JPH07105042B2 - Method for improving corrosion resistance of base metal plating - Google Patents

Method for improving corrosion resistance of base metal plating

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Publication number
JPH07105042B2
JPH07105042B2 JP2214987A JP2214987A JPH07105042B2 JP H07105042 B2 JPH07105042 B2 JP H07105042B2 JP 2214987 A JP2214987 A JP 2214987A JP 2214987 A JP2214987 A JP 2214987A JP H07105042 B2 JPH07105042 B2 JP H07105042B2
Authority
JP
Japan
Prior art keywords
corrosion resistance
baking
vacuum
temperature
degree
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2214987A
Other languages
Japanese (ja)
Other versions
JPS63188829A (en
Inventor
忠利 黒住
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Denko KK
Original Assignee
Showa Denko KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Denko KK filed Critical Showa Denko KK
Priority to JP2214987A priority Critical patent/JPH07105042B2/en
Publication of JPS63188829A publication Critical patent/JPS63188829A/en
Publication of JPH07105042B2 publication Critical patent/JPH07105042B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Chemically Coating (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Preventing Corrosion Or Incrustation Of Metals (AREA)
  • Magnetic Record Carriers (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)

Description

【発明の詳細な説明】 「産業上の利用分野」 本発明は磁気ディスクの製造に際し、素地のアルミニウ
ム板に下地メッキを施した後、このメッキの耐食性を向
上させるために行なわれる処理方法に関する。
DETAILED DESCRIPTION OF THE INVENTION "Industrial field of use" The present invention relates to a treatment method for improving the corrosion resistance of an aluminum plate, which is a base material, in the production of a magnetic disk after the undercoating.

「従来の技術」 磁気ディスク装置は、コンピューターシステムでの記憶
装置として、その重要性は年々高まっており、その小型
化、低価格化を目標として磁気記録媒体の高密度化が要
望されている。
“Prior Art” A magnetic disk device is becoming more and more important as a storage device in a computer system year by year, and there is a demand for higher density of a magnetic recording medium for the purpose of downsizing and cost reduction.

磁気ディスクは、素地のアルミニウム板の面を磁気媒体
(メッキ法の場合CoNiP、スパッタ法の場合、CoNi、CoN
iCrなど)で被覆して製造されるが、両者の密着性を向
上させるため、間に下地メッキ層を介在させる。
For magnetic disks, the surface of the base aluminum plate is a magnetic medium (CoNiP for the plating method, CoNi, CoN for the sputtering method).
It is manufactured by coating with iCr, etc., but an underplating layer is interposed between them in order to improve the adhesion between them.

下地メッキ層は、通常NiP無電解メッキによって、厚さ2
0〜100μmに形成されるが、NiにPを8〜12wt%含有し
ており、非磁性で、高耐食性を有する。この下地メッキ
の耐食性を向上させることは、磁気ディスクの寿命を延
ばす上で極めて重要であり、下地メッキを行なう技術を
向上させることが必要であるとともに、メッキ後のベー
キング処理が下地メッキの耐食性に大きな影響があり、
さらに優れた下地メッキを開発すべく、精力的な研究が
進められている。
The base plating layer is usually NiP electroless plated to a thickness of 2
Although it is formed to have a thickness of 0 to 100 μm, Ni contains 8 to 12 wt% of P, is nonmagnetic, and has high corrosion resistance. Improving the corrosion resistance of this underplating is extremely important in extending the life of the magnetic disk, and it is necessary to improve the technology for performing the underplating. Has a big impact,
Energetic research is underway to develop even better base plating.

従来、ベーキング処理は、ハードディスクにおいては、
クリーンオーブンが使用され、大気雰囲気、常圧下、10
0〜200℃、1〜3hrの条件で行なわれている。この処理
により、吸蔵水素を除去するとともに、メッキの応力を
均一化し、耐食性が向上するが、ベーキング条件は、下
地メッキのPの含有量によって、上記範囲内で変えられ
ている。
Conventionally, the baking process has been
Clean oven is used, atmospheric atmosphere, under normal pressure, 10
It is carried out under conditions of 0 to 200 ° C and 1 to 3 hours. By this treatment, the stored hydrogen is removed, the stress of plating is made uniform, and the corrosion resistance is improved, but the baking conditions are changed within the above range depending on the P content of the undercoat.

「発明が解決しようとする問題点」 ところで、ハードディスクはフロッピーディスクと異な
り、コンピュータから磁気ディスクを取出すことなく、
コンピュータの一部分として使用されるもので、磁気デ
ィスクの寿命は、コンピュータの寿命に直結する。ま
た、ハードディスクが用いられているコンピュータは、
一般家庭においても使用されるため、世界各国の環境条
件に耐えるものであることが必要である。
"Problems to be solved by the invention" By the way, unlike a floppy disk, a hard disk does not need to take out a magnetic disk from a computer.
Used as part of a computer, the life of a magnetic disk is directly linked to the life of the computer. In addition, the computer using the hard disk,
Since it is used in ordinary households as well, it must be able to withstand the environmental conditions of each country in the world.

上記磁気ディスクの腐食は、表面から発生するものもあ
るが、下地メッキが腐食されることが原因となって発生
することが多い。例えば、前処理の際使用される酸がピ
ンホール等に僅か残存し、これによって腐食が開始さ
れ、素地アルミニウムに達すると、アルミニウムは酸に
弱いため、容易に腐食が広がり、下地メッキとの密着が
不良となる。密着が不良となると下地メッキの応力によ
ってふくらみが発生し、磁気媒体もふくらんで使用でき
なくなるが、従来のベーキング方法は、下地メッキの腐
食を防止する効果が充分でなかった。
Corrosion of the magnetic disk may occur from the surface, but often occurs due to corrosion of the undercoat. For example, a small amount of acid used in the pretreatment remains in pinholes, etc., which causes corrosion to start and when it reaches the base aluminum, since aluminum is weak against acid, corrosion easily spreads and adheres to the base plating. Becomes defective. If the adhesion is poor, a bulge occurs due to the stress of the undercoat, and the magnetic medium also bulges and cannot be used. However, the conventional baking method is not sufficiently effective in preventing the corrosion of the undercoat.

本発明者は、上記の問題点を解決すべく鋭意研究した結
果、ベーキングを減圧下で行なうと下地メッキの耐食性
が向上することを発見した。
The present inventor, as a result of earnest research to solve the above problems, discovered that the corrosion resistance of the undercoating is improved when baking is performed under reduced pressure.

本発明は、上記の発見に基づいてなされたもので、素地
アルミニウムと、磁性媒体とを密着させ、しかもほぼ永
久的に腐食を発生することのない下地メッキが得られる
下地メッキの耐食性向上方法を提供することを目的とす
る。
The present invention has been made based on the above findings, and provides a method for improving the corrosion resistance of a base plating, which allows a base aluminum and a magnetic medium to be in close contact with each other, and further, a base plating without substantially permanent corrosion can be obtained. The purpose is to provide.

「問題点を解決するための手段」 本発明は上記の目的を達成すべくなされたもので、その
要旨は、磁気ディスクの製造において、素地のアルミニ
ウムの表面に下地メッキを施した後のベーキングを、10
-4〜10-7Torrの真空下で行なう下地メッキの耐食性向上
方法にある。
"Means for Solving Problems" The present invention has been made to achieve the above-mentioned object, and its gist is to perform baking after subjecting the surface of the base aluminum to undercoating in the manufacture of a magnetic disk. ,Ten
It is a method of improving the corrosion resistance of undercoating performed under a vacuum of -4 to 10 -7 Torr.

「作用」 本発明は、下地メッキのベーキングを10-4〜10-7Torrの
真空下で行なうので、前処理に使用された酸など、腐食
開始の要因となるものが完全に除去される。
[Operation] In the present invention, the base plating is baked under a vacuum of 10 −4 to 10 −7 Torr, so that the acid used for the pretreatment and the factors that cause the initiation of corrosion are completely removed.

「実施例」 本発明においては、素地のアルミニウムに、NiPの無電
解メッキを施した後のベーキングを、10-4〜10-7の真空
度で行なうことが必要である。この際、ベーキング中の
真空度を高めてゆくに従って耐食性は増加するが、10-4
Torr以下の真空度ではその効果が充分でなく、10-7Torr
以上の真空度としてもその効果は上昇せず、経済的でな
い。
[Examples] In the present invention, it is necessary to perform baking after performing electroless plating of NiP on the base aluminum, at a vacuum degree of 10-4 to 10-7 . At this time, the corrosion resistance increases as the degree of vacuum during baking increases, but 10 -4
The effect is not sufficient in the following degree of vacuum Torr, 10 -7 Torr
Even if the degree of vacuum is higher than that, the effect is not improved and it is not economical.

また、ベーキングの温度および時間は、従来行なわれて
いるクリーンオーブンによるベーキング法と同様、100
〜200℃、1〜3hrの条件下で行なわれる。温度が100℃
未満では耐食性を向上させる効果が少なく、200℃を越
えると、市販のハードディスク用メッキ浴を用いた場
合、磁性を生ずるものがある。
In addition, the baking temperature and time are the same as those in the conventional baking method using a clean oven.
It is carried out under the conditions of ~ 200 ° C and 1-3 hours. Temperature is 100 ℃
If it is less than 200 ° C., the effect of improving the corrosion resistance is small, and if it exceeds 200 ° C., it may cause magnetism when a commercially available plating bath for hard disk is used.

また、ベーキング時間は、上記温度範囲を用いた場合、
温度が低くとも時間を長くすれば、温度を高く、時間を
短くした場合と同様な効果がある。例えば、150℃で3hr
処理するより、6hr処理した下地メッキの方が耐食性は
高いが、200℃で3hr処理しても同じ耐食性がえられるも
のもある。しかし、ベーキング時間が短い方が、オーブ
ンの使用効率が高くなり、経済的である。
In addition, the baking time, when using the above temperature range,
Even if the temperature is low, if the time is increased, the same effect as when the temperature is increased and the time is shortened is obtained. For example, 3 hours at 150 ℃
The base plating treated for 6 hours has a higher corrosion resistance than that for the treatment, but there are some that can obtain the same corrosion resistance even if treated for 3 hours at 200 ° C. However, the shorter the baking time, the higher the use efficiency of the oven and the more economical.

また、ベーキングを真空下で行なった後、これを空気雰
囲気で常温、常圧に戻しても耐食性の向上効果は顕著で
あるが、表面が酸化され、磁性特性が不良となることが
あり、真空中でベーキングを行なった後、N2,Ar等の不
活性ガスを導入し、この雰囲気を保持してオーブン内を
常温、常圧に戻した後、取出すのが好ましい。
Also, after baking under vacuum, the effect of improving the corrosion resistance is remarkable even if it is returned to room temperature and normal pressure in an air atmosphere, but the surface may be oxidized and the magnetic properties may become poor. After baking in the atmosphere, it is preferable to introduce an inert gas such as N 2 or Ar, maintain this atmosphere, return the inside of the oven to normal temperature and pressure, and then take it out.

また、下地メッキの耐食性判定には、下地メッキが相当
高い耐食性を有するため、通常のメッキの優劣判定に用
いられる塩水噴霧試験やヒートショック試験では差が認
められず不適当である。そのため塩水噴霧試験に代え
て、これをさらにハードにした侵漬試験が用いられる。
もちいられる侵漬液としては、下地メッキ表面に残る可
能性の多い、例えばHCl水溶液等が適当である。
In addition, since the base plating has a considerably high corrosion resistance for the determination of the corrosion resistance of the undercoat, no difference is recognized in the salt spray test or the heat shock test used for judging the superiority or inferiority of the usual plating, which is not suitable. Therefore, instead of the salt spray test, an immersion test in which this is made harder is used.
As the immersion liquid used, an HCl aqueous solution or the like, which is likely to remain on the surface of the undercoat, is suitable.

比較方法は、素地のアルミニウム板に下地メッキを施
し、面を鏡面研摩した後、ベーキングを行ない、これを
所定濃度のHCl等の水溶液に所定時間侵漬して取出し、
鏡面の変化した部分を目視によって判定し、その面積の
全面積に対する割合を%によって示すことによって耐食
性を比較した。
The comparison method is that the base aluminum plate is subjected to undercoating, the surface is mirror-polished, and then baked, and this is immersed in an aqueous solution of HCl or the like of a predetermined concentration for a predetermined time and taken out,
Corrosion resistance was compared by visually observing the changed portion of the mirror surface and showing the ratio of the area to the total area by%.

実施例1 素地アルミニウム板を磁気ディスク用の非磁性NiPメッ
キ浴に3hr侵漬してPの含有量が11.5wt%、厚み36μm
の下地メッキを施し、鏡面研摩した後、これを真空オー
ブン中で真空度を変え、150℃、2hrのベーキングを行な
った。ベーキング終了後、オーブン中にN2を導入し、N2
雰囲気において常温、常圧にもどした。この下地メッキ
したアルミニウム板を、2wt%のHCl水溶液に48hr侵漬
し、耐食性を測定した。各真空度と耐食性の関係を第1
図に示す。第1図より明らかなように10-4〜10-5Torrの
間でほぼ耐食性が飽和していることがわかる。
Example 1 A base aluminum plate was immersed in a non-magnetic NiP plating bath for a magnetic disk for 3 hours so that the P content was 11.5 wt% and the thickness was 36 μm.
After undercoating and mirror polishing, this was baked in a vacuum oven at 150 ° C for 2 hours while changing the degree of vacuum. After baking the end, it introduced the N 2 in the oven, N 2
In the atmosphere, the temperature was returned to normal temperature and pressure. This underplated aluminum plate was immersed in a 2 wt% HCl aqueous solution for 48 hours to measure the corrosion resistance. The first is the relationship between each degree of vacuum and corrosion resistance.
Shown in the figure. As is clear from FIG. 1, it is found that the corrosion resistance is almost saturated between 10 −4 and 10 −5 Torr.

実施例2 ベーキングの際の真空度を10-6Torrとし、ベーキング温
度を100〜200℃に変えた他は、実施例1と同じにして、
ベーキング温度と耐食性との関係を求めた。結果を第2
図に示す。第2図より明らかなように、温度が高くなる
にしたがって耐食性が増加する。また、この範囲の温度
では、真空度を10-6Torrとしても下地メッキの非磁性特
性が劣化することなく、表面が硬化したり、クラックが
入ったりする表面状態の悪化は認められなかった。
Example 2 The same as Example 1, except that the degree of vacuum during baking was set to 10 −6 Torr and the baking temperature was changed to 100 to 200 ° C.
The relationship between the baking temperature and the corrosion resistance was obtained. Second result
Shown in the figure. As is clear from FIG. 2, the corrosion resistance increases as the temperature rises. Further, at a temperature in this range, even if the degree of vacuum was set to 10 -6 Torr, the non-magnetic property of the undercoating was not deteriorated, and the surface was not hardened or cracked, and the surface condition was not deteriorated.

実施例3 素地アルミニウム板を磁気ディスク用非磁性NiPメッキ
浴に3hr侵漬してPの含有量12.5wt%、厚み36μmの下
地メッキを施し、鏡面研摩した後、これを真空オーブン
中で真空度を変え、150℃、2hrのベーキングを行なっ
た。ベーキング終了後、オーブン中にN2を導入し、N2
囲気において常温、常圧にもどした。この下地メッキし
たアルミニウム板を、2wt%のHCl水溶液に48侵漬し、耐
食性を測定した。各真空度と耐食性の関係を第3図に示
す。第3図より明らかなように10-4〜10-5Torrの間でほ
ぼ耐食性が飽和していることがわかった。
Example 3 A base aluminum plate was immersed in a non-magnetic NiP plating bath for a magnetic disk for 3 hours to carry out undercoating with a P content of 12.5 wt% and a thickness of 36 μm, and after mirror polishing, this was vacuumed in a vacuum oven. Was changed, and baking was performed at 150 ° C. for 2 hours. After completion of baking, N 2 was introduced into the oven, and the temperature was returned to normal temperature and pressure in N 2 atmosphere. This underplated aluminum plate was immersed in a 2 wt% HCl aqueous solution for 48 times to measure the corrosion resistance. The relationship between each degree of vacuum and corrosion resistance is shown in FIG. As is clear from FIG. 3, it was found that the corrosion resistance was almost saturated between 10 −4 and 10 −5 Torr.

実施例4 5wt%のNaCl水溶液に96hr侵漬して耐食試験を行なった
他は実施例1と同じにして真空度と耐食性の関係を求め
た。結果を第4図に示す。第4図より明らかなように、
HCl水溶液を用いた場合とその傾向は同じであるが、耐
食性は高い様な結果となる。したがって、耐食性の差を
比較する場合には、差が大きく現われるHCl水溶液が適
当である。
Example 4 The relationship between the degree of vacuum and the corrosion resistance was determined in the same manner as in Example 1 except that the corrosion resistance test was carried out by dipping it in a 5 wt% NaCl aqueous solution for 96 hours. Results are shown in FIG. As is clear from Fig. 4,
The tendency is the same as when using the HCl aqueous solution, but the result is that the corrosion resistance is high. Therefore, when comparing the difference in corrosion resistance, an aqueous HCl solution, which shows a large difference, is suitable.

実施例5 ベーキング温度を、100℃、175℃、200℃とした他は、
実施例1と同じにして、各温度における真空度と、耐食
性との関係を求め、各温度をパラメータとして第5図に
示す。第5図より、温度が高い程耐食性が増大し、ま
た、真空度が10-4〜10-5Torrの間で耐食性がほぼ飽和す
ることがわかる。
Example 5 Except that the baking temperature was 100 ° C, 175 ° C, and 200 ° C,
In the same manner as in Example 1, the relationship between the degree of vacuum at each temperature and the corrosion resistance was determined, and each temperature is shown as a parameter in FIG. From FIG. 5, it can be seen that the higher the temperature, the higher the corrosion resistance, and that the corrosion resistance is almost saturated when the degree of vacuum is between 10 −4 and 10 −5 Torr.

「発明の効果」 以上述べたように、素地アルミニウムに下地メッキを施
した後のベーキングを10-4〜10-7Torrの真空中で行なう
本発明に係る下地メッキの耐食性向上方法は、下地メッ
キの耐食性を大幅に高め、磁気ディスクの寿命をほぼ永
久的なものとする効果があり、コンピュータ工業分野に
寄与することが極めて大きい。
"Effects of the Invention" As described above, the method for improving the corrosion resistance of the undercoat according to the present invention, in which the baking after applying the undercoat to the base aluminum is performed in a vacuum of 10 -4 to 10 -7 Torr is Has the effect of greatly improving the corrosion resistance of the magnetic disk and making the life of the magnetic disk almost permanent, and it greatly contributes to the field of computer industry.

【図面の簡単な説明】[Brief description of drawings]

第1図は実施例1における真空度と耐食性の関係を示す
図、第2図は実施例2におけるベーキング温度と耐食性
の関係を示す図、第3図は実施例3における第1図相当
図、第4図は実施例4における第1図相当図、第5図は
温度を変え、これをパラメータとした第1図相当図であ
る。
FIG. 1 is a diagram showing the relationship between the degree of vacuum and corrosion resistance in Example 1, FIG. 2 is a diagram showing the relationship between baking temperature and corrosion resistance in Example 2, and FIG. 3 is a diagram corresponding to FIG. 1 in Example 3. FIG. 4 is a view corresponding to FIG. 1 in Example 4, and FIG. 5 is a view corresponding to FIG.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】磁気ディスクの製造において、素地のアル
ミニウム板表面に下地メッキを施した後のベーキング
を、10-4〜10-7Torrの真空中で行なうことを特徴とする
下地メッキの耐食性向上方法。
1. A method for improving the corrosion resistance of an undercoating, characterized in that, in the production of a magnetic disk, baking after applying undercoating to the surface of a base aluminum plate is performed in a vacuum of 10 −4 to 10 −7 Torr. Method.
JP2214987A 1987-02-02 1987-02-02 Method for improving corrosion resistance of base metal plating Expired - Lifetime JPH07105042B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2214987A JPH07105042B2 (en) 1987-02-02 1987-02-02 Method for improving corrosion resistance of base metal plating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2214987A JPH07105042B2 (en) 1987-02-02 1987-02-02 Method for improving corrosion resistance of base metal plating

Publications (2)

Publication Number Publication Date
JPS63188829A JPS63188829A (en) 1988-08-04
JPH07105042B2 true JPH07105042B2 (en) 1995-11-13

Family

ID=12074803

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2214987A Expired - Lifetime JPH07105042B2 (en) 1987-02-02 1987-02-02 Method for improving corrosion resistance of base metal plating

Country Status (1)

Country Link
JP (1) JPH07105042B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7037421B2 (en) 2000-05-19 2006-05-02 Alps Electric Co., Ltd. Thin-film magnetic head having magnetic gap formed of NiP
AU2002221105A1 (en) * 2000-12-13 2002-06-24 Showa Denko K K Magnetic-disk substrate, and method for manufacturing the same

Also Published As

Publication number Publication date
JPS63188829A (en) 1988-08-04

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