JPH0660439A - Production of stamper for optical disk - Google Patents
Production of stamper for optical diskInfo
- Publication number
- JPH0660439A JPH0660439A JP20782292A JP20782292A JPH0660439A JP H0660439 A JPH0660439 A JP H0660439A JP 20782292 A JP20782292 A JP 20782292A JP 20782292 A JP20782292 A JP 20782292A JP H0660439 A JPH0660439 A JP H0660439A
- Authority
- JP
- Japan
- Prior art keywords
- stamper
- thin film
- inorganic compound
- master
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Landscapes
- Manufacturing Optical Record Carriers (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は光ディスクの作製方法に
係り、特に、原盤の長寿命化および表面の平坦性を向上
する上で好適な、光ディスク用スタンパの作製方法に関
する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing an optical disk, and more particularly to a method for manufacturing a stamper for an optical disk, which is suitable for prolonging the life of the master and improving the flatness of the surface.
【０００２】[0002]
【従来の技術】従来のプロセスでは、図４のように、表
面を平滑，平坦化した基板１に感光性樹脂２を塗布し、
光学的手段で感光性樹脂２の表面に案内溝および情報を
記録した凹凸パターンの少なくとも一つを形成して原盤
３を作製していた。その後、剥離層としてＡｌ−Ｔｉ膜
４を形成した後、紫外線硬化樹脂５を塗布し、透光性部
材６を重ね合わせ、紫外線７を透光性部材６の裏から照
射し、紫外線硬化樹脂５を硬化させ、紫外線硬化樹脂５
とＡｌ−Ｔｉ膜４の境界面から剥離を行ない、案内溝お
よび情報を記録した凹凸パターンの少なくとも一つが転
写されたスタンパ８を作製していた。ここで、凹凸パタ
ーンの形状は反転して形成される。さらに、スタンパ表
面に紫外線硬化樹脂９を塗布し、透光性基板１０を重ね
合わせ、紫外線７を透光性基板１０の裏から照射し、紫
外線硬化樹脂９を硬化させ、紫外線硬化樹脂５と紫外線
硬化樹脂９の境界面から剥離を行ない、案内溝および情
報を記録した凹凸パターンの少なくとも一つが複製され
たレプリカ１１を作製していた。ここで、紫外線硬化樹
脂９を塗布する前に、紫外線硬化樹脂５の表面にフッ素
系の液体を塗布した極薄膜を形成し、紫外線硬化樹脂を
硬化後の両者の剥離を容易にしている。2. Description of the Related Art In a conventional process, as shown in FIG. 4, a photosensitive resin 2 is applied to a substrate 1 having a smooth and flat surface,
At least one of the guide groove and the concavo-convex pattern in which information is recorded is formed on the surface of the photosensitive resin 2 by optical means to manufacture the master 3. After that, after forming the Al—Ti film 4 as a peeling layer, the ultraviolet curable resin 5 is applied, the transparent member 6 is overlapped, and the ultraviolet ray 7 is irradiated from the back side of the transparent member 6 to form the ultraviolet curable resin 5. UV curing resin 5
And the Al—Ti film 4 were separated from each other to form the stamper 8 to which at least one of the guide groove and the concave-convex pattern in which information was recorded was transferred. Here, the shape of the concavo-convex pattern is inverted and formed. Further, an ultraviolet curable resin 9 is applied to the surface of the stamper, a translucent substrate 10 is superposed on the stamper, and ultraviolet rays 7 are irradiated from the back of the translucent substrate 10 to cure the ultraviolet curable resin 9 and the ultraviolet curable resin 5 and the ultraviolet ray. Peeling was performed from the boundary surface of the cured resin 9 to produce a replica 11 in which at least one of the guide groove and the concavo-convex pattern in which information was recorded was duplicated. Here, before applying the ultraviolet curable resin 9, an ultrathin film in which a fluorine-based liquid is applied is formed on the surface of the ultraviolet curable resin 5 to facilitate separation of the ultraviolet curable resin and the both after curing.
【０００３】なお本発明に関連する従来技術として特開
昭59−114031号，特開昭61−113142号，特開平1−10733
9号 公報が挙げられる。As prior arts related to the present invention, JP-A-59-114031, JP-A-61-113142, and JP-A-1-10733.
No. 9 publication is mentioned.
【０００４】[0004]
【発明が解決しようとする課題】従来技術では、原盤の
剥離層として腐食しにくいＡｌ−Ｔｉ合金を用いてい
る。しかし、一般に、合金は融点が低いため粒径が大き
い合金膜が形成される。そのため、合金膜表面には粒径
に対応して微細な凹凸粗さが形成される。それにより、
案内溝および情報を記録した凹凸パターンなどが転写さ
れるほかに、Ａｌ−Ｔｉ合金膜の表面の微細な凹凸粗さ
もスタンパに転写される。したがって、スタンパを用い
てレプリカを複製すると、レプリカ表面に微細な凹凸粗
さも複製される。そのため、レーザ光を照射し反射光量
の強弱を情報に用いている光ディスクではノイズになる
ため問題になっていた。また、スタンパ作製工程の最後
に行なう原盤とスタンパの界面からの剥離の際、原盤に
大きいストレスがかかるので、数回のスタンパ作製で原
盤の剥離層の一部が剥がれてスタンパに残るため、スタ
ンパを多数枚転写できなかった。In the prior art, an Al-Ti alloy which is resistant to corrosion is used as the release layer of the master. However, since the alloy generally has a low melting point, an alloy film having a large grain size is formed. Therefore, fine unevenness roughness is formed on the surface of the alloy film according to the grain size. Thereby,
In addition to the transfer of the guide groove and the concavo-convex pattern in which information is recorded, the fine concavo-convex roughness of the surface of the Al-Ti alloy film is also transferred to the stamper. Therefore, when the replica is duplicated by using the stamper, the fine uneven roughness is also duplicated on the replica surface. Therefore, this is a problem because it becomes noise in an optical disk that is irradiated with laser light and uses the intensity of reflected light for information. Also, when peeling from the interface between the master and stamper performed at the end of the stamper manufacturing process, a large stress is applied to the master, so that a part of the peeling layer of the master peels off and remains on the stamper after the stamper is manufactured several times. I couldn't transfer many sheets.
【０００５】本発明の目的は、錆ない材料でしかも、感
光性樹脂に対しては接着性が良く、紫外線硬化樹脂に対
しては剥離しやすい剥離層を設けて、スタンパを多数枚
作製できる長寿命の原盤を提供することにある。An object of the present invention is to provide a release layer which is a material which does not rust and has good adhesiveness to a photosensitive resin and easy to release from an ultraviolet curable resin, so that a large number of stampers can be produced. It is to provide the master of life.
【０００６】[0006]
【課題を解決するための手段】上記目的は、スパッタリ
ング法により、案内溝および情報を記録した凹凸パター
ンの少なくとも一方を有する感光性樹脂膜の原盤表面
に、高融点の金属元素を主成分とする薄膜および無機化
合物のうちの少なくとも一つを、少なくとも一層以上に
形成することにより達成される。すなわち、上記感光性
樹脂膜の表面に、融点が高い金属元素を主成分とするタ
ーゲットあるいは無機化合物のターゲットを用いて、ス
パッタリング法により薄膜を形成する。それにより、粒
径が小さい剥離層が形成される。The above-mentioned object is to use a metal element having a high melting point as a main component on a master surface of a photosensitive resin film having at least one of a guide groove and an uneven pattern for recording information by a sputtering method. This is achieved by forming at least one of the thin film and the inorganic compound in at least one layer. That is, a thin film is formed on the surface of the photosensitive resin film by a sputtering method using a target containing a metal element having a high melting point as a main component or a target of an inorganic compound. Thereby, a peeling layer having a small particle size is formed.
【０００７】上記金属薄膜および無機化合物薄膜は、表
面に形成される微細な凹凸粗さの凹部あるいは凸部の半
値幅の平均値は２ｎｍから５０ｎｍの範囲が好ましい。
特に凹部あるいは凸部の半値幅の平均値は５ｎｍから３
０ｎｍの範囲が好ましい。また、上記薄膜の膜厚は、表
面に形成される凹凸の凹部と凸部の高さの差の平均値で
５ｎｍから２００ｎｍの範囲が好ましい。特に凹部と凸
部の高さの差の平均値で１０ｎｍから１５０ｎｍの範囲
が好ましい。The metal thin film and the inorganic compound thin film preferably have an average full width at half maximum of concave portions or convex portions having fine irregularities formed on the surface in the range of 2 nm to 50 nm.
Particularly, the average value of the half-value widths of the concave or convex portions is 5 nm to 3
The range of 0 nm is preferred. Further, the film thickness of the thin film is preferably in the range of 5 nm to 200 nm in terms of the average value of the height difference between the concave and convex portions formed on the surface. Particularly, the average value of the height difference between the concave portion and the convex portion is preferably in the range of 10 nm to 150 nm.
【０００８】さらに、上記薄膜の形成に用いる金属元素
の融点は１４００℃以上が好ましい。特に１４５０℃以
上３４５０℃以下の範囲がより好ましい。上記金属元素
は、Ｓｉ，Ｔｉ，Ｖ，Ｃｒ，Ｆｅ，Ｃｏ，Ｚｒ，Ｎｂ，
Ｍｏ，Ｔｃ，Ｒｕ，Ｒｈ，Ｐｄ，Ｈｆ，Ｔａ，Ｗ，Ｒ
ｅ，Ｏｓ，Ｉｒ，ＰｔおよびＣよりなる群より選ばれた
一者を主成分とすることが好ましい。上記感光性樹脂膜
との接着性が良い金属薄膜を形成後、スタンパとの剥離
性が良い金属薄膜を積層して多層構造にするとより好ま
しい。Further, the melting point of the metal element used for forming the thin film is preferably 1400 ° C. or higher. Particularly, the range of 1450 ° C or higher and 3450 ° C or lower is more preferable. The metal elements are Si, Ti, V, Cr, Fe, Co, Zr, Nb,
Mo, Tc, Ru, Rh, Pd, Hf, Ta, W, R
It is preferable that the main component is one selected from the group consisting of e, Os, Ir, Pt and C. It is more preferable to form a metal thin film having good adhesiveness with the photosensitive resin film and then stack metal thin films having good peelability from the stamper to form a multilayer structure.
【０００９】また、上記剥離層を多層構造にした場合、
上記感光性樹脂膜との接着性が良い無機化合物を原盤表
面に積層し、その上に金属薄膜を積層しても良い。上記
無機化合物薄膜の融点は４４０℃以上が好ましい。上記
無機化合物は、ＳｉＯ，Ｂ2Ｏ3，ＳｉＯ2，ＴｉＯ2，Ａ
ｌ2Ｏ3，Ｔａ2Ｏ5，ＳｎＯ2，ＭｎＯ，ＣａＯ，Ｚｒ
Ｏ2，ＭｇＯ，Ｙ2Ｏ3，Ｓｂ2Ｓ3，Ｓｂ2Ｓｅ3，Ｇｅ
Ｓ，ＧｅＳｅ，ＧｅＳ2，ＧｅＳｅ2，ＳｎＳ，ＳｎＳ
ｅ，ＳｎＳ2，ＳｎＳｅ2，ＰｂＳ，ＰｂＳｅ，Ｉｎ
2Ｓ3，Ｉｎ2Ｓｅ3，Ｃｕ2Ｓ，Ａｇ2Ｓ，ＺｎＳ，ＺｎＳ
ｅ，ＣｄＳ，ＣdＳe，Ｓｉ3Ｎ4，ＡｌＮ，ＴｉＮ，Ｚｒ
Ｎ，およびＢＮより選ばれた一つを主成分とすることが
好ましい。When the release layer has a multi-layer structure,
An inorganic compound having good adhesiveness to the photosensitive resin film may be laminated on the surface of the master and a metal thin film may be laminated thereon. The melting point of the inorganic compound thin film is preferably 440 ° C. or higher. The above-mentioned inorganic compounds are SiO, B 2 O 3 , SiO 2 , TiO 2 , and A.
l 2 O 3 , Ta 2 O 5 , SnO 2 , MnO, CaO, Zr
O 2 , MgO, Y 2 O 3 , Sb 2 S 3 , Sb 2 Se 3 , Ge
S, GeSe, GeS 2 , GeSe 2 , SnS, SnS
e, SnS 2 , SnSe 2 , PbS, PbSe, In
2 S 3 , In 2 Se 3 , Cu 2 S, Ag 2 S, ZnS, ZnS
e, CdS, CdSe, Si 3 N 4 , AlN, TiN, Zr
It is preferable to have one selected from N and BN as a main component.
【００１０】[0010]
【作用】案内溝および情報を記録した凹凸パターンの少
なくとも一つを有する感光性樹脂膜の原盤の表面に、ス
パッタリング法により、融点が高い金属元素あるいは無
機化合物を用いて薄膜を形成することにより、粒径が小
さい剥離層を形成できる。それにより薄膜の表面が微細
な凹凸粗さになるため、表面が滑らかなスタンパが転写
される。したがって、スタンパを用いると表面が滑らか
なレプリカが複製される。また、感光性樹脂膜との接着
性が良い金属薄膜を形成後、スタンパとの剥離性が良い
金属薄膜を積層して多層構造にするとより好ましい。さ
らに、剥離層を多層構造にした場合、感光性樹脂膜との
接着性が良い無機化合物を原盤表面に積層し、その上に
金属薄膜を積層しても良い。それにより、原盤との接着
性が向上し、かつ、スタンパとの剥離性が向上する。そ
のため原盤からスタンパを多数枚転写できる。スタンパ
から複製したレプリカを用いればノイズが低減した光デ
ィスクを作製できる。この構造にすることにより、原盤
剥離層の錆や腐食が発生しないため、長期的にわたって
保存しても、再利用が可能となり、原盤からのスタンパ
の転写枚数を１０枚以上にできる。さらに、上記原盤に
金属薄膜および無機化合物薄膜のいずれかを下部層にし
て多層構造に積層しても接着性を強化できる。それによ
り、原盤からのスタンパの転写枚数を１０枚以上にでき
る。[Function] By forming a thin film using a metal element or an inorganic compound having a high melting point on the surface of a master of a photosensitive resin film having at least one of a guide groove and an uneven pattern in which information is recorded, by a sputtering method, A release layer having a small particle size can be formed. As a result, the surface of the thin film has fine unevenness, so that a stamper having a smooth surface is transferred. Therefore, using the stamper, a replica with a smooth surface is duplicated. Further, it is more preferable to form a metal thin film having good adhesiveness with the photosensitive resin film and then stack metal thin films having good peeling property from the stamper to form a multilayer structure. Further, when the peeling layer has a multi-layer structure, an inorganic compound having good adhesiveness to the photosensitive resin film may be laminated on the surface of the master, and a metal thin film may be laminated thereon. Thereby, the adhesiveness with the master is improved and the peelability with the stamper is improved. Therefore, many stampers can be transferred from the master. An optical disk with reduced noise can be manufactured by using a replica duplicated from the stamper. With this structure, rust and corrosion of the master release layer do not occur, so that it can be reused even after long-term storage, and the number of stampers transferred from the master can be 10 or more. Further, the adhesion can be enhanced even if a metal thin film or an inorganic compound thin film is used as a lower layer on the above master to be laminated in a multilayer structure. As a result, the number of stamper transfers from the master can be made 10 or more.
【００１１】本発明はスタンパを作製するばかりでな
く、スタンパからレプリカを複製する場合のスタンパの
剥離層としても有効である。The present invention is effective not only for producing a stamper but also as a peeling layer for a stamper when replicating a stamper.
【００１２】[0012]
〈実施例１〉図１に示すように、基板（ガラス：１０
ｔ）１の表面に感光性樹脂２で作製した案内溝および情
報を記録した凹凸パターンの少なくとも一つを有する原
盤３の表面に、スパッタリング法によりＴｉ膜（５０ｎ
ｍ）１３を積層した。この後、Ｔｉ膜１３の表面に紫外
線硬化樹脂５を塗布し、透光性部材６（プラスチック：
２ｔ）を紫外線硬化樹脂５に重ね合わせ平行平坦にし、
紫外線７を透光性部材６の裏側から照射した（照射パワ
ー：４ｋｗ／cm2 、照射時間：３０秒）。その後、紫外
線硬化樹脂５とＴｉ膜１３の境界面で剥離すると、透光
性部材６上に原盤３の凹凸パターンが転写された紫外線
硬化樹脂５からなるスタンパ８が得られた。Example 1 As shown in FIG. 1, a substrate (glass: 10
t) On the surface of the master 3 having at least one of the guide groove made of the photosensitive resin 2 and the concavo-convex pattern in which information is recorded on the surface of 1), a Ti film (50 n
m) 13 was laminated. Thereafter, the surface of the Ti film 13 is coated with the ultraviolet curable resin 5, and the translucent member 6 (plastic:
2t) is superposed on the UV curable resin 5 to make it parallel and flat,
Ultraviolet rays 7 were irradiated from the back side of the translucent member 6 (irradiation power: 4 kw / cm 2 , irradiation time: 30 seconds). Then, when peeled off at the boundary surface between the ultraviolet curable resin 5 and the Ti film 13, a stamper 8 made of the ultraviolet curable resin 5 on which the concavo-convex pattern of the master 3 was transferred was obtained on the translucent member 6.
【００１３】ここで、Ｔｉ膜を形成するためのスパッタ
条件は、到達真空度を１×１０-6Torr以上１×１０-5To
rr以下の範囲とし、放電ガスにＡｒを用いて放電ガス圧
を２×１０-3Torr以上５×１０-2Torr以下の範囲とし
た。また、放電電力を１〜１０ｗ／cm2 の範囲とした。
この範囲にすることにより、表面に形成される微細な凹
凸粗さの凹部あるいは凸部の半値幅の平均値は２ｎｍか
ら５０ｎｍの範囲であり、微細な凹凸粗さの凹部と凹部
あるいは凸部と凸部の間隔の平均値は２ｎｍから５０ｎ
ｍの範囲でストレスが小さいＴｉ膜が得られる。Ｔｉ膜
の厚みは、案内溝および情報を記録した感光性樹脂（フ
ォトレジストＡＺ-１３５０)２の表面の凹凸パターンの
形状が転写される膜厚として、表面に形成される微細な
凹凸粗さの凹部と凸部の高さの差の平均値で５ｎｍから
２００ｎｍの範囲が好ましい。Here, the sputtering conditions for forming the Ti film are such that the ultimate vacuum is 1 × 10 −6 Torr or more and 1 × 10 −5 To.
The discharge gas pressure was set in the range of rr or less and the discharge gas pressure was set in the range of 2 × 10 −3 Torr or more and 5 × 10 −2 Torr or less using Ar as the discharge gas. Further, the discharge power was set in the range of 1 to 10 w / cm 2 .
Within this range, the average value of the half-value widths of the concaves or convexes having fine unevenness roughness formed on the surface is in the range of 2 nm to 50 nm. The average value of the intervals of the convex portions is from 2 nm to 50 n
A Ti film having a small stress can be obtained in the range of m. The thickness of the Ti film is the thickness of the guide groove and the shape of the uneven pattern on the surface of the photosensitive resin (photoresist AZ-1350) 2 on which information is recorded, and is the thickness of the fine uneven roughness formed on the surface. The average value of the height differences between the concave portions and the convex portions is preferably in the range of 5 nm to 200 nm.
【００１４】なお、透光性部材６の表面にあらかじめ接
着促進材（アクリルプライマ）を塗布することにより、
紫外線硬化樹脂５との接着性を向上させることができ
た。By applying an adhesion promoter (acrylic primer) to the surface of the transparent member 6 in advance,
The adhesiveness with the ultraviolet curable resin 5 could be improved.
【００１５】原盤から多数回のスタンパを作製しても原
盤表面の剥離層は剥がれることも無く、スタンパ作製は
少なくとも１０回行なうことができた。また、従来法で
作製した原盤表面は３カ月程度で錆や腐食が発生してい
たが、Ｔｉを使用すると、６カ月以上の長期保存ができ
るようになった。また、ＴｉをＳｉ，Ｖ，Ｃｒ，Ｍｎ，
Ｃｏ，Ｇｅ，Ｚｒ，Ｎｂ，Ｍｏ，Ｔｃ，Ｒｕ，Ｒｈ，Ｐ
ｄ，Ｈｆ，Ｔａ，Ｗ，Ｒｅ，Ｏｓ，Ｉｒ，Ｐｔ，Ａｕ、
およびＣより成る群より選ばれた一つを主成分とする金
属元素で置換しても同様の効果が得られた。さらに、剥
離層をスタンパに設けるとレプリカを複製する際の剥離
性が向上しかつ、表面の滑らかさも維持できるなどの同
様の効果があった。スタンパから表面が滑らかなレプリ
カを複製できた。Even if the stamper was produced many times from the master, the release layer on the surface of the master was not peeled off, and the stamper could be manufactured at least 10 times. In addition, the surface of the master prepared by the conventional method was rusted or corroded in about 3 months, but when Ti is used, it can be stored for a long period of 6 months or more. In addition, Ti is replaced with Si, V, Cr, Mn,
Co, Ge, Zr, Nb, Mo, Tc, Ru, Rh, P
d, Hf, Ta, W, Re, Os, Ir, Pt, Au,
Similar effects were obtained by substituting one selected from the group consisting of C and C with a metal element having a main component. Further, when the release layer is provided on the stamper, the release property when replicating the replica is improved, and the smoothness of the surface can be maintained, and similar effects are obtained. We were able to duplicate a smooth surface replica from the stamper.
【００１６】〈実施例２〉次に、本発明の第２の実施例
を図２により説明する。実施例１と同様に作製した原盤
３の表面に、スパッタリング法により第一剥離層として
Ｐｔ膜（５ｎｍ）１４を積層し、次に第二剥離層として
Ｔｉ膜（４５ｎｍ）１３を積層した。この後、実施例１
と同様にしてＴｉ膜１３の表面に紫外線硬化樹脂５を塗
布し、透光性部材６（プラスチック：２ｔ）を紫外線硬
化樹脂５に重ね合わせ平行平坦にし、紫外線７を透光性
部材６の裏側から照射した。その後、紫外線硬化樹脂５
とＴｉ膜１３の境界面で剥離すると、透光性部材６上に
原盤の凹凸パターンが転写された紫外線硬化樹脂５から
なるスタンパ８が得られた。原盤から多数回のスタンパ
を作製しても原盤表面の剥離層は剥がれることも無く、
スタンパ作製は少なくとも１０回行なうことができた。<Second Embodiment> Next, a second embodiment of the present invention will be described with reference to FIG. A Pt film (5 nm) 14 was laminated as a first peeling layer by a sputtering method on the surface of a master 3 manufactured in the same manner as in Example 1, and then a Ti film (45 nm) 13 was laminated as a second peeling layer. After this, Example 1
In the same manner as above, the ultraviolet curable resin 5 is applied to the surface of the Ti film 13, the translucent member 6 (plastic: 2t) is superposed on the ultraviolet curable resin 5 to be parallel and flat, and the ultraviolet ray 7 is applied to the back side of the translucent member 6. It was irradiated from. After that, UV curable resin 5
When peeled off at the boundary surface between the Ti film 13 and the Ti film 13, a stamper 8 made of the ultraviolet curable resin 5 having the concavo-convex pattern of the master transferred on the translucent member 6 was obtained. Even if a stamper is made many times from the master, the release layer on the master surface does not peel off,
The stamper could be manufactured at least 10 times.
【００１７】〈実施例３〉次に、本発明の第３の実施例
を図３により説明する。実施例１と同様に作製した原盤
３の表面に、スパッタリング法により第一剥離層として
無機化合物のＳｉＯ2膜（１０ｎｍ）１５を積層し、次
に第二剥離層としてＴｉ膜（３０ｎｍ)１３を積層し
た。この後、実施例１と同様にしてＴｉ膜１３の表面に
紫外線硬化樹脂５を塗布し、透光性部材６（プラスチッ
ク：２ｔ）を紫外線硬化樹脂５に重ね合わせ平行平坦に
し、紫外線７を透光性部材６の裏側から照射した。その
後、紫外線硬化樹脂５とＴｉ膜１３の境界面で剥離する
と、透光性部材６上に原盤の凹凸パターンが転写された
紫外線硬化樹脂５からなるスタンパ８が得られた。原盤
から多数回のスタンパを作製しても原盤表面の剥離層は
剥がれることも無く、スタンパ作製は少なくとも１０回
以上行なうことができた。<Third Embodiment> Next, a third embodiment of the present invention will be described with reference to FIG. An inorganic compound SiO 2 film (10 nm) 15 was laminated as a first release layer on the surface of a master 3 prepared in the same manner as in Example 1, and then a Ti film (30 nm) 13 was used as a second release layer. Laminated. Thereafter, in the same manner as in Example 1, the ultraviolet curable resin 5 is applied to the surface of the Ti film 13, the translucent member 6 (plastic: 2t) is superposed on the ultraviolet curable resin 5 to be parallel and flat, and the ultraviolet ray 7 is transmitted. Irradiation was performed from the back side of the light-sensitive member 6. After that, when peeled off at the boundary surface between the ultraviolet curable resin 5 and the Ti film 13, a stamper 8 made of the ultraviolet curable resin 5 on which the concavo-convex pattern of the master was transferred was obtained on the translucent member 6. Even if the stamper was manufactured many times from the master, the release layer on the master surface was not peeled off, and the stamper could be manufactured at least 10 times or more.
【００１８】また、ＳｉＯ2をＢ2Ｏ3，ＳｉＯ，Ｔｉ
Ｏ2，Ａｌ2Ｏ3，Ｔａ2Ｏ5，ＳｎＯ2，ＭｎＯ，Ｓｂ
2Ｓ3，Ｓｂ2Ｓｅ3，ＧｅＳ，ＧｅＳｅ，ＧｅＳ2，Ｇｅ
Ｓe2，ＳnＳ，ＳｎＳｅ，ＳｎＳ2，ＳｎＳｅ2，Ｐｂ
Ｓ，ＰｂＳｅ，Ｉｎ2Ｓ3，Ｉｎ2Ｓｅ3，Ｃｕ2Ｓ，Ａｇ2
Ｓ，ＺｎＳ，ＺｎＳｅ，ＣｄＳ，ＣｄＳｅ，Ｓｉ3Ｎ4，
ＣａＯ，ＺｒＯ2 ，ＭｇＯ，Ｙ2Ｏ3，ＡｌＮ，ＴｉＮ，
ＺｒＮ、およびＢＮに近い組成の材料より選ばれた少な
くとも一つに置き換えても同様の結果が得られる。ま
た、第一剥離層に金属元素の薄膜を積層し、第二剥離層
として無機化合物膜を積層しても同様の結果が得られ
た。Further, SiO 2 is replaced with B 2 O 3 , SiO, Ti
O 2 , Al 2 O 3 , Ta 2 O 5 , SnO 2 , MnO, Sb
2 S 3 , Sb 2 Se 3 , GeS, GeSe, GeS 2 , Ge
Se 2 , SnS, SnSe, SnS 2 , SnSe 2 , Pb
S, PbSe, In 2 S 3 , In 2 Se 3 , Cu 2 S, Ag 2
S, ZnS, ZnSe, CdS, CdSe, Si 3 N 4 ,
CaO, ZrO 2 , MgO, Y 2 O 3 , AlN, TiN,
Similar results can be obtained by substituting at least one selected from materials having a composition close to that of ZrN and BN. Similar results were obtained by laminating a thin film of a metal element on the first peeling layer and laminating an inorganic compound film as the second peeling layer.
【００１９】[0019]
【発明の効果】本発明によれば、光ディスク用スタンパ
の作製方法において、感光性樹脂の上にスパッタ法によ
り、融点が高い金属元素をターゲットに用いることによ
り、粒径が極めて小さい薄膜が形成される。それによ
り、表面は微細な凹凸になり、滑らかで、かつ、接着性
の良い剥離層を原盤の上に形成できる。それにより、表
面が滑らかなスタンパを多数枚作製できる。また、剥離
層を金属薄膜と無機化合物膜の組合せなどによる多層構
造にすることにより、感光性樹脂と剥離層の接着性は向
上し、剥離層と紫外線硬化樹脂の剥離性を損なうことが
無く、かつ、錆や腐食の発生の無い材質であることか
ら、原盤の長寿命化を達成できる。さらに、スタンパを
用いれば表面が滑らかなレプリカが複製できる。According to the present invention, in the method of manufacturing a stamper for an optical disk, a thin film having an extremely small grain size is formed on a photosensitive resin by sputtering by using a metal element having a high melting point as a target. It As a result, the surface becomes fine irregularities, and a smooth and good adhesive release layer can be formed on the master. Thereby, a large number of stampers having a smooth surface can be manufactured. Further, by forming the peeling layer into a multi-layer structure such as a combination of a metal thin film and an inorganic compound film, the adhesiveness between the photosensitive resin and the peeling layer is improved, and the peeling property between the peeling layer and the ultraviolet curable resin is not impaired, Moreover, since the material does not cause rust or corrosion, the life of the master can be extended. Furthermore, if a stamper is used, a replica with a smooth surface can be duplicated.
【００２０】レプリカを用いて光ディスクを作製しノイ
ズ評価した結果、ノイズを２ｄＢ低減できた。As a result of producing an optical disk using the replica and evaluating the noise, it was possible to reduce the noise by 2 dB.
【００２１】これにより、従来法では１枚の原盤から
２，３枚程度のスタンパの作製枚数であったのに対し
て、本発明により１０枚以上のスタンパの作製が可能に
なった。したがって、レプリカの複製枚数は３倍以上に
できる。As a result, compared with the conventional method, the number of stampers to be produced is about 2 or 3 from one master, but the present invention enables the production of 10 or more stampers. Therefore, the number of replica copies can be tripled or more.
【図１】本発明の実施例１による光ディスクスタンパの
作製方法を示す断面図。FIG. 1 is a sectional view showing a method for manufacturing an optical disk stamper according to a first embodiment of the present invention.
【図２】本発明の実施例２を示す断面図。FIG. 2 is a sectional view showing a second embodiment of the present invention.
【図３】本発明の実施例３を示す断面図。FIG. 3 is a sectional view showing a third embodiment of the present invention.
【図４】従来の光ディスクの原盤，スタンパおよびレプ
リカの作製方法を示す断面図。FIG. 4 is a cross-sectional view showing a method of manufacturing a conventional optical disk master, stamper, and replica.
１…基板、２…感光性樹脂、３…原盤、５…紫外線硬化
樹脂、６…透光性部材、７…紫外線、８…スタンパ、１
３…Ｔｉ膜。DESCRIPTION OF SYMBOLS 1 ... Substrate, 2 ... Photosensitive resin, 3 ... Master, 5 ... UV curable resin, 6 ... Translucent member, 7 ... Ultraviolet, 8 ... Stamper, 1
3 ... Ti film.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 宮村 芳徳 東京都国分寺市東恋ケ窪１丁目280番地 株式会社日立製作所中央研究所内 (72)発明者 宮本 治一 東京都国分寺市東恋ケ窪１丁目280番地 株式会社日立製作所中央研究所内 (72)発明者 堀籠 信吉 東京都国分寺市東恋ケ窪１丁目280番地 株式会社日立製作所中央研究所内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Yoshinori Miyamura 1-280 Higashi Koikekubo, Kokubunji, Tokyo Inside Central Research Laboratory, Hitachi, Ltd. (72) Inventor Shinichi Miyamoto 1-280 Higashi Koikeku, Kokubunji, Tokyo Hitachi Ltd. (72) Inventor Shinkichi Horigo 1-280, Higashi Koigokubo, Kokubunji, Tokyo Metropolitan Research Center, Hitachi Ltd.
Claims (7)
内溝および情報を記録した凹凸パターンの少なくとも一
つを設けた感光性樹脂膜からなる原盤表面に剥離層を積
層した後、紫外線硬化樹脂を塗布して透光性部材を上記
紫外線硬化樹脂に重ねた後、紫外線を照射して上記紫外
線硬化樹脂を硬化させ、上記紫外線硬化樹脂と上記透光
性部材を上記原盤から剥離してスタンパを形成する工程
において、上記原盤の表面に剥離層として金属元素を主
成分とする薄膜および無機化合物薄膜の少なくとも一つ
を、一層以上設けたことを特徴とする光ディスク用スタ
ンパの作製方法。1. A release layer is laminated on a surface of a substrate and a photosensitive resin film provided with at least one of a guide groove by optical means and a concavo-convex pattern in which information is recorded, and a release layer is laminated on the substrate, followed by ultraviolet curing. After applying a resin and overlaying the translucent member on the ultraviolet curable resin, the ultraviolet curable resin is irradiated with ultraviolet rays to cure the ultraviolet curable resin, and the ultraviolet curable resin and the translucent member are peeled off from the master and stamped. A method for manufacturing a stamper for an optical disk, characterized in that, in the step of forming the step (1), at least one of a thin film containing a metal element as a main component and at least one inorganic compound thin film is provided as a release layer on the surface of the master.
機化合物薄膜は、表面に形成される微細な凹凸粗さの凹
部あるいは凸部の半値幅の平均値が２ｎｍから５０ｎｍ
の範囲であり、上記微細な凹凸粗さの凹部と凹部あるい
は凸部と凸部の間隔の平均値が２ｎｍから５０ｎｍの範
囲である光ディスク用スタンパの作製方法。2. The thin film and the inorganic compound thin film according to claim 1, wherein an average half-value width of a concave portion or a convex portion having fine uneven roughness formed on the surface is from 2 nm to 50 nm.
And the average value of the intervals between the concave portions and the concave portions or the convex portions and the convex portions having the above-described fine unevenness roughness is in the range of 2 nm to 50 nm.
および上記無機化合物薄膜の膜厚は、表面に形成される
微細な凹凸粗さの凹部と凸部の高さの差の平均値で５ｎ
ｍから２００ｎｍの範囲である光ディスク用スタンパの
作製方法。3. The film thickness of the metal thin film and the inorganic compound thin film according to claim 1 or 2, which is an average value of the height differences between the concave and convex portions having fine uneven roughness formed on the surface.
A method for manufacturing a stamper for an optical disc having a range of m to 200 nm.
薄膜の融点が１４００℃以上である材質からなる光ディ
スク用スタンパの作製方法。4. The method for manufacturing an optical disk stamper according to claim 1, 2 or 3, wherein the metal thin film has a melting point of 1400 ° C. or higher.
金属元素は、Ｓｉ，Ｔｉ，Ｖ，Ｃｒ，Ｆｅ，Ｃｏ，Ｚ
ｒ，Ｎｂ，Ｍｏ，Ｔｃ，Ｒｕ，Ｒｈ，Ｐｄ，Ｈｆ，Ｔ
ａ，Ｗ，Ｒｅ，Ｏｓ，Ｉｒ，ＰｔおよびＣより成る群よ
り選ばれた少なくとも一つを主成分とする材質である光
ディスク用スタンパの作製方法。5. The metal element according to claim 1, 2, 3 or 4, wherein the metal element is Si, Ti, V, Cr, Fe, Co, Z.
r, Nb, Mo, Tc, Ru, Rh, Pd, Hf, T
A method for manufacturing an optical disk stamper, which is a material containing at least one selected from the group consisting of a, W, Re, Os, Ir, Pt, and C as a main component.
化合物薄膜の融点が４４０℃以上である酸化物，硫化
物，セレン化物あるいは窒化物を主成分とする少なくと
も一つをもつ光ディスク用スタンパの作製方法。6. The stamper for an optical disc according to claim 1, wherein the inorganic compound thin film has at least one of oxides, sulfides, selenides or nitrides whose melting point is 440 ° C. or higher. Of manufacturing.
無機化合物は、ＳｉＯ，Ｂ2Ｏ3，ＳｉＯ2，ＴｉＯ2，Ａ
ｌ2Ｏ3，Ｔａ2Ｏ5，ＳｎＯ2，ＭｎＯ，ＣａＯ，Ｚｒ
Ｏ2，ＭｇＯ，Ｙ2Ｏ3，Ｓｂ2Ｓ3，Ｓｂ2Ｓｅ3，Ｇｅ
Ｓ，ＧｅＳｅ，ＧeＳ2，ＧeＳe2,ＳｎＳ，ＳｎＳｅ，Ｓ
ｎＳ2，ＳｎＳｅ2，ＰｂＳ，ＰbＳe，Ｉn2Ｓ3，Ｉn2Ｓe
3,Ｃｕ2Ｓ，Ａｇ2Ｓ，ＺｎＳ，ＺｎＳｅ，ＣｄＳ，Ｃｄ
Ｓｅ，Ｓｉ3Ｎ4，ＡｌＮ，ＴｉＮ，ＺｒＮ、およびＢＮ
の中より選ばれた一つである光ディスク用スタンパの作
製方法。7. The inorganic compound as defined in claim 1, wherein the inorganic compound is SiO, B 2 O 3 , SiO 2 , TiO 2 , or A.
l 2 O 3 , Ta 2 O 5 , SnO 2 , MnO, CaO, Zr
O 2 , MgO, Y 2 O 3 , Sb 2 S 3 , Sb 2 Se 3 , Ge
S, GeSe, GeS 2 , GeSe 2 , SnS, SnSe, S
nS 2 , SnSe 2 , PbS, PbSe, In 2 S 3 , In 2 Se
3 , Cu 2 S, Ag 2 S, ZnS, ZnSe, CdS, Cd
Se, Si 3 N 4 , AlN, TiN, ZrN, and BN
A method for manufacturing a stamper for an optical disc, which is one selected from the above.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20782292A JPH0660439A (en) | 1992-08-04 | 1992-08-04 | Production of stamper for optical disk |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20782292A JPH0660439A (en) | 1992-08-04 | 1992-08-04 | Production of stamper for optical disk |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0660439A true JPH0660439A (en) | 1994-03-04 |
Family
ID=16546086
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20782292A Withdrawn JPH0660439A (en) | 1992-08-04 | 1992-08-04 | Production of stamper for optical disk |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0660439A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9028704B2 (en) | 2012-06-29 | 2015-05-12 | Kabushiki Kaisha Toshiba | Magnetic recording medium and method of manufacturing |
-
1992
- 1992-08-04 JP JP20782292A patent/JPH0660439A/en not_active Withdrawn
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9028704B2 (en) | 2012-06-29 | 2015-05-12 | Kabushiki Kaisha Toshiba | Magnetic recording medium and method of manufacturing |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| WO1986006198A1 (en) | Process for fabricating optical recording disk | |
| JPH0354742A (en) | Optical disk, production thereof and reading method thereof | |
| JP2002042379A (en) | Multilayered optical recording medium and its manufacturing method | |
| KR100420237B1 (en) | Dual-layer dvd disc, and method and apparatus for making same | |
| JPH0614414B2 (en) | Transfer type optical recording medium | |
| JP2003077187A (en) | Method for manufacturing optical disk | |
| JPH0589517A (en) | Optical disk | |
| WO2006033410A1 (en) | Multilayer information recording medium and production method therefor, and photosensitive adhesive sheet | |
| JPH0660439A (en) | Production of stamper for optical disk | |
| JP2003067984A (en) | Optical disk manufacturing method and optical disk made by this method | |
| JPS6369044A (en) | Optical recording medium | |
| US7844984B2 (en) | Optical recording medium and manufacturing method thereof | |
| JP2000036135A (en) | Production of multilayered information recording medium | |
| JP5393045B2 (en) | Optical information recording medium | |
| KR100311146B1 (en) | Disk structure | |
| JPS60173737A (en) | Manufacture of stamper for optical disk | |
| JPH04263141A (en) | Glass substrate having reflective coating | |
| JPH08106656A (en) | Stamper for optical disk and production of substrate | |
| JPH01271935A (en) | Optical disk and its production | |
| JPH06103617A (en) | Stamper for optical disk and production of substrate | |
| JPS6323244A (en) | Production of optical card | |
| JPS60182532A (en) | Metallic mold for reproducing flat plate-shaped information recording carrier | |
| JPS6047254A (en) | Method for manufacturing optical disk | |
| JPH08255376A (en) | Mod and sd using integrated substrate and their manufacture | |
| JPS61163342A (en) | Method for removing photoresist |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A300 | Withdrawal of application because of no request for examination |
Free format text: JAPANESE INTERMEDIATE CODE: A300 Effective date: 19991005 |