JPH0699485A - Syndiotactic polystyrenic biaxially stretched film - Google Patents

Syndiotactic polystyrenic biaxially stretched film

Info

Publication number
JPH0699485A
JPH0699485A JP4251310A JP25131092A JPH0699485A JP H0699485 A JPH0699485 A JP H0699485A JP 4251310 A JP4251310 A JP 4251310A JP 25131092 A JP25131092 A JP 25131092A JP H0699485 A JPH0699485 A JP H0699485A
Authority
JP
Japan
Prior art keywords
film
biaxially stretched
syndiotactic
stretched film
orientation ratio
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4251310A
Other languages
Japanese (ja)
Inventor
Masayuki Imai
正幸 今井
Naonobu Oda
尚伸 小田
Tomonori Yoshinaga
知則 吉永
Tadashi Okudaira
正 奥平
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyobo Co Ltd
Original Assignee
Toyobo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyobo Co Ltd filed Critical Toyobo Co Ltd
Priority to JP4251310A priority Critical patent/JPH0699485A/en
Publication of JPH0699485A publication Critical patent/JPH0699485A/en
Pending legal-status Critical Current

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  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Shaping By String And By Release Of Stress In Plastics And The Like (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

PURPOSE:To obtain a polystyrenic biaxially stretched film excellent in slitting properties substantially formed from a styrenic polymer having a syndiotactic structure, characterized by that an orientation ratio calculated according to a predetermined formula is 1.6 or more and having specific distribution in the azimuth angle direction of a specific crystallite in wide angle X-ray diffraction. CONSTITUTION:A syndiotactic polystyrenic biaxially stretched film is substantially formed from a styrenic polymer having a syndiotactic structure and the orientation ratio calculated according to formula; orientation ratio = Ax/Ay (wherein Ax is 1222cm<-1> band intensity when the polarizing direction of infrared rays coincides with the lateral direction of the film and Ay is 1222cm<-1> band intensity when the polarizing direction of infrared rays coincides with the longitudinal direction of the film) of the film is 1.6 or more and the distribution in the azimuth angle direction of a crystallite evaluated using a crystal diffraction peak present at 20.6 deg. in wide angle X-ray diffraction is not divided in the vicinity of the max. value and has only one peak.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明はスリット性に優れたシン
ジオタクチックポリスチレン系二軸延伸フィルム、さら
に詳しく言えば、磁気テープ用、写真・製版用、コンデ
ンサー用、包装用として用いる場合に、良好なスリット
性を示すシンジオタクチックポリスチレン系二軸延伸フ
ィルムに関するものである。
FIELD OF THE INVENTION The present invention relates to a biaxially stretched syndiotactic polystyrene film having excellent slitting property, more specifically, it is excellent when used for magnetic tape, photo / plate making, condenser, packaging. The present invention relates to a syndiotactic polystyrene-based biaxially stretched film having excellent slit properties.

【0002】[0002]

【従来の技術】シンジオタクチックポリスチレン系二軸
延伸フィルムは耐熱性、電気特性、透明性などに優れた
ものが開発され(特開平1−110122号、同1−1
68709号、同1−182346号、同2−2797
31号、同3−74437号、同3−109453号、
同3−99828号、同3−124427号、同3−1
31644号など)、磁気テープ用、写真・製版用、コ
ンデンサー用、包装用等、各種のフィルム用途に展開が
期待されてる。近年上記分野においては、スリット性が
優れたフィルムが要求されている。しかし、これまでの
シンジオタクチックポリスチレン系二軸延伸フィルムに
おいては、その脆さの為、スリット時にスリット点が安
定せず、幅方向に裂けたりするため破断が生じ、その結
果スリット性が極めて悪くなり、生産性の悪化をもたら
している。
2. Description of the Related Art Syndiotactic polystyrene biaxially stretched films have been developed that have excellent heat resistance, electrical properties, transparency, etc. (Japanese Patent Laid-Open Nos. 1-110122 and 1-11).
68709, 1-182346, 2-2797.
No. 31, No. 3-74437, No. 3-109453,
3-99828, 3-124427, 3-1
No. 31644), magnetic tapes, photo / plate making, capacitors, packaging, and other various film applications. In recent years, films having excellent slitting properties have been required in the above fields. However, in the conventional syndiotactic polystyrene biaxially stretched film, due to its brittleness, the slit point is not stable at the time of slitting and breaks due to tearing in the width direction, resulting in extremely poor slitting property. This has led to a deterioration in productivity.

【0003】[0003]

【発明が解決しようとする課題】シンジオタクチックポ
リスチレン系二軸延伸フィルムにおいては、その脆さの
為、スリット時にスリット点が安定せず、幅方向に裂け
たりするため破断が生じ、その結果スリット性が極めて
悪くなり、生産性の悪化をもたらしている。本発明は、
スリット性に優れたシンジオタクチックポリスチレン系
二軸延伸フィルムを提供することを目的とする。
In the syndiotactic polystyrene biaxially stretched film, due to its brittleness, the slit point is not stable at the time of slitting and fracture occurs due to tearing in the width direction, resulting in slitting. Productivity has deteriorated and productivity has deteriorated. The present invention is
An object is to provide a syndiotactic polystyrene-based biaxially stretched film having excellent slit properties.

【0004】[0004]

【課題を解決するための手段】本発明者らは、スリット
時にスリット点が安定し、フィルムの破断が生じにくい
シンジオタクチックポリスチレン2軸延伸フィルムを開
発すべく鋭意研究の結果、シンジオタクチックポリスチ
レン分子鎖の配向と結晶子の配向を或る範囲に在らしめ
ることによりスリット性を満足させることが可能である
ことを見いだし、本発明に到達したものである。即ち、
本発明は下記式によって求められる配向比が1.6以上で
あるとともに広角X線回折において20.6゜にある結晶回
折ピークを用いて評価した結晶子の方位角方向における
分布が極大値付近で分裂せず1つのピークのみを有する
ことを特徴とするスリット性に優れたシンジオタクチッ
クポリスチレン二軸延伸フィルム。本発明に用いられる
立体規則性がシンジオタクチック構造であるポリスチレ
ン系重合体は、側鎖であるフェニル基又は置換フェニル
基が核磁気共鳴法により定量されるタクテイシテイがダ
イアッド(構成単位が2個)で85%以上、ペンタッド
(構成単位が5個)で50%以上のシンジオタクチック構
造であることが望ましい。
The present inventors have earnestly studied to develop a syndiotactic polystyrene biaxially stretched film in which the slit point is stable during slitting and the breakage of the film is unlikely to occur, and as a result, the syndiotactic polystyrene was found. The inventors have found that it is possible to satisfy the slit property by making the orientation of the molecular chains and the orientation of the crystallites within a certain range, and have reached the present invention. That is,
In the present invention, the orientation ratio obtained by the following formula is 1.6 or more and the distribution in the azimuth direction of the crystallites evaluated by using the crystal diffraction peak at 20.6 ° in wide angle X-ray diffraction is divided near the maximum value. A biaxially stretched syndiotactic polystyrene film having excellent slitting characteristics, which has only one peak. The polystyrene polymer with stereoregularity having a syndiotactic structure used in the present invention has a tacticity of diad (two constitutional units) in which a side chain phenyl group or substituted phenyl group is quantified by a nuclear magnetic resonance method. It is desirable that the syndiotactic structure is 85% or more, and pentad (5 constitutional units) is 50% or more.

【0005】該ポリスチレン系重合体としては、ポリス
チレン、ポリ(p-、m-又はo-メチルスチレン)、ポリ
(2,4-、2,5-、3,4-又は3,5-ジメチルスチレン)、ポリ
(p-ターシャリーブチルスチレン)などのポリ(アルキ
ルスチレン)、ポリ(p-、m-又はo-クロロスチレン)、
ポリ(p-、m-又はo-ブロモスチレン)、ポリ(p-、m-又
はo-フルオロスチレン)、ポリ(o-メチル-p- フルオロ
スチレン)などのポリ(ハロゲン化スチレン)、ポリ
(p-、m-又はo-クロロメチルスチレン)などのポリ(ハ
ロゲン置換アルキルスチレン)、ポリ(p-、m-又はo-メ
トキシスチレン)、ポリ(p-、m-又はo-エトキシスチレ
ン)などのポリ(アルコキシスチレン)、ポリ(p-、m-
又はo-カルボキシメチルスチレン)などのポリ(カルボ
キシアルキルスチレン)ポリ(p-ビニルベンジルプロピ
ル)などのポリ(アルキルエーテルスチレン)、ポリ
(p-トリメチルシリルスチレン)などのポリ(アルキル
シリルスチレン)、さらにはポリ(ビニルベンジルジメ
トキシホスファイド)などが挙げられる。
Examples of the polystyrene-based polymer include polystyrene, poly (p-, m- or o-methylstyrene), poly (2,4-, 2,5-, 3,4- or 3,5-dimethylstyrene. ), Poly (alkylstyrene) such as poly (p-tertiarybutylstyrene), poly (p-, m- or o-chlorostyrene),
Poly (halogenated styrene) such as poly (p-, m- or o-bromostyrene), poly (p-, m- or o-fluorostyrene), poly (o-methyl-p-fluorostyrene), poly ( p-, m- or o-chloromethylstyrene) and other poly (halogen-substituted alkylstyrenes), poly (p-, m- or o-methoxystyrene), poly (p-, m- or o-ethoxystyrene), etc. Poly (alkoxystyrene), poly (p-, m-
Or, poly (carboxyalkylstyrene) such as o-carboxymethylstyrene), poly (alkyletherstyrene) such as poly (p-vinylbenzylpropyl), poly (alkylsilylstyrene) such as poly (p-trimethylsilylstyrene), and Examples thereof include poly (vinylbenzyldimethoxyphosphide).

【0006】本発明においては、前記ポリスチレン系重
合体のなかで、特にポリスチレンが好適である。また、
本発明で用いるシンジオタクチック構造を有するポリス
チレン系重合体は、必ずしも単一化合物である必要はな
く、シンジオタクティシティが前記範囲内であればアタ
クチック構造やアイソタクチック構造のポリスチレン系
重合体との混合物や、共重合体及びそれらの混合物でも
よい。本発明の二軸延伸シンジオタクチックポリスチレ
ンはシンジオタクチックポリスチレンを常法で溶融押し
出しした後、逐次または同時二軸延伸を行い、更に必要
に応じ再度縦または横方向に延伸を行った後150 〜280
℃の温度で熱固定することによって得られるものである
が、その最大の特徴は該フィルムの分子配向と結晶配向
がある特定範囲内にあることである。
In the present invention, polystyrene is particularly preferable among the polystyrene polymers. Also,
The polystyrene-based polymer having a syndiotactic structure used in the present invention is not necessarily a single compound, and if the syndiotacticity is within the above range, a polystyrene-based polymer having an atactic structure or an isotactic structure is used. It may be a mixture of, a copolymer and a mixture thereof. The biaxially stretched syndiotactic polystyrene of the present invention is obtained by melt-extruding the syndiotactic polystyrene by a conventional method, then sequentially or simultaneously biaxially stretched, and further stretched in the longitudinal direction or the transverse direction as needed, and then 150- 280
It is obtained by heat-setting at a temperature of ° C, and the most important feature is that the molecular orientation and crystal orientation of the film are within a certain range.

【0007】赤外吸収法により求められる分子配向はシ
ンジオタクチックポリスチレン分子鎖の主鎖がトランス
コンフォメーションによりどの程度並び揃っているかを
結晶部・非晶部をあわせた系全体として評価するパラメ
ーターである。この値が1に近づくほど分子鎖は等方的
に存在し、0に近づくほどTD方向に配向し、1より大
きくなるに従ってMD方向に配向していることを表して
いる。発明者らは、この赤外吸収法により求めた分子配
向がスリット点の安定性と極めて相関が強いことを見い
だし、この値が請求範囲外にあるときは、スリット点が
不安定化するため、スリット時の破断が急増し、スリッ
ト性が良好なフィルムが得られない。更に、スリット性
を良好にするためには赤外吸収より求めた分子配向を上
記の範囲にあらしめるだけでは不十分であり、結晶子の
配向もある特定範囲にあらしめることが必要である。本
発明のシンジオタクチックポリスチレンフィルムは広角
X線回折において20.6゜にある結晶回折ピークを用いて
評価した結晶子の方位角方向における分布曲線が極大値
付近で分裂せずに1つのピークのみを与えることが必要
である。この結晶配向はシンジオタクチックポリスチレ
ン結晶子の配向の程度を表しており、方位角方向の分布
曲線が極大値付近で分裂せずに1つのピークのみを与え
ることは、結晶子がその方向に極度に配向していること
を示している。発明者らはこの結晶子の配向がスリット
時のスリット点の安定性、特に幅方向への裂けにに密接
な相関があることを見いだし、更に、該配向分布曲線を
極大値付近で分裂させず1つのピークのみにすることに
よりそのようなスリット時の裂けの改善がはかれること
を見いだした。
The molecular orientation determined by the infrared absorption method is a parameter for evaluating how much the main chains of syndiotactic polystyrene molecular chains are aligned by transconformation as a whole system including a crystal part and an amorphous part. is there. It is shown that the molecular chains are isotropically present as the value approaches 1 and are oriented in the TD direction as the value approaches 0, and are oriented in the MD direction as the value becomes greater than 1. The inventors have found that the molecular orientation determined by this infrared absorption method has a very strong correlation with the stability of the slit point, and when this value is outside the claimed range, the slit point becomes unstable, The number of breaks at the time of slitting increases rapidly, and a film having good slitting properties cannot be obtained. Further, in order to improve the slit property, it is not enough to give the molecular orientation determined by infrared absorption to the above range, and it is necessary to give the crystallite orientation to a certain specific range. In the syndiotactic polystyrene film of the present invention, the distribution curve in the azimuth direction of the crystallite evaluated using the crystal diffraction peak at 20.6 ° in wide-angle X-ray diffraction gives only one peak without splitting near the maximum value. It is necessary. This crystal orientation represents the degree of orientation of the syndiotactic polystyrene crystallite, and the fact that the distribution curve in the azimuth direction gives only one peak without splitting near the maximum value means that the crystallite has an extreme degree in that direction. It is shown that it is oriented to. The inventors have found that the orientation of the crystallite has a close correlation with the stability of the slit point at the time of slitting, particularly the tear in the width direction, and further, the orientation distribution curve is not split near the maximum value. It has been found that the improvement of the tear at such a slit can be achieved by making only one peak.

【0008】[0008]

【実施例】以下に実施例にて本発明を具体的に説明する
が、本発明はこれら実施例のみに限定されるものではな
い。なお、フィルムの評価方法を以下に示す。 (1)分子配向 シンジオタクチックポリスチレン分子鎖の分子配向の測
定は1222cm-1にある赤外吸収バンドがトランスコンフォ
メーションに起因する報告に従って行った。パーキンエ
ルマー赤外分光光度計を用いて、偏光赤外に対する試料
の傾きを変え、吸収強度を測定した。1222cm-1の光で、
入射光の電気ベクトルがフィルムの幅方向と一致した時
の吸収強度を1182cm-1バンドで規格化した値をAx、フィ
ルムの長手方向と一致した時の吸収強度を1182cm-1バン
ドで規格化した値をAyとすると、分子配向はAx/Ay で定
義される。
EXAMPLES The present invention will be specifically described below with reference to examples, but the present invention is not limited to these examples. The evaluation method of the film is shown below. (1) Molecular Orientation The molecular orientation of syndiotactic polystyrene molecular chains was measured according to the report that the infrared absorption band at 1222 cm −1 was due to transconformation. Using a Perkin Elmer infrared spectrophotometer, the inclination of the sample with respect to polarized infrared was changed and the absorption intensity was measured. 1222 cm -1 of light,
The absorption intensity when the electric vector of the incident light coincided with the width direction of the film was standardized in the 1182 cm -1 band as Ax, and the absorption intensity when it coincided with the longitudinal direction of the film was normalized in the 1182 cm -1 band. If the value is Ay, the molecular orientation is defined by Ax / Ay.

【0009】(2)結晶配向分布 二軸延伸フィルムを約500μmの厚さになるように積
層して、X線回折用の試料とし、X線回折装置(理学電
機(株)製 Rotaflex) の試料ホルダーに設置する。フ
ィルム面と垂直にX線を入射した場合をθ=0゜とし、
入射X線の延長線上に検出器がある場合を2θ=0゜と
する。まず、走査面とフィルムの幅方向が平行になるよ
うに試料を設置し、この状態を方位角χ=0゜とする。
この状態で2θをスキャンして2θ=20.6゜付近にみら
れる結晶回折ピークの極大位置で検出器を固定する。こ
の状態でさらにθをスキャンして回折ピークの強度が極
大値をもつところでθを固定する。このようにしていわ
ゆる結晶面の面だしを行った上で方位角をスキャンし、
このときの結晶回折ピーク強度の方位角依存性を記録す
ると、これが結晶配向分布曲線と呼ぶ。
(2) Crystal orientation distribution A biaxially stretched film was laminated so as to have a thickness of about 500 μm and used as a sample for X-ray diffraction, which was a sample of an X-ray diffractometer (Rotaflex manufactured by Rigaku Denki KK) Install in the holder. When X-rays are incident perpendicularly to the film surface, θ = 0 °,
When the detector is on the extension of the incident X-ray, 2θ = 0 °. First, the sample is set so that the scanning surface and the width direction of the film are parallel to each other, and this state is set to an azimuth angle χ = 0 °.
In this state, scan 2θ and fix the detector at the maximum position of the crystal diffraction peak seen near 2θ = 20.6 °. In this state, θ is further scanned and θ is fixed when the intensity of the diffraction peak has a maximum value. In this way, the azimuth angle is scanned after the so-called crystal plane is set,
When the azimuth angle dependence of the crystal diffraction peak intensity at this time is recorded, this is called a crystal orientation distribution curve.

【0010】(3)スリット性 シェアーカッター方式のスリッター(西村製作所製)で
スリットし、そのときの破断の回数よりスリット性を次
のように判断した。ただし、スリッターの運転はライン
スピード100m /min で行った。 10分間運転したとき 破断が0回 1級 破断が3〜1回 2級 破断が9〜4回 3級 破断が19〜10回 4級 破断が20回以上 5級
(3) Slitting property A slitting device of the shear cutter type (manufactured by Nishimura Seisakusho) was used for slitting, and the slitting property was judged from the number of breaks at that time as follows. However, the operation of the slitter was performed at a line speed of 100 m / min. When operated for 10 minutes Break 0 times Class 1 Break 3 to 1 class 2 Break 9 to 4 times Class 3 break 19 to 10 times Class 4 break 20 times or more Class 5

【0011】実施例 滑剤として、平均粒子径0.8 μm、ばらつき度20%、面
積形状係数75%の炭酸カルシウムをシンジオタクチック
ポリスチレン(重量平均分子量300000)100 重量%に対
して2.0 重量%添加したポリマーチップと、滑剤の添加
されていないポリマーチップを重量比で1対9の割合で
混合した後、乾燥し、295 ℃で溶融押し出し冷却固化
し、無定形シートを得た。該無定形シートをまず赤外線
加熱ヒーターを複数個使用して140 ℃で縦方向に1.6 倍
延伸した後、テンターで、横方向に130 ℃で3.0 倍延伸
し、その後再び、125 ℃に加熱したロールを用いて縦方
向に2.5 倍延伸する。このフィルムを240℃で熱固定し
た後、230 ℃で幅方向に3%リラックスさせた。得られ
たフィルムは分子配向が3.1 で、結晶配向分布曲線は図
1に示すように極大値付近でも分裂せずに1つのピーク
のみを与えた。このフィルムのスリット性のランクは1
級であった。
EXAMPLE As a lubricant, 2.0% by weight of calcium carbonate having an average particle size of 0.8 μm, a degree of variation of 20% and an area shape factor of 75% was added to 100% by weight of syndiotactic polystyrene (weight average molecular weight 300000). Chips and polymer chips to which a lubricant was not added were mixed at a weight ratio of 1: 9, dried, melt-extruded at 295 ° C., cooled and solidified to obtain an amorphous sheet. The amorphous sheet was first stretched 1.6 times in the machine direction at 140 ° C using multiple infrared heaters, then stretched 3.0 times in the transverse direction at 130 ° C by 3.0 times with a tenter, and then again heated to 125 ° C. To draw 2.5 times in the machine direction. This film was heat set at 240 ° C. and then relaxed at 230 ° C. in the width direction by 3%. The obtained film had a molecular orientation of 3.1, and the crystal orientation distribution curve gave only one peak without splitting even near the maximum value as shown in FIG. The slit property of this film is ranked 1
It was class.

【0012】比較例1 実施例で用いた無定形シートをテンターで横方向に130
℃で3.2 倍延伸し、次に135 ℃に加熱したロールを用い
て縦方向に3.5 倍延伸する。このフィルムを250 ℃で熱
固定した後、230 ℃で幅方向に3%リラックスさせた。
得られたフィルムは分子配向が1.8 で、結晶配向分布曲
線は図2に示すように極大値付近で2つに分裂した。こ
のフィルムのスリット性のランクは5級であった。
COMPARATIVE EXAMPLE 1 The amorphous sheet used in the example was placed in a tenter in the lateral direction 130
Draw 3.2 times at ℃, then draw 3.5 times in the machine direction using a roll heated to 135 ℃. The film was heat set at 250 ° C. and then relaxed at 230 ° C. in the width direction by 3%.
The obtained film had a molecular orientation of 1.8, and the crystal orientation distribution curve was split into two near the maximum value as shown in FIG. The slit property of this film was grade 5.

【0013】比較例2 実施例で用いた無定形シートをまず赤外線加熱ヒーター
を複数個使用して140℃で縦方向に1.4 倍延伸した後、1
35 ℃に加熱したロールを用いて縦方向に2.2倍延伸す
る。次にテンターで横方向に135 ℃で3.0 倍延伸し、25
0 ℃で熱固定した後、230 ℃で幅方向に3%リラックス
させた。得られたフィルムは分子配向が1.4 で、結晶配
向分布曲線は図3に示すように極大値付近でも分裂せず
に1つのピークのみを与えた。このフィルムのスリット
性のランクは5級であった。
Comparative Example 2 The amorphous sheet used in the example was first stretched 1.4 times in the machine direction at 140 ° C. by using a plurality of infrared heaters, and then 1
Stretch 2.2 times in the machine direction using a roll heated to 35 ° C. Then, draw it in the tenter transversely at 135 ℃ 3.0 times,
After heat setting at 0 ° C, the mixture was relaxed at 230 ° C in the width direction by 3%. The obtained film had a molecular orientation of 1.4, and the crystal orientation distribution curve gave only one peak without splitting near the maximum value as shown in FIG. The slit property of this film was grade 5.

【0014】[0014]

【発明の効果】以上、記載のとおり、本発明は前記特許
請求の範囲に記載のとおりの構成を採用することによ
り、スリット性に極めて優れたシンジオタクチックポリ
スチレン系二軸延伸フィルムであると言うことができ
る。
As described above, the present invention is said to be a syndiotactic polystyrene type biaxially stretched film having an extremely excellent slit property by adopting the constitution as described in the claims. be able to.

【図面の簡単な説明】[Brief description of drawings]

【図1】図1は実施例で得られたフィルムの結晶配向分
布曲線である。
FIG. 1 is a crystal orientation distribution curve of a film obtained in an example.

【図2】図2は比較例1で得られたフィルムの結晶配向
分布曲線である。
FIG. 2 is a crystal orientation distribution curve of the film obtained in Comparative Example 1.

【図3】図3は比較例2で得られたフィルムの結晶配向
分布曲線である。
FIG. 3 is a crystal orientation distribution curve of the film obtained in Comparative Example 2.

【符号の説明】[Explanation of symbols]

Azimuthal angle :フィルムの方位角 Intensity :結晶回折強度 Azimuthal angle: Film azimuth Intensity: Crystal diffraction intensity

───────────────────────────────────────────────────── フロントページの続き (72)発明者 奥平 正 滋賀県大津市堅田二丁目1番1号 東洋紡 績株式会社総合研究所内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Tadashi Okuhira 2-1-1 Katata, Otsu City, Shiga Prefecture Toyobo Co., Ltd.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 実質的にシンジオタクチック構造を有す
るスチレン系重合体から成り、下記式によって求められ
る配向比が1.6 以上であり、且つ広角X線回折において
20.6゜にある結晶回折ピークを用いて評価した結晶子の
方位角方向における分布が極大値付近で分裂せず1つの
ピークのみを有することを特徴とするシンジオタクチッ
クポリスチレン系二軸延伸フィルム。 配向比=Ax/Ay Ax:赤外光の偏光方向がフィルムの幅方向と一致した時
の1222cm-1 バンド強度 Ay:赤外光の偏光方向がフィルムの長手方向と一致した
時の1222cm-1 バンド強度
1. A substantially styrene-based polymer having a syndiotactic structure, which has an orientation ratio of 1.6 or more as determined by the following formula and has a wide-angle X-ray diffraction pattern.
A syndiotactic polystyrene biaxially stretched film characterized in that the distribution of crystallites in the azimuth direction evaluated using the crystal diffraction peak at 20.6 ° does not split near the maximum value and has only one peak. Orientation ratio = Ax / Ay Ax: infrared light polarization direction 1222Cm -1 band intensity Ay when matched with the width direction of the film: the infrared light polarization direction when matched with the longitudinal direction of the film 1222Cm -1 Band strength
JP4251310A 1992-09-21 1992-09-21 Syndiotactic polystyrenic biaxially stretched film Pending JPH0699485A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4251310A JPH0699485A (en) 1992-09-21 1992-09-21 Syndiotactic polystyrenic biaxially stretched film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4251310A JPH0699485A (en) 1992-09-21 1992-09-21 Syndiotactic polystyrenic biaxially stretched film

Publications (1)

Publication Number Publication Date
JPH0699485A true JPH0699485A (en) 1994-04-12

Family

ID=17220909

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4251310A Pending JPH0699485A (en) 1992-09-21 1992-09-21 Syndiotactic polystyrenic biaxially stretched film

Country Status (1)

Country Link
JP (1) JPH0699485A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06107812A (en) * 1992-09-28 1994-04-19 Toyobo Co Ltd Biaxially oriented syndiotactic polystyrene film
JPH06107813A (en) * 1992-09-28 1994-04-19 Toyobo Co Ltd Biaxially oriented syndiotactic polystyrene film
JPH0724911A (en) * 1993-07-08 1995-01-27 Toyobo Co Ltd Syndyotactic polystyrene film
JPH08323877A (en) * 1995-05-29 1996-12-10 Toyobo Co Ltd Biaxially oriented film of syndiotactic polystyrene

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JP2713338B2 (en) * 1992-08-10 1998-02-16 東洋紡績株式会社 Syndiotactic polystyrene film
JP3191995B2 (en) * 1992-08-10 2001-07-23 東洋紡績株式会社 Polystyrene-based biaxially stretched film
JP3270135B2 (en) * 1992-09-04 2002-04-02 東洋紡績株式会社 Syndiotactic polystyrene biaxially stretched film for condenser
JP3287419B2 (en) * 1992-08-24 2002-06-04 東洋紡績株式会社 Syndiotactic polystyrene biaxially stretched film
JP3287417B2 (en) * 1992-08-10 2002-06-04 東洋紡績株式会社 Syndiotactic polystyrene biaxially stretched film
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JPS6377905A (en) * 1986-09-22 1988-04-08 Idemitsu Kosan Co Ltd Styrene polymer molding
JPH01110122A (en) * 1987-10-23 1989-04-26 Asahi Chem Ind Co Ltd Production of syndiotactic polystyrenic film
JPH01316246A (en) * 1987-12-04 1989-12-21 Idemitsu Kosan Co Ltd Styrene resin oriented molded product and its manufacture
JPH01168709A (en) * 1987-12-25 1989-07-04 Asahi Chem Ind Co Ltd Syndiotactic polystyrene film
JPH01182346A (en) * 1988-01-14 1989-07-20 Idemitsu Kosan Co Ltd Molded body of styrene based resin and production thereof
JPH0267328A (en) * 1988-08-31 1990-03-07 Idemitsu Kosan Co Ltd Raw material for food packaging
JPH02162083A (en) * 1988-12-16 1990-06-21 Idemitsu Petrochem Co Ltd Ink ribbon
JPH02279731A (en) * 1989-04-21 1990-11-15 Asahi Chem Ind Co Ltd Transparent syndiotactic polystyrene film
JPH0370746A (en) * 1989-08-11 1991-03-26 Idemitsu Kosan Co Ltd Film having smoothness
JPH0374437A (en) * 1989-08-14 1991-03-29 Idemitsu Kosan Co Ltd Readily slippery film
JPH0386706A (en) * 1989-08-31 1991-04-11 Idemitsu Kosan Co Ltd Magnetic recording medium
JPH0395723A (en) * 1989-09-08 1991-04-22 Idemitsu Kosan Co Ltd Magnetic card
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JP3287417B2 (en) * 1992-08-10 2002-06-04 東洋紡績株式会社 Syndiotactic polystyrene biaxially stretched film
JP2713337B2 (en) * 1992-08-10 1998-02-16 東洋紡績株式会社 Syndiotactic polystyrene stretched film
JP2713338B2 (en) * 1992-08-10 1998-02-16 東洋紡績株式会社 Syndiotactic polystyrene film
JP2637337B2 (en) * 1992-08-24 1997-08-06 東洋紡績株式会社 Syndiotactic polystyrene biaxially stretched film
JP3287419B2 (en) * 1992-08-24 2002-06-04 東洋紡績株式会社 Syndiotactic polystyrene biaxially stretched film
JP3287418B2 (en) * 1992-08-24 2002-06-04 東洋紡績株式会社 Syndiotactic polystyrene biaxially stretched film
JP3270135B2 (en) * 1992-09-04 2002-04-02 東洋紡績株式会社 Syndiotactic polystyrene biaxially stretched film for condenser
JPH0691750A (en) * 1992-09-11 1994-04-05 Toyobo Co Ltd Syndiotactic polystyrene biaxially drawn film

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06107812A (en) * 1992-09-28 1994-04-19 Toyobo Co Ltd Biaxially oriented syndiotactic polystyrene film
JPH06107813A (en) * 1992-09-28 1994-04-19 Toyobo Co Ltd Biaxially oriented syndiotactic polystyrene film
JPH0724911A (en) * 1993-07-08 1995-01-27 Toyobo Co Ltd Syndyotactic polystyrene film
JPH08323877A (en) * 1995-05-29 1996-12-10 Toyobo Co Ltd Biaxially oriented film of syndiotactic polystyrene

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