JPH07109572A - Production of coating body excellent in adhesion - Google Patents

Production of coating body excellent in adhesion

Info

Publication number
JPH07109572A
JPH07109572A JP27618293A JP27618293A JPH07109572A JP H07109572 A JPH07109572 A JP H07109572A JP 27618293 A JP27618293 A JP 27618293A JP 27618293 A JP27618293 A JP 27618293A JP H07109572 A JPH07109572 A JP H07109572A
Authority
JP
Japan
Prior art keywords
gas
coating
base material
substrate
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP27618293A
Other languages
Japanese (ja)
Other versions
JP3417986B2 (en
Inventor
Hiroyuki Kodama
浩亨 児玉
Kunio Shibuki
邦夫 渋木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tungaloy Corp
Original Assignee
Toshiba Tungaloy Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Tungaloy Co Ltd filed Critical Toshiba Tungaloy Co Ltd
Priority to JP27618293A priority Critical patent/JP3417986B2/en
Publication of JPH07109572A publication Critical patent/JPH07109572A/en
Application granted granted Critical
Publication of JP3417986B2 publication Critical patent/JP3417986B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)

Abstract

PURPOSE:To enhance the adhesive strength between a substrate and a coating film and the peeling resistance and to provide a highly reliable coating body reduced in variance by pretreating the surface of a substrate with a gas and then forming a coating film by CVD. CONSTITUTION:The surface of a substrate of the metal, alloy or ceramic sintered compact is coated with a film. In this case, the substrate is heated as the pretreatment in a pretreating gas consisting of a gaseous halogen and/or a gaseous halogen compd. contg. halogen element or a mixture of the pretreating gas with dilution gas, and then the substrate surface is coated with the film. Consequently, the adhesive strength between the substrate and coating film is increased by about 5-10 times as compared with the conventional production of the coating body by CVD, the variance is reduced, and the quality of the coating body is remarkably improved.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、金属,合金またはセラ
ミックス焼結体の基材の表面に、化学蒸着法(CVD
法)により被膜を被覆するための被覆物体の製造方法に
関し、具体的には、反応容器内で基材の表面にガスによ
る前処理を施した後、被膜を被覆して切削工具および耐
摩耗工具等の工具として最適にするための付着性に優れ
た被覆物体の製造方法に関する。
BACKGROUND OF THE INVENTION The present invention relates to a chemical vapor deposition method (CVD) on a surface of a base material of a metal, alloy or ceramics sintered body.
Method) for producing a coated object for coating a coating film, specifically, after subjecting a surface of a substrate in a reaction vessel to a pretreatment with a gas, the coating film is coated to form a cutting tool and an abrasion resistant tool. The present invention relates to a method of manufacturing a coated object having excellent adhesiveness for optimizing a tool such as.

【0002】[0002]

【従来の技術】一般に、気相−気相反応により基材の表
面に被膜を被覆させる方法として知られている熱CVD
法,プラズマCVD法またはレーザCVD法は、反応形
態により固相拡散反応,熱分解反応,水素還元反
応,複合反応,水素還元複合反応,置換反応等が
ある。
2. Description of the Related Art Generally, thermal CVD is known as a method for coating a film on a surface of a substrate by a gas phase-gas phase reaction.
The method, plasma CVD method or laser CVD method includes solid phase diffusion reaction, thermal decomposition reaction, hydrogen reduction reaction, complex reaction, hydrogen reduction complex reaction, substitution reaction and the like depending on the reaction mode.

【0003】これらの反応形態により行われる被覆工程
は、水や有機溶剤等で表面を洗浄した基材を反応容器内
に配置し、反応容器内を真空,水素ガスまたは不活性ガ
スの雰囲気とした後、昇温する第1工程と、被膜の構成
成分となる元素を含んだ気相またはその気相を励起させ
る励起ガスの添加や励起機構を備けて、加熱保持し、基
材の表面に被膜を被覆する第2工程と、反応容器内を冷
却する第3工程に大別できる。
In the coating process performed by these reaction modes, a substrate whose surface has been washed with water, an organic solvent or the like is placed in a reaction vessel, and the inside of the reaction vessel is evacuated or filled with hydrogen gas or an inert gas atmosphere. After that, a first step of raising the temperature and a gas phase containing an element to be a constituent of the coating or an excitation gas addition for exciting the gas phase and an excitation mechanism are provided, and the material is heated and held, and the surface of the substrate is heated. It can be roughly divided into a second step of coating a film and a third step of cooling the inside of the reaction vessel.

【0004】これらの工程を経て作製される被覆物体
は、被膜と基材との付着性が悪いこと、異質被膜間の付
着性が悪いことおよび付着強度のバラツキが大きいとい
う問題がある。
The coated article produced through these steps has the problems of poor adhesion between the coating and the substrate, poor adhesion between different coatings, and large variations in adhesion strength.

【0005】この問題を解決するための検討が多数行わ
れており、その1つの方法として、反応容器内に基材を
配置する前に、水や有機溶剤による基材表面の洗浄の他
に、超音波による基材表面の洗浄または酸やアルカリ溶
剤による基材表面のエッチング処理等があり、異質被膜
間の付着性の問題を解決しようとした代表的なものに、
特開昭59−219477号公報がある。
Many investigations have been made to solve this problem. One of the methods is to clean the surface of the substrate with water or an organic solvent before placing the substrate in the reaction vessel. Typical ones that have attempted to solve the problem of adhesion between different coatings, such as cleaning the substrate surface with ultrasonic waves or etching the substrate surface with an acid or alkaline solvent.
There is JP-A-59-219477.

【0006】[0006]

【発明が解決しようとする課題】被覆物体における被膜
の接合または結合するための方法として提案されている
特開昭59−219477号公報には、超硬合金に代表
される硬質金属製の切削植刃の基材表面を耐火金属の炭
化物,窒化物または炭窒化物の薄層で被覆し、該薄層を
酸化雰囲気に暴露して耐火金属の一酸化物より硬度の酸
化物を生成させ、該高度酸化物層をTiCl4,HfC
4,ZrCl4の1種の化合物とH2との混合ガスで還
元してその表面に一酸化物を生成させ、次いで一酸化物
表面上に硬質の耐摩耗性酸化アルミニウムを被覆させる
ことを特徴とする硬質金属製切削工具植刃の製造方法に
ついて記載されている。
SUMMARY OF THE INVENTION Japanese Patent Laid-Open No. 219477/1984 proposes a method for joining or joining coatings on a coated object, and a cutting plant made of hard metal represented by cemented carbide. Coating the substrate surface of the blade with a thin layer of a refractory metal carbide, nitride or carbonitride, and exposing the thin layer to an oxidizing atmosphere to form an oxide having a hardness higher than that of the refractory metal monoxide; Advanced oxide layer is TiCl 4 , HfC
l 4 , ZrCl 4 One compound of H 2 and a mixture gas of H 2 are reduced to form a monoxide on the surface, and then a hard wear-resistant aluminum oxide is coated on the surface of the monoxide. A method for manufacturing a characteristic hard metal cutting tool planting blade is described.

【0007】同公報に記載されている製造方法は、耐火
金属の炭化物,窒化物または炭窒化物の薄層と酸化アル
ミニウムの硬質層との接合または結合を強固にするとい
う方法であるが、基材と薄層との付着性については改善
されてなく、特にセラミックス焼結体の基材の場合に
は、基材と薄層間における剥離でもって短寿命になると
いう問題がある。
The manufacturing method described in the publication is a method of strengthening the bonding or bonding between a thin layer of a refractory metal carbide, nitride or carbonitride and a hard layer of aluminum oxide. The adhesion between the material and the thin layer has not been improved, and particularly in the case of the base material of the ceramics sintered body, there is a problem that the peeling between the base material and the thin layer shortens the service life.

【0008】本発明は、上述のような問題点を解決した
もので、具体的には、CVD法により基材の表面に被膜
を被覆する前に、ハロゲンガスおよび/またはハロゲン
元素を含むハロゲン化合物ガスの存在する雰囲気中で基
材を加熱する前処理工程を施して、被膜と基材との付着
強度、耐剥離性を高めると共に、バラツキの小さい、信
頼性の高い被覆物体を得るための製造方法の提供を目的
とする。
The present invention solves the above-mentioned problems, and specifically, a halogen compound containing a halogen gas and / or a halogen element is formed before the surface of a substrate is coated with a film by a CVD method. Manufacture to obtain a highly reliable coated object with little variation while increasing the adhesion strength and peeling resistance between the coating and the substrate by performing a pretreatment step of heating the substrate in an atmosphere containing gas. The purpose is to provide a method.

【0009】[0009]

【課題を解決するための手段】本発明者らは、被覆物体
を切削工具として用いた場合、特にセラミックス焼結体
の基材の表面に硬質被膜を被覆した被覆物体における基
材と被膜との付着強度を高めることについて検討してい
たところ、基材の表面に被膜を被覆する場合、基材と被
膜との付着性は、それぞれの材質の整合性,被膜厚さ,
基材の表面状態および被覆条件により大きく影響を受け
るが、被膜を被覆する前の基材表面状態を調整するこ
と、特に被膜を被覆するための反応容器内に基材を設置
してから被膜を被覆する直前における基材表面状態によ
り大きく影響を受けること、このとき基材表面をハロゲ
ンガスやハロゲン元素を含むハロゲン化合物ガスの存在
する雰囲気中で加熱するとより大きな効果があるという
知見を得て本発明を完成するに至ったものである。
Means for Solving the Problems When the coated object is used as a cutting tool, the inventors of the present invention have developed a ceramic sintered body, in which the surface of the substrate is coated with a hard coating, and As a result of studying how to increase the adhesive strength, when coating a film on the surface of a substrate, the adhesiveness between the substrate and the film depends on the consistency of the respective materials, the film thickness,
It is greatly affected by the surface condition of the base material and the coating conditions, but it is necessary to adjust the surface condition of the base material before coating the coating, especially after the base material is placed in the reaction vessel for coating the coating. It was found that it was greatly affected by the surface condition of the base material just before coating, and that heating the base material surface in an atmosphere containing halogen gas or a halogen compound gas containing a halogen element had a greater effect. The invention has been completed.

【0010】すなわち、本発明の被覆物体の製造方法
は、金属,合金またはセラミックス焼結体の基材の表面
にCVD法により被膜を被覆する方法において、ハロゲ
ンガスおよび/またはハロゲン元素を含むハロゲン化合
物ガスでなる前処理ガス中、もしくは該前処理ガスと希
釈ガスとの混合ガス(但し、基材の表面に被膜が形成さ
れるような処理ガスと希釈ガスとの組合わせは除く)中
で該基材を加熱する前処理工程を施した後、該基材の表
面に該被膜を被覆することを特徴とする方法である。
That is, the method for producing a coated article according to the present invention is a method of coating a film on the surface of a base material of a metal, alloy or ceramics sintered body by a CVD method, which is a halogen compound containing a halogen gas and / or a halogen element. In a pretreatment gas consisting of a gas, or in a mixed gas of the pretreatment gas and a diluent gas (excluding the combination of the treatment gas and the diluent gas such that a film is formed on the surface of the substrate). The method is characterized in that the surface of the substrate is coated with the coating after a pretreatment step of heating the substrate.

【0011】本発明の被覆物体の製造方法における基材
は、具体的には、例えば周期律表の4a,5a,6a族
の金属、ステンレス鋼,ダイス鋼,高速度鋼等の工具
鋼,Al合金,Ti合金または超硬合金,サーメット等
の焼結合金もしくは窒化ケイ素系セラミックス焼結体,
炭化ケイ素系セラミックス焼結体,酸化アルミニウム系
セラミックス焼結体,窒化アルミニウム系セラミックス
焼結体,酸化ジルコニウム系セラミックス焼結体を挙げ
ることができる。
The base material in the method for producing a coated article of the present invention is, for example, a metal of group 4a, 5a, 6a of the periodic table, tool steel such as stainless steel, die steel, high speed steel, Al, etc. Alloy, Ti alloy or cemented carbide, sintered alloy such as cermet or silicon nitride ceramics sintered body,
Examples thereof include silicon carbide-based ceramics sintered bodies, aluminum oxide-based ceramics sintered bodies, aluminum nitride-based ceramics sintered bodies, and zirconium oxide-based ceramics sintered bodies.

【0012】これらの基材の表面は、従来から行われて
いる水,有機溶剤,酸溶液,アルカリ溶液等で洗浄(超
音波洗浄も含む)処理を施すことは好ましいことであ
る。次いで、従来から実用されている各種のCVD法の
処理ができる装置の反応容器内に基材を設置し、基材の
表面に被膜を被覆する前に、ハロゲンガスおよび/また
はハロゲン元素を含むハロゲン化合物ガスでなる前処理
ガス中、もしくは該前処理ガスと希釈ガスとの混合ガス
(但し、基材の表面に被膜が形成されるような処理ガス
と希釈ガスとの組合わせは除く)中で基材を加熱する前
処理工程を施すことが本発明の製造方法の大きな特徴で
ある。
It is preferable that the surface of these base materials is subjected to conventional cleaning treatment (including ultrasonic cleaning) with water, an organic solvent, an acid solution, an alkaline solution or the like. Then, the substrate is placed in a reaction vessel of an apparatus capable of performing various CVD methods that have been conventionally used, and a halogen gas and / or a halogen element-containing halogen is applied before the surface of the substrate is coated with a coating film. In a pretreatment gas consisting of a compound gas, or in a mixed gas of the pretreatment gas and a diluent gas (excluding the combination of the treatment gas and the diluent gas such that a film is formed on the surface of the base material) A major feature of the production method of the present invention is to perform a pretreatment step of heating the substrate.

【0013】本発明の被覆物体の製造方法における前処
理ガスは、具体的には、例えばフッ素,塩素,臭素,ヨ
ウ素のハロゲンガス、CCl4,CF4,C26,C
38,CCl22,CBrF3,HF,HCl,CH
3,WF6,MoF6,TiCl4,AlCl3,Si
4,SiCl4,MoO2Cl2,CrO2Cl2のハロゲ
ン化炭素ガス,ハロゲン化水素ガス,ハロゲン化炭化水
素ガス,ハロゲン化ケイ素ガス,金属ハロゲン化ガスを
挙げることができる。
The pretreatment gas in the method for producing a coated article of the present invention is, for example, a halogen gas of fluorine, chlorine, bromine, iodine, CCl 4 , CF 4 , C 2 F 6 , C.
3 F 8 , CCl 2 F 2 , CBrF 3 , HF, HCl, CH
F 3 , WF 6 , MoF 6 , TiCl 4 , AlCl 3 , Si
Examples include F 4 , SiCl 4 , MoO 2 Cl 2 , and CrO 2 Cl 2 halogenated carbon gas, hydrogen halide gas, halogenated hydrocarbon gas, silicon halide gas, and metal halogenated gas.

【0014】これらの前処理ガスの中の少なくとも1種
のガス雰囲気中または前処理ガスと例えば水素,酸素,
一酸化炭素,不活性ガスの中の少なくとも1種の希釈ガ
スとの混合ガス中で基材を約400℃以上に加熱すると
いう前処理工程を施して、基材表面を改造した後、基材
表面に被膜を被覆する方法である。
In a gas atmosphere of at least one of these pretreatment gases or with the pretreatment gas such as hydrogen, oxygen,
After modifying the surface of the base material by subjecting the base material surface to a pretreatment step of heating the base material to about 400 ° C. or higher in a mixed gas of carbon monoxide and at least one diluent gas among inert gases, the base material This is a method of coating a film on the surface.

【0015】この前処理工程の前後に別の工程を付加す
ることも好ましいことであり、特に、反応容器内に基材
を設置し、次いで反応容器内を真空雰囲気中または非酸
化性ガス雰囲気中にして基材を昇温し、次いで前処理工
程を施した後、基材表面に被膜を被覆することは、基材
と被膜の付着強度から好ましいことである。また、以上
のような工程の後に、さらに物理蒸着法(PVD法)で
もって被膜を被覆し、多層膜とすることも好ましいこと
である。
It is also preferable to add another step before and after this pretreatment step. In particular, a base material is placed in a reaction vessel, and then the reaction vessel is subjected to a vacuum atmosphere or a non-oxidizing gas atmosphere. It is preferable from the standpoint of adhesion strength between the base material and the coating film to raise the temperature of the base material and then perform the pretreatment step and then coat the surface of the base material with the coating film. It is also preferable that after the above steps, the coating film is further coated by a physical vapor deposition method (PVD method) to form a multilayer film.

【0016】本発明の被覆物体の製造方法における被膜
は、用途および基材材質により選定する必要があるが、
従来のCVD法により被覆される被膜ならば制限されな
く、具体的には、例えば周期律表の4a,5a,6a族
の金属、これらの炭化物,窒化物,炭酸化物,窒酸化
物,硫化物,ホウ化物,Alの酸化物,窒化物,Siの
炭化物,窒化物およびこれらの相互固溶体、もしくは立
方晶窒化ホウ素,ダイヤモンド,ダイヤモンド状カーボ
ンの中の少なくとも1種の単層あるいは多層を挙げるこ
とができる。
The coating used in the method for producing a coated article of the present invention must be selected depending on the application and the material of the base material.
The film is not limited as long as it is a film coated by a conventional CVD method, and specifically, for example, metals of groups 4a, 5a and 6a of the periodic table, their carbides, nitrides, carbonates, oxynitrides and sulfides. , Boride, Al oxides, nitrides, Si carbides, nitrides and mutual solid solutions thereof, or at least one monolayer or multilayer of cubic boron nitride, diamond and diamond-like carbon. it can.

【0017】[0017]

【作用】本発明の被覆物体の製造方法は、前処理ガス、
または前処理ガスと希釈ガスとの混合ガスが基材表面の
付着または酸化した酸化物や不純物を除去し、面粗さを
大きくし、大きな面粗さの中に被膜がクサビ状に付着さ
れることにより、基材と被膜との付着強度を高める作用
をしていること、または基材表面の実質的表面積を広く
し、広い表面積に被膜が付着されることにより、基材と
被膜との付着強度を高める作用となっていること、さら
には、基材表面が研摩されている場合には、研摩により
生じた基材表面の微小クラックを減少または消滅させる
作用をし、その結果微小クラックから発生する被膜の剥
離を抑制するという間接的作用をしているものである。
The method for producing a coated object according to the present invention comprises a pretreatment gas,
Alternatively, the mixed gas of the pretreatment gas and the diluent gas removes the oxides or impurities that have adhered or oxidized on the surface of the base material to increase the surface roughness, and the film is attached like wedges in the large surface roughness. This has the effect of increasing the adhesive strength between the base material and the coating film, or widens the substantial surface area of the base material surface and allows the coating material to adhere to a large surface area, thereby adhering the base material to the coating film. It has the effect of increasing the strength, and further, when the base material surface is polished, it acts to reduce or eliminate microcracks on the base material surface caused by polishing, resulting in the generation of microcracks. It has an indirect effect of suppressing peeling of the coating film.

【0018】[0018]

【実施例1】92%Si34−5%Y23−3%Al2
3(重量%)組成の市販窒化ケイ素系焼結体をJIS
規格による形状SNMN120412に成形し、その表
面を鏡面研摩し、JIS規格B0601による表面粗さ
Ra=0.005μm以下にした基材を準備した。この
基材の表面を洗浄および乾燥した後、化学蒸着装置の反
応容器内に装着し、表1の昇温工程の条件でもって11
00℃まで昇温し、次いで表1に示した前処理工程、第
1被膜工程、第2被膜工程、第3被膜工程および冷却工
程を順次行って、本発明の方法による被覆物体を得た。
このとき、工程から次の工程に移る際には、必ずガスの
供給を止め、反応容器内に残ったガスは、エジェクター
ポンプにより5Torr以上の真空にして行った。
Example 1 92% Si 3 N 4 -5% Y 2 O 3 -3% Al 2
A commercially available silicon nitride-based sintered body having an O 3 (wt%) composition is JIS
A base material having a standard shape SNMN120412 and having its surface mirror-polished to have a surface roughness Ra of 0.005 μm or less according to JIS standard B0601 was prepared. After cleaning and drying the surface of the base material, the base material was mounted in a reaction vessel of a chemical vapor deposition apparatus, and the temperature was raised according to the conditions of the temperature raising step in Table 1.
The temperature was raised to 00 ° C., and then the pretreatment step, the first coating step, the second coating step, the third coating step and the cooling step shown in Table 1 were sequentially performed to obtain a coated object by the method of the present invention.
At this time, when moving from one step to the next step, the supply of gas was always stopped, and the gas remaining in the reaction vessel was evacuated to 5 Torr or more by an ejector pump.

【0019】比較として、表1に示した前処理工程のみ
行わず、その他をすべて上述と同様の工程で行って、比
較の方法による被覆物体を得た。
For comparison, only the pretreatment steps shown in Table 1 were not carried out, and the other steps were all carried out in the same steps as described above to obtain coated objects by the method of comparison.

【0020】こうして得た本発明の方法による被覆物体
と比較の方法による被覆物体の被膜の付着強度を評価す
るために、ロックウエルダイヤモンド圧子を用いたスク
ラッチ試験を行った結果、本発明の方法による被覆物体
は、10Kgfの荷重においても被膜の剥離が生じない
のに対し、比較の方法による被覆物体は、1Kgfの荷
重で被膜の剥離が生じた。
In order to evaluate the adhesion strength of the coating of the coated article obtained by the method of the present invention and the coated article obtained by the comparative method, a scratch test using a Rockwell diamond indenter was carried out. As a result, the coating produced by the method of the present invention was used. The object did not peel off the coating even under a load of 10 Kgf, whereas the coated article according to the comparative method caused peeling of the film under a load of 1 Kgf.

【0021】上述の本発明の方法および比較の方法の
内、基材の表面のみ、#400砥石で研削した面とし、
その他をそれぞれ同様に行って得た被覆物体を用いて、
被削材:FC350(HB208),切削時間:20
分,切削速度:200m/min,送り:0.3mm/
rev,切込み:1.5mm,乾式による切削試験を行
った結果、本発明の方法による被覆物体は、平均逃げ面
摩耗量(VB)=0.19で被膜の剥離が生じていなか
ったのに対し、比較のよる方法による被覆物体は、平均
逃げ面摩耗量(VB)=0.52で被膜の剥離が生じ
た。
Among the above-described method of the present invention and the comparative method, only the surface of the substrate is a surface ground with a # 400 grindstone,
Using coated objects obtained by performing the other respectively in the same manner,
Work Material: FC350 (HB208), Cutting Time: 20
Min, cutting speed: 200 m / min, feed: 0.3 mm /
rev, depth of cut: 1.5 mm, as a result of a dry cutting test, the coated object produced by the method of the present invention had an average flank wear amount (V B ) = 0.19, and no peeling of the coating occurred. On the other hand, in the case of the coated article prepared by the comparative method, the peeling of the coating occurred at the average flank wear amount (V B ) = 0.52.

【0022】[0022]

【表1】 [Table 1]

【0023】[0023]

【実施例2】92%WC−8%Co(重量%)組成の市
販超硬合金をJIS規格による形状SNMN12041
2に成形した基材を準備した。この基材を実施例1と同
様にして、表2の昇温工程の条件でもって1100℃ま
で昇温し、次いで表2に示した前処理工程、第1被膜工
程、第2被膜工程、第3被膜工程、第4被膜工程および
冷却工程を順次行って、本発明の方法による被覆物体を
得た。
Example 2 A commercially available cemented carbide having a composition of 92% WC-8% Co (% by weight) was formed into a shape according to JIS standard SNMN12041.
A base material molded into 2 was prepared. This substrate was heated to 1100 ° C. under the conditions of the temperature raising step of Table 2 in the same manner as in Example 1, and then the pretreatment step, first coating step, second coating step, The 3 coating step, the 4th coating step and the cooling step were sequentially performed to obtain a coated object by the method of the present invention.

【0024】比較として、表2に示した前処理工程のみ
行わず、その他をすべて上述と同様の工程で行って、比
較の方法による被覆物体を得た。
For comparison, only the pretreatment steps shown in Table 2 were not performed, and the other steps were all performed in the same steps as described above to obtain coated objects by the method of comparison.

【0025】こうして得た本発明の方法による被覆物体
と比較の方法による被覆物体の被膜の付着強度を実施例
1と同様にして評価した結果、本発明の方法による被覆
物体は、10Kgfの荷重においても被膜の剥離が生じ
ないのに対し、比較の方法による被覆物体は、5Kgf
の荷重で被膜の剥離が生じた。
As a result of evaluating the adhesion strength of the coating film of the thus-obtained coated article by the method of the present invention and the coated article by the comparative method in the same manner as in Example 1, the coated article by the method of the present invention was subjected to a load of 10 Kgf. No peeling of the coating occurs, whereas the coated object produced by the comparative method has 5 Kgf
The peeling of the coating film occurred under the load of.

【0026】[0026]

【表2】 [Table 2]

【0027】[0027]

【発明の効果】本発明の被覆物体の製造方法は、従来の
CVD法による被覆物体の製造方法に比べて、基材と被
膜との付着強度が約5〜10倍も優れているという顕著
な効果がある。
EFFECTS OF THE INVENTION The method for producing a coated article according to the present invention is remarkably superior in adhesion strength between the substrate and the coating by about 5 to 10 times as compared with the conventional method for producing a coated article by the CVD method. effective.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 金属,合金またはセラミックス焼結体の
基材の表面に化学蒸着法により被膜を被覆する方法おい
て、ハロゲンガスおよび/またはハロゲン元素を含むハ
ロゲン化合物ガスでなる前処理ガス中、もしくは該前処
理ガスと希釈ガスとの混合ガス(但し、基材の表面に被
膜が形成されるような処理ガスと希釈ガスとの組合わせ
は除く)中で該基材を加熱する前処理工程を施した後、
該基材の表面に該被膜を被覆することを特徴とする付着
性に優れた被覆物体の製造方法。
1. A method of coating a film on a surface of a base material of a metal, alloy or ceramics sintered body by a chemical vapor deposition method, in a pretreatment gas comprising a halogen gas and / or a halogen compound gas containing a halogen element, Alternatively, a pretreatment step of heating the base material in a mixed gas of the pretreatment gas and a diluting gas (excluding the combination of the treatment gas and the diluting gas such that a film is formed on the surface of the base material). After applying
A method for producing a coated article having excellent adhesion, which comprises coating the surface of the substrate with the coating.
【請求項2】 金属,合金またはセラミックス焼結体の
基材の表面に化学蒸着法により被膜を被覆する方法おい
て、真空もしくは非酸化性ガスの雰囲気中で該基材を昇
温する工程と、ハロゲンガスおよび/またはハロゲン元
素を含むハロゲン化合物ガスでなる前処理ガス中、ある
いは該前処理ガスと希釈ガスとの混合ガス(但し、基材
の表面に被膜が形成されるような処理ガスと希釈ガスと
の組合わせは除く)中で該基材を加熱する前処理工程と
を施した後、該基材の表面に該被膜を被覆することを特
徴とする付着性に優れた被覆物体の製造方法。
2. A method of coating a film on the surface of a base material of a metal, alloy or ceramics sintered body by a chemical vapor deposition method, which comprises heating the base material in a vacuum or an atmosphere of a non-oxidizing gas. In a pretreatment gas consisting of a halogen gas and / or a halogen compound gas containing a halogen element, or a mixed gas of the pretreatment gas and a diluting gas (provided that a treatment gas for forming a film on the surface of the base material is used). A pretreatment step of heating the base material in (excluding a combination with a diluting gas), and then coating the coating on the surface of the base material. Production method.
JP27618293A 1993-10-07 1993-10-07 Method for producing coated object with excellent adhesion Expired - Fee Related JP3417986B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27618293A JP3417986B2 (en) 1993-10-07 1993-10-07 Method for producing coated object with excellent adhesion

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27618293A JP3417986B2 (en) 1993-10-07 1993-10-07 Method for producing coated object with excellent adhesion

Publications (2)

Publication Number Publication Date
JPH07109572A true JPH07109572A (en) 1995-04-25
JP3417986B2 JP3417986B2 (en) 2003-06-16

Family

ID=17565862

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27618293A Expired - Fee Related JP3417986B2 (en) 1993-10-07 1993-10-07 Method for producing coated object with excellent adhesion

Country Status (1)

Country Link
JP (1) JP3417986B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4824232B2 (en) * 1999-06-16 2011-11-30 ティーディーワイ・インダストリーズ・インコーポレーテッド Substrate processing method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4824232B2 (en) * 1999-06-16 2011-11-30 ティーディーワイ・インダストリーズ・インコーポレーテッド Substrate processing method

Also Published As

Publication number Publication date
JP3417986B2 (en) 2003-06-16

Similar Documents

Publication Publication Date Title
JP2825693B2 (en) Coating tool and method of manufacturing the same
KR100193546B1 (en) Ultra hard membrane coating member and manufacturing method thereof
JP3249277B2 (en) Wear resistant coating
JPH06173009A (en) Coated cemented carbide excellent in wear resistance and its production
JPH11124672A (en) Coated cemented carbide
EP1616974B1 (en) Method for preparing an alpha alumina coating
JPH05320910A (en) Diamond coated member
JPH0819522B2 (en) Diamond-coated sintered alloy with excellent adhesion and method for producing the same
JPH07109572A (en) Production of coating body excellent in adhesion
JPH09124394A (en) Wear-resistant member
JP3353239B2 (en) Method for producing diamond-coated member
JP2797612B2 (en) Artificial diamond coated hard sintering tool member with high adhesion strength
JP3130734B2 (en) Heat resistant coating
JP3212057B2 (en) Diamond coated substrate and method for producing the same
JPH0617252A (en) Member coated with diamonds and its production
JPS61104078A (en) Hard coated sintered alloy and its manufacture
JP2002275571A (en) cBN-BASE SINTERED COMPACT, AND COATED TOOL CONSISTING THEREOF
Cerio et al. Machining of abrasive materials with diamond-coated tungsten carbide inserts
JP3242133B2 (en) High adhesion coating member and method of manufacturing the same
JP2621010B2 (en) Mold for metal plastic working
JP2623508B2 (en) Coated cemented carbide with adjusted surface roughness
JPH0797677A (en) Production of coated material
JPH07145483A (en) Wear resistant coated member
JP3009177B2 (en) Coated ceramic sintered body with excellent adhesion
JPH0733578B2 (en) Alumina-coated silicon nitride member

Legal Events

Date Code Title Description
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20030326

S533 Written request for registration of change of name

Free format text: JAPANESE INTERMEDIATE CODE: R313533

R360 Written notification for declining of transfer of rights

Free format text: JAPANESE INTERMEDIATE CODE: R360

R370 Written measure of declining of transfer procedure

Free format text: JAPANESE INTERMEDIATE CODE: R370

S533 Written request for registration of change of name

Free format text: JAPANESE INTERMEDIATE CODE: R313533

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

LAPS Cancellation because of no payment of annual fees