JPH0681157A - Surface treatment of copper foil for printed circuit - Google Patents
Surface treatment of copper foil for printed circuitInfo
- Publication number
- JPH0681157A JPH0681157A JP25200792A JP25200792A JPH0681157A JP H0681157 A JPH0681157 A JP H0681157A JP 25200792 A JP25200792 A JP 25200792A JP 25200792 A JP25200792 A JP 25200792A JP H0681157 A JPH0681157 A JP H0681157A
- Authority
- JP
- Japan
- Prior art keywords
- copper foil
- treatment
- zinc
- printed circuit
- chromium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C2222/00—Aspects relating to chemical surface treatment of metallic material by reaction of the surface with a reactive medium
- C23C2222/20—Use of solutions containing silanes
Landscapes
- Chemical Treatment Of Metals (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Parts Printed On Printed Circuit Boards (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、印刷回路用銅箔の光沢
面の処理方法に関するものであり、特には耐湿性の改善
及び耐ヤケ性の改善を目的とする印刷回路用銅箔の光沢
面の処理方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for treating a glossy surface of a printed circuit copper foil, and more particularly to a gloss of a printed circuit copper foil for the purpose of improving moisture resistance and burn resistance. It relates to a method of processing a surface.
【0002】[0002]
【従来の技術】印刷回路用銅箔は一般に、合成樹脂等の
基材に高温高圧下で積層接着され、その後目的とする回
路を形成するべく必要な回路を印刷した後、不要部を除
去するエッチング処理が施される。最終的に、所要の素
子が半田付けされて、エレクトロニクスデバイス用の種
々の印刷回路板を形成する。印刷配線板用銅箔に対する
品質要求は、樹脂基材と接着される面(粗化面)と、非
接着面(光沢面)とで異なる。2. Description of the Related Art Generally, a printed circuit copper foil is laminated and adhered to a base material such as a synthetic resin under high temperature and high pressure, and after printing a necessary circuit to form a target circuit, unnecessary parts are removed. An etching process is performed. Finally, the required elements are soldered to form various printed circuit boards for electronic devices. Quality requirements for a copper foil for a printed wiring board are different between a surface bonded to a resin substrate (roughened surface) and a non-bonded surface (glossy surface).
【0003】粗化面に対する要求としては、主として、 保存時における酸化変色のないこと、 基材との引き剥し強さが高温加熱、湿式処理、半田付
け、薬品処理等の後でも充分なこと、 基材との積層、エッチング後に生じる所謂積層汚点の
ないこと 等が挙げられる。The requirements for the roughened surface are mainly that there is no oxidative discoloration during storage and that the peeling strength from the substrate is sufficient even after high temperature heating, wet treatment, soldering, chemical treatment, etc. For example, there is no so-called laminated stain that occurs after lamination with a substrate or etching.
【0004】他方、光沢面に対しては、 外観が良好なこと及び保存時における酸化変色のない
こと、 高温加熱時に酸化変色がないこと(耐熱酸化性、ヤケ
性) 半田濡れ性が良好なこと、 レジストとの密着性が良好なこと 等が要求される。On the other hand, the glossy surface has a good appearance, no oxidative discoloration during storage, no oxidative discoloration during high temperature heating (heat-resistant oxidation resistance, burnability), and good solder wettability. Good adhesion with the resist is required.
【0005】[0005]
【発明が解決しようとする課題】特に最近では、印刷回
路用銅箔は海外へも輸出されることが多く、船積輸送を
含めて保管環境が悪い場合がある。湿度の多い夏場など
に酸化のトラブルを起こすことがある。また、国内にお
いても、保証期間の延長等従来より長期間の保証を求め
られる傾向がある。Particularly, recently, the copper foil for printed circuits is often exported to foreign countries, and the storage environment including shipping may be bad. May cause oxidation problems in humid summers. Also in Japan, there is a tendency to require a longer-term warranty than before, such as extension of the warranty period.
【0006】また、新しい製作方式として、2層フレキ
と呼ばれる方式が出現している。2層フレキは、ポリイ
ミド樹脂を直接銅箔上へ塗布し、300℃以上の高温で
ポリイミド樹脂をキュワリングしてフレキシブル基板と
する方法で、ポリイミド層と銅箔層の2層構造となって
いるため、2層フレキと呼ばれている。また、従来の材
料においても、特性を一層高めるために高温処理を行う
場合がある。As a new manufacturing method, a method called two-layer flex has appeared. The two-layer flex is a method in which a polyimide resin is directly applied onto a copper foil and the polyimide resin is cured at a high temperature of 300 ° C. or more to form a flexible substrate, and has a two-layer structure of a polyimide layer and a copper foil layer. It is called 2-layer flexible. Further, even conventional materials may be subjected to high temperature treatment in order to further improve the characteristics.
【0007】銅箔には通常、製造最終段階で、防錆目的
でクロメート処理或いは亜鉛めっき+クロメート処理の
ような防錆処理をを施してある。しかしながら、従来か
らの防錆処理では、湿度の高い夏場等に悪い環境で長期
保管されると酸化トラブルを起こすことがあり、また従
来より高い温度で処理を受けると変色してしまう。The copper foil is usually subjected to anticorrosion treatment such as chromate treatment or zinc plating + chromate treatment for the purpose of anticorrosion at the final stage of production. However, the conventional anticorrosion treatment may cause an oxidation trouble if it is stored for a long time in a bad environment such as a humid summer, and if it is treated at a temperature higher than the conventional temperature, it will be discolored.
【0008】本発明の課題は、銅箔光沢面の長期保存性
(耐湿性)の改善及び耐ヤケ性(耐熱酸化性)の改善を
目的とする印刷回路用銅箔の光沢面の処理方法を確立す
ることである。An object of the present invention is to provide a method for treating the glossy surface of a copper foil for a printed circuit for the purpose of improving the long-term storage property (moisture resistance) and the burn resistance (heat oxidation resistance) of the copper foil glossy surface. To establish.
【0009】[0009]
【課題を解決するための手段】本発明者等は、印刷回路
用銅箔の光沢面にZn又はZn合金めっきを施しその後
クロメート処理若しくは電解亜鉛・クロム処理するか、
或いは光沢面に直接電解亜鉛・クロム処理し、その後処
理表面をシランカップリング剤で処理することにより上
記課題を解決しうることを見出した。シランカップリン
グ処理自体は、古くはガラスクロスの処理として有名で
あり、銅箔に対してはその粗化面(接着面)の特性、特
に接着強度の改善にもっぱら使用されてきた。例えば、
特開昭56−118853号はプリプレグと銅箔粗化面
との間にシランを介在させることを開示し、特公昭61
−24176号、特公昭61−24177号及び特公昭
61−24178号は、アミノシランを銅箔粗化面に或
いはクロメート処理後の銅箔粗化面に塗布してエポキシ
樹脂基板或いはポリイミド樹脂基板を作製することを記
載している。特開昭58−84484号は、銅箔粗化面
にシランを塗布し耐酸性を向上させることを記載する。
この他にも多くの文献があるが、これらはすべて、銅箔
の粗化面の特性改善に関するものであり、銅箔光沢面に
シランカップリング剤を塗布することを明記するものは
なく、ましてや光沢面の長期保存性(耐湿性)の改善及
び耐ヤケ性の改善に言及するものはない。このシランカ
ップリング処理は、所要水準のハンダ濡れ性をやレジス
ト密着性を保証することも確認された。Means for Solving the Problems The present inventors have proposed that the glossy surface of a printed circuit copper foil is plated with Zn or a Zn alloy, and then subjected to chromate treatment or electrolytic zinc / chromium treatment.
Alternatively, it has been found that the above problems can be solved by directly treating the glossy surface with electrolytic zinc / chromium and then treating the treated surface with a silane coupling agent. The silane coupling treatment itself has long been known as a treatment for glass cloth, and has been used exclusively for improving the characteristics of the roughened surface (adhesive surface) of the copper foil, particularly the adhesive strength. For example,
Japanese Unexamined Patent Publication No. 56-118853 discloses that silane is interposed between the prepreg and the roughened surface of the copper foil.
No. 24176, JP-B-61-24177 and JP-B-61-24178, an aminosilane is applied to the roughened surface of copper foil or the roughened surface of copper foil after chromate treatment to prepare an epoxy resin substrate or a polyimide resin substrate. It describes that you do. JP-A-58-84484 describes that silane is applied to a roughened surface of a copper foil to improve acid resistance.
There are many other documents, but these are all related to the improvement of the characteristics of the roughened surface of the copper foil, and there is nothing that clearly states that the silane coupling agent is applied to the glossy surface of the copper foil, let alone There is no mention of improvement in long-term storage property (moisture resistance) and improvement in burn resistance of the glossy surface. It was also confirmed that this silane coupling treatment ensures the required level of solder wettability and resist adhesion.
【0010】この知見に基づき、本発明は、(1)印刷
回路用銅箔の光沢面にZn又はZn合金めっきを施し、
その後該Zn又はZn合金めっき表面をクロメート処理
し、更にクロメート処理表面をシランカップリング剤で
処理することを特徴とする印刷回路用銅箔の光沢面処理
方法、(2)印刷回路用銅箔の光沢面にZn又はZn合
金めっきを施し、その後該Zn又はZn合金めっき表面
に電解亜鉛・クロム処理によるクロム酸化物と亜鉛及び
(又は)亜鉛酸化物との混合皮膜を形成し、更に電解亜
鉛・クロム処理表面をシランカップリング剤で処理する
ことを特徴とする印刷回路用銅箔の光沢面処理方法並び
に(3)印刷回路用銅箔の光沢面に電解亜鉛・クロム処
理によるクロム酸化物と亜鉛及び(又は)亜鉛酸化物と
の混合皮膜を形成し、更に電解亜鉛・クロム処理表面を
シランカップリング剤で処理することを特徴とする印刷
回路用銅箔の光沢面処理方法を提供する。Based on this finding, the present invention provides (1) Zn or Zn alloy plating on a glossy surface of a printed circuit copper foil,
Then, the Zn or Zn alloy plated surface is chromate-treated, and the chromate-treated surface is further treated with a silane coupling agent. A method for treating a glossy surface of a copper foil for a printed circuit, (2) a copper foil for a printed circuit Zn or Zn alloy plating is applied to the glossy surface, and then a mixed film of chromium oxide and zinc and / or zinc oxide is formed on the Zn or Zn alloy plating surface by electrolytic zinc / chromium treatment. Method for treating shiny surface of copper foil for printed circuit, characterized in that surface treated with chromium is treated with silane coupling agent, and (3) Chromium oxide and zinc by electrolytic zinc / chromium treatment on shiny surface of copper foil for printed circuit Gloss of copper foil for printed circuits characterized by forming a mixed film with and / or zinc oxide, and further treating the electrolytic zinc / chromium treated surface with a silane coupling agent. To provide a processing method.
【0011】[0011]
【作用】本発明において使用する銅箔は、電解銅箔或い
は圧延銅箔いずれでもよい。銅箔の光沢面に、先ず、
(1)Zn又はZn合金めっきを施しその後クロメート
処理するか或いは(2)Zn又はZn合金めっきを施し
その後電解亜鉛・クロム処理してクロム酸化物と亜鉛及
び(又は)亜鉛酸化物との混合皮膜を形成するか或いは
(3)直接電解亜鉛・クロム処理してクロム酸化物と亜
鉛及び(又は)亜鉛酸化物との混合皮膜を形成する。The copper foil used in the present invention may be either electrolytic copper foil or rolled copper foil. First, on the shiny side of the copper foil,
(1) Zn or Zn alloy plating and then chromate treatment, or (2) Zn or Zn alloy plating and then electrolytic zinc / chromium treatment and mixed coating of chromium oxide and zinc and / or zinc oxide. Or (3) direct electrolytic zinc / chromium treatment to form a mixed film of chromium oxide and zinc and / or zinc oxide.
【0012】(1)及び(2)の場合にはZn又はZn
合金めっきが先ず形成される。Znめっきの場合、10
0〜500μg/dm2 の付着量でごく薄く形成するように
めっきが実施される。Zn付着量が100μg/dm2 未満
では耐ヤケ性(耐熱酸化性)が悪化する。500μg/dm
2 を超えると、Zn金属の色調が濃くなり、外観上問題
となる。Znめっき条件の例は次の通りである: Znめっき条件 Zn:10〜50g/l pH:3〜5 温度:30〜60℃ 電流密度:0.1〜3A/dm2 めっき時間:0.5〜5秒In the cases (1) and (2), Zn or Zn
The alloy plating is first formed. 10 for Zn plating
Plating is performed so as to form a very thin film with an adhesion amount of 0 to 500 μg / dm 2 . When the amount of deposited Zn is less than 100 μg / dm 2 , the burn resistance (heat-resistant oxidation resistance) deteriorates. 500 μg / dm
When it exceeds 2 , the color tone of Zn metal becomes dark, which is a problem in appearance. Examples of Zn plating conditions are as follows: Zn plating conditions Zn: 10 to 50 g / l pH: 3 to 5 Temperature: 30 to 60 ° C. Current density: 0.1 to 3 A / dm 2 Plating time: 0.5 ~ 5 seconds
【0013】Zn合金めっきとしては、例えばZn−N
i、Zn−Co等が代表的である。Zn−Niを例にと
ると、光沢面に同じくZn−Ni合金処理が実施され
る。Zn−Ni合金処理は、好ましくはZn−Ni電解
めっき浴を使用して50〜97重量%Zn及び3〜50
重量%Niを含むZn−Ni合金層を100〜500μ
g/dm2 の付着量でごく薄く形成するように実施される。
Ni量が3重量%以上でZn単独の場合より良好な耐熱
酸化性が確保される。他方Ni量が50重量%を超える
と、半田濡れ性が悪化すると共に、耐熱酸化性も悪化す
る。付着量についてはZn単独の場合に準じる。Zn−
Co合金の場合も上記と同一である。The Zn alloy plating is, for example, Zn--N.
i, Zn-Co, etc. are typical. Taking Zn-Ni as an example, the Zn-Ni alloy treatment is similarly performed on the glossy surface. The Zn-Ni alloy treatment is preferably 50-97 wt% Zn and 3-50 using a Zn-Ni electroplating bath.
Zn-Ni alloy layer containing 100% by weight of Ni 100-500μ
It is carried out so as to form a very thin film with an attached amount of g / dm 2 .
When the amount of Ni is 3% by weight or more, better thermal oxidation resistance is secured as compared with the case of Zn alone. On the other hand, when the amount of Ni exceeds 50% by weight, the solder wettability deteriorates and the thermal oxidation resistance also deteriorates. The adhesion amount is the same as when Zn alone. Zn-
The same applies to the case of Co alloy.
【0014】Zn−Ni合金めっき浴の組成及び条件例
は次の通りである: Zn:5〜50g/l Ni:5〜50g/l pH:2.5〜4 温度:30〜60℃ 電流密度:0.5〜5A/dm2 めっき時間:1〜10秒The composition and conditions of the Zn-Ni alloy plating bath are as follows: Zn: 5 to 50 g / l Ni: 5 to 50 g / l pH: 2.5 to 4 Temperature: 30 to 60 ° C. Current density : 0.5 to 5 A / dm 2 Plating time: 1 to 10 seconds
【0015】上記(1)では、水洗後、ZnまたはZn
合金めっき上にクロメート処理が施される。浸漬クロメ
ート或いは電解クロメートいずれでも良い。耐候性が要
求されるときには、電解クロメートが好ましい。浸漬ク
ロメート或いは電解クロメートの条件は斯界で確立され
ている条件に従う。例えば、浸漬クロメート及び電解ク
ロメート処理の条件例は次の通りである: (A)浸漬クロメート処理 K2Cr2O7 :0.1〜5g/l pH :2.5〜4.5 温度 :40〜60℃ 時間 :3〜8秒 (B)電解クロメート処理 K2Cr2O7 (Na2Cr2O7或いはCrO3):2〜10g/l NaOH或いはKOH :10〜50g/l pH :7〜13 浴温 :20〜80℃ 電流密度 :0.05〜5 A/dm2 時間 :5〜30秒In the above (1), after washing with water, Zn or Zn
Chromate treatment is applied on the alloy plating. Either immersion chromate or electrolytic chromate may be used. When weather resistance is required, electrolytic chromate is preferable. The conditions of immersion chromate or electrolytic chromate follow the conditions established in the art. For example, examples of conditions of immersion chromate treatment and electrolytic chromate treatment are as follows: (A) Immersion chromate treatment K 2 Cr 2 O 7 : 0.1 to 5 g / l pH: 2.5 to 4.5 Temperature: 40 -60 ° C Time: 3-8 seconds (B) Electrolytic chromate treatment K 2 Cr 2 O 7 (Na 2 Cr 2 O 7 or CrO 3 ): 2 to 10 g / l NaOH or KOH: 10 to 50 g / l pH: 7 -13 Bath temperature: 20-80 ° C Current density: 0.05-5 A / dm 2 hours: 5-30 seconds
【0016】クロメート層は、Cr量で表して15〜1
00μg/dm2 の付着量を有することが好ましい。Cr付
着量が15μg/dm2 未満だと、耐湿性及び耐薬品性が悪
化する。Cr付着量が100μg/dm2 を超えると、ハン
ダ濡れ性及びUV(紫外線硬化型)レジストインクのよ
うなレジストの密着性に悪影響を与える。The chromate layer has a Cr content of 15 to 1
It is preferable to have an adhesion amount of 00 μg / dm 2 . When the amount of deposited Cr is less than 15 μg / dm 2 , the moisture resistance and chemical resistance are deteriorated. When the amount of deposited Cr exceeds 100 μg / dm 2 , the wettability of solder and the adhesiveness of a resist such as a UV (ultraviolet curing type) resist ink are adversely affected.
【0017】上記(2)の場合には、ZnまたはZn合
金めっき上に電解亜鉛・クロム処理によりクロム酸化物
と亜鉛及び(又は)亜鉛酸化物との混合皮膜を形成す
る。電解亜鉛・クロム処理とは、亜鉛塩または酸化亜鉛
とクロム酸塩とを含むめっき浴を用いて電気めっきによ
り亜鉛または酸化亜鉛とクロム酸化物とより成る亜鉛−
クロム基混合物の防錆層を被覆する処理である。めっき
浴としては代表的には、K2Cr2O7 、Na2Cr2O7等の重クロ
ム酸塩やCrO3等の少なくとも一種と、水溶性亜鉛塩、例
えばZnO 、ZnSO4 ・7H2O等少なくとも一種と、水酸化ア
ルカリとの混合水溶液が用いられる。代表的なめっき浴
組成と電解条件例は次の通りである: (C)電解亜鉛・クロム処理 K2Cr2O7 :2〜10g/l (Na2Cr2O7或いはCrO3) Zn :0.1〜1g/l Na2SO4 :5〜20g/l pH :3〜5 浴温 :20〜60℃ 電流密度 :0.1〜3 A/dm2 時間 :1〜30秒 クロム酸化物はクロム量として15〜100μg/dm2 そ
して亜鉛は50〜500μg/dm2 の被覆量が好ましい。
Cr付着量が15μg/dm2 未満だと、耐湿性及び耐薬品
性が悪化する。Cr付着量が100μg/dm2 を超える
と、ハンダ濡れ性及びUVレジストインク密着性に悪影
響を与える。Zn付着量が50μg/dm2 未満では耐熱酸
化性(ヤケ性)が悪化する。500μg/dm2 を超える
と、Zn金属の色調が濃くなり、外観上問題となる。In the case of the above (2), a mixed film of chromium oxide and zinc and / or zinc oxide is formed on the Zn or Zn alloy plating by electrolytic zinc / chromium treatment. The electrolytic zinc / chromium treatment means zinc consisting of zinc or zinc oxide and chromium oxide by electroplating using a plating bath containing zinc salt or zinc oxide and chromate.
This is a treatment for coating the anticorrosion layer of the chromium-based mixture. The plating bath is typically K 2 Cr 2 O 7 , at least one of dichromates such as Na 2 Cr 2 O 7 and CrO 3, and a water-soluble zinc salt such as ZnO, ZnSO 4 .7H 2 A mixed aqueous solution of at least one of O and alkali hydroxide is used. Typical plating bath compositions and examples of electrolysis conditions are as follows: (C) Electrolytic zinc / chromium treatment K 2 Cr 2 O 7 : 2 to 10 g / l (Na 2 Cr 2 O 7 or CrO 3 ) Zn: 0.1 to 1 g / l Na 2 SO 4 : 5 to 20 g / l pH: 3 to 5 Bath temperature: 20 to 60 ° C. Current density: 0.1 to 3 A / dm 2 hours: 1 to 30 seconds Chromium oxide the 15~100μg / dm 2 and zinc as the chromium content of the coating amount of 50-500 / dm 2 is preferred.
When the amount of deposited Cr is less than 15 μg / dm 2 , the moisture resistance and chemical resistance are deteriorated. When the amount of deposited Cr exceeds 100 μg / dm 2 , the wettability of the solder and the adhesion of the UV resist ink are adversely affected. If the amount of deposited Zn is less than 50 μg / dm 2 , the thermal oxidation resistance (burning property) deteriorates. When it exceeds 500 μg / dm 2 , the color tone of Zn metal becomes dark, which causes a problem in appearance.
【0018】上記(3)の場合には、ZnまたはZn合
金めっきを省略して、銅箔光沢面に直接電解亜鉛・クロ
ム処理によりクロム酸化物と亜鉛及び(又は)亜鉛酸化
物との混合皮膜を形成する。その条件は上記に準じる。In the case of the above (3), Zn or Zn alloy plating is omitted, and a mixed film of chromium oxide and zinc and / or zinc oxide is directly applied to the shiny surface of the copper foil by electrolytic zinc / chromium treatment. To form. The conditions are the same as above.
【0019】これら(1)〜(3)の処理の後、水洗
後、処理表面にシランカップリング剤が塗布される。こ
こで、シランカップリング剤とは、化学式YRSiX3
(この場合、Yは反応性官能基で、例えばエポキシ、ア
ミノ、ビニル、グリシジルオキシ、メタクリルオキシ等
の基であり、RはYとケイ素原子とを連結する結合基
で、例えばメチレン、エチレン、プロピレンのようなア
ルキレン基であり、Xはケイ素原子と結合する加水分解
性の基で、例えばメトキシ、エトキシ、プロポキシのよ
うなアルコキシ基である。)で一般に表されるものであ
る。例えば、エポキシシラン(例、日本ユニカー
(株):商品名A187)、アミノシラン(例、日本ユ
ニカー(株):商品名A1100)、メタクリルシラン
(例、日本ユニカー(株):商品名A−174)、スチ
リルシラン(例、東レシリコーン(株):商品名SZ6
032)が市販されている。シランカップリング剤の塗
布は、噴霧、浸漬、刷毛塗り等適宜の方法で表面を一様
に被覆するように通常常温で実施される。After these treatments (1) to (3), after washing with water, a silane coupling agent is applied to the treated surface. Here, the silane coupling agent has a chemical formula of YRSiX 3
(In this case, Y is a reactive functional group, for example, a group such as epoxy, amino, vinyl, glycidyloxy, methacryloxy, etc., and R is a bonding group connecting Y with a silicon atom, such as methylene, ethylene, propylene. And an X is a hydrolyzable group that is bonded to a silicon atom and is generally represented by an alkoxy group such as methoxy, ethoxy, and propoxy. For example, epoxy silane (eg, Nippon Unicar Co., Ltd .: trade name A187), aminosilane (eg, Nippon Unicar Co., Ltd .: trade name A1100), methacrylsilane (eg, Nihon Unicar Co., Ltd .: trade name A-174). , Styrylsilane (eg Toray Silicone Co., Ltd.): trade name SZ6
032) is commercially available. The application of the silane coupling agent is usually carried out at room temperature so as to uniformly coat the surface by an appropriate method such as spraying, dipping, or brush coating.
【0020】シランカップリング剤の濃度は0.001
〜10%の範囲をとることが好ましい。この濃度が0.
001%未満では、耐湿度性が悪く、酸化防止効果がな
い。またヤケ性の改善も見られない。他方上記濃度が1
0%を超えると、外観が悪くなり(ムラ等の発生)、ま
た加熱により変色しやすくなる。The concentration of the silane coupling agent is 0.001
It is preferably in the range of 10%. This concentration is 0.
If it is less than 001%, the moisture resistance is poor and the antioxidant effect is not obtained. Also, no improvement in burntness is seen. On the other hand, the above concentration is 1
If it exceeds 0%, the appearance tends to be poor (unevenness or the like is generated) and the color tends to change due to heating.
【0021】乾燥後得られた製品は、長期保存性に優れ
また従来より高温に曝露しても耐ヤケ性に優れている。
所要水準のハンダ濡れ性及びレジスト密着性をも具備し
ている。The product obtained after drying has excellent long-term storability and is excellent in burn resistance even when exposed to high temperatures.
It also has the required level of solder wettability and resist adhesion.
【0022】銅箔の粗化面については、従来から採用さ
れてきた任意の処理を施すことができる。すなわち、粗
化処理後に、粗化面にCu、Cr、Ni、Fe、Co及
びZnから選択される1種乃至2種以上の単一金属層又
は合金層を形成するトリート処理を行うことが好まし
い。合金めっきの例としては、Cu−Ni、Cu−C
o、Cu−Ni−Co、Cu−Znその他を挙げること
ができる(詳細は、特公昭56−9028号、特開昭5
4−13971号、特開平2−292895号、特開平
2−292894号、特公昭51−35711号、特公
昭54−6701号等を参照のこと)。こうしたトリー
ト処理層は銅箔の正常を決定するものとしてまた障壁と
しての役割を果たす。The roughened surface of the copper foil can be subjected to any treatment conventionally adopted. That is, after the roughening treatment, it is preferable to perform a treat treatment for forming a single metal layer or an alloy layer of one or more kinds selected from Cu, Cr, Ni, Fe, Co and Zn on the roughened surface. . Examples of alloy plating include Cu-Ni and Cu-C.
o, Cu-Ni-Co, Cu-Zn and the like (for details, see JP-B-56-9028, JP-A-5-9028).
4-13971, JP-A-2-292895, JP-A-2-292894, JP-B-51-35711, JP-B-54-6701 and the like). These treat layers serve as determinants of copper foil health and as barriers.
【0023】[0023]
【実施例】本発明の効果を例示する目的で以下に実施例
及び比較例として長期保管性に関しては耐湿性試験をそ
して耐ヤケ性に関しては及びベーキング試験結果を示
す。試験方法は次の通りとした:耐湿性は、銅箔を紙管
に約20m巻き、60℃−60%RHの恒温恒湿槽に入
れ、銅箔光沢面の酸化変色をチェックした。ベーキング
テストは、銅箔600mm巾×100mm長さの試片を
所定のオーブン中に投入し、取り出した後、光沢面の変
色の有無を確認した(判断基準:○=変色なし、△=や
や変色あり、×=変色あり)。EXAMPLES For the purpose of illustrating the effects of the present invention, a moisture resistance test is shown for long-term storability, and a baking test result is shown for burn resistance as examples and comparative examples. The test method was as follows: For moisture resistance, a copper foil was wound around a paper tube for about 20 m and placed in a constant temperature and humidity bath at 60 ° C.-60% RH to check the oxidative discoloration of the glossy surface of the copper foil. In the baking test, a copper foil 600 mm wide x 100 mm long test piece was put into a predetermined oven and taken out, and then the presence or absence of discoloration of the glossy surface was confirmed (judgment standard: ○ = no discoloration, △ = slightly discoloration Yes, x = discoloration).
【0024】(実施例I及び比較例I)実施例として、
方法1として圧延銅箔の光沢面に(A)Zn(又はZn
−Ni合金)めっきし、水洗後(B)クロメート処理し
た場合と、方法2として圧延銅箔の光沢面に(A)Zn
(又はZn−Ni合金)めっきし、水洗後(C)電解亜
鉛・クロム処理を行った場合とにわけ、その後いずれも
水洗→(D)シランカップリング剤処理→乾燥の手順で
表面処理を施した。(A)〜(D)の処理条件は次の通
りとした: (A)Zn(又はZn−Ni合金)めっき Zn:20g/l Ni:零又は10g/l pH:4 温度:50℃ 電流密度:1A/dm2 めっき時間:2秒 (B)クロメート処理(浸漬クロメート処理) K2Cr2O7 :5g/l pH:3 温度:55℃ 時間:8秒 (C)電解亜鉛・クロム処理 K2Cr2O7 :5g/l Zn:0.5g/l pH:3 浴温:55℃ 電流密度:0.5 A/dm2 時間:5秒 (D)シランカップリング剤処理 1%エポキシシラン(日本ユニカー(株):商品名A1
87)液を常温で塗布することにより行った。(Example I and Comparative Example I) As examples,
As a method 1, (A) Zn (or Zn
-Ni alloy) plating, washing with water (B) chromate treatment, and method 2 is (A) Zn on the glossy surface of the rolled copper foil.
(Or Zn-Ni alloy) plating, and after washing with water, (C) electrolytic zinc / chromium treatment is carried out, and thereafter both are subjected to surface treatment by washing with water → (D) silane coupling agent treatment → drying. did. The processing conditions of (A) to (D) were as follows: (A) Zn (or Zn-Ni alloy) plating Zn: 20 g / l Ni: zero or 10 g / l pH: 4 Temperature: 50 ° C Current density : 1A / dm 2 Plating time: 2 seconds (B) Chromate treatment (immersion chromate treatment) K 2 Cr 2 O 7 : 5g / l pH: 3 Temperature: 55 ° C Time: 8 seconds (C) Electrolytic zinc / chromium treatment K 2 Cr 2 O 7 : 5 g / l Zn: 0.5 g / l pH: 3 Bath temperature: 55 ° C. Current density: 0.5 A / dm 2 hours: 5 seconds (D) Silane coupling agent treatment 1% epoxysilane (Nippon Unicar Co., Ltd.): Product name A1
87) The solution was applied at room temperature.
【0025】比較例として、同じ圧延銅箔光沢面に上記
(D)のシランカップリング剤処理を実施しないことを
除いて上記と同条件で、即ち方法1及び方法2のみに従
い表面処理を施した。As a comparative example, the same rolled copper foil glossy surface was subjected to a surface treatment under the same conditions as described above except that the silane coupling agent treatment (D) was not carried out, that is, only in Method 1 and Method 2. .
【0026】実施例及び比較例の試験品を前述の方法に
従って耐湿性及びベーキング性試験に供した。結果を表
1に示す。The test articles of Examples and Comparative Examples were subjected to the moisture resistance and baking test according to the method described above. The results are shown in Table 1.
【0027】[0027]
【表1】 [Table 1]
【0028】(実施例II及び比較例II)実施例とし
て、圧延銅箔の光沢面に直接電解亜鉛・クロム処理を行
い、水洗後シランカップリング剤処理し、乾燥すること
により表面処理を施した。比較例として電解亜鉛・クロ
ム処理のみを行い、シランカップリング剤処理を省略し
た。電解亜鉛・クロム処理並びにシランカップリング剤
処理の条件は実施例Iに従った。結果を表2に示す。(Example II and Comparative Example II) As an example, electrolytic zinc / chromium treatment was directly applied to the glossy surface of a rolled copper foil, followed by washing with water, treatment with a silane coupling agent, and drying to perform surface treatment. . As a comparative example, only electrolytic zinc / chromium treatment was performed and the silane coupling agent treatment was omitted. The conditions of electrolytic zinc / chromium treatment and silane coupling agent treatment were in accordance with Example I. The results are shown in Table 2.
【0029】[0029]
【表2】 [Table 2]
【0030】表1及び2から、本発明に従う試験品は耐
湿性及びベーキング性に優れることが明らかである。シ
ランカップリング剤処理をしない場合には耐湿性及びベ
ーキング性に乏しい。From Tables 1 and 2 it is clear that the test articles according to the invention have excellent moisture resistance and baking properties. When the treatment with the silane coupling agent is not carried out, the moisture resistance and the baking property are poor.
【0031】[0031]
【発明の効果】銅箔の光沢面における長期保存性(耐湿
性)及び耐ヤケ性を改善し、湿度の高い夏場等の悪い環
境で長期保管されても酸化トラブルを起こさず、また従
来より高い温度での処理を可能とした。EFFECTS OF THE INVENTION The long-term storage property (moisture resistance) and burn resistance of the glossy surface of the copper foil are improved, oxidation trouble does not occur even when it is stored for a long time in a bad environment such as high humidity in the summer, and higher than before. Allowed treatment at temperature.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.5 識別記号 庁内整理番号 FI 技術表示箇所 C25D 11/38 305 H05K 1/09 A 6921−4E ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 5 Identification code Office reference number FI technical display location C25D 11/38 305 H05K 1/09 A 6921-4E
Claims (3)
合金めっきを施し、その後該Zn又はZn合金めっき表
面をクロメート処理し、更にクロメート処理表面をシラ
ンカップリング剤で処理することを特徴とする印刷回路
用銅箔の光沢面処理方法。1. Zn or Zn is applied to the glossy surface of a printed circuit copper foil.
A method for treating a shiny surface of a copper foil for a printed circuit, which comprises subjecting the Zn or Zn alloy-plated surface to a chromate treatment and then subjecting the chromate-treated surface to a silane coupling agent.
合金めっきを施し、その後該Zn又はZn合金めっき表
面に電解亜鉛・クロム処理によるクロム酸化物と亜鉛及
び(又は)亜鉛酸化物との混合皮膜を形成し、更に電解
亜鉛・クロム処理表面をシランカップリング剤で処理す
ることを特徴とする印刷回路用銅箔の光沢面処理方法。2. Zn or Zn is applied to the glossy surface of a printed circuit copper foil.
Alloy plating is performed, and then a mixed film of chromium oxide and zinc and / or zinc oxide is formed on the surface of the Zn or Zn alloy plating by electrolytic zinc / chromium treatment. A method for treating a glossy surface of a copper foil for a printed circuit, which comprises treating with a ring agent.
ロム処理によるクロム酸化物と亜鉛及び(又は)亜鉛酸
化物との混合皮膜を形成し、更に電解亜鉛・クロム処理
表面をシランカップリング剤で処理することを特徴とす
る印刷回路用銅箔の光沢面処理方法。3. A mixed film of chromium oxide and zinc and / or zinc oxide is formed by electrolytic zinc / chromium treatment on the glossy surface of a printed circuit copper foil, and the electrolytic zinc / chromium treated surface is further coated with a silane cup. A method for treating a glossy surface of a copper foil for a printed circuit, which comprises treating with a ring agent.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP04252007A JP3103683B2 (en) | 1992-08-28 | 1992-08-28 | Surface treatment method for copper foil for printed circuit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP04252007A JP3103683B2 (en) | 1992-08-28 | 1992-08-28 | Surface treatment method for copper foil for printed circuit |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0681157A true JPH0681157A (en) | 1994-03-22 |
JP3103683B2 JP3103683B2 (en) | 2000-10-30 |
Family
ID=17231274
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP04252007A Expired - Lifetime JP3103683B2 (en) | 1992-08-28 | 1992-08-28 | Surface treatment method for copper foil for printed circuit |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3103683B2 (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1214191A1 (en) * | 1998-09-10 | 2002-06-19 | Ga-Tek Inc. | Treated copper foil and process for making treated copper foil |
JP2003201585A (en) * | 2001-10-30 | 2003-07-18 | Nikko Materials Co Ltd | Surface treated copper foil |
JP2009105152A (en) * | 2007-10-22 | 2009-05-14 | Hitachi Cable Ltd | Copper foil for printed wiring board, and method of manufacturing the same |
JP2014208893A (en) * | 2013-03-28 | 2014-11-06 | 古河電気工業株式会社 | Surface-treated copper foil, method of treating surface of the copper foil, copper-clad laminate sheet and method of producing the laminate sheet |
-
1992
- 1992-08-28 JP JP04252007A patent/JP3103683B2/en not_active Expired - Lifetime
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1214191A1 (en) * | 1998-09-10 | 2002-06-19 | Ga-Tek Inc. | Treated copper foil and process for making treated copper foil |
EP1214191A4 (en) * | 1998-09-10 | 2006-11-08 | Nikko Materials Usa Inc | Treated copper foil and process for making treated copper foil |
JP2003201585A (en) * | 2001-10-30 | 2003-07-18 | Nikko Materials Co Ltd | Surface treated copper foil |
EP1441046A1 (en) * | 2001-10-30 | 2004-07-28 | Nikko Materials Company, Limited | SURFACE−TREATED COPPER FOIL |
US7651783B2 (en) * | 2001-10-30 | 2010-01-26 | Nikko Materials Co., Ltd. | Surface treated copper film |
JP2009105152A (en) * | 2007-10-22 | 2009-05-14 | Hitachi Cable Ltd | Copper foil for printed wiring board, and method of manufacturing the same |
JP2014208893A (en) * | 2013-03-28 | 2014-11-06 | 古河電気工業株式会社 | Surface-treated copper foil, method of treating surface of the copper foil, copper-clad laminate sheet and method of producing the laminate sheet |
Also Published As
Publication number | Publication date |
---|---|
JP3103683B2 (en) | 2000-10-30 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2849059B2 (en) | Processing method of copper foil for printed circuit | |
US5456817A (en) | Surface treatment method of a copper foil for printed circuits | |
US4387006A (en) | Method of treating the surface of the copper foil used in printed wire boards | |
JPH0787270B2 (en) | Copper foil for printed circuit and manufacturing method thereof | |
KR100613958B1 (en) | Surface-treated copper foil and copper-clad laminate for higher frequency applications | |
JPWO2011078077A1 (en) | Surface treated copper foil | |
JPH03119701A (en) | Electrically conductive material with resistance layer and printed circuit board with resistance layer | |
JPH0496395A (en) | Processing method for copper foil for printed circuit | |
JPH0685417A (en) | Surface treatment method for copper foil used for printed circuit | |
JP2517503B2 (en) | Surface treatment method for copper foil for printed circuits | |
JP3103683B2 (en) | Surface treatment method for copper foil for printed circuit | |
JPH07832B2 (en) | Copper foil for printed circuit and manufacturing method thereof | |
JP3367805B2 (en) | Processing method of copper foil for printed circuit | |
JPH0685455A (en) | Surface treatment of copper foil for printed circuit use | |
JP3067672B2 (en) | Copper foil for printed wiring board and method for producing the same | |
JPH0685416A (en) | Method for surface treatment of copper foil used for printed circuit | |
JP3564460B2 (en) | Copper foil for printed wiring board and method for producing the same | |
JPH02294490A (en) | Surface treatment for rolled copper foil | |
JP2875186B2 (en) | Processing method of copper foil for printed circuit | |
JPH0496393A (en) | Processing method for copper foil for printed circuit | |
JP2875187B2 (en) | Processing method of copper foil for printed circuit | |
JPH0732307B2 (en) | Surface treatment method for copper foil for printed circuits | |
JPH04338694A (en) | Copper foil for printed circuit and manufacture thereof | |
JP3113445B2 (en) | Copper foil for printed circuit and manufacturing method thereof | |
JPH0851281A (en) | Method for manufacture high-temperature large-expansion copper foil for printed circuit |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20000815 |
|
S533 | Written request for registration of change of name |
Free format text: JAPANESE INTERMEDIATE CODE: R313533 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20080825 Year of fee payment: 8 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20080825 Year of fee payment: 8 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20090825 Year of fee payment: 9 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20090825 Year of fee payment: 9 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100825 Year of fee payment: 10 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100825 Year of fee payment: 10 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110825 Year of fee payment: 11 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110825 Year of fee payment: 11 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313111 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110825 Year of fee payment: 11 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110825 Year of fee payment: 11 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120825 Year of fee payment: 12 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120825 Year of fee payment: 12 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130825 Year of fee payment: 13 |
|
EXPY | Cancellation because of completion of term | ||
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130825 Year of fee payment: 13 |