JPH0698331A - Recognition device for pattern and shape of cloth - Google Patents

Abstract

PURPOSE:To easily detect a pattern and a shape of a cloth by controlling a lighting quantity so as to use a 2-dimension sensor to detect a 3-dimensional structure of the cloth. CONSTITUTION:A cloth 19 is placed at a prescribed position on a base plate 20, the luminous quantity of a lighting device 2 is set to a maximum level by lighting all light emitting segments, a camera 1 picks up the picture in this state, an A/D converter 11 applies A/D-conversion to the picture and the result is quantized and stored once in a picture memory 12. Then a processor 15 obtains a luminance distribution in which the brightness of each picture element is set to the X axis and the frequency of occurrence is set to the Y axis. The luminance distribution obtained in this case is concentrated to a portion where the luminance level is a maximum. Furthermore, the lighting quantity in this state is gradually decreased and the luminance distribution is similarly obtained. The luminance distribution in this case changes from that concentrating to the maximum level to that having a width, and then the lighting quantity level when the luminance distribution does not indicate any maximum is used for the lighting quantity level at the succeeding processing.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a pattern (pattern) of a cloth or the like to be recognized, its shape, or both of them (hereinafter, simply referred to as "fabric pattern (pattern), shape, etc."). A pattern such as cloth for recognizing
The present invention relates to a shape recognition device, and more particularly, to improvement of an illumination unit in the pattern / shape recognition device.

[0002]

2. Description of the Related Art Conventionally, in a pattern / shape recognizing device of this kind of cloth or the like, a detecting sensor has been used as a means for detecting the pattern (pattern) or shape of the cloth, and In addition, the pattern surface of the cloth, which is the detected area,
In order to facilitate the detection of the shaped surface, an illuminating means is arranged to illuminate the entire area so as to have a brightness as uniform as possible.

[0003]

However, in the conventional illumination means for detecting the pattern (shape) of the cloth as described above, the brightness of the entire detection area is made uniform. , For example, a pattern (pattern) is formed by the weave of the fabric (so-called structural pattern)
In the case of such a cloth, there is a disadvantage that the pattern (pattern) cannot be easily detected, and when detecting the shape of the cloth, the cloth and the cloth are not placed. Although the boundary between the base plate and the existing base plate will be detected, the brightness of the cloth and the base plate is almost the same, so the boundary part cannot be detected. There is a problem that so-called halation (light saturation phenomenon) occurs in a pattern (pattern) portion that is too bright, and it is difficult to detect the opposite pattern (pattern) that is too dark.

The present invention is intended to solve the above-mentioned conventional problems, and an object thereof is to use a two-dimensional sensor as a sensor for detecting the pattern (pattern), shape, etc. of the cloth. The two-dimensional sensor detects the three-dimensional structure of the fabric, so-called clear detection of the structural pattern,
The pattern of this kind of fabric, etc., which makes it possible to easily detect the pattern (shape), shape, etc. of the cloth at any brightness.
The object is to provide a shape recognition device.

[0005]

In order to achieve the above object, a pattern / shape recognizing device according to the present invention includes a illuminating means for illuminating an area to be detected such as a cloth. The irradiation light amount, the irradiation direction, or both of them can be arbitrarily controlled.

That is, the present invention is an apparatus for detecting and recognizing a pattern (pattern) in a detected region set on at least a part of a cloth or the like, or both of them, Illuminating means capable of arbitrarily controlling the irradiation light amount of illumination light for illuminating the detection area, and a pattern (pattern) in the detection area, or its shape, or both of them is used as a two-dimensional image. A pattern (pattern) in the detected area is formed by using at least one detection unit to be detected, a storage unit that quantizes and stores the image data detected by the detection unit, and the image data stored in the storage unit. ), Or its shape, or a computing means for recognizing both of them, or a pattern / shape recognizing device such as cloth. Also,
The present invention is a device for detecting and recognizing a pattern (pattern) in a detection area set in at least a part of a cloth or the like, or both of them, which is for the detection area. Illuminating means capable of arbitrarily controlling the irradiating direction of irradiating light for illuminating, and at least one for detecting a pattern (pattern) in the detected region, its shape, or both as a two-dimensional image. A pattern (pattern) in the detection area or its shape is formed by using the detection unit, the storage unit that quantizes and stores the image data detected by the detection unit, and the image data stored in the storage unit. , Or a pattern such as a cloth or the like, which is provided with an arithmetic means for recognizing both of them.
It is a shape recognition device. Furthermore, the present invention is a device for detecting and recognizing a pattern (pattern) in a detection area set in at least a part of a cloth or the like, or both of them, The illumination means for controlling the irradiation light amount and the irradiation direction of the irradiation light for illuminating the area, and the pattern (pattern) in the detection area, its shape, or both of them are two-dimensional. At least 1 detected as an image
One detecting means, a storing means for quantizing and storing the image data detected by the detecting means, and an image data stored in the storing means are used to design a pattern (pattern) in the detected area, or a pattern thereof. A pattern / shape recognizing device for a cloth or the like, which is provided with a calculating means for recognizing the shape or both of them.

[0007]

Therefore, in the pattern / shape recognizing device according to the present invention, the illuminating means for illuminating an area to be detected such as the fabric can control the irradiation light amount of the irradiation light for the illumination. , It is possible to prevent halation (saturation phenomenon of light) in the detected area, and by this, it is possible to illuminate with the irradiation light amount under the condition that is the easiest to detect corresponding to the mode of the detected area, and illuminate the detected area Since it is possible to control the irradiation direction of the irradiating light, a shadow is generated in a portion where the three-dimensional structure in the detected area changes, and by detecting the shadow, a structural pattern such as a cloth,
The shape of the cloth or the like on the base plate can be detected and recognized.

[0008]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of a pattern / shape recognizing device according to the present invention will be described below in detail with reference to FIGS. FIG. 1 is a configuration explanatory view showing an outline of a pattern / shape recognition device such as a cloth to which the present embodiment is applied, and FIGS. 2 (a) and 2 (b) show an outline configuration of a lighting device used in the present embodiment device. It is a side view shown and a bottom view as an illumination surface.

In the device configurations shown in FIGS. 1 and 2,
Reference numeral 1 denotes a sensor for detecting the pattern (pattern) and shape of the cloth as a two-dimensional image. Here, the pattern (pattern) and shape of the cloth are imaged as a two-dimensional image, and the captured analog data. Is an imaging camera that outputs Reference numeral 2 denotes an illuminating device for illuminating a pattern (pattern) surface, a shape surface, or the like of the cloth as the detection area, which is equiangularly spaced so as to surround the image pickup unit 1a of the image pickup camera 1. And each light emitting segment 3 to 10 composed of a thin plate light emitting element or the like arranged downward, and the light emitting control of each of these light emitting segments 3 to 10 is possible individually. .

Reference numeral 11 is an A / D converter for converting analog data of the captured image output from the image capturing camera 1 into digital data, and 12 is a digital image of the captured image output from the A / D converter 11. An image memory that quantizes and stores data. Reference numeral 13 is a light emission amount control device for controlling the brightness (light emission amount) in the lighting device 2, and 14
Is a light emitting direction control device for similarly controlling the light emitting direction.
Reference numeral 15 uses the digital data of the captured image stored in the image memory 12 to recognize the pattern (shape) and the shape of the cloth, and calculates the control amount such as the light emission amount and the light emission direction in the lighting device 2. The processors 16, 16 and 17 are a RAM used for reading, writing, and reading data in the processor 15, and a ROM for storing programs and the like. Reference numeral 18 denotes a drive circuit which is controlled by the light emission amount control device 13 and the light emission direction control device 14 to drive the lighting device 2.

Further, reference numeral 19 denotes a cloth as an object to be recognized, and 20 is a base plate on which the cloth 19 is placed.

Next, FIGS. 3 (a) and 3 (b) to FIGS. 6 (a) and 6 (b)
FIG. 4 is a diagram showing the detection of a pattern (pattern) of a cloth, particularly in this case, a principle of detecting a structural pattern.

Here, in FIG. 3 (a), the structural pattern in the detected region 19a of the cloth 19 is represented by a cross-hatched portion and a white background portion. In the case of the structural pattern, the cross-hatched portion is a white background. In addition to showing that it is woven somewhat higher than the portion, the irradiation direction of the illumination light using the illuminating device 2 with respect to the detection area 19a is indicated by the arrow (1) from the vertical direction. (2) shows the cases from the left diagonal direction, and arrow (3) shows the cases from the right diagonal direction. In FIG.
The concept of each cross-sectional aspect along the line AA, BB, CC in FIG.

4 (a) and 4 (b) show the projection of the detected area 19a when it is imaged by the camera 1 when the detected area 19a is illuminated from the vertical (directly above) direction of the arrow (1). The distribution state and the detected waveform obtained by this are shown respectively. Similarly, in FIGS. 5 (a) and 5 (b), similarly, the projection distribution of the case of irradiation from the left oblique direction of the arrow (2) is shown. The state and the detected waveform are shown respectively.
Similarly, FIGS. 6A and 6B respectively show the state of the projection distribution and the detection waveform when the irradiation is performed from the right oblique direction of the arrow (3).

That is, as shown in FIG. 3 (a), the vertical direction with respect to the detected area 19a of the cloth 19
When the illumination light from (1) is irradiated, as described above, in this case, the overall brightness in the detection region 19a becomes substantially constant. As can be seen, there is almost no difference in the weaving height due to the structural pattern in the detected region 19a, so the detected waveform obtained at this time is almost flat as shown in FIG. 4 (b). Become.

On the other hand, as shown in FIG. 3 (a), with respect to the detected area 19a of the cloth 19, a diagonal direction to the left
When the illumination light from (2) is irradiated, in this case, as shown in FIG. 5 (a), on the right side of the cross-hatched portion where the weaving height in the detection area 19a is increased. As a result, a shadow corresponding to the height difference from the white background appears, and as a result, a detection waveform clearly identifying the structural pattern can be obtained as shown in FIG. 5 (b).

Similarly, as shown in FIG. 3 (a),
Diagonally to the right of the detected area 19a of the cloth 19 (3)
In this case, the illumination light from FIG.
As shown in (a), a shadow corresponding to the difference in height from the white background appears on the left side of the cross-hatched portion where the weaving height in the detected area 19a is increased. As a result, as shown in FIG. 6 (b), a detected waveform in which the structural pattern is clearly identified can be obtained.

Next, FIGS. 7 (a), (b), and (c) are diagrams showing the principle of detecting the shape of the cloth.

Here, in FIG. 7 (a), the shape portion in the detection area 19b of the cloth 19 placed on the base plate 20 and the illumination of the detection area 19b using the illumination device 2 are shown. The irradiation direction of the light, in this case, the boundary part of the detected region 19b is on the right side, and therefore the irradiation is performed from the diagonal left direction as shown by the arrow (4). ) Shows the concept of the cross-sectional aspect of the DD line portion in the detection area 19b, and further, FIG. 7 (c) shows an image picked up by the camera 1 with the detection area 19b illuminated from the left oblique direction. The detected waveform obtained by the above is shown.

That is, as shown in FIG. 7 (a), with respect to the detected area 19b of the cloth 19, a diagonal direction to the left
When the illumination light from (4) is irradiated, a shadow is generated on the base plate 20 on the right side of the cloth 19 at the boundary between the two, and the shape of the detected region 19b of the cloth 19 is clearly identified. The waveform is obtained.

Next, the operation of the device for recognizing the pattern / shape of the cloth according to the present embodiment having the above-described structure, particularly the operation for identifying the structural pattern in the detected region 19b of the cloth 19, will be described with reference to the flowchart of FIG. .

The pattern / shape recognizing apparatus according to this embodiment starts its operation in step S1 with the material 19 to be recognized placed and held at a predetermined position on the base plate 20. That is, in step S2, various initial settings of the apparatus are performed, and in step S3, the illumination light amount is adjusted.

In the process of adjusting the amount of illumination light in step S3, first, all the light emitting segments 3 to 10 of the illumination device 2 are turned on to set the amount of light to the maximum, and in this state, An image is captured and captured by the camera 1, the output of the camera 1 is A / D converted and quantized by the A / D converter 11, and the output is temporarily stored in the image memory 12 as image data.

Then, in the processor 15, the brightness (luminance level) of each pixel is adjusted for the image data as shown in the adjustment procedure of FIGS. 9 (a), (b), and (c). The horizontal axis is the horizontal axis and the frequency of occurrence is the vertical axis. That is, in this case, since the minimum illumination light amount is the maximum, the captured image has halation (a light saturation phenomenon),
The luminance distribution obtained at this time is concentrated at the maximum luminance level, as shown in FIG. Further, in this state, the amount of illumination light is gradually reduced, and the luminance distribution is obtained in the same manner.
Change from (b) to (c). Then, as shown in FIG. 9 (c),
The light amount level when there is no maximum brightness level is adopted as the light amount level in the subsequent processing. That is, the adjustment of the illumination light amount here is completed in this way.

Subsequently, the process proceeds to the illumination direction control process of step S4 and thereafter. The control of the illumination direction is performed by changing the lighting pattern of each of the light emitting segments 3 to 10 which form the lighting device 2, and each lighting pattern is stored and set in the ROM 17 in advance, and will be described later. Similarly, the value of the level required to determine the peak in each detected waveform
The OM 17 is stored and set.

Here, the lighting pattern in this embodiment is, for example, the light emitting segments 3 to 1 in the first stage.
A total of 0 (N times) lighting patterns, such as a lighting pattern that lights all 0, a lighting pattern that lights only the light emitting segment 3 in the second step, and a lighting pattern that lights only the light emitting segment 4 in the third step. The lighting pattern of R
It is assumed that the program is set in the OM 17 and stored.

Then, in this case, first, based on the set program, the lighting pattern in the first stage is read from the ROM 17, each of the light emitting segments 3 to 10 is lit according to the lighting pattern, and then the step S5 is performed.
Then, in step S5, as described above,
By the camera 1, the cloth 1 as a corresponding object to be recognized
The image of the detected region 19b in 9 is captured and captured, and the output is A / D converted by the A / D converter 11,
In addition to storing the image data in the image memory 12,
In step S6, the respective projection distributions, that is, FIG. 4 (a) and FIG.
(a), Obtain each projection distribution data as shown in FIG. 6 (a). Note that in this processing operation, the projection distribution of the arrow (1) from the vertical direction is included, and the left diagonal direction of the arrow (2),
Obtain each projection distribution data from the right diagonal direction of the arrow (3),
As a result, finally, the detected area 19 of the cloth 19 is detected.
When detecting the structural pattern in a, that is, in other words, each projection distribution data on one X direction side (one-dimensional direction side) including immediately above in each direction is obtained, and finally each respective Although the detection waveform is obtained, the same applies to the respective projection distribution data on both sides orthogonal to the arrows (2) and (3), that is, on the other Y-direction side (two-dimensional direction side). Each detection waveform is obtained to obtain each detection waveform, and the description thereof is omitted here to avoid complication of the description. Further, although it is not directly related to this processing operation, The same applies to the detection of the shape in the detection area 19b.

Then, after that, the process proceeds to step S7, and each projection distribution data obtained previously is analyzed by the processor 15, so that FIG. 4 (b), FIG. 5 (b), FIG. 7 (c)) according to the above, it is judged whether or not the peak of each detected waveform appears, and if the peak value of each detected waveform is above a certain level, the target fabric is obtained. It is assumed that the structural pattern in the detected area 19a of 19 (or similarly, the shape in the detected area 19b of the cloth 19) is detected, the process proceeds to step S9, and the structural pattern in the detected area 19a of the cloth 19 (or , The shape of the cloth 19 in the detected region 19b) is ended.

Thus, in step S7, the detected waveform obtained from the projection distribution data is, for example, as shown in FIG.
If the pattern is as shown in (b) and no peak appears, the process proceeds to step S8. Then, in step S8, it is determined whether or not the lighting pattern of each of the light emitting segments 3 to 10 in the lighting device 2 at that time is the N-th (N-th) lighting pattern, and this is the N-th (N-th) lighting pattern. If the lighting pattern is, step S
Moving to 10, the structural pattern (or the detected area 19b of the cloth 19) in the detected area 19a of the cloth 19 is assumed to be one in which the structural pattern (or shape) could not be detected.
Shape), and if this is not the Nth (Nth) lighting pattern, the process returns to step S4 to read the lighting pattern at the next relevant stage from the ROM 17, and Nth operation (Nth time)
Iterate until it reaches. That is,
In this way, control of the lighting direction here, and by extension,
From each projection distribution and each detection waveform based on each projection distribution, the target detection area 19a of the cloth 19 is obtained.
Structure pattern (or the detection area 19 of the cloth 19)
The shape of b) can be effectively recognized.

Further, the illumination device 2 in this embodiment is not limited to the configuration shown in FIG. 2, and for example, the configuration shown in FIG. 10 or FIGS. The configuration shown in b) can be used.

The configuration of the illumination device 2 shown in FIG. 10 is the same as the configuration of the illumination device 2 shown in FIG.
b to 10a, 10b), this configuration can increase the lighting pattern of the illumination and control the angle of the illumination. In this case, the light emitting segments 3a, 3 corresponding to the additional lights to be turned on
As the positions of b to 10a and 10b move away from the camera 1 as the detection sensor, the amount of illumination light reaching the image pickup point of the camera 1 is reduced.
Such a decrease in the amount of illumination light can be eliminated by correcting the amount of illumination light on the drive circuit 18 side in advance for each additional segment position.

11 (a) and 11 (b) is another example of the illuminating light amount correcting means in the illuminating device 2 shown in FIG.
0 is added to the outer circumference in the radial direction (3a, 3b, 3c or 1
0a, 10b, 10c), and each of the light emitting segments 3a, 3b, 3c to 10a, 10 corresponding to the extension.
The positions of b and 10c should be equidistant or nearly equidistant from the imaging point of the camera 1 as the detection sensor.
It is arranged on the inner surface of the holding member 21 having an arc shape. In this configuration, all the light emitting segments 3a, 3
It is possible to maintain the amount of light reaching the imaging point evenly or substantially evenly depending on the arrangement positions of b, 3c to 10a, 10b, 10c.

Further, in addition to the above-mentioned respective embodiments, FIG.
As shown in (a) and (b), by purely mechanical means,
The illumination direction can be controlled by the illumination device 2.

Here, FIG. 12 (a) is a side view schematically showing a schematic structure of the lighting device 22 by the mechanical lighting direction control, and FIG. 12 (b) is a plan view of the same device 22. Is.

That is, in FIGS. 12 (a) and 12 (b), the mechanical illuminating device 22 has a pulse motor 23 arranged on the upper coaxial line of the camera 1 and is controlled by the pulse motor 23. With respect to the supporting body 24, one set of uniform light projecting lamps 26, 26 is held using the arms 25, 25 toward the imaging point, respectively. By the controlled rotation of the pulse motor 23, as shown by the arrow, it is possible to illuminate the detected region 19a from the entire circumferential direction with a uniform light amount.

Next, FIG. 13 (a) is an example of the structural pattern of the cloth identified by the pattern / shape recognizing device for the cloth according to the present invention. Here, the pattern (pattern) is adjusted by adjusting the illumination light.
FIG. 2 is a schematic plan view substantially showing an example of a structural pattern in which the fabric is visible or invisible, that is, a so-called “blind grid”. Illumination light from a direction perpendicular to (directly above) the structural pattern of the fabric. Fig. 13 (b) shows the actual projection distribution when illuminating, and similarly, the projection distribution when illuminating the structural pattern of the fabric with the illumination light from the right diagonal direction is the same. It becomes like FIG.13 (c). That is, as is clear from these FIGS. 13 (b) and 13 (c), when comparing with the projection distribution in (b), the projection distribution in (c) is
It appears as a clear pattern (pattern), and it is more clear that the operation and effect of the apparatus of this embodiment are excellent.

Although the present embodiment has been described above focusing on the case of recognizing the pattern / shape of the cloth, it is needless to say that the present invention can be applied to recognition of the pattern / shape other than the cloth. The configuration of each unit in the example can also be modified and embodied arbitrarily within the scope not departing from the gist of the present invention.

[0038]

As described above in detail, according to the pattern / shape recognizing device for cloth or the like according to the present invention, the pattern (pattern) in the detected area set on at least a part of the cloth,
Alternatively, in a device for detecting and recognizing the shape or both of them, and an illuminating means capable of arbitrarily controlling the irradiation light amount and / or the irradiation direction of the irradiation light for illuminating the detection area. , At least one detecting means for detecting a pattern in the detected region, its shape, or both as a two-dimensional image, and storage means for quantizing and storing the image data detected by the detecting means. And a calculation means for recognizing a pattern (pattern) in the detection area, or its shape, or both of them by using the image data stored in the storage means, and in particular, a detected object such as cloth is detected. Since the amount of irradiation light for illuminating the area can be controlled, halation (light saturation phenomenon) in the detection area can be improved. It is possible to stop, and it is possible to easily secure the illumination by the irradiation light amount under the condition that is the most easy to detect corresponding to the mode of the detection area, and similarly, the irradiation direction of the irradiation light for illuminating the detection area. Since it is possible to control, it is possible to generate a shadow in a changed portion of the three-dimensional structure in the detected region, and by detecting the shadow, a structural pattern such as a cloth that is usually extremely difficult to detect,
It has the excellent feature of being able to effectively detect and recognize the shape of the material on the base plate.

[Brief description of drawings]

FIG. 1 is a configuration explanatory view showing an outline to which an embodiment of a pattern / shape recognition device according to the present invention is applied.

FIG. 2A is a side view showing the configuration of a lighting device applied to the device of this embodiment. (b) is a bottom view as an illumination surface in the same illumination device.

[Fig. 3] (a) is a pattern (pattern) of a cloth using the device of this embodiment.
Detection, in particular, the pattern of the structural pattern in the detection area of the cloth is shown by the cross-hatched portion and the white background portion, and the vertical, left oblique, and right oblique irradiation directions of the illumination light to the detection area are separately shown. FIG. (b) is a cross-sectional explanatory view showing the concept of each cross-sectional aspect in the AA, BB, CC line portion in the detection area.

FIG. 4A is a projection distribution diagram in the case where a detection area is illuminated from the vertical direction. (b) is a detection waveform diagram same as above.

FIG. 5A is a projection distribution diagram in the case where an area to be detected is illuminated from an oblique left direction. (b) is a detection waveform diagram same as above.

FIG. 6 (a) is a projection distribution diagram in the case where the detection area is illuminated from the right oblique direction. (b) is a detection waveform diagram same as above.

FIG. 7A is an explanatory diagram showing a shape portion in a detected area of the cloth and showing a left oblique irradiation direction of illumination light with respect to the detected area. (b) is a sectional explanatory view showing a mode of a section at a DD line portion in the detection region.
(c) is a detection waveform diagram same as above.

FIG. 8 is a flowchart showing a flow of recognition processing in the pattern / shape recognition device according to the embodiment of the present invention.

9A, 9B, and 9C are explanatory views sequentially showing the procedure for adjusting the illumination light amount in this embodiment.

FIG. 10 is a bottom view as an illumination surface showing a modification of the illumination device according to the embodiment of the present invention.

FIG. 11A is a side view showing another modified example of the lighting device according to the embodiment of the present invention. (b) is a bottom view as an illumination surface in the same illumination device.

FIG. 12A is a side view schematically showing a schematic configuration of a lighting device by mechanical lighting direction control according to another embodiment of the present invention. (b) is a plan view of the same lighting device.

FIG. 13 (a) is a schematic plan view showing an example of the structural pattern of the cloth identified by the pattern / shape recognition device according to the present invention. (b) Vertical direction (directly above) to the structural pattern of the same fabric
It is explanatory drawing which shows the projection distribution when illuminating from. (c)
FIG. 5 is an explanatory diagram showing a projection distribution when the structural pattern of the same fabric is illuminated from the right oblique direction.

[Explanation of symbols]

DESCRIPTION OF SYMBOLS 1 sensor (camera for image pickup) 1a image pickup part 2,22 illumination device 3,3a, 3b, 3c-10, 10a, 10b, 10c
Light emitting segment (thin plate light emitting element, etc.) 11 A / D converter 12 Image memory 13 Light emission amount control device 14 Light emission direction control device 15 Processor 16 RAM 17 ROM 18 Drive circuit 19 Fabric as recognition target 19a Detection area 20 Base plate 21 arc-shaped holding member 23 pulse motor 24 support 25 arm 26 floodlight

 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Hirosumi Ito 15-1 Naeshiro-cho, Mizuho-ku, Nagoya City Brother Industries, Ltd.

Claims (3)

[Claims] 1. A device for detecting and recognizing a pattern (pattern) in a detected area set on at least a part of cloth or the like, or both of them, which is used for illuminating the detected area. Illumination means capable of arbitrarily controlling the irradiation light amount of the irradiation light, and at least one detection means for detecting a pattern (pattern) in the detection region, its shape, or both as a two-dimensional image And a storage means for quantizing and storing the image data detected by the detection means, and a pattern (pattern) in the detection area using the image data stored in the storage means.
A device for recognizing a pattern or shape of a cloth or the like, which is provided with an arithmetic means for recognizing the shape or both of them. 2. An apparatus for recognizing a pattern (pattern) in a detection area set on at least a part of a cloth or the like, or both of them, which is an irradiation for illuminating the detection area. Illuminating means capable of arbitrarily controlling the irradiation direction of light, at least one detecting means for detecting a pattern (pattern) in the detected region, its shape, or both as a two-dimensional image, A storage unit that quantizes and stores the image data detected by the detection unit, and a pattern (pattern) in the detected region, or its shape, or both by using the image data stored in the storage unit. An apparatus for recognizing a pattern or shape of a cloth or the like, which is provided with a calculation means for recognizing 3. An apparatus for recognizing a pattern (pattern) in a detection area set on at least a part of a cloth or the like, or both of them, and irradiating the detection area for illumination. Illuminating means capable of arbitrarily controlling the irradiation light amount and the irradiation direction of the light, and at least one for detecting a pattern (pattern) in the detection region, its shape, or both as a two-dimensional image. A pattern (pattern) in the detection area or its shape is formed by using the detection unit, the storage unit that quantizes and stores the image data detected by the detection unit, and the image data stored in the storage unit. Or, a device for recognizing a pattern or shape of a cloth or the like, which is provided with an arithmetic means for recognizing both of them.