JPH0676599A - Semiconductor memory - Google Patents

Semiconductor memory

Info

Publication number
JPH0676599A
JPH0676599A JP4229083A JP22908392A JPH0676599A JP H0676599 A JPH0676599 A JP H0676599A JP 4229083 A JP4229083 A JP 4229083A JP 22908392 A JP22908392 A JP 22908392A JP H0676599 A JPH0676599 A JP H0676599A
Authority
JP
Japan
Prior art keywords
word lines
test
row selection
lines
level
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4229083A
Other languages
Japanese (ja)
Other versions
JP2972455B2 (en
Inventor
Shinichirou Usui
▲真▼市郎 薄井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC IC Microcomputer Systems Co Ltd
Original Assignee
NEC IC Microcomputer Systems Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC IC Microcomputer Systems Co Ltd filed Critical NEC IC Microcomputer Systems Co Ltd
Priority to JP4229083A priority Critical patent/JP2972455B2/en
Publication of JPH0676599A publication Critical patent/JPH0676599A/en
Application granted granted Critical
Publication of JP2972455B2 publication Critical patent/JP2972455B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • For Increasing The Reliability Of Semiconductor Memories (AREA)

Abstract

PURPOSE:To shorten a burn-in test time by shortening the time for selecting all word lines. CONSTITUTION:A row selecting circuit 2 is operated by ordinary operation selecting one line among plural word lines WL1-WL4 according to an address signal AD when test row selecting signals PHI1, PHI2 are in an inactive state and separated from all word lines when test row selecting signals PHI1, PHI2 are in an active state. A selecting circuit 3 for a test row simultaneously selecting at least two lines among plural word lines WL1-WL4 according to the test row selecting signals PHI1, PHI2 while being separated from all word lines in the inactive state is provided.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は半導体記憶装置に関し、
特にバーンインテスト時にワード線を選択レベルにして
データの書込み,読出しを行う構成の半導体記憶装置に
関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor memory device,
In particular, the present invention relates to a semiconductor memory device having a structure in which a word line is set to a selection level during a burn-in test to write and read data.

【0002】[0002]

【従来の技術】従来、半導体記憶装置のバーンインテス
トでは、高温の雰囲気中で電源電圧の高バイアスを印加
し、読出し動作や書込み動作を行って各回路素子や配線
にストレスをかける。
2. Description of the Related Art Conventionally, in a burn-in test of a semiconductor memory device, a high bias of a power supply voltage is applied in a high temperature atmosphere to perform a read operation or a write operation to stress each circuit element or wiring.

【0003】図3は従来のこの種の半導体記憶装置の一
例を示す回路図である。
FIG. 3 is a circuit diagram showing an example of a conventional semiconductor memory device of this type.

【0004】この半導体記憶装置は、複数のワード線W
L1〜WL4、これらワード線WL1〜WL4と絶縁し
て交差する複数のディジット線DL11,DL12,D
L21,DL22、並びにワード線WL1〜WL4及び
ディジット線DL11,DL12,DL21,DL22
の所定の交差部に設けられ対応するワード線が選択レベ
ルのとき対応するディジット線に伝達されたデータを書
込み記憶し記憶しているデータを対応するディジット線
に読出す複数のメモリセルMC11〜MC14,MC2
1〜MC24を備えたメモリセルアレイ1と、ディジッ
ト線DL11,DL12間、DL21,DL22間の差
電位を増幅するセンス増幅器SA1,SA2と、ワード
線駆動信号RAが活性化状態のときアドレス信号ADに
従って複数のワード線WL1〜WL4のうちの1本を選
択レベルにする行選択回路2aとを有する構成となって
いる。
This semiconductor memory device has a plurality of word lines W.
L1 to WL4 and a plurality of digit lines DL11, DL12, D that are insulated from and cross the word lines WL1 to WL4.
L21, DL22, word lines WL1 to WL4 and digit lines DL11, DL12, DL21, DL22
A plurality of memory cells MC11 to MC14 which are provided at predetermined crossing points of the corresponding word lines and write and store the data transmitted to the corresponding digit lines when the corresponding word lines are at the selected level and read the stored data to the corresponding digit lines. , MC2
1 to MC24, the sense amplifiers SA1 and SA2 for amplifying the difference potentials between the digit lines DL11 and DL12, DL21 and DL22, and the address signal AD when the word line drive signal RA is activated. The row selection circuit 2a has a configuration in which one of the plurality of word lines WL1 to WL4 is set to a selection level.

【0005】次にこの半導体記憶装置のバーンインテス
トにおける動作について説明する。
Next, the operation of the semiconductor memory device in the burn-in test will be described.

【0006】バーンインテストにおいても、行選択回路
2aにより選択されるワード線は通常動作と同様に1本
ずつである。例えば、ワード線WL1が選択され選択レ
ベルになると、メモリセルMC11,MC21が選択状
態となりそのトランジスタQsがオンとなり、ディジッ
ト線DL11,DL21のデータが容量素子Csに蓄え
られ、また、蓄えられていたデータがディジット線DL
11,DL21に伝達される。
Also in the burn-in test, the word lines selected by the row selection circuit 2a are one by one as in the normal operation. For example, when the word line WL1 is selected and becomes the selected level, the memory cells MC11 and MC21 are selected and the transistor Qs thereof is turned on, and the data of the digit lines DL11 and DL21 are stored in the capacitive element Cs and are stored. Data is digit line DL
11, transmitted to the DL 21.

【0007】そしてこの動作が、高温,高バイアス電源
電圧の下で、全ワード線に対して順次行なわれ、全メモ
リセル,配線に対してストレスが与えられる。
This operation is sequentially performed on all word lines under high temperature and high bias power supply voltage, and stress is applied to all memory cells and wirings.

【0008】[0008]

【発明が解決しようとする課題】この従来の半導体記憶
装置では、バーンインテストにおいてもワード線を1本
ずつ順次選択し、全ワード線と接続するメモリセルにス
トレスを与える構成となっているので、バーンインテス
トの時間が長くなるという問題点があった。
In the conventional semiconductor memory device, the word lines are sequentially selected one by one even in the burn-in test, and the memory cells connected to all the word lines are stressed. There is a problem that the burn-in test takes a long time.

【0009】本発明の目的は、バーンインテストの時間
を短縮することができる半導体記憶装置を提供すること
にある。
An object of the present invention is to provide a semiconductor memory device capable of shortening the burn-in test time.

【0010】[0010]

【課題を解決するための手段】本発明の半導体記憶装置
は、複数のワード線、これらワード線と絶縁して交差す
る複数のディジット線、並びに前記ワード線及びディジ
ット線の交差部に設けられ対応するワード線が選択レベ
ルのとき対応するディジット線に伝達されたデータを書
込み記憶し記憶しているデータを対応するディジット線
に読出す複数のメモリセルを備えたメモリセルアレイ
と、所定のテストモード時活性化状態となるテスト行選
択信号が非活性状態のときはアドレス信号に従って前記
複数のワード線のうちの1本を選択レベルとし、活性化
状態のときは前記複数のワード線との間を絶縁状態とす
る行選択回路と、前記テスト行選択信号が活性化状態の
ときはこのテスト行選択信号に従って前記複数のワード
線のうちの少なくとも2本を同時に選択レベルとし、非
活性化状態のときは前記複数のワード線との間を絶縁状
態とするテスト行選択回路とを有している。
A semiconductor memory device according to the present invention is provided at a plurality of word lines, a plurality of digit lines which insulate the word lines and intersect, and an intersection of the word lines and the digit lines. A memory cell array having a plurality of memory cells for writing and storing the data transmitted to the corresponding digit line when the selected word line is at the selected level and reading the stored data to the corresponding digit line; When the activated test row selection signal is inactive, one of the plurality of word lines is set to the selection level in accordance with the address signal, and when activated, the word lines are insulated from each other. The row selection circuit to be turned on and at least one of the plurality of word lines according to the test row selection signal when the test row selection signal is in the activated state. And simultaneously selected level 2, and when the inactive mode and a test row selection circuit for an insulating state between said plurality of word lines.

【0011】[0011]

【実施例】次に本発明の実施例について図面を参照して
説明する。
Embodiments of the present invention will now be described with reference to the drawings.

【0012】図1は本発明の第1の実施例を示す回路図
である。
FIG. 1 is a circuit diagram showing a first embodiment of the present invention.

【0013】この実施例が図3に示された従来の半導体
記憶装置と相違する点は、行選択回路2を、バーンイン
テストモード時活性化状態となるテスト行選択信号Φ
1,Φ2が非活性状態のときはワード線駆動信号RAが
活性化状態のときアドレス信号に従って複数のワード線
WL1〜WL4のうちの1本を選択レベルとし、テスト
行選択信号Φ1,Φ2が活性化状態のときは複数のワー
ド線との間を絶縁状態とする回路とし、かつ、トランジ
スタQ1〜Q12を備えテスト行選択信号Φ1,Φ2が
活性化状態のときはワード線駆動信号RAが活性化状態
のときテスト行選択信号Φ1,Φ2に従って複数のワー
ド線WL1〜WL4のうちの少なくとも2本を同時に選
択レベルとし、テスト行選択信号Φ1,Φ2が非活性状
態のときは複数をワード線WL1〜WL4との間を絶縁
状態とするテスト行選択回路3と、テスト行選択信号Φ
1,Φ2が活性化状態か非活性化状態かによって行選択
回路2の動作を制御するNORゲートG1とを設けた点
にある。
This embodiment is different from the conventional semiconductor memory device shown in FIG. 3 in that the row selection circuit 2 is a test row selection signal Φ which is activated in the burn-in test mode.
When 1 and Φ2 are inactive, when the word line drive signal RA is active, one of the plurality of word lines WL1 to WL4 is set to the selection level according to the address signal, and the test row selection signals Φ1 and Φ2 are activated. In the activated state, a circuit for insulating between a plurality of word lines is provided, and the transistor Q1 to Q12 are provided, and when the test row selection signals Φ1 and Φ2 are activated, the word line drive signal RA is activated. In the state, at least two of the plurality of word lines WL1 to WL4 are simultaneously set to the selection level in accordance with the test row selection signals Φ1 and Φ2, and when the test row selection signals Φ1 and Φ2 are inactive, the plurality of word lines WL1 to WL1 are selected. A test row selection circuit 3 for insulating between WL4 and a test row selection signal Φ
1, and a NOR gate G1 for controlling the operation of the row selection circuit 2 depending on whether Φ2 is in the activated state or the inactivated state.

【0014】次にこの実施例の動作について説明する。Next, the operation of this embodiment will be described.

【0015】テスト行選択信号Φ1,Φ2は、活性化状
態のとき互いに相補のレベル関係にあり、非活性状態の
ときは低レベルとなっている。
The test row selection signals Φ1 and Φ2 have complementary level relationships in the activated state, and have a low level in the inactivated state.

【0016】テスト行選択信号Φ1,Φ2が非活性状態
のとき、NORゲートG1の出力は高レベルとなり行選
択回路2はアドレス信号ADに従って複数のワード線W
L1〜WL4のうちの1本をワード線駆動信号RAに同
期して選択レベルとする。このとき、テスト行選択回路
3のトランジスタQ2,Q3,Q5,Q6,Q8,Q
9,Q11,Q12はオフとなっており、従ってテスト
行選択回路3はワード線WL1〜WL4と切離されてい
る。すなわち、ワード線は行選択回路2によって選択さ
れる。
When the test row selection signals Φ1 and Φ2 are inactive, the output of the NOR gate G1 becomes high level, and the row selection circuit 2 receives a plurality of word lines W according to the address signal AD.
One of L1 to WL4 is set to the selection level in synchronization with the word line drive signal RA. At this time, the transistors Q2, Q3, Q5, Q6, Q8, Q of the test row selection circuit 3
9, Q11, Q12 are off, so that the test row selection circuit 3 is separated from the word lines WL1 to WL4. That is, the word line is selected by the row selection circuit 2.

【0017】テスト行選択信号Φ1,Φ2が活性化状態
になると、片方(例えばΦ1)が高レベル、他方が低レ
ベルとなるので、NORゲートG1の出力は低レベルと
なり、行選択回路2はワード線WL1〜う4と切離され
る。
When the test row selection signals Φ1 and Φ2 are activated, one of them (eg, Φ1) becomes high level and the other becomes low level, so that the output of the NOR gate G1 becomes low level and the row selection circuit 2 becomes word-wise. The lines WL1 to W4 are separated.

【0018】一方、テスト行選択信号Φ1によりトラン
ジスタQ2,Q6,Q9,Q11がオン、Φ2によりQ
3,Q5,Q8,Q12がオフとなるので、ワード線W
L1,WL4の少なくとも2本がワード線駆動信号RA
に同期して選択レベルとなり、ワード線WL2,WL3
は非選択レベルとなる。すなわち、ワード線はテスト行
選択回路3によって同時に少なくとも2本が選択され
る。
On the other hand, the transistors Q2, Q6, Q9, Q11 are turned on by the test row selection signal Φ1, and Q is turned by Φ2.
Since 3, Q5, Q8, and Q12 are turned off, the word line W
At least two of L1 and WL4 are word line drive signals RA
To the selection level in synchronization with the word lines WL2, WL3
Is the non-selection level. That is, at least two word lines are simultaneously selected by the test row selection circuit 3.

【0019】このように、バーンインテスト時には、複
数本のワード線が同時に選択レベルとなるので、全ワー
ド線を選択レベルとする時間、すなわちバーンインテス
ト時間を短縮することができる。
As described above, during the burn-in test, a plurality of word lines are simultaneously set to the selection level, so that the time for setting all the word lines to the selection level, that is, the burn-in test time can be shortened.

【0020】図2は本発明の第2の実施例を示す回路図
である。
FIG. 2 is a circuit diagram showing a second embodiment of the present invention.

【0021】第1の実施例ではワード線WL1,WL4
が選択レベルのときはワード線WL2,WL3は非選択
レベルとなっているが、この第2の実施例では、テスト
行選択信号Φ1によってワード線WL1〜WL4が同時
に選択レベルとなる。このとき、テスト行選択信号Φ2
によって図2には示されていない他のワード線が非選択
レベルとなる。
In the first embodiment, word lines WL1 and WL4
Is at the selection level, the word lines WL2 and WL3 are at the non-selection level, but in the second embodiment, the test lines selection signal Φ1 causes the word lines WL1 to WL4 to simultaneously become the selection level. At this time, the test row selection signal Φ2
As a result, the other word lines not shown in FIG. 2 become the non-selected level.

【0022】すなわち、本実施例と第1の実施例とは、
同時に選択レベルとなるワード線の組合せが異なる。こ
れ以外は、基本的な動作及び効果を含め、第1の実施例
と同じである。
That is, this embodiment and the first embodiment are
At the same time, the combinations of word lines that become the selection level are different. Other than this, the basic operation and effects are the same as those of the first embodiment.

【0023】[0023]

【発明の効果】以上説明したように本発明は、バーンイ
ンテスト時、同時に複数本のワード線を選択する構成と
したので、全ワード線を選択する時間が短縮でき、従っ
てバーンインテスト時間を短縮することができる効果が
ある。
As described above, according to the present invention, since a plurality of word lines are selected at the same time during the burn-in test, it is possible to shorten the time for selecting all the word lines, thus shortening the burn-in test time. There is an effect that can be.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の第1の実施例を示す回路図である。FIG. 1 is a circuit diagram showing a first embodiment of the present invention.

【図2】本発明の第2の実施例を示す回路図である。FIG. 2 is a circuit diagram showing a second embodiment of the present invention.

【図3】従来の半導体記憶装置の一例を示す回路図であ
る。
FIG. 3 is a circuit diagram showing an example of a conventional semiconductor memory device.

【符号の説明】[Explanation of symbols]

1 メモリセルアレイ 2,2a 行選択回路 3,3a テスト行選択回路 DL11,DL12,DL21,DL22 ディジッ
ト線 G1 NORゲート MC11〜MC14,MC21,DL22 ディジッ
ト線 Q1〜Q12 トランジスタ SA1,SA2 センス増幅器 WL1〜WL4 ワード線
1 memory cell array 2, 2a row selection circuit 3, 3a test row selection circuit DL11, DL12, DL21, DL22 digit line G1 NOR gate MC11 to MC14, MC21, DL22 digit line Q1 to Q12 transistor SA1, SA2 sense amplifier WL1 to WL4 word line

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 複数のワード線、これらワード線と絶縁
して交差する複数のディジット線、並びに前記ワード線
及びディジット線の交差部に設けられ対応するワード線
が選択レベルのとき対応するディジット線に伝達された
データを書込み記憶し記憶しているデータを対応するデ
ィジット線に読出す複数のメモリセルを備えたメモリセ
ルアレイと、所定のテストモード時活性化状態となるテ
スト行選択信号が非活性状態のときはアドレス信号に従
って前記複数のワード線のうちの1本を選択レベルと
し、活性化状態のときは前記複数のワード線との間を絶
縁状態とする行選択回路と、前記テスト行選択信号が活
性化状態のときはこのテスト行選択信号に従って前記複
数のワード線のうちの少なくとも2本を同時に選択レベ
ルとし、非活性化状態のときは前記複数のワード線との
間を絶縁状態とするテスト行選択回路とを有することを
特徴とする半導体記憶装置。
1. A plurality of word lines, a plurality of digit lines that intersect the word lines in an insulated manner, and digit lines that are provided at the intersections of the word lines and the digit lines and the corresponding word lines are at a selected level. The memory cell array having a plurality of memory cells for writing and storing the data transmitted to and reading the stored data to the corresponding digit line, and the test row selection signal which is activated in a predetermined test mode are inactive A row selection circuit that sets one of the plurality of word lines to a selection level according to an address signal when in the state, and an isolation state between the plurality of word lines when in the activated state; and the test row selection When the signal is in the activated state, at least two of the plurality of word lines are simultaneously set to the selection level in accordance with the test row selection signal, and the inactivated state. In this case, the semiconductor memory device further comprises a test row selection circuit for insulating the plurality of word lines from each other.
JP4229083A 1992-08-28 1992-08-28 Semiconductor storage device Expired - Fee Related JP2972455B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4229083A JP2972455B2 (en) 1992-08-28 1992-08-28 Semiconductor storage device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4229083A JP2972455B2 (en) 1992-08-28 1992-08-28 Semiconductor storage device

Publications (2)

Publication Number Publication Date
JPH0676599A true JPH0676599A (en) 1994-03-18
JP2972455B2 JP2972455B2 (en) 1999-11-08

Family

ID=16886489

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4229083A Expired - Fee Related JP2972455B2 (en) 1992-08-28 1992-08-28 Semiconductor storage device

Country Status (1)

Country Link
JP (1) JP2972455B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5936910A (en) * 1997-07-25 1999-08-10 Nec Corporation Semiconductor memory device having burn-in test function
US5949731A (en) * 1997-03-27 1999-09-07 Mitsubishi Denki Kabushiki Kaisha Semiconductor memory device having burn-in mode operation stably accelerated

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5949731A (en) * 1997-03-27 1999-09-07 Mitsubishi Denki Kabushiki Kaisha Semiconductor memory device having burn-in mode operation stably accelerated
US6038183A (en) * 1997-03-27 2000-03-14 Mitsubishi Denki Kabushiki Kaisha Semiconductor memory device having burn-in mode operation stably accelerated
US6205067B1 (en) 1997-03-27 2001-03-20 Mitsubishi Denki Kabushiki Kaisha Semiconductor memory device having burn-in mode operation stably accelerated
US5936910A (en) * 1997-07-25 1999-08-10 Nec Corporation Semiconductor memory device having burn-in test function

Also Published As

Publication number Publication date
JP2972455B2 (en) 1999-11-08

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