JPH0710143Y2 - Valve device - Google Patents

Description

[Detailed Description of the Invention] [Industrial field of application] The present invention relates to a valve suitable for switching source gas in a device that requires rapid switching of fluid, for example, a vapor phase growth device for growing a multilayer thin film crystal. It relates to an improvement of the device.

[Conventional technology]

Known valve devices for switching the supply of the raw material gas from the cylinder to the vapor phase growth device are shown in FIGS. 4 (a) and (b) and FIGS. 5 (a) and (b).

In the valve device shown in FIG. 4 (a), a plurality of cylinders 1.1A and 1B storing raw material gases (not shown) and a growth furnace line of a reaction furnace 2 of a vapor phase growth apparatus (not shown) are connected to the introduction pipes 3.3A. Connected by 3B, and a plurality of switching valves 4, 4A, 4B are provided respectively in the plurality of introduction pipes 3, 3A, 3B, and by properly switching the plurality of switching valves 4, 4A, 4B, The supply of raw material gas is switched.

On the other hand, the valve device shown in FIG. 4 (b) is provided with the plurality of switching valves 4, 4A, 4B between the plurality of cylinders 1, 1A, 1B and the growth furnace line of the reaction furnace 2 described above. By interposing the valve collecting device 5, the switching valves 4, 4A, 4B of the valve collecting device 5 are individually operated to switch the supply of the raw material gas.

Further, when the vent line 6 is provided in the valve device of FIG. 4, a plurality of cylinders 1 and 2 are provided as shown in FIG. 5 (a).
1A / 1B, single vent line switching valve 7 / 7A
By arranging 7B respectively, and switching the plurality of vent line switching valves 7, 7A, 7B, the raw material gas is transferred to the vent line 6 or is supplied to the growth furnace line of the reaction furnace 2. It was

On the other hand, in order to realize such switching, as shown in FIG. 5 (b), a valve assembly including a plurality of switching valves 4, 4A, 4B and a plurality of vent line switching valves 7, 7A, 7B. The device 8 was sometimes used.

The symbol B in FIG. 4 (b) and FIG. 5 (b) indicates the distance from the switching valve 4, 4A, 4B of each source gas line to the gas outlet.

[Problems to be solved by the device]

The conventional valve device is configured as described above, and as shown in FIG. 4 (b) and FIG. 5 (b), the distance B from the opening / closing parts of the plurality of switching valves 4, 4A, 4B to the gas outlet port. Was different.

Therefore, when switching the switching valves 4, 4A, 4B, there is a difference in the time until the raw material gas is delivered to the gas outlet, so the switching valves 4, 4A, 4B of the respective raw material gas lines can be operated for the same time. Even if it is opened, the same amount of the raw material gas cannot be supplied to the reaction furnace 2, and it is difficult to supply the accurate amount of the raw material gas, so that there is a big drawback that the film thickness cannot be controlled accurately.

Further, the conventional valve device has a problem that a raw material gas accumulation space is generated as shown in FIGS. 4 (b) and 5 (b), and the raw material gas cannot be rapidly switched. .

This problem will be described in detail with reference to the figure. When the switching valve 4 is closed and the switching valves 4A and 4B are opened to supply the raw material gas from a plurality of cylinders 1A and 1B, the hatched portion A is used. There is a problem that the raw material gas is always accumulated in the indicated area.

Then, when the switching valve 4 is opened to supply the raw material gas, there is a drawback that the raw material gas accumulated in the shaded area A prevents abrupt switching of the raw material gas.

Similarly, open the switching valve 4B and open the cylinder 1B.
When the raw material gas is supplied only from the above, there is a problem that the raw material gas always accumulates in the regions indicated by the hatched portion A and the hatched portion B.

In order to correct the above-mentioned drawbacks, Japanese Utility Model Publication No. 39-23475 discloses
Disclosed is a flow path switching device for the purpose of preventing time delay of fluid.

However, in this flow path switching device, since the flow velocity of the fluid in the closed flow passage is 0, the flow velocity of the fluid must rise from 0 at the moment when the closed flow passage is opened.

Therefore, there is a serious drawback that it takes a very long time to make the flow velocity of the fluid constant.

Further, there is a big problem that it is not possible to prevent the fluid state from changing due to the switching of the flow paths.

The present invention has been made in view of the above, and an object of the present invention is to provide a valve device capable of abruptly switching fluids and capable of accurately controlling the flow rate.

[Means for Solving the Problems]

In the present invention, in order to achieve the above-mentioned object, a mounting base provided with a lead-out path and a plurality of valves which are in a radial state centered on an end portion of the lead-out path which is disposed inside the mounting base and communicates with each other. A mounting space, a plurality of valves that are respectively fitted into the plurality of valve mounting spaces, and that open and close the flow path with the opening and closing portion being close to the end portion of the outlet passage, and a plurality of valves that are arranged inside the mounting base. A plurality of introducing passages respectively communicating with the valve mounting space, a plurality of vent valve mounting spaces disposed inside the mounting base and communicating with the plurality of introducing passages and exhibiting a radiation state, and a plurality of vent valve mountings A plurality of vent valves which are respectively fitted in the spaces and open and close the flow paths in a state where the opening and closing portions are close to the introduction path, and a vent flow path which is provided inside the mounting base and communicates the plurality of vent valve mounting spaces with each other. And fluid to the plurality of introduction paths So that and a respectively supplying a plurality of sources.

[Action]

According to the present invention having the above-mentioned configuration, it is possible to rapidly switch the fluid and to accurately control the flow rate.

Also, open the vent valve of the flow path in the closed state, set the flow velocity of the flowing fluid to a predetermined value in advance, and when switching,
By operating the two valves at the same time, the flow paths can be switched very smoothly without changing the flow velocity of the fluid.

Therefore, it becomes possible to eliminate the serious drawback that it takes a very long time to make the flow velocity of the fluid constant.

Furthermore, since the plurality of valves and the plurality of vent valves are arranged in a state of being integrated on the mounting base, it is possible to remarkably suppress the change of the fluid state due to the switching of the flow paths.

〔Example〕

Hereinafter, the present invention will be described in detail with reference to an embodiment shown in FIGS.

The valve device according to the present invention is shown in FIGS. 1 and 2 (b),
As shown in (c), a plurality of valves 12, 12A, 12B and a plurality of vent valves 17, 17A, 17B are arranged in the upper and lower portions of the manifold 9 in an integrated state.

As shown in the figure, the manifold 9 includes a lower block 90 that is exposed in a substantially triangular prism shape, and an upper block 91 that is slightly smaller than the lower block 90 and has the same shape.

Then, on the flat upper surface of the lower block 90, the upper block
91 are placed in an integrated laminated state, and the central portion of the lower block 90 and the central portion of the upper block 91 are positioned and aligned with each other.

As shown in FIG. 1 and FIG. 3, the upper block 91 has a single outlet path 10 for leading a source gas (fluid) (not shown) to the reaction furnace 2 of the vapor phase growth apparatus (not shown) at the center thereof. The lead-out path 10 is formed so as to extend longitudinally, and the upper end portion of the lead-out path 10 is open at the upper surface portion.

Further, as shown in FIG. 1, substantially cylindrical valve mounting spaces 11, 11A, 11B are horizontally bored on the three side surfaces of the upper block 91, respectively.
The ends of 11A and 11B are open on each of the three side surfaces.

As shown in FIGS. 2 (a), (b) and FIG. 3, the plurality of valve mounting spaces 11, 11A, 11B are communicated with their slightly constricted tips in proximity to the lower end of the lead-out portion 10. Therefore, the radiation state is exposed at intervals of 120 degrees around the lower end of the outlet path 10, and the plurality of valves 12, 12A, 12B are housed in a fixed state in which they are fitted.

The plurality of valves 12, 12A, 12B are shown in FIG. 2 (a),
As shown in (b) and FIG. 3, the bellows (opening / closing part) at the tip part, which is composed of a pneumatically actuated bellows valve and functions as a valve body, has a lower end part of the outlet passage 10 and a valve mounting space 11.
It has a function of contacting with the communication part with the tip of A / 11B and opening / closing the flow path of the raw material gas.

However, the tips of the plurality of valves 12, 12A, 12B are close to the lower ends of the lead-out paths 10, respectively, as shown in FIG. 2 (b).

On the other hand, the lower block 90 described above is shown in FIG.
As shown in (b), (c) and FIG. 3, a plurality of introducing passages 13, 13A, 13B defining a substantially equilateral triangle in cross section are longitudinally provided therein.

As shown in FIG. 1 and FIG. 3, the plurality of introduction passages 13, 13A, 13B are formed so that their lower end portions are opened at the lower surface of the lower block 90, and the plurality of cylinders 1.1A for storing the raw material gas are stored. -Connected to 1B via introduction pipes 3A, 3B, respectively.

Then, as shown in FIG. 2 (a), the plurality of introduction paths 13, 13A, 13B are extended inside the upper block 91, and the upper ends thereof are respectively provided on the lower surfaces of the plurality of valve mounting spaces 11, 11A, 11B. It is in communication.

In addition, as shown in FIG. 1, the three side surfaces of the lower block 90 have a substantially cylindrical vent valve mounting space 14, 14A, 1
4B are respectively drilled horizontally, and the ends of the plurality of vent valve mounting spaces 14, 14A, 14B are open at the three side surfaces.

The plurality of vent valve mounting spaces 14, 14A, 14B are
As shown in FIGS. (A), (c) and FIG. 3, the slightly narrowed distal ends are in close proximity to the introduction passages and communicate with each other.

Further, as shown in FIG. 2 (c), the plurality of vent valve mounting spaces 14, 14A, 14B are connected to each other in the horizontal direction by a vent flow path 15 which defines a substantially equilateral triangle in cross section. 15 is connected to the vent port 16 of the vent line 6.

However, multiple vent valve mounting spaces 14, 14A, 14B
Radiation is exposed at intervals of 120 degrees around the center of the lower block 90, and a plurality of vent valves 17, 17A, 17B are stored in a fixed state.

As shown in FIGS. 2 (a), (c) and FIG. 3, the plurality of vent valves 17, 17A, 17B are pneumatically actuated bellows valves. Part) is in contact with the communicating portion between the introduction passages 13, 13A, 13B and the tip portions of the vent valve mounting spaces 14, 14A, 14B.

However, the multiple vent valves 17, 17A, 17B are not
・ Minimize dead space on the 13A ・ 13B side,
It has a function of switching between the vent channel 15 and the introduction channels 13, 13A, 13B.

Also, the bellows of multiple vent valves 17, 17A, 17B are
Introductory path 13, 13A, 1 as well as multiple valves 12, 12A, 12B
Exposed to be close to 3B.

In addition, 18,18A, 18B, 19,19A, 19B in FIG. 3 shows the accumulation | storage part of each raw material gas.

Next, the operation of the valve device according to the present invention will be described.

First, when supplying the raw material gas to the side of the vent line 6, the plurality of valves 12, 12A, 12B may be closed and the plurality of vent valves 17, 17A, 17B may be opened.

Then, the raw material gas is introduced from the cylinder 1.1A / 1B into the inlet pipe 3.3A.
・ 3B, introduction path 13 ・ 13A ・ 13B, vent valve mounting space 14 ・
It is supplied to the vent line 6 through 14A and 14B, the vent channel 15, and the vent port 16 in order.

During this supply, the pressure in the vent channel 15 is maintained at a constant value.

Next, the source gas of the cylinder 1 is fed to the reactor 2 of the vapor phase growth apparatus.
In the case of supplying to the valve, the vent valve 17 may be closed and the valve 12 may be opened.

Then, the raw material gas is introduced from the cylinder 1 into the introduction pipe 3, the introduction pipe 13,
It is supplied to the reaction furnace 2 of the vapor phase growth apparatus through the valve mounting space 14 and the outlet 10 in order.

Then, after supplying a predetermined amount of the source gas of the cylinder 1 (the predetermined amount is determined by the supply time because the flow rate is constant) to the reaction furnace 2 of the vapor phase growth apparatus, the source gas of the cylinder 1A is vaporized. When supplying to the reaction furnace 2 of the growth apparatus, the valve 12 is closed, the vent valve 17 is opened, and the supply of the raw material gas from the cylinder 1 is stopped.

Then, the vent valve 17A may be closed and the valve 12A may be opened.

Then, the raw material gas flows from the cylinder 1A to the introduction pipe 3A and the introduction path 13
It is supplied to the reaction furnace 2 of the vapor phase growth apparatus through A, the valve mounting space 14A, and the outlet path 10 in sequence.

At the time of this supply, a plurality of valves 12, 12A, 12B are arranged in a radial state at intervals of 120 degrees around the lower end of the outlet path 10, and when the source gas is switched, the valve 12 for each source gas is used.・
Since the distance from 12A to the reactor 2 is the same, multiple valves 1
The difference between the switching time of 2 / 12A / 12B and the time to the outlet 10 does not exist between the source gases.

However, the amount of the raw material gas supplied to the reaction furnace 2 can be accurately controlled only by accurately controlling the opening time of the valves 12 and 12A.

In addition, since the tips that function as the valve bodies of the multiple valves 12, 12A, and 12B are close to the lower end of the outlet passage 10, it is possible to minimize the pooled portions 18, 18A, 18B of each source gas. It is possible to switch the source gas rapidly.

Further, since the tip portions that function as the valve bodies of the plurality of vent valves 17, 17A, and 17B are close to the introduction passages 13, 13A, and 13B, it is necessary to minimize the pooled portions 19, 19A, 19B of each source gas. Therefore, it is possible to eliminate the space where the raw material gas is accumulated on the pipe of the raw material gas supply system, and it is possible to rapidly switch the raw material gas.

Therefore, when growing a multi-layered thin film crystal using a vapor phase growth apparatus, the fluid from the supply source can be rapidly switched, so that the multi-layered thin film crystal whose thickness is controlled in the order of atomic layers can be easily grown. There is a special effect that it can be done.

In the above description, the valve 12 which is a bellows valve is used.
Although the 12A and 12B and the vent valve 17, 17A and 17B are used, the present invention is not limited thereto and a diaphragm valve or the like may be used, and the valve 12 and 12A. The number of 12B and vent valves 17, 17A, 17B may be increased or decreased as appropriate.

Further, in the above explanations, the one in which the raw material gas is supplied to the reaction furnace 2 of the vapor phase growth apparatus has been shown, but the present invention is not limited to this, and the invention can be applied to an apparatus of a type requiring the supply of the raw material. It is obvious that

Further, although the source gas is supplied in the above description, the same effect can be obtained even if the source material such as liquid is supplied.

[Effect of device]

As described above, according to the present invention, there is a remarkable effect that the fluid can be rapidly switched.

Further, there is an excellent effect that the flow rate can be accurately controlled.

Further, according to the present invention, the vent valve of the closed flow path is opened, the flow velocity of the flowing fluid is set to a predetermined value in advance, and when the two valves are simultaneously operated when switching, the flow velocity of the fluid is changed. It is possible to expect a remarkable effect that the flow paths can be switched extremely smoothly without changing

Therefore, it becomes possible to eliminate the serious drawback that the flow velocity of the fluid takes a very long time to be constant.

Furthermore, since the plurality of valves and the plurality of vent valves are arranged in an integrated state on the mounting base, it is possible to remarkably suppress the fluctuation of the fluid state due to the switching of the flow paths with a simple configuration. There is a great effect that you can do it.

[Brief description of drawings]

FIG. 1 is an overall perspective view showing an embodiment of the valve device according to the present invention, FIG. 2 (a) is a vertical sectional view taken along the plane Z of FIG. 1, and FIG. 2 (b) is a book. FIG. 2 (c) is a cross-sectional view showing an upper portion of the valve device according to the present invention, FIG. 2 (c) is a cross-sectional view showing a lower portion of the valve device according to the present invention, and FIG. 3 is an embodiment of the valve device according to the present invention. Fluid circuit configuration diagram, FIGS. 4 (a) and 4 (b) are explanatory diagrams showing a conventional valve device, and FIG.
(A), (b) is explanatory drawing which shows the other conventional valve device. 1.1A / 1B …… Cylinder (supply source), 2 ... Reactor, 9 ...
… Manifold (mounting base), 10… Outgoing path, 11 / 11A / 1
1B …… valve mounting space, 12 ・ 12A ・ 12B …… valve, 13 ・
13A ・ 13B …… Introduction passage, 14 ・ 14A ・ 14B …… Vent valve mounting space, 15 …… Vent flow passage, 17 ・ 17A ・ 17B …… Vent valve.

Claims (1)

[Scope of utility model registration request] 1. A mounting base having a lead-out path, a plurality of valve mounting spaces which are arranged inside the mounting base and radiate around an end of the lead-out path, which communicates with each other, and the plurality of valve mounting spaces. A plurality of valves that are respectively fitted in the valve mounting spaces and that open and close the flow paths with the opening and closing portions being close to the ends of the outlet passages, and communicate with the plurality of valve mounting spaces that are arranged inside the mounting base. A plurality of introduction paths, a plurality of vent valve mounting spaces disposed inside the mounting base and communicating with the plurality of introduction paths and exhibiting a radiation state, and the plurality of vent valve mounting spaces fitted and introduced into the plurality of vent valve mounting spaces, respectively. A plurality of vent valves that open and close the flow path in a state where the opening and closing part is close to the path, a vent flow path that is provided inside the mounting base and that communicates with each other between the plurality of vent valve mounting spaces, and the plurality of introduction paths. Supply multiple fluids to each Valve device being characterized in that a number sources.