JPH07106925B2 - Method for manufacturing base material for optical fiber - Google Patents

Method for manufacturing base material for optical fiber

Info

Publication number
JPH07106925B2
JPH07106925B2 JP2645087A JP2645087A JPH07106925B2 JP H07106925 B2 JPH07106925 B2 JP H07106925B2 JP 2645087 A JP2645087 A JP 2645087A JP 2645087 A JP2645087 A JP 2645087A JP H07106925 B2 JPH07106925 B2 JP H07106925B2
Authority
JP
Japan
Prior art keywords
container
gas
glass
pressure
base material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2645087A
Other languages
Japanese (ja)
Other versions
JPS63195141A (en
Inventor
章 浦野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
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Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Priority to JP2645087A priority Critical patent/JPH07106925B2/en
Publication of JPS63195141A publication Critical patent/JPS63195141A/en
Publication of JPH07106925B2 publication Critical patent/JPH07106925B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01Manufacture of glass fibres or filaments
    • C03B37/012Manufacture of preforms for drawing fibres or filaments
    • C03B37/014Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01446Thermal after-treatment of preforms, e.g. dehydrating, consolidating, sintering
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01Manufacture of glass fibres or filaments
    • C03B37/012Manufacture of preforms for drawing fibres or filaments
    • C03B37/014Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01446Thermal after-treatment of preforms, e.g. dehydrating, consolidating, sintering
    • C03B37/0146Furnaces therefor, e.g. muffle tubes, furnace linings
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00Type of glass produced
    • C03B2201/06Doped silica-based glasses
    • C03B2201/08Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
    • C03B2201/12Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant doped with fluorine

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Thermal Sciences (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、多孔質母材を用いた光フアイバーの母材の製
造方法に関するもので、特にフツ素(F)を添加剤とし
て多量かつ高速で添加する光フアイバー用母材の製造方
法に関する。
TECHNICAL FIELD The present invention relates to a method for producing a base material of an optical fiber using a porous base material, and in particular, it uses fluorine (F) as an additive in a large amount and at high speed. The present invention relates to a method for manufacturing a base material for optical fibers added in step 1.

〔従来の技術〕[Conventional technology]

従来、光フアイバはVAD法、OVPO法など様々な製法で製
造されているが、生産性・品質などの点で注目されてい
る。これらの方法は、まず火炎加水分解反応により、ガ
ラス微粒子を生成し、回転する出発材上に次々と堆積さ
せ、棒状の多孔質プリフオームを作る。次にプリフオー
ムを様々なガス雰囲気中で加熱処理し、脱水・溶融ガラ
ス化し、光フアイバ母材を得る。さらにこの母材を紡糸
して光フアイバを得るという方法である。
Hitherto, optical fibers have been manufactured by various manufacturing methods such as the VAD method and the OVPO method, but attention has been paid to them in terms of productivity and quality. According to these methods, first, glass particles are produced by a flame hydrolysis reaction, and they are successively deposited on a rotating starting material to produce a rod-shaped porous preform. Next, the preform is heat-treated in various gas atmospheres, dehydrated and molten into glass to obtain an optical fiber base material. Furthermore, the method is a method in which this base material is spun to obtain an optical fiber.

光フアイバは、主として光の伝搬されるコア部と、その
周囲のクラツド部から構成されており、コア部の屈折率
をn1、クラツド部の屈折率をn2とすると、N.A(開口
数)は で定義される(n1,n2は平均値)。シリカ(SiO2)をベ
ースとすると光フアイバでは、(i)コアに屈折率を上
げる添加剤を添加する方式、(ii)クラツドに屈折率を
下げる添加剤を添加する方式、(iii)(i)と(ii)
の方式の合体方式、のいずれかの方式が用いられる。言
うまでもなく、(i)ではクラツド部が(ii)ではコア
部がシリカである。
An optical fiber is mainly composed of a core part through which light is propagated and a cladding part around it. If the refractive index of the core part is n 1 and the refractive index of the cladding part is n 2 , NA (numerical aperture) Is Is defined by (n 1 and n 2 are average values). In an optical fiber based on silica (SiO 2 ), (i) a method of adding an additive for increasing the refractive index to the core, (ii) a method of adding an additive for decreasing the refractive index to the cladding, (iii) (i ) And (ii)
Any one of the above method, which is a combination method. Needless to say, the cladding portion in (i) and the core portion in (ii) are silica.

通常よく用いられる添加剤としては、GeO2,P2O5,Al2O3,
TiO2(以上屈折率上昇用)、またB2O3,F(以上屈折率下
降用)等が挙げられる。第2図に波長0.59μmにおける
石英系ガラスの屈折率を示す。横軸はシリカ中の酸化物
重量%を、縦軸を屈折率(nα)および屈折率△n%を
あらわす。〔出典:熊丸、黒崎:“光伝送用材料”工業
材料27(1979),P39〕 これらの添加剤のうち、フツ素は最近になつて注目され
だした添加剤であつて、VAD法や他の製法においても添
加する方法が検討、開発されている。
Commonly used additives include GeO 2 , P 2 O 5 , Al 2 O 3 ,
Examples thereof include TiO 2 (for increasing the refractive index), B 2 O 3 and F (for decreasing the refractive index) and the like. Figure 2 shows the refractive index of silica glass at a wavelength of 0.59 µm. The abscissa represents the weight% of oxide in silica, and the ordinate represents the refractive index (nα) and the refractive index Δn%. [Source: Kumamaru, Kurosaki: “Optical Transmission Material” Industrial Material 27 (1979), P39] Among these additives, fluorine is one of the most recently added additives, and the VAD method and Methods of addition have been studied and developed in other production methods.

コア・クラツド間で同じ屈折率差を得たい場合に、一般
的クラツドで屈折率を下げた、前述の(ii)および(ii
i)の方式は、コア部に添加する添加剤量が全く無い
か、あるいは(i)の方式によるよりも少なくてすむ、
という利点を有してている。このことは、高NA光フアイ
バにとつて、コア部の添加剤による吸収損失が低減され
るという意味で有利である。また、放射線照射下での伝
送損失に優れた純シリカコア光フアイバは(ii)の方式
でしか作成できない。
When it is desired to obtain the same refractive index difference between the core and the cladding, the refractive index is lowered by the general cladding, and the above (ii) and (ii
The method i) requires no additive amount to be added to the core portion, or requires less amount than the method i).
It has the advantage of This is advantageous for a high NA optical fiber in that the absorption loss due to the additive in the core part is reduced. Moreover, a pure silica core optical fiber having excellent transmission loss under irradiation of radiation can be produced only by the method (ii).

このように、クラツド部の屈折率を下げる方式は有利な
特性をもつ。
As described above, the method of lowering the refractive index of the cladding portion has advantageous characteristics.

特に、VAD法の焼結工程において、フツ素を添加するこ
との利点は、 均一に添加でき、平坦な屈折率分布を与えることが
できる。
In particular, in the sintering step of the VAD method, the advantage of adding fluorine is that it can be added uniformly and a flat refractive index distribution can be provided.

処理速度が速い。すなわち数100〜1kg程度の多孔質
プリフオームを数時間以内で処理・ガラス化できる。
The processing speed is fast. That is, a porous preform of several 100 to 1 kg can be treated and vitrified within a few hours.

の2点において特に他方式よりすぐれている。2 is particularly superior to other methods.

しかしながら、従来技術においては、常圧下フツ素系ガ
ス100%雰囲気で多孔質プリフオームを加熱処理して
も、屈折率差で最大−0.75%程度しか添加されなかつ
た。また、他の製法、例えばプラズマ外付法と呼ばれる
方法では、熱プラズマによる火炎を用いてガラス原料を
出発棒上に吹き付け、堆積させ直接ガラス化させるが、
この際に同時にフツ素系ガスを添加させて、フツ素を添
加しようとしても、屈折率差−1%を与えるフツ素系ガ
スを含有させた場合、その堆積速度はせいぜい0.1g/分
であり、かつ、添加量を増加させると堆積速度が下がる
ことが知られている。
However, in the prior art, even if the porous preform was heat-treated in an atmosphere of 100% fluorine-based gas under normal pressure, only a maximum difference of about -0.75% was added due to the difference in refractive index. Further, in another manufacturing method, for example, a method called a plasma external method, a glass raw material is blown onto a starting rod by using a flame by thermal plasma, and the glass is directly deposited and vitrified,
At this time, when a fluorine-based gas is added at the same time to add fluorine, but when a fluorine-based gas that gives a refractive index difference of -1% is contained, the deposition rate is 0.1 g / min at most. Moreover, it is known that the deposition rate decreases as the amount of addition increases.

加えて、VAD法においてもプラズマ法においてもフツ素
を屈折率差で−0.5%以上添加しようとした場合、得ら
れたガラス母材中に気泡を残存せしめ、フツ素の添加量
を多くすればするほどこの傾向は大きくなるという問題
があつた。
In addition, in both the VAD method and the plasma method, when it is attempted to add fluorine by −0.5% or more due to a difference in refractive index, bubbles are left in the obtained glass base material and the amount of fluorine added is increased. However, there is a problem that this tendency becomes larger as it is done.

これに対し、石英を主成分とするガラス微粒子体の透明
ガラス化工程までに、該微粒子体を少なくとも一時期、
実質的にSiF4ガスからなるガス雰囲気中で加熱処理する
工程を有し、かつ該ガスを1気圧以上とし、さらには、
上記においてSiF4ガスを吹き流しつつ加熱処理するフツ
素を含んだ光フアイバー用ガラス母材の製造方法は、上
述の欠点を解消すること、すなわち、気泡を残すことな
くフツ素の添加量を向上すること、またフツ素添加を高
速で行えるようにすることを実現した。
On the other hand, by the time of the transparent vitrification step of the glass fine particles containing quartz as the main component, the fine particles are at least temporarily
A heat treatment is performed in a gas atmosphere consisting essentially of SiF 4 gas, and the gas is 1 atm or more;
In the above, the method for producing a glass preform for optical fibers containing fluorine, which is heat-treated while blowing SiF 4 gas, eliminates the above-mentioned drawbacks, that is, improves the amount of fluorine added without leaving bubbles. In addition, we have realized that fluorine can be added at high speed.

〔発明が解決しようとする問題点〕[Problems to be solved by the invention]

しかしながら、上述の方法は、反応性の高いフッ素系の
ガスを大気圧より高い圧力で使用するに加えて、比較的
高温での熱処理を行なうために、熱処理容器として金属
等を用いることは困難であつた。そのために金属以外の
ものを用いるが、ガスのリーク特に加熱処理用容器の劣
化に伴うリークの対策が要望されている。
However, the above-described method uses a highly reactive fluorine-based gas at a pressure higher than atmospheric pressure and also performs heat treatment at a relatively high temperature, and thus it is difficult to use a metal or the like as a heat treatment container. Atsuta For this reason, a material other than metal is used, but measures against gas leaks, especially leaks due to deterioration of the heat treatment container, are desired.

本発明の目的はフツ素系ガスのリークの問題が解決され
ており、不純物の混入なく、しかもフツ素を効率良く添
加できる光フアイバ母材の製造方法を提供することにあ
る。また本発明の別の目的は、従来より安価な装置を用
いることができる低コストの製造方法を提供することで
ある。
An object of the present invention is to solve the problem of leakage of fluorine-based gas, and to provide a method for producing an optical fiber preform capable of efficiently adding fluorine without mixing impurities. Another object of the present invention is to provide a low-cost manufacturing method capable of using a device which is cheaper than before.

〔問題点を解決するための手段〕[Means for solving problems]

本発明は加熱処理用容器を二重構造にし、かつガラス微
粒子体を保持する第1の容器の内圧P1と該第1の容器を
保持する第2の容器の内圧P2を P1>P2>P1−0.3kg/cm2かつP2>1気圧 となる様に調整し、更に第2の容器内雰囲気を希ガス及
び/又はチツ素ガス雰囲気とすることにより、第1の容
器内のフツ素系ガスのリークによる周辺環境の直接的な
汚染を防止するとともに、フツ素を添加した高品質の光
フアイバ用ガラス母材を製造する方法を提供するもので
ある。
The present invention is a heat treatment vessel in a double structure, and the internal pressure P 2 of the P 1 of the second container holding a first pressure P 1 and the first vessel of a container holding the glass particulate matter> P By adjusting so that 2 > P 1 -0.3 kg / cm 2 and P 2 > 1 atm, and by making the atmosphere in the second container a rare gas and / or nitrogen gas atmosphere, in the first container The present invention provides a method for producing a high-quality glass base material for optical fibers, which contains fluorine, while directly preventing the surrounding environment from being contaminated due to the leakage of the fluorine-based gas.

すなわち本発明は石英を主成分とするガラス微粒子体の
透明ガラス化工程までに、該微粒子体を少なくとも一時
期、実質的にSiF4ガスからなるガス雰囲気の第1の容器
内に保持しておき、この第1の容器をさらに、その内部
が希ガス及び/又はN2ガスを含有する雰囲気である第2
の容器内に保持すると共に、該第1の容器の内圧をP1
該第2の容器の内圧をP2としたときに、P1>P2>P1−0.
3kg/cm2であつて、かつP2>1気圧となるようにP1及びP
2を調整して加熱処理を行う工程を有することを特徴と
する光フアイバ用母材の製造方法である。
That is, according to the present invention, the fine particles are kept in the first container in a gas atmosphere substantially consisting of SiF 4 gas for at least a period of time until the transparent vitrification step of the glass fine particles containing quartz as a main component, The first container is further provided with a second container in which an atmosphere containing a rare gas and / or a N 2 gas is contained.
While keeping the internal pressure of the first container P 1 ,
When the internal pressure of the second container is P 2 , P 1 > P 2 > P 1 −0.
P 1 and P to be 3 kg / cm 2 and P 2 > 1 atm
A method for producing a base material for an optical fiber, which comprises the step of adjusting 2 and performing heat treatment.

本発明においては、上記第1の容器内のSiF4ガス及び第
2の容器内の希ガス及び/又はN2ガスを吹き流しつつ加
熱処理することが特に好ましい。また、本発明において
は第1の容器が高純度カーボン又は高純度石英ガラスか
らなるもの、第2の容器が高純度石英ガラスからなるも
のにて行なうことが好結果を得られるので好ましい。
In the present invention, it is particularly preferable to perform the heat treatment while blowing the SiF 4 gas in the first container and the rare gas and / or the N 2 gas in the second container. Further, in the present invention, it is preferable that the first container is made of high-purity carbon or high-purity quartz glass, and the second container is made of high-purity quartz glass because good results can be obtained.

以下図面を参照して本発明を具体的に説明する。第1図
は本発明の実施に用いられる加熱処理装置の1例を示す
もので、1はガラス微粒子体、2は第1の圧力容器、3
は第2の圧力容器、4及び5はハツチ、6は加熱装置、
7及び8は圧力計、9及び10はバルブ、11〜14はガス配
管を示し、図中の矢印はガスの流れの方向を示す。
The present invention will be specifically described below with reference to the drawings. FIG. 1 shows an example of a heat treatment apparatus used for carrying out the present invention, in which 1 is a fine glass particle body, 2 is a first pressure vessel, and 3 is a pressure vessel.
Is a second pressure vessel, 4 and 5 are hatches, 6 is a heating device,
7 and 8 are pressure gauges, 9 and 10 are valves, and 11 to 14 are gas pipes, and the arrows in the figure show the direction of gas flow.

ガラス微粒子体1を第1の圧力容器2、第2の圧力容器
3を有する二重構造の加熱処理用容器内にてフツ素添加
される。フツ素添加用ガスとしては実質的にSiF4ガスか
らなり圧力P1の雰囲気ガスを、バルブ7、ライン11を経
て第1の圧力容器2内に供給し、ライン13、バルブ9を
経て排気する。また第2の圧力容器3内には希ガス及び
/又はN2ガスからなり圧力P2の雰囲気ガスを、バルブ
8、ライン12を経て供給し、ライン14、バルブ10を経て
排気する。またこの間に加熱装置6により加熱する。こ
のときに、P1>P2>P1−0.3kg/cm2、かつP2>大気圧の
範囲となるようにP1及びP2をバルブ7,8,9及び10にて調
製して行なう。このように加熱処理用容器を2重にする
ことによりフッ素系ガスのリークによる周辺環境の汚染
を防止しうることは容易に類推可能である。
The glass microparticles 1 are added with fluorine in a double-structured heat treatment container having a first pressure vessel 2 and a second pressure vessel 3. An atmosphere gas consisting essentially of SiF 4 gas and having a pressure P 1 is supplied to the first pressure vessel 2 through the valve 7 and the line 11 and exhausted through the line 13 and the valve 9 as the fluorine addition gas. . Further, an atmosphere gas consisting of a rare gas and / or N 2 gas and having a pressure P 2 is supplied into the second pressure vessel 3 through the valve 8 and the line 12, and is exhausted through the line 14 and the valve 10. In addition, heating is performed by the heating device 6 during this time. At this time, prepare P 1 and P 2 with valves 7, 8, 9 and 10 so that P 1 > P 2 > P 1 −0.3 kg / cm 2 and P 2 > atmospheric pressure range. To do. It can be easily inferred that the double heat treatment container can prevent the surrounding environment from being contaminated due to the leakage of the fluorine-based gas.

しかしながら単に2重容器としただけでは例えば外側の
容器内の雰囲気ガスが内側の容器内のフツ素系ガスに混
入してガラス微粒子体へのフツ素添加が効率的に行われ
なかつたり、内側容器内の圧力と外側容器内の差圧によ
る内側容器の破損等の現象が発生し良好なガラス体を得
ることは困難である。
However, if a double container is simply used, for example, the atmospheric gas in the outer container is not mixed with the fluorine-based gas in the inner container to efficiently add fluorine to the fine glass particles, or the inner container is It is difficult to obtain a good glass body because phenomena such as damage to the inner container occur due to the pressure inside and the pressure difference inside the outer container.

本発明者らはこの点について更に検討を重ねた。その結
果、第1の容器(内側容器)2内の実質的SiF4からなる
雰囲気ガスの圧力をP1の希ガス及び/又はN2ガスからな
る雰囲気ガスの圧力をP2とするときに、P2を単に1気圧
(大気圧)より大とすることのみによつてもSiF4ガスの
周辺ガスへのリークは防止できるが、P2≧P1の場合には
第2の容器内の雰囲気ガスが第1の容器内に混入して、
これにより第1の容器内のSiF4ガス分圧を低下するた
め、フツ素添加量が所定量に未たないガラス母材を得て
しまうという事態がしばしば発生することが分つた。
The present inventors have further studied this point. As a result, when the pressure of the atmosphere gas substantially consisting of SiF 4 in the first container (inner container) 2 is P 2 the pressure of the atmosphere gas consisting of the rare gas of P 1 and / or N 2 gas, Leakage of SiF 4 gas to the surrounding gas can be prevented only by setting P 2 to more than 1 atm (atmospheric pressure), but when P 2 ≧ P 1 , the atmosphere in the second container Gas is mixed in the first container,
As a result, the SiF 4 gas partial pressure in the first container is lowered, and it has been found that a situation often occurs in which a glass base material in which the amount of fluorine added has not reached a predetermined amount is obtained.

これに対しP2をP1より小さくすることにより、第2の容
器内雰囲気ガスの第1の容器内への混入を防止できる
が、P2とP1の差圧を大きくとると、P1を所定圧力に保て
なかつたり、最悪の場合には第1の容器の破損を招く。
この点について本発明者らが詳細に実験、研究を続けた
結果、P1とP2が、P1>P2>P1−0.3kg/cm2なる関係を保
つように調製することにより外側容器内の雰囲気ガスの
内側容器内への混入を防止しつつ内側容器内の圧力を所
定の値に保持することが比較的容易であることを見出し
たのである。
On the other hand, by making P 2 smaller than P 1 , it is possible to prevent the atmospheric gas in the second container from mixing into the first container. However, if the pressure difference between P 2 and P 1 is large, P 1 Cannot be maintained at a predetermined pressure, or in the worst case, the first container may be damaged.
As a result of the inventors' detailed experiments and studies on this point, P 1 and P 2 were adjusted so as to maintain the relationship of P 1 > P 2 > P 1 −0.3 kg / cm 2 It has been found that it is relatively easy to maintain the pressure in the inner container at a predetermined value while preventing the atmospheric gas in the container from mixing into the inner container.

本発明においては第2の容器内の雰囲気ガスとしては希
ガス及び/又はN2ガスからなるガスを用いる。希ガスと
しては、例えばHe,Ar等が挙げられるが、Arがより好ま
しい。このような雰囲気ガスは原則として排ガス処理が
不要であるうえに比較的安価なため大流量で使用でき
る。これによつて、第2の容器はその耐圧性の範囲内で
大容量とすることができるため、蓋のシール部分を加熱
領域の外に置くような設計が容易となるので、第2の容
器つまり外側容器から周辺へのリークを防止して、内圧
の制御を容易に行うことも可能である。
In the present invention, a gas composed of a rare gas and / or N 2 gas is used as the atmosphere gas in the second container. Examples of the rare gas include He and Ar, but Ar is more preferable. In principle, such an atmospheric gas does not require exhaust gas treatment and is relatively inexpensive, so it can be used at a large flow rate. As a result, the second container can have a large capacity within the range of pressure resistance thereof, so that it is easy to design such that the sealing portion of the lid is placed outside the heating region. That is, it is possible to prevent leakage from the outer container to the surroundings and easily control the internal pressure.

さらに本発明においては、第1の容器すなわち内側容器
は、酸素雰囲気からは完全に遮断されており、かつ第1
と第2の容器間の差圧が極めて小さいので、高純度カー
ボンのように耐熱性が高く、かつ安価な材料を使用する
ことができる点も有利である。
Furthermore, in the present invention, the first or inner container is completely shielded from the oxygen atmosphere, and
Since the differential pressure between the second container and the second container is extremely small, it is also advantageous that a highly heat-resistant and inexpensive material such as high-purity carbon can be used.

また本発明においては、第2の容器としては、耐熱性、
耐圧性、耐酸化性、気密性が要求されるので、カーボン
では耐酸化性と気密性(カーボンでは内外の圧力差が大
きいとガスが透過する)に問題があり、上記の要求され
る条件をすべて満すものとして石英ガラスを用いること
が好ましい。さらに耐熱性の点で高純度石英ガラスのも
のが特に好ましい。
Further, in the present invention, the second container has heat resistance,
Since pressure resistance, oxidation resistance, and airtightness are required, there is a problem in oxidation resistance and airtightness with carbon (when carbon has a large pressure difference between the inside and outside, gas permeates). It is preferable to use quartz glass as a material that satisfies all requirements. Further, from the viewpoint of heat resistance, high-purity quartz glass is particularly preferable.

本発明の方法は、ガラス微粒子体を加圧したSiF4雰囲気
中で加熱処理を行うに際し、SiF4ガスの周辺へのリーク
を防止し、かつF添加を効率的に行うことができる。
The method of the present invention can prevent leakage of SiF 4 gas to the periphery and efficiently add F when heat treatment is performed in a SiF 4 atmosphere in which glass fine particles are pressurized.

なお、第1図を用いて説明したが、本発明の方法はこれ
に限定されるものではない。
Although the description has been made with reference to FIG. 1, the method of the present invention is not limited to this.

〔実施例〕〔Example〕

実施例1 第1図に示したような装置を用いてVAD法により作成し
た100mmφ×400mmlの純粋石英ガラス微粒子体について
本発明によりフツ素添加と透明化を行つた。第1の容器
内をSiF4100%雰囲気第2の容器内をN2100%雰囲気とし
た。各々の容器の内圧は、第1の容器が4.0kg/cm2、第
2の容器内圧が3.95kg/cm2であつた。温度1200℃で2時
間加熱処理を行つた後、溶融ガラス化された。得られた
ガラスの負の屈折率は1.06%であつた。周辺環境へのガ
スリークもなく、所定値のフツ素添加ができた。
Example 1 Pure silica glass fine particles of 100 mmφ × 400 mml prepared by the VAD method using the apparatus shown in FIG. 1 were added with fluorine and made transparent according to the present invention. The inside of the first container was set to 100% SiF 4 atmosphere and the inside of the second container was set to 100% N 2 atmosphere. The internal pressure of each container, the first container is 4.0 kg / cm 2, the second internal pressure of the container Atsuta at 3.95kg / cm 2. After heat treatment was carried out at a temperature of 1200 ° C. for 2 hours, it was melted and vitrified. The negative refractive index of the obtained glass was 1.06%. There was no gas leak to the surrounding environment, and fluorine could be added at the specified value.

比較例1 実施例1で用いたのと同様のガラス微粒子体について、
P1を4.0kg/cm2、P2を4.1kg/cm2とした以外は実施例と同
様に行つて溶融ガラス体を得た。得られたガラスの負の
屈折率は0.98%と実施例1の場合より0.08%小さい(絶
対値としては大きい)値であつた。又得られたガラス中
には何点かの気泡が見られた。これは第2の容器内のN2
ガスが第1の容器内に混入したためと思われる。
Comparative Example 1 With respect to the same glass fine particle body as that used in Example 1,
Except that the P 1 was 4.0kg / cm 2, P 2 and 4.1 kg / cm 2 was obtained by following Example as well as means pursuant molten glass body. The negative refractive index of the obtained glass was 0.98%, which was 0.08% smaller than that in Example 1 (large in absolute value). Also, some bubbles were found in the obtained glass. This is N 2 in the second container
It seems that the gas was mixed in the first container.

比較例2 実施例1及び比較例1で用いたと同様のガラス微粒子体
について、P1を4.0kg/cm2、P2を3.5kg/cm2とした以外は
実施例1と同様に行つた。2時間に及ぶ熱処理中第1の
容器内圧をモニターとしたところ極めて不安定であり実
施例1と同じSiF4流量では平均して3.7気圧であつた。
得られたガラスの負屈折率は1.04%であつた。実施例1
の場合の−1.06%に比べると、フッ素の添加効率が低下
していることがわかる。
The same glass soot body and used in Comparative Example 2 Example 1 and Comparative Example 1, a P 1 to 4.0 kg / cm 2, P 2 similarly except that the 3.5 kg / cm 2 from Example 1 KoTsuta. When the pressure inside the first container was monitored during the heat treatment for 2 hours, it was extremely unstable, and the average SiF 4 flow rate as in Example 1 was 3.7 atm.
The negative refractive index of the obtained glass was 1.04%. Example 1
It can be seen that the addition efficiency of fluorine is lower than that of -1.06% in the case of.

以上の実施例、比較例から本発明の有効なことが明らか
である。なお本発明の上記実施例により限定されるもの
ではないことは言うまでもない。
From the above examples and comparative examples, it is clear that the present invention is effective. Needless to say, the present invention is not limited to the above-mentioned embodiments.

〔発明の効果〕〔The invention's effect〕

以上の説明から明らかなように、本発明は次の効果を奏
する。
As is clear from the above description, the present invention has the following effects.

(1) 容器を二重構造にして第1の容器内をSiF4ガス
雰囲気とし、第2の容器内を希ガス及び/又はN2ガスか
らなる雰囲気ガスを吹き流すことにより、SiF4ガスの周
辺のリークを防止しつつ加圧雰囲気でガス微粒子体を熱
処理することが可能である。
(1) The container is made into a double structure, the inside of the first container is made into a SiF 4 gas atmosphere, and the atmosphere gas consisting of a rare gas and / or N 2 gas is blown into the inside of the second container, so that the SiF 4 gas It is possible to heat-treat the gas fine particles in a pressurized atmosphere while preventing the leakage of the surrounding area.

(2) 第1の容器内圧力をP1、第2の容器内圧力をP2
とするとき、P1>P2>P1−0.3kg/cm2とすることにより
第1の容器内へのSiF4以外のガス混入を防止しかつ第1
の容器内圧を安定に保つことができる。
(2) The first container pressure is P 1 , and the second container pressure is P 2.
In this case, by setting P 1 > P 2 > P 1 −0.3 kg / cm 2 , it is possible to prevent gas other than SiF 4 from entering the first container and
The internal pressure of the container can be kept stable.

(3) 第1の容器は酸素遮断された状態であり、第2
容器内圧力との差圧は0.3kg/cm2より小さいので、耐熱
性大で安価な高純度カーボン製容器を用いることができ
る。
(3) The first container is in a state where oxygen is blocked, and the second container
Since the pressure difference from the internal pressure of the container is less than 0.3 kg / cm 2, it is possible to use an inexpensive high-purity carbon container having high heat resistance.

(4) 第2の容器はかなり容量が大きくてもよいの
で、上部蓋のシール部を加熱領域外に設計できるので、
リーク防止がより有効に行なえる。
(4) Since the second container may have a considerably large capacity, the seal portion of the upper lid can be designed outside the heating area.
Leak prevention can be performed more effectively.

【図面の簡単な説明】[Brief description of drawings]

第1図は本発明を実施するのに用いる装置の概念図であ
る。
FIG. 1 is a conceptual diagram of an apparatus used to carry out the present invention.

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】石英を主成分とするガラス微粒子体の透明
ガラス化工程までに、該微粒子体を少なくとも一時期、
実質的にSiF4ガスからなるガス雰囲気の第1の容器内に
保持しておき、この第1の容器をさらに、その内部が希
ガス及び/又はN2ガスを含有する雰囲気である第2の容
器内に保持すると共に、該第1の容器の内圧をP1、該第
2の容器の内圧をP2としたときに、P1>P2>P1−0.3kg/
cm2であつて、かつP2>1気圧となるようにP1及びP2
調整して加熱処理を行う工程を有することを特徴とする
光フアイバ用母材の製造方法。
1. A method for producing a glass fine particle containing quartz as a main component at least for a period of time before the step of vitrifying the fine glass.
The first container is kept in a first container having a gas atmosphere consisting essentially of SiF 4 gas, and the first container is further provided with a second container whose inside contains a rare gas and / or N 2 gas. While holding in the container, when the internal pressure of the first container is P 1 and the internal pressure of the second container is P 2 , P 1 > P 2 > P 1 −0.3 kg /
A method for producing a base material for an optical fiber, which has a step of performing heat treatment by adjusting P 1 and P 2 so that the pressure is cm 2 and P 2 > 1 atm.
【請求項2】第1の容器内のSiF4ガス及び第2の容器内
の希ガス及び/又はN2ガスを吹き流しつつ加熱処理する
特許請求の範囲の第(1)項に記載される光フアイバ用
母材の製造方法。
2. The light according to claim 1, wherein heat treatment is carried out while blowing SiF 4 gas in the first container and rare gas and / or N 2 gas in the second container. Manufacturing method of base material for fiber.
【請求項3】第1の容器として高純度カーボン又は高純
度石英ガラスからなるものを用いて、第2の容器が高純
度石英ガラスからなるものを用いて行なう特許請求の範
囲第(1)項に記載される光フアイバー用母材の製造方
法。
3. The method according to claim 1, wherein the first container is made of high-purity carbon or high-purity quartz glass, and the second container is made of high-purity quartz glass. The method for producing a base material for optical fibers described in 1.
JP2645087A 1987-02-09 1987-02-09 Method for manufacturing base material for optical fiber Expired - Fee Related JPH07106925B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2645087A JPH07106925B2 (en) 1987-02-09 1987-02-09 Method for manufacturing base material for optical fiber

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2645087A JPH07106925B2 (en) 1987-02-09 1987-02-09 Method for manufacturing base material for optical fiber

Publications (2)

Publication Number Publication Date
JPS63195141A JPS63195141A (en) 1988-08-12
JPH07106925B2 true JPH07106925B2 (en) 1995-11-15

Family

ID=12193839

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2645087A Expired - Fee Related JPH07106925B2 (en) 1987-02-09 1987-02-09 Method for manufacturing base material for optical fiber

Country Status (1)

Country Link
JP (1) JPH07106925B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6734724B2 (en) * 2016-07-29 2020-08-05 芝浦メカトロニクス株式会社 Damage detection device for double container, damage detection method, and substrate processing device

Also Published As

Publication number Publication date
JPS63195141A (en) 1988-08-12

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