JPH07106496A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPH07106496A
JPH07106496A JP25195693A JP25195693A JPH07106496A JP H07106496 A JPH07106496 A JP H07106496A JP 25195693 A JP25195693 A JP 25195693A JP 25195693 A JP25195693 A JP 25195693A JP H07106496 A JPH07106496 A JP H07106496A
Authority
JP
Japan
Prior art keywords
lead
semiconductor element
pitch
package
electrodes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP25195693A
Other languages
Japanese (ja)
Inventor
Yukinori Aoki
幸典 青木
Satoshi Honda
智 本田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP25195693A priority Critical patent/JPH07106496A/en
Publication of JPH07106496A publication Critical patent/JPH07106496A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48247Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/484Connecting portions
    • H01L2224/4847Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond
    • H01L2224/48472Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond the other connecting portion not on the bonding area also being a wedge bond, i.e. wedge-to-wedge

Abstract

PURPOSE:To easily increase the number of terminals of a semiconductor device by a method wherein both ends of a second lead terminal part provided with a plurality of lead terminals which are piled up in the thickness direction so as to be insulated electrically are branched and installed so as to correspond to a pitch between electrodes and a pitch at a first lead terminal part. CONSTITUTION:Many lead terminals 26 constituting a first lead terminal part 23 are arranged in a row and in parallel at every piece of a semiconductor element 22, and end parts 27 are extended rectlinearly and arranged nearly uniformly at a pitch E and on nearly the same plane. In addition, two lead terminals 31, 32, for a second lead terminal part 30, which are composed of a conductive material are stacked by sandwiching a double-sided tape, they are bonded in such a way that an interval between end parts on one side coincides nearly with a pitch D between electrodes 25a, 25b, and end parts on the other side are bonded so as to coincide nearly with the pitch E between the lead terminals 26. Since the electrodes 25a, 25b can be connected to the lead terminals 26 without using any metal thin wire, the pitch D between the electrodes and the pitch E between the lead terminals can be set to be narrow.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、例えば、狭ピッチで多
数のリ−ドが形成された半導体装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor device in which a large number of leads are formed at a narrow pitch.

【0002】[0002]

【従来の技術】例えば、図10に示すSOP(Small Out
line Package) 1や、図11に示すQFP(Quad Flat P
ackage) 2などの半導体装置が知られている。これらの
うちのQFP2においては、図12に示すように半導体
素子3がアイランド4に接合されるとともに、図13に
示すように半導体素子のバンプ電極5が、金属細線6を
介して対応するリ−ド端子7の基端部に接続されてい
る。さらに、半導体素子3は矩形な樹脂製のパッケ−ジ
8に封止されており、多数のリ−ド端子7の一部がパッ
ケ−ジ8の四つの側面から突出している。
2. Description of the Related Art For example, the SOP (Small Out) shown in FIG.
line Package) 1 or QFP (Quad Flat P) shown in FIG.
Semiconductor devices such as ackage) 2 are known. In the QFP 2 among these, the semiconductor element 3 is bonded to the island 4 as shown in FIG. 12, and the bump electrode 5 of the semiconductor element is connected to the corresponding lead via the metal thin wire 6 as shown in FIG. It is connected to the base end of the terminal 7. Further, the semiconductor element 3 is sealed in a rectangular resin package 8, and a large number of lead terminals 7 partially project from the four side surfaces of the package 8.

【0003】ここで、リ−ド端子7はアイランド4とと
もにリ−ドフレ−ム(図示しない)から打抜かれてい
る。そして、リ−ド端子7の金属細線6が接続された側
の端部はインナリ−ド9であり、パッケ−ジ8から突出
した部分の先端部はアウタリ−ド10である。
Here, the lead terminal 7 is punched together with the island 4 from a lead frame (not shown). The end of the lead terminal 7 on the side to which the thin metal wire 6 is connected is the inner lead 9, and the tip of the portion protruding from the package 8 is the outer lead 10.

【0004】半導体素子3の封止の際には、半導体素子
3が装着されたリ−ドフレ−ムが金型に装填され、金型
にエポキシ樹脂等の熱硬化性樹脂が供給されて、パッケ
−ジ8がトランスファ成形される。
When the semiconductor element 3 is sealed, the lead frame on which the semiconductor element 3 is mounted is loaded into a mold, and a thermosetting resin such as an epoxy resin is supplied to the mold to package the package. The die 8 is transfer molded.

【0005】なお、図10のSOP1についても、同様
な結線構造及び封止方法を適用することが可能である。
上述のQFP2に代表されるように、高機能な半導体装
置においては、リ−ド端子7の数が極めて多い。一方、
半導体装置には、実装密度を高めることを目的として小
型化が要求されている。そして、多端子化及び小型化を
両立するために、リ−ド端子7の狭ピッチ化が進められ
ている。
A similar connection structure and sealing method can be applied to the SOP1 shown in FIG.
As represented by QFP2 described above, the number of lead terminals 7 is extremely large in a high-performance semiconductor device. on the other hand,
The semiconductor device is required to be miniaturized for the purpose of increasing the packaging density. In order to achieve both multi-terminals and miniaturization, the lead terminals 7 are being narrowed in pitch.

【0006】[0006]

【発明が解決しようとする課題】ところで、リ−ド端子
7の狭ピッチ化を進めるほど、各インナリ−ド9の幅が
小さくなり、金属細線6の接続スペ−スが狭くなる。こ
のため、インナリ−ド9と半導体素子3との距離を拡げ
てインナリ−ドピッチAを増すことによって、インナリ
−ド9の接続スペ−スが確保されている。そして、これ
に伴って、金属細線6は長ル−プ化(金属細線6の長さ
を大とすること)されている。
By the way, as the pitch of the lead terminals 7 is made narrower, the width of each inner lead 9 becomes smaller and the connecting space of the fine metal wires 6 becomes narrower. Therefore, the connection space of the inner lead 9 is secured by increasing the inner lead pitch A by increasing the distance between the inner lead 9 and the semiconductor element 3. Along with this, the fine metal wire 6 is made into a long loop (the length of the fine metal wire 6 is increased).

【0007】しかし、金属細線6を長ル−プ化すると、
樹脂封止の際に樹脂から金属細線6に作用する力が増す
ため、金属細線6の変形が生じ易くなる。そして、変形
が過度に大きい場合には、金属細線6が半導体素子3や
隣の金属細線6と短絡することがある。
However, if the metal thin wire 6 is made into a long loop,
Since the force exerted by the resin on the metal thin wire 6 during the resin sealing increases, the metal thin wire 6 is easily deformed. When the deformation is excessively large, the thin metal wire 6 may short-circuit with the semiconductor element 3 or the adjacent thin metal wire 6.

【0008】また、金属細線6の接続ピッチには限界が
あるため、電極ピッチBやインナリ−ドピッチAを、金
属細線6の接続可能な最小ピッチよりも小さく設定する
ことはできない。このため、半導体素子3及びパッケ−
ジ8の面積を拡大せずに多端子化を進めることは困難で
ある。
Further, since the connection pitch of the fine metal wires 6 is limited, the electrode pitch B and the inner lead pitch A cannot be set smaller than the minimum pitch at which the fine metal wires 6 can be connected. Therefore, the semiconductor element 3 and the package
It is difficult to increase the number of terminals without increasing the area of the gate 8.

【0009】さらに、近年は、半導体の高集積度化も進
んでいるが、集積度が高まるほど消費電力が増すため、
半導体装置の低熱抵抗化の要求が高まっている。本発明
の目的とするところは、多端子化が容易な半導体装置を
提供することにある。
Further, in recent years, the degree of integration of semiconductors has been increasing, but since the power consumption increases as the degree of integration increases,
There is an increasing demand for lower thermal resistance of semiconductor devices. An object of the present invention is to provide a semiconductor device that can be easily made multi-terminal.

【0010】[0010]

【課題を解決するための手段および作用】上記目的を達
成するために請求項1の発明は、端縁部に沿って所定の
ピッチで配設された多数の電極を有する半導体素子と、
この半導体素子を封止したパッケ−ジと、一端部がパッ
ケ−ジから導出され他端部がパッケ−ジの外壁に近接し
た内部に位置し半導体素子の電極よりも大きいピッチで
配設された多数のリ−ドを有する第1リ−ド部と、半導
体素子の電極と第1リ−ド部とを電気的に接続する第2
リ−ド部とを具備し、第2リ−ド部は、電気的に絶縁し
て厚さ方向に重ねられた複数のリ−ドを有し、且つ、両
端が電極のピッチ及び第1リ−ド部のリ−ドのピッチに
対応して分岐して設けられている。
In order to achieve the above object, the invention of claim 1 is a semiconductor device having a large number of electrodes arranged at a predetermined pitch along an edge portion,
The package encapsulating the semiconductor element and one end of the package which is led out from the package and the other end of which is located inside the package close to the outer wall of the package and arranged at a pitch larger than that of the electrodes of the semiconductor element. A first lead portion having a large number of leads, and a second lead electrically connecting the electrode of the semiconductor element and the first lead portion.
The second lead portion has a plurality of leads that are electrically insulated and are stacked in the thickness direction, and both ends have the electrode pitch and the first lead. It is provided so as to branch according to the lead pitch of the lead portion.

【0011】また、請求項6の発明は、端縁部に沿って
所定のピッチで配設された多数の電極を有する半導体素
子と、この半導体素子を封止したパッケ−ジと、一端部
がパッケ−ジから導出され他端部がパッケ−ジの外壁に
近接した内部に位置し半導体素子の電極よりも大きいピ
ッチで配設された多数のリ−ドを有する第1リ−ド部
と、パッケ−ジ内で半導体素子を支持する絶縁性の内部
基板と、この内部基板上に薄膜状に形成され一端部が電
極に電気的に接続されるとともに他端部が内部基板の外
縁部に放射状に延在して電極よりも大きいピッチで拡が
った複数のリ−ドを有する第2リ−ド部と、第1リ−ド
部と第2リ−ド部とを接続するワイヤとを具備した。そ
して、これらの発明は半導体装置を容易に多端子化でき
るようにした。
According to a sixth aspect of the present invention, a semiconductor element having a large number of electrodes arranged at a predetermined pitch along the edge, a package encapsulating the semiconductor element, and one end A first lead portion having a large number of leads which are led out of the package and whose other end is located in the vicinity of the outer wall of the package and arranged at a pitch larger than the electrodes of the semiconductor element; An insulative internal substrate for supporting the semiconductor element in the package, and a thin film formed on the internal substrate, one end of which is electrically connected to the electrode and the other end of which is radial to the outer edge of the internal substrate. A second lead portion having a plurality of leads extending to the upper end and extending at a pitch larger than the electrode, and a wire connecting the first lead portion and the second lead portion. . And these inventions made it possible to easily make a semiconductor device multi-terminal.

【0012】[0012]

【実施例】以下、本発明の各実施例を図1〜図9に基づ
いて説明する。図1〜図4は本発明の第1実施例の要部
を示すもので、図1中の符号21はQFP(Quad Flat P
ackage) 型の半導体装置である。この半導体装置21
は、半導体素子22と第1リ−ド部23とを有してい
る。ここで、図1は半導体装置21の約1/4の部分の
みを示しており、その他の部分の図示は省略されてい
る。
Embodiments of the present invention will be described below with reference to FIGS. 1 to 4 show an essential part of a first embodiment of the present invention, in which reference numeral 21 is QFP (Quad Flat P
ackage) type semiconductor device. This semiconductor device 21
Has a semiconductor element 22 and a first lead portion 23. Here, FIG. 1 shows only about 1/4 of the semiconductor device 21, and the other parts are omitted.

【0013】半導体素子22の素子形成面24には多数
の電極としてのバンプ電極(以下、電極と称する)25
a、25bが形成されており、これら電極25a、25
bは半導体素子22の端縁部に沿って二列に千鳥配列さ
れている。ここで、図1中の符号Dは電極25a、25
bのピッチを示している。また、素子形成面24の電極
25a、25b以外の部分には、絶縁性材料がコ−ティ
ングされている。なお、半導体素子22をアイランドに
装着してもよい。
Bump electrodes (hereinafter referred to as electrodes) 25 as a large number of electrodes are formed on the element formation surface 24 of the semiconductor element 22.
a, 25b are formed, and these electrodes 25a, 25b
b are staggered in two rows along the edge of the semiconductor element 22. Here, reference numeral D in FIG. 1 indicates electrodes 25a, 25
The pitch of b is shown. An insulating material is coated on the portion other than the electrodes 25a and 25b on the element forming surface 24. The semiconductor element 22 may be mounted on the island.

【0014】第1リ−ド部23は多数のリ−ド端子26
によって構成されている。リ−ド端子26は半導体素子
22の各片毎に一列に且つ平行に並べられている。さら
に、リ−ド端子26の半導体素子22の側の端部(イン
ナリ−ド)27は直線状に延びており、リ−ド端子26
のピッチEは略均一に設定されている。そして、リ−ド
23の端部27は略同一平面上に揃っている。
The first lead portion 23 has a large number of lead terminals 26.
It is composed by. The lead terminals 26 are arranged in a line and in parallel for each piece of the semiconductor element 22. Further, the end portion (inner lead) 27 of the lead terminal 26 on the semiconductor element 22 side extends linearly, and the lead terminal 26
Pitch E is set to be substantially uniform. The ends 27 of the leads 23 are substantially flush with each other.

【0015】半導体素子22とリ−ド端子26の端部2
7は矩形なパッケ−ジ28によって封止されており、リ
−ド23はパッケ−ジ28の四つの側面29(外壁)か
ら略垂直に突出している。つまり、リ−ド端子26の端
部27はパッケ−ジ28の、側面29に近接した内部に
位置している。パッケ−ジ28の材質としてエポキシ樹
脂を利用し、成型方法としてトランスファ成形を採用す
ることが可能である。なお、図1においては、パッケ−
ジ26は二点鎖線によって概略的に示されている。
The end portion 2 of the semiconductor element 22 and the lead terminal 26
7 is sealed by a rectangular package 28, and the lead 23 projects substantially vertically from the four side surfaces 29 (outer wall) of the package 28. That is, the end portion 27 of the lead terminal 26 is located inside the package 28 adjacent to the side surface 29. It is possible to use an epoxy resin as the material of the package 28 and adopt transfer molding as a molding method. In FIG. 1, the package is
The di 26 is schematically indicated by a chain double-dashed line.

【0016】また、図1中に符号30で示すのは複数の
第2リ−ド部である。各第2リ−ド部30は、図2及び
図3中に示すように、ともに導電性の材質からなる二枚
のリ−ド31、32と、絶縁性の材質からなる両面テ−
プ33とを有している。リ−ド31、32と両面テ−プ
33との幅は略等しく設定されており、リ−ド31、3
2は両面テ−プ33を挟んで積層されている。第2リ−
ド部30は、半導体素子22の周囲に放射状に配設され
ている。そして、第2リ−ド部30の長さは、半導体装
置22(及びパッケ−ジ28)の各片の中央から両端へ
いくほど長い。
Reference numeral 30 in FIG. 1 denotes a plurality of second lead portions. As shown in FIGS. 2 and 3, each second lead portion 30 has two leads 31 and 32 both made of a conductive material and a double-sided tape made of an insulating material.
And 33. The widths of the leads 31 and 32 and the double-sided tape 33 are set to be substantially equal to each other.
2 are laminated with a double-sided tape 33 sandwiched therebetween. Second Lee
The cord portions 30 are radially arranged around the semiconductor element 22. The length of the second lead portion 30 is longer from the center of each piece of the semiconductor device 22 (and the package 28) to both ends.

【0017】また、各第2リ−ド部30の両端において
は、図3(a)及び図4(a)に示すように、リ−ド3
1、32が異なる方向に延びて分岐している。分岐した
部分においては、リ−ド31、32に両面テ−プ33は
貼着されていない。さらに、上側のリ−ド32両端は、
図3(b)及び図4(b)に示すように、下側のリ−ド
31の端部と同じ高さに位置するよう折曲されている。
At both ends of each second lead portion 30, as shown in FIGS. 3 (a) and 4 (a), leads 3 are provided.
1, 32 extend in different directions and are branched. The double-sided tape 33 is not attached to the leads 31 and 32 at the branched portion. Furthermore, both ends of the upper lead 32 are
As shown in FIGS. 3 (b) and 4 (b), it is bent so as to be located at the same height as the end portion of the lower lead 31.

【0018】第2リ−ド部30の一方の端部において、
リ−ド31、32の間隔は電極25a、25bのピッチ
Dに略一致しており、この部分は各電極25a、25b
に接合されている。また、他方の端部におけるリ−ド3
1、32の間隔はリ−ド端子26のピッチEに略一致し
ており、この部分はリ−ド端子26に接合されている。
At one end of the second lead portion 30,
The distance between the leads 31 and 32 is substantially equal to the pitch D of the electrodes 25a and 25b, and this portion corresponds to the electrodes 25a and 25b.
Is joined to. The lead 3 at the other end
The interval between 1 and 32 is substantially equal to the pitch E of the lead terminal 26, and this portion is joined to the lead terminal 26.

【0019】ここで、リ−ド31、32と電極25a、
25b及びリ−ド端子26との接合方法として、熱圧着
を採用することが可能である。また、本実施例では、リ
−ド31、32の積層は成形の後に行われている。
Here, the leads 31, 32 and the electrodes 25a,
It is possible to employ thermocompression bonding as a method of joining the lead terminals 25b and the lead terminals 26. Further, in this embodiment, the leads 31 and 32 are laminated after molding.

【0020】上述のような半導体装置21においては、
半導体素子22の電極25a、25bと第1リ−ド部2
3リ−ド端子26とが、第2リ−ド部30を介して接続
されている。さらに、第2リ−ド部30においてはリ−
ド31、32が積層されており、これらリ−ド31、3
2が分岐して電極25a、25b及びリ−ド端子26に
接合されている。
In the semiconductor device 21 as described above,
The electrodes 25a and 25b of the semiconductor element 22 and the first lead portion 2
The three lead terminals 26 are connected via the second lead portion 30. Further, in the second lead section 30, the lead is
The leads 31 and 32 are laminated, and these leads 31 and 3 are provided.
2 is branched and joined to the electrodes 25a and 25b and the lead terminal 26.

【0021】したがって、金属細線を用いることなく電
極25a、25bをリ−ド端子26に接続することがで
きる。このため、金属細線の接続ピッチによって制限さ
れることなく、電極ピッチDやリ−ド端子ピッチEを狭
く設定することが可能になる。そして、半導体素子22
やパッケ−ジ24の面積を大としなくても、多端子化を
行うことができる。
Therefore, the electrodes 25a and 25b can be connected to the lead terminal 26 without using a thin metal wire. Therefore, the electrode pitch D and the lead terminal pitch E can be set narrow without being limited by the connection pitch of the thin metal wires. Then, the semiconductor element 22
The number of terminals can be increased without increasing the area of the package 24 and the package 24.

【0022】また、ル−プ状の金属細線を用いていない
ので、樹脂封止の際に金属細線の変形が生じにくい。し
たがって、断線や短絡を防止することが可能になる。さ
らに、金属細線を用いることなく結線を行っているの
で、電極25a、25bの配置の自由度が高まる。した
がって、半導体素子22の設計の自由度も高まる。
Further, since the loop-shaped thin metal wire is not used, deformation of the thin metal wire is less likely to occur during resin sealing. Therefore, it becomes possible to prevent disconnection and short circuit. Furthermore, since the connection is made without using the thin metal wires, the degree of freedom in arranging the electrodes 25a and 25b is increased. Therefore, the degree of freedom in designing the semiconductor element 22 also increases.

【0023】なお、本発明は、要旨を逸脱しない範囲で
種々に変形することが可能である。例えば、本実施例で
は、第2リ−ド部30のリ−ド31、32が両面テ−プ
33を介して積層されているが、本発明はこれに限定さ
れるものではなく、例えば絶縁性の被膜を利用すること
が可能である。絶縁性の被膜として、高分子材料からな
る塗料や接着剤等が考えられる。
The present invention can be variously modified without departing from the scope of the invention. For example, in the present embodiment, the leads 31 and 32 of the second lead portion 30 are laminated via the double-sided tape 33, but the present invention is not limited to this and, for example, insulation. It is possible to utilize a protective coating. As the insulating film, paints and adhesives made of polymer materials are considered.

【0024】また、本実施例では、両リ−ド31、32
の端部を同一平面上に揃えているが、例えば、図5に示
すように電極25a、25bに高低差を設ければ、リ−
ド32の折曲が不要になる。この場合、電極25a、2
5bを真横に並べることが可能になるので、更に電極を
狭ピッチ化することができる。高低差の量は、例えばリ
−ド31及び両面テ−プ33の厚みを足し合わせた量に
略等しい。なお、図示しないが、隣合ったリ−ド端子2
6に高低差を設けてもよい。
Further, in this embodiment, both leads 31, 32 are provided.
Although the end portions of the electrodes are aligned on the same plane, for example, if a height difference is provided between the electrodes 25a and 25b as shown in FIG.
The bending of the cord 32 is unnecessary. In this case, the electrodes 25a, 2
Since 5b can be arranged right next to each other, the pitch of the electrodes can be further narrowed. The amount of height difference is approximately equal to the amount of the thicknesses of the lead 31 and the double-sided tape 33 added together, for example. Although not shown, the adjacent lead terminals 2
6 may be provided with a height difference.

【0025】また、本実施例では電極25a、25bが
二列に並べられているが、例えば図6に示すように、電
極25を前述の実施例と同じピッチEで一列に並べても
よい。
Although the electrodes 25a and 25b are arranged in two rows in this embodiment, the electrodes 25 may be arranged in one row at the same pitch E as in the above-described embodiments, as shown in FIG. 6, for example.

【0026】さらに、図7に示すように、パッケ−ジ4
2に、アルミ合金等の高熱伝性材料からなるヒ−トシン
ク43をインサ−トしてもよい。図7においては、半導
体素子22の素子形成面24に対して逆側の面44に板
状のヒ−トシンク43が熱伝性の接着剤を介して接合さ
れており、このヒ−トシンク43の放熱面45がパッケ
−ジ42の表面47から面一で露出している。半導体素
子22に発生した熱はヒ−トシンク43に伝わり、ヒ−
トシンク43からパッケ−ジ42の外へ放出される。ま
た、ヒ−トシンク43の側面46はアンダ−カットされ
ており、半導体素子22の側へ拡がりながら傾斜してい
る。そして、この側面46によってヒ−トシンク43の
抜け落ちが防止されている。
Further, as shown in FIG. 7, the package 4
Alternatively, a heat sink 43 made of a highly heat conductive material such as an aluminum alloy may be inserted. In FIG. 7, a plate-shaped heat sink 43 is joined to a surface 44 of the semiconductor element 22 opposite to the element forming surface 24 via a heat conductive adhesive. The heat dissipation surface 45 is exposed flush with the surface 47 of the package 42. The heat generated in the semiconductor element 22 is transmitted to the heat sink 43,
It is discharged from the tosink 43 to the outside of the package 42. The side surface 46 of the heat sink 43 is undercut, and is inclined while expanding toward the semiconductor element 22 side. The side surface 46 prevents the heat sink 43 from falling off.

【0027】このような半導体装置41によれば、多端
子化の上に低熱抵抗化が可能になる。したがって、この
構造は、高集積化された半導体素子を備えた半導体装置
に適している。なお、ヒ−トシンク43をパッケ−ジ4
2から突出させてもよい。
According to such a semiconductor device 41, the number of terminals can be increased and the thermal resistance can be reduced. Therefore, this structure is suitable for a semiconductor device including a highly integrated semiconductor element. In addition, the heat sink 43 is installed in the package 4
You may make it project from 2.

【0028】また、本発明はQFPに限らず、その他の
種々のタイプの半導体装置に適用可能である。つぎに、
本発明の第2実施例を図8及び図9に基づいて説明す
る。
The present invention is applicable not only to QFP but also to other various types of semiconductor devices. Next,
A second embodiment of the present invention will be described based on FIGS. 8 and 9.

【0029】図8は本発明の第2実施例の要部を一部破
断して示しており、図中の符号51は半導体装置51で
ある。この半導体装置51はQFP(Quad Flat Packag
e) 型のもので、半導体素子52、内部基板53、矩形
なパッケ−ジ54、及び、第1リ−ド部55を有してい
る。第1リ−ド部55はリ−ドとしての多数のリ−ド端
子56を有している。
FIG. 8 shows an essential part of the second embodiment of the present invention partially broken away, and the reference numeral 51 in the drawing denotes a semiconductor device 51. This semiconductor device 51 is a QFP (Quad Flat Packag).
It is of the e) type and has a semiconductor element 52, an internal substrate 53, a rectangular package 54, and a first lead portion 55. The first lead portion 55 has a large number of lead terminals 56 as leads.

【0030】これらのうち半導体素子52は、多数(二
つのみ図示)のバンプ電極(以下、電極と称する)57
を有しており、これら電極57は半導体素子52の四つ
の辺のそれぞれに沿って略等ピッチで一列に並んでい
る。
Among these, the semiconductor element 52 includes a large number (only two are shown) of bump electrodes (hereinafter referred to as electrodes) 57.
The electrodes 57 are arranged in a line at substantially equal pitches along each of the four sides of the semiconductor element 52.

【0031】また、内部基板53は絶縁性材料からなる
もので、正方形な枠状に加工されている。さらに、内部
基板53の一方の板面58には第2リ−ド部59が形成
されている。第2リ−ド部59は多数の薄膜状のリ−ド
60を有しており、これらのリ−ド60は内部基板53
の貫通孔61を中心として放射状に配設されている。そ
して、リ−ド60の外側の端部のピッチは内側の端部の
ピッチに比べて大きく拡がっている。
The internal substrate 53 is made of an insulating material and is processed into a square frame shape. Further, a second lead portion 59 is formed on one plate surface 58 of the internal substrate 53. The second lead portion 59 has a large number of thin film leads 60, and these leads 60 are the internal substrate 53.
Are arranged radially around the through-hole 61. The pitch of the outer end of the lead 60 is wider than the pitch of the inner end.

【0032】内部基板53の中央には半導体素子52が
装着されている。半導体素子52は内部基板53にフェ
イスダウン式に装着されており、半導体素子52の電極
57がリ−ド60の内側の端部に熱圧着されている。
The semiconductor element 52 is mounted in the center of the internal substrate 53. The semiconductor element 52 is mounted face down on the internal substrate 53, and the electrode 57 of the semiconductor element 52 is thermocompression bonded to the inner end of the lead 60.

【0033】リ−ド端子56は内部基板53の周囲に配
設されており、内部基板53の各辺に沿って一列に並ん
でいる。さらに、リ−ド端子56の内側の部分(インナ
リ−ド)は内部基板53に対して放射状に延びており、
外側の部分(アウタリ−ド)は内部基板53の各辺に対
して略垂直に延びている。そして、リ−ド端子56の外
側の部分のピッチは、内側の部分のピッチに比べて大き
く拡がっている。なお、リ−ド端子56の内側の端部は
内部基板53と略同じ高さに位置している。
The lead terminals 56 are arranged around the internal substrate 53, and are arranged in a line along each side of the internal substrate 53. Further, the inner portion (inner lead) of the lead terminal 56 extends radially with respect to the internal substrate 53,
The outer portion (outer lead) extends substantially perpendicular to each side of the internal substrate 53. The pitch of the outer portion of the lead terminal 56 is wider than the pitch of the inner portion. The inner end of the lead terminal 56 is located at substantially the same height as the internal board 53.

【0034】内部基板53のリ−ド60の外側の端部
と、リ−ド端子56の内側の端部とは、ワイヤとしての
ボンディングワイヤ(金属細線)62を介して結線され
ている。そして、半導体素子52の電極59、内部基板
53のリ−ド60、ボンディングワイヤ62、及び、リ
−ド端子56によって信号伝達経路が構成されている。
The outer end of the lead 60 of the internal substrate 53 and the inner end of the lead terminal 56 are connected via a bonding wire (metal thin wire) 62 as a wire. The electrode 59 of the semiconductor element 52, the lead 60 of the internal substrate 53, the bonding wire 62, and the lead terminal 56 constitute a signal transmission path.

【0035】パッケ−ジ54は、半導体素子52、内部
基板53、ボンディングワイヤ62、及び、リ−ド端子
56の内側の端部を封止している。さらに、リ−ド端子
56の外側の部分はパッケ−ジ54の四つの側面から略
垂直に、且つ、互いに平行に突出している。パッケ−ジ
54の材質としてエポキシ樹脂等を利用し、成形方法と
してトランスファ成形を採用することが可能である。
The package 54 seals the semiconductor element 52, the internal substrate 53, the bonding wires 62, and the inner ends of the lead terminals 56. Further, the outer portions of the lead terminals 56 project substantially vertically from the four side surfaces of the package 54 and in parallel with each other. Epoxy resin or the like can be used as the material of the package 54, and transfer molding can be adopted as the molding method.

【0036】また、パッケ−ジ54の中にはヒ−トシン
ク63が組込まれている。このヒ−トシンク63は、例
えばアルミニウム合金等のような高熱伝性材料からなる
もので、平板状に加工されている。また、ヒ−トシンク
63の一方の板面が、半導体素子52の内部基板53に
接合された側の面に対して逆側の面に接合されている。
ヒ−トシンク63と半導体素子52との接合に、充分な
熱伝性を有する接着剤を利用することが可能である。
A heat sink 63 is incorporated in the package 54. The heat sink 63 is made of a highly heat conductive material such as aluminum alloy, and is processed into a flat plate shape. Further, one plate surface of the heat sink 63 is bonded to the surface of the semiconductor element 52 opposite to the surface bonded to the internal substrate 53.
It is possible to use an adhesive having sufficient heat conductivity for joining the heat sink 63 and the semiconductor element 52.

【0037】ヒ−トシンク63の他方の板面64はパッ
ケ−ジ54の表面65から面一で露出している。さら
に、ヒ−トシンク63の側面66はアンダ−カットされ
ており、半導体素子52の側へ拡がるよう傾斜してい
る。ヒ−トシンク63はパッケ−ジ54の成形時にイン
サ−トされている。そして、傾斜した側面66によっ
て、ヒ−トシンク63の抜け落ちが防止されている。
The other plate surface 64 of the heat sink 63 is exposed flush with the surface 65 of the package 54. Further, the side surface 66 of the heat sink 63 is undercut, and is inclined so as to spread toward the semiconductor element 52 side. The heat sink 63 is inserted when the package 54 is molded. The inclined side surface 66 prevents the heat sink 63 from falling off.

【0038】半導体素子52に発生した熱は、ヒ−トシ
ンク63へ伝わり、ヒ−トシンク63の露出した板面6
4からパッケ−ジ54の外へ放出される。上述のような
半導体装置51においては、半導体素子52の電極56
とボンディングワイヤ62との間に、内部基板53のリ
−ド60が介在しているので、ボンディングワイヤ61
を従来よりも短くすることができる。この結果、ボンデ
ィングワイヤ62の低ル−プ化が可能になり、封止時に
ボンディングワイヤ62が変形しにくくなる。そして、
半導体装置51の信頼性が向上する。
The heat generated in the semiconductor element 52 is transmitted to the heat sink 63, and the exposed plate surface 6 of the heat sink 63.
4 is discharged to the outside of the package 54. In the semiconductor device 51 as described above, the electrode 56 of the semiconductor element 52 is included.
Since the lead 60 of the internal substrate 53 is interposed between the bonding wire 61 and the bonding wire 62, the bonding wire 61
Can be shorter than before. As a result, the bonding wire 62 can be made to have a lower loop, and the bonding wire 62 is less likely to be deformed during sealing. And
The reliability of the semiconductor device 51 is improved.

【0039】また、半導体素子52の電極56とボンデ
ィングワイヤ62との間に、内部基板53のリ−ド60
が介在しているので、半導体素子52の電極56のピッ
チが、ボンディングワイヤ62の半導体素子側の接続ピ
ッチよりも小となる。つまり、ボンディングワイヤ62
の最小の接続可能なピッチに制限されることなく、電極
56を狭ピッチ化することができる。そして、半導体装
置51の狭ピッチ・多端子化が可能になる。また、放射
状に延在されたリ−ド60の外側端部にボンディングワ
イヤ62が接続されるので、接続ピッチが拡がり、ワイ
ヤボンディングが容易になる。
Further, between the electrode 56 of the semiconductor element 52 and the bonding wire 62, the lead 60 of the internal substrate 53 is provided.
, The pitch of the electrodes 56 of the semiconductor element 52 is smaller than the connection pitch of the bonding wires 62 on the semiconductor element side. That is, the bonding wire 62
The pitch of the electrodes 56 can be narrowed without being limited to the minimum connectable pitch of. Then, the semiconductor device 51 can have a narrow pitch and a large number of terminals. In addition, since the bonding wires 62 are connected to the outer ends of the radially extending leads 60, the connection pitch is widened and wire bonding is facilitated.

【0040】さらに、ヒ−トシンク63が設けられてい
るので、狭ピッチ・多端子化が可能な上に、熱抵抗を低
減できる。したがって、半導体素子の高集積化が可能に
なる。 また、本実施例の半導体装置51の製造にあた
って、熱圧着、ワイヤボンディング、及び、トランスフ
ァ成形等のように一般的な技術を適用することができ
る。したがって、新たな設備投資や技術開発を行う必要
がない。
Further, since the heat sink 63 is provided, it is possible to reduce the pitch and the number of terminals, and it is possible to reduce the thermal resistance. Therefore, high integration of the semiconductor element becomes possible. Further, in manufacturing the semiconductor device 51 of the present embodiment, general techniques such as thermocompression bonding, wire bonding, and transfer molding can be applied. Therefore, there is no need to make new capital investment or technological development.

【0041】なお、本発明は、要旨を逸脱しない範囲で
種々に変形することが可能である。例えば、本実施例で
はQFPが例として挙げられているが、これ以外の一般
的な種々の半導体装置に適用可能である。また、必要に
応じて、ヒ−トシンク63を省略してもよい。
The present invention can be variously modified without departing from the scope of the invention. For example, although the QFP is given as an example in the present embodiment, it can be applied to various general semiconductor devices other than this. Further, the heat sink 63 may be omitted if necessary.

【0042】[0042]

【発明の効果】以上説明したように請求項1の発明は、
端縁部に沿って所定のピッチで配設された多数の電極を
有する半導体素子と、この半導体素子を封止したパッケ
−ジと、一端部がパッケ−ジから導出され他端部がパッ
ケ−ジの外壁に近接した内部に位置し半導体素子の電極
よりも大きいピッチで配設された多数のリ−ドを有する
第1リ−ド部と、半導体素子の電極と第1リ−ド部とを
電気的に接続する第2リ−ド部とを具備し、第2リ−ド
部は、電気的に絶縁して厚さ方向に重ねられた複数のリ
−ドを有し、且つ、両端が電極のピッチ及び第1リ−ド
部のリ−ドのピッチに対応して分岐して設けられてい
る。
As described above, the invention of claim 1 is
A semiconductor element having a large number of electrodes arranged at a predetermined pitch along the edge, a package encapsulating the semiconductor element, one end of which is led out of the package and the other end of which is the package. A first lead portion having a large number of leads located inside the outer wall of the semiconductor element and arranged at a pitch larger than that of the electrodes of the semiconductor element; an electrode of the semiconductor element and a first lead portion; A second lead portion for electrically connecting to each other, and the second lead portion has a plurality of leads that are electrically insulated and are stacked in the thickness direction, and both ends thereof. Corresponding to the pitch of the electrodes and the pitch of the leads of the first lead portion.

【0043】また、請求項6の発明は、端縁部に沿って
所定のピッチで配設された多数の電極を有する半導体素
子と、この半導体素子を封止したパッケ−ジと、一端部
がパッケ−ジから導出され他端部がパッケ−ジの外壁に
近接した内部に位置し半導体素子の電極よりも大きいピ
ッチで配設された多数のリ−ドを有する第1リ−ド部
と、パッケ−ジ内で半導体素子を支持する絶縁性の内部
基板と、この内部基板上に薄膜状に形成され一端部が電
極に電気的に接続されるとともに他端部が内部基板の外
縁部に放射状に延在して電極よりも大きいピッチで拡が
った複数のリ−ドを有する第2リ−ド部と、第1リ−ド
部と第2リ−ド部とを接続するワイヤとを具備した。そ
して、これらの発明によれば、半導体装置を容易に多端
子化できるという効果がある。
According to a sixth aspect of the invention, a semiconductor element having a large number of electrodes arranged at a predetermined pitch along the edge, a package encapsulating the semiconductor element, and one end A first lead portion having a large number of leads which are led out of the package and whose other end is located in the vicinity of the outer wall of the package and arranged at a pitch larger than the electrodes of the semiconductor element; An insulative internal substrate for supporting the semiconductor element in the package, and a thin film formed on the internal substrate, one end of which is electrically connected to the electrode and the other end of which is radial to the outer edge of the internal substrate. A second lead portion having a plurality of leads extending to the upper end and extending at a pitch larger than the electrode, and a wire connecting the first lead portion and the second lead portion. . Further, according to these inventions, there is an effect that the semiconductor device can be easily multi-terminaled.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の第1実施例の半導体装置を一部省略し
て示す平面図。
FIG. 1 is a plan view showing a semiconductor device of a first embodiment of the present invention with a part thereof omitted.

【図2】第2リ−ド部と半導体素子との接続状態を拡大
して示す側面図。
FIG. 2 is an enlarged side view showing a connection state between a second lead portion and a semiconductor element.

【図3】(a)は図1中の円IVで囲った部分の拡大図、
(b)は(a)中に矢印Vで示す方向の矢視図。
3 (a) is an enlarged view of a portion surrounded by a circle IV in FIG. 1,
(B) is an arrow view of the direction shown by arrow V in (a).

【図4】(a)は図1中の円VIで囲った部分の拡大図、
(b)は(a)中に矢印VIIで示す方向の矢視図。
4 (a) is an enlarged view of a portion surrounded by a circle VI in FIG. 1,
7B is a view in the direction of the arrow VII in FIG.

【図5】変形例を示すもので、(a)は平面図、(b)
は側面図。
5A and 5B show a modified example, in which FIG. 5A is a plan view and FIG.
Is a side view.

【図6】他の変形例を示す平面図。FIG. 6 is a plan view showing another modification.

【図7】他の変形例を示す側断面図。FIG. 7 is a side sectional view showing another modification.

【図8】本発明の第2実施例の半導体装置の要部を示す
側断面図。
FIG. 8 is a side sectional view showing a main part of a semiconductor device according to a second embodiment of the present invention.

【図9】本発明の第2実施例の半導体装置を一部省略し
て示す平面図。
FIG. 9 is a plan view showing a semiconductor device according to a second embodiment of the present invention with a part thereof omitted.

【図10】一般のSOPを示す斜視図。FIG. 10 is a perspective view showing a general SOP.

【図11】一般のQFPを示す斜視図。FIG. 11 is a perspective view showing a general QFP.

【図12】一般のQFPを一部省略して示す平面図。FIG. 12 is a plan view showing a general QFP with a part thereof omitted.

【図13】QFPのリ−ドと半導体素子との接続状態を
一部省略して示す側面図。
FIG. 13 is a side view showing a connection state between a lead of a QFP and a semiconductor element with a part thereof omitted.

【符号の説明】[Explanation of symbols]

21…半導体装置、22…半導体素子、23…第1リ−
ド部、26…リ−ド端子(リ−ド)、25a、25b…
バンプ電極(電極)、28…パッケ−ジ、30…第2リ
−ド部、31、32…リ−ド、41…半導体装置、43
…ヒ−トシンク、51…半導体装置、52…半導体素
子、53…内部基板、54…パッケ−ジ、55…第1リ
−ド部、56…リ−ド端子、57…バンプ電極(電
極)、59…第2リ−ド部、60…リ−ド、62…ワイ
ヤ、63…ヒ−トシンク。
21 ... Semiconductor device, 22 ... Semiconductor element, 23 ... First reel
Lead portion, 26 ... Lead terminal (lead), 25a, 25b ...
Bump electrode (electrode), 28 ... package, 30 ... second lead portion, 31, 32 ... lead, 41 ... semiconductor device, 43
... heat sink, 51 ... semiconductor device, 52 ... semiconductor element, 53 ... internal substrate, 54 ... package, 55 ... first lead portion, 56 ... lead terminal, 57 ... bump electrode (electrode), 59 ... Second lead section, 60 ... Lead, 62 ... Wire, 63 ... Heat sink.

Claims (7)

【特許請求の範囲】[Claims] 【請求項1】 端縁部に沿って所定のピッチで配設され
た多数の電極を有する半導体素子と、この半導体素子を
封止したパッケ−ジと、一端部が上記パッケ−ジから導
出され他端部が上記パッケ−ジの外壁に近接した内部に
位置し上記半導体素子の電極よりも大きいピッチで配設
された多数のリ−ドを有する第1リ−ド部と、上記半導
体素子の電極と上記第1リ−ド部とを電気的に接続する
第2リ−ド部とを具備し、上記第2リ−ド部は、電気的
に絶縁して厚さ方向に重ねられた複数のリ−ドを有し、
且つ、両端が上記電極のピッチ及び上記第1リ−ド部の
リ−ドのピッチに対応して分岐して設けられていること
を特徴とする半導体装置。
1. A semiconductor element having a large number of electrodes arranged at a predetermined pitch along an edge, a package encapsulating the semiconductor element, and one end of which is led out from the package. A first lead portion having a large number of leads, the other end portion of which is located in the vicinity of the outer wall of the package and is arranged at a pitch larger than the electrodes of the semiconductor element; A second lead portion electrically connecting the electrode and the first lead portion, wherein the second lead portion is a plurality of electrically insulated layers stacked in the thickness direction. With a lead of
Further, the semiconductor device is characterized in that both ends are provided so as to be branched corresponding to the pitch of the electrodes and the pitch of the leads of the first lead portion.
【請求項2】 電極が複数列に配設されていることを特
徴とする上記請求項1記載の半導体装置。
2. The semiconductor device according to claim 1, wherein the electrodes are arranged in a plurality of rows.
【請求項3】 第2リ−ド部の半導体素子側の端部にお
いて分岐したリ−ドは、同一平面上に揃って設けられて
いることを特徴とする上記請求項2記載の半導体装置。
3. The semiconductor device according to claim 2, wherein the leads branched at the end of the second lead portion on the side of the semiconductor element are arranged on the same plane.
【請求項4】 第2リ−ド部の半導体素子側の端部にお
いて分岐したリ−ドが高低差を有するとともに、電極が
各列毎に上記リ−ドに応じた高低差を有していることを
特徴とする上記請求項2記載の半導体装置。
4. The leads branched at the end of the second lead portion on the semiconductor element side have a height difference, and the electrodes have a height difference according to the lead for each row. The semiconductor device according to claim 2, wherein the semiconductor device is a semiconductor device.
【請求項5】 電極の高低差がバンプによって形成され
ていることを特徴とする上記請求項4記載の半導体装
置。
5. The semiconductor device according to claim 4, wherein the height difference of the electrodes is formed by bumps.
【請求項6】 端縁部に沿って所定のピッチで配設され
た多数の電極を有する半導体素子と、この半導体素子を
封止したパッケ−ジと、一端部が上記パッケ−ジから導
出され他端部が上記パッケ−ジの外壁に近接した内部に
位置し上記半導体素子の電極よりも大きいピッチで配設
された多数のリ−ドを有する第1リ−ド部と、上記パッ
ケ−ジ内で上記半導体素子を支持する絶縁性の内部基板
と、この内部基板上に薄膜状に形成され一端部が上記電
極に電気的に接続されるとともに他端部が上記内部基板
の外縁部に放射状に延在して上記電極よりも大きいピッ
チで拡がった複数のリ−ドを有する第2リ−ド部と、上
記第1リ−ド部と上記第2リ−ド部とを接続するワイヤ
とを具備した半導体装置。
6. A semiconductor element having a large number of electrodes arranged along an edge portion at a predetermined pitch, a package encapsulating the semiconductor element, and one end of which is led out from the package. A first lead portion having a large number of leads arranged inside the other end portion of the package close to the outer wall of the package and having a pitch larger than the electrodes of the semiconductor element; and the package. An insulating internal substrate for supporting the semiconductor element therein, a thin film formed on the internal substrate, one end of which is electrically connected to the electrode, and the other end of which is radial to the outer edge of the internal substrate. A second lead portion having a plurality of leads extending to the first electrode portion and extending at a pitch larger than that of the electrode; and a wire connecting the first lead portion and the second lead portion. A semiconductor device comprising:
【請求項7】 パッケ−ジに組込まれ半導体素子に熱伝
達可能に接合されるとともに上記パッケ−ジから露出し
たヒ−トシンクを設けたことを特徴とする上記請求項1
または上記請求項6記載の半導体装置。
7. A heat sink incorporated in a package and joined to a semiconductor element so as to be able to transfer heat, and a heat sink exposed from the package.
Alternatively, the semiconductor device according to claim 6.
JP25195693A 1993-10-07 1993-10-07 Semiconductor device Pending JPH07106496A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25195693A JPH07106496A (en) 1993-10-07 1993-10-07 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25195693A JPH07106496A (en) 1993-10-07 1993-10-07 Semiconductor device

Publications (1)

Publication Number Publication Date
JPH07106496A true JPH07106496A (en) 1995-04-21

Family

ID=17230493

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25195693A Pending JPH07106496A (en) 1993-10-07 1993-10-07 Semiconductor device

Country Status (1)

Country Link
JP (1) JPH07106496A (en)

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