JP3157303B2 - Hydrogen gas discharge circuit of absorption refrigerator - Google Patents

Hydrogen gas discharge circuit of absorption refrigerator

Info

Publication number
JP3157303B2
JP3157303B2 JP25201392A JP25201392A JP3157303B2 JP 3157303 B2 JP3157303 B2 JP 3157303B2 JP 25201392 A JP25201392 A JP 25201392A JP 25201392 A JP25201392 A JP 25201392A JP 3157303 B2 JP3157303 B2 JP 3157303B2
Authority
JP
Japan
Prior art keywords
hydrogen gas
gas discharge
discharge device
gas
condensable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP25201392A
Other languages
Japanese (ja)
Other versions
JPH0674614A (en
Inventor
正美 間々田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP25201392A priority Critical patent/JP3157303B2/en
Publication of JPH0674614A publication Critical patent/JPH0674614A/en
Application granted granted Critical
Publication of JP3157303B2 publication Critical patent/JP3157303B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Sorption Type Refrigeration Machines (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、吸収式冷凍機や吸収ヒ
ートポンプなど(以下、吸収式冷凍機と総称する)の機
械内部で発生する水素ガスを機外へ排出するための技術
に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a technology for discharging hydrogen gas generated inside a machine such as an absorption refrigerator or an absorption heat pump (hereinafter collectively referred to as an absorption refrigerator) to the outside of the machine.

【0002】[0002]

【従来の技術】吸収式冷凍機は周知のように再生器、凝
縮器、蒸発器、吸収器などを順次配管接続し、臭化リチ
ウム水溶液などの吸収液により水などの冷媒を吸収させ
たり、放出させたりしながら循環させて熱の授受を行な
い、冷温水供給・冷暖房運転などに供するための装置で
ある。
2. Description of the Related Art As is well known, an absorption refrigerator has a regenerator, a condenser, an evaporator, an absorber and the like connected in series with a pipe to absorb a refrigerant such as water with an absorbent such as an aqueous solution of lithium bromide. This is a device for supplying and receiving heat by circulating while discharging and supplying it to cold / hot water supply / cooling / heating operation.

【0003】上記構成の吸収式冷凍機においては、再生
器、凝縮器、蒸発器、吸収器、およびこれらを連結する
配管部などが、鉄あるいはステンレス鋼によって形成さ
れ、冷媒に水、吸収液に臭化リチウム水溶液などが用い
られていると、冷媒および吸収液の水分や吸収液が機器
素材の金属と反応し、酸化皮膜などを形成する際に水素
ガスが発生する。特に、運転中は再生器により吸収液
が、例えば160℃と云った高温に加熱されるため上記
反応が生じ易く、水素ガスの発生が多くなる。
In the absorption refrigerator having the above structure, a regenerator, a condenser, an evaporator, an absorber, and a pipe connecting them are formed of iron or stainless steel. When an aqueous solution of lithium bromide or the like is used, the water and the absorbing liquid in the refrigerant and the absorbing liquid react with the metal of the material of the device, and hydrogen gas is generated when an oxide film or the like is formed. In particular, during the operation, the absorbent is heated to a high temperature of, for example, 160 ° C. by the regenerator, so that the above reaction is likely to occur, and the generation of hydrogen gas increases.

【0004】また、蒸発器などは冷媒が蒸発し易いよう
に高真空設計(例えば、数mmHg程度)となっている
ため、溶接などにより気密性を高めているが、大気の浸
入を完全に防止することは困難である。
Further, since the evaporator and the like have a high vacuum design (for example, about several mmHg) so that the refrigerant is easily evaporated, the airtightness is enhanced by welding or the like, but the infiltration of the atmosphere is completely prevented. It is difficult to do.

【0005】上記メカニズムで発生した水素ガスや、大
気からの侵入成分である窒素ガス・酸素ガスなどは、冷
凍機における冷却などでは凝縮することがないし、吸収
液への溶解度も極めて小さいため蒸発器や吸収器の非溶
液部に滞留し、次第にその濃度が高まる。このような不
凝縮ガスの機内における圧力が高まると、冷媒の蒸発が
抑制されて冷凍能力が低下したり、場合によっては冷凍
機の運転そのものが不能になってしまうことがあると云
った問題点がある。
[0005] Hydrogen gas generated by the above mechanism and nitrogen gas / oxygen gas which are intrusion components from the atmosphere are not condensed by cooling in a refrigerator or the like, and the solubility in the absorbing solution is extremely small, so that the evaporator is not used. And stay in the non-solution part of the absorber, and its concentration gradually increases. When the pressure of such non-condensable gas in the machine increases, the evaporation of the refrigerant is suppressed, and the refrigerating capacity is reduced. In some cases, the operation of the refrigerator may become impossible. There is.

【0006】このため、吸収器の非溶液部から上記不凝
縮ガスを送出することのできる不凝縮ガス室を連通して
設け、この不凝縮ガス室に温度が上昇した時に水素ガス
だけを透過する性質を有するパラジウムセルを取り付け
た構成の水素ガス排出装置の発明が、特開昭59−13
9864号公報に提案されている。
For this reason, an uncondensable gas chamber capable of delivering the above-mentioned non-condensable gas is provided in communication with the non-solution part of the absorber, and only hydrogen gas is permeated into the non-condensable gas chamber when the temperature rises. The invention of a hydrogen gas discharge device having a structure in which a palladium cell having properties is attached is disclosed in
9864.

【0007】[0007]

【発明が解決しようとする課題】上記パラジウムセルに
よる水素ガスを排出する能力は、水素ガスの分圧が高い
程高くなるが、上記従来構成の水素ガス排出装置におい
ては、水素ガス以外の不凝縮ガス、すなわち、窒素ガス
・酸素ガスなどの残留濃度が次第に高まって水素ガス排
出能力が時間の経過と共に低下するので、かかる装置を
取り付けてあっても冷凍機の運転ができなくなることが
あると云った問題があり、この点の解決が課題となって
いた。
The ability of the palladium cell to discharge hydrogen gas increases as the partial pressure of the hydrogen gas increases. Since the residual concentration of gas, ie, nitrogen gas / oxygen gas, gradually increases and the hydrogen gas discharge capacity decreases with time, the refrigerator may not be able to operate even with such a device installed. There was a problem, and the solution of this point was an issue.

【0008】[0008]

【課題を解決するための手段】本発明は上記従来技術の
課題を解決するためになされたもので、低温胴と、該低
温胴に連通した不凝縮ガス室とを、三方弁を介して水素
ガス排出装置に接続する吸収式冷凍機の水素ガス排出回
路であって、三方弁が、通常は不凝縮ガス室と水素ガス
排出装置とを連通し、所定時間毎、または水素ガス排出
装置内の圧力が所定値に達した特定時に切り替わり、水
素ガス排出装置と低温胴とを連通することを特徴とする
水素ガス排出回路と、
SUMMARY OF THE INVENTION The present invention has been made in order to solve the above-mentioned problems of the prior art. In the present invention, a low-temperature cylinder and a non-condensable gas chamber connected to the low-temperature cylinder are supplied with hydrogen through a three-way valve. A hydrogen gas discharge circuit of an absorption refrigerator connected to a gas discharge device, wherein a three-way valve normally communicates the non-condensing gas chamber and the hydrogen gas discharge device, and every predetermined time, or inside the hydrogen gas discharge device. A hydrogen gas discharge circuit, which is switched at a specific time when the pressure reaches a predetermined value and communicates the hydrogen gas discharge device with the low temperature body,

【0009】低温胴に連通したエゼクターを有する不凝
縮ガス室と、該不凝縮ガス室のエゼクター設置部とを、
三方弁を介して水素ガス排出装置に接続する吸収式冷凍
機の水素ガス排出回路であって、三方弁が、通常は不凝
縮ガス室と水素ガス排出装置とを連通し、所定時間毎、
または水素ガス排出装置内の圧力が所定値に達した特定
時に切り替わり、水素ガス排出装置と不凝縮ガス室のエ
ゼクター設置部とを連通することを特徴とする水素ガス
排出回路と、を提供し、前記従来技術の課題を解決する
ものである。
An uncondensable gas chamber having an ejector communicating with the low-temperature cylinder, and an ejector installation portion of the non-condensable gas chamber,
A hydrogen gas discharge circuit of an absorption refrigerator connected to a hydrogen gas discharge device via a three-way valve, wherein the three-way valve normally communicates the non-condensable gas chamber and the hydrogen gas discharge device, and at predetermined time intervals,
Or a hydrogen gas discharge circuit, which is switched at a specific time when the pressure in the hydrogen gas discharge device reaches a predetermined value, and communicates the hydrogen gas discharge device and an ejector installation portion of the non-condensable gas chamber, An object of the present invention is to solve the problems of the conventional technology.

【0010】[0010]

【作用】請求項1に係わる水素ガス排出回路の場合;通
常は不凝縮ガス室と水素ガス排出装置とが三方弁を介し
て連通し、水素ガス排出装置と低温胴(吸収器・凝縮器
・蒸発器など)とが不通となっているので、低温胴から
エゼクターなどを介して不凝縮ガス室に送出された水素
ガス・窒素ガス・酸素ガスなどの不凝縮ガスは、三方弁
を介して水素ガス排出装置に流入し、水素ガスのみが水
素ガス排出装置のパラジウムセルなどによって機外に選
択的に排出され、他の窒素ガス・酸素ガスなどの不凝縮
ガスの濃度が次第に高まる。
In the case of the hydrogen gas discharge circuit according to claim 1, the non-condensable gas chamber and the hydrogen gas discharge device usually communicate with each other through a three-way valve, and the hydrogen gas discharge device and the low-temperature cylinder (absorber, condenser, Evaporator, etc.), the non-condensable gas such as hydrogen gas, nitrogen gas and oxygen gas sent from the low temperature body to the non-condensable gas chamber via an ejector etc. The hydrogen gas flows into the gas discharge device, and only the hydrogen gas is selectively discharged outside the apparatus by a palladium cell or the like of the hydrogen gas discharge device, and the concentration of other non-condensable gases such as nitrogen gas and oxygen gas gradually increases.

【0011】所定時間が経過するか、水素ガス排出装置
内における不凝縮ガス分圧(水素ガス・窒素ガス・酸素
ガスなどの何れでも良い)が所定値に達した特定時に、
三方弁が切り替わって不凝縮ガス室と水素ガス排出装置
とが不通となり、これまで不通であった水素ガス排出装
置と低温胴とが連通し、水素ガス排出装置に残留してい
た水素ガス分圧の低い不凝縮ガス、換言すれば窒素ガス
・酸素ガスなどの比率が高い不凝縮ガスが低温胴に流入
して減少するので、水素ガス排出装置における水素ガス
排出機能が元の状態に復帰する。
When a predetermined time elapses or when a specific pressure of the non-condensable gas (which may be any of hydrogen gas, nitrogen gas, oxygen gas, etc.) in the hydrogen gas discharge device reaches a predetermined value,
The three-way valve is switched so that the non-condensable gas chamber and the hydrogen gas discharge device are disconnected, and the previously disconnected hydrogen gas discharge device communicates with the low temperature body, and the hydrogen gas partial pressure remaining in the hydrogen gas discharge device Since the non-condensable gas having a low ratio, that is, the non-condensable gas having a high ratio of nitrogen gas / oxygen gas flows into the low temperature body and decreases, the hydrogen gas discharging function of the hydrogen gas discharging device returns to the original state.

【0012】このため、三方弁が再度切り替わって不凝
縮ガス室と水素ガス排出装置とが連通すると、不凝縮ガ
ス室から水素ガス排出装置に流入した不凝縮ガスの内の
水素ガスが選択的に能率良く排出される。
For this reason, when the three-way valve is switched again and the non-condensable gas chamber communicates with the hydrogen gas discharge device, the hydrogen gas in the non-condensable gas flowing into the hydrogen gas discharge device from the non-condensable gas chamber is selectively removed. It is discharged efficiently.

【0013】請求項2に係わる水素ガス排出回路の場
合;通常は不凝縮ガス室と水素ガス排出装置とが三方弁
を介して連通し、水素ガス排出装置と不凝縮ガス室のエ
ゼクター設置部とが不通となっているので、低温胴から
エゼクターを介して不凝縮ガス室に送出された水素ガス
・窒素ガス・酸素ガスなどの不凝縮ガスは、三方弁を介
して水素ガス排出装置に流入し、水素ガスのみが水素ガ
ス排出装置のパラジウムセルなどによって機外に選択的
に排出され、他の窒素ガス・酸素ガスなどの不凝縮ガス
の濃度が次第に高まる。
In the case of the hydrogen gas discharge circuit according to claim 2, the non-condensing gas chamber and the hydrogen gas discharging device usually communicate with each other through a three-way valve, and the hydrogen gas discharging device and the ejector installation portion of the non-condensing gas chamber are connected. The non-condensable gas, such as hydrogen gas, nitrogen gas, and oxygen gas, sent from the low temperature body to the non-condensable gas chamber via the ejector flows into the hydrogen gas discharge device through the three-way valve. Only the hydrogen gas is selectively discharged outside the apparatus by a palladium cell or the like of the hydrogen gas discharge device, and the concentration of other non-condensable gases such as nitrogen gas and oxygen gas gradually increases.

【0014】所定時間が経過するか、水素ガス排出装置
内における前記不凝縮ガス分圧が所定値に達した特定時
に、三方弁が切り替わって不凝縮ガス室と水素ガス排出
装置とが不通となり、これまで不通であった水素ガス排
出装置と不凝縮ガス室のエゼクター設置部とが連通し、
水素ガス排出装置に残留していた水素ガス分圧の低い不
凝縮ガス、すなわち窒素ガス・酸素ガスなどの比率が高
い不凝縮ガスが低温胴に流入して減少するので、水素ガ
ス排出装置における水素ガス排出機能が元の状態に復帰
する。
When the predetermined time has elapsed or when the partial pressure of the non-condensable gas in the hydrogen gas discharge device has reached a predetermined value, the three-way valve is switched to disconnect the non-condensable gas chamber from the hydrogen gas discharge device. The hydrogen gas discharge device that had been disconnected until now communicates with the ejector installation section of the non-condensable gas chamber,
Since the non-condensable gas with a low hydrogen gas partial pressure remaining in the hydrogen gas discharge device, that is, the non-condensable gas having a high ratio of nitrogen gas / oxygen gas, flows into the low-temperature cylinder and decreases, the hydrogen in the hydrogen gas discharge device is reduced. The gas discharge function returns to the original state.

【0015】このため、三方弁が再度切り替わって不凝
縮ガス室と水素ガス排出装置とが連通すると、不凝縮ガ
ス室から水素ガス排出装置に流入した不凝縮ガスの内の
水素ガスが選択的に能率良く排出される。
Therefore, when the three-way valve is switched again and the non-condensable gas chamber communicates with the hydrogen gas discharge device, the hydrogen gas in the non-condensable gas flowing into the hydrogen gas discharge device from the non-condensable gas chamber is selectively removed. It is discharged efficiently.

【0016】[0016]

【実施例】図1は、請求項1に係わる水素排出回路を組
み込んだ吸収式冷凍機の一構成例であって、図中11は
高温再生器、12は低温再生器、13は凝縮器、14は
蒸発器、15は吸収器、16は高温熱交換器、17は低
温熱交換器であり、
FIG. 1 shows an example of the construction of an absorption refrigerator incorporating a hydrogen discharge circuit according to claim 1. In the drawing, 11 is a high-temperature regenerator, 12 is a low-temperature regenerator, 13 is a condenser, 14 is an evaporator, 15 is an absorber, 16 is a high-temperature heat exchanger, 17 is a low-temperature heat exchanger,

【0017】ここに例示した水素ガス排出回路は、三方
弁21が、不凝縮ガス室22と低温胴である吸収器15
とを、水素ガス排出装置23に適宜接続可能とするもの
であって、通常は不凝縮ガス室22と水素ガス排出装置
23とが連通し、水素ガス排出装置23と吸収器15と
の間が不通であり、
In the hydrogen gas discharge circuit exemplified here, the three-way valve 21 includes the non-condensing gas chamber 22 and the absorber 15 as a low temperature body.
Can be connected to the hydrogen gas discharge device 23 as appropriate. Usually, the non-condensable gas chamber 22 and the hydrogen gas discharge device 23 communicate with each other, and the space between the hydrogen gas discharge device 23 and the absorber 15 is provided. Is uncommunicable,

【0018】特定時に前記三方弁21を切り替わって、
不凝縮ガス室22と水素ガス排出装置23とが不通とな
り、水素ガス排出装置23と吸収器15とが連通するよ
うになっている。
When the three-way valve 21 is switched at a specific time,
The non-condensable gas chamber 22 and the hydrogen gas discharge device 23 are not connected, and the hydrogen gas discharge device 23 and the absorber 15 are connected.

【0019】なお、不凝縮ガス室22は上部にエゼクタ
ー22aを有し、このエゼクター22aと吸収液導入管
31とを介して、吸収液ポンプP1が吸収器15から高
温再生器11に送る吸収液の一部が分岐して勢い良く噴
出するようになっており、この噴出力を利用して、吸収
器15の非溶液部(吸収液が液体として存在することの
ない領域)Aに存するガス体(冷媒蒸気・霧状吸収液・
水素ガス・窒素ガス・酸素ガスなどの混在物)が吸引で
きるようにガス体導入管32が配管され、同様に、凝縮
器13の非溶液部Bからもガス体が吸引できるようにガ
ス体導入管33が配管接続されている。
The non-condensable gas chamber 22 has an ejector 22a in the upper part, and the absorbing solution pump P1 sends the absorbing solution from the absorber 15 to the high temperature regenerator 11 via the ejector 22a and the absorbing solution introducing pipe 31. Is partly branched and spouted vigorously, and by utilizing this jetting power, the gas body existing in the non-solution part A (region where the absorbing liquid does not exist as a liquid) A of the absorber 15 is used. (Refrigerant vapor, atomized absorbent,
A gas body introduction pipe 32 is provided so as to be capable of sucking a mixture of hydrogen gas, nitrogen gas, oxygen gas, and the like. Similarly, the gas body is introduced so that the gas body can be sucked also from the non-solution part B of the condenser 13. A pipe 33 is connected to the pipe.

【0020】水素ガス排出装置23は、水素ガス排出管
取付容器23aにそれ自体は従来周知の水素ガス排出
管、例えばパラジウムセル23bを有しており、内蔵し
ているヒータ(図示せず)に通電して加熱することによ
り、微細な分子の水素ガスだけが透過して排出できるよ
うになっている。
The hydrogen gas discharge device 23 has a conventionally well-known hydrogen gas discharge tube, for example, a palladium cell 23b, in a hydrogen gas discharge tube mounting container 23a, and a built-in heater (not shown). By heating by energizing, only hydrogen gas of fine molecules can be transmitted and discharged.

【0021】高温再生器11、低温再生器12、凝縮器
13、蒸発器14、吸収器15、高温熱交換器16、低
温熱交換器17およびこれらを連結する配管部などが例
えば鉄によって形成され、前記したように冷媒に水、吸
収液に臭化リチウム水溶液が用いられていると、運転
中、吸収液は高温再生器11において例えば160℃に
も加熱され、高温蒸気を発生する吸収液や高温の冷媒蒸
気(水蒸気)などが装置を構成する鉄と反応して表面に
酸化皮膜を形成する際に水素ガスが発生する。
The high-temperature regenerator 11, the low-temperature regenerator 12, the condenser 13, the evaporator 14, the absorber 15, the high-temperature heat exchanger 16, the low-temperature heat exchanger 17, and the piping connecting them are made of, for example, iron. As described above, if water is used as the refrigerant and an aqueous solution of lithium bromide is used as the absorbing liquid, the absorbing liquid is heated to, for example, 160 ° C. in the high-temperature regenerator 11 during operation, and the absorbing liquid that generates high-temperature steam or Hydrogen gas is generated when high-temperature refrigerant vapor (water vapor) reacts with iron constituting the device to form an oxide film on the surface.

【0022】また、機器の連結部やピンホールなどを介
して大気が機内に侵入することがあるが、このようにし
て機内に溜った水素ガス・窒素ガス・酸素ガスなどは、
冷凍機における冷却温度範囲では凝縮することがない
し、吸収液への溶解度も極めて小さいため、吸収器15
の非溶液部Aや凝縮器13の非溶液部Bに滞留して次第
にその濃度が高まり、内圧が上昇する要因となる。
In addition, the atmosphere may enter the machine through a connection portion of the device or a pinhole, and the hydrogen gas, the nitrogen gas, the oxygen gas, etc. accumulated in the machine in this way are:
Since it does not condense in the cooling temperature range of the refrigerator and has extremely low solubility in the absorbing solution, the absorber 15
And the concentration thereof gradually increases in the non-solution part A of the condenser 13 and the non-solution part B of the condenser 13, causing the internal pressure to rise.

【0023】しかし、上記構成の吸収式冷凍機において
は本発明の水素ガス排出回路が組み込まれているため、
吸収液ポンプP1により所定の圧力(例えば、2Kgf/cm
2 )で吐出された吸収液の一部が吸収液導入管31・エ
ゼクター22aを介して高速で不凝縮ガス室22に吐出
する際に、吸収器15の非溶液部Aに一端が連通してい
るガス体導入管32のエゼクター22a設置部の圧力が
低下し、吸収器15の非溶液部Aに存在している冷媒蒸
気・霧状吸収液・水素ガス・窒素ガス・酸素ガスなどの
混在ガスがガス体導入管32側に引き込まれ、凝縮器1
3の非溶液部Bに存在している冷媒蒸気・水素ガス・窒
素ガス・酸素ガスなどの混在ガスがガス体導入管33側
に引き込まれ、共に吸収液と一体となって不凝縮ガス室
22に吐出する。
However, in the absorption refrigerator having the above structure, since the hydrogen gas discharge circuit of the present invention is incorporated,
A predetermined pressure (for example, 2 kgf / cm) by the absorbent pump P1
When a part of the absorbing liquid discharged in 2 ) is discharged into the non-condensable gas chamber 22 at high speed through the absorbing liquid introducing pipe 31 and the ejector 22a, one end communicates with the non-solution part A of the absorber 15. The pressure of the ejector 22 a installation portion of the gas introduction pipe 32 is reduced, and the mixed gas such as refrigerant vapor, atomized absorption liquid, hydrogen gas, nitrogen gas, oxygen gas, etc., is present in the non-solution portion A of the absorber 15. Is drawn into the gas inlet tube 32 side, and the condenser 1
The mixed gas such as refrigerant vapor, hydrogen gas, nitrogen gas, and oxygen gas existing in the non-solution portion B of No. 3 is drawn into the gas introduction pipe 33 side, and is integrated with the absorbing liquid together with the non-condensable gas chamber 22. To be discharged.

【0024】そして、不凝縮ガス室22内では、吸収液
に溶解しないガスのみが溶液中を気泡となって上昇し、
気液が分離される。すなわち、水素ガス・窒素ガス・酸
素ガスなどは上記したように吸収液には実質的に溶解さ
れないため、吸収液の中を気泡となって上昇し、上部に
これら不凝縮ガスのみが貯留される。この不凝縮ガスは
三方弁21を介して上方に設置されている水素ガス排出
装置23の水素ガス排出管取付容器23aに流入し、こ
の内から水素ガスのみがパラジウムセル23bを介して
機外に選択的に排出される。
Then, in the non-condensable gas chamber 22, only the gas that is not dissolved in the absorbing liquid rises as bubbles in the solution,
Gas and liquid are separated. That is, since hydrogen gas, nitrogen gas, oxygen gas, etc. are not substantially dissolved in the absorbing solution as described above, they rise as bubbles in the absorbing solution, and only these non-condensable gases are stored in the upper portion. . This non-condensable gas flows into the hydrogen gas discharge pipe mounting container 23a of the hydrogen gas discharge device 23 installed above via the three-way valve 21, and only hydrogen gas from outside flows out of the machine via the palladium cell 23b. Emitted selectively.

【0025】長期間に渡って上記水素ガスの排出を行っ
ていると、水素ガス排出管取付容器23a内の水素ガス
以外の不凝縮ガス、すなわち窒素ガス・酸素ガスなどの
比率が大きくなり、水素ガス分圧が低下して排出能力が
減少するので、所定時間、例えば24時間毎に三方弁2
1を切り替えるか、水素ガス排出装置23の適当な部位
に不凝縮ガスの圧力計を設置し、これによる計測値が所
定値(水素ガスであれば下限値、水素ガス以外の不凝縮
ガスであれば上限値)に達した特定時などに、三方弁2
1を切り替えて、
If the hydrogen gas is discharged for a long period of time, the ratio of non-condensable gas other than hydrogen gas in the hydrogen gas discharge pipe mounting container 23a, that is, nitrogen gas / oxygen gas becomes large, Since the gas partial pressure is reduced and the discharge capacity is reduced, the three-way valve 2 is provided every predetermined time, for example, every 24 hours.
1 or a pressure gauge of the non-condensable gas is installed at an appropriate part of the hydrogen gas discharging device 23, and the measured value is a predetermined value (lower limit value for hydrogen gas, lower limit value for non-condensable gas other than hydrogen gas). At the time of reaching the upper limit, for example)
Switch 1 and

【0026】不凝縮ガス室22と水素ガス排出装置23
とを不通とし、これまで不通であった水素ガス排出装置
23と低温胴である吸収器15とを連通させ、水素ガス
排出装置23に残留していた窒素ガス・酸素ガスなどの
比率の高くなった不凝縮ガスを吸収器15に流入させ
る。
Non-condensing gas chamber 22 and hydrogen gas discharging device 23
The hydrogen gas discharge device 23 and the low-temperature body absorber 15 are communicated with each other so that the ratio of nitrogen gas / oxygen gas remaining in the hydrogen gas discharge device 23 becomes high. The non-condensed gas that has flowed into the absorber 15.

【0027】このため、三方弁21が再度切り替わって
不凝縮ガス室22と水素ガス排出装置23とが連通する
と、不凝縮ガス室22から水素ガス排出装置23に流入
する不凝縮ガスの中から水素ガスが選択的に能率良く機
外に排出される。
For this reason, when the three-way valve 21 is switched again and the non-condensable gas chamber 22 communicates with the hydrogen gas discharge device 23, the hydrogen from the non-condensable gas flowing into the hydrogen gas discharge device 23 from the non-condensable gas chamber 22 is removed. Gas is selectively and efficiently discharged outside the machine.

【0028】図2は、請求項2に係わる水素ガス排出回
路を示しており、この場合の水素ガス排出回路において
は三方弁21が、通常は不凝縮ガス室22と水素ガス排
出装置23とを連通し、特定時に切り替わって、水素ガ
ス排出装置23と不凝縮ガス室22のエゼクター22a
設置部とが連通するように配管接続されている。
FIG. 2 shows a hydrogen gas discharging circuit according to a second aspect of the present invention. In this case, the three-way valve 21 normally includes a non-condensing gas chamber 22 and a hydrogen gas discharging device 23. Communication and switching at a specific time, the hydrogen gas discharge device 23 and the ejector 22a of the non-condensable gas chamber 22
The pipe is connected so as to communicate with the installation section.

【0029】なお、吸収式冷凍機自体の構成は図1の実
施例と同様である。
The structure of the absorption refrigerator is the same as that of the embodiment shown in FIG.

【0030】この場合の水素ガス排出回路においても、
所定時間が経過するか、水素ガス・窒素ガスなどの分圧
が所定値に達した特定時に、前記三方弁21を切り替え
て、不凝縮ガス室22と水素ガス排出装置23とを不通
とし、水素ガス排出装置23と不凝縮ガス室22のエゼ
クター22a設置部とを連通させ、
In the hydrogen gas discharge circuit in this case,
When a predetermined time elapses or when the partial pressure of hydrogen gas / nitrogen gas reaches a predetermined value, the three-way valve 21 is switched to disconnect the non-condensing gas chamber 22 and the hydrogen gas discharge device 23, and The gas discharge device 23 communicates with the ejector 22a installation portion of the non-condensable gas chamber 22,

【0031】水素ガス排出装置23に残留していた窒素
ガス・酸素ガスなどの比率の高くなった不凝縮ガスを吸
収器15に流入させる。
The non-condensable gas having a high ratio of nitrogen gas / oxygen gas remaining in the hydrogen gas discharge device 23 flows into the absorber 15.

【0032】このため、三方弁21が再度切り替わって
不凝縮ガス室22と水素ガス排出装置23とが連通する
と、この場合も不凝縮ガス室22から水素ガス排出装置
23に流入した不凝縮ガスの内の水素ガスが選択的に能
率良く排出される。
For this reason, when the three-way valve 21 is switched again and the non-condensable gas chamber 22 communicates with the hydrogen gas discharge device 23, the non-condensable gas flowing into the hydrogen gas discharge device 23 from the non-condensable gas chamber 22 is also used in this case. The hydrogen gas inside is selectively and efficiently discharged.

【0033】図3は、本発明の効果を具体的に検証する
ために行った実験装置の概略を示したものであり、10
0は吸収器15を想定して製作した鉄製の真空容器(内
容積2516cc)、101は電熱ヒータ、102は水
素ガスボンベ、103は真空ポンプ、104は圧力計、
105は記録計、V1〜V4は開閉弁であり、23は前
記実施例で使用した水素ガス排出装置である。
FIG. 3 schematically shows an experimental apparatus used for specifically verifying the effects of the present invention.
Numeral 0 is an iron vacuum container (internal volume 2516 cc) manufactured assuming the absorber 15, 101 is an electric heater, 102 is a hydrogen gas cylinder, 103 is a vacuum pump, 104 is a pressure gauge,
Reference numeral 105 denotes a recorder, V1 to V4 denote on-off valves, and 23 denotes a hydrogen gas discharge device used in the above-described embodiment.

【0034】真空容器100の内部には臭化リチウム溶
液と2エチルヘキサノールとが封入されてあり、電熱ヒ
ータ101が容器内を例えば40℃に加熱・保温するこ
とにより、実際の水素ガス排出管取付容器23aの温度
になるようになっている。
A lithium bromide solution and 2-ethylhexanol are sealed inside the vacuum vessel 100, and the electric heater 101 heats and keeps the inside of the vessel at, for example, 40.degree. The temperature of the container 23a is set.

【0035】開閉弁V2を閉じ、開閉弁V1・V3・V
4を開いた状態で真空ポンプ103を起動し、真空容器
100の内圧が5mmHgになった時、開閉弁V3を閉
じ、開閉弁V2を開く、水素ボンベ102から水素ガス
を真空容器100の内圧が100mmHgになるまで注
入し、内圧の変化を記録計105にて記録した。
The on-off valve V2 is closed and the on-off valves V1, V3, V
4 is opened, the vacuum pump 103 is started, and when the internal pressure of the vacuum container 100 becomes 5 mmHg, the on-off valve V3 is closed and the on-off valve V2 is opened. The injection was performed until the pressure reached 100 mmHg, and the change in the internal pressure was recorded by the recorder 105.

【0036】すなわち、真空容器100に注入した水素
ガスが、水素ガス排出装置23のパラジウムセル23b
から機外に排出され、内圧が20mmHgに低下した時
点で開閉弁V2を開き、水素ガスボンベ102から容器
の内圧が100mmHgを回復するまで補給する、と云
った水素ガスの排出・注入作業を1週間繰り返し、
That is, the hydrogen gas injected into the vacuum vessel 100 is supplied to the palladium cell 23 b of the hydrogen gas discharging device 23.
The discharge / injection operation of hydrogen gas, which is to open and close the on-off valve V2 when the internal pressure drops to 20 mmHg and replenish the internal pressure of the container from the hydrogen gas cylinder 102 to 100 mmHg when the internal pressure drops to 20 mmHg for one week repetition,

【0037】その後、開閉弁V4を閉じ、開閉弁V3を
開いた状態で真空ポンプ103を起動させて1分間の真
空吸引を行ない、さらにその後、開閉弁V3を閉じ、開
閉弁V4とV2とを開き、真空容器100の内圧が10
0mmHgを回復するまで水素ガスボンベ102から水
素ガスを注入し、この間の内圧の変化を測定することに
より、水素ガス排出装置23、すなわちパラジウムセル
23bによる水素ガス排出能力の推移および回復度を調
査し、表1の結果を得た。
Thereafter, the on-off valve V4 is closed, the vacuum pump 103 is started with the on-off valve V3 open, and vacuum suction is performed for one minute. Thereafter, the on-off valve V3 is closed and the on-off valves V4 and V2 are connected. When the internal pressure of the vacuum container 100 is
By injecting hydrogen gas from the hydrogen gas cylinder 102 until the pressure recovers to 0 mmHg, and measuring the change in internal pressure during the injection, the change and the degree of recovery of the hydrogen gas discharge capability of the hydrogen gas discharge device 23, that is, the palladium cell 23b, are investigated. The results in Table 1 were obtained.

【0038】[0038]

【表1】 [Table 1]

【0039】表1から、水素ガス排出装置23、すなわ
ちパラジウムセル23bによる水素ガス排出能力は、当
初3.4cc/分と云う高い性能を有しているが、時間
の経過と共にその排出能力は低下し、1週間が経過する
と当初の機能の僅か40%弱にまで低下するが、水素ガ
ス排出装置23に残留しているガス、すなわち水素以外
の窒素ガス・酸素ガスなどの比率が高まった不凝縮ガス
を吸引除去することによって、当初の機能にまで完全に
回復することが確認された。
As can be seen from Table 1, the hydrogen gas discharging device 23, that is, the hydrogen gas discharging capability of the palladium cell 23b has a high performance of 3.4 cc / min at first, but the discharging capability decreases with time. After one week, the original function is reduced to slightly less than 40% of the original function, but the non-condensation in which the ratio of the gas remaining in the hydrogen gas discharge device 23, that is, the nitrogen gas / oxygen gas other than the hydrogen is increased. It was confirmed that the gas was completely removed to the original function by aspiration.

【0040】なお、本発明は上記実施例に限定されるも
のではないので、特許請求の範囲に記載の趣旨から逸脱
しない範囲で各種の変形実施が可能であり、例えば水素
ガス・窒素ガス・酸素ガスなどの不凝縮ガスの送出を、
吸収器15のみから行うものであっても良い。
Since the present invention is not limited to the above embodiment, various modifications can be made without departing from the spirit of the appended claims. For example, hydrogen gas, nitrogen gas, oxygen gas, etc. Delivery of non-condensable gas such as gas
It may be performed only from the absorber 15.

【0041】[0041]

【発明の効果】以上説明したように本発明は、低温胴
と、該低温胴に連通した不凝縮ガス室とを、三方弁を介
して水素ガス排出装置に接続する吸収式冷凍機の水素ガ
ス排出回路であって、三方弁が、通常は不凝縮ガス室と
水素ガス排出装置とを連通し、所定時間毎、または水素
ガス排出装置内の圧力が所定値に達した特定時に切り替
わり、水素ガス排出装置と低温胴とを連通することを特
徴とする水素ガス排出回路であり、
As described above, the present invention relates to a hydrogen gas for an absorption type refrigerator in which a low-temperature cylinder and an uncondensable gas chamber connected to the low-temperature cylinder are connected to a hydrogen gas discharge device via a three-way valve. In the discharge circuit, the three-way valve normally communicates the non-condensable gas chamber with the hydrogen gas discharge device, and is switched every predetermined time or at a specific time when the pressure in the hydrogen gas discharge device reaches a predetermined value, and the hydrogen gas is discharged. A hydrogen gas discharge circuit characterized by communicating the discharge device with the low temperature body,

【0042】低温胴に連通したエゼクターを有する不凝
縮ガス室と、該不凝縮ガス室のエゼクター設置部とを、
三方弁を介して水素ガス排出装置に接続する吸収式冷凍
機の水素ガス排出回路であって、三方弁が、通常は不凝
縮ガス室と水素ガス排出装置とを連通し、所定時間毎、
または水素ガス排出装置内の圧力が所定値に達した特定
時に切り替わり、水素ガス排出装置と不凝縮ガス室のエ
ゼクター設置部とを連通することを特徴とする水素ガス
排出回路であるので、
A non-condensing gas chamber having an ejector communicating with the low-temperature cylinder, and an ejector installation portion of the non-condensing gas chamber,
A hydrogen gas discharge circuit of an absorption refrigerator connected to a hydrogen gas discharge device via a three-way valve, wherein the three-way valve normally communicates the non-condensable gas chamber and the hydrogen gas discharge device, and at predetermined time intervals,
Or it is switched at a specific time when the pressure in the hydrogen gas discharge device reaches a predetermined value, and is a hydrogen gas discharge circuit characterized by communicating the hydrogen gas discharge device and the ejector installation part of the non-condensable gas chamber,

【0043】時間の経過と共に低下し勝ちな水素ガス排
出装置のガス排出能力が、高価な真空ポンプなどを使用
することなく、簡単にしかも完全に回復することから、
蒸発器などにおける冷媒の蒸発が抑制されることがなく
なり、吸収式冷凍機の冷凍能力が長期に渡って十分に発
揮できるようになった。
Since the gas discharge capability of the hydrogen gas discharge device, which tends to decrease with time, can be easily and completely recovered without using an expensive vacuum pump or the like.
The evaporation of the refrigerant in the evaporator or the like is no longer suppressed, and the refrigeration capacity of the absorption refrigerator can be sufficiently exhibited over a long period of time.

【図面の簡単な説明】[Brief description of the drawings]

【図1】一実施例を示す説明図である。FIG. 1 is an explanatory diagram showing one embodiment.

【図2】他の実施例を示す説明図である。FIG. 2 is an explanatory diagram showing another embodiment.

【図3】実験装置の説明図である。FIG. 3 is an explanatory diagram of an experimental apparatus.

【符号の説明】[Explanation of symbols]

11 高温再生器 12 低温再生器 13 凝縮器 14 蒸発器 15 吸収器 16 高温熱交換器 17 低温熱交換器 21 三方弁 22 不凝縮ガス室 22a エゼクター 23 水素ガス排出装置 23a 水素ガス排出管取付容器 23b パラジウムセル 31 吸収液導入管 32・33 ガス体導入管 100 真空容器 101 電熱ヒータ 102 水素ガスボンベ 103 真空ポンプ 104 圧力計 105 記録計 P1 吸収液ポンプ A・B 非溶液部 V1・V2・V3・V4 開閉弁 DESCRIPTION OF SYMBOLS 11 High temperature regenerator 12 Low temperature regenerator 13 Condenser 14 Evaporator 15 Absorber 16 High temperature heat exchanger 17 Low temperature heat exchanger 21 Three-way valve 22 Non-condensing gas chamber 22a Ejector 23 Hydrogen gas discharge device 23a Hydrogen gas discharge pipe mounting container 23b Palladium cell 31 Absorption liquid introduction pipe 32, 33 Gas introduction pipe 100 Vacuum container 101 Electric heater 102 Hydrogen gas cylinder 103 Vacuum pump 104 Pressure gauge 105 Recorder P1 Absorption liquid pump A / B Non-solution part V1, V2, V3, V4 Open / Close valve

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 低温胴と、該低温胴に連通した不凝縮ガ
ス室とを、三方弁を介して水素ガス排出装置に接続する
吸収式冷凍機の水素ガス排出回路であって、三方弁が、
通常は不凝縮ガス室と水素ガス排出装置とを連通し、所
定時間毎、または水素ガス排出装置内の圧力が所定値に
達した特定時に切り替わり、水素ガス排出装置と低温胴
とを連通することを特徴とする水素ガス排出回路。
1. A hydrogen gas discharge circuit of an absorption refrigerator in which a low-temperature cylinder and a non-condensable gas chamber communicating with the low-temperature cylinder are connected to a hydrogen gas discharge device through a three-way valve. ,
Normally, the non-condensing gas chamber communicates with the hydrogen gas discharge device, and switches every predetermined time or at a specific time when the pressure in the hydrogen gas discharge device reaches a predetermined value, and connects the hydrogen gas discharge device and the low temperature body. A hydrogen gas discharge circuit characterized by the following.
【請求項2】 低温胴に連通したエゼクターを有する不
凝縮ガス室と、該不凝縮ガス室のエゼクター設置部と
を、三方弁を介して水素ガス排出装置に接続する吸収式
冷凍機の水素ガス排出回路であって、三方弁が、通常は
不凝縮ガス室と水素ガス排出装置とを連通し、所定時間
毎、または水素ガス排出装置内の圧力が所定値に達した
特定時に切り替わり、水素ガス排出装置と不凝縮ガス室
のエゼクター設置部とを連通することを特徴とする水素
ガス排出回路。
2. A hydrogen gas for an absorption refrigerator in which an uncondensable gas chamber having an ejector communicating with a low-temperature body and an ejector installation portion of the noncondensable gas chamber are connected to a hydrogen gas discharge device via a three-way valve. In the discharge circuit, the three-way valve normally communicates the non-condensable gas chamber with the hydrogen gas discharge device, and is switched every predetermined time or at a specific time when the pressure in the hydrogen gas discharge device reaches a predetermined value, and the hydrogen gas is discharged. A hydrogen gas discharge circuit, which communicates a discharge device with an ejector installation portion of a non-condensable gas chamber.
JP25201392A 1992-08-28 1992-08-28 Hydrogen gas discharge circuit of absorption refrigerator Expired - Fee Related JP3157303B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25201392A JP3157303B2 (en) 1992-08-28 1992-08-28 Hydrogen gas discharge circuit of absorption refrigerator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25201392A JP3157303B2 (en) 1992-08-28 1992-08-28 Hydrogen gas discharge circuit of absorption refrigerator

Publications (2)

Publication Number Publication Date
JPH0674614A JPH0674614A (en) 1994-03-18
JP3157303B2 true JP3157303B2 (en) 2001-04-16

Family

ID=17231363

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25201392A Expired - Fee Related JP3157303B2 (en) 1992-08-28 1992-08-28 Hydrogen gas discharge circuit of absorption refrigerator

Country Status (1)

Country Link
JP (1) JP3157303B2 (en)

Also Published As

Publication number Publication date
JPH0674614A (en) 1994-03-18

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