JPH07120818B2 - Light emitting diode - Google Patents

Light emitting diode

Info

Publication number
JPH07120818B2
JPH07120818B2 JP8790886A JP8790886A JPH07120818B2 JP H07120818 B2 JPH07120818 B2 JP H07120818B2 JP 8790886 A JP8790886 A JP 8790886A JP 8790886 A JP8790886 A JP 8790886A JP H07120818 B2 JPH07120818 B2 JP H07120818B2
Authority
JP
Japan
Prior art keywords
light emitting
well
emitting diode
led
width
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP8790886A
Other languages
Japanese (ja)
Other versions
JPS62245687A (en
Inventor
誠 森岡
友義 三島
淳一 葛西
良史 片山
靖寛 白木
良昌 村山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP8790886A priority Critical patent/JPH07120818B2/en
Priority to EP86304772A priority patent/EP0207699A3/en
Publication of JPS62245687A publication Critical patent/JPS62245687A/en
Publication of JPH07120818B2 publication Critical patent/JPH07120818B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Led Devices (AREA)

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、発光素子に係り、特に発光領域に多重量子井
戸構造を有する発光ダイオードに関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a light emitting device, and more particularly to a light emitting diode having a multiple quantum well structure in a light emitting region.

〔従来の技術〕[Conventional technology]

従来の発光ダイオード(以下LEDと言う)は、同一材料
のpn接合からなる構造、又は、pn接合の片側あるいは発
光領域の両側をエネルギバンドギヤツプの大きい材料で
構成したシングルヘテロ,ダブルヘテロ構造で実現して
いた。近年、LEDの発光領域での発光再結合の効率をよ
り向上できる構造として、この発光領域にエネルギバン
ドギヤツプの大きい材料で、エネルギバンドギヤツプの
小さい材料の薄層を多層に亘りはさんだ、多重量子井戸
構造のものがエレクトロニクス・レダーズ,第19巻,第
6号,1983年3月17日刊(Electronics Letters,vol.19,
No.6,17th March(1983))等に提案されている。
A conventional light emitting diode (hereinafter referred to as an LED) has a structure composed of a pn junction made of the same material, or a single hetero structure or a double hetero structure having a material having a large energy band gap on one side of the pn junction or both sides of the light emitting region. Was realized in. In recent years, as a structure that can further improve the efficiency of radiative recombination in the light emitting region of an LED, a thin layer of a material having a large energy band gap and a material having a small energy band gap is formed in multiple layers in the light emitting region. Sanda, Multi-quantum well structure, Electronics Redders, Vol. 19, No. 6, published March 17, 1983 (Electronics Letters, vol.19,
No.6, 17th March (1983)).

〔発明が解決しようとする問題点〕[Problems to be solved by the invention]

本発明は、発光領域に多重量子井戸構造を用いたLEDに
おいて、最も発光効率の良い井戸巾を有するLEDを提供
することにある。
An object of the present invention is to provide an LED using a multiple quantum well structure in the light emitting region and having a well width with the highest luminous efficiency.

〔問題点を解決するための手段と作用〕[Means and Actions for Solving Problems]

第2図は、GaAs/Al0.3Ga0.7As多重量子井戸において、
バリア層であるAl0.3Ga0.7Asの巾を一定にし、GaAsの巾
を変えた時の各井戸巾におけるフオトルミネツセンス
(Photoluminesence:PL)強度IPLの励起強度Iex依存性
を示したものである。第3図は、PLの励起光強度の依存
性(IPL∝Im ex)、すなわち勾配m(対数表示の比例定
数)の井戸巾依存性について示したものである。励起光
量、即ちLEDのキヤリア注入量に対して、井戸巾により
m=1とm=2の間で振動していることがわかる。より
発光効率の良い多重量子井戸LEDを製作するためには、
m=1の井戸巾となる様に井戸巾を製作する必要があ
る。m=2の時の物理的イメージは、井戸中に離散的に
形成されたレベルのうち最も高エネルギ(コンダクシヨ
ン・バンド中の)のレベルが、バリア層のコンダクシヨ
ン・バンドの底と一致した状態に相当し、m=1では、
この井戸中の最も高エネルギレベルの位置が上記バリア
層の底よりも充分深い位置にある時に相当する。
Figure 2 shows GaAs / Al 0.3 Ga 0.7 As multiple quantum wells.
Dependence of excitation intensity I ex on photoluminesence (PL) intensity I PL in each well width when the width of Al 0.3 Ga 0.7 As, which is the barrier layer, is made constant and the width of GaAs is changed. Is. FIG. 3 shows the dependence of the PL excitation light intensity (I PL ∝I m ex ), that is, the well width dependence of the slope m (proportional constant in logarithmic representation). It can be seen that the amount of excitation light, that is, the amount of carrier injected into the LED, oscillates between m = 1 and m = 2 depending on the well width. In order to manufacture a multiple quantum well LED with higher luminous efficiency,
It is necessary to manufacture the well width so that the well width is m = 1. The physical image when m = 2 is that the highest energy level (in the conduction band) among the discretely formed levels in the well matches the bottom of the conduction band in the barrier layer. Correspondingly, when m = 1,
This corresponds to the case where the position of the highest energy level in this well is deeper than the bottom of the barrier layer.

〔実施例〕〔Example〕

以下、本発明の実施例により詳細に説明する。 Hereinafter, examples of the present invention will be described in detail.

第1図は、本発明のLEDの構造を示したものである。図
中(1)はn側オーミックコンタクト電極、(2)はn+
−GaAs基板、(3)はn+−Al0.3Ga0.7As層である。
(4)と(5)はノンドープのGaAsとノンドープAl0.3G
a0.7Asの多重量子井戸の発光領域であり、GaAsの1層の
厚さは第3図に示したm1の値となる内の75Åに、バ
リア層であるAl0.3Ga0.7Asの1層の厚さは300Åにして
ある。本実施例のLEDでは、GaAs4層、Al0.3Ga0.7As5層
とした。(6)はp+−Al0.3Ga0.7As層、(7)はオーミ
ツクコンタクト用のp+−GaAs、(8)はp側オーミツク
コンタクト電極である。本実施例のLED構造は、分子線
エピタキシー(Molecular Beam Epitaxy:MBE)で作つ
た。このLEDは、p側コンタクト電極に電源の+側を、
n側コンタクト電極に電源の一側を接続して、多重量子
井戸領域で発光させ、光取出し用ウインドー(9)から
光10を取出す。このウインド領域(9)の下のオーミツ
クコンタクト用p+−GaAsは取出しのために、勿論エツチ
ング除去してある。
FIG. 1 shows the structure of the LED of the present invention. In the figure, (1) is an n-side ohmic contact electrode, (2) is n +
-GaAs substrate, (3) is a n + -Al 0.3 Ga 0.7 As layer.
(4) and (5) are undoped GaAs and undoped Al 0.3 G
It is a light emitting region of a 0.7 As multiple quantum well, and the thickness of one layer of GaAs is 75 Å within the value of m1 shown in Fig. 3, and one layer of Al 0.3 Ga 0.7 As which is a barrier layer. The thickness is 300Å. In the LED of this example, a GaAs4 layer and an Al 0.3 Ga 0.7 As 5 layer were used. (6) is a p + -Al 0.3 Ga 0.7 As layer, (7) is p + -GaAs for ohmic contact, and (8) is a p-side ohmic contact electrode. The LED structure of this example was made by molecular beam epitaxy (MBE). In this LED, the + side of the power supply is connected to the p-side contact electrode,
One side of the power source is connected to the n-side contact electrode to emit light in the multiple quantum well region, and the light 10 is extracted from the light extraction window (9). The ohmic contact p + -GaAs under the window region (9) is of course removed by etching for extraction.

本LEDの光出力は、駆動電流50mAの時、1.5mWであつた。
この値は、同じ構造でウエルの巾の最適化をはからなか
つたものに比べ、約1.5倍の出力を得ることが出来た。
The light output of this LED was 1.5 mW at a drive current of 50 mA.
With this value, we were able to obtain about 1.5 times the output of the same structure without optimizing the width of the well.

〔発明の効果〕〔The invention's effect〕

本発明によれば、最も発光効率の良い井戸巾で、多重量
子井戸形のLEDが製作でき、LEDのより低電流駆動が出来
るという大きな効果がある。
According to the present invention, a multi-quantum well type LED can be manufactured with a well width having the highest luminous efficiency, and there is a great effect that the LED can be driven at a lower current.

【図面の簡単な説明】[Brief description of drawings]

第1図は、多重量子井戸LEDの構造を示す斜視図、第2
図は、PLにおける励起光量と発光強度の関係を示す図、
第3図は井戸巾と励起光量に対する発光強度の依存性の
勾配係数と井戸巾との関係を示す図である。 1……n側電極、2……n+−GaAs基板、3……n+−GaAl
As、4……アンドープGaAlAsバリア、5……アンドープ
GaAsウエル、6……p+−GaAlAs、7……p+−GaAs、8…
…p側電極、9……光取り出し用窓、10……発光光。
FIG. 1 is a perspective view showing the structure of a multiple quantum well LED, and FIG.
The figure shows the relationship between the amount of excitation light and the emission intensity in PL,
FIG. 3 is a diagram showing the relationship between the well width and the well width and the gradient coefficient of the dependence of the emission intensity on the amount of excitation light. 1 ... n side electrode, 2 ... n + -GaAs substrate, 3 ... n + -GaAl
As, 4 ... Undoped GaAlAs barrier, 5 ... Undoped
GaAs well, 6 ... p + -GaAlAs, 7 ... p + -GaAs, 8 ...
… P-side electrode, 9 …… Light extraction window, 10 …… Emitted light.

フロントページの続き (72)発明者 片山 良史 東京都国分寺市東恋ヶ窪1丁目280番地 株式会社日立製作所中央研究所内 (72)発明者 白木 靖寛 東京都国分寺市東恋ヶ窪1丁目280番地 株式会社日立製作所中央研究所内 (72)発明者 村山 良昌 東京都国分寺市東恋ヶ窪1丁目280番地 株式会社日立製作所基礎研究所内Front page continued (72) Inventor Yoshifumi Katayama 1-280 Higashi Koigakubo, Kokubunji, Tokyo Inside Hitachi Central Research Laboratory (72) Inventor Yasuhiro Shiraki 1-280 Higashi Koigakubo, Kokubunji City, Tokyo Inside Hitachi Central Research Laboratory (72) Inventor Yoshimasa Murayama 1-280 Higashi Koigakubo, Kokubunji City, Tokyo Metropolitan Research Laboratories, Hitachi, Ltd.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】多重量子井戸形発光ダイオードにおいて、
井戸中に形成される離散したレベルの最も高いエネルギ
レベルの位置が、バリア層のコンダクシヨンバンドの底
と一致しない井戸巾となつていることを特徴とする発光
ダイオード。
1. A multi-quantum well light emitting diode comprising:
A light emitting diode characterized in that the position of the highest energy level of discrete levels formed in the well has a well width that does not coincide with the bottom of the conduction band of the barrier layer.
【請求項2】多重量子井戸形発光ダイオードにおいて、
その井戸中に形成され離散したエネルギレベルの最も高
いものが、量子井戸のコンダクシヨンバンドの底近傍に
なる様に井戸巾が設けられたことを特徴とする特許請求
の範囲第1項記載の発光ダイオード。
2. In a multiple quantum well type light emitting diode,
The light emission according to claim 1, wherein the well width is provided so that the highest discrete energy level formed in the well is near the bottom of the conduction band of the quantum well. diode.
JP8790886A 1985-06-28 1986-04-18 Light emitting diode Expired - Lifetime JPH07120818B2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP8790886A JPH07120818B2 (en) 1986-04-18 1986-04-18 Light emitting diode
EP86304772A EP0207699A3 (en) 1985-06-28 1986-06-20 Light-emitting element having multiquantum-well structure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8790886A JPH07120818B2 (en) 1986-04-18 1986-04-18 Light emitting diode

Publications (2)

Publication Number Publication Date
JPS62245687A JPS62245687A (en) 1987-10-26
JPH07120818B2 true JPH07120818B2 (en) 1995-12-20

Family

ID=13928012

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8790886A Expired - Lifetime JPH07120818B2 (en) 1985-06-28 1986-04-18 Light emitting diode

Country Status (1)

Country Link
JP (1) JPH07120818B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02189985A (en) * 1989-01-18 1990-07-25 Daido Steel Co Ltd Light emitting diode

Also Published As

Publication number Publication date
JPS62245687A (en) 1987-10-26

Similar Documents

Publication Publication Date Title
Chuang et al. Kinetic model for degradation of light-emitting diodes
JP3373561B2 (en) Light emitting diode
JP3290672B2 (en) Semiconductor light emitting diode
JPH0621511A (en) Semiconductor light emitting element
Craford Visible light-emitting diodes: past, present, and very bright future
JPH08222763A (en) Semiconductor light emitting element
JPH0738150A (en) Semiconductor light emitting device
US20090146163A1 (en) High brightness light emitting diode structure
Zinkiewicz et al. High‐power vertical‐cavity surface‐emitting AlGaAs/GaAs diode lasers
US5814838A (en) Light emitting semiconductor element with ZN doping
JP2000312031A (en) Semiconductor device
JP3406907B2 (en) Semiconductor light emitting diode
JP2885198B2 (en) P-type electrode structure and semiconductor light emitting device having the same
JPH07120818B2 (en) Light emitting diode
JP2000174331A (en) Semiconductor device
JP3449751B2 (en) Semiconductor light emitting device
JP2002033509A (en) Light emitting diode
JPH01264275A (en) Semiconductor light-emitting device
EP0207699A2 (en) Light-emitting element having multiquantum-well structure
JP2795885B2 (en) Semiconductor light emitting diode
JP3716483B2 (en) Light emitting diode
JP2937439B2 (en) Semiconductor light emitting device
CN111416278B (en) Epitaxial wafer and semiconductor laser
JP2001111105A (en) Light emitting diode
JP3242910B2 (en) Semiconductor light emitting device

Legal Events

Date Code Title Description
R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

EXPY Cancellation because of completion of term