JPH07114879A - Manufacture of porous ceramic thin plate for plasma display panel - Google Patents

Manufacture of porous ceramic thin plate for plasma display panel

Info

Publication number
JPH07114879A
JPH07114879A JP5284292A JP28429293A JPH07114879A JP H07114879 A JPH07114879 A JP H07114879A JP 5284292 A JP5284292 A JP 5284292A JP 28429293 A JP28429293 A JP 28429293A JP H07114879 A JPH07114879 A JP H07114879A
Authority
JP
Japan
Prior art keywords
thin plate
ceramic thin
plasma display
porous
display panel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP5284292A
Other languages
Japanese (ja)
Inventor
Noritatsu Sawada
昇龍 沢田
Shin Sato
伸 佐藤
Masanori Yanagawa
昌紀 梁川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JGC Corp
Original Assignee
JGC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by JGC Corp filed Critical JGC Corp
Priority to JP5284292A priority Critical patent/JPH07114879A/en
Publication of JPH07114879A publication Critical patent/JPH07114879A/en
Withdrawn legal-status Critical Current

Links

Landscapes

  • Manufacture Of Electron Tubes, Discharge Lamp Vessels, Lead-In Wires, And The Like (AREA)
  • Gas-Filled Discharge Tubes (AREA)

Abstract

PURPOSE:To manufacture a porous ceramic thin plate formed in thin plate thickness and thin wall thickness between fine holes further with high accuracy thereof for using in manufacturing a plasma display panel. CONSTITUTION:High purity alumina material powder of 0.5mum or less mean grain size is used to manufacture an alumirma ceramic thin plate 10 of 0.25mm or less thickness having 45kg/mm<2> or more strength. This ceramic thin plate is coated with a porous mask 14 formed of an elastic material, and by blowing grinding particles by a sandblasting method, fine holes 18 are high accurately drilled in the ceramic thin plate.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の目的】[Object of the Invention]

【産業上の利用分野】本発明は、プラズマ・ディスプレ
ー・パネル用の多孔性セラミック薄板の製造方法に関す
る。
FIELD OF THE INVENTION The present invention relates to a method of manufacturing a porous ceramic sheet for a plasma display panel.

【0002】[0002]

【従来の技術】次世代テレビとして期待されている壁掛
け型のテレビのディスプレーには種々の方式が検討され
ており、プラズマ・ディスプレー・パネル(PDP)は
その1つである。PDPは、誘電体の薄板に多数の微細
孔を規則的に形成し、夫々の微細孔にガスを封入した上
で電極マトリックスを配置して放電セルを形成し、ガラ
ス板で挟持したものである。一般的なサイズのPDPに
おいては、放電セルの直径は約0.55mm、セル間の
距離(芯々距離)は約0.7mmであり、従って、セル
間の最小壁厚は約0.15mmである。
2. Description of the Related Art Various systems have been studied for display of a wall-mounted television expected as a next-generation television, and a plasma display panel (PDP) is one of them. A PDP is one in which a large number of fine holes are regularly formed in a thin dielectric plate, a gas is filled in each fine hole, and an electrode matrix is arranged to form a discharge cell, which is sandwiched between glass plates. . In a PDP of a general size, the diameter of the discharge cell is about 0.55 mm, the distance between the cells (core-to-core distance) is about 0.7 mm, and therefore the minimum wall thickness between the cells is about 0.15 mm. .

【0003】PDPの放電セルの形成に用いる多孔性誘
電体薄板には、板厚が薄いこと(0.2mm程度)、セ
ル間距離の精度が高いこと、絶縁性に優れていること、
耐熱性に優れていること、などが要求される。
The porous dielectric thin plate used for forming the discharge cell of the PDP has a small plate thickness (about 0.2 mm), a high accuracy of the distance between cells, and an excellent insulating property.
It is required to have excellent heat resistance.

【0004】絶縁性と耐熱性の見地からは、PDP用多
孔性誘電体薄板の素材としてはセラミックが適している
が、靭性の少ないセラミックの薄板に放電セル用の多数
の微細孔を高精度の微小間隔で形成するには技術的な困
難があり、PDP用の多孔性誘電体薄板をセラミックで
形成することは今日に至るまで実現されていない。
From the viewpoint of insulation and heat resistance, ceramic is suitable as a material for the porous dielectric thin plate for PDP, but a large number of fine holes for discharge cells are formed on the thin ceramic plate having low toughness with high precision. It is technically difficult to form them at minute intervals, and it has not been realized to date that the porous dielectric thin plate for PDP is formed of ceramics.

【0005】即ち、多孔性セラミック板を製造するため
の汎用の加工技術としては、レーザー加工法、パンチン
グ法、サンドブラスト法が知られている。
That is, a laser processing method, a punching method, and a sandblasting method are known as general-purpose processing techniques for producing a porous ceramic plate.

【0006】レーザー加工法は、炭酸ガスレーザーなど
によりセラミック板に孔を開けるものであるが、PDP
用多孔性薄板においては前述したように微細孔間の壁厚
が非常に薄い(即ち、約0.15mm)ので、加工時の
熱ショックでセラミック薄板が割れるという問題があ
り、PDP用多孔性薄板の製造には適用することができ
ない。
In the laser processing method, a hole is made in a ceramic plate by a carbon dioxide laser or the like.
The porous thin plate for PDP has a problem that the ceramic thin plate is cracked by the heat shock during processing because the wall thickness between the micropores is very thin (that is, about 0.15 mm) as described above. Can not be applied to the manufacture of.

【0007】パンチング法は、焼成前のグリーンシート
に金型を用いて機械的に孔を開け、その後焼成するもの
であるが、焼成時の収縮が大きいので、高精度の孔間公
差が要求されるPDP用セラミック薄板を製作すること
ができない。
In the punching method, holes are mechanically formed in a green sheet before firing using a die, and then firing is performed. However, since shrinkage during firing is large, a highly accurate hole-tolerance is required. It is impossible to manufacture a thin ceramic plate for PDP.

【0008】サンドブラスト法は、例えば特開昭62-251
073号および特開平1-295764号に開示されたように、研
削性の粒子を吹き付けることによりセラミック板に穿孔
するものであるが、PDP用多孔性薄板の場合には板厚
が薄く(0.2mm程度)、しかも、微細孔間の壁厚が
薄いので、同様にセラミック薄板が割れてしまい、PD
P用多孔性薄板の製造にそのまゝ応用することができな
かった。
The sandblast method is disclosed in, for example, Japanese Patent Laid-Open No. 62-251.
As disclosed in 073 and JP-A 1-295764, a ceramic plate is perforated by spraying grindable particles, but in the case of a porous thin plate for PDP, the plate thickness is thin (0. (About 2 mm), and because the wall thickness between the fine holes is thin, the ceramic thin plate is also cracked and the PD
It could not be applied as it is to the production of porous thin plates for P.

【0009】[0009]

【発明が解決しようとする課題】本発明の目的は、板厚
が薄く、微細孔間の壁厚が薄く、かつ、高精度の孔間公
差を備えたプラズマ・ディスプレー・パネル(PDP)
用多孔性セラミック薄板を製造することの可能な方法を
提供することにある。
SUMMARY OF THE INVENTION An object of the present invention is to provide a plasma display panel (PDP) having a small plate thickness, a small wall thickness between fine holes, and a highly accurate hole tolerance.
It is an object of the present invention to provide a method capable of manufacturing a porous ceramic thin plate for use.

【0010】[0010]

【発明の構成】[Constitution of the invention]

【課題を解決するための手段および作用】本発明のプラ
ズマ・ディスプレー・パネル用多孔性セラミック薄板の
製造方法は、平均粒径0.5μm以下の高純度アルミナ
原料粉を用いて、45kg/mm以上の強度を有し厚
さ0.25mm以下のアルミナ・セラミック薄板を製作
し、このセラミック薄板に弾性材料からなる多孔性マス
クを被せ、サンドブラスト法により研削性粒子を吹き付
けることによりセラミック薄板に穿孔することを特徴と
するものである。
The method for producing a porous ceramic thin plate for a plasma display panel according to the present invention uses a high-purity alumina raw material powder having an average particle size of 0.5 μm or less and 45 kg / mm 2 Alumina-ceramic thin plate having the above strength and a thickness of 0.25 mm or less is manufactured, a porous mask made of an elastic material is covered on the ceramic thin plate, and the ceramic thin plate is perforated by spraying abrasive particles by a sandblast method. It is characterized by that.

【0011】平均粒径0.5μm以下の微細なアルミナ
粉を用いたことによりセラミック薄板の焼結密度を高め
ることができる。即ち、微細な気孔を少なくすることに
より、強度が45kg/mm以上の高強度のアルミナ
・セラミック薄板が得られる。このレベルの強度のセラ
ミック薄板は、板厚を0.25mm以下に薄くした場合
でも、サンドブラストの衝撃に耐えることができ、割れ
を生じることなく微細孔を加工することができる。
By using fine alumina powder having an average particle size of 0.5 μm or less, the sintering density of the ceramic thin plate can be increased. That is, by reducing fine pores, a high-strength alumina-ceramic thin plate having a strength of 45 kg / mm 2 or more can be obtained. The ceramic thin plate of this level of strength can withstand the impact of sandblasting even when the plate thickness is reduced to 0.25 mm or less, and can process fine holes without causing cracks.

【0012】マスクはポリウレタン・フォームのような
弾性材料により形成することができ、写真製版法により
PDPの放電セルのマトリックス・パターンに合わせて
高精度で微細孔を形成する。このマスクをセラミック薄
板に張り付け、研削性粒子を吹き付ける。研削性粒子と
しては、アルミナ系の研削材を用いることができる。研
削性粒子の吹き付けは、高圧のエアーにより行うことも
できるし、水を加えたスラリーの形で吹き付けてもよ
い。
The mask can be formed of an elastic material such as polyurethane foam, and fine holes are formed with high precision according to the matrix pattern of the discharge cell of the PDP by photolithography. The mask is attached to a ceramic thin plate and abrasive particles are sprayed. An alumina-based abrasive can be used as the abrasive particles. The abrasive particles can be sprayed with high-pressure air or in the form of a slurry containing water.

【0013】研削材の吹き付けに伴い、セラミック薄板
のうちマスクに覆われていない部分の材料は削り落とさ
れ、薄板に微細孔が穿孔される。マスクには高精度で微
細孔が形成してあるので、マスクを用いてサンドブラス
トを行うことにより、セラミック薄板の微細孔の孔間精
度を高めることができる。
Along with the spraying of the abrasive, the material of the portion of the ceramic thin plate which is not covered by the mask is scraped off and fine holes are punched in the thin plate. Since the fine holes are formed in the mask with high precision, the precision of the fine holes in the ceramic thin plate can be increased by performing sandblasting using the mask.

【0014】本発明の好ましい実施態様においては、大
型画面用のPDP用多孔性セラミック薄板を製造するた
め、複数枚のセラミック薄板を互いに隣接させて並置
し、斯く並置された複数枚のセラミック薄板に1枚の共
通のマスクを被せ、サンドブラスト加工を行う。
In a preferred embodiment of the present invention, in order to produce a porous ceramic thin plate for a PDP for a large screen, a plurality of ceramic thin plates are juxtaposed adjacent to each other, and thus a plurality of juxtaposed ceramic thin plates are formed. A common mask is covered and sandblasting is performed.

【0015】[0015]

【実施例】平均粒径0.5μm以下の高純度アルミナ原
料粉に分散剤とバインダーと可塑剤を加え、混合、分
散、粘度調整した後、ドクターブレードを用いてグリー
ンシートを製作した。このグリーンシートを焼成し、4
5kg/mm以上の3点曲げ強度を有する厚さ0.2
5mmのアルミナ・セラミック薄板10を得た。
Example A dispersant, a binder, and a plasticizer were added to a high-purity alumina raw material powder having an average particle size of 0.5 μm or less, mixed, dispersed, and adjusted in viscosity, and then a green sheet was manufactured using a doctor blade. Burn this green sheet and
Thickness having a 3-point bending strength of 5 kg / mm 2 or more 0.2
A 5 mm alumina ceramic thin plate 10 was obtained.

【0016】次に、図1に示したように、ポリウレタン
・フォームに、写真製版法により直径約0.55mmの
微細孔12を約0.7mmのピッチで形成し、マスク1
4を製作した。このマスク14を図1に示したようにセ
ラミック薄板10に張り付け、サンドブラスト装置のノ
ズル16から高圧エアーと共にアルミナ系研削粒子を吹
き付けた。同様に、セラミック薄板10の裏面にもマス
ク14を張り付け、裏面からもサンドブラスト加工を行
なった。
Next, as shown in FIG. 1, fine holes 12 having a diameter of about 0.55 mm are formed at a pitch of about 0.7 mm on a polyurethane foam by a photolithography method, and a mask 1 is formed.
I made 4. This mask 14 was attached to the ceramic thin plate 10 as shown in FIG. 1, and alumina-based abrasive particles were blown together with high pressure air from a nozzle 16 of a sandblasting device. Similarly, a mask 14 was attached to the back surface of the ceramic thin plate 10 and sandblasting was performed from the back surface.

【0017】研削粒子の吹き付けに伴い、セラミック薄
板10のうちマスク14で覆われていない部分は研削さ
れ、マスク14の微細孔12のパターンに応じた微細孔
18が穿孔され、PDP用多孔性セラミック薄板20が
得られた。この薄板20をダイシング・ソーで適当な寸
法・形状に切断し、最終製品を得た。
Along with the spraying of the grinding particles, the portion of the ceramic thin plate 10 which is not covered with the mask 14 is ground, and the fine holes 18 corresponding to the pattern of the fine holes 12 of the mask 14 are punched to form a porous ceramic for PDP. A thin plate 20 was obtained. This thin plate 20 was cut into an appropriate size and shape with a dicing saw to obtain a final product.

【0018】比較例として、粒径約2μmのアルミナ粉
を用いて同様の条件で厚さ0.25mmのアルミナ・セ
ラミック薄板を製作し、同一のマスクを用いてサンドブ
ラスト加工を行ったところ、加工の途中で薄板に割れが
発生し、微細孔を貫通させることができなかった。明ら
かに、セラミック薄板の強度が不充分であったためであ
ると考えられる。
As a comparative example, an alumina-ceramic thin plate having a thickness of 0.25 mm was manufactured under the same conditions using alumina powder having a particle size of about 2 μm, and sandblasting was performed using the same mask. The thin plate was cracked on the way and the fine holes could not be penetrated. Apparently, this is because the strength of the ceramic thin plate was insufficient.

【0019】図2は、大型画面用のPDP用多孔性セラ
ミック薄板を製造するに好適な本発明の他の実施例を示
す。図示したように、例えば6枚のセラミック薄板10
を互いに隣接させて並置し、ワックスなどで固定する。
この上に1枚の大型サイズのマスクを被せ、ノズル16
を走査しながら研削性粒子を吹き付ける。このようにす
れば、大型サイズであっても、精度の高いPDP用多孔
性セラミック薄板を得ることができる。
FIG. 2 shows another embodiment of the present invention suitable for producing a porous ceramic thin plate for a PDP for a large screen. As shown, for example, six ceramic thin plates 10
Are juxtaposed adjacent to each other and fixed with wax or the like.
A large-sized mask is put on this, and the nozzle 16
The abrasive particles are sprayed while scanning. By doing so, it is possible to obtain a highly accurate porous ceramic thin plate for PDP even with a large size.

【0020】[0020]

【発明の効果】本発明の方法によれば、薄いセラミック
板を破壊させることなく高精度で微細孔を穿孔すること
ができるので、プラズマ・ディスプレー・パネル(PD
P)の製作に適した多孔性セラミック薄板を実現するこ
とができる。
According to the method of the present invention, fine holes can be formed with high precision without destroying a thin ceramic plate, so that a plasma display panel (PD) can be formed.
It is possible to realize a porous ceramic thin plate suitable for manufacturing P).

【0021】また、本発明の好適な実施態様によれば、
大型サイズのプラズマ・ディスプレー・パネルに用いる
ことの可能な高精度の多孔性セラミック薄板を得ること
ができる。
According to a preferred embodiment of the present invention,
It is possible to obtain a highly accurate porous ceramic thin plate that can be used for a large size plasma display panel.

【図面の簡単な説明】[Brief description of drawings]

【図1】図1は、本発明の方法を示す1部切欠き斜視図
である。
FIG. 1 is a partial cutaway perspective view showing the method of the present invention.

【図2】図2は、本発明の好適な実施態様に従い複数の
セラミックを並置したところを示す。
FIG. 2 shows a plurality of ceramics juxtaposed in accordance with a preferred embodiment of the present invention.

【符号の説明】[Explanation of symbols]

10: セラミック薄板 12: マスクの微細孔 14: 多孔性マスク 18: セラミック薄板の微細孔 20: プラズマ・ディスプレー・パネル用多孔性セラ
ミック薄板
10: Ceramic thin plate 12: Micropores of mask 14: Porous mask 18: Micropores of ceramic thin plate 20: Porous ceramic thin plate for plasma display panel

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 平均粒径0.5μm以下のアルミナ粉を
用いて、45kg/mm2以上の強度を有する厚さ0.2
5mm以下の緻密なアルミナ・セラミック薄板を製作
し、前記セラミック薄板に弾性材料からなる多孔性マス
クを被せ、研削性粒子を吹き付けることによりセラミッ
ク薄板に穿孔することを特徴とするプラズマ・ディスプ
レー・パネル用多孔性セラミック薄板の製造方法。
1. Alumina powder having an average particle size of 0.5 μm or less and a thickness of 0.2 having a strength of 45 kg / mm 2 or more.
For a plasma display panel, characterized in that a dense alumina ceramic thin plate of 5 mm or less is manufactured, a porous mask made of an elastic material is covered on the ceramic thin plate, and abrasive particles are sprayed to perforate the ceramic thin plate. A method for manufacturing a porous ceramic thin plate.
【請求項2】 大型画面用のプラズマ・ディスプレー・
パネル用多孔性セラミック薄板を製造するため、複数枚
の前記セラミック薄板を互いに隣接させて並置し、斯く
並置された複数枚のセラミック薄板に1枚の共通の前記
マスクを被せ、研削性粒子を吹き付けることを特徴とす
る請求項1に基づくプラズマ・ディスプレー・パネル用
多孔性セラミック薄板の製造方法。
2. A plasma display for a large screen.
In order to manufacture a porous ceramic thin plate for a panel, a plurality of the ceramic thin plates are juxtaposed adjacent to each other, a plurality of the ceramic thin plates thus juxtaposed are covered with one common mask, and abrasive particles are sprayed. A method of manufacturing a porous ceramic thin plate for a plasma display panel according to claim 1.
JP5284292A 1993-10-19 1993-10-19 Manufacture of porous ceramic thin plate for plasma display panel Withdrawn JPH07114879A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5284292A JPH07114879A (en) 1993-10-19 1993-10-19 Manufacture of porous ceramic thin plate for plasma display panel

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5284292A JPH07114879A (en) 1993-10-19 1993-10-19 Manufacture of porous ceramic thin plate for plasma display panel

Publications (1)

Publication Number Publication Date
JPH07114879A true JPH07114879A (en) 1995-05-02

Family

ID=17676645

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5284292A Withdrawn JPH07114879A (en) 1993-10-19 1993-10-19 Manufacture of porous ceramic thin plate for plasma display panel

Country Status (1)

Country Link
JP (1) JPH07114879A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6464905B1 (en) * 2000-05-22 2002-10-15 Benq Corporation Method of performing a uniform illumination pattern in a back-light plate using sand-blasting
EP4099131A3 (en) * 2021-05-31 2023-02-22 Samsung Display Co., Ltd. Supporting member for a display device, display device comprising the same, and methods for manufacturing a supporting member and a display device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6464905B1 (en) * 2000-05-22 2002-10-15 Benq Corporation Method of performing a uniform illumination pattern in a back-light plate using sand-blasting
EP4099131A3 (en) * 2021-05-31 2023-02-22 Samsung Display Co., Ltd. Supporting member for a display device, display device comprising the same, and methods for manufacturing a supporting member and a display device
US11681330B2 (en) 2021-05-31 2023-06-20 Samsung Display Co., Ltd. Supporting member for display device, display device comprising the same, and method for manufacturing thereof
US12050491B2 (en) 2021-05-31 2024-07-30 Samsung Display Co., Ltd. Supporting member for display device, display device comprising the same, and method for manufacturing thereof

Similar Documents

Publication Publication Date Title
EP0599595B1 (en) Ceramic electronic device and method of producing the same
US20060035194A1 (en) Ceramic setter plate and method for manufacturing multilayer ceramic substrate using the same
CN103348454B (en) Plasma-etching apparatus parts and manufacture method thereof
EP0678217B1 (en) Method of providing a pattern of apertures and/or cavities in a plate of non-metallic material
US6140767A (en) Plasma display having specific substrate and barrier ribs
US9538653B2 (en) Insulating substrates including through holes
EP0924739B1 (en) Method of forming a back-panel for a plasma display
JPH07114879A (en) Manufacture of porous ceramic thin plate for plasma display panel
CN1147685A (en) Gas discharging display device and its producing method
EP2514576A1 (en) A method of producing ceramic substrates
KR100778970B1 (en) Method for manufacturing substrate for flat panel display
JPH01115033A (en) Gas discharge display device
JP2002114579A (en) Sintering setter
KR20030079572A (en) Method of manufacturing barrier ribs for PDP by etching of thick film using water-based solution and compositions therefor
EP0562670A1 (en) Method of manufacturing a plate of electrically insulating material having a pattern of apertures and/or cavities
JPH09187809A (en) Manufacture of ceramic member having fine through holes
JP2003128470A (en) Method of manufacturing ceramic substrate and porous ceramic plate
JP3407710B2 (en) Method of manufacturing dielectric line
JP2001229812A (en) Molding die and barrier rib forming method for display panel using the same
US20010035253A1 (en) Ceramic sintered body and production method thereof
JPH01292729A (en) Gas discharge display device
JP2006273643A (en) Sintered compact, wiring board and method for producing the same
JP2002232095A (en) Ceramic substrate for electronic component
CN207305136U (en) The manufacture device of ceramic multi-layer baseplate
JP3539078B2 (en) Method for manufacturing rear substrate for plasma display panel

Legal Events

Date Code Title Description
A300 Withdrawal of application because of no request for examination

Free format text: JAPANESE INTERMEDIATE CODE: A300

Effective date: 20001226