JPH068917U - Optical microscope for three-dimensional image observation of surface micro-defects / adhesions - Google Patents
Optical microscope for three-dimensional image observation of surface micro-defects / adhesionsInfo
- Publication number
- JPH068917U JPH068917U JP9777791U JP9777791U JPH068917U JP H068917 U JPH068917 U JP H068917U JP 9777791 U JP9777791 U JP 9777791U JP 9777791 U JP9777791 U JP 9777791U JP H068917 U JPH068917 U JP H068917U
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- Japan
- Prior art keywords
- light
- sample
- optical microscope
- slit
- observation
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- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
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Abstract
(57)【要約】
【目的】 特殊の検査装置を用いることなく、光学顕微
鏡を改良して低コストで表面微小欠陥や付着物の立体像
観察を可能にする。
【構成】 光源の光をミラー部で直角に屈折させ、対物
レンズを介して試料に照射し、反射光を接眼レンズに入
射させ観察する反射光学系顕微鏡において、直角に屈折
させる前、及び/又は、後にスリットを設け、光源から
の光を端部のみとし、かつ集光レンズで試料に一定の角
度を有して照射し、さらに試料下方より補助光を照射す
ることを特徴とする立体像観察用光学顕微鏡。
(57) [Abstract] [Purpose] To improve the optical microscope without using a special inspection device and enable stereoscopic image observation of surface micro-defects and deposits at low cost. [Constitution] In a catoptric microscope for refracting light from a light source at a right angle in a mirror portion, irradiating a sample through an objective lens, and making reflected light incident on an eyepiece for observation, before refraction at a right angle, and / or , 3D image observation characterized in that a slit is provided later, the light from the light source is limited to the end part, the sample is irradiated with a condenser lens at a certain angle, and further the auxiliary light is irradiated from below the sample. For optical microscope.
Description
【0001】[0001]
本考案は、フォトマスクサブストレート等の表面微小欠陥や微小付着物を立体 的に観察できる光学顕微鏡に関する。 The present invention relates to an optical microscope capable of stereoscopically observing surface microscopic defects and microscopic deposits on a photomask substrate or the like.
【0002】[0002]
従来より、フォトマスクサブストレート等の表面微小欠陥や微小付着物を観察 するものとして、レーザースポットをレチクル上で走査して散乱光を検出し、異 物の有無や大きさを図る装置(特開昭58−62544号公報)、光透過性の板 状物体の一方から光ビームを照射し、この板状物体に付着した異物から生じる散 乱光を検出して、異物の有無を検出する装置(特開昭59−186324号公報 )、X線を用い、該X線の波長領域外の特定の波長域の光を殆ど吸収する膜厚を 最小膜厚とする有機膜を塗布して異物の散乱光を検査する方法(特開昭63−2 89814号公報)、及び防塵膜を通して特定の位相のずれを生ずるように照射 光と受光角で照射するようにした異物検査装置(特開平2−189449号公報 )等が開示されている。 Conventionally, as a device for observing surface micro-defects and micro-adhesions such as photomask substrates, a device for detecting the scattered light by scanning a laser spot on a reticle to determine the presence or absence of foreign matter and its size (JP-A-58-62544), a device for irradiating a light beam from one of the light-transmissive plate-like objects, detecting scattered light generated from the foreign matter adhering to the plate-like object, and detecting the presence or absence of the foreign matter ( JP-A-59-186324), using an X-ray, coating an organic film having a minimum film thickness that almost absorbs light in a specific wavelength range outside the wavelength range of the X-ray to scatter foreign matters. A method of inspecting light (Japanese Patent Laid-Open No. 63-2 89814), and a foreign substance inspecting apparatus (Japanese Patent Laid-Open No. 2-189449) in which irradiation is performed with an irradiation light and a light-receiving angle so as to cause a specific phase shift through a dustproof film. Issue gazette) etc. There.
【0003】 また、光学顕微鏡によるフォトマスクサブストレート上の微小欠陥、付着物の 観察は、図7に示すように試料直上部から直接照明光をあてて観察していた。In addition, as for the observation of minute defects and adhering substances on the photomask substrate by an optical microscope, as shown in FIG. 7, illumination light was directly applied from directly above the sample.
【0004】[0004]
しかし、従来例に開示された発明は、あくまで特殊装置による異物検査装置で あり、構造が複雑であったり、コストがかかったり、光学顕微鏡を用いていると きに異物を発見したときに装置を替える必要があり、簡易に異物を検査すること ができなかった。 However, the invention disclosed in the conventional example is only a foreign matter inspection device using a special device, and the device is complicated when the foreign matter is found when using an optical microscope because of its complicated structure and cost. It was necessary to replace it and it was not possible to easily inspect for foreign matter.
【0005】 また、光学顕微鏡による観察では、付着物等の試料直上部から直接照明光をあ てるため、凹凸のある異物も直上から均一に光があたり凹凸部に明暗がつきにく く、観察像の形状が不明確で、凸(付着物)、凹(欠陥)の判断が困難で異物等 の凸凹の判別を行なう場合には、顕微鏡をのぞきながら観察物を針でつついて判 別せねばならず、その時にフォトマスクサブストレート表面にキズをつけるおそ れがある。Further, in the observation with an optical microscope, since the illumination light is directly applied from directly above the sample such as an adhered substance, uneven foreign matter is uniformly illuminated from directly above, and it is difficult for the unevenness to be bright or dark. When the shape of the image is unclear and it is difficult to judge whether it is convex (adhered matter) or concave (defect), and if it is necessary to distinguish between irregularities such as foreign matter, look at the microscope and pick up the observation object with a needle to make a distinction. At that time, the surface of the photomask substrate may be damaged.
【0006】 そのため、特殊の検査装置を用いることなく、光学顕微鏡を改良して低コスト で表面微小欠陥や付着物の立体像観察を可能にする光学顕微鏡の開発が望まれて いた。Therefore, it has been desired to develop an optical microscope that improves the optical microscope and enables three-dimensional image observation of surface microscopic defects and deposits at low cost without using a special inspection device.
【0007】 本考案は、前記欠点を解決し、表面微小欠陥や付着物の立体像観察を光学顕微 鏡を改良して低コストで提供することを目的とする。It is an object of the present invention to solve the above-mentioned drawbacks and to provide a stereoscopic image observation of surface micro-defects and deposits at a low cost by improving an optical microscope.
【0008】[0008]
そこで、本考案者は前記課題を解決するために鋭意研究を行った結果、光源の 光をミラー部で直角に屈折させ、対物レンズを介して試料に照射し、反射光を接 眼レンズに入射させ観察する反射光学系顕微鏡において、直角に屈折させる前、 及び/又は、後でスリットにより光源からの光を限定し、かつ集光レンズで試料 に一定の角度を有して照射すれば、前記課題が解決でき立体映像が光学顕微鏡で 観察できるとの知見を得て本考案を完成した。 Therefore, as a result of earnest research to solve the above-mentioned problems, the inventor of the present invention has found that the light from the light source is refracted at right angles by the mirror part, irradiates the sample through the objective lens, and the reflected light is incident on the eyepiece lens. In a reflection optical system microscope for observing, if the light from the light source is limited by the slit before and / or after being refracted at a right angle, and if the sample is irradiated with a condenser lens at a certain angle, The present invention has been completed based on the knowledge that the problems can be solved and stereoscopic images can be observed with an optical microscope.
【0009】 以下、本考案を図面に基づいて説明する。 図1は、本考案の概念を示す図であり、光学反射顕微鏡において、入射光1は ミラー部2で直角に屈折させる前、及び/又は、後に設けたスリット3(及び/ 又は4)により一部が遮断され、上又は下端部の光のみに限定される。 端部に限定された入射光1は集光レンズ5の端部付近より屈折され、試料に一 方向より一定の角度θを有して照射される。Hereinafter, the present invention will be described with reference to the drawings. FIG. 1 is a view showing the concept of the present invention. In an optical reflection microscope, an incident light 1 is reflected by a slit 3 (and / or 4) provided before and / or after being refracted at a right angle by a mirror unit 2. Part is blocked and is limited to light at the top or bottom. The incident light 1 limited to the end is refracted from the vicinity of the end of the condenser lens 5, and is irradiated onto the sample at a constant angle θ from one direction.
【0010】 このとき、スリットは、ミラー部の前部3のみに設けて入射光を限定しても良 いし、又はミラー部の屈折後の位置4のみに設けても良く、さらにはミラー部の 屈折の前後両方に双方のスリット間隔が同期するように設けて入射光を限定する こともできるが、スリットを多く設置すればそれだけ乱反射を防止できる。 なお、ミラーをハーフミラーとして試料からの反射光を再度ミラー部2へ入射 させる方式とした場合においては、スリットはミラー部の前部3のみにしてもよ い。At this time, the slit may be provided only in the front part 3 of the mirror part to limit the incident light, or may be provided only in the position 4 after refraction of the mirror part, and further, in the mirror part. It is possible to limit the incident light by arranging both slits before and after refraction so as to be synchronized with each other. When the mirror is a half mirror and the reflected light from the sample is incident on the mirror section 2 again, the slit may be provided only on the front section 3 of the mirror section.
【0011】 試料への照射角度θは、スリット3又は4の透過孔を調製をすることによって 、また集光レンズ5によって自在に調製することができる。The irradiation angle θ to the sample can be freely adjusted by adjusting the transmission holes of the slits 3 or 4 or by the condenser lens 5.
【0012】 また、本考案を光学顕微鏡に用いるときは、後述するように、ミラー部、スリ ット部を一体とした立体観察用治具8(図6参照)として光学顕微鏡内に組み込 むことによって光学顕微鏡で簡易に立体像を観察することができる。When the present invention is used in an optical microscope, as will be described later, it is incorporated in the optical microscope as a stereoscopic observation jig 8 (see FIG. 6) in which a mirror portion and a slit portion are integrated. This allows a stereoscopic image to be easily observed with an optical microscope.
【0013】 入射光となる照明光はスリットにより大部分がカットされるため光量不足を補 うため試料下部より補助光を照射する。補助光の光量は補助光源のコンデンサー 絞りの開口部を調製することによって調製することができる。Since most of the incident illumination light is cut by the slit, the auxiliary light is emitted from the lower portion of the sample to compensate for the insufficient light amount. The amount of auxiliary light can be adjusted by adjusting the aperture of the condenser diaphragm of the auxiliary light source.
【0014】 図2は、本考案を光学反射顕微鏡に用いた光路図を示すもので、ミラー部2、 及びスリット3を着脱自在な立体観察用治具8として光学反射顕微鏡に組み込ん だものである。FIG. 2 shows an optical path diagram in which the present invention is applied to an optical reflection microscope, in which the mirror section 2 and the slit 3 are incorporated in the optical reflection microscope as a detachable stereoscopic observation jig 8. .
【0015】 立体観察用治具8に設けられたスリットは、例えば、図3、図4に示す形状の 透過孔9を有し、入射光端部の一部のみを透過するように構成する。また、図5 のように長方形状において大部のスリット部に円形状の透過孔を設け、可動可能 なスリットを立体観察用治具内を自在に可動させることによって透過孔とスリッ トを調製して透過光量を調製することもできる。The slit provided in the stereoscopic observation jig 8 has, for example, a transmission hole 9 having a shape shown in FIGS. 3 and 4, and is configured to transmit only a part of the incident light end portion. In addition, as shown in Fig. 5, a rectangular transmission hole is provided in the large slit portion, and the movable slit is freely moved in the stereoscopic observation jig to prepare the transmission hole and the slit. It is also possible to adjust the amount of transmitted light.
【0016】 スリット形状によって、例えば図3に示す形状のものでは側面方向から、また 図4のものでは一周囲方向というように一定の角度を持たせた入射光をどの方向 から試料に照射させるかもスリットの形状により適宜決定できる。Depending on the slit shape, the sample may be irradiated with incident light having a certain angle such as the side direction in the case of the shape shown in FIG. 3 or the one-circumferential direction in the case of FIG. It can be appropriately determined depending on the shape of the slit.
【0017】 図5のスリットを立体観察用治具に用いたときは、まず透過孔を全開にして入 射光を異物上に真上より照射し、集光レンズで焦点を定める。次いで、スリット を移動して端部の透過光のみ透過して試料に一方向より角度を設けて照射するか 、または焦点を定めた段階で図3、図4のスリットと交換することによって試料 に一方向より角度を設けて照射することができる。When the slit shown in FIG. 5 is used for a stereoscopic observation jig, first, the transmission hole is fully opened to irradiate the foreign matter onto the foreign matter from directly above, and the focus is determined by the condenser lens. Then, the slit is moved so that only the transmitted light at the end is transmitted and the sample is irradiated at an angle from one direction, or at the stage where the focus is set, the sample is replaced by the slit shown in FIGS. 3 and 4. Irradiation can be performed at an angle from one direction.
【0018】[0018]
本考案によれば顕微鏡観察像に陰影によるコントラストを与え、像を立体的に する事によって、従来の光学顕微鏡観察では困難であったフォトマスクサブスト レート上の微小欠点が、欠陥(凹)か、付着物(凸)かの識別が、正確、かつ、 容易に、またサブストレート表面にキズを付ける事なく、行なうことができる。 また、付着物の立体的形状、欠陥においてのダメージの入り方を観察する事が 出来る為、欠陥、付着物発生原因の調査において欠陥、付着物の分類、同定が正 確かつ容易に行なえる。 さらに、補助光をもちいるので試料を明確に観察することができる。 また、入射光の制限を立体観察用治具で可動スリットにより行うようことがで きるため、従来の光学顕微鏡に簡単な改良を行うことによって安価に立体観察用 光学顕微鏡を得ることができる。 According to the present invention, by giving a contrast by shading to a microscope observation image and making the image three-dimensional, a micro defect on the photomask substrate, which was difficult in the conventional optical microscope observation, is a defect (concave). It is possible to accurately and easily identify whether there is a deposit (convex) or not without scratching the surface of the substrate. In addition, since it is possible to observe the three-dimensional shape of the deposit and how damage is introduced in the defect, it is possible to accurately and easily classify and identify the defect and deposit in the investigation of the cause of the defect and deposit generation. Further, since the auxiliary light is used, the sample can be clearly observed. Further, since the incident light can be limited by the movable slit in the stereoscopic observation jig, it is possible to inexpensively obtain the stereoscopic optical microscope by making a simple improvement to the conventional optical microscope.
【図1】本考案の概念を示す図。FIG. 1 is a diagram showing the concept of the present invention.
【図2】本考案を光学反射顕微鏡に用いた光路図。FIG. 2 is an optical path diagram using the present invention in an optical reflection microscope.
【図3】スリットの平面図。FIG. 3 is a plan view of a slit.
【図4】スリットの平面図。FIG. 4 is a plan view of a slit.
【図5】スリットの平面図。FIG. 5 is a plan view of a slit.
【図6】スリットとミラー部を組み込んだ立体観察用治
具の光路図。FIG. 6 is an optical path diagram of a stereoscopic observation jig incorporating a slit and a mirror section.
【図7】従来の光路図。FIG. 7 is a conventional optical path diagram.
1 入射光 2 ミラー 3、4 スリット 5 レンズ 6 試料 7 補助光 8 立体観察用治具 9 透光孔 10 接眼レンズ 11 対物レンズ 12 光源 1 Incident light 2 Mirror 3, 4 Slit 5 Lens 6 Sample 7 Auxiliary light 8 Stereoscopic observation jig 9 Light transmitting hole 10 Eyepiece 11 Objective lens 12 Light source
Claims (3)
対物レンズを介して試料に照射し、反射光を接眼レンズ
に入射させ観察する反射光学系顕微鏡において、直角に
屈折させる前、及び/又は、後にスリットを設け、光源
からの光を限定し、かつ集光レンズで試料に一定の角度
を有して照射することを特徴とする立体像観察用光学顕
微鏡。1. The light of a light source is refracted at right angles by a mirror part,
In a catadioptric microscope that irradiates a sample through an objective lens and allows reflected light to enter an eyepiece for observation, a slit is provided before and / or after refraction at a right angle to limit light from a light source, and An optical microscope for observing a stereoscopic image, characterized in that a sample is irradiated at a constant angle with a condenser lens.
対物レンズを介して試料に照射し、反射光を接眼レンズ
に入射させ観察する反射光学系顕微鏡において、直角に
屈折させる前、及び/又は、後にスリットを設け、光源
からの光を端部のみとし、かつ集光レンズで試料に一定
の角度を有して照射し、さらに試料下方より補助光を照
射することを特徴とする立体像観察用光学顕微鏡。2. The light of the light source is refracted at right angles by the mirror part,
In a catoptric optical microscope that irradiates a sample through an objective lens and allows reflected light to enter an eyepiece for observation, a slit is provided before and / or after refraction at a right angle, and light from a light source is limited to an end portion. An optical microscope for observing a stereoscopic image, characterized in that the sample is irradiated with a condenser lens at a constant angle, and further auxiliary light is irradiated from below the sample.
スリットを立体観察用治具として組み込んだことを特徴
とする立体像観察用光学顕微鏡。3. An optical microscope for observing a stereoscopic image according to claim 1, wherein the mirror portion and the movable slit are incorporated as a jig for stereoscopic observation.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1991097777U JP2588473Y2 (en) | 1991-11-01 | 1991-11-01 | Optical microscope for observing three-dimensional images of surface micro defects and attached matter |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1991097777U JP2588473Y2 (en) | 1991-11-01 | 1991-11-01 | Optical microscope for observing three-dimensional images of surface micro defects and attached matter |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH068917U true JPH068917U (en) | 1994-02-04 |
JP2588473Y2 JP2588473Y2 (en) | 1999-01-13 |
Family
ID=14201266
Family Applications (1)
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JP1991097777U Expired - Fee Related JP2588473Y2 (en) | 1991-11-01 | 1991-11-01 | Optical microscope for observing three-dimensional images of surface micro defects and attached matter |
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JP (1) | JP2588473Y2 (en) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6063514A (en) * | 1983-09-17 | 1985-04-11 | Nippon Kogaku Kk <Nikon> | Projecting microscope for dark field of view |
JPH01108508U (en) * | 1988-01-16 | 1989-07-21 |
-
1991
- 1991-11-01 JP JP1991097777U patent/JP2588473Y2/en not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6063514A (en) * | 1983-09-17 | 1985-04-11 | Nippon Kogaku Kk <Nikon> | Projecting microscope for dark field of view |
JPH01108508U (en) * | 1988-01-16 | 1989-07-21 |
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JP2588473Y2 (en) | 1999-01-13 |
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