JPH07110074A - Purge valve for container capable of making small flow rate purge - Google Patents

Purge valve for container capable of making small flow rate purge

Info

Publication number
JPH07110074A
JPH07110074A JP25443993A JP25443993A JPH07110074A JP H07110074 A JPH07110074 A JP H07110074A JP 25443993 A JP25443993 A JP 25443993A JP 25443993 A JP25443993 A JP 25443993A JP H07110074 A JPH07110074 A JP H07110074A
Authority
JP
Japan
Prior art keywords
gas
purge
valve
passage
storage container
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP25443993A
Other languages
Japanese (ja)
Inventor
Akira Saito
彰 齋藤
Makoto Tanaka
田中  誠
Takuya Nogami
拓矢 野上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Proterial Ltd
Original Assignee
Hitachi Metals Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Metals Ltd filed Critical Hitachi Metals Ltd
Priority to JP25443993A priority Critical patent/JPH07110074A/en
Publication of JPH07110074A publication Critical patent/JPH07110074A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To enable the purge gas flow rate to be selected by providing a first diaphragm valve between an upper passage and a lower passage for introducing purge gas, providing a second diaphragm valve between a lower passage and a discharging passage, and providing a deep purging pipe on a joint member of a gas storage container to the gas discharging passage. CONSTITUTION:A metal diaphragm valve A is closed, and also a valve B is opened in the small flow rate purge, and purging inert gas is allowed to flow into a small flow rate purge gas introducing lower passage through a communication hole pipe, and the connecting work is performed while spraying a small quantity of gas to the root part of a gas storage container. After that, the valve of the gas storage container is closed, and the valves A, B are opened in the full-scale purge work, and a large quantity of gas is introduced from a purge gas introducing upper passage 4, and the gas is injected from an injection port through a purge gas introducing lower passage 5, a gas discharging passage 10 and a pipe 14 for deep purge of the joint member 3, and then the passage is purged by stirring the root part of the gas storage container and the inside of the communication passage 18. The gas passes a process gas discharging lower passage 12, so as to purge-treat the piping system.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は液化ガスあるいは高圧ガ
ス等が充填されたガス貯蔵容器に装着して使用されるガ
ス貯蔵容器用パージ弁に関し、特に小流量でもパージを
行なうことができる機能が備わった小流量パージが可能
な容器用パージ弁に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a purge valve for a gas storage container which is used by being attached to a gas storage container filled with a liquefied gas or a high pressure gas. The present invention relates to a container purge valve capable of performing a small flow rate purge.

【0002】[0002]

【従来の技術】近年は、種々の産業分野で超高純度なガ
スが使用されている。例えば半導体製造プロセスで使用
されるガスがあるが、これらのいわゆるプロセスガスの
純度は、製造される製品の品質に重大な影響を与える。
従って、ガスの高純度を維持するために多大の配慮がな
されねばならない。またこれらプロセスガスの中には毒
性の強いものや爆発する危険性の高いものもあり、取扱
いに際しては安全性が強く要求される。これらのプロセ
スガスは、一旦ガス貯蔵容器に充填され、この容器に取
り付けられた元弁を介して供給が行われている。
2. Description of the Related Art In recent years, ultra high purity gas has been used in various industrial fields. For example, there are gases used in semiconductor manufacturing processes, but the purity of these so-called process gases has a significant impact on the quality of the manufactured products.
Therefore, great care must be taken to maintain the high purity of the gas. Further, some of these process gases are highly toxic and have a high risk of exploding, and therefore safety is strongly required in handling. These process gases are once filled in a gas storage container and supplied through a main valve attached to this container.

【0003】そして、上記した高純度プロセスガスは、
貯蔵容器から元弁を介して各種の弁及び配管を通って使
用される。このとき配管内に不純物を含んだガスやパー
ティクルがある場合、さらに言えば接ガス金属面に不純
ガスが吸着している場合、これらの不純ガスやパーティ
クルが高純度プロセスガスを通すときに放出されて、高
純度プロセスガスの純度を低下させる。これを防ぐため
に、例えば、接ガス金属面の全てを高精度に電解研磨処
理をして鏡面仕上げをし、不純ガスが金属面に極力吸着
しないようにするという対策がある。また通常行われる
のは元弁を貯蔵容器に取付けて、高純度プロセスガスを
流す前に、配管系を真空ポンプによる真空引き、あるい
は不活性ガス置換によるパージ処理を施し、配管内を洗
浄することが行われている。
The high-purity process gas described above is
It is used from a storage container through various valves and pipes via a main valve. At this time, if there are gases or particles containing impurities in the pipe, or more specifically, if impure gas is adsorbed on the metal surface in contact with the gas, these impure gases or particles are released when passing through the high-purity process gas. Reduce the purity of the high-purity process gas. In order to prevent this, for example, there is a measure that all the metal surfaces in contact with gas are subjected to electropolishing treatment with high precision and mirror-finished so that impure gas is not adsorbed to the metal surface as much as possible. Also, it is usually done to attach the main valve to the storage container, and before the high-purity process gas flows, vacuum the pipe system with a vacuum pump or perform a purge process by replacing with an inert gas to clean the inside of the pipe. Is being done.

【0004】例えば、図3に示すようなパージ機構をも
った継手がある。このものは接続部74をガス貯蔵容器
(図示せず)の元弁に接続し、胴部73内にはパージガス用
のチューブ70が前記接続部74付近の奥部まで導入されて
おり、また胴部73の途中から分岐して、パージガスある
いはプロセスガスの導出用チューブ71が設けられてい
る。従って、バージ処理の際は、パージ用チューブ70か
らバージガスを導入して貯蔵容器の根元部分およびガス
導出用チューブ71後の配管を全て含んでパージ処理を行
うことができる。
For example, there is a joint having a purging mechanism as shown in FIG. This is a gas storage container with connection 74
It is connected to a main valve (not shown), and a purge gas tube 70 is introduced into the body portion 73 to a deep part near the connection portion 74. Alternatively, a process gas lead-out tube 71 is provided. Therefore, during the barge process, the purge process can be performed by introducing the barge gas from the purging tube 70 and including all the bases of the storage container and the pipe after the gas outlet tube 71.

【0005】[0005]

【発明が解決しようとする課題】ところで、通常パージ
弁を容器に、詳しくは容器の元弁に取り付ける作業はパ
ージガスを流しながら行ない、取り付けた後本格的なパ
ージ作業を行なうことが望ましい。ところが、上記従来
例においては弁機構がないので一旦パージガスを流した
状態にすればその流量は絶えず一定である。つまり取り
付け時は小流量のパージガスで足りるのに大量のガスを
流しっぱなしにすることになり大変な無駄がある。一
方、取り付け後は管内も含め一気に大量のパージガスを
送ってパージする方が効率的である。たとえ弁機構は配
管系に設けてあるにしても通常市販のものはON−OF
F弁であってパージガスを流すか止めるかの操作しかな
い。即ち、従来は作業に合わせてパージガス流量を選択
する余地がなかったのである。
By the way, it is desirable that the operation of attaching the purge valve to the container, more specifically to the main valve of the container, is carried out while flowing the purge gas, and after the attachment, a full-scale purging operation is performed. However, in the above conventional example, since there is no valve mechanism, once the purge gas is made to flow, its flow rate is constantly constant. In other words, at the time of installation, a small amount of purge gas is sufficient, but a large amount of gas is kept flowing, which is very wasteful. On the other hand, after installation, it is more efficient to send a large amount of purge gas all at once, including inside the pipe, to perform purge. Even if the valve mechanism is installed in the piping system, the commercially available one is normally ON-OF.
It is an F valve, and there is only an operation of flowing or stopping the purge gas. That is, conventionally, there was no room to select the purge gas flow rate according to the work.

【0006】本発明は、パーティクルの発生のないメタ
ルダイヤフラム弁機構の他に小流量域でもパージ操作を
可能とし、状況に応じてパージガス流量を小流量と大流
量といずれかに選択できる機能を持ったガス貯蔵容器用
パージ弁を提供することを目的とする。
In addition to the metal diaphragm valve mechanism in which particles are not generated, the present invention enables a purge operation even in a small flow rate range and has a function of selecting either a small flow rate or a large flow rate as the purge gas flow rate depending on the situation. Another object of the present invention is to provide a purge valve for a gas storage container.

【0007】[0007]

【課題を解決するための手段】本発明は、パージガス導
入上流路と、パージガス導入下流路とが隔壁で遮られて
おり、この隔壁に小流量が通る連通孔を設け、両流路は
第1の弁座部を介して連通しており、前記弁座部に直
接、着座あるいは離座をする第1の金属製のダイヤフラ
ム弁体と、このダイヤフラムの上部に設けられダイヤフ
ラムを押圧又はこれを解除する第1の操作手段とを備
え、同時に前記パージガス導入下流路と、ガス導出流路
とが隔壁で遮られていると共に両流路は第2の弁座部を
介して連通しており、第2の弁座部に直接、着座あるい
は離座をする第2の金属製のダイヤフラム弁体と、この
ダイヤフラムの上部に設けられダイヤフラムを押圧又は
これを解除する第2の操作手段とを一体的に備えた弁本
体と、内部に通路を有し、一端にガス貯蔵容器との接続
部を備え、他端は前記ガス導出流路と接続した継手部材
と、前記継手部材の通路内にあり、一端は前記ガス貯蔵
容器の接続部付近まで延び、他端を前記ガス導出流路内
に取り付けたデイープパージ用パイプと、前記継手部材
に付設し、前記継手部材の接続部を介してガス貯蔵容器
に接続するナット部材とからなる小流量パージが可能な
容器用パージ弁である。
According to the present invention, an upper flow path for introducing purge gas and a lower flow path for introducing purge gas are blocked by a partition wall, and the partition wall is provided with a communication hole through which a small flow rate passes. First metal diaphragm valve body which is in communication with the valve seat portion and directly seats on or separates from the valve seat portion, and the diaphragm provided on the diaphragm is pressed or released. The purge gas introduction lower flow path and the gas discharge flow path are blocked by a partition wall, and both flow paths communicate with each other via a second valve seat portion. A second metal diaphragm valve body which is directly seated on or separated from the second valve seat portion and a second operation means which is provided on the upper part of the diaphragm and presses or releases the diaphragm. Built-in valve body and passage inside , A connecting portion with a gas storage container at one end, the other end is a joint member connected to the gas outlet channel, is in the passage of the joint member, one end extends to near the connecting portion of the gas storage container, A small-flow purge is possible, which includes a deep purge pipe having the other end mounted in the gas outlet channel and a nut member attached to the joint member and connected to the gas storage container through the joint of the joint member. It is a purge valve for various containers.

【0008】[0008]

【作用】パージガス導入上流路とパージガス導入下流路
の間にある隔壁には連通孔が設けられているので常にパ
ージガスは下流路側に流れている。ここで第1の弁座部
を閉鎖し第2の弁座部は開放する、即ち第1のメタルダ
イヤフラム弁を閉、第2のメタルダイヤフラム弁を開に
すれば、上記連通孔を通過する小流量のパージガスのみ
がガス導出流路まで供給されるので、容器交換時のパー
ジに適している。一方、第1、第2のメタルダイヤフラ
ム弁共に開にすればパージガス導入上流路からガス導出
流路までをつなぐ主流路から大量のパージガスが流れる
ので、これは容器交換後の本格パージに適している。以
上によって大流量と小流量のパージ作業を使い分けでき
る。
Since the partition wall between the upper flow path for introducing purge gas and the lower flow path for introducing purge gas has a communication hole, the purge gas always flows to the lower flow path side. Here, if the first valve seat portion is closed and the second valve seat portion is opened, that is, the first metal diaphragm valve is closed and the second metal diaphragm valve is opened, the small passage that passes through the communication hole can be achieved. Since only the flow rate of the purge gas is supplied to the gas outlet channel, it is suitable for purging when the container is replaced. On the other hand, if both the first and second metal diaphragm valves are opened, a large amount of purge gas flows from the main flow path connecting the purge gas introduction upper flow path to the gas discharge flow path, which is suitable for full-scale purging after container replacement. . As described above, it is possible to selectively use the large-flow purge operation and the small-flow purge operation.

【0009】[0009]

【実施例】以下、本発明の実施例を図面に基づき説明す
る。図1及び図2は本発明の一実施例を示す小流量パー
ジが可能なガス貯蔵容器用パージ弁(以下パージ弁とい
う)の部分断面図である。図1は小流量のパージが行な
われている場合を、図2は大流量のパージが行なわれて
いる場合を示している。図において第1の弁座部や弁
体、操作部を備えているものを第1のメタルダイヤフラ
ム弁A、第2の弁座部、弁体、操作部を備えているのを
第2のメタルダイヤフラム弁Bという。尚、図2の符号
は図1と同じなので主要なものしか記載していない。
Embodiments of the present invention will be described below with reference to the drawings. 1 and 2 are partial cross-sectional views of a gas storage container purge valve (hereinafter referred to as a purge valve) capable of performing a small flow rate purge according to an embodiment of the present invention. FIG. 1 shows a case where a small flow rate purge is performed, and FIG. 2 shows a case where a large flow rate purge is performed. In the figure, a valve having a first valve seat portion, a valve element, and an operating portion is a first metal diaphragm valve A, and a valve element having a second valve seat portion, a valve element, and an operating portion is a second metal. It is called diaphragm valve B. Note that the reference numerals in FIG. 2 are the same as those in FIG.

【0010】以下このパージ弁の構成について説明する
と、まず弁本体1は1つの弁箱2内に第1のメタルダイ
ヤフラム弁Aと第2のメタルダイヤフラム弁Bを一体的
に備えている。先ずメタルダイヤフラム弁Aは、弁箱2
内に略L字状のパージガス導入上流路4と略逆L字状の
パージガス導入下流路5を形成し、これらの流路は隔壁
6を介して遮られているが上部の第1の弁座部7Aが形
成された弁室内で連通している。そして隔壁6の下部に
は下記する小流量リーク用パイプからなる連通孔が設け
られている。第1の弁座部7Aにはシール性を高めるた
めに、例えばフッ素系樹脂からなるシールリングが嵌着
されており、この弁座部に対向する位置に第1の金属製
ダイヤフラム弁体8Aがダイヤフラム押え部材によって
外周を狭着して置かれている。そしてそのまた上部には
ダイヤフラム弁体を弁座に着座あるいは離座させるため
の負荷を発生する第1の操作手段9Aが装置されてい
る。この操作手段は本実施例のようにエアシリンダ式の
アクチュータであることが望ましいが、手動操作弁や電
磁弁等であっても良い。
The structure of the purge valve will be described below. First, the valve body 1 integrally includes a first metal diaphragm valve A and a second metal diaphragm valve B in one valve box 2. First, the metal diaphragm valve A is the valve box 2
A substantially L-shaped purge gas introduction upper flow path 4 and a substantially inverted L-shaped purge gas introduction lower flow path 5 are formed therein, and these flow paths are blocked by a partition wall 6 but are located above the first valve seat. It communicates with the valve chamber in which the portion 7A is formed. A communication hole made of a small flow rate leak pipe described below is provided below the partition wall 6. A seal ring made of, for example, a fluororesin is fitted to the first valve seat portion 7A in order to improve the sealing property, and the first metal diaphragm valve body 8A is provided at a position facing the valve seat portion. The diaphragm holding member is placed so that the outer circumference is tightly attached. Further, on the upper part thereof, there is provided a first operating means 9A for generating a load for seating or separating the diaphragm valve body on the valve seat. This operating means is preferably an air cylinder type actuator as in the present embodiment, but may be a manually operated valve or a solenoid valve.

【0011】次にメタルダイヤフラム弁Bについて簡単
に説明すると、上記パージガス導入下流路5が連続して
形成され、ガス導出流路10と隔壁11を介して遮られ
ているが第2の弁座部7Bで連通している。そしてガス
導出流路10内の途中には段差孔部13が形成され下記
するデイープパージ用パイプが取り付けられている。そ
してその下流側には90゜角度をずらして分岐連通したプ
ロセスガス導出下流路12が形成されている。この流路
はパージ処理後、貯蔵容器内のプロセスガスを流すとき
はプロセスガスの導出流路となる。その他は上記したメ
タルダイヤフラム弁Aと同様なので以下の説明は省略す
る。
The metal diaphragm valve B will be briefly described below. The purge gas introduction lower flow path 5 is formed continuously and is blocked by the gas discharge flow path 10 and the partition wall 11, but the second valve seat portion is formed. It communicates with 7B. A stepped hole portion 13 is formed in the middle of the gas outlet channel 10, and a deep purge pipe described below is attached to the stepped hole portion 13. On the downstream side, a process gas outlet lower flow path 12 is formed, which is branched and connected at a 90 ° angle. This flow path serves as a process gas outlet flow path when the process gas in the storage container is allowed to flow after the purging process. Others are the same as those of the metal diaphragm valve A described above, and therefore the following description will be omitted.

【0012】上記シタダイヤフラム弁体8A、8Bはス
テンレス製の薄板で複数枚に重ねてもよい。また、各ダ
イヤフラムの間に金メッキを施して潤滑性とかじり付き
防止を向上させても良い。ダイヤフラムの形状は外周縁
が平担で中央部分が上部に膨出した、いわゆる部分球殻
形状を程しているものである。従って、この膨出した中
央部を負荷手段によって押圧すると、ある一定の荷重で
ダイヤフラム弁体は弾性変形域内で飛び移り変形をし
て、直接弁座と当接した着座状態となり弁は閉となる。
そして、負荷手段を上方に移動するとダイヤフラム弁体
は自身の弾性復元力で元の状態にもどり離座状態となり
弁は開となる。
The above-mentioned theta diaphragm valve bodies 8A and 8B may be laminated on a plurality of thin stainless steel plates. Further, gold plating may be applied between the diaphragms to improve lubricity and galling prevention. The shape of the diaphragm is a so-called partial spherical shell shape in which the outer peripheral edge is flat and the central portion bulges upward. Therefore, when the bulging central portion is pressed by the load means, the diaphragm valve body undergoes a snapping deformation within the elastic deformation region under a certain constant load, and becomes a seated state in which the diaphragm valve body is in direct contact with the valve seat, and the valve is closed. .
Then, when the load means is moved upward, the diaphragm valve body returns to its original state due to its elastic restoring force, and the valve is opened.

【0013】以上説明した弁本体は、弁室、パージガス
導入上流路4、同じくパージガス導入下流路5及びガス
導出下流路10の各接ガス内面には個々電解研磨処理を
施し、ガスが吸着しにくい面に仕上げられている。しか
も弁室内の接ガス部は金属製ダイヤフラム弁体しか存在
せず、極めて簡素でデッドスペースが少なく、パーティ
クルの発生源がない構成となっている。
In the valve body described above, the inner surfaces of the valve chamber, the purge gas introducing upper flow path 4, the purge gas introducing lower flow path 5 and the gas derivation lower flow path 10 are individually electropolished to prevent gas adsorption. The surface is finished. Moreover, the gas-contacting portion in the valve chamber has only a metal diaphragm valve body, is extremely simple, has a small dead space, and has no particle generation source.

【0014】次にメタルダイヤフラム弁Aに設けた連通
孔について説明する。隔壁6には内径が略0.2〜1.0mm程
度の連通孔を設けることになるが、このような小径の孔
は加工しずらいので、直接隔壁に形成できない場合は、
本実施例のようにステンレス製のパイプを利用できる。
即ち、細内径のパイプ16を一旦ホルダー部材17にろ
う付け等で固着し、このパイプ付きホルダー部材を隔壁
に形成した比較的大径で加工し易い嵌着穴に圧入して装
着するのである。このようにすればパイプの径や長さを
適宜選定してやればリーク流量も簡単に操作できるので
都合が良い。
Next, the communication hole provided in the metal diaphragm valve A will be described. The partition wall 6 will be provided with a communication hole having an inner diameter of approximately 0.2 to 1.0 mm. However, since such a small diameter hole is difficult to process, if it cannot be directly formed in the partition wall,
A stainless steel pipe can be used as in this embodiment.
That is, the pipe 16 having a small inner diameter is once fixed to the holder member 17 by brazing or the like, and the holder member with a pipe is press-fitted into a relatively large-diameter fitting hole formed in the partition wall for easy processing. This is convenient because the leak flow rate can be easily manipulated by appropriately selecting the diameter and length of the pipe.

【0015】継手部材3は、内部に連絡通路18が成形
されており、この内面は弁箱2と同様に電解研磨処理が
施されている。継手部材3の一端は連絡通路18の奥部
までデイープパージ用パイプ14が延出されている状態
で弁箱2に対し溶接手段で固定されている。一方他端に
はガス貯蔵容器(図示せず)との接続部19が形成さ
れ、その外側には軸受20を介してナット部材30が設
けられている。従って、ナット部材30の内周面に設け
ためねじと容器側のおねじとを螺合して、パージ弁とガ
ス貯蔵容器とを接続するものである。
The joint member 3 has a communication passage 18 formed therein, and the inner surface of the joint member 3 is electropolished similarly to the valve box 2. One end of the joint member 3 is fixed to the valve box 2 by welding means in a state where the deep purge pipe 14 extends to the inner part of the communication passage 18. On the other hand, a connection portion 19 with a gas storage container (not shown) is formed at the other end, and a nut member 30 is provided outside the connection portion 19 via a bearing 20. Therefore, the screw and the male thread on the container side are screwed together to be provided on the inner peripheral surface of the nut member 30 to connect the purge valve and the gas storage container.

【0016】デイープパージ用パイプ14は、上記した
リーク用パイプと同様にステンレス製で、電解研磨処理
が施されている。このパイプ14の一端には円環部材1
5aをロウ付け等で取付け、この円環部材付の細管パイ
プを、パージガス導出流路10内で、プロセスガス導出
下流路12よりも奥側に形成した段差孔部13に挿入
し、その後、かしめ部材15bをかしめ込んでパイプ1
4を流路内に固定したものである。
The deep purge pipe 14 is made of stainless steel like the above-mentioned leak pipe, and is electrolytically polished. The ring member 1 is attached to one end of the pipe 14.
5a is attached by brazing or the like, and the thin pipe with the annular member is inserted into the step gas hole 13 formed on the inner side of the process gas discharge lower flow path 12 in the purge gas discharge flow path 10 and then caulked. Pipe 1 by caulking member 15b
4 is fixed in the flow path.

【0017】次にこのガス貯蔵容器用パージ弁の作用に
ついて説明する。まずガス貯蔵容器の元弁にこのパージ
弁をナット部材30を用いて接続するとき、即ち、小流
量でパージを行ないたい時は図1に示すように上記した
メタルダイヤフラム弁Aを閉弁、メタルダイヤフラム弁
Bを開弁にして、パージ用の不活性ガス例えばN2ガスを
連通孔パイプを通る小流量だけ下流路側に流れるように
し、ガス貯蔵容器の接続部分を含む根元部分に小量のパ
ージガスを吹き付けながら接続作業を行なう。その後、
ガス貯蔵容器自身に装置された弁を閉じ、本格的なパー
ジ作業を行なう場合は、図2に示すようにメタルダイヤ
フラム弁A、B共に開として、パージガス導入上流路か
ら大量のN2ガスを導入し、パージガス導入下流路5,ガ
ス導出流路10、デイープパージ用パイプ14を経由し
て先端の噴出口からN2ガスを噴出させて、ガス貯蔵容器
の根元部分や連絡通路18内を撹拌して通路の周壁を含
む全体をパージするものである。そしてN2ガスはプロセ
スガス導出下流路12を通って、続く配管系をパージ処
理する。そして、パージ処理後はメタルダイヤフラム弁
Bを閉として、ガス貯蔵容器の元弁を開としてプロセス
ガスをプロセスガス導出下流路12を介して流すもので
ある。
Next, the operation of the gas storage container purge valve will be described. First, when connecting the purge valve to the main valve of the gas storage container by using the nut member 30, that is, when purging at a small flow rate, the metal diaphragm valve A is closed as shown in FIG. The diaphragm valve B is opened to allow an inert gas for purging, such as N 2 gas, to flow to the lower flow path side by a small flow rate through the communication hole pipe, and a small amount of purge gas is supplied to the base portion including the connecting portion of the gas storage container. Perform connection work while spraying. afterwards,
When performing a full-scale purging operation by closing the valve installed in the gas storage container itself, as shown in FIG. 2, both metal diaphragm valves A and B are opened, and a large amount of N 2 gas is introduced from the purge gas introduction upper flow path. Then, N 2 gas is ejected from the ejection port at the tip through the purging gas introduction lower channel 5, the gas derivation channel 10, and the deep purging pipe 14 to stir the root portion of the gas storage container and the inside of the communication passage 18. The entire wall including the peripheral wall of the passage is purged. Then, the N 2 gas passes through the process gas outlet / lower channel 12 to purge the subsequent piping system. After the purging process, the metal diaphragm valve B is closed and the main valve of the gas storage container is opened to allow the process gas to flow through the process gas outlet / lower flow path 12.

【0016】以上説明のとおり、本実施例のパージ弁
は、小流量と大流量のパージガスを供給することがで
き、適宜状況に応じて使い分けができるのでパージガス
の浪費が少なくて済む。また、弁装置内の流路と細管及
び継手部材の接ガス部を部品毎個別にかつ容易に電解研
磨処理ができ、その後組立ができるので、ガス吸着が少
ないと共にパーティクルの発生がない。かつ2つの弁が
1つの弁箱内に集約されているのでデッドスペースが少
なくコンパクトである。
As described above, the purge valve of this embodiment can supply a small flow rate and a large flow rate of the purge gas, and can be used properly according to the situation, so that the waste of the purge gas can be reduced. In addition, since the flow path in the valve device, the narrow tube, and the gas contacting portion of the joint member can be individually and easily subjected to electrolytic polishing and then assembled, gas adsorption is small and particles are not generated. Moreover, since the two valves are integrated into one valve box, the dead space is small and the size is compact.

【0017】[0017]

【発明の効果】本発明によれば、ガス吸着が少なく、パ
ーティクルの発生がなく、デッドスペースの少ないコン
パクトな弁構造であって、小流量と大流量のパージガス
供給を選択して貯蔵容器の根元部分の奥深い場所まで完
全にかつ効率的にパージ処理ができる。
EFFECTS OF THE INVENTION According to the present invention, a compact valve structure with less gas adsorption, generation of particles, and less dead space, and a purge gas supply of a small flow rate and a large flow rate is selected and the root of the storage container is selected. Complete and efficient purging can be performed even in deep places.

【図面の簡単な説明】[Brief description of drawings]

【図1】 本発明のパージ弁を示し小流量パージ時の要
部断面図である。
FIG. 1 is a cross-sectional view of a main part of a purge valve according to the present invention during a small flow rate purge.

【図2】 本発明のパージ弁を示し大流量パージ時の要
部断面図である。
FIG. 2 is a cross-sectional view of an essential part showing a purge valve of the present invention during a large flow rate purge.

【図3】 従来のパージ機構を示す継手部分の配管図で
ある。
FIG. 3 is a piping diagram of a joint portion showing a conventional purging mechanism.

【符号の説明】[Explanation of symbols]

1…弁本体 2…弁箱 3…継手部材 4…パージガス導入上流路 5…パージガス導入下流路 6、11…隔壁 7A…第1の弁座部 7B…第2の弁座部 8A…第1のメタルダイヤフラム弁体 8B…第2のメタルダイヤフラム弁体 9A…第1の操作手段 9B…第2の操作手段 10…ガス導出流路 12…プロセスガス導出流路 14…デープパージ用パイプ 16…小流量パージ用パイプ 18…ガス通路 19…接続部 30…ナット部材 DESCRIPTION OF SYMBOLS 1 ... Valve main body 2 ... Valve box 3 ... Joint member 4 ... Purge gas introduction upper flow path 5 ... Purge gas introduction lower flow path 6, 11 ... Partition wall 7A ... 1st valve seat part 7B ... 2nd valve seat part 8A ... 1st Metal diaphragm valve body 8B ... Second metal diaphragm valve body 9A ... First operating means 9B ... Second operating means 10 ... Gas outlet passage 12 ... Process gas outlet passage 14 ... Depurge pipe 16 ... Small flow purge Pipe 18 ... Gas passage 19 ... Connection part 30 ... Nut member

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 パージガス導入上流路と、パージガス導
入下流路とが隔壁で遮られており、この隔壁に小流量が
通る連通孔を設け、両流路は第1の弁座部を介して連通
しており、前記弁座部に直接、着座あるいは離座をする
第1の金属製のダイヤフラム弁体と、このダイヤフラム
の上部に設けられダイヤフラムを押圧又はこれを解除す
る第1の操作手段とを備え、 同時に前記パージガス導入下流路と、ガス導出流路とが
隔壁で遮られていると共に両流路は第2の弁座部を介し
て連通しており、第2の弁座部に直接、着座あるいは離
座をする第2の金属製のダイヤフラム弁体と、このダイ
ヤフラムの上部に設けられダイヤフラムを押圧又はこれ
を解除する第2の操作手段とを一体的に備えた弁本体
と、 内部に通路を有し、一端にガス貯蔵容器との接続部を備
え、他端は前記ガス導出流路と接続した継手部材と、 前記継手部材の通路内にあり、一端は前記ガス貯蔵容器
の接続部付近まで延び、他端を前記ガス導出流路内に取
り付けたデイープパージ用パイプと、 前記継手部材に付設し、前記継手部材の接続部を介して
ガス貯蔵容器に接続するナット部材とからなることを特
徴とする小流量パージが可能な容器用パージ弁。
1. An upper flow path for introducing purge gas and a lower flow path for introducing purge gas are blocked by a partition wall, and the partition wall is provided with a communication hole through which a small flow rate passes, and both flow paths communicate with each other through a first valve seat portion. And a first metal diaphragm valve body which is seated or separated from the valve seat portion, and a first operation means which is provided on the diaphragm and presses or releases the diaphragm. At the same time, the purging gas introduction lower flow path and the gas derivation flow path are blocked by a partition wall, and both flow paths communicate with each other through a second valve seat portion, and directly to the second valve seat portion, A valve body integrally provided with a second metallic diaphragm valve body for seating or separating and a second operating means provided on the upper part of the diaphragm for pressing or releasing the diaphragm, and It has a passage and a gas storage container at one end A joint member having a connecting portion, the other end of which is in the passage of the joint member, and the other end of which is connected to the gas outlet passage, one end of which extends to the vicinity of the connecting portion of the gas storage container and the other end of which is the gas outlet passage A container capable of purging at a small flow rate, which comprises a deep purging pipe attached inside and a nut member attached to the joint member and connected to a gas storage container through a connecting portion of the joint member. Purge valve.
JP25443993A 1993-10-12 1993-10-12 Purge valve for container capable of making small flow rate purge Pending JPH07110074A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25443993A JPH07110074A (en) 1993-10-12 1993-10-12 Purge valve for container capable of making small flow rate purge

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25443993A JPH07110074A (en) 1993-10-12 1993-10-12 Purge valve for container capable of making small flow rate purge

Publications (1)

Publication Number Publication Date
JPH07110074A true JPH07110074A (en) 1995-04-25

Family

ID=17265020

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25443993A Pending JPH07110074A (en) 1993-10-12 1993-10-12 Purge valve for container capable of making small flow rate purge

Country Status (1)

Country Link
JP (1) JPH07110074A (en)

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