JPH0674614A - Hydrogen gas discharge circuit of absorption refrigerating machine - Google Patents

Hydrogen gas discharge circuit of absorption refrigerating machine

Info

Publication number
JPH0674614A
JPH0674614A JP25201392A JP25201392A JPH0674614A JP H0674614 A JPH0674614 A JP H0674614A JP 25201392 A JP25201392 A JP 25201392A JP 25201392 A JP25201392 A JP 25201392A JP H0674614 A JPH0674614 A JP H0674614A
Authority
JP
Japan
Prior art keywords
hydrogen gas
gas
gas discharge
way valve
discharge device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP25201392A
Other languages
Japanese (ja)
Other versions
JP3157303B2 (en
Inventor
Masami Mamada
正美 間々田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP25201392A priority Critical patent/JP3157303B2/en
Publication of JPH0674614A publication Critical patent/JPH0674614A/en
Application granted granted Critical
Publication of JP3157303B2 publication Critical patent/JP3157303B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Sorption Type Refrigeration Machines (AREA)

Abstract

PURPOSE:To enable a refrigerating capacity of an absorption refrigerating machine to be realized for a long period of time by a method wherein a three-way valve communicates between a non-condensed gas chamber and a hydrogen gas discharging device, the three-way valve is changed over for every predetermined time or when a physical amount such as pressure and the like reaches a predetermined value and then the hydrogen gas discharging device communicates with a low temperature drum. CONSTITUTION:A hydrogen gas discharging circuit is operated such that a three-way valve 21 can connect properly a non-condensed gas chamber 22 and an absorber 15 of low temperature drum with a hydrogen gas discharging device 23. Normally, the non-condensed gas chamber 22 and the hydrogen gas discharging device 23 communicate with each other and the hydrogen gas discharging device 23 and the absorber 15 do not communicate with each other. At the specified time, the three-way valve 21 is changed over to cause the non-condensed gas chamber 22 not to communicate with the hydrogen gas discharging device 23, resulting in that the hydrogen gas discharging device 23 communicates with the absorber 15. The hydrogen gas discharging device 23 has a palladium cell 23b at a hydrogen gas discharging pipe fixing container 23a, a heater stored in it is electrically energized to perform heating of it and only the fine molecular hydrogen gas is discharged through the cell.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、吸収式冷凍機や吸収ヒ
ートポンプなど(以下、吸収式冷凍機と総称する)の機
械内部で発生する水素ガスを機外へ排出するための技術
に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a technique for discharging hydrogen gas generated inside a machine such as an absorption refrigerating machine or an absorption heat pump (hereinafter referred to as absorption refrigerating machine) to the outside of the machine.

【0002】[0002]

【従来の技術】吸収式冷凍機は周知のように再生器、凝
縮器、蒸発器、吸収器などを順次配管接続し、臭化リチ
ウム水溶液などの吸収液により水などの冷媒を吸収させ
たり、放出させたりしながら循環させて熱の授受を行な
い、冷温水供給・冷暖房運転などに供するための装置で
ある。
2. Description of the Related Art As is well known, an absorption refrigerator has a regenerator, a condenser, an evaporator, an absorber, etc. connected in series by pipes to absorb a refrigerant such as water with an absorption liquid such as an aqueous solution of lithium bromide. It is a device for supplying and receiving heat by circulating it while releasing it, and supplying it to cold / hot water and heating / cooling operation.

【0003】上記構成の吸収式冷凍機においては、再生
器、凝縮器、蒸発器、吸収器、およびこれらを連結する
配管部などが、鉄あるいはステンレス鋼によって形成さ
れ、冷媒に水、吸収液に臭化リチウム水溶液などが用い
られていると、冷媒および吸収液の水分や吸収液が機器
素材の金属と反応し、酸化皮膜などを形成する際に水素
ガスが発生する。特に、運転中は再生器により吸収液
が、例えば160℃と云った高温に加熱されるため上記
反応が生じ易く、水素ガスの発生が多くなる。
In the absorption refrigerator having the above structure, the regenerator, the condenser, the evaporator, the absorber, and the pipe portion connecting them are made of iron or stainless steel, and are used as the refrigerant for water and the absorbing liquid. When a lithium bromide aqueous solution or the like is used, the moisture of the refrigerant and the absorbing liquid or the absorbing liquid reacts with the metal of the material of the device, and hydrogen gas is generated when forming an oxide film or the like. In particular, during operation, the absorbing solution is heated to a high temperature of, for example, 160 ° C. by the regenerator, so that the above reaction is likely to occur and hydrogen gas is generated in large amounts.

【0004】また、蒸発器などは冷媒が蒸発し易いよう
に高真空設計(例えば、数mmHg程度)となっている
ため、溶接などにより気密性を高めているが、大気の浸
入を完全に防止することは困難である。
Further, since the evaporator and the like have a high vacuum design (for example, about several mmHg) so that the refrigerant can easily evaporate, the airtightness is improved by welding or the like, but the invasion of the atmosphere is completely prevented. Is difficult to do.

【0005】上記メカニズムで発生した水素ガスや、大
気からの侵入成分である窒素ガス・酸素ガスなどは、冷
凍機における冷却などでは凝縮することがないし、吸収
液への溶解度も極めて小さいため蒸発器や吸収器の非溶
液部に滞留し、次第にその濃度が高まる。このような不
凝縮ガスの機内における圧力が高まると、冷媒の蒸発が
抑制されて冷凍能力が低下したり、場合によっては冷凍
機の運転そのものが不能になってしまうことがあると云
った問題点がある。
The hydrogen gas generated by the above mechanism and the nitrogen gas / oxygen gas, which are invasion components from the atmosphere, do not condense upon cooling in a refrigerator and the solubility in the absorbing liquid is extremely small, so that the evaporator is used. And stays in the non-solution part of the absorber, and its concentration gradually increases. When the pressure of such a non-condensable gas in the machine increases, the evaporation of the refrigerant is suppressed and the refrigerating capacity decreases, and in some cases, the operation of the refrigerator itself may become impossible. There is.

【0006】このため、吸収器の非溶液部から上記不凝
縮ガスを送出することのできる不凝縮ガス室を連通して
設け、この不凝縮ガス室に温度が上昇した時に水素ガス
だけを透過する性質を有するパラジウムセルを取り付け
た構成の水素ガス排出装置の発明が、特開昭59−13
9864号公報に提案されている。
For this reason, a non-condensable gas chamber capable of delivering the non-condensable gas from the non-solution portion of the absorber is provided in communication with the non-condensable gas chamber, and only hydrogen gas permeates when the temperature rises. An invention of a hydrogen gas discharge device having a structure having a palladium cell attached thereto is disclosed in Japanese Patent Laid-Open No. 59-13
It is proposed in Japanese Patent No. 9864.

【0007】[0007]

【発明が解決しようとする課題】上記パラジウムセルに
よる水素ガスを排出する能力は、水素ガスの分圧が高い
程高くなるが、上記従来構成の水素ガス排出装置におい
ては、水素ガス以外の不凝縮ガス、すなわち、窒素ガス
・酸素ガスなどの残留濃度が次第に高まって水素ガス排
出能力が時間の経過と共に低下するので、かかる装置を
取り付けてあっても冷凍機の運転ができなくなることが
あると云った問題があり、この点の解決が課題となって
いた。
The capacity of the palladium cell for discharging hydrogen gas increases as the partial pressure of hydrogen gas increases. However, in the hydrogen gas discharging device of the above-described configuration, non-condensing other than hydrogen gas Since the residual concentration of gas, that is, nitrogen gas, oxygen gas, etc., gradually increases and the hydrogen gas discharge capacity decreases with the passage of time, it can be said that even if such a device is installed, the operation of the refrigerator may become impossible. However, there was a problem to solve this problem.

【0008】[0008]

【課題を解決するための手段】本発明は上記従来技術の
課題を解決するためになされたもので、低温胴と、該低
温胴に連通した不凝縮ガス室とを、三方弁を介して水素
ガス排出装置に接続する吸収式冷凍機の水素ガス排出回
路であって、三方弁が、通常は不凝縮ガス室と水素ガス
排出装置とを連通し、所定時間毎、または圧力などの物
理量が所定値に達した特定時に切り替わり、水素ガス排
出装置と低温胴とを連通することを特徴とする水素ガス
排出回路と、
SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned problems of the prior art, in which a low temperature cylinder and a non-condensable gas chamber communicating with the low temperature cylinder are connected to each other via a three-way valve. A hydrogen gas discharge circuit of an absorption chiller connected to a gas discharge device, in which a three-way valve normally connects the non-condensable gas chamber and the hydrogen gas discharge device, and a physical quantity such as pressure is set at predetermined intervals. It switches at a specific time when it reaches a value, and a hydrogen gas discharge circuit characterized by connecting the hydrogen gas discharge device and the low temperature cylinder to each other,

【0009】低温胴に連通したエゼクターを有する不凝
縮ガス室と、該不凝縮ガス室のエゼクター設置部とを、
三方弁を介して水素ガス排出装置に接続する吸収式冷凍
機の水素ガス排出回路であって、三方弁が、通常は不凝
縮ガス室と水素ガス排出装置とを連通し、所定時間毎、
または圧力などの物理量が所定値に達した特定時に切り
替わり、水素ガス排出装置と不凝縮ガス室のエゼクター
設置部とを連通することを特徴とする水素ガス排出回路
と、を提供し、前記従来技術の課題を解決するものであ
る。
A non-condensable gas chamber having an ejector communicating with the cold cylinder, and an ejector installation portion of the non-condensable gas chamber,
A hydrogen gas discharge circuit of an absorption chiller connected to a hydrogen gas discharge device via a three-way valve, the three-way valve is usually in communication with the non-condensable gas chamber and the hydrogen gas discharge device, every predetermined time,
Or a physical quantity such as pressure is switched at a specific time when it reaches a predetermined value, and a hydrogen gas discharge circuit characterized by connecting the hydrogen gas discharge device and an ejector installation part of the non-condensing gas chamber is provided. To solve the problem of.

【0010】[0010]

【作用】請求項1に係わる水素ガス排出回路の場合;通
常は不凝縮ガス室と水素ガス排出装置とが三方弁を介し
て連通し、水素ガス排出装置と低温胴(吸収器・凝縮器
・蒸発器など)とが不通となっているので、低温胴から
エゼクターなどを介して不凝縮ガス室に送出された水素
ガス・窒素ガス・酸素ガスなどの不凝縮ガスは、三方弁
を介して水素ガス排出装置に流入し、水素ガスのみが水
素ガス排出装置のパラジウムセルなどによって機外に選
択的に排出され、他の窒素ガス・酸素ガスなどの不凝縮
ガスの濃度が次第に高まる。
In the case of the hydrogen gas discharge circuit according to claim 1, the non-condensable gas chamber and the hydrogen gas discharge device normally communicate with each other through a three-way valve, and the hydrogen gas discharge device and the low temperature cylinder (absorber, condenser, condenser, Since non-condensable gases such as hydrogen gas, nitrogen gas and oxygen gas sent from the low temperature cylinder to the non-condensable gas chamber through the ejector etc. The hydrogen gas flows into the gas discharge device, and only the hydrogen gas is selectively discharged to the outside by a palladium cell of the hydrogen gas discharge device, and the concentration of other non-condensable gases such as nitrogen gas and oxygen gas gradually increases.

【0011】所定時間が経過するか、水素ガス排出装置
内における不凝縮ガス分圧(水素ガス・窒素ガス・酸素
ガスなどの何れでも良い)などの物理量が所定値に達し
た特定時に、三方弁が切り替わって不凝縮ガス室と水素
ガス排出装置とが不通となり、これまで不通であった水
素ガス排出装置と低温胴とが連通し、水素ガス排出装置
に残留していた水素ガス分圧の低い不凝縮ガス、換言す
れば窒素ガス・酸素ガスなどの比率が高い不凝縮ガスが
低温胴に流入して減少するので、水素ガス排出装置にお
ける水素ガス排出機能が元の状態に復帰する。
When a predetermined time elapses or when the physical quantity such as the partial pressure of the non-condensable gas (hydrogen gas, nitrogen gas, oxygen gas, etc.) in the hydrogen gas discharge device reaches a predetermined value, the three-way valve And the non-condensable gas chamber and the hydrogen gas discharge device are cut off, and the hydrogen gas discharge device that was previously cut off communicates with the low temperature cylinder, and the hydrogen gas partial pressure remaining in the hydrogen gas discharge device is low. Since the non-condensable gas, in other words, the non-condensable gas having a high ratio of nitrogen gas / oxygen gas, etc. flows into the low temperature cylinder and decreases, the hydrogen gas discharging function of the hydrogen gas discharging device returns to the original state.

【0012】このため、三方弁が再度切り替わって不凝
縮ガス室と水素ガス排出装置とが連通すると、不凝縮ガ
ス室から水素ガス排出装置に流入した不凝縮ガスの内の
水素ガスが選択的に能率良く排出される。
Therefore, when the three-way valve is switched again and the noncondensable gas chamber and the hydrogen gas discharge device communicate with each other, the hydrogen gas in the noncondensable gas flowing from the noncondensable gas chamber into the hydrogen gas discharge device is selectively discharged. Efficiently discharged.

【0013】請求項2に係わる水素ガス排出回路の場
合;通常は不凝縮ガス室と水素ガス排出装置とが三方弁
を介して連通し、水素ガス排出装置と不凝縮ガス室のエ
ゼクター設置部とが不通となっているので、低温胴から
エゼクターを介して不凝縮ガス室に送出された水素ガス
・窒素ガス・酸素ガスなどの不凝縮ガスは、三方弁を介
して水素ガス排出装置に流入し、水素ガスのみが水素ガ
ス排出装置のパラジウムセルなどによって機外に選択的
に排出され、他の窒素ガス・酸素ガスなどの不凝縮ガス
の濃度が次第に高まる。
In the case of the hydrogen gas discharge circuit according to claim 2, normally, the non-condensable gas chamber and the hydrogen gas discharge device communicate with each other through a three-way valve, and the hydrogen gas discharge device and the ejector installation portion of the non-condensable gas chamber are connected. The non-condensable gas such as hydrogen gas, nitrogen gas, oxygen gas, etc. sent from the low temperature cylinder to the non-condensable gas chamber through the ejector flows into the hydrogen gas discharge device through the three-way valve. Only hydrogen gas is selectively discharged to the outside by a palladium cell or the like of a hydrogen gas discharge device, and the concentration of other non-condensable gases such as nitrogen gas and oxygen gas gradually increases.

【0014】所定時間が経過するか、水素ガス排出装置
内における前記不凝縮ガス分圧などの物理量が所定値に
達した特定時に、三方弁が切り替わって不凝縮ガス室と
水素ガス排出装置とが不通となり、これまで不通であっ
た水素ガス排出装置と不凝縮ガス室のエゼクター設置部
とが連通し、水素ガス排出装置に残留していた水素ガス
分圧の低い不凝縮ガス、すなわち窒素ガス・酸素ガスな
どの比率が高い不凝縮ガスが低温胴に流入して減少する
ので、水素ガス排出装置における水素ガス排出機能が元
の状態に復帰する。
When a predetermined time elapses or when the physical quantity such as the partial pressure of the non-condensable gas in the hydrogen gas discharge device reaches a predetermined value, the three-way valve is switched to separate the non-condensable gas chamber and the hydrogen gas discharge device. The non-condensable gas with a low partial pressure of hydrogen gas remaining in the hydrogen gas discharge device, that is, nitrogen gas Since the non-condensable gas having a high ratio such as oxygen gas flows into the cold cylinder and decreases, the hydrogen gas discharging function of the hydrogen gas discharging device returns to the original state.

【0015】このため、三方弁が再度切り替わって不凝
縮ガス室と水素ガス排出装置とが連通すると、不凝縮ガ
ス室から水素ガス排出装置に流入した不凝縮ガスの内の
水素ガスが選択的に能率良く排出される。
Therefore, when the three-way valve is switched again and the non-condensable gas chamber and the hydrogen gas discharging device communicate with each other, the hydrogen gas in the non-condensing gas flowing into the hydrogen gas discharging device from the non-condensing gas chamber is selectively Efficiently discharged.

【0016】[0016]

【実施例】図1は、請求項1に係わる水素排出回路を組
み込んだ吸収式冷凍機の一構成例であって、図中11は
高温再生器、12は低温再生器、13は凝縮器、14は
蒸発器、15は吸収器、16は高温熱交換器、17は低
温熱交換器であり、
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 is a constitutional example of an absorption refrigerator incorporating a hydrogen discharge circuit according to claim 1, in which 11 is a high temperature regenerator, 12 is a low temperature regenerator, and 13 is a condenser. 14 is an evaporator, 15 is an absorber, 16 is a high temperature heat exchanger, 17 is a low temperature heat exchanger,

【0017】ここに例示した水素ガス排出回路は、三方
弁21が、不凝縮ガス室22と低温胴である吸収器15
とを、水素ガス排出装置23に適宜接続可能とするもの
であって、通常は不凝縮ガス室22と水素ガス排出装置
23とが連通し、水素ガス排出装置23と吸収器15と
の間が不通であり、
In the hydrogen gas discharge circuit illustrated here, the three-way valve 21 is the non-condensable gas chamber 22 and the absorber 15 which is a cold cylinder.
And the hydrogen gas exhaust device 23 can be appropriately connected to each other. Normally, the non-condensable gas chamber 22 and the hydrogen gas exhaust device 23 communicate with each other, and the hydrogen gas exhaust device 23 and the absorber 15 are connected to each other. Out of order,

【0018】特定時に前記三方弁21を切り替わって、
不凝縮ガス室22と水素ガス排出装置23とが不通とな
り、水素ガス排出装置23と吸収器15とが連通するよ
うになっている。
When the three-way valve 21 is switched at a specific time,
The non-condensable gas chamber 22 and the hydrogen gas exhaust device 23 are in communication with each other, and the hydrogen gas exhaust device 23 and the absorber 15 are in communication with each other.

【0019】なお、不凝縮ガス室22は上部にエゼクタ
ー22aを有し、このエゼクター22aと吸収液導入管
31とを介して、吸収液ポンプP1が吸収器15から高
温再生器11に送る吸収液の一部が分岐して勢い良く噴
出するようになっており、この噴出力を利用して、吸収
器15の非溶液部(吸収液が液体として存在することの
ない領域)Aに存するガス体(冷媒蒸気・霧状吸収液・
水素ガス・窒素ガス・酸素ガスなどの混在物)が吸引で
きるようにガス体導入管32が配管され、同様に、凝縮
器13の非溶液部Bからもガス体が吸引できるようにガ
ス体導入管33が配管接続されている。
The non-condensable gas chamber 22 has an ejector 22a at the upper part, and the absorbent pump P1 sends the absorbent from the absorber 15 to the high temperature regenerator 11 via the ejector 22a and the absorbent introducing pipe 31. Part of the gas is branched and ejected vigorously, and by utilizing this ejection force, the gas body existing in the non-solution part (the region where the absorbing liquid does not exist as a liquid) A of the absorber 15 is present. (Refrigerant vapor / mist absorption liquid /
A gas body introduction pipe 32 is provided so that a mixture of hydrogen gas, nitrogen gas, oxygen gas, etc.) can be sucked, and similarly, a gas body is introduced so that the gas body can be sucked from the non-solution portion B of the condenser 13 as well. The pipe 33 is connected to the pipe.

【0020】水素ガス排出装置23は、水素ガス排出管
取付容器23aにそれ自体は従来周知の水素ガス排出
管、例えばパラジウムセル23bを有しており、内蔵し
ているヒータ(図示せず)に通電して加熱することによ
り、微細な分子の水素ガスだけが透過して排出できるよ
うになっている。
The hydrogen gas discharge device 23 has a hydrogen gas discharge pipe mounting container 23a and a hydrogen gas discharge pipe known in the prior art, for example, a palladium cell 23b, in a heater (not shown) incorporated therein. By energizing and heating, only hydrogen gas of fine molecules can be permeated and discharged.

【0021】高温再生器11、低温再生器12、凝縮器
13、蒸発器14、吸収器15、高温熱交換器16、低
温熱交換器17およびこれらを連結する配管部などが例
えば鉄によって形成され、前記したように冷媒に水、吸
収液に臭化リチウム水溶液が用いられていると、運転
中、吸収液は高温再生器11において例えば160℃に
も加熱され、高温蒸気を発生する吸収液や高温の冷媒蒸
気(水蒸気)などが装置を構成する鉄と反応して表面に
酸化皮膜を形成する際に水素ガスが発生する。
The high-temperature regenerator 11, the low-temperature regenerator 12, the condenser 13, the evaporator 14, the absorber 15, the high-temperature heat exchanger 16, the low-temperature heat exchanger 17 and the pipes connecting them are formed of, for example, iron. As described above, when water is used as the refrigerant and a lithium bromide aqueous solution is used as the absorbing liquid, the absorbing liquid is heated to, for example, 160 ° C. in the high temperature regenerator 11 during operation, and the absorbing liquid that generates high temperature steam is generated. Hydrogen gas is generated when a high-temperature refrigerant vapor (water vapor) or the like reacts with iron constituting the device to form an oxide film on the surface.

【0022】また、機器の連結部やピンホールなどを介
して大気が機内に侵入することがあるが、このようにし
て機内に溜った水素ガス・窒素ガス・酸素ガスなどは、
冷凍機における冷却温度範囲では凝縮することがない
し、吸収液への溶解度も極めて小さいため、吸収器15
の非溶液部Aや凝縮器13の非溶液部Bに滞留して次第
にその濃度が高まり、内圧が上昇する要因となる。
Further, the atmosphere may enter the inside of the machine through the connecting parts of the equipment, pinholes, etc., but the hydrogen gas, nitrogen gas, oxygen gas, etc. thus accumulated in the machine,
In the cooling temperature range of the refrigerator, the absorber 15 does not condense and the solubility in the absorbing liquid is extremely small.
Staying in the non-solution portion A and the non-solution portion B of the condenser 13 and the concentration thereof gradually increases, which causes a rise in the internal pressure.

【0023】しかし、上記構成の吸収式冷凍機において
は本発明の水素ガス排出回路が組み込まれているため、
吸収液ポンプP1により所定の圧力(例えば、2Kgf/cm
2 )で吐出された吸収液の一部が吸収液導入管31・エ
ゼクター22aを介して高速で不凝縮ガス室22に吐出
する際に、吸収器15の非溶液部Aに一端が連通してい
るガス体導入管32のエゼクター22a設置部の圧力が
低下し、吸収器15の非溶液部Aに存在している冷媒蒸
気・霧状吸収液・水素ガス・窒素ガス・酸素ガスなどの
混在ガスがガス体導入管32側に引き込まれ、凝縮器1
3の非溶液部Bに存在している冷媒蒸気・水素ガス・窒
素ガス・酸素ガスなどの混在ガスがガス体導入管33側
に引き込まれ、共に吸収液と一体となって不凝縮ガス室
22に吐出する。
However, since the hydrogen gas discharge circuit of the present invention is incorporated in the absorption refrigerator having the above structure,
Predetermined pressure (for example, 2 Kgf / cm by the absorption liquid pump P1)
When a part of the absorbent discharged in 2 ) is discharged into the non-condensing gas chamber 22 at high speed through the absorbent introducing pipe 31 and the ejector 22a, one end communicates with the non-solution part A of the absorber 15. The pressure of the ejector 22a installed portion of the gas body introduction pipe 32 is lowered, and a mixed gas of refrigerant vapor, atomized absorbing liquid, hydrogen gas, nitrogen gas, oxygen gas, etc. existing in the non-solution portion A of the absorber 15 Is drawn into the gas body introduction pipe 32 side, and the condenser 1
The mixed gas of the refrigerant vapor, hydrogen gas, nitrogen gas, oxygen gas and the like existing in the non-solution portion B of No. 3 is drawn into the gas body introducing pipe 33 side, and together with the absorbing liquid, the non-condensing gas chamber 22 To discharge.

【0024】そして、不凝縮ガス室22内では、吸収液
に溶解しないガスのみが溶液中を気泡となって上昇し、
気液が分離される。すなわち、水素ガス・窒素ガス・酸
素ガスなどは上記したように吸収液には実質的に溶解さ
れないため、吸収液の中を気泡となって上昇し、上部に
これら不凝縮ガスのみが貯留される。この不凝縮ガスは
三方弁21を介して上方に設置されている水素ガス排出
装置23の水素ガス排出管取付容器23aに流入し、こ
の内から水素ガスのみがパラジウムセル23bを介して
機外に選択的に排出される。
Then, in the non-condensable gas chamber 22, only the gas that is not dissolved in the absorbing liquid rises as bubbles in the solution,
Gas-liquid is separated. That is, since hydrogen gas, nitrogen gas, oxygen gas, etc. are not substantially dissolved in the absorbing liquid as described above, they rise as bubbles in the absorbing liquid and only these non-condensing gases are stored in the upper part. . This non-condensed gas flows into the hydrogen gas discharge pipe mounting container 23a of the hydrogen gas discharge device 23 installed above via the three-way valve 21, and only the hydrogen gas is discharged from the inside to the outside via the palladium cell 23b. It is selectively discharged.

【0025】長期間に渡って上記水素ガスの排出を行っ
ていると、水素ガス排出管取付容器23a内の水素ガス
以外の不凝縮ガス、すなわち窒素ガス・酸素ガスなどの
比率が大きくなり、水素ガス分圧が低下して排出能力が
減少するので、所定時間、例えば24時間毎に三方弁2
1を切り替えるか、水素ガス排出装置23の適当な部位
に不凝縮ガスの圧力計を設置し、これによる計測値が所
定値(水素ガスであれば下限値、水素ガス以外の不凝縮
ガスであれば上限値)に達した特定時などに、三方弁2
1を切り替えて、
If the hydrogen gas is discharged for a long period of time, the proportion of non-condensable gas other than hydrogen gas, that is, nitrogen gas / oxygen gas, in the hydrogen gas discharge pipe mounting container 23a becomes large, and Since the gas partial pressure is reduced and the discharge capacity is reduced, the three-way valve 2 is operated every predetermined time, for example, every 24 hours.
1 or install a pressure gauge for the non-condensable gas at an appropriate portion of the hydrogen gas discharge device 23, and the measured value by this is a predetermined value (for hydrogen gas, the lower limit value, if the gas is a non-condensable gas other than hydrogen gas, The three-way valve 2
Switch 1

【0026】不凝縮ガス室22と水素ガス排出装置23
とを不通とし、これまで不通であった水素ガス排出装置
23と低温胴である吸収器15とを連通させ、水素ガス
排出装置23に残留していた窒素ガス・酸素ガスなどの
比率の高くなった不凝縮ガスを吸収器15に流入させ
る。
Non-condensable gas chamber 22 and hydrogen gas discharge device 23
Are made non-conductive, and the hydrogen gas discharge device 23, which has been cut off until now, and the absorber 15, which is a low temperature cylinder, are made to communicate with each other, and the ratio of nitrogen gas, oxygen gas, etc. remaining in the hydrogen gas discharge device 23 becomes high. The non-condensed gas is flowed into the absorber 15.

【0027】このため、三方弁21が再度切り替わって
不凝縮ガス室22と水素ガス排出装置23とが連通する
と、不凝縮ガス室22から水素ガス排出装置23に流入
する不凝縮ガスの中から水素ガスが選択的に能率良く機
外に排出される。
Therefore, when the three-way valve 21 is switched again and the non-condensable gas chamber 22 and the hydrogen gas exhaust device 23 communicate with each other, hydrogen is extracted from the non-condensable gas flowing from the non-condensable gas chamber 22 into the hydrogen gas exhaust device 23. Gas is selectively and efficiently discharged out of the machine.

【0028】図2は、請求項2に係わる水素ガス排出回
路を示しており、この場合の水素ガス排出回路において
は三方弁21が、通常は不凝縮ガス室22と水素ガス排
出装置23とを連通し、特定時に切り替わって、水素ガ
ス排出装置23と不凝縮ガス室22のエゼクター22a
設置部とが連通するように配管接続されている。
FIG. 2 shows a hydrogen gas discharge circuit according to a second aspect of the present invention. In the hydrogen gas discharge circuit in this case, a three-way valve 21 normally has a non-condensable gas chamber 22 and a hydrogen gas discharge device 23. The hydrogen gas exhaust device 23 and the ejector 22a of the non-condensable gas chamber 22 communicate with each other and switch at a specific time.
It is connected by piping so that it communicates with the installation part.

【0029】なお、吸収式冷凍機自体の構成は図1の実
施例と同様である。
The structure of the absorption refrigerator is the same as that of the embodiment shown in FIG.

【0030】この場合の水素ガス排出回路においても、
所定時間が経過するか、水素ガス・窒素ガスなどの分圧
が所定値に達した時などの特定時に、前記三方弁21を
切り替えて、不凝縮ガス室22と水素ガス排出装置23
とを不通とし、水素ガス排出装置23と不凝縮ガス室2
2のエゼクター22a設置部とを連通させ、
Also in the hydrogen gas discharge circuit in this case,
At a specific time such as when a predetermined time elapses or when the partial pressure of hydrogen gas, nitrogen gas, etc. reaches a predetermined value, the three-way valve 21 is switched and the non-condensable gas chamber 22 and the hydrogen gas discharge device 23 are switched.
And the hydrogen gas discharge device 23 and the non-condensable gas chamber 2
To communicate with the 2 ejector 22a installation section,

【0031】水素ガス排出装置23に残留していた窒素
ガス・酸素ガスなどの比率の高くなった不凝縮ガスを吸
収器15に流入させる。
The non-condensable gas having a high ratio of nitrogen gas, oxygen gas, etc. remaining in the hydrogen gas discharge device 23 is made to flow into the absorber 15.

【0032】このため、三方弁21が再度切り替わって
不凝縮ガス室22と水素ガス排出装置23とが連通する
と、この場合も不凝縮ガス室22から水素ガス排出装置
23に流入した不凝縮ガスの内の水素ガスが選択的に能
率良く排出される。
Therefore, when the three-way valve 21 is switched again and the non-condensable gas chamber 22 and the hydrogen gas exhaust device 23 communicate with each other, the non-condensable gas flowing from the non-condensable gas chamber 22 into the hydrogen gas exhaust device 23 is also removed. Hydrogen gas inside is selectively and efficiently discharged.

【0033】図3は、本発明の効果を具体的に検証する
ために行った実験装置の概略を示したものであり、10
0は吸収器15を想定して製作した鉄製の真空容器(内
容積2516cc)、101は電熱ヒータ、102は水
素ガスボンベ、103は真空ポンプ、104は圧力計、
105は記録計、V1〜V4は開閉弁であり、23は前
記実施例で使用した水素ガス排出装置である。
FIG. 3 shows an outline of an experimental apparatus that was carried out to specifically verify the effects of the present invention.
0 is an iron vacuum container (internal volume 2516 cc) manufactured assuming the absorber 15, 101 is an electric heater, 102 is a hydrogen gas cylinder, 103 is a vacuum pump, 104 is a pressure gauge,
Reference numeral 105 is a recorder, V1 to V4 are on-off valves, and 23 is the hydrogen gas discharge device used in the above-mentioned embodiment.

【0034】真空容器100の内部には臭化リチウム溶
液と2エチルヘキサノールとが封入されてあり、電熱ヒ
ータ101が容器内を例えば40℃に加熱・保温するこ
とにより、実際の水素ガス排出管取付容器23aの温度
になるようになっている。
Lithium bromide solution and 2-ethylhexanol are enclosed in the vacuum container 100, and the electric heater 101 heats and keeps the inside of the container at, for example, 40 ° C., so that the hydrogen gas exhaust pipe is actually attached. The temperature of the container 23a is reached.

【0035】開閉弁V2を閉じ、開閉弁V1・V3・V
4を開いた状態で真空ポンプ103を起動し、真空容器
100の内圧が5mmHgになった時、開閉弁V3を閉
じ、開閉弁V2を開く、水素ボンベ102から水素ガス
を真空容器100の内圧が100mmHgになるまで注
入し、内圧の変化を記録計105にて記録した。
The on-off valve V2 is closed and the on-off valves V1, V3, V
4 is opened, the vacuum pump 103 is started, and when the internal pressure of the vacuum container 100 reaches 5 mmHg, the opening / closing valve V3 is closed and the opening / closing valve V2 is opened. Injection was performed until the pressure reached 100 mmHg, and the change in internal pressure was recorded by the recorder 105.

【0036】すなわち、真空容器100に注入した水素
ガスが、水素ガス排出装置23のパラジウムセル23b
から機外に排出され、内圧が20mmHgに低下した時
点で開閉弁V2を開き、水素ガスボンベ102から容器
の内圧が100mmHgを回復するまで補給する、と云
った水素ガスの排出・注入作業を1週間繰り返し、
That is, the hydrogen gas injected into the vacuum vessel 100 is the palladium cell 23b of the hydrogen gas discharge device 23.
Is discharged to the outside of the machine, and when the internal pressure drops to 20 mmHg, the on-off valve V2 is opened, and hydrogen gas is discharged and injected from the hydrogen gas cylinder 102 until the internal pressure of the container recovers 100 mmHg for one week. repetition,

【0037】その後、開閉弁V4を閉じ、開閉弁V3を
開いた状態で真空ポンプ103を起動させて1分間の真
空吸引を行ない、さらにその後、開閉弁V3を閉じ、開
閉弁V4とV2とを開き、真空容器100の内圧が10
0mmHgを回復するまで水素ガスボンベ102から水
素ガスを注入し、この間の内圧の変化を測定することに
より、水素ガス排出装置23、すなわちパラジウムセル
23bによる水素ガス排出能力の推移および回復度を調
査し、表1の結果を得た。
Thereafter, the on-off valve V4 is closed, the on-off valve V3 is opened, the vacuum pump 103 is activated to perform vacuum suction for one minute, and then the on-off valve V3 is closed to open the on-off valves V4 and V2. Open, the internal pressure of the vacuum container 100 is 10
Hydrogen gas is injected from the hydrogen gas cylinder 102 until 0 mmHg is recovered, and the change in internal pressure during this time is measured to investigate the transition and the degree of recovery of the hydrogen gas discharge capacity by the hydrogen gas discharge device 23, that is, the palladium cell 23b. The results shown in Table 1 were obtained.

【0038】[0038]

【表1】 [Table 1]

【0039】表1から、水素ガス排出装置23、すなわ
ちパラジウムセル23bによる水素ガス排出能力は、当
初3.4cc/分と云う高い性能を有しているが、時間
の経過と共にその排出能力は低下し、1週間が経過する
と当初の機能の僅か40%弱にまで低下するが、水素ガ
ス排出装置23に残留しているガス、すなわち水素以外
の窒素ガス・酸素ガスなどの比率が高まった不凝縮ガス
を吸引除去することによって、当初の機能にまで完全に
回復することが確認された。
From Table 1, the hydrogen gas discharging device 23, that is, the hydrogen gas discharging capacity of the palladium cell 23b has a high performance of 3.4 cc / min at the beginning, but the discharging capacity decreases with the passage of time. However, after one week, the function is reduced to just less than 40% of the original function, but the non-condensation in which the ratio of the gas remaining in the hydrogen gas discharge device 23, that is, the nitrogen gas / oxygen gas other than hydrogen has increased. It was confirmed that the original function could be completely restored by sucking out the gas.

【0040】なお、本発明は上記実施例に限定されるも
のではないので、特許請求の範囲に記載の趣旨から逸脱
しない範囲で各種の変形実施が可能であり、例えば、三
方弁21の切り替えを時間や圧力以外に、発生器におけ
る温度などの物理量を計測して制御することなども可能
であり、また、水素ガス・窒素ガス・酸素ガスなどの不
凝縮ガスの送出を、吸収器15のみから行うものであっ
ても良い。
Since the present invention is not limited to the above embodiment, various modifications can be made without departing from the scope of the claims. For example, the three-way valve 21 can be switched. In addition to time and pressure, it is also possible to measure and control physical quantities such as temperature in the generator. In addition, non-condensable gas such as hydrogen gas, nitrogen gas, oxygen gas can be delivered only from the absorber 15. It may be done.

【0041】[0041]

【発明の効果】以上説明したように本発明は、低温胴
と、該低温胴に連通した不凝縮ガス室とを、三方弁を介
して水素ガス排出装置に接続する吸収式冷凍機の水素ガ
ス排出回路であって、三方弁が、通常は不凝縮ガス室と
水素ガス排出装置とを連通し、所定時間毎、または圧力
などの物理量が所定値に達した特定時に切り替わり、水
素ガス排出装置と低温胴とを連通することを特徴とする
水素ガス排出回路であり、
As described above, according to the present invention, the low temperature cylinder and the non-condensing gas chamber communicating with the low temperature cylinder are connected to the hydrogen gas discharge device through the three-way valve. In the discharge circuit, the three-way valve normally connects the non-condensable gas chamber and the hydrogen gas discharge device, and switches at a predetermined time or at a specific time when a physical quantity such as pressure reaches a predetermined value, and the hydrogen gas discharge device is connected. It is a hydrogen gas discharge circuit characterized by communicating with the low temperature cylinder,

【0042】低温胴に連通したエゼクターを有する不凝
縮ガス室と、該不凝縮ガス室のエゼクター設置部とを、
三方弁を介して水素ガス排出装置に接続する吸収式冷凍
機の水素ガス排出回路であって、三方弁が、通常は不凝
縮ガス室と水素ガス排出装置とを連通し、所定時間毎、
または圧力などの物理量が所定値に達した特定時に切り
替わり、水素ガス排出装置と不凝縮ガス室のエゼクター
設置部とを連通することを特徴とする水素ガス排出回路
であるので、
A non-condensable gas chamber having an ejector communicating with the low temperature cylinder, and an ejector installation portion of the non-condensable gas chamber,
A hydrogen gas discharge circuit of an absorption chiller connected to a hydrogen gas discharge device via a three-way valve, the three-way valve is usually in communication with the non-condensable gas chamber and the hydrogen gas discharge device, every predetermined time,
Or, when the physical quantity such as pressure is switched at a specific time when it reaches a predetermined value, the hydrogen gas discharge circuit is characterized by connecting the hydrogen gas discharge device and the ejector installation part of the non-condensing gas chamber.

【0043】時間の経過と共に低下し勝ちな水素ガス排
出装置のガス排出能力が、高価な真空ポンプなどを使用
することなく、簡単にしかも完全に回復することから、
蒸発器などにおける冷媒の蒸発が抑制されることがなく
なり、吸収式冷凍機の冷凍能力が長期に渡って十分に発
揮できるようになった。
The gas discharge capacity of the hydrogen gas discharge device, which tends to decrease with the passage of time, can be easily and completely restored without using an expensive vacuum pump or the like.
The evaporation of the refrigerant in the evaporator is not suppressed, and the refrigerating capacity of the absorption chiller can be fully exerted for a long period of time.

【図面の簡単な説明】[Brief description of drawings]

【図1】一実施例を示す説明図である。FIG. 1 is an explanatory diagram showing an example.

【図2】他の実施例を示す説明図である。FIG. 2 is an explanatory diagram showing another embodiment.

【図3】実験装置の説明図である。FIG. 3 is an explanatory diagram of an experimental device.

【符号の説明】[Explanation of symbols]

11 高温再生器 12 低温再生器 13 凝縮器 14 蒸発器 15 吸収器 16 高温熱交換器 17 低温熱交換器 21 三方弁 22 不凝縮ガス室 22a エゼクター 23 水素ガス排出装置 23a 水素ガス排出管取付容器 23b パラジウムセル 31 吸収液導入管 32・33 ガス体導入管 100 真空容器 101 電熱ヒータ 102 水素ガスボンベ 103 真空ポンプ 104 圧力計 105 記録計 P1 吸収液ポンプ A・B 非溶液部 V1・V2・V3・V4 開閉弁 11 High-temperature regenerator 12 Low-temperature regenerator 13 Condenser 14 Evaporator 15 Absorber 16 High-temperature heat exchanger 17 Low-temperature heat exchanger 21 Three-way valve 22 Non-condensing gas chamber 22a Ejector 23 Hydrogen gas discharge device 23a Hydrogen gas discharge pipe mounting container 23b Palladium cell 31 Absorption liquid introduction pipe 32, 33 Gas body introduction pipe 100 Vacuum container 101 Electric heater 102 Hydrogen gas cylinder 103 Vacuum pump 104 Pressure gauge 105 Recorder P1 Absorption liquid pump A / B Non-solution part V1, V2, V3, V4 Open / close valve

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 低温胴と、該低温胴に連通した不凝縮ガ
ス室とを、三方弁を介して水素ガス排出装置に接続する
吸収式冷凍機の水素ガス排出回路であって、三方弁が、
通常は不凝縮ガス室と水素ガス排出装置とを連通し、所
定時間毎、または圧力などの物理量が所定値に達した特
定時に切り替わり、水素ガス排出装置と低温胴とを連通
することを特徴とする水素ガス排出回路。
1. A hydrogen gas discharge circuit of an absorption chiller in which a low temperature cylinder and a non-condensable gas chamber communicating with the low temperature cylinder are connected to a hydrogen gas discharge device via a three-way valve, the three-way valve comprising: ,
Normally, the non-condensable gas chamber and the hydrogen gas discharge device are communicated with each other, and the hydrogen gas discharge device and the low temperature cylinder are communicated with each other at a predetermined time or at a specific time when a physical quantity such as pressure reaches a predetermined value. A hydrogen gas exhaust circuit.
【請求項2】 低温胴に連通したエゼクターを有する不
凝縮ガス室と、該不凝縮ガス室のエゼクター設置部と
を、三方弁を介して水素ガス排出装置に接続する吸収式
冷凍機の水素ガス排出回路であって、三方弁が、通常は
不凝縮ガス室と水素ガス排出装置とを連通し、所定時間
毎、または圧力などの物理量が所定値に達した特定時に
切り替わり、水素ガス排出装置と不凝縮ガス室のエゼク
ター設置部とを連通することを特徴とする水素ガス排出
回路。
2. A hydrogen gas of an absorption chiller in which a non-condensable gas chamber having an ejector communicating with a low temperature cylinder and an ejector installation portion of the non-condensable gas chamber are connected to a hydrogen gas discharge device via a three-way valve. In the discharge circuit, the three-way valve normally connects the non-condensable gas chamber and the hydrogen gas discharge device, and switches at a predetermined time or at a specific time when a physical quantity such as pressure reaches a predetermined value, and the hydrogen gas discharge device is connected. A hydrogen gas discharge circuit that communicates with the ejector installation part of the non-condensing gas chamber.
JP25201392A 1992-08-28 1992-08-28 Hydrogen gas discharge circuit of absorption refrigerator Expired - Fee Related JP3157303B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25201392A JP3157303B2 (en) 1992-08-28 1992-08-28 Hydrogen gas discharge circuit of absorption refrigerator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25201392A JP3157303B2 (en) 1992-08-28 1992-08-28 Hydrogen gas discharge circuit of absorption refrigerator

Publications (2)

Publication Number Publication Date
JPH0674614A true JPH0674614A (en) 1994-03-18
JP3157303B2 JP3157303B2 (en) 2001-04-16

Family

ID=17231363

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25201392A Expired - Fee Related JP3157303B2 (en) 1992-08-28 1992-08-28 Hydrogen gas discharge circuit of absorption refrigerator

Country Status (1)

Country Link
JP (1) JP3157303B2 (en)

Also Published As

Publication number Publication date
JP3157303B2 (en) 2001-04-16

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