JPH07110584A - Coating device - Google Patents

Coating device

Info

Publication number
JPH07110584A
JPH07110584A JP25351593A JP25351593A JPH07110584A JP H07110584 A JPH07110584 A JP H07110584A JP 25351593 A JP25351593 A JP 25351593A JP 25351593 A JP25351593 A JP 25351593A JP H07110584 A JPH07110584 A JP H07110584A
Authority
JP
Japan
Prior art keywords
coating
conductive substrate
tank
opening
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP25351593A
Other languages
Japanese (ja)
Inventor
Makoto Kurokawa
誠 黒川
Tatsuhiro Morita
竜廣 森田
Rikiya Matsuo
力也 松尾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP25351593A priority Critical patent/JPH07110584A/en
Publication of JPH07110584A publication Critical patent/JPH07110584A/en
Pending legal-status Critical Current

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  • Photoreceptors In Electrophotography (AREA)
  • Coating Apparatus (AREA)

Abstract

PURPOSE:To form a uniform photosensitive layer without causing nonuniform coating by lowering the surface of a coating soln. below the opening of a coating tank after the dipping of a conductive substrate is finished and then starting coating. CONSTITUTION:This device consists of the surface 1 of a coating soln., a coating tank 2, the opening 3 of the coating tank, an overflow receiving tank 4, a coating soln. return port 5, a coating soln. feed port 6 and a conductive substrate 7, the surface 1 is lowered below the opening 3 at the time of starting coating, then the substrate 7 is extracted, and a charge generating layer is provided on the substrate 7. A coating soln. for a charge-transfer layer prepared by mixing one pts.wt. of a hydrazone compd. and 8 pts.wt. of dichloromethane, agitating and dissolving the mixture is applied by dip coating in the same way as the charge generating layer to provide a charge-transfer layer and dried with hot air to form a functionally separated electrophotographic photoreceptor. Since the photosensitive layer is formed after the liq. surface is stabilized in this way, a coating film defect such as annular nonuniformity and nonuniform coating is prevented, and a good picture characteristic is attained.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】電子写真複写機はその基体の周面
に感光性材料を塗布して製作するが、この塗布方法の1
つである浸漬塗布方法を実施する塗布装置に関するもの
である。
BACKGROUND OF THE INVENTION An electrophotographic copying machine is manufactured by coating a photosensitive material on the peripheral surface of its substrate.
The present invention relates to a coating device for carrying out the dipping coating method.

【0002】[0002]

【従来の技術】現在実用化されている電子写真感光体
は、無機系材料を用いたものと有機系材料を用いたもの
に大別できる。無機系材料の代表的な感光体としては、
アモルファスセレン(a−Se)やアモルファスセレン
ひ素(a−As2Se3)等のセレン系のもの、色素増感
した酸化亜鉛(ZnO)、あるいは硫化カドミウム(C
dS)を結着樹脂中に分散したもの、及びアモルファス
シリコン(a−Si)を使用したもの等があげられる。
また、有機系材料の代表的な感光体としては、2,4,
7−トリニトロー9ーフルオレノン(TNF)とぽり−
N−ビニルカルバゾール(PVK)との電荷移動錯体を
用いたものなどがあげられる。これら無機系の感光体
は、多くの長所を有すると同時に欠点も有している。例
えば、セレン系及びCdSを使用した感光体は耐熱性及
び保存安定性に問題があり、また毒性を有するため簡単
に廃棄することができず回収しなければならないという
制約がある。ZnO樹脂分散系感光体は、低感度及び耐
久性の無さから現在ほとんど使用されなくなりつつあ
る。また、a−Si感光体は、高感度、高耐久性等の優
れた長所は、もっているものの、その製造プロセスの複
雑さに起因する高製造コスト及び成膜時の欠陥に起因す
る画像欠陥等の問題を残している。一方有機系の感光体
は、有機材料が多種散在し、合成により多様のアレンジ
も可能なため、それらを適宜選択することにより保存安
定性、毒性等の問題を回避することができる。また、低
コストで製造することが可能なため、広範囲で精力的に
検討されているが、有機感光体もやはり低感度という問
題点を有しており、その改良が進められている。先に記
した、PVK−TNF電荷移動錯体もその改良の一つで
あったが、十分な感度を有するまでに至らなかった。
2. Description of the Related Art Electrophotographic photoreceptors currently in practical use can be roughly classified into those using an inorganic material and those using an organic material. As a typical photoreceptor of inorganic material,
Selenium compounds such as amorphous selenium (a-Se) and amorphous selenium arsenic (a-As 2 Se 3 ), dye-sensitized zinc oxide (ZnO), or cadmium sulfide (C
Examples thereof include those in which dS) is dispersed in a binder resin, those in which amorphous silicon (a-Si) is used, and the like.
In addition, as typical photoreceptors of organic materials, 2, 4,
7-Trinitro-9-fluorenone (TNF) and Pori-
Examples thereof include those using a charge transfer complex with N-vinylcarbazole (PVK). These inorganic photoconductors have many advantages and at the same time have drawbacks. For example, a photoreceptor using selenium and CdS has problems in heat resistance and storage stability, and has a limitation that it cannot be easily discarded because it has toxicity and must be recovered. ZnO resin-dispersed photoreceptors are now almost obsolete because of their low sensitivity and lack of durability. Further, although the a-Si photoconductor has excellent advantages such as high sensitivity and high durability, it has a high manufacturing cost due to the complexity of its manufacturing process and image defects due to defects during film formation. Is left with the problem. On the other hand, organic photoreceptors have various organic materials scattered therein and can be arranged in various ways by synthesis. Therefore, by appropriately selecting them, problems such as storage stability and toxicity can be avoided. Further, since it can be manufactured at low cost, it has been extensively studied in a wide range. However, the organic photoconductor also has a problem of low sensitivity, and its improvement is being promoted. The PVK-TNF charge transfer complex described above was one of the improvements, but it did not reach sufficient sensitivity.

【0003】そこで、その他の種々の増感方法が提案さ
れ、例えば、光を照射したときに電荷担体を発生する物
質(以下「電荷発生物質」と記す)を含む層(以下「電
荷発生層」と記す)と、電荷発生層で発生した電荷担体
を受け入れ、それを輸送する物質(以下「電荷輸送物
質」と記す)を主体とする層(以下「電荷輸送層」と記
す)とから成る積層型の感光体(以下「機能分離型感光
体」と記す)が優れた増感性を示すことから、現在実用
化されている有機感光体構成の大部分を占めてきてい
る。また近年の耐久性向上から今後感光体の主流として
期待されている。
Therefore, various other sensitizing methods have been proposed, for example, a layer containing a substance (hereinafter referred to as "charge generating substance") that generates charge carriers when irradiated with light (hereinafter referred to as "charge generating layer"). And a layer mainly composed of a substance (hereinafter referred to as “charge transport substance”) that receives and transports the charge carriers generated in the charge generation layer (hereinafter referred to as “charge transport layer”). Type photoconductors (hereinafter referred to as "function-separated type photoconductors") exhibit excellent sensitization properties, and thus have occupied most of the organic photoconductor structures currently in practical use. Further, it is expected to be the mainstream of photoconductors in the future due to the improvement of durability.

【0004】本発明における導電性基体としては、基体
自体が導電性を持つもの、例えばアルミニウム、アルミ
ニウム合金、銅、亜鉛、ステンレス、ニッケル、チタン
等を用いることができ、その他、アルミニウム、アルミ
ニウム合金、酸化インジウム、酸化錫等を蒸着又は、塗
布したプラスチックや紙、導電性粒子を含有したプラス
チックや紙、及び導電性ポリマ−を有するプラスチック
等を用いることができる。導電性基体の上には、電荷発
生層が形成されるが、電荷発生層に使用される電荷発生
物質としては、クロロダイアンブルー等のビスアゾ系化
合物、ジブロモアンサンスロン等の多環キノン系化合
物、ペリレン系化合物、キナクリドン系化合物、フタロ
シアニン系化合物、アズレニウム塩系化合物等を用いる
ことができる。電荷発生層の作成方法としては、真空蒸
着で直接化合物を形成する方法及び結着性樹脂溶液中に
分散し、塗布して成膜する方法があるが、一般に後者の
方法が好ましい。電荷発生層の膜厚は、0.05〜5μ
m、好ましくは0.1〜1μmである。塗布による作製
の場合、結着性樹脂溶液中への電荷発生物質の混合分散
の方法としては、ボールミル、サイドミル、アトライタ
ー、振動ミル、超音波分散機等がある。また結着性樹脂
溶液用の結着剤樹脂としては、メラミン樹脂、エポキシ
樹脂、シリコン樹脂、ポリウレタン樹脂、アクリル樹
脂、塩化ビニール、酢酸ビニール共重合樹脂、ポリカー
ボネート樹脂、フェノキン樹脂等があり、これらの樹脂
を溶解させる溶剤としては、アセトン、メチルエチルケ
ント、シクロヘキサノン等のケトン類、酢酸エチル、酢
酸ブチル等のエステル類、テトラヒドロフラン、ジオキ
サン等のエーテル類、ベンゼン、トルエン、キシレン等
の芳香族炭化水素類、N,N−ジメチルホルムアミド、
ジメチルスルホキシド等の非プロトン性極性溶媒等を用
いることができる。電荷発生層の上に設けられる電荷輸
送層の電荷輸送物質をしては、ヒドラゾン系化合物、ピ
ラゾリン系化合物、トリフェニルアミン系化合物、トリ
フェニルメタン系化合物、スチルベン系化合物、オキサ
ジアゾール系化合物等が使用可能であり、電荷輸送用塗
布液の作製は、結着剤樹脂溶液中に電荷輸送物質を溶解
して作製する。この電荷輸送層は、前述の塗布方法によ
り、形成することができる。電荷輸送層の膜厚は、5〜
50μm好ましくは10〜40μmである。また、導電
性基板と感光層との間に特性向上の目的で下引き層とよ
ばれる層を設ける場合もある。
As the conductive substrate in the present invention, a substrate having conductivity itself, for example, aluminum, aluminum alloy, copper, zinc, stainless steel, nickel, titanium, etc. can be used. In addition, aluminum, aluminum alloy, It is possible to use plastic or paper on which indium oxide, tin oxide, or the like is vapor-deposited or applied, plastic or paper containing conductive particles, plastic having conductive polymer, or the like. A charge generation layer is formed on the conductive substrate, and as the charge generation substance used for the charge generation layer, a bisazo compound such as chlorodian blue, a polycyclic quinone compound such as dibromoanthanethrone, Perylene-based compounds, quinacridone-based compounds, phthalocyanine-based compounds, azurenium salt-based compounds and the like can be used. As a method for forming the charge generation layer, there are a method of directly forming a compound by vacuum vapor deposition and a method of dispersing in a binder resin solution and coating to form a film, but the latter method is generally preferable. The thickness of the charge generation layer is 0.05 to 5 μm.
m, preferably 0.1 to 1 μm. In the case of production by coating, as a method of mixing and dispersing the charge generating substance in the binder resin solution, there are a ball mill, a side mill, an attritor, a vibration mill, an ultrasonic disperser and the like. Examples of the binder resin for the binder resin solution include melamine resin, epoxy resin, silicone resin, polyurethane resin, acrylic resin, vinyl chloride, vinyl acetate copolymer resin, polycarbonate resin, phenoquine resin, and the like. As the solvent for dissolving the resin, acetone, methyl ethyl kent, ketones such as cyclohexanone, esters such as ethyl acetate and butyl acetate, ethers such as tetrahydrofuran and dioxane, aromatic hydrocarbons such as benzene, toluene and xylene. , N, N-dimethylformamide,
An aprotic polar solvent such as dimethyl sulfoxide can be used. Examples of the charge transport material of the charge transport layer provided on the charge generation layer include hydrazone compounds, pyrazoline compounds, triphenylamine compounds, triphenylmethane compounds, stilbene compounds, oxadiazole compounds, etc. Can be used, and the charge transporting coating liquid is prepared by dissolving the charge transporting substance in the binder resin solution. This charge transport layer can be formed by the above-mentioned coating method. The thickness of the charge transport layer is 5 to
50 μm, preferably 10 to 40 μm. Further, a layer called an undercoat layer may be provided between the conductive substrate and the photosensitive layer for the purpose of improving the characteristics.

【0005】上記の有機系材料を用いた電子写真感光体
の製造方法としては特開昭57−5047に記載されて
いるような感光性物質を含有する塗布液に導電性基体を
浸漬し、次いで該基体を塗布液から引き抜き、基体上に
感光層を形成する浸漬塗布法が知られており、装置的に
も簡単で生産性に優れていることから、有機感光体の製
造方法の主流となっている。
As a method for producing an electrophotographic photosensitive member using the above organic material, a conductive substrate is dipped in a coating solution containing a photosensitive substance as described in JP-A-57-5047, and then, A dip coating method is known in which the substrate is drawn out of the coating solution to form a photosensitive layer on the substrate, and it is a mainstream method for producing an organic photoreceptor because it is simple in terms of equipment and excellent in productivity. ing.

【0006】[0006]

【発明が解決しようとする課題】従来の浸漬塗布の場合
塗布液の沈殿防止及び導電性基体の浸漬長さを常に一定
による、などの理由から、オーバーフロー装置を設ける
必要がある。しかし、オーバーフロー塗布の場合、オー
バーフローしながらの塗布は塗布液の乱流が原因で塗膜
にムラが発生する。そこで上記の条件を満足させるため
には、基体の浸漬時のみオーバーフローさせ塗布時はオ
ーバーフローを止める方法が考えられる。ところがこの
方法によれば塗布液の乱流による塗膜ムラは、解消でき
たものの塗布開始時にリング状のムラが発生するという
問題が起こる。このリング状のムラは基体の浸漬が終了
しオーバーフローを止めたときに、塗布液の表面張力に
より塗布液の液面が、塗布槽開口部より高い位置に有り
塗布液が盛り上がった状態になる。この液面の盛り上が
った状態が塗布液の一番不安定な時であり、次いで塗布
を開始すると液面の盛り上がった所で液面の揺らぎが起
こり、それが原因で塗布開始時にリング状のムラが発生
する。
In the case of the conventional dip coating, it is necessary to provide an overflow device in order to prevent the precipitation of the coating solution and to keep the dipping length of the conductive substrate constant. However, in the case of overflow coating, uneven coating occurs due to the turbulent flow of the coating liquid during coating while overflowing. Therefore, in order to satisfy the above conditions, a method of overflowing only when the substrate is immersed and stopping the overflow during coating can be considered. However, according to this method, the coating film unevenness due to the turbulent flow of the coating solution can be eliminated, but there is a problem that ring-shaped unevenness occurs at the start of coating. This ring-shaped unevenness is such that when the substrate is immersed and the overflow is stopped, the surface tension of the coating liquid causes the liquid level of the coating liquid to be higher than the opening of the coating tank and the coating liquid to rise. This rising state of the liquid level is the most unstable state of the coating liquid, and when the coating is started next time, the liquid level fluctuates at the place where the liquid level rises, which causes ring-shaped unevenness at the start of coating. Occurs.

【0007】[0007]

【課題を解決するための手段】本発明は上記課題の解決
を目的としてなされたものであり、請求項1記載の塗布
装置は、塗布液を満たした塗布槽に導電性基体を浸漬
し、塗布液をオーバーフローさせて後、前記導電性基体
を引き抜き感光層を形成する塗布装置において、導電性
基体の浸漬終了時に塗布液の液面を塗布槽開口部より下
げる手段と、該手段により前記液面を下げてから塗布を
開始することを特徴とする塗布装置である。
SUMMARY OF THE INVENTION The present invention has been made for the purpose of solving the above-mentioned problems, and a coating apparatus according to claim 1 immerses a conductive substrate in a coating tank filled with a coating solution to perform coating. In a coating device for forming a photosensitive layer by drawing out the conductive substrate after overflowing the liquid, means for lowering the liquid level of the coating liquid from the opening of the coating tank at the end of immersion of the conductive substrate, and the liquid level by the means. The coating device is characterized in that the coating is started after lowering.

【0008】請求項2記載の塗布装置は、前記液面を下
げる手段として、前記導電性基体を引き抜くことで塗布
液面を下げることを特徴とする請求項1記載の塗布装置
である。
The coating apparatus according to a second aspect is the coating apparatus according to the first aspect, wherein the means for lowering the liquid level is to lower the coating liquid level by pulling out the conductive substrate.

【0009】請求項3記載の塗布装置は前記塗布液面を
下げてから所定時間経過後、前記導電性基体を引き抜
き、該導電性基体上に感光層を形成することを特徴とす
る請求項1記載の塗布装置である。
A coating apparatus according to a third aspect of the invention is characterized in that the conductive substrate is pulled out after a predetermined time has elapsed after lowering the coating liquid surface, and a photosensitive layer is formed on the conductive substrate. It is the coating device described.

【0010】[0010]

【作用】請求項1によれば液面の不安定状態を解除して
から感光層を形成するので塗布ムラが発生することな
く、均一な感光層を形成することをができる。
According to the first aspect, since the photosensitive layer is formed after releasing the unstable state of the liquid surface, it is possible to form a uniform photosensitive layer without causing coating unevenness.

【0011】請求項2によれば液面を下げる手段とし
て、特別な機能等が不要で、従来の塗布装置に手を加え
ることなく問題点の解決が可能となる。
According to the second aspect, no special function is required as means for lowering the liquid level, and the problem can be solved without modifying the conventional coating device.

【0012】請求項3によれば塗布液の液面が安定して
から感光層を形成するため塗布ムラの抑制に更なる効果
を発揮し、より一層均一な感光体を形成することができ
る。
According to the third aspect, since the photosensitive layer is formed after the liquid surface of the coating liquid is stabilized, a further effect can be exerted in suppressing uneven coating, and a more uniform photosensitive member can be formed.

【0013】[0013]

【実施例】以下に本発明の実施例を添付の図面に基づき
説明するが、その要旨をこえない限り以下の実施例に限
定されるものではない。
Embodiments of the present invention will be described below with reference to the accompanying drawings, but the present invention is not limited to the following embodiments unless the gist thereof is exceeded.

【0014】実施例1 図1は導電性基体を浸漬オーバーフローが終了した時点
の塗布液の液面状態を示す概略断面図であり、同図にお
いて1は塗布液液面、2は塗布槽、3は塗布槽開口部、
4はオーバーフロー受け槽、5は塗布液戻し口、6は塗
布液供給口、7は導電性基体である。
Example 1 FIG. 1 is a schematic cross-sectional view showing the liquid level of the coating liquid at the time when the immersion overflow of the conductive substrate is completed. In FIG. 1, 1 is the liquid level of the coating liquid, 2 is a coating tank, and 3 Is the coating tank opening,
4 is an overflow receiving tank, 5 is a coating liquid return port, 6 is a coating liquid supply port, and 7 is a conductive substrate.

【0015】図2は塗布開始時の塗布液の液面を塗布槽
開口部より下げた状態を示す概略断面図である。
FIG. 2 is a schematic sectional view showing a state in which the liquid level of the coating liquid at the start of coating is lowered from the opening of the coating tank.

【0016】図1及び2に示す様な塗布槽に、例えば下
記構造式(化1)のビスアゾ顔料(クロロダイアンブル
ー)1.5重量部とブチラール樹脂(ユニオンカーバイ
ト社製:XYGS)1.5重量部とメチルイソブチルケ
ント97重量部とを混合したものをペイントシェカーで
8時間分散し、作製した電荷発生層用塗布液を満たし、
次いでアルミニウム製の円筒状導電性基体の上端部を密
閉保持したものを上記塗布槽に浸漬し塗布液をオーバー
フローさせる。基体が所望の深さに達すると浸漬を止め
る。この時点で塗布液の液面は、図1に示す様な水位に
なっており、次に基体を若干引き抜き塗布液の液面が図
2に示す様な状態になる様にする。この時の塗布槽開口
部から液面までの距離は1mmである。液面を下げた
後、基体を引き抜き導電性基体上に電荷発生層を設け
た。さらにその上に下記構造式(化2)のヒドラゾン系
化合物(4,−ジエチルアミノベンズアルデヒド−N,
N−ジフェニルビドラゾン)1重量部とポリカーボネイ
ト樹脂(三菱ガス化学社製:ユーピロン)1重量部とジ
クロルメタン8重量部とを混合したものを撹拌溶解し、
作製した電荷輸送層用塗布液を電荷発生層と同様の方法
にて浸漬塗布し電荷輸送層を設け、80℃の乾燥温度で
1時間の熱風乾燥を行い、乾燥膜厚が20μmの機能分
離型電子写真感光体を作製した。この様にして作製した
電子写真感光体はリング状ムラ、塗布ムラ等の塗膜欠陥
もなく、実際の機器(シャープ(株)製:SF:810
0)による実写試験でも良好な画像特性が得られた。
In a coating tank as shown in FIGS. 1 and 2, for example, 1.5 parts by weight of a bisazo pigment (chlorodian blue) represented by the following structural formula (Formula 1) and butyral resin (manufactured by Union Carbide Co .: XYGS) 1. A mixture of 5 parts by weight and 97 parts by weight of methyl isobutyl kent was dispersed with a paint shaker for 8 hours to fill the prepared charge generation layer coating liquid,
Next, a cylindrical conductive base made of aluminum, whose upper end is hermetically held, is immersed in the coating tank to overflow the coating liquid. Immersion is stopped when the substrate reaches the desired depth. At this point, the liquid level of the coating liquid is at the water level as shown in FIG. 1, and then the substrate is slightly pulled out so that the liquid level of the coating liquid becomes as shown in FIG. At this time, the distance from the coating tank opening to the liquid surface is 1 mm. After lowering the liquid level, the substrate was pulled out and a charge generation layer was provided on the conductive substrate. Furthermore, a hydrazone compound (4, -diethylaminobenzaldehyde-N,
A mixture of 1 part by weight of N-diphenyl bidrazone), 1 part by weight of a polycarbonate resin (Mitsubishi Gas Chemical Co., Inc .: Iupilon) and 8 parts by weight of dichloromethane was dissolved by stirring.
The prepared charge transport layer coating solution is applied by dip coating in the same manner as for the charge generation layer to form a charge transport layer, and hot air drying is performed for 1 hour at a drying temperature of 80 ° C. to obtain a dry film thickness of 20 μm. An electrophotographic photoreceptor was produced. The electrophotographic photosensitive member produced in this manner has no coating defects such as ring-shaped unevenness and coating unevenness, and the actual device (manufactured by Sharp Corporation: SF: 810).
Good image characteristics were also obtained in the actual copying test according to 0).

【0017】[0017]

【化1】 [Chemical 1]

【0018】[0018]

【化2】 [Chemical 2]

【0019】実施例2 実施例1で導電性基体を若干引き抜き塗布液の液面を塗
布槽開口部より下げたものに対し、塗布液を供給口から
少量抜き、液面を下げる様にした以外は、実施例1と同
様に浸漬塗布を行い機能分離型電子写真感光体を作製し
た。この場合も実施例1と同様に感光体の外観検査及び
実写試験を行ったが、塗膜欠陥もなく良好な画像特性が
得られた。
Example 2 In contrast to Example 1 in which the conductive substrate was slightly drawn out and the liquid level of the coating liquid was lowered from the opening of the coating tank, a small amount of the coating liquid was drained from the supply port to lower the liquid level. Was subjected to dip coating in the same manner as in Example 1 to produce a function-separated electrophotographic photosensitive member. In this case as well, the appearance inspection and actual copying test of the photoconductor were performed in the same manner as in Example 1, but good image characteristics were obtained without coating film defects.

【0020】実施例3 塗布槽に実施例1で使用した塗布液を満たし、該塗布槽
に導電性基体を浸漬した後、塗布液面を塗布槽開口部よ
り2mm下げてから約10秒停止し、塗布液面が完全に
安定してから、塗布を開始するという手順で機能分離型
電子写真感光体を作製した。この場合も、実施例1と同
様に感光体の外観検査及び実写試験を行ったが塗膜欠陥
もなく良好な画像特性が得られた。
Example 3 The coating solution used in Example 1 was filled in the coating tank, the conductive substrate was immersed in the coating tank, the surface of the coating solution was lowered by 2 mm from the opening of the coating tank, and then stopped for about 10 seconds. Then, the function-separated electrophotographic photosensitive member was produced by the procedure of starting the coating after the coating liquid surface was completely stabilized. In this case as well, the appearance inspection and actual copying test of the photosensitive member were performed in the same manner as in Example 1, but good image characteristics were obtained without coating film defects.

【0021】比較例1 実施例1で行った導電性基体を若干引き抜き塗布液の液
面を塗布槽開口部より下げたものに対し、液面を下げず
に図1の様な状態から塗布を行い機能分離型電子写真感
光体を作製した。この場合も実施例1と同様に感光体の
外観検査及び実写試験を行ったところ、塗布開始時に塗
布液の揺らぎが発生し、それが原因で感光体上部にリン
グ状のムラが発生し、良好な画像特性が得られなかっ
た。
Comparative Example 1 The conductive substrate obtained in Example 1 was slightly pulled out, and the liquid level of the coating liquid was lowered from the opening of the coating tank, while the liquid level was not lowered and coating was performed from the state shown in FIG. Then, a function-separated electrophotographic photosensitive member was produced. Also in this case, the appearance inspection and the actual copying test of the photoconductor were carried out in the same manner as in Example 1, and the fluctuation of the coating liquid occurred at the start of the coating, which caused the ring-shaped unevenness on the upper part of the photoconductor, which was excellent. Image characteristics were not obtained.

【0022】比較例2 実施例1で行った、導電性基体を若干引き抜き塗布液の
液面を塗布槽開口部より1mm下げたものに対し、液面
を塗布槽開口部より6mm下げた。それ以外は、実施例
1と同様に浸漬塗布を行い機能分離型電子写真感光体を
作製した。この場合も実施例1と同様に感光体の外観検
査及び実写試験を行ったところ、感光体上部の画像域部
分の膜厚がうすくなり画像不良が発生した。
Comparative Example 2 Whereas the conductive substrate obtained in Example 1 was slightly pulled out and the liquid level of the coating liquid was lowered by 1 mm from the opening of the coating tank, the liquid level was lowered by 6 mm from the opening of the coating tank. Except for this, dip coating was performed in the same manner as in Example 1 to prepare a function-separated electrophotographic photosensitive member. In this case as well, when the appearance inspection and the actual copying test of the photosensitive member were carried out in the same manner as in Example 1, the film thickness in the image area portion on the upper portion of the photosensitive member became thin and an image defect occurred.

【0023】比較例3 実施例3で、塗布液面を、2mm下げてから約10秒停
止し、塗布を開始したのに対し、停止時間を60秒にし
た以外は、実施例3と同様に感光体の外観検査及び実写
試験を行ったところ、感光体材料の2次凝集が原因で忘
れた感光層となり、不均一な画像特性となった。上記を
まとめると本発明では、導電性基体の浸漬終了時、即ち
オーバーフロー終了時に塗布液の液面を塗布槽開口部よ
り下げてから塗布を開始することを特徴としている。ま
た本発明の塗布槽開口部より塗布液の液面を下げる方法
は、特に限定されないが、液面を下げた時の塗布槽開口
部から液面までの距離は、感光体上部の非塗布部分が画
像域に達しない様、0〜2mm以内に設定するのが好ま
しいが、画像域に達しない範囲であれば特に限定しな
い。また液面を下げてから、塗布開始までの時間は、0
〜30秒程度が好ましく長すぎると感光材料の2次凝集
が発生し塗布液が沈殿し塗布ムラの原因となる。
Comparative Example 3 In the same manner as in Example 3, except that the coating liquid surface was lowered by 2 mm and stopped for about 10 seconds to start coating in Example 3, but the stop time was changed to 60 seconds. When the appearance inspection and the actual copying test of the photosensitive member were conducted, the photosensitive layer was forgotten due to the secondary agglomeration of the photosensitive material, resulting in non-uniform image characteristics. Summarizing the above, the present invention is characterized in that coating is started after the liquid surface of the coating liquid is lowered from the opening of the coating tank at the end of immersion of the conductive substrate, that is, at the end of overflow. Further, the method of lowering the liquid level of the coating liquid from the coating tank opening of the present invention is not particularly limited, but the distance from the coating tank opening to the liquid level when the liquid level is lowered is the non-coated portion of the upper part of the photoreceptor. Is preferably set within 0 to 2 mm so as not to reach the image area, but is not particularly limited as long as it does not reach the image area. Also, the time from lowering the liquid level to the start of coating is 0
Approximately 30 seconds or so is preferable, and if it is too long, secondary aggregation of the photosensitive material occurs and the coating solution precipitates, causing uneven coating.

【0024】以上の如く構成された塗布装置の塗布槽に
塗布液を満たし、該塗布槽に導電性基体を浸漬させオー
バーフローを行う、基体が所望の深さまで来たら浸漬を
停止する。この時点で塗布液の液面は、塗布液の表面張
力の影響で塗布槽開口部より高い位置にあるので、液面
を塗布槽開口部より低くなるよう下げてやる。次いで塗
布液が安定してから導電性基体を引き抜き、塗布を行い
基体上に感光層を形成させる。この様にして得られた、
電子写真感光体の塗膜は均一で塗膜性に優れたものであ
る。
The coating tank of the coating apparatus constructed as described above is filled with the coating solution, and the conductive substrate is immersed in the coating tank to cause overflow. When the substrate reaches a desired depth, the immersion is stopped. At this point, the liquid surface of the coating liquid is located higher than the opening of the coating tank due to the influence of the surface tension of the coating liquid. Therefore, the liquid surface is lowered below the opening of the coating tank. Next, after the coating liquid is stabilized, the conductive substrate is drawn out and coating is performed to form a photosensitive layer on the substrate. Obtained in this way,
The coating film of the electrophotographic photosensitive member is uniform and has excellent coating properties.

【0025】その他本発明は上記し、かつ、図面に示し
た実施例のみに限定するものではなく要旨を逸脱しない
範囲内で適宜変形して実施できることは勿論である。
Others The present invention is not limited to the embodiments described above and shown in the drawings, and it is needless to say that the present invention can be appropriately modified and implemented without departing from the scope of the invention.

【0026】[0026]

【発明の効果】上記構成により本発明の請求項1によれ
ば液面の不安定状態を解除してから感光層を形成するの
で塗布ムラが発生することなく、均一な感光層を形成す
ることができる。
According to claim 1 of the present invention having the above structure, the photosensitive layer is formed after the unstable state of the liquid surface is released, so that a uniform photosensitive layer can be formed without causing coating unevenness. You can

【0027】請求項2によれば液面を下げる手段とし
て、特別な機能等が不要で、従来の塗布装置に手を加え
ることなく問題点の解決が可能となる。
According to the second aspect, as a means for lowering the liquid level, no special function is required, and the problem can be solved without modifying the conventional coating device.

【0028】請求項3によれば塗布液の液面が安定して
から感光層を形成するため塗布ムラの抑制に更なる効果
を発揮し、より一層均一な感光体を形成することができ
る。
According to the third aspect, since the photosensitive layer is formed after the liquid surface of the coating liquid is stabilized, a further effect can be exerted in suppressing uneven coating, and a more uniform photosensitive member can be formed.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の実施例の断面図であり、導電性基体を
浸漬させた直後の状態を表す。
FIG. 1 is a cross-sectional view of an example of the present invention, showing a state immediately after a conductive substrate is immersed.

【図2】本発明の実施例の断面図であり、塗布開始時の
状態を表す。
FIG. 2 is a cross-sectional view of an example of the present invention, showing a state at the start of coating.

【符号の説明】[Explanation of symbols]

1 塗布液液面 2 塗布槽 3 塗布槽開口部 4 オーバーフロー受け槽 5 塗布液戻し口 6 塗布液供給口 7 導電性基体 1 coating liquid level 2 coating tank 3 coating tank opening 4 overflow receiving tank 5 coating liquid return port 6 coating liquid supply port 7 conductive substrate

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 塗布液を満たした塗布槽に導電性基体を
浸漬し、塗布液をオーバーフローさせた後、前記導電性
基体を引き抜き感光層を形成する塗布装置において、導
電性基体の浸漬終了時に塗布液の液面を塗布槽開口部よ
り下げる手段と、該手段により前記液面を下げてから塗
布を開始することを特徴とする塗布装置。
1. A coating apparatus for immersing a conductive substrate in a coating tank filled with the coating solution, allowing the coating solution to overflow, and then pulling out the conductive substrate to form a photosensitive layer, at the end of immersion of the conductive substrate. A coating device comprising means for lowering the liquid level of the coating liquid below the opening of the coating tank, and coating after the liquid level is lowered by the means.
【請求項2】 前記液面を下げる手段として、前記導電
性基体を引き抜くことで塗布液面を下げることを特徴と
する請求項1記載の塗布装置。
2. The coating apparatus according to claim 1, wherein the means for lowering the liquid level is to lower the coating liquid level by pulling out the conductive substrate.
【請求項3】 前記塗布液面を下げてから、所定時間経
過後、前記導電性基体を引き抜き、該導電性基体上に感
光層を形成することを特徴とする請求項1記載の塗布装
置。
3. The coating apparatus according to claim 1, wherein the conductive substrate is pulled out and a photosensitive layer is formed on the conductive substrate after a predetermined time elapses after lowering the coating liquid surface.
JP25351593A 1993-10-12 1993-10-12 Coating device Pending JPH07110584A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25351593A JPH07110584A (en) 1993-10-12 1993-10-12 Coating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25351593A JPH07110584A (en) 1993-10-12 1993-10-12 Coating device

Publications (1)

Publication Number Publication Date
JPH07110584A true JPH07110584A (en) 1995-04-25

Family

ID=17252448

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25351593A Pending JPH07110584A (en) 1993-10-12 1993-10-12 Coating device

Country Status (1)

Country Link
JP (1) JPH07110584A (en)

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