JPH0697323A - Semiconductor integrated circuit device - Google Patents

Semiconductor integrated circuit device

Info

Publication number
JPH0697323A
JPH0697323A JP4245384A JP24538492A JPH0697323A JP H0697323 A JPH0697323 A JP H0697323A JP 4245384 A JP4245384 A JP 4245384A JP 24538492 A JP24538492 A JP 24538492A JP H0697323 A JPH0697323 A JP H0697323A
Authority
JP
Japan
Prior art keywords
heat
package
heat dissipation
die pad
resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4245384A
Other languages
Japanese (ja)
Inventor
Kenichi Takebe
堅一 建部
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Renesas Semiconductor Package and Test Solutions Co Ltd
Original Assignee
Hitachi Hokkai Semiconductor Ltd
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Hokkai Semiconductor Ltd, Hitachi Ltd filed Critical Hitachi Hokkai Semiconductor Ltd
Priority to JP4245384A priority Critical patent/JPH0697323A/en
Publication of JPH0697323A publication Critical patent/JPH0697323A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/45099Material
    • H01L2224/451Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/45138Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/45144Gold (Au) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48247Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation

Abstract

PURPOSE:To improve the heat radiability of a resin-sealed type LSI package without moisture resistance lowered. CONSTITUTION:This device is a resin-sealed type LSI package 1 in which a through-hole 7 is provided in the rear of a die pad 6 on which a semiconductor chip 5 is mounted, and the through-hole 7 is filled up with liquid or gel heat radiating materials, and at the same time a heat radiator 3 is bonded in the bottom of the body 2 of the package.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、半導体集積回路装置に
関し、特に、半導体チップを封止するLSIパッケージ
の放熱性の改善に適用して有効な技術に関するものであ
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor integrated circuit device, and more particularly to a technique effectively applied to improve heat dissipation of an LSI package for sealing a semiconductor chip.

【0002】[0002]

【従来の技術】近年、QFP(Quad Flat Package) など
の樹脂封止型LSIパッケージは、LSIの高集積化、
高速化に伴って半導体チップの発熱量が増大しているた
め、放熱性の改善が重要な課題となっている。
2. Description of the Related Art In recent years, resin-sealed LSI packages such as QFP (Quad Flat Package) have been developed for higher integration of LSI.
Since the heat generation amount of the semiconductor chip is increasing with the increase in speed, improvement of heat dissipation is an important issue.

【0003】このような放熱性改善対策の一つに、パッ
ケージ本体の底面に金属製の放熱板を接合するものがあ
る。これは、半導体チップを搭載したダイパッドの裏面
に放熱板を貼り付けてその裏面をパッケージ本体の底面
に露出させ、この放熱板とダイパッドとを通じて半導体
チップの熱を外部に逃がすようにしたものである。
One of such measures for improving heat dissipation is to join a metal heat dissipation plate to the bottom surface of the package body. In this, a heat sink is attached to the back surface of a die pad on which a semiconductor chip is mounted, the back surface is exposed on the bottom surface of the package body, and the heat of the semiconductor chip is released to the outside through the heat sink and the die pad. .

【0004】[0004]

【発明が解決しようとする課題】しかしながら、パッケ
ージ本体の底面に金属製の放熱板を接合する前記従来技
術は、パッケージ本体と放熱板との界面剥離などに起因
してパッケージ本体の底面から水分が内部に浸入し易
く、信頼性に問題があった。
However, in the above-mentioned prior art in which a metal heat sink is joined to the bottom surface of the package body, moisture is removed from the bottom surface of the package body due to interface separation between the package body and the heat sink. It was easy to get inside and there was a problem with reliability.

【0005】そこで、本発明の目的は、樹脂封止型LS
Iパッケージの耐湿性を低下させることなく、放熱性を
向上させることのできる技術を提供することにある。
Therefore, an object of the present invention is to provide a resin-sealed LS.
It is an object of the present invention to provide a technique capable of improving heat dissipation without lowering the moisture resistance of the I package.

【0006】本発明の前記ならびにその他の目的と新規
な特徴は、本明細書の記述および添付図面から明らかに
なるであろう。
The above and other objects and novel features of the present invention will be apparent from the description of this specification and the accompanying drawings.

【0007】[0007]

【課題を解決するための手段】本願において開示される
発明のうち、代表的なものの概要を簡単に説明すれば、
次のとおりである。
Among the inventions disclosed in the present application, a brief description will be given to the outline of typical ones.
It is as follows.

【0008】本発明の樹脂封止型LSIパッケージは、
半導体チップを搭載したダイパッドの裏面に貫通孔を設
けて該貫通孔内に液状ないしゲル状の放熱材を充填する
と共に、パッケージ本体の底面に放熱板を接合したもの
である。
The resin-sealed LSI package of the present invention is
A through hole is provided in the back surface of a die pad on which a semiconductor chip is mounted, a liquid or gel heat radiating material is filled in the through hole, and a heat radiating plate is joined to the bottom surface of the package body.

【0009】[0009]

【作用】上記した手段によれば、半導体チップの熱をダ
イパッド、放熱材および放熱板を通じて外部に逃がすこ
とができるので、放熱性の高い樹脂封止型LSIパッケ
ージを提供することができる。
According to the above-mentioned means, the heat of the semiconductor chip can be released to the outside through the die pad, the heat radiating member and the heat radiating plate, so that the resin-sealed LSI package having high heat radiating property can be provided.

【0010】また、ダイパッドと放熱板との間に放熱材
を充填した貫通孔を設けたことにより、パッケージ本体
底面からの水分の浸入経路が長くなり、耐湿性の低下が
防止される。
Further, since the through hole filled with the heat radiation material is provided between the die pad and the heat radiation plate, the moisture infiltration path from the bottom surface of the package body is lengthened, and the deterioration of the moisture resistance is prevented.

【0011】[0011]

【実施例】以下、本発明の一実施例である樹脂封止型L
SIパッケージの構成を図1を用いて説明する。
EXAMPLE A resin-sealed type L which is an example of the present invention will be described below.
The configuration of the SI package will be described with reference to FIG.

【0012】本実施例の樹脂封止型LSIパッケージ1
は、合成樹脂の成型体からなるパッケージ本体2の底面
に放熱板3が接着剤4により接合されている。半導体チ
ップ5を搭載したダイパッド6の裏面には、貫通孔7が
設けられており、この貫通孔7内には、ゲル状の放熱材
8が充填されている。半導体チップ5の電極パッド9と
リード10との間には、Auのワイヤ11がボンディン
グされている。
Resin-sealed LSI package 1 of this embodiment
The heat dissipation plate 3 is bonded to the bottom surface of the package body 2 made of a synthetic resin molded body with an adhesive 4. A through hole 7 is provided on the back surface of the die pad 6 on which the semiconductor chip 5 is mounted, and the through hole 7 is filled with a gel-like heat dissipation material 8. An Au wire 11 is bonded between the electrode pad 9 and the lead 10 of the semiconductor chip 5.

【0013】上記放熱板3、ダイパッド6およびリード
10は、Cuなどの高熱伝導性金属で構成されている。
また、貫通孔7内の放熱材8は、Cu、Alなどの高熱
伝導性金属粉末を混入したシリコーンゲルで構成されて
いる。なお、放熱材8は、熱伝導性が良く、吸湿性の低
い液状ないしゲル状の物質であれば、金属粉末を混入し
たシリコーンゲルに限定されるものではない。
The heat radiating plate 3, the die pad 6 and the leads 10 are made of high heat conductive metal such as Cu.
Further, the heat dissipation material 8 in the through hole 7 is made of silicone gel mixed with highly heat conductive metal powder such as Cu and Al. The heat dissipating material 8 is not limited to silicone gel mixed with metal powder as long as it is a liquid or gel substance having good thermal conductivity and low hygroscopicity.

【0014】上記LSIパッケージ1を組み立てるに
は、常法によりダイパッド6上にAgペーストなどを用
いて半導体チップ5を接合した後、電極パッド9とリー
ド10との間にワイヤ11をボンディングし、続いてト
ランスファモールドによりパッケージ本体2を成形す
る。ダイパッド6の裏面の貫通孔7は、このとき同時に
形成する。その後、貫通孔7内に放熱材8を充填した
後、パッケージ本体2の底面に放熱板3を接合する。
To assemble the LSI package 1, the semiconductor chip 5 is bonded onto the die pad 6 using Ag paste or the like by a conventional method, and then the wire 11 is bonded between the electrode pad 9 and the lead 10. And the package body 2 is molded by transfer molding. The through holes 7 on the back surface of the die pad 6 are simultaneously formed at this time. After that, after filling the through hole 7 with the heat dissipation material 8, the heat dissipation plate 3 is bonded to the bottom surface of the package body 2.

【0015】上記のように構成された本実施例によれ
ば、半導体チップ5の熱をダイパッド6、放熱材8およ
び放熱板3を通じて外部に逃がすことができるので、放
熱性の高い樹脂封止型LSIパッケージ1を提供するこ
とができる。
According to the present embodiment configured as described above, the heat of the semiconductor chip 5 can be released to the outside through the die pad 6, the heat radiating material 8 and the heat radiating plate 3. The LSI package 1 can be provided.

【0016】また、ダイパッド6と放熱板3との間に放
熱材8を充填した貫通孔7を設けたことにより、ダイパ
ッドの裏面に放熱板を直接接合する従来技術に比べてパ
ッケージ本体2底面からの水分の浸入経路が長くなるた
め、耐湿性の低下が防止され、信頼性の高い樹脂封止型
LSIパッケージ1を提供することができる。
Further, since the through hole 7 filled with the heat dissipation material 8 is provided between the die pad 6 and the heat dissipation plate 3, as compared with the conventional technique in which the heat dissipation plate is directly bonded to the back surface of the die pad, Since the moisture infiltration path becomes long, it is possible to provide the highly reliable resin-sealed LSI package 1 in which the moisture resistance is prevented from being deteriorated.

【0017】さらに、LSIパッケージ1を半田リフロ
ーによって基板に実装する際の熱ストレスなどに起因す
る応力を貫通孔7内に充填したゲル状の放熱材8が吸収
するので、パッケージクラック耐性の向上した樹脂封止
型LSIパッケージ1を提供することができる。
Further, the gel-shaped heat radiating material 8 filled in the through holes 7 absorbs the stress caused by the thermal stress when the LSI package 1 is mounted on the substrate by the solder reflow, so that the package crack resistance is improved. It is possible to provide the resin-sealed LSI package 1.

【0018】以上、本発明者によってなされた発明を実
施例に基づき具体的に説明したが、本発明は前記実施例
に限定されるものではなく、その要旨を逸脱しない範囲
で種々変更可能であることはいうまでもない。
Although the invention made by the present inventor has been specifically described based on the embodiments, the present invention is not limited to the embodiments and various modifications can be made without departing from the gist thereof. Needless to say.

【0019】[0019]

【発明の効果】本願によって開示される発明のうち、代
表的なものによって得られる効果を簡単に説明すれば、
以下の通りである。
The effects obtained by the typical ones of the inventions disclosed in this application will be briefly described as follows.
It is as follows.

【0020】半導体チップを搭載したダイパッドの裏面
に貫通孔を設けて該貫通孔内に液状ないしゲル状の放熱
材を充填すると共に、パッケージ本体の底面に放熱板を
接合したことにより、樹脂封止型LSIパッケージの耐
湿性を低下させることなく、放熱性を向上させることが
できる。
By forming a through hole in the back surface of the die pad on which the semiconductor chip is mounted, filling the through hole with a liquid or gel heat radiating material, and by bonding a heat radiating plate to the bottom surface of the package body, resin sealing is performed. The heat dissipation can be improved without lowering the moisture resistance of the die LSI package.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例であるLSIパッケージを示
す断面図である。
FIG. 1 is a cross-sectional view showing an LSI package that is an embodiment of the present invention.

【符号の説明】[Explanation of symbols]

1 樹脂封止型LSIパッケージ 2 パッケージ本体 3 放熱板 4 接着剤 5 半導体チップ 6 ダイパッド 7 貫通孔 8 放熱材 9 電極パッド 10 リード 11 ワイヤ 1 Resin Sealed LSI Package 2 Package Body 3 Heat Sink 4 Adhesive 5 Semiconductor Chip 6 Die Pad 7 Through Hole 8 Heat Dissipator 9 Electrode Pad 10 Lead 11 Wire

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.5 識別記号 庁内整理番号 FI 技術表示箇所 H01L 23/36 H01L 23/36 C ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 5 Identification code Internal reference number FI Technical indication H01L 23/36 H01L 23/36 C

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 半導体チップを搭載したダイパッドの裏
面に設けた貫通孔内に液状ないしゲル状の放熱材を充填
すると共に、パッケージ本体の底面に放熱板を接合した
ことを特徴とする半導体集積回路装置。
1. A semiconductor integrated circuit characterized in that a through hole provided on the back surface of a die pad on which a semiconductor chip is mounted is filled with a liquid or gel heat dissipation material, and a heat dissipation plate is bonded to the bottom surface of the package body. apparatus.
【請求項2】 前記放熱材は、金属粉末を混入したシリ
コーンゲルであることを特徴とする請求項1記載の半導
体集積回路装置。
2. The semiconductor integrated circuit device according to claim 1, wherein the heat dissipation material is a silicone gel mixed with metal powder.
【請求項3】 前記ダイパッドおよび放熱板がCuから
なることを特徴とする請求項1または2記載の半導体集
積回路装置。
3. The semiconductor integrated circuit device according to claim 1, wherein the die pad and the heat dissipation plate are made of Cu.
JP4245384A 1992-09-16 1992-09-16 Semiconductor integrated circuit device Pending JPH0697323A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4245384A JPH0697323A (en) 1992-09-16 1992-09-16 Semiconductor integrated circuit device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4245384A JPH0697323A (en) 1992-09-16 1992-09-16 Semiconductor integrated circuit device

Publications (1)

Publication Number Publication Date
JPH0697323A true JPH0697323A (en) 1994-04-08

Family

ID=17132861

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4245384A Pending JPH0697323A (en) 1992-09-16 1992-09-16 Semiconductor integrated circuit device

Country Status (1)

Country Link
JP (1) JPH0697323A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7187063B2 (en) 2002-07-29 2007-03-06 Yamaha Corporation Manufacturing method for magnetic sensor and lead frame therefor
WO2007138681A1 (en) * 2006-05-30 2007-12-06 Kokusan Denki Co., Ltd. Resin-sealed semiconductor device and electronic device using such semiconductor device

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7187063B2 (en) 2002-07-29 2007-03-06 Yamaha Corporation Manufacturing method for magnetic sensor and lead frame therefor
CN100346168C (en) * 2002-07-29 2007-10-31 雅马哈株式会社 Magnetic sensor producing method and lead wire frame
US7494838B2 (en) 2002-07-29 2009-02-24 Yamaha Corporation Manufacturing method for magnetic sensor and lead frame therefor
US7541665B2 (en) 2002-07-29 2009-06-02 Yamaha Corporation Lead frame for a magnetic sensor
US8138757B2 (en) 2002-07-29 2012-03-20 Yamaha Corporation Manufacturing method for magnetic sensor and lead frame therefor
WO2007138681A1 (en) * 2006-05-30 2007-12-06 Kokusan Denki Co., Ltd. Resin-sealed semiconductor device and electronic device using such semiconductor device
US7868451B2 (en) 2006-05-30 2011-01-11 Kokusan Denki Co. Ltd. Resin sealing semiconductor device and electronic device using resin sealing semiconductor device
JP5024289B2 (en) * 2006-05-30 2012-09-12 国産電機株式会社 Resin-sealed semiconductor device and electronic device using this semiconductor device

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