JPH0658443B2 - Method for manufacturing color filter - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION [Industrial field of application] The present invention is a CCD (charge coupled device), B
The present invention relates to a method for manufacturing a color filter such as a solid-state image sensor including a BD (bucket briquette device) and a CID (charge injection device), a liquid crystal display element, and the like.

[Prior Art] Conventionally, the following two manufacturing methods are mainly known as a manufacturing method of a color filter of a liquid crystal display device or a solid-state imaging device.

First, first, a dyeable coating film forming material is applied and cured on a transparent substrate such as glass or a solid-state imaging device (light receiving surface) which is a substrate to form a dyeing substrate layer. After forming a pattern of the first color using a resist on the dyeing substrate layer, the exposed dyeing substrate portion is dyed with a first color dye having required spectral characteristics, and then the resist is peeled off. Thus, the hue pattern of the first color is formed. next,
The hue pattern of the second color, the third color, etc. is formed by repeating the same procedure, and finally the surface protective layer is formed.
This manufacturing method is a method of dyeing a single dyeing substrate layer into a plurality of hue patterns.

In another manufacturing method, first, a dyeable coating film forming material having photosensitivity is uniformly applied onto a substrate and dried to form a photosensitive dyeing substrate layer. Next, a portion of the substrate layer that becomes the pattern portion of the first color is selectively exposed to light to be photo-cured and then developed to remove portions other than the predetermined pattern of the substrate layer. Next, the obtained pattern of the first color is dyed with a dye having a predetermined spectral characteristic. Next, a transparent protective layer having dye resistance, that is, not dyed with a dye, is formed on the entire surface of the substrate and the dyed first color pattern. Then, in order to form a pattern of the second color, the third color, etc., the above-mentioned photosensitive coating film forming material is applied onto the protective layer thus formed to form a photosensitive dyeing substrate layer, and selective exposure and development are performed. The steps of dyeing and forming a protective layer are repeated as many times as necessary, and finally a surface protective layer is formed. In the color filter manufactured by this method, the patterns of each hue are independent by being separated by a protective layer for preventing mutual dyeing, and as a whole, the layers of the hue pattern and the protective layers are alternately laminated. It has the form of

In any of the above methods, the protective layer provided for dye-proofing or surface protection is required to have high transparency, particularly high light transmittance in the entire visible region.

By the way, for example, when it is necessary to remove a part of the protective layer as an unnecessary part because it is necessary to remove the protection part corresponding to the bonding pad part of the solid-state imaging device as an unnecessary part and provide an opening. There is. for that reason,
Conventionally, a photosensitive material is used as a material for forming such a protective layer, and after patterning, a method of photo-curing a main portion and then removing the unnecessary portion by a developing treatment has been adopted.

[Problems to be solved by the invention]

However, since the light absorption wavelength by the photosensitive group of the photosensitive material used for forming the protective layer extends to the visible region, the light transmittance in the visible region is impaired, and it is difficult to obtain a color filter with good performance. It was

[Means for solving problems]

The present invention, as a solution to the above-mentioned problems, comprises a step of forming a protective layer for dye-proofing or surface protection of a dyed layer, and a step of removing an unnecessary portion of the protective layer. In the method for producing a color filter, the protective layer is formed by using (A) the general formula (I) [In the formula, R represents a hydrogen atom or a lower alkyl group,
n is an integer of 1 to 5. ] A polymer containing 60% by weight or more of a monomer unit derived from a compound represented by: (B) 0.1 to 50 parts by weight of an aromatic polyvalent carboxylic acid and an aromatic polyvalent per 100 parts by weight of the polymer. Formed by curing a curable composition containing at least one selected from carboxylic acid anhydrides and a silane coupling agent having an epoxy group (C), and removing unnecessary portions of the protective layer by dry etching. A method for manufacturing a color filter is provided.

As the polymer of the component (A) of the composition used in the method of the present invention, a homopolymer consisting of one compound of the general formula (I) and a copolymer consisting of two or more compounds of the general formula (I) can be used. Examples thereof include polymers and copolymers composed of one or more compounds of the general formula (I) and other polymerizable monomers.

Specific examples of the compound represented by the general formula (I) include glycidyl acrylate, glycidyl methacrylate, α-ethyl glycidyl acrylate, α-n-propyl glycidyl acrylate, α-n-butyl glycidyl acrylate, and acrylic acid-3. , 4-epoxybutyl, methacrylic acid-3,4-epoxybutyl, methacrylic acid-4,5-epoxypentyl, acrylic acid-6,7-epoxypentyl, methacrylic acid-6,7-
Examples thereof include epoxypentyl and α-ethylacrylic acid-6,7-epoxypentyl. Among these compounds, those in which R in the general formula (I) is a hydrogen atom, a methyl group or an ethyl group are preferable, and n is preferably 1 or 2.

The content of the monomer unit derived from the compound of the general formula (I) in the polymer which is the component (A) of the composition used in the present invention is
It is necessary to be 60% by weight or more, preferably 80% by weight
It is above, and particularly preferably 100% by weight. When the content of the monomer unit is less than 60% by weight, the adhesiveness of the composition to the substrate is insufficient and the intended purpose cannot be achieved. The composition having this content of 80% by weight or more exhibits particularly excellent adhesion to the substrate material of the color filter.

In the polymer of the component (A), other polymerizable monomers that can be used to form a copolymer with the compound of the general formula (I) include, for example, methyl acrylate, methyl methacrylate, acrylic acid. Esters of acrylic acid or methacrylic acid such as ethyl, ethyl methacrylate, butyl acrylate, butyl methacrylate, 2-ethylhexyl methacrylate, phenyl acrylate, and phenyl methacrylate; styrene, α-methylstyrene, p-methylstyrene, Mention may be made of vinyl aromatic compounds such as vinyl naphthalene. Among these polymerizable monomers, it is particularly preferable to use an ester of acrylic acid or methacrylic acid in terms of forming a tougher and highly transparent coating film. Further, as the polymerizable monomer, acrylic acid, methacrylic acid, hydroxyethyl methacrylate, hydroxyethyl acrylate, 2-hydroxypropyl acrylate, 2-hydroxypropyl methacrylate, 2-hydroxybutyl acrylate, Functional acrylic compounds such as 2-hydroxybutyl methacrylate;
Diene compounds such as butadiene, isoprene, piperylene, and dimethylbutadiene can be used, but the content of the monomer units derived from them should be within the range of not more than 10% by weight of the polymer of the component (A). Is desirable. If the content of these exceeds 10% by weight, the adhesion to the substrate will be reduced.

The copolymerization form of the copolymer of the above-mentioned polymerizable monomer and the compound of the general formula (I) is not particularly limited and may be a random copolymer by addition polymerization, a block copolymer or the like. The method may be either a solution polymerization method or an emulsion polymerization method.

The molecular weight of the polymer of the component (A) is not particularly limited as long as the composition can be applied as a uniform film on the substrate,
Normal polystyrene equivalent weight average molecular weight of 5,000 to 300,000
It can be appropriately selected depending on the purpose and conditions of the coating film formation such as the thickness of the coating film to be formed and the coating method.

Specific examples of the aromatic polycarboxylic acid which is the component (B) of the composition used in the present invention include phthalic acid, isophthalic acid, terephthalic acid, 1,2,3-tricarboxylbenzene, and 1,2,3. -Tricarboxyl-4-methylbenzene,
1,2,3-tricarboxyl-5-methylbenzene, 1,2,3
-Tricarboxyl-4-phenylbenzene, 1,2,3-
Tricarboxyl-5-phenylbenzene, 1,2,3-tricarboxylbenzene (that is, trimellitic acid), 1,2,4-tricarboxyl-3-methylbenzene, 1,2,4-tricarboxyl-3- Phenylbenzene, 1,2,4-tricarboxyl-5-methylbenzene,
1,2,4-tricarboxyl-5-phenylbenzene, 1,
2,4-tricarboxyl-6-methylbenzene, 1,2,4-
Tricarboxyl-6-phenylbenzene, 1,2,3,4-
Tetracarboxylbenzene, 1,2,3,4-tetracarboxyl-5-methylbenzene, 1,2,3,4-tetracarboxyl-5-phenylbenzene, 1,2,3,5-tetracarboxylbenzene, 1, 2,3,5-tetracarboxyl-4
-Methylbenzene, 1,2,3,5-tetracarboxyl-4
Benzene derivatives such as -phenylbenzene and 1,2,4,5-tetracarboxylbenzene (that is, pyromellitic acid); 1,2,3-tricarboxyl naphthalene, 1,2,4-tricarboxyl naphthalene, 1,2 5,5-tricarboxyl naphthalene, 1,2,6-tricarboxyl naphthalene, 1,2,7
-Tricarboxyl naphthalene, 1,2,8-tricarboxyl naphthalene, 1,2,3,4-tetracarboxyl naphthalene, 1,2,3,5-tetracarboxyl naphthalene, 1,2,
3,6-Tetracarboxyl naphthalene, 1,2,3,7-Tetracarboxyl naphthalene, 1,2,3,6-Tetracarboxyl naphthalene, 1,2,3,7-Tetracarboxyl naphthalene, 1,3,5, 6-tetracarboxylic naphthalene, 1,3,5,7
Naphthalene derivatives such as tetracarboxylic naphthalene, 1,4,5,6-tetracarboxylic naphthalene, 1,4,5,7-tetracarboxylic naphthalene, 1,4,5,8-tetracarboxylic naphthalene; 2,2 ′, 3-tricarboxyl benzophenone, 2,3,3'-tricarboxyl benzophenone, 2,3,4'-tricarboxyl benzophenone,
2 ', 3,4-tricarboxylbenzophenone, 3,3', 4
-Tricarboxyl benzophenone, 3,4,4'-tricarboxyl benzophenone, 2,3,4-tricarboxyl benzophenone, 2,3,6-tricarboxyl benzophenone, 2,3,4,5-tetracarboxyl benzophenone,
2,3,5,6-tetracarboxylic benzophenone, 2,2 ',
3,3'-tetracarboxyl benzophenone, 2,3,3 ', 5
-Tetracarboxyl benzophenone, 3,3'4,4'-tetracarboxyl benzophenone, benzophenone derivatives such as 3,3 ', 4,5'-tetracarboxyl benzophenone, and the like, and aromatic polycarboxylic acid anhydrides. Specific examples of the product include anhydrides of the aromatic polycarboxylic acid.

Among the aromatic polyvalent carboxylic acid anhydrides and the aromatic polyvalent carboxylic acids, particularly preferable are trivalent or tetravalent aromatic polyvalent carboxylic acids or their anhydrides.

The above-mentioned aromatic polyvalent carboxylic acid anhydride and aromatic polyvalent carboxylic acid can be used either individually or in combination of two or more.

The compounding amount of the component (B) in the composition of the present invention is in the range of 0.1 to 50 parts by weight, preferably 0.5 to 20 parts by weight, per 100 parts by weight of the polymer which is the component (A). When the blending amount of the component (B) is less than 0.1 parts by weight, curing is insufficient and a tough coating film cannot be formed, and when it exceeds 50 parts by weight, the component (B) is precipitated during coating. It becomes difficult to form a uniform coating film.

Examples of the silane coupling agent having an epoxy group, which is the component (C) of the composition used in the present invention, include a silane compound having an epoxy group represented by the following formula (a).

XY-Si (OR < ¹ >) ₃ ) ... (A) [In formula, X shows an epoxy group, Y shows an alkylene group or a phenylene group, and R < ¹ > shows a methyl group, an ethyl group, or a propyl group. Specific examples of the compound of the formula (a) include γ-glycidoxypropyltrimethoxysilane, β- (3,4-epoxycyclohexyl) ethyltrimethoxysilane and the like. The silane coupling agent having an epoxy group as the component (C) exhibits particularly excellent smoothness, adhesiveness, water resistance and solvent resistance as a coating film for various substrates. These silane coupling agents can be used alone or in combination of two or more.

The blending amount of the component (C) in the composition of the present invention is preferably 0.1 to 30 parts by weight, particularly preferably 0.5 to 20 parts by weight, per 100 parts by weight of the polymer of the component (A). By blending the component (C) in such a range, the coating film formed,
The smoothness, the adhesion to the substrate, the water resistance, the solvent resistance and the hardness are further improved.

The composition of the present invention includes the components (A), (B) and (C) described above.
In addition to the essential components, if necessary, for example, an antioxidant, an ultraviolet absorber, etc. can be added to the extent that transparency is not impaired.

The composition used in the present invention is obtained by uniformly mixing the above components. As a method for mixing these components, usually, a solution mixing method in which these components are mixed by dissolving them in a suitable solvent is preferable. The solvent used for solution mixing is not particularly limited as long as it dissolves the above components and does not react with these components, various solvents can be used, and specific examples include: Acetone, methyl ethyl ketone, methyl-n
-Propyl ketone, methyl isopropyl ketone, methyl-n-butyl ketone, methyl isobutyl ketone, methyl-n-amyl ketone, methyl-n-hexyl ketone, diethyl ketone, ethyl-n-butyl ketone, di-n-propyl ketone, diisobutyl ketone, Ketone solvents such as cyclohexanone and holone; ether solvents such as ethyl ether, isopropyl ether, n-butyl ether, diisoamyl ether, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, diethylene glycol dimethyl ether, diethylene glycol, dioxane, tetrahydrofuran; ethyl formate, formic acid Propyl, n-butyl formate, ethyl acetate, acetic acid-n-propyl, isopropyl acetate, acetic acid-
Examples thereof include ester solvents such as n-butyl, acetic acid-n-amyl, ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, diethylene glycol monomethyl ether acetate, and diethylene glycol monoethyl ether acetate.

The mixing order in the case of preparing the composition by solution mixing is not particularly limited, and for example, all components may be dissolved in a solvent at any time to prepare a solution of the composition, or each component may be separately separated as necessary. Alternatively, two or more solutions may be dissolved in the same or different solvent, and these solutions may be mixed to prepare a composition solution. For example, by improving the long-term storage stability of each component by preparing a solution of the component (B) and two types of solutions of the remaining other components and mixing them in a desired ratio immediately before use. By changing the mixing ratio of the two kinds of solutions, it becomes possible to easily change the coating performance according to the purpose.

The concentration of the solution is not particularly limited and can be appropriately selected according to the purpose of use, but generally 5 to
Use at about 50% by weight.

The composition prepared as described above can be applied to the surface of the substrate with the solution and cured by heating to obtain a desired coating film.

The method of applying the solution of the composition to the surface of the substrate is not particularly limited, and various methods such as a spray method, a roll coating method, and a spin coating method can be used, and the composition used in the present invention can be applied to the spin coating method. The suitable point is one of the features of the present invention.

The thermosetting conditions for the composition used in the present invention are appropriately selected depending on the specific type of each component of the composition, the mixing ratio, etc., but are usually at 80 to 250 ° C. for about 15 minutes to 10 hours.

In the method of the present invention, the unnecessary portion of the protective layer removed by dry etching includes, for example, a portion corresponding to the bonding pad of the solid-state imaging device, a portion corresponding to the scribe line, and the like.

As the dry etching method used in the method of the present invention, a material other than unnecessary portions of the protective layer obtained by curing the composition is preliminarily made of a suitable material, for example, a negative resist made of polyisoprene cyclized product, a positive type made of novolac resin. A physical dry etching method such as a sputter etching method in which a mask is masked with a resist and the entire surface is irradiated with ions of high kinetic energy; A chemical dry etching method such as a plasma etching method for etching an unnecessary portion can be used.

The above-mentioned sputter etching method or dry etching method usually uses high frequency power of 50 to 250 W and 0.1 to 10 Torr.
It is carried out by flowing 10 to 500 m / min of oxygen under reduced pressure.

Further, examples of the dry etching method other than the above include an ion beam etching method in which an unnecessary portion of the protective layer is selectively scanned with an ion beam without providing a mask in advance.

In the dry etching method, when a negative resist, a positive resist or the like is used as a mask,
Although the dry etching method may be used for removing the mask, the mask may be removed by using a resist stripping solution.

The method of the present invention is a conventionally known method for producing a color filter,
That is, the method can be roughly classified into any of the following two manufacturing methods.

The first manufacturing method includes (i) a step of forming a photosensitive dyeing substrate layer on a substrate, (ii) a step of selectively exposing and then developing the pattern portion of the first color of the substrate layer, (iii) the above After the development, the pattern portion of the first color is dyed with a dye having a predetermined spectral characteristic, and (iv) after the dyeing, the pattern of the first color is formed by the step of forming a protective layer on the entire surface of the substrate, and then, This is a method of forming a required number of hue patterns in a product phase state by repeating the above steps (i) to (iv) for the required number of colors using the protective layer formed in the step (iv) as a substrate. According to the present invention, the unnecessary portion of the protective layer is thus removed by dry etching after the lamination.

The substrate used in the step (i) is, for example, a transparent substrate such as glass or plastic, or a solid-state image sensor. The photosensitive dyeing substrate layer can be formed by uniformly applying a photosensitized polymer compound solution onto a substrate using roller coating, dipping, a spinner or the like, and drying. Specific examples of the polymer compound that serves as the photosensitive dyeing substrate layer include water-soluble natural polymer compounds such as gelatin, casein, fish glue, and egg white, and water-soluble synthetic polymers such as polyvinyl alcohol, polyvinylpyrrolidone, and polyacrylonitrile. Compounds with photosensitizers, such as ammonium dichromate, sodium dichromate,
Dichromates such as potassium dichromate, p-diazophenylamine, 1-diazo-4-dimethylaminobenzene hydrofluorate, 1-diazo-3-methyl-4
-Dimethylaniline sulfate, 1-diazo-3-
Diazonium salts such as monoethylnaphthylamine and their paraformaldehyde condensates, 4,4′-diazidostilbene-2,2-disulfonic acid and salts thereof, 2,6-
Bis (4-azidobenzal-2-sulfonic acid) cyclohexanone and salts thereof, such as azidosulfonic acid compounds, have solubility in a solvent such as water and -COOH, -in the polymer by active light such as ultraviolet rays. NH ₂ , -OH, -CONH ₂ ,>
Examples thereof include a composition in which a compound capable of coordinate bond with a group having a non-coexisting electron pair such as CO is mixed. The amount of the photosensitizer added is usually 1 to 50 as a weight ratio with respect to the polymer.
%, Preferably 10 to 30%. The film thickness of the photosensitive dyeing substrate layer thus formed is preferably in the range of 0.3 to 2 μm.

The selective exposure in the step (ii) can be performed according to a known method, and can be performed by irradiating through a mask having a required pattern with a mercury lamp, an ultra-high pressure mercury lamp, a metal halide lamp, or the like. After the required pattern portion is cured by exposure, it is developed with a developing solution such as warm water to remove unnecessary portions.

The dye used in the step (iii) is usually a water-soluble dye, and any acidic, direct or basic water-soluble dye can be used. Specific examples of the dye that can be used include the following.

(1) Red dyes include Suminol Milling Scarlet G (Sumitomo Chemical), Cibacron Scarlet
GP (Ciba Geigy), Cibacron Bronte
Scarlet (Ciba Geigy), Suminol Fast Red G (Sumitomo Chemical), Sumirite Supra
Red 4BL (Sumitomo Chemical), Aminyl Red E-
2BL (Sumitomo Chemical), Aminyl Red E-3BL
(Sumitomo Chemical), Azido Scarlet 901 (Sumitomo Chemical), Suminol Milling Scarlet FC (Sumitomo Chemical), Suminol Milling Orange FG (Sumitomo Chemical), Suminol Fast Orange PO (Sumitomo Chemical) , Maxilon Red GRL (Ciba Geigy), Eriocin Scarlet, RE (Ciba Geigy), Mikawan Brilliant Red 8BS
(Mitsubishi Chemical), Acid Light Scarlet GL1
30% (Mitsubishi Chemical), Kayanol Milling Red R
Examples include S125 (Mitsubishi Chemical).

(2) As green dyes, Sumonol Milling Brilliant Green 5G (Sumitomo Chemical), Acid Brilliant Milling Green G (Sumitomo Chemical), Azido Brilliant Milling Green B (Sumitomo Chemical), Mycation, Olive Green, 3GS (Ciba Geigy), Kayanol Milling Green, 5G
W (Nippon Kayaku) Sooriidazol Green P-GG
(Hoechst), Paper Fast Green, 5G
(Bayer) and the like.

(3) Blue dyes include Sumilite, Supra, Turquoise, Blue, G (Sumitomo Chemical), Cibacron Blue, 3
GA (Ciba Geigy), Cibachloran Blue 8
G (Ciba Geigy), Brosion Turquoise H-
A (CIC), Kayathion Turquoise P-A (Nippon Kayaku), Kayathion Turquoise P-NGF (Nippon Kayaku), Sumikaron Blue E-FBL (Sumitomo Chemical),
Sumikaron Brilliant Blue S-BL (Sumitomo Chemical), Suminol Leveling Sky Blue R. Extra Conc (Sumitomo Chemical), Orazol Blue G
N (Ciba Geigy), Maxion Blue 3G3
(Mitsubishi Chemical), Maxion Blue 2GS (Mitsubishi Chemical), Kayanol Milling Blue GW (Nippon Kayaku), Kayashil Sky Blue R (Nippon Kayaku) and the like.

The formation of the protective layer in the step (iv) is performed by applying the composition solution according to the present invention and curing by heating. The coating method is not particularly limited, but a spin coating method, a spray coating method, a roll coating method, a dipping method, a printing method and the like are preferable, and the thickness of the protective layer formed is preferably in the range of 0.1 μm to 10 μm. In the color filter manufactured by this method, the protective layer provided between the patterns of each hue mainly acts as a dye-protecting protective layer for the purpose of mutual dye protection, and the finally formed protective layer is the color filter. It acts as a surface protection phase for the purpose of preventing the surface from being damaged by scratching or the like.

The manufacturing method of the second color filter includes (i) a step of forming a dyeing substrate layer on the substrate, (ii) a first color pattern formed by using a resist on the dyeing substrate layer to expose the exposed first color A step of dyeing the pattern portion with a first color dye and then peeling off the resist, (iii) a hue pattern of the second color, the third color, etc. (ii)
It is a method comprising a step of forming by repeating the steps, and (iv) a step of finally forming a surface protective layer. According to the present invention, in the step (iv), the surface protective layer is formed by applying and curing the above-mentioned composition of the present invention, and then unnecessary portions of the surface protective layer are removed by dry etching. The various materials used in the second manufacturing method are the same as those described in the first manufacturing method.

〔Example〕

Next, the present invention will be described in detail with reference to examples, but the present invention is not limited to these examples.

Example 1 Copolymer of glycidyl methacrylate and tert-butyl methacrylate (polystyrene-equivalent weight average molecular weight about 75,000)
To a solution of 6 g dissolved in 48 g of ethyl cellosolve acetate, 0.2 g of 1,2,4-tricarboxylbenzene and γ-
Glycidoxypropyltrimethoxysilane (0.3 g) was added and mixed uniformly, and the mixture was filtered through a filter having a pore size of 0.2 μm to give the following composition for stainproofing and surface protective layer.

First, as shown in FIG. 1 (a), a solution of the above composition is spin-coated at 3000 revolutions on a solid-state image sensor 2 having a light-receiving section 1 and is heat-treated at 150 ° C. for 30 minutes. A transparent base film 3 was formed. Then, as shown in FIG. 1 (b), a gelatin aqueous solution containing ammonium dichromate was spin-coated on the substrate at 3000 rpm, dried at 80 ° C. for 10 minutes, and then irradiated with ultraviolet rays through a mask. Next, by developing with warm water, the unirradiated portion of gelatin and ammonium dichromate in gelatin are washed out and removed, and heat-treated at 150 ° C. for 30 minutes to obtain a dyed substrate layer 4 patterned for the first color. Was formed. Next, as shown in FIG. 1 (c),
By immersing this in the following dyeing bath at 60 ° C. for 5 minutes, the patterned dyeing substrate layer 4 is dyed, further washed with water, and dried at 150 ° C. for 30 minutes to obtain the first color layer 5 dyed red. Was formed.

Dyeing bath Next, as shown in FIG. 1 (d), the solution of the composition for a protective layer is spin-coated at 3000 rpm on the entire surface, and heat-treated at 150 ° C. for 30 minutes to form the first dye-protective protective layer 6. did.

Next, as shown in FIG. 1 (e), for the second color (green) and the third color (blue), the operation from the formation of the dyeing substrate layer to the formation of the protective layer is repeated in the same manner, Bicolor layer 7,
The second dye-proof protective layer 8, the third color layer 9 and the surface protective layer 10
Was formed. Next, as shown in FIG. 1 (f), a positive resist 11 is spin-coated on the uppermost surface protection layer 10,
After pre-baking (80 ° C./10 minutes), the portions of the solid-state image pickup device that contact the scribe line 12 and the bonding pad 13 were exposed through a mask, and the exposed portion was developed with an alkaline solution and dissolved and removed. After further post-baking (130 ° C / 30 minutes), a 100 W plasma etching apparatus was used to supply oxygen gas at a flow rate of 100 m / min, 0.25
Dry etching was performed under the conditions of Torr to remove the protective layer portion corresponding to the scribe line 12 and the bonding pad 13 to obtain the color filter shown in FIG. The obtained color filter exhibited excellent light transmittance in the entire visible region.

Comparative Example 1 A color filter was prepared in the same manner as in Example 1 except that 0.2 g of diethylenetriamine was used instead of 1,2,4-tricarboxylbenzene.

In the obtained color filter, some green pixels were peeled off.

Comparative Example 2 In this Comparative Example, a color filter was produced in the same manner as in Example 1 except that γ-glycidoxypropyltrimethoxysilane was not used.

The obtained color filter had poor adhesion and was partially lacking the protective film and the dyed substrate.

〔The invention's effect〕

According to the method of the present invention, since the curable composition used does not have absorption in the visible and near-ultraviolet regions, it is provided with a protective layer for dyeing and surface protection having high transparency in the entire visible region, and has excellent performance. Color filters can be manufactured.

[Brief description of drawings]

FIG. 1 is a process explanatory view illustrating the method of the present invention,
FIG. 2 is a sectional view of a color filter obtained by the method of the present invention. 2 ... Solid-state image sensor, 6, 8, 10 ... Protective layer, 11 ... Resist, 12 ... Scribe line, 13 ... Bonding pad.

Claims (1)

[Claims] 1. A method for producing a color filter on a substrate, which comprises a step of forming a protective layer for dye-proofing or surface protection of a dyed layer, and a step of removing unnecessary portions of the protective layer, The formation of the protective layer is performed by (A) general formula (I): [In the formula, R represents a hydrogen atom or a lower alkyl group,
n is an integer of 1 to 5. ] A polymer containing 60% by weight or more of a monomer unit derived from a compound represented by: (B) 0.1 to 50 parts by weight of an aromatic polyvalent carboxylic acid and an aromatic polyvalent per 100 parts by weight of the polymer. A curable composition containing at least one selected from anhydrides of carboxylic acids and (C) a silane coupling agent having an epoxy group is cured, and unnecessary portions of the protective layer are removed by dry etching. A method for producing a color filter, which is characterized in that