JPH0649275B2 - Method of manufacturing electroformed thin blade grindstone - Google Patents

Method of manufacturing electroformed thin blade grindstone

Info

Publication number
JPH0649275B2
JPH0649275B2 JP61157053A JP15705386A JPH0649275B2 JP H0649275 B2 JPH0649275 B2 JP H0649275B2 JP 61157053 A JP61157053 A JP 61157053A JP 15705386 A JP15705386 A JP 15705386A JP H0649275 B2 JPH0649275 B2 JP H0649275B2
Authority
JP
Japan
Prior art keywords
abrasive grain
thin blade
grain layer
grindstone
flat substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61157053A
Other languages
Japanese (ja)
Other versions
JPS6311281A (en
Inventor
務 高橋
尚登 及川
武志 片山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Materials Corp
Original Assignee
Mitsubishi Materials Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Materials Corp filed Critical Mitsubishi Materials Corp
Priority to JP61157053A priority Critical patent/JPH0649275B2/en
Publication of JPS6311281A publication Critical patent/JPS6311281A/en
Publication of JPH0649275B2 publication Critical patent/JPH0649275B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

【発明の詳細な説明】 「産業上の利用分野」 本発明は、特にシリコンやフェライト等の被削材におけ
る高精度の切断加工や溝入れ加工に用いられる電鋳薄刃
砥石の製造方法に関するものである。
The present invention relates to a method for manufacturing an electroformed thin blade grindstone used for highly accurate cutting and grooving of a work material such as silicon or ferrite. is there.

「従来の技術」 第4図は、この種の電鋳薄刃砥石1の使用態様を示す図
である。
"Prior Art" Fig. 4 is a diagram showing a usage mode of this type of electroformed thin blade grindstone 1.

この電鋳薄刃砥石1は、NiやCoあるいはそれらの合金
からなる金属メッキ相中に、ダイヤモンドやCBN等の
超砥粒を分散して形成された、厚さ数十μm〜数百μm
の輪環薄板状のものである。そして、この電鋳薄刃砥石
1は、両側面に配設された一対の取付用フランジ2,2
間に挾まれたうえ、軸線まわりに回転される砥石軸4に
ナット3によって締め付け固定され、使用に供される。
The electroformed thin blade grindstone 1 is formed by dispersing superabrasive grains such as diamond and CBN in a metal plating phase made of Ni, Co or their alloys, and has a thickness of several tens μm to several hundreds μm.
It is a ring-shaped thin plate. The electroformed thin blade grindstone 1 includes a pair of mounting flanges 2 and 2 arranged on both side surfaces.
In addition to being sandwiched in between, it is fastened and fixed by a nut 3 to a grindstone shaft 4 which is rotated around its axis, and is used.

従来、このような電鋳薄刃砥石の製造は、次のように行
なわれている。
Conventionally, such electroformed thin blade grindstones are manufactured as follows.

先ず、メッキ浴内において、ステンレス鋼製の平面基板
の表面にNi,Co等の金属メッキ相を析出させつつ、こ
の金属メッキ相内にダイヤモンド等の超砥粒を分散させ
て砥粒層を形成する。
First, in the plating bath, while depositing a metal plating phase such as Ni, Co on the surface of a stainless steel flat substrate, superabrasive particles such as diamond are dispersed in the metal plating phase to form an abrasive grain layer. To do.

次いで、この砥粒層を平面基板から剥離し、所定の砥石
形状に整形することにより、電鋳薄刃砥石を得る。
Then, the abrasive grain layer is peeled from the flat substrate and shaped into a predetermined grindstone shape to obtain an electroformed thin blade grindstone.

「発明が解決しようとする問題点」 ところで、上記の方法によって製造された電鋳薄刃砥石
は、先ず平面基板の表面にメッキを施して形成したの
ち、この平面基板から剥がして得られるものなので、第
5図に示すように平面基板に接していた表面1Aにおい
ては、金属メッキ相5から超砥粒6…が全く突出してい
ない。このため、切削に際して、この表面1Aは切れ味
が悪く、特に切削初期において被削材にチツピングやい
わゆるムシリを発生しやすいという問題点があった。
"Problems to be solved by the invention" By the way, the electroformed thin blade grindstone produced by the above method is obtained by first plating the surface of the flat substrate and then peeling it from the flat substrate. As shown in FIG. 5, superabrasive grains 6 ... Do not project from the metal plating phase 5 at all on the surface 1A that was in contact with the flat substrate. Therefore, there is a problem that the surface 1A has poor sharpness during cutting, and chipping or so-called shavings is likely to occur in the work material particularly in the initial stage of cutting.

また、前記電鋳薄刃砥石の製造方法では、金属メッキ相
5を平面基板上に析出させていく過程において、メッキ
相5内に応力が累積されていき、製造後の電鋳薄刃砥石
に反りが生じやすいという欠点があった。
Further, in the method for manufacturing the electroformed thin blade grindstone, stress is accumulated in the plating phase 5 during the process of depositing the metal plating phase 5 on the flat substrate, and the electroformed thin blade grindstone is not warped. It had the drawback of being prone to occur.

「発明の目的」 本発明は上記事情に鑑みてなされたもので、切削開始当
初から切れ味に優れ、被削材にチツピングやムシリを生
じることがなく、しかも反りが生じにくく高い加工精度
が得られる電鋳薄刃砥石を製造することができる電鋳薄
刃砥石の製造方法を提供することを目的とする。
[Object of the Invention] The present invention has been made in view of the above circumstances, and has excellent sharpness from the beginning of cutting, does not cause chipping or shavings in a work material, and is highly resistant to warping, thus providing high processing accuracy. An object of the present invention is to provide a method for manufacturing an electroformed thin blade grindstone capable of manufacturing the electroformed thin blade grindstone.

「問題点を解決するための手段」 本発明の電鋳薄刃砥石の製造方法は、平面基板上に、表
面から超砥粒の一部が突出した砥粒層を形成した後、こ
の砥粒層を平面基板から剥離し、この砥粒層の平面基板
に接していた面に再び金属メッキ相を形成しつつ、この
金属メッキ相内に超砥粒を分散させて表面から超砥粒の
一部が突出した砥粒層を形成することを特徴とする。
"Means for Solving Problems" The method for producing an electroformed thin blade grindstone of the present invention is, on a flat substrate, after forming an abrasive grain layer in which a part of superabrasive grains are projected from the surface, the abrasive grain layer Is separated from the flat substrate, and while forming a metal plating phase again on the surface of the abrasive grain layer that was in contact with the flat substrate, disperse the superabrasive grains in the metal plating phase to partially remove the superabrasive grains from the surface. Is formed to form a protruding abrasive grain layer.

「実施例」 以下、本発明の一実施例を図面を用いて詳細に説明す
る。
[Example] Hereinafter, an example of the present invention will be described in detail with reference to the drawings.

第1図および第2図は、それぞれ本発明の電鋳薄刃砥石
の製造方法の一例を実施するための装置を示すものであ
る。
FIG. 1 and FIG. 2 each show an apparatus for carrying out an example of the method for manufacturing an electroformed thin blade grindstone of the present invention.

図中符号10はメッキ槽であり、このメッキ槽10内に
は、Ni,Co等の金属イオンを含むメッキ液Mが満たさ
れている。また、このメッキ槽10には、図示しない超
音波攪拌機等の攪拌機が配設されており、メッキ液Mの
攪拌がなされるようになっている。
In the figure, reference numeral 10 is a plating bath, and the plating bath 10 is filled with a plating solution M containing metal ions such as Ni and Co. In addition, a stirrer such as an ultrasonic stirrer (not shown) is arranged in the plating tank 10 to stir the plating solution M.

メッキ槽10内には、非導電性の台座11が水平に配置
されており、この台座11上には、ステンレス製の平面
基板12が載置されている。この平面基板12の上面に
は、製造すべき砥石の原型形状をなす部分を残してマス
キングが施されている。また、平面基板12の上方に
は、平面基板12と平行に陽極板13が配置され、図示
しない電源の陽極に接続されている。
A non-conductive pedestal 11 is horizontally arranged in the plating tank 10, and a flat substrate 12 made of stainless steel is placed on the pedestal 11. Masking is performed on the upper surface of the flat substrate 12 while leaving a portion of the prototype shape of the grindstone to be manufactured. An anode plate 13 is arranged above the plane substrate 12 in parallel with the plane substrate 12 and connected to an anode of a power source (not shown).

電鋳薄刃砥石を製造する際には、まず第1図に示すよう
に、メッキ槽10内のメッキ液Mに、所定量の超砥粒を
添加し、超音波攪拌機によってメッキ液M中に均一に分
散させる。次いで、平面基板12を電源の陰極に接続し
て陽極板13との間に通電し、平面基板12上に金属メ
ッキ相を析出させつつ、この金属メッキ相内に超砥粒を
均一に分散させて砥粒層14を形成する。
When manufacturing an electroformed thin blade grindstone, as shown in FIG. 1, first, a predetermined amount of superabrasive grains are added to the plating solution M in the plating tank 10 and the plating solution M is uniformly mixed with an ultrasonic stirrer. Disperse into Then, the flat substrate 12 is connected to a cathode of a power source and an electric current is applied between the flat substrate 12 and the anode plate 13 to deposit a metal plating phase on the flat substrate 12 and uniformly disperse the superabrasive grains in the metal plating phase. To form the abrasive grain layer 14.

そして、この砥粒層14が、最終的に成形すべき電鋳薄
刃砥石肉厚の1/2にできるだけ近く、しかも平面基板
11からの引き剥がしに十分耐えうる強度を有する肉厚
になったら通電を停止し、平面基板12から砥粒層14
を引き剥がす。なお、最終的に製造すべき電鋳薄刃砥石
の肉厚が薄く、その略1/2の肉厚の砥粒層を平面基板
から損傷なく剥離させることが困難な場合には、損傷す
ることなく剥離できる肉厚になってからでよい。こうし
て得られた砥粒層14は、その一方の表面14Aからの
み超砥粒が突出している。
When the abrasive grain layer 14 is as close as possible to 1/2 of the wall thickness of the electroformed thin blade grindstone to be finally formed, and has a thickness that is sufficiently strong to be peeled off from the flat substrate 11, the electricity is supplied. To stop the abrasive grain layer 14 from the flat substrate 12
Peel off. If the thickness of the electroformed thin blade grindstone to be finally manufactured is thin and it is difficult to peel the abrasive grain layer having a thickness of about 1/2 of the grindstone layer from the flat substrate without damage, do not damage it. It is enough after the wall thickness can be peeled off. The abrasive grain layer 14 thus obtained has superabrasive grains protruding only from one surface 14A thereof.

次に、剥離させた砥粒層14の、超砥粒が突出していな
い表面14B上に、再度、超砥粒を分散させた砥粒層を
形成する。
Next, an abrasive grain layer in which the superabrasive grains are dispersed is formed again on the surface 14B of the peeled abrasive grain layer 14 on which the superabrasive grains do not protrude.

まず、第2図に示すように、先程のメッキ槽10内に、
中央に雌ネジ孔を有する平面基板17を配置する。そし
て、この平面基板17上に、超砥粒が突出した表面14
Aが平面基板17に接するように砥粒層14を載置す
る。
First, as shown in FIG. 2, in the plating tank 10 described above,
A flat substrate 17 having a female screw hole in the center is arranged. Then, the surface 14 on which the superabrasive grains are projected is formed on the flat substrate 17.
The abrasive grain layer 14 is placed so that A contacts the flat substrate 17.

次いで、この砥粒層14の中央に形成されている取付孔
を通して、ステンレス製の固定ネジ16を平面基板17
にねじ込む。この固定ネジ16は、砥粒層14を押さえ
付けるためのフランジ部16Aを有し、このフランジ部
16Aのメッキ液M中に露出する部分のみにはマスキン
グが施されている。こうして砥粒層14を固定した状態
においては、砥粒層14が固定ネジ16を介して平面基
板17と導通されるようになっている。
Then, through a mounting hole formed in the center of the abrasive grain layer 14, a fixing screw 16 made of stainless steel is attached to a flat substrate 17
Screw into. The fixing screw 16 has a flange portion 16A for pressing the abrasive grain layer 14, and only the portion of the flange portion 16A exposed in the plating solution M is masked. When the abrasive grain layer 14 is fixed in this manner, the abrasive grain layer 14 is electrically connected to the flat substrate 17 via the fixing screw 16.

砥粒層14をセットし終えたら、前記攪拌機を作動さ
せ、メッキ液中に超砥粒を分散させながら、平面基板1
7を電源の陰極に接続して陽極板13との間に通電す
る。そして、砥粒層14の前記表面14Bに金属メッキ
相を析出させるとともに、この金属メッキ相内に超砥粒
を分散させ、砥粒層14上に砥粒層18を形成する。や
がて、この砥粒層18が所定の肉厚に達したら、通電を
停止し、平面基板17から、互いに接合された砥粒層
(14+18)を取り外して、これを砥石形状に整形し、第
3図に示すように、両面から超砥粒6…が突出した電鋳
薄刃砥石を得る。
After setting the abrasive grain layer 14, the agitator is operated to disperse the superabrasive grains in the plating solution and
7 is connected to the cathode of the power source, and electricity is applied to the anode plate 13. Then, a metal plating phase is deposited on the surface 14B of the abrasive grain layer 14, and superabrasive particles are dispersed in the metal plating phase to form the abrasive grain layer 18 on the abrasive grain layer 14. Eventually, when the abrasive grain layer 18 reaches a predetermined thickness, the energization is stopped, the abrasive grain layers (14 + 18) bonded to each other are removed from the flat substrate 17, and this is shaped into a grindstone shape, As shown in FIG. 3, an electroformed thin blade grindstone having superabrasive grains 6 ...

このような構成からなる電鋳薄刃砥石の製造方法によれ
ば、一方の表面14Aから超砥粒6…の一部が突出した
砥粒層14を形成した後、この砥粒層14の超砥粒6…
が突出していない裏面14Bに、超砥粒6…が突出した
砥粒層18を形成するので、両面から超砥粒が突出した
電鋳薄刃砥石を製造することができ、切削開始当初から
良好な切れ味と高い加工精度を有し、しかもピッチング
の少ない電鋳薄刃砥石を得ることができる。
According to the method for manufacturing an electroformed thin blade grindstone having such a configuration, after forming the abrasive grain layer 14 in which a part of the superabrasive grains 6 ... Grain 6 ...
Since the abrasive grain layer 18 in which the superabrasive grains 6 ... Protrude is formed on the back surface 14B in which the superabrasive grains are not projected, it is possible to manufacture an electroformed thin blade grindstone in which the superabrasive grains are projected from both sides, which is excellent from the beginning of cutting. It is possible to obtain an electroformed thin blade grindstone having sharpness, high processing accuracy, and less pitching.

また、この電鋳薄刃砥石の製造方法によって製造された
電鋳薄刃砥石では、砥粒層14を形成する際に生じた砥
粒層14内の応力と、砥粒層18を形成する際に生じた
砥粒層18内の応力とが、互いに相反する方向に砥石を
反らせようと作用する。しかも、両砥粒層14,18の
肉厚を略等しく形成することによって、両砥粒層14,
18内の応力を略等しい大きさとするので、両応力は互
いに相殺しあい、砥石に反りが生じることがない。した
がって、本方法によれば、従来では困難であった反りが
生じにくい電鋳薄刃砥石を容易に製造することができ
る。
In the electroformed thin blade grindstone manufactured by the method for manufacturing the electroformed thin blade grindstone, the stress in the abrasive grain layer 14 generated when the abrasive grain layer 14 is formed and the stress generated when the abrasive grain layer 18 is formed. The stress in the abrasive grain layer 18 acts to warp the grindstone in opposite directions. Moreover, by forming the two abrasive grain layers 14 and 18 to have substantially the same thickness,
Since the stresses in 18 are made substantially equal in magnitude, both stresses cancel each other out and warp of the grindstone does not occur. Therefore, according to the present method, it is possible to easily manufacture an electroformed thin blade grindstone that is unlikely to cause warpage, which has been difficult in the past.

なお、上記の実施例では、砥粒層18を形成する際に、
固定ネジ16によって砥粒層14を平面基板17上に固
定していたが、実際には、平面基板17上に超砥粒が突
出した面14Aを接触させて載置するだけで、平面基板
17と砥粒層14とを導通させることができる。これ
は、金属メッキ相から突出している超砥粒6…の表面に
も、部分的に金属メッキ相が被さるように形成されてい
るためである。
In the above example, when forming the abrasive grain layer 18,
Although the abrasive grain layer 14 is fixed on the flat substrate 17 by the fixing screw 16, in practice, the flat substrate 17 can be simply placed by bringing the surface 14A on which the superabrasive grains protrude into contact with the flat substrate 17. And the abrasive grain layer 14 can be electrically connected. This is because the surface of the superabrasive grains 6 ... Protruding from the metal plating phase is also formed so as to partially cover the metal plating phase.

「実施例」 次に、実験例を挙げて本発明の効果を明確にする。[Examples] Next, the effects of the present invention will be clarified by giving experimental examples.

まず、不働態化皮膜が形成されたステンレス鋼からなる
平面基板の表面に、砥石原型形状をなす部分を残してマ
スキングしたのち、脱脂等の清浄化処理を施した。次ぎ
に、ダイヤモンド砥粒を分散させたスルフアミン酸Ni
メッキ液を用いて上記基板の表面に電気メッキを施し、
Niメッキ相内に上記ダイヤモンド砥粒を分散させ、第
1の砥石層を形成した。この場合における上記電気メッ
キの条件を以下に示す。
First, the surface of a planar substrate made of stainless steel on which a passivation film was formed was masked while leaving a portion forming a prototype of a grindstone, and then a cleaning treatment such as degreasing was performed. Next, Ni sulfamate in which diamond abrasive grains are dispersed
Electroplating the surface of the substrate using a plating solution,
The diamond abrasive grains were dispersed in the Ni plating phase to form the first grindstone layer. The conditions of the electroplating in this case are shown below.

(イ) 電気メッキ液の組成 スルフアミン酸Ni:450g/ 塩化Ni:10g/、硼酸:30g/、 ピツト防止剤、光沢剤:各少量、PH:4.0 分散超砥粒の種類:ダイヤモンド粒、 分散砥粒の粒度 :20〜30μm、 分散砥粒の濃度 :20g/ (ロ) 電気メッキ条件 浴温度:50℃、メッキ時間:140分、 陰極電流密度:3A/dm2(B) Composition of electroplating solution Ni sulfamate: 450 g / Ni chloride: 10 g /, boric acid: 30 g /, anti-pitting agent, brightener: each small amount, PH: 4.0 Dispersion superabrasive grain type: diamond grain, Particle size of dispersed abrasive grains: 20 to 30 μm, concentration of dispersed abrasive grains: 20 g / (b) Electroplating conditions Bath temperature: 50 ° C., plating time: 140 minutes, cathode current density: 3 A / dm 2 .

次に、上記砥粒層を平面基板から剥離させ取り外した
後、平面基板に接していた面を上に向けて再度平面基板
上にセットし、前記と同じメッキ液、メッキ条件におい
て、第2の砥粒層を形成した。
Next, after peeling off the abrasive grain layer from the flat substrate and removing it, the abrasive grain layer was set again on the flat substrate with the surface in contact with the flat substrate facing upward, and the second plating was performed under the same plating solution and plating conditions as described above. An abrasive grain layer was formed.

そして、このようにして得られた上記薄肉板状の砥石を
放電加工等により円形の砥石形状に成形して、実験例1
の電鋳薄刃砥石を得た。また、同様の方法により、実験
例2の電鋳薄刃砥石を作成した。
Then, the thin plate-shaped grindstone thus obtained was molded into a circular grindstone shape by electrical discharge machining or the like, and then, Experimental Example 1
The electroformed thin blade grindstone was obtained. Further, an electroformed thin blade grindstone of Experimental Example 2 was prepared by the same method.

また、比較例として、上記と同様のメッキ液、メッキ条
件(メッキ時間を除く)下において、超砥粒の突出処理
が施されていない2種の電鋳薄刃砥石を作成した。
In addition, as a comparative example, two kinds of electroformed thin blade grindstones not subjected to the projection processing of superabrasive grains were prepared under the same plating solution and plating conditions (excluding plating time) as above.

次いで、上記4枚の電鋳薄刃砥石により、以下の切削条
件(湿式)において切削を行なった。
Then, cutting was performed under the following cutting conditions (wet) with the above-mentioned four electroformed thin blade grindstones.

切削条件 被削材:フェライト(HIP材)、 砥石周速:1500m/min.、 刃先突出し量:3mm、 送り速度:20mm/min、 切込み量:2.5mm、 次表は、上記4種類の電鋳薄刃砥石の各寸法および各々
の切削結果を示すものである。
Cutting conditions Work material: Ferrite (HIP material), Grindstone peripheral speed: 1500 m / min., Cutting edge amount: 3 mm, Feed rate: 20 mm / min, Depth of cut: 2.5 mm, the following table shows the above 4 types of electrodes. It shows each dimension of the cast thin blade grindstone and each cutting result.

「発明の効果」 本発明の電鋳薄刃砥石の製造方法によれば、次のような
効果が得られる。
"Effects of the Invention" According to the method for manufacturing an electroformed thin blade grindstone of the present invention, the following effects can be obtained.

一方の表面から超砥粒の一部が突出した砥粒層を形成
した後、この砥粒層の超砥粒が突出していない裏面に、
超砥粒が突出した砥粒層を再度形成するので、両面から
超砥粒が突出した電鋳薄刃砥石を製造することができ、
切削開始当初から良好な切れ味と高い加工精度の電鋳薄
刃砥石を製造することができる。
After forming an abrasive grain layer in which a part of the superabrasive grains is projected from one surface, the superabrasive grains of this abrasive grain layer are not projected on the back surface,
Since the abrasive grain layer in which the superabrasive grains are projected is formed again, it is possible to manufacture an electroformed thin blade grindstone in which the superabrasive grains are projected from both sides.
From the beginning of cutting, it is possible to manufacture an electroformed thin blade grindstone with good sharpness and high processing accuracy.

この電鋳薄刃砥石の製造方法によって製造された電鋳
薄刃砥石では、一方の砥粒層を形成する際に生じた応力
と、他方の砥粒層を形成する際に生じた応力とが、互い
に相反する方向に砥石を反らせようと作用する。しか
も、両砥粒層の肉厚を略等しく形成した場合には、両砥
粒層内の応力が略等しい大きさとなるので、両応力は互
いに相殺し合い、砥石に反りが生じることがない。した
がって、本方法によれば、従来では困難であった反りが
生じにくい電鋳薄刃砥石を容易に製造することができ
る。
In the electroformed thin blade grindstone manufactured by the method for manufacturing this electroformed thin blade grindstone, the stress generated when forming one abrasive grain layer and the stress generated when forming the other abrasive grain layer are mutually It works to bend the grindstone in opposite directions. Moreover, when the two abrasive grain layers are formed to have substantially the same thickness, the stresses in the two abrasive grain layers are substantially equal to each other, so that the two stresses cancel each other out and the whetstone does not warp. Therefore, according to the present method, it is possible to easily manufacture an electroformed thin blade grindstone that is unlikely to cause warpage, which has been difficult in the past.

【図面の簡単な説明】[Brief description of drawings]

第1図および第2図は本発明の電鋳薄刃砥石の製造方法
の一実施例に使用される装置の縦断面図、第3図は同製
造方法によって造られた電鋳薄刃砥石の拡大断面図、第
4図は従来の電鋳薄刃砥石を砥石軸に固定した状態を示
す側断面図、第5図は従来の電鋳薄刃砥石の平面基板側
表面の拡大断面図である。 6……超砥粒 12……平面基板 14……先に形成した砥粒層 14A……超砥粒が突出した砥粒層表面 14B……平面基板に接していた砥粒層表面 17……平面基板 18……後に形成した砥粒層
1 and 2 are longitudinal sectional views of an apparatus used in an embodiment of a method for manufacturing an electroformed thin blade grindstone of the present invention, and FIG. 3 is an enlarged cross section of an electroformed thin blade grindstone manufactured by the manufacturing method. FIG. 4 is a side sectional view showing a state in which a conventional electroformed thin blade grindstone is fixed to a grindstone shaft, and FIG. 5 is an enlarged sectional view of a surface of a conventional electroformed thin blade grindstone on the side of a flat substrate. 6 ... Super-abrasive grain 12 ... Planar substrate 14 ... Abrasive grain layer formed earlier 14A ... Abrasive layer surface with super-abrasive grains protruding 14B ... Abrasive layer surface in contact with flat substrate 17 ... Flat substrate 18 ... Abrasive layer formed later

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】平面基板に金属メッキ相を形成しつつ、こ
の金属メッキ相内に超砥粒を分散させて、表面から超砥
粒の一部が突出した砥粒層を形成した後、この砥粒層を
平面基板から剥離し、この砥粒層の平面基板に接してい
た面に金属メッキ相を形成しつつ、この金属メッキ相内
に超砥粒を分散させて表面から超砥粒の一部が突出した
砥粒層を形成することを特徴とする電鋳薄刃砥石の製造
方法。
1. A metal plating phase is formed on a flat substrate, and superabrasive grains are dispersed in the metal plating phase to form an abrasive grain layer in which a part of the superabrasive grains is projected from the surface. While peeling the abrasive grain layer from the flat substrate and forming a metal plating phase on the surface of the abrasive grain layer that was in contact with the flat substrate, the superabrasive grains are dispersed in the metal plating phase to form a superabrasive grain from the surface. A method for producing an electroformed thin blade grindstone, which comprises forming an abrasive grain layer, a portion of which protrudes.
JP61157053A 1986-07-02 1986-07-02 Method of manufacturing electroformed thin blade grindstone Expired - Lifetime JPH0649275B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61157053A JPH0649275B2 (en) 1986-07-02 1986-07-02 Method of manufacturing electroformed thin blade grindstone

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61157053A JPH0649275B2 (en) 1986-07-02 1986-07-02 Method of manufacturing electroformed thin blade grindstone

Publications (2)

Publication Number Publication Date
JPS6311281A JPS6311281A (en) 1988-01-18
JPH0649275B2 true JPH0649275B2 (en) 1994-06-29

Family

ID=15641172

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61157053A Expired - Lifetime JPH0649275B2 (en) 1986-07-02 1986-07-02 Method of manufacturing electroformed thin blade grindstone

Country Status (1)

Country Link
JP (1) JPH0649275B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03134131A (en) * 1989-10-18 1991-06-07 Japan Metals & Chem Co Ltd Alloy for handling isotope of hydrogen
JP4904245B2 (en) * 2007-10-29 2012-03-28 本田技研工業株式会社 Body structure

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5518328A (en) * 1978-07-21 1980-02-08 Toshiba Corp Method of fabricating cutting grindstone

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5518328A (en) * 1978-07-21 1980-02-08 Toshiba Corp Method of fabricating cutting grindstone

Also Published As

Publication number Publication date
JPS6311281A (en) 1988-01-18

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