JPH0699329A - Air leak prevention method for vacuum chuck surface - Google Patents

Air leak prevention method for vacuum chuck surface

Info

Publication number
JPH0699329A
JPH0699329A JP27340092A JP27340092A JPH0699329A JP H0699329 A JPH0699329 A JP H0699329A JP 27340092 A JP27340092 A JP 27340092A JP 27340092 A JP27340092 A JP 27340092A JP H0699329 A JPH0699329 A JP H0699329A
Authority
JP
Japan
Prior art keywords
workpiece
chuck
face plate
vacuum
chuck surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP27340092A
Other languages
Japanese (ja)
Inventor
Yoshihiko Yamada
良彦 山田
Hiroshi Ishikure
博司 石榑
Tetsutsugu Osaka
哲嗣 大阪
Sumitaka Noda
純孝 野田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujimi Inc
Toyoda Koki KK
Original Assignee
Fujimi Inc
Toyoda Koki KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujimi Inc, Toyoda Koki KK filed Critical Fujimi Inc
Priority to JP27340092A priority Critical patent/JPH0699329A/en
Publication of JPH0699329A publication Critical patent/JPH0699329A/en
Pending legal-status Critical Current

Links

Landscapes

  • Jigs For Machine Tools (AREA)

Abstract

PURPOSE:To provide an air leak prevention method which prevent air leak from the chuck surface making no contact with a work, around the work in a vacuum chuck employing a chuck surface composed of porous material. CONSTITUTION:The method consists of a process in which a work is placed first over a chuck surface 3 composed of hard porous material fixedly set on a fixed surface 1 having vacuum holes 2, and the vacuum is drawn with silicone rubber 6 coated, which is located on the chuck surface 3 around the work 3, and of a process in which after coated silicone rubber 6 has been hardened with the work W removed from the chuck surface 3, the chuck surface 3 including the silicone rubber coated surface is flatly ground by a grinding wheel.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、工作物を真空吸着して
保持する真空チャック面の空気洩れ防止方法に関するも
のである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for preventing air leakage from a vacuum chuck surface for holding a workpiece by vacuum suction.

【0002】[0002]

【従来の技術】工作機械で工作物を加工する際に、真空
チャックで工作物を保持する場合がある。この真空チャ
ックは図5及び図6で示すように、テーブル1の表面に
真空引き穴2を開口し、この真空引き穴2上にポーラス
セラミック等の多気孔部材よりなるチャック面板3を当
接し、その外周をシール材5を介してホルダ4によりテ
ーブル1に固着した構造である。
2. Description of the Related Art When machining a workpiece with a machine tool, the workpiece may be held by a vacuum chuck. As shown in FIGS. 5 and 6, this vacuum chuck has a vacuum drawing hole 2 formed in the surface of the table 1, and a chuck face plate 3 made of a multi-pore member such as porous ceramic is brought into contact with the vacuum drawing hole 2. The structure is such that the outer periphery is fixed to the table 1 by the holder 4 via the seal material 5.

【0003】[0003]

【発明が解決しようとする課題】上記真空チャックは多
気孔部材よりなるチャック面板3上に工作物Wを載置
し、真空引き穴2より真空引きすることにより、工作物
Wがチャック面板3に真空吸着して保持される。
In the above vacuum chuck, the workpiece W is placed on the chuck face plate 3 made of a multi-pore member, and the workpiece W is attached to the chuck face plate 3 by evacuating the workpiece W through the vacuum suction hole 2. It is vacuum-adsorbed and held.

【0004】ところが、工作物Wの面積がチャック面板
3の面積と同一であれば問題はないが、一般に工作物W
の面積よりもチャック面板3の面積の方が大きく形成さ
れている。そのため、チャック面板3に工作物Wを載置
したときに、工作物Wの周囲のチャック面板3には工作
物Wが接していない幅部Bが具現する。
However, if the area of the workpiece W is the same as the area of the chuck face plate 3, there is no problem, but generally the workpiece W is
The area of the chuck face plate 3 is formed larger than the area of. Therefore, when the workpiece W is placed on the chuck face plate 3, a width portion B where the workpiece W is not in contact with the chuck face plate 3 around the workpiece W is realized.

【0005】この工作物Wが接していない幅部Bによ
り、真空引きしたときに空気が洩れてしまい、工作物W
の吸着保持力が低下する問題があった。
Due to the width portion B which is not in contact with the workpiece W, air leaks when the vacuum is drawn, and the workpiece W
However, there was a problem that the adsorption holding power of was decreased.

【0006】本発明の目的は、上記工作物Wが接してい
ない幅部Bからの空気洩れを防止する方法を提供するこ
とである。
An object of the present invention is to provide a method for preventing air leakage from the width portion B which is not in contact with the workpiece W.

【0007】[0007]

【課題を解決するための手段】上記の目的を達成するた
めの本発明の方法は、真空引き穴を有する固定面に固設
した硬質の多気孔部材よりなるチャック面板上に工作物
を載置し、工作物周囲のチャック面板にシリコンゴムを
塗布して真空引きする工程と、チャック面板より工作物
を取り外して前記塗布したシリコンゴムが硬化した後に
前記シリコンゴム塗布面を含めてチャック面板の表面を
砥石で平坦研削する工程とから成るものである。
According to the method of the present invention for achieving the above object, a workpiece is placed on a chuck face plate made of a rigid multi-pore member fixed to a fixed surface having a vacuum drawing hole. Then, the step of applying silicon rubber to the chuck face plate around the workpiece and drawing a vacuum, and the surface of the chuck face plate including the silicon rubber application face after removing the workpiece from the chuck face plate and curing the applied silicon rubber Is ground flat with a grindstone.

【0008】[0008]

【作用】上記の構成により、工作物が接していない工作
物の周囲のチャック面板にシリコンゴムの塗布浸透部が
形成され、このシリコンゴムの塗布浸透部部によって多
気孔が塞がれて通気遮断状態となり、空気洩れを防止す
る。また、チャック面板の表面を砥石で平坦に研削する
ことにより、シリコンゴムの出っ張りがなくなり、工作
物の一部が塗布滲透部にはみ出しても工作物とチャック
面板を密着させることができる。
With the above construction, the silicone rubber coating / penetrating portion is formed on the chuck face plate around the workpiece that is not in contact with the workpiece, and the silicone rubber coating / permeating portion blocks the multiple pores to block ventilation. To prevent air leakage. Further, by flattening the surface of the chuck face plate with a grindstone, the protrusion of the silicone rubber is eliminated, and the workpiece and the chuck face plate can be brought into close contact with each other even if a part of the workpiece protrudes into the coating / penetrating portion.

【0009】[0009]

【実施例】以下本発明の実施例を図面に基づいて説明す
る。図1において、1はテーブル、あり、その表面に複
数の真空引き穴2が開口されている。この真空引き穴2
上にポーラスセラミック等の多気孔部材よりなる円形の
チャック面板3を当接し、その外周をシール材5を介し
て円筒状のホルダ4を介してボルト10によりテーブル
1に固着し、真空チャックを構成している。
Embodiments of the present invention will be described below with reference to the drawings. In FIG. 1, reference numeral 1 denotes a table, on the surface of which a plurality of vacuum drawing holes 2 are opened. This vacuum draw hole 2
A circular chuck face plate 3 made of a multi-pore member such as a porous ceramic is brought into contact with the top, and the outer periphery thereof is fixed to the table 1 with a bolt 10 via a cylindrical holder 4 via a sealing material 5 to form a vacuum chuck. is doing.

【0010】前記チャック面板3上に工作物Wを載置
し、工作物W周囲のチャック面板3の工作物Wが接して
いない幅部Bにシリコンゴム6を塗布して真空引きす
る。これにより、シリコンゴム6の一部は多気孔に吸引
浸透する。
A workpiece W is placed on the chuck face plate 3, and a silicon rubber 6 is applied to a width portion B of the chuck face plate 3 around the workpiece W, which is not in contact with the workpiece W, and a vacuum is drawn. As a result, a part of the silicone rubber 6 is sucked and permeated into the multi-pores.

【0011】次に、工作物Wをチャック面板3より取り
外す。工作物Wが取り外されたチャック面板3の表面に
は図2で示すように、シリコンゴム6を塗布した工作物
Wが接していない幅部Bにはシリコンゴム6が盛り上が
り、多気孔にはシリコンゴム浸透部6aが形成される。
Next, the workpiece W is removed from the chuck face plate 3. As shown in FIG. 2, on the surface of the chuck face plate 3 from which the workpiece W has been removed, the silicon rubber 6 rises up in the width portion B where the workpiece W coated with the silicone rubber 6 is not in contact, and the silicon is filled in the multi-pores. The rubber permeation part 6a is formed.

【0012】前記シリコンゴム6が硬化するまで待っ
て、図3で示すように、硬化した後には前記盛り上がっ
たシリコンゴム6を含めてチャック面板3の表面を、モ
ータ8で回転する砥石7によって平坦研削仕上げをす
る。
After the silicone rubber 6 is cured, as shown in FIG. 3, after the silicone rubber 6 is cured, the surface of the chuck face plate 3 including the raised silicone rubber 6 is flattened by a grindstone 7 rotated by a motor 8. Grind and finish.

【0013】前記平坦研削仕上げされたチャック面板3
は図4で示すように、工作物Wが接していない幅部Bの
シリコンゴム6の盛り上がりが除去され、シリコンゴム
浸透部6aが残存する。従って、再び工作物Wを前記の
定位置に載置することにより、工作物Wが接していない
幅部Bの工作物Wの周囲のチャック面板3は、前記シリ
コンゴム浸透部6aによって通気が遮断された状態にな
る。
The chuck face plate 3 which has been subjected to the flat grinding finish
As shown in FIG. 4, the swelling of the silicone rubber 6 in the width portion B not in contact with the workpiece W is removed, and the silicone rubber permeation portion 6a remains. Therefore, by placing the work W again in the above-mentioned fixed position, the chuck face plate 3 around the work W of the width B where the work W is not in contact is cut off by the silicone rubber permeation part 6a. It will be in the state of being.

【0014】これにより、工作物Wを真空吸着するため
に、真空引きしても工作物Wが接していない幅部Bから
の空気洩れが防止され、シリコンゴム6の盛り上がりが
ないので、工作物Wをチヤック面板3にしっかり密着さ
せることができ、真空圧が上昇し、工作物Wを充分に真
空吸着保持することができる。
As a result, since the workpiece W is vacuum-sucked, even if the workpiece W is evacuated, air leakage from the width portion B where the workpiece W is not in contact is prevented, and the silicone rubber 6 does not rise. The W can be firmly attached to the chuck face plate 3, the vacuum pressure can be increased, and the workpiece W can be sufficiently vacuum-held and held.

【0015】[0015]

【発明の効果】以上のように本発明によると、真空引き
穴を有する固定面に固設した硬質の多気孔部材よりなる
チャック面板上に工作物を載置し、工作物周囲のチャッ
ク面板にシリコンゴムを塗布して真空引きする工程と、
チャック面板より工作物を取り外して前記塗布したシリ
コンゴムが硬化した後に前記シリコンゴム塗布面を含め
てチャック面板の表面を砥石で平坦研削する工程とによ
って工作物Wが接していない幅部の空気洩れを防止し、
工作物とチャック面板を互いにしっかりと密着させるこ
とができる真空チャックが得られ、工作物が真空チヤッ
クから外れたり、位置ずれしたりすることを防止でき
る。
As described above, according to the present invention, a workpiece is placed on a chuck face plate made of a hard multi-pore member fixed to a fixed face having a vacuum hole, and the chuck face plate around the workpiece is attached to the chuck face plate. Applying silicon rubber and vacuuming,
Air leakage in the width portion where the workpiece W is not in contact by a step of removing the workpiece from the chuck face plate and flattening the surface of the chuck face plate including the surface coated with the silicon rubber with a grind stone after the applied silicon rubber is cured. Prevent
A vacuum chuck can be obtained in which the workpiece and the chuck face plate can be firmly adhered to each other, and the workpiece can be prevented from coming off the vacuum chuck or being displaced.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明方法のシリコンゴム塗布工程の断面図FIG. 1 is a cross-sectional view of a silicone rubber applying step of the method of the present invention.

【図2】工作物を取り外した状態の断面図FIG. 2 is a cross-sectional view with the workpiece removed.

【図3】チャック面板の表面を平坦研削している状態の
断面図
FIG. 3 is a sectional view showing a state where the surface of the chuck face plate is flat-ground.

【図4】平坦研削仕上げされチャック面板の断面図FIG. 4 is a cross-sectional view of a chuck face plate that has been finished by flat grinding.

【図5】従来の真空チャックの平面図FIG. 5 is a plan view of a conventional vacuum chuck.

【図6】図5の断面図6 is a sectional view of FIG.

【符号の説明】[Explanation of symbols]

1 テーブル 2 真空引き穴 3 チャック面板 4 ホルダ 6 シリコンゴム 6a シリコンゴム浸透部 1 Table 2 Vacuum suction hole 3 Chuck face plate 4 Holder 6 Silicon rubber 6a Silicon rubber penetration part

───────────────────────────────────────────────────── フロントページの続き (72)発明者 石榑 博司 愛知県刈谷市朝日町1丁目1番地 豊田工 機株式会社内 (72)発明者 大阪 哲嗣 愛知県刈谷市朝日町1丁目1番地 豊田工 機株式会社内 (72)発明者 野田 純孝 愛知県西春日井郡西枇杷島町地領2丁目1 番地の1 株式会社フジミインコーポレー テッド内 ─────────────────────────────────────────────────── ─── Continuation of front page (72) Inventor Hiroshi Ishigure, 1-1 Asahi-cho, Kariya city, Aichi Toyota Koki Co., Ltd. Incorporated (72) Inventor Sumitaka Noda 1 at 2-1-1, Jyoryo, Nishibiwajima-cho, Nishikasugai-gun, Aichi Prefecture Within Fujimi Incorporated

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 真空引き穴を有する固定面に固設した硬
質の多気孔部材よりなるチャック面板上に工作物を載置
し、工作物周囲のチャック面板にシリコンゴムを塗布し
て真空引きする工程と、チャック面板より工作物を取り
外して前記塗布したシリコンゴムが硬化した後に前記シ
リコンゴム塗布面を含めてチャック面板の表面を砥石で
平坦研削する工程とから成る真空チヤック面の空気洩れ
防止方法。
1. A workpiece is placed on a chuck face plate composed of a hard multi-pore member fixed to a fixed surface having a vacuum suction hole, and silicon rubber is applied to the chuck face plate around the workpiece to perform vacuuming. A method for preventing air leakage of a vacuum chuck surface, which comprises the steps of: removing a workpiece from a chuck face plate, and flattening the surface of the chuck face plate including the silicon rubber coated face with a grind stone after the applied silicon rubber is cured. .
JP27340092A 1992-09-18 1992-09-18 Air leak prevention method for vacuum chuck surface Pending JPH0699329A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27340092A JPH0699329A (en) 1992-09-18 1992-09-18 Air leak prevention method for vacuum chuck surface

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27340092A JPH0699329A (en) 1992-09-18 1992-09-18 Air leak prevention method for vacuum chuck surface

Publications (1)

Publication Number Publication Date
JPH0699329A true JPH0699329A (en) 1994-04-12

Family

ID=17527372

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27340092A Pending JPH0699329A (en) 1992-09-18 1992-09-18 Air leak prevention method for vacuum chuck surface

Country Status (1)

Country Link
JP (1) JPH0699329A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005340324A (en) * 2004-05-25 2005-12-08 Disco Abrasive Syst Ltd Method of processing chuck table in processing apparatus
JP2005340592A (en) * 2004-05-28 2005-12-08 Disco Abrasive Syst Ltd Wafer processing device
JP2008060307A (en) * 2006-08-31 2008-03-13 Taiheiyo Cement Corp Vacuum suction device, and its manufacturing method
CN103639806A (en) * 2013-11-25 2014-03-19 上海现代先进超精密制造中心有限公司 Fixture and method for machining ultrathin aluminum sheet with complicated surface contour shape
JP2017100235A (en) * 2015-12-01 2017-06-08 株式会社ディスコ Lathe turning method using turning tool

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005340324A (en) * 2004-05-25 2005-12-08 Disco Abrasive Syst Ltd Method of processing chuck table in processing apparatus
JP2005340592A (en) * 2004-05-28 2005-12-08 Disco Abrasive Syst Ltd Wafer processing device
JP2008060307A (en) * 2006-08-31 2008-03-13 Taiheiyo Cement Corp Vacuum suction device, and its manufacturing method
JP4718397B2 (en) * 2006-08-31 2011-07-06 太平洋セメント株式会社 Manufacturing method of vacuum suction device
CN103639806A (en) * 2013-11-25 2014-03-19 上海现代先进超精密制造中心有限公司 Fixture and method for machining ultrathin aluminum sheet with complicated surface contour shape
JP2017100235A (en) * 2015-12-01 2017-06-08 株式会社ディスコ Lathe turning method using turning tool

Similar Documents

Publication Publication Date Title
US6866564B2 (en) Method of backgrinding wafers while leaving backgrinding tape on a chuck
US7708854B2 (en) Work carrier and method of processing a workpiece
US4597228A (en) Vacuum suction device
US6179956B1 (en) Method and apparatus for using across wafer back pressure differentials to influence the performance of chemical mechanical polishing
US6629876B1 (en) Apparatus for grinding wafers using a grind chuck having a high elastic modulus
US6077149A (en) Method and apparatus for surface-grinding of workpiece
DE10143938A1 (en) Polishing machine for semiconductor wafers includes two-chamber carrier system with membrane and openings in correspondence
WO2002103780A1 (en) Substrate table, production method therefor and plasma treating device
DE2712521A1 (en) PROCEDURE FOR FITTING DISCS
EP0786803A1 (en) Backing pad and method for polishing semiconductor wafer therewith
EP0761391B1 (en) Method for holding a workpiece by vacuum
US5079875A (en) Segmentee grinding wheel
JPH0699329A (en) Air leak prevention method for vacuum chuck surface
US20060019582A1 (en) Substrate removal from polishing tool
JPS62124844A (en) Vacuum attraction jig
US6344414B1 (en) Chemical-mechanical polishing system having a bi-material wafer backing film assembly
JPS6218362Y2 (en)
JP2001341042A (en) Vacuum chuck and method for manufacturing the same
JPH07214442A (en) Vacuum table
JPS5934143Y2 (en) Adsorption part of vacuum chuck
JPS61114813A (en) Cutting method
JP2006517351A5 (en)
JP3611029B2 (en) Semiconductor substrate polishing holding plate
JPH0675635U (en) Vacuum chuck device for wafer grinding machine
CN216029527U (en) Vacuum adsorption positioning device and numerical control equipment