性を改良するた
めの添加剤として種々の界面活性剤(以下、活性剤とい
う)が使用されてきた。特にサポニンは写真工業におい
て塗布助剤として広汎に利用されてきたが、泡立ち易い
こと、天然物であるため品質の変動が大きく、シかも塗
布助剤としての特性が弱いなどの欠点があった。また、
その他各種の合成活性剤においても種々の写真塗布液も
しくは写真塗布層の塗布特性および表面特性に及ぼす作
用が活性剤の種類によって特異性を示し、従ってその用
途範囲が限定されるため多くの異なった型の活性剤が特
定の用途に応じて選択され利用されている。Various surfactants (hereinafter referred to as activators) have conventionally been used as coating aids in various coating solutions for photosensitive materials, as emulsifiers, or as additives for improving the surface properties of photographic surface layers. In particular, saponin has been widely used as a coating aid in the photographic industry, but it has drawbacks such as easy foaming, large fluctuations in quality because it is a natural product, and poor properties as a coating aid. Also,
Various other synthetic activators also exhibit specificity depending on the type of activator in their effects on the coating properties and surface properties of various photographic coating solutions or photographic coating layers. The type of active agent selected and utilized depends on the particular application.
しかしながら、これらの中には写真特性、特に高温多湿
時での膜物性の悪化や、化合物そのものの安定性、ある
いは高速塗布性が不十分なものもあり、満足できる現状
ではない。However, some of these have poor photographic properties, particularly poor film properties at high temperatures and high humidity, insufficient stability of the compound itself, or insufficient high-speed coating properties, and the current state of the art is not satisfactory.
本発明は上記の事情に鑑み為されたもので、本発明のt
Jlの目的は、泡・ハジキその他の塗布故障がなく高速
塗布が可能な帯電防止されたハロゲン化銀写真感光材料
を提供することにある。The present invention has been made in view of the above circumstances.
The purpose of Jl is to provide an antistatic silver halide photographic material that can be coated at high speed without bubbles, repelling, or other coating failures.
本発明の第2の目的は、表面の滑り性を改良したハロゲ
ン化銀写真感光材料を提供することである。A second object of the present invention is to provide a silver halide photographic material with improved surface slipperiness.
本発明の第3の目的は、写真性能に悪影響を及ぼすこと
のない帯電防止剤を用いて帯電防止されたハロゲン化銀
写真感光材料を提供することである。A third object of the present invention is to provide a silver halide photographic material that is antistatic using an antistatic agent that does not adversely affect photographic performance.
本発明の上記目的は、支持体上に少なくとも一層の親水
性コロイド層を有し、かつ、下記−数式CI)及び/又
は−数式(If)で表される化合物から選ばれる少なく
とも一つを含有するハロゲン−数式〔I〕
一般式(n)
S
但し、式中R1は炭素数4〜18のアルキル基、アルケ
ニル基、もしくはアラルキル基を表す。The above-mentioned object of the present invention has at least one hydrophilic colloid layer on a support, and contains at least one compound selected from the following formulas CI) and/or formula (If). Halogen Formula [I] General Formula (n) S However, in the formula, R1 represents an alkyl group, an alkenyl group, or an aralkyl group having 4 to 18 carbon atoms.
R1は水素原子又は炭素数4〜18のアルキル基、アル
ケニル基、もしくはアラルキル基を表す。R1 represents a hydrogen atom or an alkyl group having 4 to 18 carbon atoms, an alkenyl group, or an aralkyl group.
前記−数式CI)のR1は炭素数4〜18のアルキル基
、アルケニル基、またはアラルキル基であり、アルキル
基としては、例えばブチル、イソブチル、ペンチル、ヘ
キシル、ヘプチル、オクチル、ノニル、デシル、ウンデ
シル、ドデシル、トリデシル、テトラデシル、ペンタデ
シル、ヘキサデシル、ヘプタデシル、オクタデシル等で
ある。R1 in formula CI) is an alkyl group, alkenyl group, or aralkyl group having 4 to 18 carbon atoms, and examples of the alkyl group include butyl, isobutyl, pentyl, hexyl, heptyl, octyl, nonyl, decyl, undecyl, Dodecyl, tridecyl, tetradecyl, pentadecyl, hexadecyl, heptadecyl, octadecyl, etc.
アルケニル基としては、例えば、ブテニル、インブテニ
ル、ペンテニル、ヘキセニル、ヘプテニル、オクテニル
、ノネニル、デセニル、ウンデセニル、ドデセニル、ト
リデセニル、テトラデセニル、ペンタデセニル、ヘキサ
デセニル、ヘプタデセニル、オクタデセニル等が挙げら
れる。アラルキル基としては、スチリル、ベンジル等が
あり、これらの混合物でも良い。Examples of the alkenyl group include butenyl, imbutenyl, pentenyl, hexenyl, heptenyl, octenyl, nonenyl, decenyl, undecenyl, dodecenyl, tridecenyl, tetradecenyl, pentadecenyl, hexadecenyl, heptadecenyl, octadecenyl, and the like. Examples of the aralkyl group include styryl and benzyl, and mixtures thereof may also be used.
R3は水素または炭素数4〜18のアルキル基、アルケ
ニル基、またはアラルキル基で、それぞれ、上述のR1
に同義である。R3 is hydrogen or an alkyl group having 4 to 18 carbon atoms, an alkenyl group, or an aralkyl group, and each of the above R1
is synonymous with
R3R1は水素原子又は炭素数1〜3のアルキル基で例
えばメチル、エチル、又はプロピルなどが挙げられる。R3R1 is a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, such as methyl, ethyl, or propyl.
前記−数式(II)のR6は炭素数8〜30のアルキル
基、アルケニル基、アルキルアリール基、もしくはアラ
ルキルアリール基であり、アルキル基としては、例えば
オクチル、ノニル、デシル、ウンデシル、ドデシル、ト
リデシル、テトラデシル、ペンタデシル、ヘキサデシル
、ヘプタデシル、オクタデシル、ノナデシル、エイコシ
ル等が挙げろれる。R6 in formula (II) above is an alkyl group, alkenyl group, alkylaryl group, or aralkylaryl group having 8 to 30 carbon atoms, and examples of the alkyl group include octyl, nonyl, decyl, undecyl, dodecyl, tridecyl, Examples include tetradecyl, pentadecyl, hexadecyl, heptadecyl, octadecyl, nonadecyl, eicosyl, and the like.
アルケニル基としては、例えば、オクテニル1、ノネニ
ル、デセニル、ウンデセニル、ドデセニル、トリデセニ
ル、テトラデセニル、ペンタデセニル、ヘキサデセニル
、ヘプタデセニル、オクタデセニル等が挙げられる。Examples of the alkenyl group include octenyl 1, nonenyl, decenyl, undecenyl, dodecenyl, tridecenyl, tetradecenyl, pentadecenyl, hexadecenyl, heptadecenyl, octadecenyl, and the like.
アルキルアリール基としては、モノブチルフェノール、
ジブチルフェノール、860.ブチルフェノール、ジs
ea、ブチルフェノール、tart 、ブチルフェノー
ル、オクチルフェノール、ノニルフェノール、ジノニル
フェノール等が挙げられる。As the alkylaryl group, monobutylphenol,
Dibutylphenol, 860. butylphenol, di-s
Examples include ea, butylphenol, tart, butylphenol, octylphenol, nonylphenol, dinonylphenol, and the like.
ア゛ラルキルフェノールとしては、スチリル化フエ写
猫
ノー゛ル、ベンジルフェノール、クミルフェノール等の
モノ、ジ、トリの単独あるいは、これらの混合物が挙げ
られ、これらのアルキル基等の混合物であってもよい。As aralkylphenol, styryl phenol is
Examples include mono-, di-, and tri-phenols such as catol, benzylphenol, and cumylphenol, or mixtures thereof, and mixtures of these alkyl groups may also be used.
また、Aは炭素数2〜4のアルキレン基または置換アル
キレン基であり、例えば、エチレン、プロピレン、ブチ
レン、イソブチレン等であり、それらの単独またはブロ
ックあるいはランダムの混合物であっても良い。Further, A is an alkylene group or a substituted alkylene group having 2 to 4 carbon atoms, such as ethylene, propylene, butylene, isobutylene, etc., and may be a single group or a block or random mixture thereof.
nは1〜200の整数、mは0−100の整数であり、
より好ましくはnは2〜100. mは0.1〜50の
範囲である。n is an integer of 1 to 200, m is an integer of 0 to 100,
More preferably n is 2 to 100. m ranges from 0.1 to 50.
また、Mは、ナトリウム、カリウム等のアルカリ金属原
子、NHいもしくは、モノエタノールアミン、トリエタ
ノールアミン、等のアルカノールアミン残基であり、こ
れらの混合物であっても良い。Further, M is an alkali metal atom such as sodium or potassium, NH, or an alkanolamine residue such as monoethanolamine or triethanolamine, and may be a mixture thereof.
上記の一般式CI)の活性剤は、例えばアルキルフェノ
ールを原料をして、アリルクロライドを触媒存在のもと
て加熱反応し、次いで減圧蒸留する。The above-mentioned activator of the general formula CI) is prepared by using, for example, an alkylphenol as a raw material, heating and reacting allyl chloride in the presence of a catalyst, and then distilling it under reduced pressure.
得られた反応物にアルキレンオキサイドを付加し、次に
無水リン酸などのリン酸化剤でエステル化し、アルカリ
中和することにより容易に得られる。It can be easily obtained by adding alkylene oxide to the obtained reaction product, then esterifying it with a phosphorylating agent such as phosphoric anhydride, and neutralizing it with an alkali.
又、−数式(II)の活性剤も、同様に容易に合成でき
例えばアルキル或はアルキルフェノールとアリルグリシ
ジルエーテルを触媒存在下でアルキレンオキサイドを付
加し、加熱反応させ、得られた反応組成物に、さらにア
ルキレンオキサイドを付加しリン酸化剤でリン酸エステ
ル化後、中和することで本発明の活性剤が得られる。The activator of formula (II) can also be easily synthesized in the same way, for example, by adding alkylene oxide to alkyl or alkylphenol and allyl glycidyl ether in the presence of a catalyst, reacting with heating, and adding to the resulting reaction composition, The activator of the present invention can be obtained by further adding alkylene oxide and phosphoric acid esterification with a phosphorylating agent, followed by neutralization.
なお、これらは特開昭63−12334号、同63−2
3726号、明細書に記載されている方法であり、工業
的にも合成容易である。In addition, these are JP-A-63-12334 and JP-A-63-2.
This method is described in No. 3726, and is easy to synthesize industrially.
以下に本発明の一般式CI)、(IF)で表される化合
物の具体例を示すが本発明は、これに限定されるもので
はない。Specific examples of the compounds represented by the general formulas CI) and (IF) of the present invention are shown below, but the present invention is not limited thereto.
一般式〔!〕で表わされる化合物の具体例。General formula [! ] Specific examples of compounds represented by
−数式〔I〕 〔註〕 ※ニ一般式Yのモノリン酸エステル体 とシリン酸エステル体のモル比を表わす。-Mathematical formula [I] [Note] * Monophosphate ester of general formula Y represents the molar ratio of silicic acid ester and silicic acid ester.
EO:fCH*CHsO)− PO:+CHzCHzCH*Oゲ。EO:fCH*CHsO)- PO: +CHzCHzCH*Oge.
BO:÷Cl x CH2C8z CH20地次に一般
式(IF)で表わされる化合物の具体例を示す。BO:÷Cl x CH2C8z CH20 Next, specific examples of the compound represented by the general formula (IF) will be shown.
一般式(If)
S
本発明の化合物を感光材料の帯電防止剤として用いる場
合、その添加量は特に限定されないが好ましくは感光材
料1m”当たり0.01”lOgの範囲でよく、より好
ましくは0.01〜5gである。When the compound of the general formula (If) S of the present invention is used as an antistatic agent for a photosensitive material, the amount added is not particularly limited, but is preferably in the range of 0.01"lOg per 1m" of the photosensitive material, more preferably 0. .01-5g.
また本発明の界面活性剤は、感光材料を構成する各層例
えば、保護層、ハロゲン化銀乳剤層、フィルター層、下
引層、裏引層(バック層)等に直接添加することができ
、添加に際して、同一塗布液に添加しても、またこれら
を、まず適当な溶媒、例えば水、アルコール、ジオキサ
ン、グリコールエーテル等の溶媒又はこれらの混合溶媒
に溶解し、溶液の形で添加してもよい。Furthermore, the surfactant of the present invention can be directly added to each layer constituting the photosensitive material, such as a protective layer, a silver halide emulsion layer, a filter layer, a subbing layer, a backing layer (back layer), etc. In this case, they may be added to the same coating solution, or they may be added in the form of a solution by first dissolving them in a suitable solvent, such as water, alcohol, dioxane, glycol ether, etc., or a mixed solvent thereof. .
本発明の感光材料は写真構成層中に、米国特許第3,4
11.911号、・同3,411.912号、特公昭4
5−5331号等に記載のポリマーラテックスを、また
マット剤としてシリカ、硫酸バリウム、硫酸ストロンチ
ウム、ポリメチルメタクリレート等を含むことができる
。The light-sensitive material of the present invention has U.S. Pat.
No. 11.911, No. 3,411.912, Special Publication No. 4
The polymer latex described in No. 5-5331 may also contain silica, barium sulfate, strontium sulfate, polymethyl methacrylate, etc. as a matting agent.
本発明の感光材料に用いられるハロゲン化銀乳剤には、
臭化銀、沃臭化銀、沃塩臭化銀、塩臭化銀および塩化銀
のいずれのハロゲン化銀を用いてもよい。The silver halide emulsion used in the light-sensitive material of the present invention includes:
Any silver halide such as silver bromide, silver iodobromide, silver iodochlorobromide, silver chlorobromide, and silver chloride may be used.
ハロゲン化銀乳剤中のハロゲン化銀粒子は、立方体、八
面体、十四面体のような規則的(regular)な結
晶体を有するものでもよく、また球状、板状などのよう
な変則的(irregular)な結晶形を持2もの、
あるいは、これら結晶形の複合形を持つものでもよい。The silver halide grains in the silver halide emulsion may have a regular crystal structure such as a cube, an octahedron, or a dodecahedron, or may have an irregular crystal structure such as a spherical shape or a plate shape. It has two irregular crystal forms,
Alternatively, it may have a composite form of these crystal forms.
更にリサーチ・ディスクロージャ(Research
Disclosure、以下RDと略す)、 225巻
、 22534.20〜58頁(1983年)に記載さ
れた平板粒子であってもよい。また、特公昭41−20
86号に記載されている内部潜像型ハロゲン化銀粒子と
表面潜像をハロゲン化銀粒子とを組み合わせたものも用
いることができる。Furthermore, Research Disclosure (Research
It may be the tabular grain described in Disclosure (hereinafter abbreviated as RD), Vol. 225, pp. 22534.20-58 (1983). In addition, special public service
A combination of internal latent image type silver halide grains and surface latent image type silver halide grains described in No. 86 can also be used.
本発明に用いられる写真乳剤は、ビー・ゲラフキデス
(P、Glafkides)著 「シミー−ニー 74
ジ−クー7fトグラフイーク (Chimia et
PhysiquePhotographique)J、
ポールーモンテル(Paul Montel)社刊(1
967年〕、ジー・エフ・ダフィン(C。The photographic emulsion used in the present invention is B.
(P, Glafkides) “Shimmy Knee 74”
Chimia et
PhysiquePhotography)J,
Published by Paul Montel (1)
967], G.F. Duffin (C.
F、Duffin)著「7オトグラフイツク・エマルジ
aン・ケミストリイ(Photographic Em
ulsion Chewistry)J、ザ・フォーカ
ル・プレス(The FocalPress)社有(1
966年)、ヴイーエル・ゼリクマンら(V、L、Ze
likstanet al)rメイキング拳アンド・コ
ーティング・フォトクラフィック・エマルジ腫7
(Making and Coating Ph
otographic Emulsion)」、ザ・
7オーカル・プレス社有(1964年)などに記載され
た方法を用いて調製することができる。``7 Photographic Emulsion Chemistry'' by F. Duffin)
ulsion Chewistry) J, owned by The Focal Press (1
966), V.L. Zelikman et al.
likstanet al) r making fist and coating photocratic emulsion 7
(Making and Coating Ph
otographic Emulsion)”, The.
It can be prepared using the method described in 7 Orcal Press (1964).
ハロゲン化銀乳剤は、当分野で公知の硫黄増感法、還元
増感法、貴金属増感法など、またはこれらの組合せによ
り化学増感されてもよく、またメチン色素その他によっ
て分光増感されてもよい。The silver halide emulsions may be chemically sensitized by sulfur sensitization methods, reduction sensitization methods, noble metal sensitization methods, etc. known in the art, or combinations thereof, and may also be spectrally sensitized with methine dyes and the like. Good too.
本発明の感光材料に用いられる支持体としては、例えば
ポリエチレンのようなポリオレフィン、ポリスチレン、
セルローストリアセテートのようなセルロース誘導体、
ポリエチレンテレフタレートのようなポリエステルフィ
ルムまたはバライタ紙、合成紙あるいは紙等の両面をこ
れらのポリマーフィルムで被覆したシートからなる支持
体等が含まれる。Examples of the support used in the photosensitive material of the present invention include polyolefins such as polyethylene, polystyrene,
cellulose derivatives, such as cellulose triacetate,
Included are supports made of polyester films such as polyethylene terephthalate, or sheets of baryta paper, synthetic paper, or paper coated on both sides with these polymer films.
本発明に用いる支持体には、ハレーション防止層を設け
ることもできる。この目的のためにはカーボンブラック
あるいは各種の染料、例えばオキソノール、アゾ、スチ
リル、アントラキノン、メロシアニンおよびトリ (ま
たはジ)アリールメタン等の染料を挙げることができる
。The support used in the present invention can also be provided with an antihalation layer. For this purpose, mention may be made of carbon black or of various dyes, such as oxonol, azo, styryl, anthraquinone, merocyanine and tri(or di)arylmethane.
その他、本発明の感光材料に用いられる化学増感剤、分
光増感剤、カブリ防止剤、安定剤、硬膜剤、可塑剤、潤
滑剤、塗布助剤、増白剤、紫外線吸収剤、カプラー、色
画像安定剤等については特に制限はなく、例えばRD、
176巻、 17643.22〜28頁(197g)
の記載を参考にすることができる。In addition, chemical sensitizers, spectral sensitizers, antifoggants, stabilizers, hardeners, plasticizers, lubricants, coating aids, brighteners, ultraviolet absorbers, and couplers used in the photosensitive material of the present invention. , color image stabilizers, etc., are not particularly limited; for example, RD,
Volume 176, 17643. Pages 22-28 (197g)
You can refer to the description.
本発明の感光材料は、通常の白黒感光材料(撮影用感光
材料、X−レイ感光材料、印刷用感光材料、白黒印画紙
等)、通常のカラー感光材料(カラーネガフィルム、カ
ラー印画紙、カラーリバーサルフィルム等)、銀塩拡散
転写プロセス、ダイトランスファープロセス、銀色素漂
白法、熱現像感光材料などに用いることができるが、特
に高温迅速処理用感光材料、高感度感光材料に有効であ
る。The photosensitive material of the present invention includes ordinary black and white photosensitive materials (photosensitive materials for photographing, film, etc.), silver salt diffusion transfer process, die transfer process, silver dye bleaching method, heat-developable photosensitive materials, etc., but it is particularly effective for photosensitive materials for high-temperature rapid processing and high-sensitivity photosensitive materials.
これら感光材料の処理については、エル−エフ・ニー・
メースン(L、F、A、Mason)著「フォトグラフ
ィック・プロセッシング・ケミストリイ (Photo
graphic Processinlg Chemi
stry)J、ザ・7オーカル・プレス社有(1975
年)やRD、 176巻、 17643(前出)、28
〜31頁の記載を参考にできる。Regarding the processing of these photosensitive materials, please refer to L.F.N.
"Photographic Processing Chemistry" by Mason (L, F, A, Mason)
graphic Processinlg Chemi
stry) J, The 7 Orcal Press (1975)
) and RD, vol. 176, 17643 (cited above), 28
You can refer to the description on pages 31 to 31.
以下に具体的実施例を示して本発明を更に詳しく説明す
る。The present invention will be explained in more detail by showing specific examples below.
実施例1
平均粒径0,3μ論の沃素2モル%、塩素0.2モル%
を含有する単分散塩沃臭化銀の内部核およびその外側に
、沃素40モル%および臭素60モル%の比率で沃臭化
銀層を設け、0.5μ■の粒径まで成長させ、引続き沃
素1モル%、臭素99モル%の比率で0.85μ■まで
沃臭化銀層を成長させ、やや丸味を帯びた14面体状の
ハロゲン化銀粒子を得た。Example 1 2 mol% of iodine and 0.2 mol% of chlorine with average particle size of 0.3μ theory
A silver iodobromide layer was formed on the inner core of monodispersed silver chloroiodobromide containing 40 mol% of iodine and 60 mol% of bromine at a ratio of 40 mol% of iodine and 60 mol% of bromine. A silver iodobromide layer was grown to a thickness of 0.85 μm at a ratio of 1 mol % iodine and 99 mol % bromine to obtain slightly rounded dodecahedral silver halide grains.
これらの粒子に塩化金酸塩、ロダンアンモン、チオ硫酸
ナトリウムおよびチオ尿素系化合物を添加し化学熟成し
た。Chlorauric acid salt, rhodanammonium, sodium thiosulfate, and thiourea-based compounds were added to these particles for chemical ripening.
この粒子70g当り安定剤として4−ヒドロキシ−〇−
メチルー1.3,3a、7−チトラザインデン2gを加
えて乳剤調整液を作成した。この乳剤調整液および下記
に示す保護層液に、各種添加剤および表1に示す塗布助
剤を添加した。4-hydroxy-〇- as a stabilizer per 70g of these particles.
An emulsion preparation solution was prepared by adding 2 g of methyl-1.3,3a,7-chitrazaindene. Various additives and coating aids shown in Table 1 were added to this emulsion adjustment solution and the protective layer solution shown below.
次に、ポリエチレンテレフタレート支持体上に、乳剤液
は、銀量として4.8g/s−ゼラチン量として3.5
g/■8、保護層液は、ゼラチン量として1.0g/
ll@となるように毎分150mで同時塗布し、2分3
0秒で乾燥させて試料34種を作成した。The emulsion was then deposited on a polyethylene terephthalate support with a silver content of 4.8 g/s and a gelatin content of 3.5 g/s.
g/■8, protective layer liquid is 1.0g/ as gelatin amount
Apply at the same time at 150 m/min so that ll@, 2 minutes 3
Thirty-four samples were prepared by drying for 0 seconds.
乳剤添加剤(ハロゲン化銀1モル当り)t−ブチルカテ
コール 400■gポリビニルピロリ
ドン(分子量10.000)スチレン−無水マレイン酸
共重合体
トリメチロールプロパン
ジエチレングリコール
ニトロフェニル螢トリフェニル
ホスホニウムクロリド
1.0g
2.5g
0g
5.0g
01g
1.3−ジヒドロキシベンゼン−4−
スルホン酸アンモニウム
2−メルカプトベンツイミダゾール−
5−スルホン酸ナトリウム
g
15嘗g
CaHloCHICHCHJ(CJCOOH)1H
g
1.1−ジメチロール−1−プロモーl−二トロメタン
70■g
(nは2〜5の混合物)
CsF r *0−(CHzCHzO)TT CHtC
ToOHC4F@SO3に
mg
mg
保護層添加剤(ゼラチン1g当り)
平均粒径7μ■のポリメチルメタクリレート25)らな
るマット剤 7mg平均粒径
0.013μ園のコロイダルシリカ 70mgホル
ムアルデヒド 3Bグリオキザ
ール 2mg2−ヒドロキシ
−4,6−ジクロロ−1,3,5−トリアジンナトリウ
ム塩 3■gこの様にして得られた試料
の帯電防止性能、写真性能および塗布性能は、次の方法
で調べた。Emulsion additives (per mole of silver halide) t-butylcatechol 400 g polyvinylpyrrolidone (molecular weight 10.000) styrene-maleic anhydride copolymer trimethylolpropane diethylene glycol nitrophenyl firefly triphenylphosphonium chloride 1.0 g 2. 5g 0g 5.0g 01g 1.3-dihydroxybenzene-4-ammonium sulfonate 2-mercaptobenzimidazole-5-sodium sulfonate g 15g CaHloCHICHCHJ (CJCOOH) 1H g 1.1-dimethylol-1-promol l- Nitromethane 70 g (n is a mixture of 2 to 5) CsF r *0-(CHzCHzO)TT CHtC
ToOHC4F@SO3 mg Protective layer additive (per 1 g of gelatin) Matting agent consisting of polymethyl methacrylate 25) with an average particle size of 7μ■ 7mg Colloidal silica with an average particle size of 0.013μ 70mg Formaldehyde 3B glyoxal 2mg 2-Hydroxy-4 , 6-dichloro-1,3,5-triazine sodium salt 3 g The antistatic performance, photographic performance and coating performance of the sample thus obtained were examined by the following methods.
l)スタチックマークの発生量測定
未露光の試料を、23℃、23%RHで2時間調湿した
後、同一空調条件の暗室内において、試料をゴムローラ
、ナイロンローラで摩擦した後、自動現像機5RX−5
01(コニカ株式会社製)でXレイ自動現像機用現像液
XD−SR,定着液XF−SR(いずれもコニカ株式会
社製)で、45秒処理を行い添加した化合物の帯電防止
性能を調べた。l) Measurement of the amount of static marks The unexposed sample was conditioned for 2 hours at 23°C and 23% RH. The sample was rubbed with a rubber roller and a nylon roller in a dark room under the same air conditioning conditions, and then developed automatically. Machine 5RX-5
01 (manufactured by Konica Corporation) for 45 seconds using developer XD-SR for an X-ray automatic processor and fixer XF-SR (both manufactured by Konica Corporation), and the antistatic performance of the added compound was investigated. .
2)スタチックマークの発生度の評価は、目視により判
定した。評価基準は次の通りである。2) The degree of occurrence of static marks was evaluated visually. The evaluation criteria are as follows.
A: 全く発生しない。A: It does not occur at all.
B: 面積で3%未満発生する。B: Occurs in less than 3% of the area.
C: 面積で3%以上lO%未満発生する。C: Occurs in an area of 3% or more and less than 10%.
D= 面積で10%以上発生する。D = Occurs in 10% or more of the area.
3)写真性能の測定
作成した試料をタングステンランプでコニカ株式会社製
の1[S−1型センシトメーターでJIS法に基づき白
色光で露光した後、上記自動現像機を用いて、同様の方
法で現像を行い、写真性能の測定を行った。なお感度は
試料lの感度を100とした時の相対値で示し、カプリ
+0.20の濃度を与える露光量より計算した。3) Measurement of photographic performance The prepared sample was exposed to white light using a tungsten lamp and a Konica Corp. model 1 [S-1 sensitometer according to the JIS method. The film was developed and its photographic performance was measured. Note that the sensitivity is expressed as a relative value when the sensitivity of sample 1 is taken as 100, and was calculated from the exposure amount that gives a density of Capri +0.20.
4)塗布性能の測定 ■塗布ムラを以下の試験法によって評価した。4) Measurement of coating performance (2) Coating unevenness was evaluated by the following test method.
巾30cmx長さ100c++の試料を濃度1.0にな
るように均一に露光し、現像処理後の試料を目視により
判定する。A sample with a width of 30 cm and a length of 100 cm is uniformly exposed to light so that the density becomes 1.0, and the sample after development is visually judged.
く塗布ムラの評価〉 ◎:非常に良好 O:良好 △:やや不良 X :不良 ■各試料についてl m2当りのハジキの数を調べた。Evaluation of coating unevenness> ◎: Very good O: Good △: Slightly poor X: Defective (2) The number of repellents per 1 m2 was determined for each sample.
尚、試料1〜24.28〜34については、各界面活性
剤を保護層に加えたもの、試料25.26については、
乳剤層に加えたものであり、更に試料27については、
例示化合物を保護層と乳剤層に別々に加えたものである
。In addition, for samples 1 to 24 and 28 to 34, each surfactant was added to the protective layer, and for sample 25.26,
It was added to the emulsion layer, and for sample 27,
The exemplified compounds are added separately to the protective layer and the emulsion layer.
比較化合物 ■)サポニン ■) 。o。comparative compound ■) Saponin ■) . o.
C,H,3−NΦ−CH3Brθ CI。C,H,3-NΦ-CH3Brθ C.I.
(n = 120〜170) これらの結果を併せて表−1に示す。(n = 120-170) These results are shown in Table 1.
尚、
表中
表−1から明らかなように、本発明の化合物を用いて帯
電防止した試料については、比較試料に比べ、スタチッ
クマークの発生も少なく、塗布性も良好であり、また写
真性能に何等悪影響を及ぼさないことがわかる。また、
例示化合物を単独で用いる場合、写真性能、帯電防止性
能、塗布性の面において添加量30鵬g/m”付近が最
も好ましい。As is clear from Table 1, the samples that were antistatic using the compound of the present invention had fewer static marks, had better coating properties, and had better photographic performance than the comparative samples. It can be seen that there is no adverse effect on the Also,
When the exemplified compound is used alone, the most preferable addition amount is around 30 g/m'' in terms of photographic performance, antistatic performance, and coating properties.
更に、−数式〔I〕と(II)を併用した場合、その効
果が特にすぐれている。Furthermore, when formulas [I] and (II) are used together, the effect is particularly excellent.
実施例2
下引加工したセルローストリアセテートフィルムからな
り、ハレーション防止層(黒色コロイド銀0.38gお
よびゼラチン3.2gを含有)を有する透明支持体上に
、下記の各層を順番に塗設することにより試料35〜4
9を作成した。尚、以下の実施例において、感光材料中
への添加量は1mff1当りのものを示し、またハロゲ
ン化銀乳剤およびコロイド銀は銀に換算して示した。Example 2 The following layers were sequentially coated on a transparent support made of subbed cellulose triacetate film and having an antihalation layer (containing 0.38 g of black colloidal silver and 3.2 g of gelatin). Sample 35-4
9 was created. In the following examples, the amount added to the light-sensitive material is shown per 1 mff, and the amounts of silver halide emulsion and colloidal silver are shown in terms of silver.
層l :赤感性に色増感された1、3gの低感度赤感性
沃臭化銀(沃化銀5モル%含有)乳剤および1.3gの
ゼラチンならびに0.7gの1−ヒドロキシ−N−El
−(2,4−ジ−t−アミルフェノキシ)ブチル]−
2−ナフトアミド (シアンカプラー)、0.07gの
1−ヒドロキシ−4−[4−(1−ヒドロキシ−δ−ア
セトアミド−3,6−ジスルホ−2−ナフチルアゾ)フ
ェノキシ]−N−[δ−(2,4−ジ−t−アミルフェ
ノキシ)ブチル−2−ナフトアミド・ジナトリウム(カ
ラードシアンカプラー)および0 、07gの4−オク
タデシルスクシンイミド−2−(1フェニル−5−テト
ラゾリルチオ)−1−インダノン (DIR化合物)を
溶解した0、7gのトリクレジルホスフェート (TC
P)を含有している低感度赤感性乳剤層。Layer 1: 1.3 g of low-sensitivity red-sensitive silver iodobromide (containing 5 mol % silver iodide) emulsion sensitized to red, 1.3 g of gelatin and 0.7 g of 1-hydroxy-N- El
-(2,4-di-t-amylphenoxy)butyl]-
2-naphthamide (cyan coupler), 0.07 g of 1-hydroxy-4-[4-(1-hydroxy-δ-acetamido-3,6-disulfo-2-naphthylazo)phenoxy]-N-[δ-(2 ,4-di-t-amylphenoxy)butyl-2-naphthamide disodium (colored cyan coupler) and 0.07g of 4-octadecylsuccinimide-2-(1phenyl-5-tetrazolylthio)-1-indanone (DIR compound). ) dissolved in 0.7 g of tricresyl phosphate (TC
A low-speed red-sensitive emulsion layer containing P).
層2 : 1.2gの高感度赤感性沃臭化銀乳剤(6
モル%の沃臭化銀含有)、L4gのゼラチンならびに0
.20gの層1で用いたシアンカプラーおよび0.02
gの層lで用いたカラードシアンカプラーを溶解した0
、22gのTCPを含有している高感度赤感性乳剤層。Layer 2: 1.2 g of highly sensitive red-sensitive silver iodobromide emulsion (6
(containing mol% silver iodobromide), L4g gelatin and 0
.. 20 g of cyan coupler used in layer 1 and 0.02
0 in which the colored cyan coupler used in layer l of g was dissolved.
, a high-speed red-sensitive emulsion layer containing 22 g of TCP.
層3 : 0.05gの2.5−ジ−t−オクチルハ
イドロキノン(汚染防止剤)を溶解した0、05gのジ
ブチルフタレート (DBP)および0.7gのゼラチ
ンを含有している中間層。Layer 3: Intermediate layer containing 0.05 g dibutyl phthalate (DBP) dissolved in 0.05 g 2.5-di-tert-octylhydroquinone (antifouling agent) and 0.7 g gelatin.
層4 :緑感性に色増感された0、90gの低感度緑感
性沃臭化銀(沃化銀5モル%含有)乳剤および2.1g
のゼラチンならびに0.8gの1−(2,4,6−トリ
クロロフエニル)−3−([α−(2,4−ジ−t−ア
ミルフェノキシ)−アセトアミド]ベンズアミド)−5
−ピラゾロン (マゼンタカプラー)、0.15gの1
−(2゜4.6−)リクロロフェニル)−4−(1−ナ
フチルアゾ)−3−(2−クロロ−5−オクタデセニル
スクシンイミドアニリノ)−5−ピラゾロン (カラー
ドマゼンタカプラー)、0.016gの層lで用いたD
IR化合物を溶解した0 、 95gのTCPを含有し
ている低感度緑感性乳剤層。Layer 4: 0.90 g of low-sensitivity green-sensitive silver iodobromide (containing 5 mol% silver iodide) emulsion color-sensitized to green sensitivity and 2.1 g
of gelatin and 0.8 g of 1-(2,4,6-trichlorophenyl)-3-([α-(2,4-di-t-amylphenoxy)-acetamido]benzamide)-5
- Pyrazolone (magenta coupler), 0.15 g 1
-(2°4.6-)lichlorophenyl)-4-(1-naphthylazo)-3-(2-chloro-5-octadecenylsuccinimideanilino)-5-pyrazolone (colored magenta coupler), 0. D used in layer 1 of 016g
A slow green-sensitive emulsion layer containing 0.95 g of TCP in which an IR compound was dissolved.
層5 :緑感性に色増感された1、7gの高感度緑感性
沃臭化銀乳剤(4モル%の沃化銀含有) 1−9gのゼ
ラチンならびに0.20gの層4で用いたマゼンタカプ
ラーおよび0.049gの層4で用いたカラードマゼン
タカプラーを溶解した0、60gのDNPを含有してい
る高感度緑感性乳剤層。Layer 5: 1.7 g of a highly sensitive green-sensitive silver iodobromide emulsion (containing 4 mol% silver iodide) color sensitized to green; 1-9 g of gelatin and 0.20 g of magenta used in layer 4; A high speed green sensitive emulsion layer containing 0.60 g of DNP dissolved in the coupler and 0.049 g of the colored magenta coupler used in layer 4.
層6 : 0.15gの黄色コロイド銀、0.2gの
汚染防止剤(層3に含有と同じもの)を溶解した0、1
1gのDBPおよび1.5gのゼラチンを含有するイエ
ローフィルター層。Layer 6: 0,1 dissolved in 0.15g yellow colloidal silver, 0.2g antifouling agent (same as contained in layer 3)
Yellow filter layer containing 1 g DBP and 1.5 g gelatin.
層7 :青感性に色増感された0、25gの低感度青感
性沃臭化銀乳剤(沃化銀4モル%含有)および1.9g
のゼラチンならび搭1.5gのa−ピバロイル−(l−
ベンジル−2−7エニルー3,5−ジオキソイミダゾリ
ジン−4−イル)−27−クロロ−5’−[(a−ドデ
シルオキシカルボニル)エトキシカルボニル]アセドア
ニライド(イエローカプラー)を溶解した0、6gのT
CPを含有している低感度赤感性乳剤層。Layer 7: 0.25 g of low-speed blue-sensitive silver iodobromide emulsion (containing 4 mol% silver iodide) color-sensitized to blue sensitivity and 1.9 g
of gelatin and 1.5 g of a-pivaloyl (l-
0.6 g of benzyl-2-7enyl-3,5-dioxoimidazolidin-4-yl)-27-chloro-5'-[(a-dodecyloxycarbonyl)ethoxycarbonyl]acedoanilide (yellow coupler) dissolved in T
A low-speed red-sensitive emulsion layer containing CP.
層8 :青感性に色増感された0、9gの高感度青感性
沃臭化銀乳剤(2モル%の沃化銀含有)、1.5gのゼ
ラチンならびに1.30gの層7で用いたイエローカプ
ラーを溶解した0、65gのTCPを含有している高感
度青感性乳剤層。Layer 8: 0.9 g of highly sensitive blue-sensitive silver iodobromide emulsion (containing 2 mole % silver iodide), color sensitized to blue, 1.5 g of gelatin and 1.30 g used in layer 7 A high-speed blue-sensitive emulsion layer containing 0.65 g of TCP in which a yellow coupler was dissolved.
層9 : 2.3gのゼラチン、o、1gの本発明の
例示化合物または比較化合物を含有する保護層。尚、そ
れぞれの層には硬膜剤、延展剤を加えた。Layer 9: Protective layer containing 2.3 g of gelatin, 1 g of exemplified compound of the invention or comparative compound. A hardening agent and a spreading agent were added to each layer.
以上のようにして作成した試料を23℃、23%RHの
下で12時間調整し、同一空調条件の暗室内において試
料をゴムローラ、ナイロンローラで摩擦した後、以下の
現像処理を行いスタチックマークの度合いを実施例1と
同様の方法で判定した。The sample prepared as described above was conditioned for 12 hours at 23°C and 23% RH, and the sample was rubbed with a rubber roller and a nylon roller in a dark room with the same air conditioning conditions.Then, the following development process was performed to create a static mark. The degree of this was determined in the same manner as in Example 1.
なお、摩擦係数による評価としてT、 Anvelt、
J。In addition, as an evaluation based on the friction coefficient, T, Anvelt,
J.
F、carroll、 JR,and L、J、Sug
den J、SMPTE、 80(9)734〜739
(1971)に記載のペーパークリップ法を用いて、塗
布後のフィルム表面の最大静摩擦係数を求めた。値が小
さい程フィルム面の摩擦が少ないことを意味する。F, carroll, JR, and L, J, Sug.
den J, SMPTE, 80(9)734-739
(1971), the maximum static friction coefficient of the film surface after coating was determined. A smaller value means less friction on the film surface.
また、塗布ムラ及び1112当りのハジキ数を調べた。In addition, coating unevenness and the number of repellents per 1112 were investigated.
塗布ムラは巾30cm x長さ100cmの試料を濃度
1.0になるように均一露光し以下の現像処理を行い、
塗布性能を実施例1と同様の方法で判定した。For coating unevenness, a sample of width 30 cm x length 100 cm was exposed uniformly to a density of 1.0, and the following development process was performed.
Coating performance was determined in the same manner as in Example 1.
r現像処理処方] 処理時間発色現像
3分15秒(38℃)漂 白
6分30秒水 洗
3分15秒定 着
6分30秒水 洗
3分15秒安定浴 3分15秒
各処理工程において使用した処理液組成は下記の如くで
あった。rDevelopment treatment prescription] Processing time Color development
Bleach for 3 minutes 15 seconds (38℃)
Wash with water for 6 minutes and 30 seconds
Fixed for 3 minutes and 15 seconds
Wash with water for 6 minutes and 30 seconds
Stabilization bath for 3 minutes and 15 seconds The composition of the treatment liquid used in each treatment step was as follows.
[発色現像液]
ニトリロ=酢酸ナトリウム 1.0g亜硫酸
ナトリウム 460g炭酸ナトリウ
ム 30.0g臭化カリウム
1.4gヒドロキシルアミン硫酸
塩 2.4g4−(N−エチル−N−β−ヒ
ドロキシエチルアミノ)−2−メチルアニリン硫酸塩
4.5g水を加えて1aとする。[Color developer] Nitrilo = Sodium acetate 1.0g Sodium sulfite 460g Sodium carbonate 30.0g Potassium bromide
1.4g hydroxylamine sulfate 2.4g 4-(N-ethyl-N-β-hydroxyethylamino)-2-methylaniline sulfate
Add 4.5g water to make 1a.
[漂白液]
臭化アンモニウム 160.0gアン
モニア水(28%’) 25.0■a
エチレンジアミン四酢酸ナトリウム鉄塩130.0g
14、hI2
氷酢酸
水を加えて11とする。[Bleach solution] Ammonium bromide 160.0g Aqueous ammonia (28%') 25.0a
Ethylenediaminetetraacetic acid sodium iron salt 130.0 g 14, hI2 Add glacial acetic acid water to make 11.
[定着液] テトラポリリン酸ナトリウム 亜硫酸ナトリウム チオ硫酸アンモニウム(70%) 重亜硫酸ナトリウム 水を加えて112とす−る。[Fixer] Sodium tetrapolyphosphate sodium sulfite Ammonium thiosulfate (70%) sodium bisulfite Add water to make 112.
[安定化液1 ホルマリン(37%水溶液) 水を加えてiffとする。[Stabilizing liquid 1 Formalin (37% aqueous solution) Add water to make if.
2.0g
4.0g
175.0mff
4.6g
8.0a+12
上記の表−2の結果からも明らかなように、本発明の実
施によってカラー用多層フィルムの場合にも帯電防止性
能、塗布性能およびフィルム表面の摩擦性が改良されて
いることがわかる。2.0g 4.0g 175.0mff 4.6g 8.0a+12 As is clear from the results in Table 2 above, the implementation of the present invention improves antistatic performance, coating performance, and film performance even in the case of color multilayer films. It can be seen that the surface friction properties have been improved.
以上述べたように本発明は、帯電防止剤として一般式〔
I〕および/または(II)で示される化合物を写真感
光材料に添加することにより、塗布性能も良好で、写真
特性に悪影響を及ぼすことなく優れた帯電防止性能を有
したハロゲン化銀写真感光材料を得ることができる。As described above, the present invention uses the general formula [
A silver halide photographic material which has good coating performance and excellent antistatic performance without adversely affecting photographic properties by adding a compound represented by [I] and/or (II) to the photographic material. can be obtained.
さらに両者を併用することによって、帯電防止性能と併
せてフィルム表面の摩擦係数の小さいハロゲン化銀写真
感光材料を提供することができる。Furthermore, by using both in combination, it is possible to provide a silver halide photographic material that has antistatic properties and a small coefficient of friction on the film surface.
Claims (1)
かつ下記一般式〔 I 〕及び/又は一般式〔II〕で表さ
れる化合物から選ばれる少なくとも一つを含有すること
を特徴とするハロゲン化銀写真感光材料。 一般式〔 I 〕 ▲数式、化学式、表等があります▼ 一般式〔II〕 〔但し、式中R_1は炭素数4〜18のアルキル基、ア
ルケニル基、もしくはアラルキル基を表す。 R^2は水素原子又は炭素数4〜18のアルキル基、ア
ルケニル基、もしくはアラルキル基を表す。 R^3、R^5は水素原子又は炭素数1〜3のアルキル
基を表す。 R^4は炭素数8〜30のアルキル基、アルケニル基、
アルキルアリール基、もしくはアラルキルアリール基を
表す。Aは炭素数2〜4のアルキレン基、もしくは置換
アルキレン基、nは1〜200、mは0〜100の整数
を表す。 Mは水素原子、アルカリ金属原子、アンモニウム基また
はアルカノールアミン基を表す。 lは1又は2で、l−1のときYは上述のMと同義であ
る。 l−2のときYは▲数式、化学式、表等があります▼を
表し、Aおよびnは上述と同義である。〕[Claims] Having at least one hydrophilic colloid layer on a support,
A silver halide photographic material characterized by containing at least one compound selected from the following general formula [I] and/or general formula [II]. General formula [I] ▲ Numerical formulas, chemical formulas, tables, etc. are available▼ General formula [II] [However, in the formula, R_1 represents an alkyl group, alkenyl group, or aralkyl group having 4 to 18 carbon atoms. R^2 represents a hydrogen atom or an alkyl group having 4 to 18 carbon atoms, an alkenyl group, or an aralkyl group. R^3 and R^5 represent a hydrogen atom or an alkyl group having 1 to 3 carbon atoms. R^4 is an alkyl group or alkenyl group having 8 to 30 carbon atoms,
Represents an alkylaryl group or an aralkylaryl group. A represents an alkylene group having 2 to 4 carbon atoms or a substituted alkylene group, n represents an integer of 1 to 200, and m represents an integer of 0 to 100. M represents a hydrogen atom, an alkali metal atom, an ammonium group or an alkanolamine group. l is 1 or 2, and when l-1, Y has the same meaning as M above. When l-2, Y represents ▲There are mathematical formulas, chemical formulas, tables, etc.▼, and A and n have the same meanings as above. ]
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20663688 | 1988-08-19 | ||
JP63-206636 | 1988-08-19 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH02256048A true JPH02256048A (en) | 1990-10-16 |
Family
ID=16526642
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11585889A Pending JPH02256048A (en) | 1988-08-19 | 1989-05-08 | Antistatic silver halide photographic sensitive material |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02256048A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2002057320A1 (en) * | 2000-12-28 | 2002-07-25 | Asahi Denka Co., Ltd. | Surfactants |
JP2021188000A (en) * | 2020-06-02 | 2021-12-13 | 第一工業製薬株式会社 | Water dispersion, coating agent for metal and coating film |
JP2021187996A (en) * | 2020-06-02 | 2021-12-13 | 第一工業製薬株式会社 | Aqueous dispersion, coating agent for metal, and coating |
JP2021187997A (en) * | 2020-06-02 | 2021-12-13 | 第一工業製薬株式会社 | Aqueous dispersion, coating agent for metal, and coating |
-
1989
- 1989-05-08 JP JP11585889A patent/JPH02256048A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2002057320A1 (en) * | 2000-12-28 | 2002-07-25 | Asahi Denka Co., Ltd. | Surfactants |
US6841655B1 (en) | 2000-12-28 | 2005-01-11 | Asahi Denka Co., Ltd. | Surfactants |
JP2021188000A (en) * | 2020-06-02 | 2021-12-13 | 第一工業製薬株式会社 | Water dispersion, coating agent for metal and coating film |
JP2021187996A (en) * | 2020-06-02 | 2021-12-13 | 第一工業製薬株式会社 | Aqueous dispersion, coating agent for metal, and coating |
JP2021187997A (en) * | 2020-06-02 | 2021-12-13 | 第一工業製薬株式会社 | Aqueous dispersion, coating agent for metal, and coating |
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