JPH0642578A - Semi-active vibration proof device, semi-active damper device, semi-active stiffness mechanism device, reduced projection exposure device and its semi-active damping method - Google Patents

Semi-active vibration proof device, semi-active damper device, semi-active stiffness mechanism device, reduced projection exposure device and its semi-active damping method

Info

Publication number
JPH0642578A
JPH0642578A JP4196993A JP19699392A JPH0642578A JP H0642578 A JPH0642578 A JP H0642578A JP 4196993 A JP4196993 A JP 4196993A JP 19699392 A JP19699392 A JP 19699392A JP H0642578 A JPH0642578 A JP H0642578A
Authority
JP
Japan
Prior art keywords
active
semi
vibration isolation
electromagnet
vibration
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4196993A
Other languages
Japanese (ja)
Inventor
Masaki Kurihara
雅樹 栗原
Hitoshi Isoya
仁 礒谷
Isao Kobayashi
功 小林
Ikumori Ootake
生司 大竹
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP4196993A priority Critical patent/JPH0642578A/en
Publication of JPH0642578A publication Critical patent/JPH0642578A/en
Pending legal-status Critical Current

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/708Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709Vibration, e.g. vibration detection, compensation, suppression or isolation

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  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Vibration Prevention Devices (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To provide an inexpensive semi-active damping device which enables damping by providing a semi-active damper device or a semi-active stiffness mechanism device on a damping device consisting of a structure subject to the step input in the horizontal direction and the floor vibration and a damping table, apart from a passive damping device. CONSTITUTION:When the X-Y stage 4 is driven by its driving device, a reaction force is exerted on a level block 3 supporting the driving device, and a damping device 2 is deformed thereby. If an electro-magnet 14 is actuated immediately before the X-Y stage 4 is driven, a movable member 16 and the level block 3 are connected to each other, and a relative motion is generated between the movable member 16 and a container member 17, and the viscous resistance of the viscous fluid 18 to be generated when the viscous fluid 18 is removed performs the damping effect as a damper. In particular, when the higher the viscosity of the viscous fluid 18 becomes, and the narrower the space between the movable member 16 and the container member 17 becomes, the larger damping force is obtained, and if required, it is possible to provide the overdamping.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明はステップ入力と床振動を
受ける機器用の除振装置に係り、特にステップ入力に対
する制振効果と床振動に対する除振効果とを両立させる
のに好適な、半能動型除振装置、半能動型ダンパ装置、
半能動型剛性機構装置、縮小投影露光装置及びその半能
動型除振方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a vibration isolator for equipment that receives step input and floor vibration, and in particular, it is suitable for achieving both a vibration control effect for step input and a vibration isolation effect for floor vibration. Active vibration isolation device, semi-active damper device,
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semi-active rigidity mechanism device, a reduced projection exposure apparatus, and a semi-active vibration isolation method for the same.

【0002】[0002]

【従来の技術】縮小投影露光装置等のように、ウェーハ
ーを移動させるのに用いる移動台を組み込んだ精密な機
器は、床面の振動が原因で精度が低下する恐れがあるた
め、除振装置上に搭載された定盤上に配置される。一般
に、除振装置としては、水平方向及び鉛直方向に剛性の
低いコイルバネ、空気バネ、もしくは防振ゴムなどと、
減衰効果を有する粘性ダンパとの組合せが用いられるこ
とが多い。除振装置は床面からの微小振動を低減するこ
とができるが、定盤を揺れやすくするため、機器の内部
に加振源をもつ場合は、その加振力に対しては逆効果と
なり、定盤の振動を増加させてしまう。
2. Description of the Related Art Precision equipment such as a reduction projection exposure apparatus, which incorporates a moving table used for moving a wafer, may lower its accuracy due to vibration of the floor surface. It is placed on the surface plate mounted above. Generally, as a vibration isolation device, a coil spring, an air spring, or a vibration isolation rubber having low rigidity in the horizontal and vertical directions,
Combinations with viscous dampers, which have a damping effect, are often used. The vibration isolation device can reduce minute vibrations from the floor surface, but in order to make the surface plate sway easily, when a vibration source is provided inside the equipment, it has an adverse effect on the vibration force. It will increase the vibration of the surface plate.

【0003】縮小投影露光装置の場合においては、定盤
上に設けられたX−Yステージの移動に伴い縮小投影露
光装置の全体が振動してしまうので、露光精度を確保す
るためには、振動を減衰させるための整定時間を長く取
る必要がある。その結果、ウェーハーをX−Yステージ
によって適当な位置に移動させ、このウェーハーに縮小
投影露光するまでの時間が増大してしまう。そこで、X
−Yステージが移動することによって発生する振動を低
減(この低減効果を制振効果とよぶ)するためには、除
振装置の減衰効果を増加させて速やかに振動を減衰させ
る方法と、除振装置の剛性を増加させて振動の発生を防
止する方法とが考えられる。しかしながら、これらの方
法では、逆に除振効果を悪化させてしまうことがある。
すなわち、受動型要素だけでは制振効果と除振効果を両
立させる除振装置を提供することは困難である。
In the case of the reduction projection exposure apparatus, the reduction projection exposure apparatus as a whole vibrates as the XY stage provided on the surface plate moves. It is necessary to take a long settling time for attenuating. As a result, it takes a long time to move the wafer to an appropriate position by the XY stage and perform reduction projection exposure on the wafer. So X
In order to reduce the vibration generated by the movement of the Y stage (this reduction effect is called the vibration damping effect), a method of increasing the damping effect of the vibration isolation device to quickly damp the vibration, A method of increasing the rigidity of the device to prevent the occurrence of vibration is considered. However, these methods may adversely affect the vibration isolation effect.
That is, it is difficult to provide a vibration damping device that achieves both the vibration damping effect and the vibration damping effect only with the passive element.

【0004】この問題を解決するために、X−Yステー
ジ駆動時の反力による定盤の振動を能動的に抑制する方
法が効果的である。従来技術としては、例えば、特開平
1−307537号公報に記載されているように、受動
型除振装置の代わりに、アクチュエータを用い、定盤上
の絶対応答加速度などをフィードバックして能動的に定
盤の振動を抑制するものがある。
To solve this problem, it is effective to actively suppress the vibration of the surface plate due to the reaction force when the XY stage is driven. As a conventional technique, for example, as described in Japanese Patent Laid-Open No. 1-307537, an actuator is used instead of a passive vibration isolator, and an absolute response acceleration on a surface plate is fed back to actively. There are those that suppress the vibration of the surface plate.

【0005】[0005]

【発明が解決しようとする課題】従来技術の原理によれ
ば、定盤の制振効果及び除振効果を能動的に得ることが
可能である。しかしながら、アクチュエータを用いた能
動型除振装置は高価であり、性能を発揮するための調整
が困難となることが想定される。
According to the principle of the prior art, it is possible to actively obtain the vibration damping effect and the vibration damping effect of the surface plate. However, it is assumed that an active vibration isolation device using an actuator is expensive and it is difficult to make adjustments to achieve its performance.

【0006】本発明の目的は、受動型の除振装置要素と
その除振装置の特性を制御できるようにした安価な半能
動型除振装置、半能動型ダンパ装置、半能動型剛性機構
装置、縮小投影露光装置及びその半能動型除振方法を提
供することにある。
An object of the present invention is to provide an inexpensive semi-active vibration isolator, a semi-active damper device, and a semi-active rigid mechanical device capable of controlling the characteristics of the passive vibration isolator device and its vibration isolator. To provide a reduction projection exposure apparatus and a semi-active vibration isolating method thereof.

【0007】[0007]

【課題を解決するための手段】上記目的は、水平方向の
ステップ入力及び床振動を受ける構造体と除振台とから
なる除振装置に、受動型除振装置とは別に、半能動型ダ
ンパ装置もしくは半能動型剛性機構装置を設けることに
よって達成される。すなわち、前記半能動型ダンパ装置
は、前記除振台の有する除振手段とは異なる受動型ダン
パ部材と、この受動型ダンパ部材の減衰力を前記構造体
に伝える能動型伝達装置と、この能動型伝達装置を制御
するコントローラとから構成し、或いは、この受動型ダ
ンパ部材を前記構造体に対して接続又は分離自在にする
電磁石と、この電磁石を制御するコントローラとから構
成されていることを特徴とするものである。また、前記
半能動型剛性機構装置は、前記除振台の有する除振手段
とは異なる受動型バネ部材と、この受動型バネ部材のバ
ネ力を前記構造体に伝える能動型伝達装置と、この能動
型伝達装置を制御するコントローラとから構成し、或い
は、この受動型バネ部材のバネ力を前記構造体に対して
接続又は分離自在にする電磁石と、この電磁石を制御す
るコントローラとから構成されていることを特徴とする
ものである。
SUMMARY OF THE INVENTION The above-mentioned object is to provide a vibration isolator comprising a structure subject to horizontal step input and floor vibration and a vibration isolator, and a semi-active damper separately from a passive vibration isolator. This is accomplished by providing a device or semi-active rigid mechanical device. That is, the semi-active damper device is a passive damper member different from the vibration isolation means of the vibration isolation table, an active transmission device that transmits the damping force of the passive damper member to the structure, and the active damper device. A controller for controlling the mold transmission device, or an electromagnet for connecting or disconnecting the passive damper member to or from the structure, and a controller for controlling the electromagnet. It is what In addition, the semi-active rigidity mechanism device includes a passive spring member different from the vibration isolation means of the vibration isolation table, an active transmission device that transmits the spring force of the passive spring member to the structure, A controller for controlling the active transmission device, or an electromagnet for connecting or disconnecting the spring force of the passive spring member to or from the structure, and a controller for controlling the electromagnet. It is characterized by being present.

【0008】[0008]

【作用】本発明の半能動型除振装置において、除振効果
と制振効果を同時に得られるようにするためには、除振
装置が支持している構造体、床振動、構造体の内部加振
源の加速度等を計測し、これらの計測データを用いて、
構造体の振動を抑制するように半能動型除振装置の動作
を制御する電磁石をオン−オフ制御することによってな
される。
In the semi-active vibration isolator of the present invention, in order to obtain the vibration isolation effect and the vibration damping effect at the same time, the structure supported by the vibration isolation device, the floor vibration, and the inside of the structure are supported. Measure the acceleration of the vibration source, etc., and use these measurement data,
This is done by on / off controlling an electromagnet that controls the operation of the semi-active vibration isolator so as to suppress the vibration of the structure.

【0009】しかしながら、本発明の半能動型除振装置
を適用する構造体が縮小投影露光装置の場合には、次の
ように半能動型除振装置の制御を簡単化することができ
る。通常、縮小投影露光装置のX−Yステージの位置決
め制御は2段階で行なわれる。第1段階では、位置決め
精度より、できるだけ高速にしかも大きく移動させるた
めに、適当な速度パターンにしたがってステージを移動
させる。この第1段階におけるステージの移動時に大き
な反力が縮小投影露光装置本体に加わる。また、第2段
階では、微小変位まで計測できるレーザー測長器を用い
て高精度の位置決め制御が行なわれるが、この時のステ
ージ反力は小さい。しかもレーザー測長器の精度は床振
動のような微小振動の影響を受けやすい。
However, when the structure to which the semi-active vibration isolator of the present invention is applied is a reduction projection exposure apparatus, the control of the semi-active vibration isolator can be simplified as follows. Usually, the positioning control of the XY stage of the reduction projection exposure apparatus is performed in two stages. In the first stage, the stage is moved in accordance with an appropriate speed pattern in order to move the stage as fast and as large as possible according to the positioning accuracy. A large reaction force is applied to the reduction projection exposure apparatus main body when the stage is moved in the first stage. Further, in the second stage, high-precision positioning control is performed using a laser length measuring device capable of measuring even minute displacements, but the stage reaction force at this time is small. Moreover, the accuracy of the laser length measuring instrument is easily affected by minute vibrations such as floor vibrations.

【0010】従って、第1段階では、半能動型除振装置
のコントローラにより電磁石を動作させ、受動型ダンパ
部材或いは受動型バネ部材を縮小投影露光装置に結合さ
せることによって、縮小投影露光装置に大きな制振力を
与え、ステージ反力による縮小投影露光装置全体の振動
応答を低減させる。受動型ダンパ部材を動作させる場合
は、その減衰力によって、また、受動型バネ部材を動作
させる場合は、除振装置全体を高剛性化することによっ
て、制振効果が得られる。次に、第2段階の高精度の位
置決め制御時には、電磁石への制御電流を切り、受動型
ダンパ部材或いは受動型バネ部材が働かないようにする
ことによって、除振装置本来の除振効果を得ることがで
きる。更に露光時においては、ステージは移動しないた
めに、そのまま除振効果が得られるように電磁石への制
御電流を切ったままにしておく。
Therefore, in the first stage, the controller of the semi-active vibration isolator operates the electromagnet to couple the passive damper member or the passive spring member to the reduction projection exposure apparatus, thereby increasing the size of the reduction projection exposure apparatus. A vibration damping force is applied to reduce the vibration response of the entire reduction projection exposure apparatus due to the stage reaction force. The damping effect is obtained by the damping force when operating the passive damper member, and by increasing the rigidity of the entire vibration isolation device when operating the passive spring member. Next, during the high-precision positioning control in the second stage, the control current to the electromagnet is cut off so that the passive damper member or the passive spring member does not work, thereby obtaining the original vibration isolation effect of the vibration isolation device. be able to. Further, since the stage does not move during exposure, the control current to the electromagnet is kept off so that the vibration isolation effect can be obtained.

【0011】なお、ステージの高精度な位置決め制御を
行なう第2段階に移行する際の、半能動型ダンパ装置或
いは半能動型剛性機構装置の動作を中断させるかどうか
の判断基準として、ステージ駆動時の操作量(荷重に対
応した量)或いは偏差量(目標位置と現在位置との変位
差に対応した量)を用いることにより、更に効果的な制
御を行うことが可能である。ステージ駆動時の操作量或
いは偏差量を用いた具体的な制御方法としては、ステー
ジ駆動時の操作量(又はその力積)或いは偏差量がある
値以下になったところで電磁石への制御電流を切る方法
が有効である。
When the stage is driven, as a criterion for deciding whether or not to suspend the operation of the semi-active damper device or the semi-active rigid mechanism device when shifting to the second stage for performing highly accurate positioning control of the stage. By using the operation amount (the amount corresponding to the load) or the deviation amount (the amount corresponding to the displacement difference between the target position and the current position), it is possible to perform more effective control. As a concrete control method using the operation amount or the deviation amount during the stage driving, the control current to the electromagnet is turned off when the operation amount (or its impulse) during the stage driving or the deviation amount becomes a certain value or less. The method is effective.

【0012】[0012]

【実施例】以下、本発明のいくつかの実施例を、図面を
参照して説明する。まず、本発明の一実施例を図1、図
2及び図11により説明する。図11は、縮小投影露光
装置を受動型の除振装置により支持した例の斜視図であ
る。図1は、図11に示した受動型の除振装置2に半能
動型要素11を配置した例を示した斜視図とコントロー
ラの構成を示したものである。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Some embodiments of the present invention will be described below with reference to the drawings. First, an embodiment of the present invention will be described with reference to FIGS. 1, 2 and 11. FIG. 11 is a perspective view of an example in which the reduction projection exposure apparatus is supported by a passive type vibration isolation device. FIG. 1 is a perspective view showing an example of arranging the semi-active type element 11 in the passive vibration isolator 2 shown in FIG. 11 and the configuration of the controller.

【0013】図11において、除振台1の複数個の除振
装置2で支持された定盤3上にX−Yステージ4が設け
られている。また、定盤3上の四隅に配置された4本の
コラム部材6によりレンズ支持台7が支持される。この
レンズ支持台7から釣下げられたレンズホールダ8と、
X−Yステージ4上部に置かれるウェーハー5との位置
関係は、X−Yステージ4が水平面内に移動することに
よって、任意に設定される。また、レンズ支持台7上部
には、レチクル9と照明装置10が配置されている。
In FIG. 11, an XY stage 4 is provided on a surface plate 3 supported by a plurality of vibration isolation devices 2 of an anti-vibration table 1. Further, the lens support base 7 is supported by the four column members 6 arranged at the four corners of the surface plate 3. A lens holder 8 suspended from the lens support base 7,
The positional relationship with the wafer 5 placed on the upper part of the XY stage 4 is arbitrarily set by moving the XY stage 4 in the horizontal plane. Further, a reticle 9 and an illumination device 10 are arranged above the lens support base 7.

【0014】ところで、本実施例では、図1に示される
ように、除振台1上に、バネ部材とダンパ部材で構成さ
れる除振装置2とは別に、複数個の半能動型要素11が
配置されている。この半能動型要素11の制御は、ステ
ージ用コントローラ33からステージ駆動時の操作量あ
るいは偏差量の信号を用いて、半能動型要素のコントロ
ーラ12により行われる。
By the way, in this embodiment, as shown in FIG. 1, a plurality of semi-active elements 11 are provided on the vibration isolation table 1 in addition to the vibration isolation device 2 composed of a spring member and a damper member. Are arranged. The control of the semi-active element 11 is performed by the controller 12 of the semi-active element using the signal of the operation amount or the deviation amount when driving the stage from the stage controller 33.

【0015】この半能動型要素11の一つは、図2に示
されるように、除振台1上に容器部材17の内部に可動
部材16が配置され、可動部材16と容器部材17との
間の水平及び上下方向の間隙を確保するために、それら
の間に弾性体部材19が設けられ、さらに、可動部材1
6と容器部材17との間に粘性流体18が介在してい
る。可動部材16には、粘性流体18の上下方向に働く
粘性抵抗力(制振力)を定盤3に伝達するために板バネ
部材15aが一つもしくは複数組設けられ、この板バネ
部材15aに対応した数だけ、電磁石14aが定盤3
に、支持部材13により固定される。また、可動部材1
6には、粘性流体18の水平方向に働く制振力を定盤3
に伝達するために板バネ部材15bが設けられ、これに
対面して、電磁石14bが支持部材13に取り付けられ
ている。電磁石14はヨーク部材21とコイル部材20
から構成され、ヨーク部材21と板バネ部材15とは近
接して設置されている。
In one of the semi-active elements 11, as shown in FIG. 2, a movable member 16 is arranged inside a container member 17 on a vibration isolation table 1, and the movable member 16 and the container member 17 are connected to each other. In order to secure a horizontal and vertical gap between them, an elastic member 19 is provided between them, and further, the movable member 1
The viscous fluid 18 is interposed between the container 6 and the container member 17. The movable member 16 is provided with one or a plurality of leaf spring members 15a for transmitting the viscous resistance force (vibration damping force) acting in the vertical direction of the viscous fluid 18 to the surface plate 3. The corresponding number of electromagnets 14a are on the surface plate 3
It is fixed by the support member 13. In addition, the movable member 1
In FIG. 6, the damping force that acts on the viscous fluid 18 in the horizontal direction is given to
A leaf spring member 15b is provided for transmission to the electromagnet, and an electromagnet 14b is attached to the support member 13 so as to face the leaf spring member 15b. The electromagnet 14 includes a yoke member 21 and a coil member 20.
The yoke member 21 and the leaf spring member 15 are installed close to each other.

【0016】次に、本実施例の作用について説明する。
図11において、X−Yステージ4がその駆動装置によ
り駆動されると、その駆動装置を支持している定盤3に
反力が加わり、これにより除振装置2が変形されるが、
X−Yステージ4が駆動される直前に電磁石14を動作
させることによって、可動部材16と定盤3とが連結さ
れるため、可動部材16と容器部材17との間に相対運
動が生じるため、粘性流体18を排除しようとした時に
生じる粘性流体18の粘性抵抗力がダンパとしての減衰
効果を発揮する。特に、粘性流体18の粘度を高くし、
可動部材16と容器部材17との間隙を狭くするほど、
大きな減衰力が得られ、必要ならば過減衰にもすること
が可能である。
Next, the operation of this embodiment will be described.
In FIG. 11, when the XY stage 4 is driven by the driving device, a reaction force is applied to the surface plate 3 supporting the driving device, and thereby the vibration isolation device 2 is deformed.
Since the movable member 16 and the surface plate 3 are connected by operating the electromagnet 14 immediately before the XY stage 4 is driven, relative movement occurs between the movable member 16 and the container member 17, The viscous resistance force of the viscous fluid 18 that occurs when the viscous fluid 18 is to be removed exerts a damping effect as a damper. In particular, by increasing the viscosity of the viscous fluid 18,
The narrower the gap between the movable member 16 and the container member 17,
A large damping force is obtained and, if necessary, overdamping is possible.

【0017】その結果、X−Yステージの駆動時の反力
による縮小投影露光装置全体の振動を抑制することがで
きる。次に、縮小投影露光装置における露光時と露光を
開始する直前のX−Yステージの高精度位置決め制御時
には、コントローラ12からの信号により電磁石14の
動作を中断することによって、粘性流体18の制振力は
定盤3に作用しなくなるため、除振装置2の本来の振動
絶縁効果が得られる。
As a result, it is possible to suppress the vibration of the entire reduction projection exposure apparatus due to the reaction force when the XY stage is driven. Next, during exposure in the reduction projection exposure apparatus and during high-accuracy positioning control of the XY stage immediately before the start of exposure, the operation of the electromagnet 14 is interrupted by a signal from the controller 12 to suppress the vibration of the viscous fluid 18. Since the force does not act on the surface plate 3, the original vibration isolation effect of the vibration isolation device 2 can be obtained.

【0018】なお、粘性ダンパを高減衰化させると、減
衰力が小さい場合に比べて、除振装置の振動絶縁効果が
悪くなるが、全くその効果がなくなる訳ではなく、床振
動があまり問題にならない場合には、本発明の受動型ダ
ンパ部材のみを、高減衰ダンパとして用いることができ
る。また、水平方向あるいは上下方向のうち一方向のみ
の制振効果を発揮させる場合には、その方向に制振力を
伝達させる板バネ部材と電磁石のみを設ければ良い。
When the viscous damper is highly damped, the vibration isolation effect of the vibration isolator becomes worse than when the damping force is small, but this effect does not disappear at all, and floor vibration becomes a problem. If not, only the passive damper member of the present invention can be used as a high damping damper. Further, when the vibration damping effect is exerted only in one of the horizontal direction and the vertical direction, only the leaf spring member and the electromagnet for transmitting the vibration damping force in that direction may be provided.

【0019】図3に別の実施例を示す。図3と図2の違
いは、図2における粘性流体18中にあった弾性部材1
9を容器部材17の上部に配置させた点である。このよ
うにすることによって、弾性部材19のメンテナンスを
やりやすくできる。
FIG. 3 shows another embodiment. The difference between FIG. 3 and FIG. 2 is that the elastic member 1 in the viscous fluid 18 in FIG.
9 is arranged on the upper part of the container member 17. By doing so, the elastic member 19 can be easily maintained.

【0020】図4には電磁石14の別の実施例を示す。
この実施例ではヨーク部21の中央に連結部材23が挿
入されており、連結部材23の一端は板バネ部材15に
接するように、支持部材13と連結部材23との間にバ
ネ部材22を設けたものである。これによって、電磁石
14と板バネ部材15とはいつも接しているので、離れ
ている場合に比較して電磁石の吸引力を小さくすること
ができる。
FIG. 4 shows another embodiment of the electromagnet 14.
In this embodiment, the connecting member 23 is inserted in the center of the yoke portion 21, and the spring member 22 is provided between the supporting member 13 and the connecting member 23 so that one end of the connecting member 23 contacts the leaf spring member 15. It is a thing. As a result, since the electromagnet 14 and the leaf spring member 15 are always in contact with each other, the attraction force of the electromagnet can be reduced as compared with the case where they are separated.

【0021】図5は板バネ部材15bの実施例を示した
ものである。この実施例の板バネ部材は面外方向の剛性
を下げるために切欠き部が設けられている。
FIG. 5 shows an embodiment of the leaf spring member 15b. The leaf spring member of this embodiment is provided with a notch to reduce the rigidity in the out-of-plane direction.

【0022】図6は半能動型ダンパ装置の別の実施例で
ある。この実施例では可動部材16に電磁石14を設け
てあり、電磁石14のヨーク部に対面する連結部材23
は定盤3に取り付けられた受け部材24に挿入されてい
る。受け部材24は連結部材23が上下方向に移動する
際のガイドになっており、連結部材23は自重により常
に電磁石14のヨーク部に接している。また、受け部材
24に設けられた1個もしくは複数個の加力部材、例え
ば積層型圧電素子26と押え部材25とからなる加力部
材により、連結部材23を受け部材24に固定させるこ
とができる。
FIG. 6 shows another embodiment of the semi-active damper device. In this embodiment, the movable member 16 is provided with the electromagnet 14, and the connecting member 23 facing the yoke portion of the electromagnet 14 is provided.
Is inserted in the receiving member 24 attached to the surface plate 3. The receiving member 24 serves as a guide when the connecting member 23 moves in the vertical direction, and the connecting member 23 is always in contact with the yoke portion of the electromagnet 14 by its own weight. The connecting member 23 can be fixed to the receiving member 24 by one or a plurality of force applying members provided on the receiving member 24, for example, an applying force member including the laminated piezoelectric element 26 and the pressing member 25. .

【0023】本実施例において、受動型粘性ダンパの制
振力を定盤3に伝達するには、まず積層型圧電素子26
を動作させて連結部材23を受け部材24に押し付けて
固定し、次に電磁石14を動作させて、電磁石14のヨ
ーク部に連結部材23を吸引・固定することによってな
される。なお、粘性流体18の水平方向のみの制振力が
必要な場合には、積層型圧電素子26と押え部材25を
省略することができる。
In this embodiment, in order to transmit the damping force of the passive viscous damper to the surface plate 3, first, the laminated piezoelectric element 26 is used.
Is operated to press and fix the connecting member 23 against the receiving member 24, and then the electromagnet 14 is operated to attract and fix the connecting member 23 to the yoke portion of the electromagnet 14. In addition, when the vibration damping force of the viscous fluid 18 only in the horizontal direction is required, the laminated piezoelectric element 26 and the pressing member 25 can be omitted.

【0024】図7は半能動型ダンパ装置の別の実施例で
ある。この実施例では受動型ダンパ部材として粘性弾性
部材28を用い、この一端に磁性体部材29を取り付け
られており、磁性体部材29と除振台1に設けられた電
磁石14とは対面して配置されている。また、粘弾性部
材28の他端は支持部材27を介して定盤3に固定され
る。この半能動型ダンパ装置は上述の粘性流体を用いた
ものに比べて、簡単な構造であることが特徴である。本
実施例では電磁石14を動作させて、粘弾性部材28の
磁性体部材29を電磁石14のヨーク部に吸引・固定す
ることによって、粘弾性部材28の制振力を定盤3に伝
えることができる。しかも、粘弾性部材28は水平及び
上下方向の制振効果を有している。
FIG. 7 shows another embodiment of the semi-active damper device. In this embodiment, a viscoelastic member 28 is used as a passive damper member, and a magnetic member 29 is attached to one end of the viscoelastic member 28. The magnetic member 29 and the electromagnet 14 provided on the vibration isolation table 1 are arranged to face each other. Has been done. The other end of the viscoelastic member 28 is fixed to the surface plate 3 via the support member 27. This semi-active damper device is characterized by a simpler structure than the one using the viscous fluid described above. In this embodiment, the electromagnet 14 is operated to attract and fix the magnetic member 29 of the viscoelastic member 28 to the yoke portion of the electromagnet 14, so that the damping force of the viscoelastic member 28 can be transmitted to the surface plate 3. it can. Moreover, the viscoelastic member 28 has a horizontal and vertical damping effect.

【0025】図8は半能動的剛性機構装置の実施例であ
る。この実施例では除振台1に支持された電磁石14と
のヨーク部に対面して、連結部材23が配置され、この
連結部材23には受動型バネ部材30が設けられてい
る。連結部材23は定盤3に取り付けられた受け部材2
4に挿入されている。また、受け部材24には1個もし
くは複数個の積層型圧電素子26と押え部材25が設け
られる。これにより、連結部材23は受け部材24に固
定される。
FIG. 8 is an embodiment of a semi-active rigid mechanical device. In this embodiment, a connecting member 23 is arranged so as to face the yoke portion with the electromagnet 14 supported by the vibration isolation table 1, and the connecting member 23 is provided with a passive spring member 30. The connecting member 23 is the receiving member 2 attached to the surface plate 3.
It is inserted in 4. Further, the receiving member 24 is provided with one or a plurality of laminated piezoelectric elements 26 and a pressing member 25. As a result, the connecting member 23 is fixed to the receiving member 24.

【0026】本実施例では、まず積層型圧電素子26を
作用させて連結部材23を受け部材24に押し付けて、
連結部材23を受け部材24に固定させる。つぎに、電
磁石14を作用させて電磁石14のヨーク部に連結部材
23を吸引・固定する。このようにすることによって、
除振系の剛性をコントロールすることができる。受動型
バネ部材30としてゴム部材等を用いることによって、
半能動型剛性機構装置の水平及び上下方向のばね定数を
適当に設定することができる。なお、受動型バネ部材3
0の水平方向のみの剛性が必要な場合には、受け部材2
4に設けられた積層形圧電素子26と押え部材25を省
略することができる。
In this embodiment, first, the laminated piezoelectric element 26 is operated to press the connecting member 23 against the receiving member 24,
The connecting member 23 is fixed to the receiving member 24. Next, the electromagnet 14 is actuated to attract and fix the connecting member 23 to the yoke portion of the electromagnet 14. By doing this,
The rigidity of the vibration isolation system can be controlled. By using a rubber member or the like as the passive spring member 30,
The spring constants in the horizontal and vertical directions of the semi-active rigid mechanical device can be set appropriately. The passive spring member 3
When the rigidity of 0 only in the horizontal direction is required, the receiving member 2
It is possible to omit the laminated piezoelectric element 26 and the pressing member 25 provided in FIG.

【0027】図9は別の半能動型剛性機構装置の実施例
である。この実施例では除振台1に設けられた電磁石1
4のヨーク部に対面して、板バネ部材15は受動型バネ
部材30を介して板バネ支持部材31に支持される。ま
た、板バネ支持部材31は定盤3に取り付けられる。本
実施例では板バネ部材15によって除振系の水平方向の
剛性を増加させるものであり、板バネ部材15の板厚を
薄くして面外方向の剛性を小さくすることにより、電磁
石14を作用させて板バネ部材15の吸引・固定を妨げ
ずに行うことができる。
FIG. 9 shows another embodiment of the semi-active type rigid mechanical device. In this embodiment, the electromagnet 1 provided on the vibration isolation table 1
The leaf spring member 15 is supported by the leaf spring support member 31 via the passive spring member 30 so as to face the yoke portion of No. 4. The leaf spring support member 31 is attached to the surface plate 3. In this embodiment, the plate spring member 15 increases the rigidity of the vibration isolation system in the horizontal direction. By reducing the plate thickness of the plate spring member 15 to reduce the rigidity in the out-of-plane direction, the electromagnet 14 operates. The leaf spring member 15 can be sucked and fixed without hindering it.

【0028】図10は、別の半能動型剛性機構装置の実
施例で、特に図9の板バネ部材15をヒンジ付板バネ部
材32にしたものである。ヒンジ部を設けることによっ
て面外方向の剛性を増加させずに水平方向の剛性を増加
させることが可能である。
FIG. 10 shows another embodiment of a semi-active type rigid mechanism device, in which the leaf spring member 15 of FIG. 9 is replaced by a leaf spring member 32 with a hinge. By providing the hinge portion, it is possible to increase the rigidity in the horizontal direction without increasing the rigidity in the out-of-plane direction.

【0029】[0029]

【発明の効果】上述のとおり本発明によれば、ステップ
入力と床振動を受ける機器用の除振装置において、特に
ステップ入力に対する制振効果と床振動に対する除振効
果とを効果的に両立させることができる。
As described above, according to the present invention, in a vibration isolator for equipment that receives a step input and floor vibration, it is possible to effectively achieve both the vibration damping effect for the step input and the vibration isolation effect for the floor vibration. be able to.

【図面の簡単な説明】[Brief description of drawings]

【図1】図1は本発明の半能動型除振装置の斜視図であ
る。
FIG. 1 is a perspective view of a semi-active vibration isolator according to the present invention.

【図2】図2は本発明の半能動型ダンパ装置の一実施例
の正面図である。
FIG. 2 is a front view of an embodiment of the semi-active damper device of the present invention.

【図3】図3は本発明の半能動型ダンパ装置の別の実施
例の正面図である。
FIG. 3 is a front view of another embodiment of the semi-active damper device of the present invention.

【図4】図4は本発明の半能動型ダンパ装置の別の実施
例の正面図である。
FIG. 4 is a front view of another embodiment of the semi-active damper device of the present invention.

【図5】図5は本発明の半能動型ダンパ装置の別の実施
例の平面図である。
FIG. 5 is a plan view of another embodiment of the semi-active damper device of the present invention.

【図6】図6は本発明の半能動型ダンパ装置の別の実施
例の正面図である。
FIG. 6 is a front view of another embodiment of the semi-active damper device of the present invention.

【図7】図7は本発明の半能動型ダンパ装置の別の実施
例の正面図である。
FIG. 7 is a front view of another embodiment of the semi-active damper device of the present invention.

【図8】図8は本発明の半能動型剛性機構装置の実施例
の正面図である。
FIG. 8 is a front view of an embodiment of the semi-active rigid mechanical device of the present invention.

【図9】図9は本発明の半能動型剛性機構装置の一実施
例の正面図である。
FIG. 9 is a front view of an embodiment of the semi-active type rigid mechanical device of the present invention.

【図10】図10は本発明の半能動型剛性機構装置の別
の実施例の正面図である。
FIG. 10 is a front view of another embodiment of the semi-active type rigid mechanical device of the present invention.

【図11】図11は縮小投影露光装置を除振装置に搭載
した例の斜視図である。
FIG. 11 is a perspective view of an example in which a reduction projection exposure apparatus is mounted on a vibration isolation device.

【符号の説明】[Explanation of symbols]

1 除振台 2 除振装置 3 定盤 4 X−Yステージ 5 ウェーハー 6 コラム部材 7 レンズ支持台 8 レンズホルダー 9 レチクル 10 照明装置 11 半能動型除振要素 12 コントローラ 13 支持部材 14a,14b 電磁石 15a,15b 板バネ部材 16 可動部材 17 容器部材 18 粘性流体 19 弾性部材 20 コイル部材 21 ヨーク部材 22 バネ部材 23 連結部材 24 受け部材 25 押え部材 26 積層型圧電素子 27 粘弾性支持部材 28 粘弾性部材 29 磁性体部材 30 受動型バネ部材 31 板バネ支持部材 32 ヒンジ付板バネ部材 33 ステージ用コントローラ 1 Vibration Isolator 2 Vibration Isolator 3 Surface Plate 4 XY Stage 5 Wafer 6 Column Member 7 Lens Support 8 Lens Holder 9 Reticle 10 Illuminator 11 Semi-Active Vibration Isolator 12 Controller 13 Support Members 14a, 14b Electromagnet 15a , 15b leaf spring member 16 movable member 17 container member 18 viscous fluid 19 elastic member 20 coil member 21 yoke member 22 spring member 23 connecting member 24 receiving member 25 pressing member 26 laminated piezoelectric element 27 viscoelastic supporting member 28 viscoelastic member 29 Magnetic member 30 Passive spring member 31 Leaf spring support member 32 Leaf spring member with hinge 33 Controller for stage

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.5 識別記号 庁内整理番号 FI 技術表示箇所 H01L 21/027 (72)発明者 大竹 生司 茨城県土浦市神立町502番地 株式会社日 立製作所機械研究所内─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 5 Identification number Reference number within the agency FI Technical indication location H01L 21/027 (72) Inventor Ikushi Otake 502 Kintatemachi, Tsuchiura City, Ibaraki Prefecture Hiritsu Manufacturing Co. Inside the mechanical laboratory

Claims (19)

【特許請求の範囲】[Claims] 【請求項1】 水平方向のステップ入力及び床振動を受
ける構造体と除振台とからなる除振装置において、前記
構造体と前記除振台との間に半能動型ダンパ装置が設け
られ、前記半能動型ダンパ装置は、前記除振台の有する
除振手段とは異なる受動型ダンパ部材と、この受動型ダ
ンパ部材の減衰力を前記構造体に伝える能動型伝達装置
と、この能動型伝達装置を制御するコントローラとから
構成されていることを特徴とする半能動型除振装置。
1. A vibration isolation device comprising a structure that receives horizontal step input and floor vibration and a vibration isolation table, wherein a semi-active damper device is provided between the structure and the vibration isolation table. The semi-active damper device is a passive damper member different from the vibration isolation means of the vibration isolation table, an active transmission device that transmits the damping force of the passive damper member to the structure, and the active transmission member. A semi-active vibration isolator comprising a controller for controlling the device.
【請求項2】 水平方向のステップ入力及び床振動を受
ける構造体と除振台とからなる除振装置において、前記
構造体と前記除振台との間に半能動型ダンパ装置が設け
られ、前記半能動型ダンパ装置は、前記除振台の有する
除振手段とは異なる受動型ダンパ部材と、この受動型ダ
ンパ部材を前記構造体に対して接続又は分離自在にする
電磁石と、この電磁石を制御するコントローラとから構
成されていることを特徴とする半能動型除振装置。
2. A vibration isolator comprising a structure and a vibration isolation table which receives horizontal step input and floor vibration, wherein a semi-active damper device is provided between the structure and the vibration isolation table. The semi-active damper device includes a passive damper member different from the vibration isolator included in the vibration isolation table, an electromagnet for connecting or disconnecting the passive damper member to or from the structure, and the electromagnet. A semi-active vibration isolator comprising a controller for controlling.
【請求項3】 請求項1記載の半能動型除振装置におけ
る前記半能動型ダンパ装置は、容器部材内の粘性流体中
に配置された可動部材と、この可動部材と前記構造体と
の間に設けられた板バネ部材と、この板バネ部材に吸引
面を対向して設けた電磁石とからなり、前記板バネ部材
は前記電磁石の吸引方向には柔らかく、その直交方向に
は大きな剛性を有して前記可動部材あるいは前記構造体
のいずれか一方に支持されていることを特徴とする半能
動型ダンパ装置。
3. The semi-active damper device of the semi-active vibration isolator according to claim 1, wherein the semi-active damper device includes a movable member disposed in a viscous fluid in a container member, and the movable member and the structure. A leaf spring member and an electromagnet having an attraction surface facing the leaf spring member. The leaf spring member is soft in the attraction direction of the electromagnet and has a large rigidity in the orthogonal direction. Then, the semi-active damper device is supported by either one of the movable member and the structure.
【請求項4】 請求項1記載の半能動型除振装置におけ
る前記半能動型ダンパ装置は、容器部材内の粘性流体中
に配置された可動部材と、この可動部材と前記構造体と
の間に設けられた板バネ部材と、この板バネ部材に吸引
面を対向して設けた電磁石とからなり、前記板バネ部材
は前記電磁石の吸引方向には柔らかく、その直交方向に
は大きな剛性を有して前記可動部材あるいは前記構造体
のいずれか一方に支持され、前記電磁石と前記板バネ部
材とが常に弱い力で接触するように、前記板バネ部材と
接触する前記電磁石の先端に、弱いバネ力で加圧され且
つバネ力と直交する方向には拘束された押し付け部材を
有することを特徴とする半能動型ダンパ装置。
4. The semi-active damper device of the semi-active vibration isolator according to claim 1, wherein the semi-active damper device includes a movable member disposed in a viscous fluid in a container member, and the movable member and the structure. A leaf spring member and an electromagnet having an attraction surface facing the leaf spring member. The leaf spring member is soft in the attraction direction of the electromagnet and has a large rigidity in the orthogonal direction. Is supported by either the movable member or the structure, and a weak spring is attached to the tip of the electromagnet that comes into contact with the leaf spring member so that the electromagnet and the leaf spring member always come into contact with each other with a weak force. A semi-active damper device comprising a pressing member that is pressed by a force and is constrained in a direction orthogonal to a spring force.
【請求項5】 請求項1記載の半能動型除振装置におけ
る前記半能動型ダンパ装置は、容器部材内の粘性流体中
に配置された可動部材と、この可動部材と前記構造体と
の間に設けられた板バネ部材と、この板バネ部材に吸引
面を対向して設けた電磁石とからなり、前記電磁石に吸
引される板バネ部材は、前記可動部材あるいは前記構造
体のいずれか一方に支持され、吸引方向である面外方向
には柔らかく、面内方向には剛性を確保できるように、
ヒンジ部あるいは切欠き部が設けられていることを特徴
とする半能動型ダンパ装置。
5. The semi-active damper device in the semi-active vibration isolator according to claim 1, wherein the semi-active damper device includes a movable member disposed in a viscous fluid in a container member, and the movable member and the structure. A leaf spring member provided on the plate spring member and an electromagnet having an attracting surface facing the leaf spring member, and the leaf spring member attracted by the electromagnet is provided on either the movable member or the structure. It is supported, so that it is soft in the out-of-plane direction, which is the suction direction, and can secure rigidity in the in-plane direction.
A semi-active damper device having a hinge portion or a notch portion.
【請求項6】 請求項1記載の半能動型除振装置におけ
る前記半能動型ダンパ装置は、容器部材内の粘性流体中
に配置された可動部材と、この可動部材に設けられた電
磁石と、この電磁石に対向して前記構造体の受け部材と
の間に設けられた連結部材とから構成され、前記受け部
材には前記電磁石と連動して前記連結部材を拘束する加
力部材が設けられていることを特徴とする半能動型除振
装置。
6. The semi-active damper device of the semi-active vibration isolator according to claim 1, wherein the semi-active damper device is a movable member arranged in the viscous fluid in the container member, and an electromagnet provided on the movable member. A connecting member is provided between the electromagnet and a receiving member of the structure, and the receiving member is provided with a force applying member that interlocks with the electromagnet to restrain the connecting member. A semi-active vibration isolation device characterized in that
【請求項7】 請求項1記載の半能動型除振装置におけ
る前記半能動型ダンパ装置は、一端部を前記構造体ある
いは前記除振台で支持され、他端部が磁性体で囲まれた
粘弾性部材と、この粘弾性部材の前記磁性体に対向して
設けた電磁石とからなることを特徴とする半能動型ダン
パ装置。
7. The semi-active damper device of the semi-active vibration isolator according to claim 1, wherein one end of the semi-active damper device is supported by the structure or the vibration isolation table, and the other end is surrounded by a magnetic material. A semi-active damper device comprising a viscoelastic member and an electromagnet provided facing the magnetic body of the viscoelastic member.
【請求項8】 水平方向のステップ入力及び床振動を受
ける構造体と除振台とからなる除振装置において、前記
構造体と前記除振台との間に半能動型剛性機構装置が設
けられ、前記半能動型剛性機構装置は、前記除振台の有
する除振手段とは異なる受動型バネ部材と、この受動型
バネ部材のバネ力を前記構造体に伝える能動型伝達装置
と、この能動型伝達装置を制御するコントローラとから
構成されていることを特徴とする半能動型除振装置。
8. A vibration isolator comprising a structure and a vibration isolation table which receives horizontal step input and floor vibration, wherein a semi-active rigid mechanical device is provided between the structure and the vibration isolation table. The semi-active stiffness mechanism device is a passive spring member different from the vibration isolation means of the vibration isolation table, an active transmission device that transmits the spring force of the passive spring member to the structure, and the active spring device. A semi-active vibration isolator comprising a controller for controlling a mold transmission device.
【請求項9】 水平方向のステップ入力及び床振動を受
ける構造体と除振台とからなる除振装置において、前記
構造体と前記除振台との間に半能動型剛性機構装置が設
けられ、前記半能動型剛性機構装置は、前記除振台の有
する除振手段とは異なる受動型バネ部材と、この受動型
バネ部材のバネ力を前記構造体に対して接続又は分離自
在にする電磁石と、この電磁石を制御するコントローラ
とから構成されていることを特徴とする半能動型除振装
置。
9. A vibration isolation device comprising a structure and a vibration isolation table which receives horizontal step input and floor vibration, wherein a semi-active rigid mechanical device is provided between the structure and the vibration isolation table. The semi-active stiffness mechanism device is a passive spring member different from the vibration isolation means of the vibration isolation table, and an electromagnet for connecting or disconnecting the spring force of the passive spring member to the structure. And a controller for controlling the electromagnet, which is a semi-active vibration isolator.
【請求項10】 請求項8記載の半能動型除振装置にお
ける前記半能動型剛性機構装置は、前記除振台上に設け
られた電磁石と、この電磁石と前記構造体との間に設け
られ、前記受動型バネ部材を有する連結部材と、この連
結部材を支持し、かつ前記構造体に取り付けられた押え
部材と、この押さえ部材に前記連結部材を固定するため
に前記電磁石と連動して動作する加力部材とから構成さ
れていることを特徴とする半能動型剛性機構装置。
10. The semi-active vibration isolator according to claim 8, wherein the semi-active rigidity mechanism device is provided between an electromagnet provided on the vibration isolation table and between the electromagnet and the structure. A connecting member having the passive spring member, a holding member that supports the connecting member and is attached to the structure, and an interlocking operation with the electromagnet to fix the connecting member to the holding member. A semi-active type rigid mechanical device.
【請求項11】 請求項8記載の半能動型除振装置にお
ける前記半能動型剛性機構装置は、前記受動型バネ部材
が、弾性部材により両端を支持された面外方向には柔で
面内方向には剛性のある板バネ部材からなり、前記電磁
石が前記板バネ部材の中央を面外方向に吸引するもので
あることを特徴とする半能動型剛性機構装置。
11. The semi-active rigidity mechanism device of the semi-active vibration isolator according to claim 8, wherein the passive spring member is soft and in-plane in an out-of-plane direction in which both ends are supported by elastic members. A semi-active type rigid mechanical device, characterized in that the electromagnet attracts the center of the leaf spring member in an out-of-plane direction.
【請求項12】 請求項8記載の半能動型除振装置にお
ける前記半能動型剛性機構装置は、前記受動型バネ部材
が、弾性部材により両端を支持され、面外方向の剛性を
低下するヒンジ部あるいは切欠き部の設けられた面内方
向には剛性のある板バネ部材からなり、前記電磁石が前
記板バネ部材の中央を面外方向に吸引するものであるこ
とを特徴とする半能動型剛性機構装置。
12. The hinge of the semi-active vibration isolator according to claim 8, wherein the passive-type spring member has both ends supported by elastic members to reduce the rigidity in the out-of-plane direction. Semi-active type which is composed of a leaf spring member having rigidity in the in-plane direction in which the portion or notch is provided, and the electromagnet attracts the center of the leaf spring member in the out-of-plane direction. Rigid mechanical device.
【請求項13】 請求項1、2、8または9記載の半能
動型除振装置を備えた縮小投影露光装置。
13. A reduction projection exposure apparatus equipped with the semi-active vibration isolator according to claim 1, 2, 8 or 9.
【請求項14】 請求項3、4、5、6または7記載の
半能動型ダンパ装置を備えた縮小投影露光装置。
14. A reduction projection exposure apparatus comprising the semi-active damper device according to claim 3, 4, 5, 6 or 7.
【請求項15】 請求項10、11または12記載の半
能動型剛性機構装置を備えた縮小投影露光装置。
15. A reduction projection exposure apparatus provided with the semi-active rigid mechanical device according to claim 10, 11 or 12.
【請求項16】 水平方向のステップ入力及び床振動を
受ける構造体と除振台とからなり、前記構造体にX−Y
ステージを備えた縮小投影露光装置の除振方法におい
て、前記構造体と前記除振台との間に、前記除振台の有
する除振手段とは異なる受動型ダンパ部材と、この受動
型ダンパ部材の減衰力を前記構造体に伝える能動型伝達
装置と、この能動型伝達装置を制御するコントローラと
から構成された半能動型ダンパ装置を備え、前記X−Y
ステージの稼働時には前記能動型伝達装置を動作状態に
し、露光時直前のX−Yステージの高精度位置決め時か
ら露光時までは、前記能動型伝達装置を非動作状態にな
るように制御することを特徴とする縮小投影露光装置の
半能動型除振方法。
16. A structure including a structure subject to horizontal step input and floor vibration and an anti-vibration table, wherein the structure has an XY structure.
In a vibration isolation method for a reduction projection exposure apparatus including a stage, a passive damper member different from the vibration isolation means of the vibration isolation table is provided between the structure and the vibration isolation table, and the passive damper member. A semi-active damper device composed of an active transmission device that transmits the damping force of the active structure to the structure, and a controller that controls the active transmission device.
When the stage is in operation, the active transmission device is set in the operating state, and the active transmission device is controlled to be in the non-operation state from the time of high precision positioning of the XY stage immediately before the exposure to the exposure. A semi-active vibration isolation method for a reduced projection exposure apparatus.
【請求項17】 水平方向のステップ入力及び床振動を
受ける構造体と除振台とからなり、前記構造体にX−Y
ステージを備えた縮小投影露光装置の除振方法におい
て、前記構造体と前記除振台との間に、前記除振台の有
する除振手段とは異なる受動型ダンパ部材と、この受動
型ダンパ部材を前記構造体に対して接続又は分離自在に
する電磁石と、この電磁石を制御するコントローラとか
ら構成された半能動型ダンパ装置を備え、前記X−Yス
テージの稼働時には、前記電磁石へ制御電流を流し、露
光時直前のX−Yステージの高精度位置決め時から露光
時までは、前記制御電流を切ることによって前記電磁石
を制御することを特徴とする縮小投影露光装置の半能動
型除振方法。
17. A structure including a structure subjected to horizontal step input and floor vibration and a vibration isolation table, wherein the structure has an XY structure.
In a vibration isolation method for a reduction projection exposure apparatus including a stage, a passive damper member different from the vibration isolation means of the vibration isolation table is provided between the structure and the vibration isolation table, and the passive damper member. A semi-active damper device composed of an electromagnet that connects or disconnects with the structure and a controller that controls the electromagnet, and supplies a control current to the electromagnet when the XY stage is in operation. A semi-active vibration isolation method for a reduction projection exposure apparatus, characterized in that the electromagnet is controlled by cutting off the control current from the time of high precision positioning of the XY stage immediately before the flow and exposure to the time of exposure.
【請求項18】 水平方向のステップ入力及び床振動を
受ける構造体と除振台とからなり、前記構造体にX−Y
ステージを備えた縮小投影露光装置の除振方法におい
て、前記構造体と前記除振台との間に、前記除振台の有
する除振手段とは異なる受動型バネ部材と、この受動型
バネ部材のバネ力を前記構造体に伝える能動型伝達装置
と、この能動型伝達装置を制御するコントローラとから
構成された半能動型剛性機構装置を備え、前記X−Yス
テージの稼働時には前記能動型伝達装置を動作状態に
し、露光時直前のX−Yステージの高精度位置決め時か
ら露光時までは、前記能動型伝達装置を非動作状態にな
るように制御することを特徴とする縮小投影露光装置の
半能動型除振方法。
18. A structure comprising a structure subject to horizontal step input and floor vibration and an anti-vibration table, wherein the structure has an XY structure.
In a vibration isolation method of a reduction projection exposure apparatus including a stage, a passive type spring member different from the vibration isolation means of the vibration isolation table is provided between the structure and the vibration isolation table, and the passive spring member. Is provided with a semi-active rigidity mechanism device including an active transmission device that transmits the spring force of the device to the structure and a controller that controls the active transmission device, and the active transmission device is used when the XY stage is in operation. A reduction projection exposure apparatus characterized in that the apparatus is brought into an operating state, and the active transmission device is controlled to be in a non-operating state from the time of high precision positioning of the XY stage immediately before exposure to the time of exposure. Semi-active vibration isolation method.
【請求項19】 水平方向のステップ入力及び床振動を
受ける構造体と除振台とからなり、前記構造体にX−Y
ステージを備えた縮小投影露光装置の除振方法におい
て、前記構造体と前記除振台との間に、前記除振台の有
する除振手段とは異なる受動型バネ部材と、この受動型
バネ部材のバネ力を前記構造体に対して接続又は分離自
在にする電磁石と、この電磁石を制御するコントローラ
とから構成された半能動型剛性機構装置を備え、前記X
−Yステージの稼働時には、前記電磁石へ制御電流を流
し、露光時直前のX−Yステージの高精度位置決め時か
ら露光時までは、前記制御電流を切ることによって前記
電磁石を制御することを特徴とする縮小投影露光装置の
半能動型除振方法。
19. A structure including a structure subjected to horizontal step input and floor vibration and an anti-vibration table, wherein the structure has an XY structure.
In a vibration isolation method of a reduction projection exposure apparatus including a stage, a passive type spring member different from the vibration isolation means of the vibration isolation table is provided between the structure and the vibration isolation table, and the passive spring member. A semi-active type rigid mechanical device including an electromagnet for connecting or disconnecting the spring force of the electromagnet to or from the structure and a controller for controlling the electromagnet.
A control current is supplied to the electromagnet during operation of the Y stage, and the electromagnet is controlled by cutting off the control current from the time of high-precision positioning of the XY stage immediately before exposure to the time of exposure. Vibration isolation method for reduced projection exposure apparatus.
JP4196993A 1992-07-23 1992-07-23 Semi-active vibration proof device, semi-active damper device, semi-active stiffness mechanism device, reduced projection exposure device and its semi-active damping method Pending JPH0642578A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4196993A JPH0642578A (en) 1992-07-23 1992-07-23 Semi-active vibration proof device, semi-active damper device, semi-active stiffness mechanism device, reduced projection exposure device and its semi-active damping method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4196993A JPH0642578A (en) 1992-07-23 1992-07-23 Semi-active vibration proof device, semi-active damper device, semi-active stiffness mechanism device, reduced projection exposure device and its semi-active damping method

Publications (1)

Publication Number Publication Date
JPH0642578A true JPH0642578A (en) 1994-02-15

Family

ID=16367046

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4196993A Pending JPH0642578A (en) 1992-07-23 1992-07-23 Semi-active vibration proof device, semi-active damper device, semi-active stiffness mechanism device, reduced projection exposure device and its semi-active damping method

Country Status (1)

Country Link
JP (1) JPH0642578A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999026120A1 (en) * 1997-11-18 1999-05-27 Nikon Corporation Vibration eliminator, aligner and projection exposure method
JP2000249185A (en) * 1999-02-26 2000-09-12 Fujita Corp Active type vibration resistant device
US6633489B2 (en) * 2001-07-31 2003-10-14 Hewlett-Packard Development Company, L.P. Dynamic isolating mount for processor packages
CN103062302A (en) * 2012-12-19 2013-04-24 哈尔滨工业大学 Coplane air floatation orthogonal decoupling and air floatation ball bearing angle decoupling magnetic levitation vibration isolator
JP2014077458A (en) * 2012-10-09 2014-05-01 Unirock:Kk Vibration isolator
JP2018124464A (en) * 2017-02-02 2018-08-09 ウシオ電機株式会社 Exposure device

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999026120A1 (en) * 1997-11-18 1999-05-27 Nikon Corporation Vibration eliminator, aligner and projection exposure method
US6522388B1 (en) 1997-11-18 2003-02-18 Nikon Corporation Vibration eliminator, exposure apparatus and projection exposure method
JP2000249185A (en) * 1999-02-26 2000-09-12 Fujita Corp Active type vibration resistant device
US6633489B2 (en) * 2001-07-31 2003-10-14 Hewlett-Packard Development Company, L.P. Dynamic isolating mount for processor packages
US6920052B2 (en) 2001-07-31 2005-07-19 Hewlett-Packard Development Company, L.P. Dynamic isolating mount for processor packages
JP2014077458A (en) * 2012-10-09 2014-05-01 Unirock:Kk Vibration isolator
CN103062302A (en) * 2012-12-19 2013-04-24 哈尔滨工业大学 Coplane air floatation orthogonal decoupling and air floatation ball bearing angle decoupling magnetic levitation vibration isolator
JP2018124464A (en) * 2017-02-02 2018-08-09 ウシオ電機株式会社 Exposure device

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