JPH0681155A - Method for plating laminated member - Google Patents

Method for plating laminated member

Info

Publication number
JPH0681155A
JPH0681155A JP25911792A JP25911792A JPH0681155A JP H0681155 A JPH0681155 A JP H0681155A JP 25911792 A JP25911792 A JP 25911792A JP 25911792 A JP25911792 A JP 25911792A JP H0681155 A JPH0681155 A JP H0681155A
Authority
JP
Japan
Prior art keywords
plating
treatment
composite member
etching
resin layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP25911792A
Other languages
Japanese (ja)
Inventor
Takashi Kanehiro
貴 金広
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KANEHIRO METALIZING YK
KANEHIRO METARAIJINGU KK
Original Assignee
KANEHIRO METALIZING YK
KANEHIRO METARAIJINGU KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by KANEHIRO METALIZING YK, KANEHIRO METARAIJINGU KK filed Critical KANEHIRO METALIZING YK
Priority to JP25911792A priority Critical patent/JPH0681155A/en
Publication of JPH0681155A publication Critical patent/JPH0681155A/en
Pending legal-status Critical Current

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  • Chemically Coating (AREA)

Abstract

PURPOSE:To enhance the adhesion of a plating layer to a synthetic resin layer by etching the resin layer without causing an excessive reaction and to carry out sure chemical nickel plating on the surface of the resin layer. CONSTITUTION:When a laminated member obtd. by forming a synthetic resin layer by baking on at least one side of a thin metallic sheet etched to a prescribed pattern is plated, it is baked by heating at 100-250 deg.C for 1-5hr, etched with an etching soln. of an inorg. acid at ordinary temp. to 45 deg.C and successively subjected to sensitivity imparting treatment, activation and chemical nickel plating.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】この発明は、例えば、アクセサリ
やペンダント等の装身具、エンブレム等の装飾用品、仏
具の飾りその他の各種の飾りとして用いられるような複
合部材に対するメッキ方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a plating method for a composite member such as an accessory such as an accessory or a pendant, a decorative article such as an emblem, an ornament for Buddhist altar, and other various ornaments.

【0002】[0002]

【従来の技術】従来、上述のような各種の飾りとして用
いるため、例えば肉厚0.1mmの黄銅(銅を主成分とす
るCu−Zn系合金およびこれに多少の他の元素を加え
た黄色の合金の総称で、いわゆる真ちゅう)またはりん
青銅(純銅にPを加えたもの)の金属薄板に対して、半
導体エッチング技術手段を応用して模様を形成し、この
模様が形成された金属薄板に6,6−ナイロン(正式に
はポリアミド66)の層を焼付形成し、質量感をもたせ
た複合部材が既に発明されている。
2. Description of the Related Art Conventionally, for use as various ornaments as described above, for example, brass having a thickness of 0.1 mm (a Cu--Zn alloy containing copper as a main component and a yellow color obtained by adding some other elements thereto) Is a general term for alloys of so-called brass) or phosphor bronze (pure copper plus P) metal thin plate, a pattern is formed by applying semiconductor etching technology means, and the metal thin plate on which the pattern is formed is formed. A composite member in which a layer of 6,6-nylon (formally polyamide 66) is formed by baking to give a sense of mass has already been invented.

【0003】そこで、上述の複合部材におけるポリアミ
ド66の表面に化学メッキ層を施して、メッキ処理後の
複合部材を上述の各種飾りとして用いる場合、化学ニッ
ケルメッキ処理の前処理工程として、複合部材における
ポリアミド66の表面をHNO3 (硝酸)またはH2
4 (硫酸)等のエッチング液でエッチング処理してメ
ッキ層の密着性を向上させることが考えられるが、メッ
キ前処理工程における上述のエッチング処理に、酸化性
酸(硝酸、クロム酸、混酸)や硫酸を用いるとポリアミ
ド66に対して過剰反応が生ずるので、処理時間の時間
設定を行なってもエッチング処理にばらつきが発生する
問題点があった。
Therefore, when a chemical plating layer is applied to the surface of the polyamide 66 in the above-mentioned composite member and the composite member after the plating treatment is used as the above-mentioned various ornaments, the pretreatment step of the chemical nickel plating treatment is performed in the composite member. The surface of polyamide 66 is HNO 3 (nitric acid) or H 2 S
It is possible to improve the adhesion of the plating layer by etching with an etching solution such as O 4 (sulfuric acid). However, an oxidizing acid (nitric acid, chromic acid, mixed acid) may be added to the above-mentioned etching treatment in the plating pretreatment step. When sulfuric acid or sulfuric acid is used, an excessive reaction occurs with respect to the polyamide 66, so that there is a problem in that the etching process varies even if the processing time is set.

【0004】一方、上述の複合部材に対して化学ニッケ
ルメッキ処理等の表面処理を行なう場合、黄銅またはり
ん青銅の金属薄板と、ポリアミド66の合成樹脂焼付層
との熱膨張係数の差異により、メッキ層が剥離する問題
点があった。
On the other hand, when the above-mentioned composite member is subjected to surface treatment such as chemical nickel plating, plating is performed due to the difference in thermal expansion coefficient between the brass or phosphor bronze thin metal plate and the polyamide 66 synthetic resin baking layer. There was a problem that the layers peeled off.

【0005】[0005]

【発明が解決しようとする課題】この発明は、複合部材
に対してベーキング(baking)処理と、無機酸によるエ
ッチング処理とを施すことで、上述のベーキング処理に
より、金属薄板に焼付形成された合成樹脂層に対する熱
固定を行ない、その後の表面処理の最高処理温度条件下
における合成樹脂層の収縮を防止しつつ、合成樹脂層の
変質を最小に抑制し、また上述のエッチング処理によ
り、過剰反応をおこすことなく、合成樹脂層をエッチン
グしてメッキ層の密着性向上を図り、合成樹脂層の表面
に確実な化学ニッケルメッキを行なうことができる複合
部材に対するメッキ方法の提供を目的とする。
SUMMARY OF THE INVENTION According to the present invention, a composite member formed by baking on a thin metal plate is subjected to a baking treatment and an etching treatment with an inorganic acid by the above-mentioned baking treatment. Performs heat fixing to the resin layer, prevents shrinkage of the synthetic resin layer under the maximum treatment temperature conditions of the subsequent surface treatment, suppresses alteration of the synthetic resin layer to the minimum, and also prevents excessive reaction by the above-mentioned etching treatment. An object of the present invention is to provide a plating method for a composite member, which can improve the adhesion of the plating layer by etching the synthetic resin layer without causing the above and can perform reliable chemical nickel plating on the surface of the synthetic resin layer.

【0006】[0006]

【課題を解決するための手段】この発明は、所定の模様
形状にエッチングされた金属薄板の少なくとも片面に合
成樹脂層が焼付形成された複合部材に対するメッキ方法
であって、上記複合部材を加熱温度100〜250℃、
加熱時間1〜5時間の範囲内でベーキング処理する第1
の工程と、上記ベーキング処理後の複合部材を、液温が
常温〜45℃の無機酸のエッチング液で1〜15分間エ
ッチング処理する第2の工程と、上記第2の工程のエッ
チング処理後における複合部材に対して感受性付与処
理、活性化処理および化学ニッケルメッキ処理をこの順
に施す工程とを備えた複合部材に対するメッキ方法であ
ることを特徴とする。
SUMMARY OF THE INVENTION The present invention is a plating method for a composite member having a synthetic resin layer baked on at least one surface of a thin metal plate etched into a predetermined pattern shape. 100-250 ℃,
Baking treatment within the range of heating time 1 to 5 hours 1st
And a second step of etching the composite member after the baking treatment with an etching solution of an inorganic acid having a liquid temperature of room temperature to 45 ° C. for 1 to 15 minutes, and after the etching treatment of the second step. A plating method for a composite member, comprising a step of subjecting the composite member to a sensitization treatment, an activation treatment, and a chemical nickel plating treatment in this order.

【0007】[0007]

【発明の効果】この発明によれば、所定の模様形状にエ
ッチングされた金属薄板の少なくとも片面に合成樹脂層
が焼付形成された複合部材に対して、上述の第1の工程
で、複合部材を加熱温度100〜250℃、加熱時間1
〜5時間の範囲内でベーキング処理し、合成樹脂層の熱
固定を行なうので、その後の表面処理の最高処理温度条
件下における該合成樹脂層の収縮を防止しつつ、この合
成樹脂層の変質を最小に抑制することができる。
According to the present invention, a composite member formed by baking a synthetic resin layer on at least one side of a thin metal plate etched into a predetermined pattern is formed by the above-mentioned first step. Heating temperature 100-250 ℃, heating time 1
Since the baking treatment is performed within a range of up to 5 hours to heat-set the synthetic resin layer, the synthetic resin layer is prevented from shrinking under the maximum treatment temperature condition of the subsequent surface treatment, and the deterioration of the synthetic resin layer is prevented. It can be suppressed to a minimum.

【0008】また上述のベーキング処理後の複合部材
を、第2の工程において液温が常温〜45℃の無機酸、
特にHCl(塩酸)のエッチング液で1〜15分間エッ
チングするので、過剰反応の発生がなく、合成樹脂層を
良好にエッチングすることができ、後工程でのメッキ層
の密着性向上を図ることができる。したがって、上述の
複合部材における合成樹脂層の表面に確実な化学ニッケ
ルメッキを行なうことができる効果がある。
In the second step, the composite member after the above baking treatment is treated with an inorganic acid having a liquid temperature of room temperature to 45 ° C.
In particular, since the etching is performed with an etching solution of HCl (hydrochloric acid) for 1 to 15 minutes, an excessive reaction does not occur, the synthetic resin layer can be satisfactorily etched, and the adhesion of the plating layer in the subsequent step can be improved. it can. Therefore, there is an effect that reliable chemical nickel plating can be performed on the surface of the synthetic resin layer in the above-mentioned composite member.

【0009】なお、上述の化学ニッケルメッキ処理の
後、複合部材の使用目的に応じて金メッキ、銀メッキ、
銅メッキ等のメッキ処理が既存のメッキ方法により施さ
れ、複合部材は各種の飾りとして用いられる。
After the above-described chemical nickel plating treatment, gold plating, silver plating,
The plating treatment such as copper plating is performed by the existing plating method, and the composite member is used as various ornaments.

【0010】[0010]

【実施例】この発明の一実施例を以下図面に基づいて詳
述する。図面は複合部材に対するメッキ方法を示し、図
1に示す工程図の第1工程S1で、肉厚が約0.1mmの
黄銅またはりん青銅の金属薄板1(図2参照)に所定の
模様形状をエッチング手段により施す。すなわち、上述
の金属薄板1上の模様として残すべき部分にエッチング
レジストを写真法により塗布し、このレジストが塗布さ
れた金属薄板1をエッチングすると、エッチングレジス
ト塗布部分以外の金属薄板1がエッチングされるので、
上述のレジストの剥離後において、例えば図6に示すよ
うな所定の模様形状を備えた金属薄板1を得ることがで
きる(図3参照)。この金属薄板1は図3に示すように
多数の模様開口部2を有する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described in detail below with reference to the drawings. The drawing shows a plating method for a composite member. In the first step S1 of the process chart shown in FIG. 1, a predetermined pattern shape is formed on a metal thin plate 1 of brass or phosphor bronze having a thickness of about 0.1 mm (see FIG. 2). It is applied by etching means. That is, when an etching resist is applied to a portion which should be left as a pattern on the above-described metal thin plate 1 by a photographic method and the metal thin plate 1 coated with this resist is etched, the metal thin plate 1 other than the etching resist applied portion is etched. So
After the resist is peeled off, the metal thin plate 1 having a predetermined pattern shape as shown in FIG. 6 can be obtained (see FIG. 3). This thin metal plate 1 has a large number of pattern openings 2 as shown in FIG.

【0011】次に図1に示す工程図の第2工程S2で、
上述の金属薄板1の両面にポリアミド66の合成樹脂層
3(図4参照)を焼付形成して、質量感を有する複合部
材4を形成する。
Next, in the second step S2 of the process diagram shown in FIG.
The synthetic resin layer 3 of polyamide 66 (see FIG. 4) is formed on both surfaces of the above-mentioned thin metal plate 1 by baking to form the composite member 4 having a sense of mass.

【0012】次に図1に示す工程図の第3工程(S3)
で、上述の複合部材4を加熱温度100〜250℃、望
ましくは150℃、加熱時間1〜5時間、望ましくは2
時間の条件下でベーキング(baking)処理する。このベ
ーキング処理によりポリアミド66の熱固定が行なわれ
るので、その後の表面処理の最高処理温度条件下におけ
るポリアミド66の収縮を防止しつつ、このポリアミド
66の変質を最小に抑制することができる。
Next, the third step (S3) of the process chart shown in FIG.
Then, the above-mentioned composite member 4 is heated at a temperature of 100 to 250 ° C., preferably 150 ° C., and a heating time of 1 to 5 hours, preferably 2
Baking is performed under the condition of time. Since the polyamide 66 is heat-set by this baking treatment, it is possible to minimize the deterioration of the polyamide 66 while preventing the polyamide 66 from shrinking under the maximum treatment temperature condition of the subsequent surface treatment.

【0013】次に図1に示す工程図の第4工程S4で、
上述のベーキング処理後の複合部材4を、液温が常温〜
45℃の無機酸のエッチング液で1〜15分間エッチン
グ処理する。より厳密には、無機酸として35%濃度の
濃塩酸(HCl)の単体を用い、この塩酸の30vol
%の溶液をエッチング液とし、液温30℃で、約8分間
エッチング処理する。このHClを用いることで、過剰
反応の発生がなく、ポリアミド66を良好にエッチング
することができ、後工程でのメッキ層の密着性向上を図
ることができる。
Next, in a fourth step S4 of the process diagram shown in FIG.
The liquid temperature of the composite member 4 after the above baking treatment is from room temperature to
Etching is performed for 1 to 15 minutes with an inorganic acid etching solution at 45 ° C. More strictly, a simple substance of concentrated hydrochloric acid (HCl) having a concentration of 35% is used as the inorganic acid, and 30 vol.
% Solution as an etching solution, and etching is performed at a liquid temperature of 30 ° C. for about 8 minutes. By using this HCl, it is possible to satisfactorily etch the polyamide 66 without causing an excessive reaction, and it is possible to improve the adhesion of the plating layer in a subsequent step.

【0014】次に図1に示す工程図の第5工程S5で、
塩化パラジウムと塩酸とを用いて、上述のエッチング処
理終了後のポリアミド66の表面に塩化パラジウムの分
子を付着させる感受性付与処理を実行する。
Next, in a fifth step S5 of the process chart shown in FIG.
Using palladium chloride and hydrochloric acid, a sensitization treatment for attaching molecules of palladium chloride to the surface of polyamide 66 after the above-described etching treatment is performed.

【0015】次に図1に示す工程図の第6工程S6で、
上述の第5工程S5までの処理が完了した複合部材4
を、第1塩化スズおよび塩酸を含む液中に入れて、Cl
(塩素)をとってパラジウムpdを金属化する活性化処
理を実行する。なお、この工程は必要に応じて2〜3回
繰返してもよい。
Next, in a sixth step S6 of the process diagram shown in FIG.
The composite member 4 that has been processed up to the fifth step S5 described above.
Is placed in a liquid containing stannous chloride and hydrochloric acid, and Cl
(Chlorine) is removed to perform an activation treatment for metallizing the palladium pd. Note that this step may be repeated 2-3 times if necessary.

【0016】次に図1に示す工程図の第7工程S7で、
上述の第6工程S6までの処理が完了した複合部材4
を、次に示す組成のメッキ液中に浸漬して、化学メッキ
(無電解メッキ)によって、Ni(ニッケル)とpd
(パラジウム)とを置換させて、厚さ約0.1〜0.2
μの化学ニッケルメッキ層5(図5参照)を形成する。
Next, in a seventh step S7 of the process chart shown in FIG.
Composite member 4 for which the processing up to the sixth step S6 described above has been completed
Is dipped in a plating solution having the following composition, and chemical plating (electroless plating) is performed to obtain Ni (nickel) and pd.
(Palladium) to replace the thickness of about 0.1-0.2
A μ chemical nickel plating layer 5 (see FIG. 5) is formed.

【0017】化学ニッケルメッキ液の組成 硫酸ニッケル……………………5g/l 次亜リン酸ソーダ(還元剤)…30g/l 安定剤……………………………微量 このように上述の第7工程S7での化学ニッケルメッキ
処理の前処理工程として、上述のベーキング処理および
塩酸によるエッチング処理を実行するので、複合部材4
におけるポリアミド66の合成樹脂層3の表面に確実な
化学ニッケルメッキ層5を形成することができる。
Composition of chemical nickel plating solution Nickel sulfate: 5g / l Sodium hypophosphite (reducing agent): 30g / l Stabilizer: ..... As described above, since the above-mentioned baking treatment and etching treatment with hydrochloric acid are executed as the pretreatment step of the chemical nickel plating treatment in the above-mentioned seventh step S7, the composite member 4
It is possible to form a reliable chemical nickel plating layer 5 on the surface of the synthetic resin layer 3 of polyamide 66.

【0018】なお、上述の化学ニッケルメッキ処理の次
工程で硫酸銅メッキ処理を行ない、この硫酸銅メッキ処
理後に光沢を有するニッケルメッキまたはつや消しニッ
ケルメッキ処理を施し、次に飾りの用途に応じて金メッ
キ、銀メッキ、黒ニッケルメッキまたは銅メッキを施す
ので、これらの各メッキ処理について付記する。
Incidentally, copper sulfate plating is carried out in the next step of the above-mentioned chemical nickel plating, and after this copper sulfate plating is carried out luster nickel plating or matte nickel plating, and then gold plating depending on the purpose of decoration. Since silver plating, black nickel plating or copper plating is performed, each of these plating treatments will be additionally described.

【0019】上述の硫酸銅メッキに用いるメッキ液の組
成およびメッキ条件は次の通りである。 硫酸銅メッキ液の組成および条件 硫酸銅(CuSO4 )…180〜200g/l 硫酸(H2 SO4 ) …50〜70g/l 液温度 …25℃ 電流密度 …0.5〜2A/dm2 上述のメッキ液にて電気メッキを行なうと、電解反応に
より金属塩溶液としてのメッキ液から金属を析出して、
上述の化学ニッケルメッキ層5の表面に対して硫酸銅メ
ッキを施すことができる。なお、メッキ時間は表面光沢
がでるまでに要する時間で、通常15〜30分間であ
る。
The composition of the plating solution used for the above copper sulfate plating and the plating conditions are as follows. Composition and Conditions of Copper Sulfate Plating Solution Copper Sulfate (CuSO 4 ) ... 180-200 g / l Sulfuric Acid (H 2 SO 4 ) ... 50-70 g / l Solution Temperature ... 25 ° C. Current Density ... 0.5-2 A / dm 2 Above When electroplating is performed with the plating solution of, the metal is deposited from the plating solution as the metal salt solution by an electrolytic reaction,
Copper sulfate plating may be applied to the surface of the above-mentioned chemical nickel plating layer 5. The plating time is the time required for the surface gloss to appear, and is usually 15 to 30 minutes.

【0020】また上述の硫酸銅メッキ層の表面に光沢を
有するニッケルメッキ層を形成する場合、このニッケル
メッキに用いるメッキ液の組成およびメッキ条件は次の
通りである。 ニッケルメッキ液の組成および条件 硫酸ニッケル(NiSO4 ・6H2 O)…240g/l 塩化ニッケル(NiCl2 ・6H2 O)…45g/l ホウ酸 …45g/l 光沢剤 …適量 液温度 …45℃ 電流密度 …0.5〜3.0A/dm2 上述のメッキ液にて約10分間、電気メッキを行なう
と、硫酸銅メッキ層の表面に、所定厚さの光沢を有する
ニッケルメッキ層を形成することができる。
When forming a nickel plating layer having gloss on the surface of the copper sulfate plating layer, the composition of the plating solution used for this nickel plating and the plating conditions are as follows. The composition and conditions nickel sulfate of nickel plating solution (NiSO 4 · 6H 2 O) ... 240g / l nickel chloride (NiCl 2 · 6H 2 O) ... 45g / l boric acid ... 45 g / l brightener ... qs fluid temperature ... 45 ° C. Current density: 0.5 to 3.0 A / dm 2 When electroplating is performed for about 10 minutes with the above plating solution, a nickel plating layer having a predetermined thickness of gloss is formed on the surface of the copper sulfate plating layer. be able to.

【0021】一方、上述の硫酸銅メッキ層の表面につや
消しニッケルメッキ層を形成する場合、このニッケルメ
ッキに用いるメッキ液の組成およびメッキ条件は次の通
りである。 ニッケメッキ液の組成および条件 硫酸ニッケル…450g/l 塩化ニッケル…45g/l ホウ酸 …45g/l 電流密度 …0.5〜1.5A/dm2 上述のメッキ液にて約6〜8分間、電気メッキを行なう
と、硫酸銅メッキ層の表面に、所定厚さのつや消しニッ
ケルメッキ層を形成することができる。
On the other hand, when a matte nickel plating layer is formed on the surface of the above copper sulfate plating layer, the composition of the plating solution used for this nickel plating and the plating conditions are as follows. Nickel Sulfate Composition and Conditions Nickel Sulfate ... 450 g / l Nickel Chloride ... 45 g / l Boric Acid ... 45 g / l Current Density ... 0.5 to 1.5 A / dm 2 About 6 to 8 minutes with the above plating solution, electricity By plating, a matte nickel plating layer having a predetermined thickness can be formed on the surface of the copper sulfate plating layer.

【0022】また上述の光沢を有するニッケルメッキあ
るいはつや消しニッケルメッキ層の表面に表面メッキ層
として金メッキ層を形成する場合、この金メッキに用い
るメッキ液の組成および条件は次の通りである。 金メッキ液の組成および条件 第1シアン化金カリ…1.5g/l クエン酸 …30g/l クエン酸カリ …50g/l PH …3.8〜4.5 液温度 …50℃〜60℃ 電流密度 …0.2〜0.5A/dm2 上述のメッキ液にてメッキ層厚に応じてメッキ時間を調
整すると、ニッケルメッキ層の表面に金メッキ層を形成
することができる。例えばメッキ時間を20秒に設定す
ると、約0.05μの厚さを有する金メッキ層を形成す
ることができる。
When a gold plating layer is formed as a surface plating layer on the surface of the nickel plating or matte nickel plating layer having the above-mentioned luster, the composition and conditions of the plating solution used for this gold plating are as follows. Composition and Conditions of Gold Plating Solution First gold cyanide cyanide… 1.5 g / l citric acid… 30 g / l potassium citrate… 50 g / l PH… 3.8 to 4.5 Solution temperature… 50 ° C. to 60 ° C. Current density 0.2 to 0.5 A / dm 2 A gold plating layer can be formed on the surface of the nickel plating layer by adjusting the plating time with the above plating solution according to the plating layer thickness. For example, if the plating time is set to 20 seconds, a gold plating layer having a thickness of about 0.05μ can be formed.

【0023】さらに上述の光沢を有するニッケルメッキ
層あるいはつや消しニッケルメッキ層の表面に表面メッ
キ層として銀メッキ層を形成する場合、この銀メッキに
用いるメッキ液の組成および条件は次の通りである。 銀メッキ液の組成および条件 第1青化銀(第1シアン化銀のこと)…15g/l 青化ソーダ(シアン化ソーダのこと)…30g/l PH …管理不可 液温度 …30〜50℃ 電流密度 …0.2〜0.5A/dm2 上述のメッキ液にて例えば約30〜60秒間、電気メッ
キを行なうと、ニッケルメッキ層の表面に、厚さ約1μ
の銀メッキ層を形成することができる。
Furthermore, when a silver plating layer is formed as a surface plating layer on the surface of the above-mentioned glossy nickel plating layer or matte nickel plating layer, the composition and conditions of the plating solution used for this silver plating are as follows. Composition and conditions of silver plating solution 1st silver cyanide (1st silver cyanide) ... 15g / l Sodium blue cyanide (sodium cyanide) ... 30g / l PH ... Uncontrollable liquid temperature ... 30-50 ° C Current density: 0.2 to 0.5 A / dm 2 When electroplating is performed with the above plating solution for, for example, about 30 to 60 seconds, the surface of the nickel plating layer has a thickness of about 1 μm.
The silver plating layer can be formed.

【0024】さらにまた、上述の光沢を有するニッケル
メッキ層あるいはつや消しニッケルメッキ層の表面に表
面メッキ層として黒ニッケルメッキ層を形成する場合、
この黒ニッケルメッキに用いるメッキ液の組成および条
件は次の通りである。 黒ニッケルメッキ液の組成および条件 硫酸ニッケルアンモニウム…15g/l ロッシェル塩 …10g/l 液温度 …30〜35℃ 電流密度 …0.05〜0.2A/dm2 上述のメッキ液にて例えば約2分間、電気メッキを行な
うと、ニッケルメッキ層の表面に、厚さ1μ以下の黒ニ
ッケルメッキ層を形成することができる。
Furthermore, when a black nickel plating layer is formed as a surface plating layer on the surface of the above-mentioned glossy nickel plating layer or matte nickel plating layer,
The composition and conditions of the plating solution used for this black nickel plating are as follows. The composition and conditions nickel ammonium sulfate black nickel plating solution ... 15 g / l Rochelle salt ... 10 g / l solution temperature ... 30 to 35 ° C. Current density ... 0.05~0.2A / dm 2 by the above-mentioned plating solution such as about 2 When electroplating is performed for a minute, a black nickel plating layer having a thickness of 1 μm or less can be formed on the surface of the nickel plating layer.

【0025】このようにして、図1に示す第7工程S7
までの処理乃至表面メッキ層の形成処理が完了した複合
部材4(図6に示す完成品)はアクセサリやペンダント
等の装身具その他の各種の飾りとして用いられる。
In this way, the seventh step S7 shown in FIG.
The composite member 4 (finished product shown in FIG. 6) that has been subjected to the above processing or the surface plating layer forming processing is used as accessories such as accessories and pendants and various other decorations.

【0026】一方、図3に示すエッチング処理終了後の
金属薄板1の片面のみに上述の各種処理を施した複合部
材4を、図7に示す如くガラス板6や布(図示せず)等
に接着すると、エンブレムその他の装飾用品として用い
ることもできる。
On the other hand, as shown in FIG. 7, the composite member 4 obtained by performing the above-mentioned various treatments on only one surface of the thin metal plate 1 after the etching treatment shown in FIG. 3 is applied to a glass plate 6 or a cloth (not shown). When bonded, it can also be used as an emblem or other decorative article.

【0027】以上要するに、所定の模様形状(図6参
照)にエッチングされた金属薄板1の少なくとも片面に
合成樹脂層3が焼付き形成された複合部材4に対して、
上述の第3工程S3で、複合部材4を加熱温度100〜
250℃、加熱時間1〜5時間の範囲内でベーキング処
理し、合成樹脂層3の熱固定を行なうので、その後の表
面処理の最高処理温度条件下における該合成樹脂層3の
収縮を防止しつつ、この合成樹脂層3の変質を最小に抑
制することができる。
In summary, the composite member 4 in which the synthetic resin layer 3 is burned and formed on at least one surface of the metal thin plate 1 etched into a predetermined pattern shape (see FIG. 6),
In the above-described third step S3, the heating temperature of the composite member 4 is 100 to 100
Since the synthetic resin layer 3 is heat-set by baking at 250 ° C. for a heating time of 1 to 5 hours, the synthetic resin layer 3 is prevented from shrinking under the maximum treatment temperature condition of the subsequent surface treatment. The deterioration of the synthetic resin layer 3 can be suppressed to the minimum.

【0028】また上述のベーキング処理後の複合部材4
を、第4工程S4において液温が常温〜45℃の無機
酸、特にHCl(塩酸)のエッチング液で1〜15分間
エッチングするので、過剰反応の発生がなく、合成樹脂
層3を良好にエッチングすることができ、後工程でのメ
ッキ層5の密着性向上を図ることができる。したがっ
て、上述の複合部材4における合成樹脂層3の表面に確
実な化学ニッケルメッキを行なうことができる効果があ
る。
Further, the composite member 4 after the above baking treatment
In the fourth step S4, since the etching is carried out for 1 to 15 minutes with an inorganic acid having a liquid temperature of room temperature to 45 ° C., particularly HCl (hydrochloric acid) for 1 to 15 minutes, an excessive reaction does not occur and the synthetic resin layer 3 is well etched. It is possible to improve the adhesion of the plated layer 5 in the subsequent step. Therefore, there is an effect that the surface of the synthetic resin layer 3 in the above-mentioned composite member 4 can be reliably subjected to chemical nickel plating.

【0029】この発明の構成と、上述の実施例との対応
において、この発明の第1の工程は、上述の実施例の第
3工程S3に対応し、以下同様に、第2の工程は、第4
工程S4に対応し、感受性付与処理は、第5工程S5に
対応し、活性化処理は、第6工程S6に対応し、化学ニ
ッケルメッキ処理は、第7工程S7に対応するも、この
発明は、上述の実施例の構成のみに限定されるものでは
ない。
In the correspondence between the configuration of the present invention and the above-described embodiment, the first step of the present invention corresponds to the third step S3 of the above-mentioned embodiment, and the same applies to the second step. Fourth
The invention corresponds to the step S4, the sensitization process corresponds to the fifth process S5, the activation process corresponds to the sixth process S6, and the chemical nickel plating process corresponds to the seventh process S7. However, the configuration is not limited to the above-mentioned embodiment.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の複合部材に対するメッキ方法を示す工
程図。
FIG. 1 is a process drawing showing a plating method for a composite member of the present invention.

【図2】金属薄板のエッチング前の状態を示す断面図。FIG. 2 is a sectional view showing a state before etching a thin metal plate.

【図3】金属薄板のエッチング後の状態を示す断面図。FIG. 3 is a cross-sectional view showing a state after etching a thin metal plate.

【図4】合成樹脂層の焼付き後の状態を示す断面図。FIG. 4 is a cross-sectional view showing a state after the synthetic resin layer is seized.

【図5】化学ニッケルメッキ処理終了後の状態を示す拡
大断面図。
FIG. 5 is an enlarged cross-sectional view showing a state after the completion of the chemical nickel plating process.

【図6】模様形状の一例を示す説明図。FIG. 6 is an explanatory diagram showing an example of a pattern shape.

【図7】完成された複合部材の一例を示す説明図。FIG. 7 is an explanatory view showing an example of a completed composite member.

【符号の説明】[Explanation of symbols]

1…金属薄板 3…合成樹脂層 4…複合部材 5…化学ニッケルメッキ層 1 ... Metal thin plate 3 ... Synthetic resin layer 4 ... Composite member 5 ... Chemical nickel plating layer

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】所定の模様形状にエッチングされた金属薄
板の少なくとも片面に合成樹脂層が焼付形成された複合
部材に対するメッキ方法であって、上記複合部材を加熱
温度100〜250℃、加熱時間1〜5時間の範囲内で
ベーキング処理する第1の工程と、上記ベーキング処理
後の複合部材を、液温が常温〜45℃の無機酸のエッチ
ング液で1〜15分間エッチング処理する第2の工程
と、上記第2の工程のエッチング処理後における複合部
材に対して感受性付与処理、活性化処理および化学ニッ
ケルメッキ処理をこの順に施す工程とを備えた複合部材
に対するメッキ方法。
1. A plating method for a composite member in which a synthetic resin layer is formed by baking on at least one surface of a thin metal plate etched into a predetermined pattern shape, wherein the composite member is heated at a temperature of 100 to 250 ° C. for a heating time of 1 ~ The first step of performing a baking treatment within a range of 5 hours, and the second step of etching the composite member after the baking treatment with an etching solution of an inorganic acid having a liquid temperature of room temperature to 45 ° C for 1 to 15 minutes And a step of subjecting the composite member after the etching treatment of the second step to a sensitivity imparting treatment, an activation treatment and a chemical nickel plating treatment in this order, a plating method for the composite member.
JP25911792A 1992-09-01 1992-09-01 Method for plating laminated member Pending JPH0681155A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25911792A JPH0681155A (en) 1992-09-01 1992-09-01 Method for plating laminated member

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25911792A JPH0681155A (en) 1992-09-01 1992-09-01 Method for plating laminated member

Publications (1)

Publication Number Publication Date
JPH0681155A true JPH0681155A (en) 1994-03-22

Family

ID=17329555

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25911792A Pending JPH0681155A (en) 1992-09-01 1992-09-01 Method for plating laminated member

Country Status (1)

Country Link
JP (1) JPH0681155A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7644605B2 (en) 2005-09-22 2010-01-12 Fujitsu Limited External force detection method, external force detector and electronic device
JP2018527460A (en) * 2015-07-30 2018-09-20 ビーエーエスエフ ソシエタス・ヨーロピアBasf Se Pretreatment method of plastic surface for plating

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7644605B2 (en) 2005-09-22 2010-01-12 Fujitsu Limited External force detection method, external force detector and electronic device
JP2018527460A (en) * 2015-07-30 2018-09-20 ビーエーエスエフ ソシエタス・ヨーロピアBasf Se Pretreatment method of plastic surface for plating

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