JPH0640589Y2 - Vacuum deposition equipment - Google Patents

Vacuum deposition equipment

Info

Publication number
JPH0640589Y2
JPH0640589Y2 JP1987178634U JP17863487U JPH0640589Y2 JP H0640589 Y2 JPH0640589 Y2 JP H0640589Y2 JP 1987178634 U JP1987178634 U JP 1987178634U JP 17863487 U JP17863487 U JP 17863487U JP H0640589 Y2 JPH0640589 Y2 JP H0640589Y2
Authority
JP
Japan
Prior art keywords
chamber
partition wall
pressure
packing
vapor deposition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1987178634U
Other languages
Japanese (ja)
Other versions
JPH0182376U (en
Inventor
雅洋 山路
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Inc
Original Assignee
Toppan Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Inc filed Critical Toppan Inc
Priority to JP1987178634U priority Critical patent/JPH0640589Y2/en
Publication of JPH0182376U publication Critical patent/JPH0182376U/ja
Application granted granted Critical
Publication of JPH0640589Y2 publication Critical patent/JPH0640589Y2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Description

【考案の詳細な説明】[Detailed description of the device] 【産業上の利用分野】[Industrial applications]

本考案は真空蒸着装置に関し、より詳しくは、チャンバ
ー内を2室に分けた装置の必要部分を高真空状態に保つ
ことのできる真空蒸着装置に関する。
The present invention relates to a vacuum vapor deposition apparatus, and more particularly, to a vacuum vapor deposition apparatus capable of maintaining a high vacuum state in a necessary portion of the apparatus in which the chamber is divided into two chambers.

【従来の技術】[Prior art]

最近、金属等を減圧下で加熱、蒸発させて基材上に被着
させるための真空蒸着が広く行われている。 真空状態、厳密には減圧状態を得るにはチャンバーを外
気から遮断して、真空ポンプによりチャンバー内の空気
を排出して減圧状態を得るというのが一般的な方法であ
る。高い真空度が得られるか否かは真空ポンプの性能と
チャンバーを外気から遮断する技術の如何にかかってい
る。 チャンバー内と外気の遮断には通常ゴムなどの弾性部材
を板状又は丸棒状に加工したいわゆるパッキンをチャン
バーの要部に配置し、ネジ止めなどによって固定する
か、又はチャンバー内を減圧して行くことによってチャ
ンバー内外の気圧差を利用し、チャンバーとパッキンを
強い力で押しつけるなどの方法により気密性を保持して
いた。 ところで、真空蒸着作業においては、金属等を加熱、蒸
発させて基材上に被着させる工程は高い真空度が要求さ
れるが、帯状に長い基材を連続的に蒸着させて行く場合
は装置が大がかりになるため、装置全体を高真空に保つ
ことは技術的に困難であるし、コスト的にもメリットが
少ない。従って、チャンバーを2室に分け、帯状基材を
収納する室は低−中度の真空度とし、基材に金属等を蒸
着する室のみ高真空とする工夫がなされている。チャン
バーを2室に分ける隔壁はチャンバーの上下のほぼ中間
に着脱可能な状態に挿入されていて、チャンバーの壁面
への取付けは壁面側に板状の隔壁受けを設け、隔壁受け
の上に硬質ゴムなどの板状パッキンを配して気密性を確
保していた。
Recently, vacuum vapor deposition has been widely used for heating and evaporating a metal or the like under reduced pressure to deposit it on a substrate. In order to obtain a vacuum state, strictly speaking, a reduced pressure state, it is a general method to shut off the chamber from the outside air and to exhaust the air in the chamber with a vacuum pump to obtain a reduced pressure state. Whether or not a high degree of vacuum can be obtained depends on the performance of the vacuum pump and the technology for shutting off the chamber from the outside air. In order to shut off the air from the inside of the chamber, a so-called packing, which is usually made of rubber or other elastic material in the shape of a plate or a round bar, is placed in the main part of the chamber and fixed by screws, or the inside of the chamber is depressurized. Therefore, the airtightness is maintained by using the pressure difference between the inside and outside of the chamber and pressing the chamber and the packing with a strong force. By the way, in vacuum deposition work, a high degree of vacuum is required in the step of heating and evaporating a metal or the like to deposit it on a base material, but when continuously depositing a long strip-shaped base material, an apparatus is required. However, it is technically difficult to maintain a high vacuum in the entire apparatus, and there is little merit in cost. Therefore, the chamber is divided into two chambers, the chamber for accommodating the strip-shaped substrate is made to have a low to medium vacuum degree, and only the chamber for depositing a metal or the like on the substrate is made to have a high vacuum. The partition wall that divides the chamber into two chambers is detachably inserted in the middle of the upper and lower parts of the chamber, and the chamber is mounted on the wall surface by providing a plate-shaped partition wall receiver, and the hard rubber on the partition wall receiver. Airtightness was secured by arranging plate-shaped packing such as.

【考案が解決しようとする課題】[Problems to be solved by the device]

しかしながら上記した板状隔壁受けの上にパッキンを配
し、この上に隔壁を設置する方法では、パッキンと隔壁
の下側に間隔がなければ隔壁を挿入できない。この隔壁
下面とパッキン間の僅かな間隔からチャンバー内を減圧
して行った時、空気の漏洩が起こり、蒸着作業を行う上
で高い真空度が要求される下側の室の真空度を高めるこ
とができないという問題があった。間隙とパッキン間の
間隔をなくして無理矢理押し込む方法もあるが、パッキ
ンがすぐに損傷し、却って気密性を損なう問題点があっ
た。 尚、隔壁をチャンバー内に着脱可能に取り付けるのはチ
ャンバー内に設置する被蒸着基材、プロセスドラム、蒸
着設備などの調整を行う上で隔壁を固定していたのでは
不便であるためである。
However, in the method of disposing the packing on the plate-shaped partition wall receiver and installing the partition wall on this, the partition wall cannot be inserted unless there is a gap between the packing and the partition wall. When the inside of the chamber is decompressed from the slight distance between the lower surface of the partition wall and the packing, air leaks and a high degree of vacuum is required for the deposition work. There was a problem that I could not do it. There is also a method in which the gap and the gap between the packings are eliminated and the members are forced in, but there is a problem that the packings are immediately damaged and the airtightness is rather deteriorated. Incidentally, the reason why the partition wall is detachably attached to the chamber is that it is inconvenient to fix the partition wall when adjusting the material to be vapor-deposited, the process drum, the vapor deposition equipment, etc. installed in the chamber.

【課題を解決するための手段】[Means for Solving the Problems]

本考案は上記した従来技術の問題点を考慮してなされた
もので、 減圧下で使用されるチャンバー内が隔壁によって帯状基
材を搬出入する室と、前記帯状基材に金属等を加熱、蒸
発させて被着する蒸着室との2室に区画された真空蒸着
装置において、前記隔壁とチャンバー内壁に沿って形成
した隔壁取着部との間に、常圧下で装置駆動時のチャン
バー内圧力を越える圧力で気体が密封され、且つ常圧下
で遊挿可能な弾性体からなる中空状自己膨張パッキンを
挿設したことを特徴とする真空蒸着装置である。
The present invention has been made in consideration of the above-mentioned problems of the prior art. In the chamber used under reduced pressure, a chamber for loading and unloading a strip-shaped substrate by a partition wall, and heating a metal or the like on the strip-shaped substrate, In a vacuum vapor deposition apparatus which is divided into two chambers, a vapor deposition chamber for evaporation and deposition, a chamber internal pressure at the time of operating the device under normal pressure between the barrier rib and a partition attachment portion formed along the chamber inner wall. The vacuum vapor deposition apparatus is characterized in that a hollow self-expanding packing made of an elastic body is inserted, which is hermetically sealed with a gas at a pressure higher than the pressure and which can be loosely inserted under normal pressure.

【作用】[Action]

隔壁取着部と隔壁との間に挿設した、弾性体からなる中
空自己膨張パッキンは、周囲の気圧が低下すると膨張
し、上昇すると収縮するので、装着の駆動時などチャン
バー内の圧力が下がると膨張して隔壁と隔壁取着部との
隙間を塞ぎ、気密性が高まり、チャンバーの蓋を開ける
などしてチャンバー内が大気圧となったときには、減圧
時より収縮して隔壁と隔壁取着部との間に隙間が生じ、
隔壁を着脱する作業が容易となる。 つぎに図面に基づいて本考案を具体的に説明する。
The hollow self-expanding packing made of an elastic material, which is inserted between the partition wall attachment part and the partition wall, expands when the ambient air pressure decreases and contracts when it rises, so the pressure inside the chamber decreases when the device is mounted. When the inside of the chamber becomes atmospheric pressure due to the expansion of the partition wall to close the gap between the partition wall and the partition wall attachment part, and the airtightness is increased, and when the chamber lid is opened, the partition wall and the partition wall are attached and contracted. There is a gap between the part and
The work of attaching and detaching the partition becomes easy. Next, the present invention will be specifically described with reference to the drawings.

【実施例】【Example】

第1図において1は本考案で使用する自己膨張パッキン
の一例であって、弾性部材である合成ゴム2の中空部3
に空気を常圧下で1.1気圧に充填し、密封しているもの
である。 第2図は自己膨張パッキン1を適用した真空蒸着装置の
チャンバー4の概念図であって、チャンバー4は縦断面
が円筒状のもので、チャンバー4の内部にチャンバーを
A、Bの上下2室に分ける隔壁があり、上の室Aには帯
状の被蒸着基材6が巻き送りロール7、巻き取りロール
7′に巻かれて設置されている。下の室Bにはプロセス
ドラム8があって、巻き送りロール7から出た帯状基材
6を受けて巻き取りロール7′に送る途中、該ドラム8
の下部で真空蒸着を行うものである。 隔壁5は、第1図に示す自己膨張パッキン1を上面に張
り付けた板状の隔壁受け9の上に、例えばガイドローラ
(図示せず)などによって手前より挿入されて、チャン
バー内を2分して取り付けられる。隔壁5の下面と自己
膨張パッキン1の上面との間には、チャンバー4の図示
しない蓋が開けられるなどしてチャンバー内が1気圧に
なった時に、隔壁5の挿入/取り外しに支障のない、例
えば2mm程度の間隙がある。尚、隔壁5の下面と自己膨
張パッキン1の上面との離間距離は、隔壁5の着脱に用
いるガイドローラなどを上下動可能に設けることで、調
整可能である。 チャンバー4内のA、B室は各々真空ポンプ(図示せ
ず)に連結されていて空気が排出され、減圧状態にする
ことが可能な構造となっている。 最初はチャンバー4の内部が1気圧であるため、上記し
た様に隔壁5の下面と自己膨張パッキン1の間に間隔が
あるが、チャンバー4内の気圧が低下するにつれ、自己
膨張パッキン1は合成ゴム1の外側の気圧より内側の気
圧の方が高くなり、合成ゴム2が伸び、パッキン全体が
膨張して隔壁5との間隔を完全に塞ぐ。この結果、A、
B両室は、チャンバー内壁に沿って長い境界部シールさ
れ、互いに気密性が保たれることになる。 A室の容積が6m3、B室が4m3のチャンバーにおいて、
A室を223m3/min、B室を32,000l/secの排気能力を持つ
真空ポンプで排気したところ、僅か25分でA室は1×10
-2Torr、B室は5×10-4Torrの真空度に達した。これは
従来のパッキンを使用した場合に比べ10分の短縮であっ
た。 隔壁5の取着部としては、第2図に示す他にも第3図、
第4図に示すように、コ字型の隔壁受け9′上下に自己
膨張パッキン1を配置し、この間に隔壁5をガイドロー
ラなどによって着脱する構造とすることも可能である。
この場合、常圧下では第3図の様に隔壁5と自己膨張パ
ッキン1の間には上下とも間隙があるが、減圧下では第
4図の様に膨張したパッキン1で上下とも隔壁5との間
隔が塞がれる。
In FIG. 1, 1 is an example of a self-expanding packing used in the present invention, which is a hollow portion 3 of a synthetic rubber 2 which is an elastic member.
It is filled with air under atmospheric pressure to 1.1 atm and sealed. FIG. 2 is a conceptual diagram of a chamber 4 of a vacuum vapor deposition apparatus to which the self-expanding packing 1 is applied. The chamber 4 has a cylindrical longitudinal section, and the chamber 4 has two chambers, A and B, above and below. In the upper chamber A, a strip-shaped substrate 6 to be vapor-deposited is wound around a winding roll 7 and a winding roll 7 '. In the lower chamber B, there is a process drum 8, which receives the strip-shaped base material 6 emitted from the winding roll 7 and sends it to the winding roll 7 ',
The vacuum deposition is performed underneath. The partition wall 5 is inserted from above by a guide roller (not shown) on a plate-shaped partition wall receiver 9 having the self-expanding packing 1 shown in FIG. Can be installed. Between the lower surface of the partition wall 5 and the upper surface of the self-expanding packing 1, there is no hindrance to the insertion / removal of the partition wall 5 when the pressure inside the chamber becomes 1 atmosphere by opening a lid (not shown) of the chamber 4. For example, there is a gap of about 2 mm. The distance between the lower surface of the partition wall 5 and the upper surface of the self-expanding packing 1 can be adjusted by providing a guide roller or the like used for attaching and detaching the partition wall 5 so as to be vertically movable. Each of the chambers A and B in the chamber 4 is connected to a vacuum pump (not shown) so that air is discharged and a depressurized state can be obtained. Since the inside of the chamber 4 is initially at 1 atmosphere, there is a space between the lower surface of the partition wall 5 and the self-expanding packing 1 as described above, but as the air pressure inside the chamber 4 decreases, the self-expanding packing 1 is synthesized. The inner pressure becomes higher than the outer pressure of the rubber 1, the synthetic rubber 2 expands, the entire packing expands, and the gap with the partition wall 5 is completely closed. As a result, A,
Both chambers B are sealed along the inner wall of the chamber at a long boundary, so that airtightness is maintained between them. In the chamber where the volume of A chamber is 6m 3 and the volume of B chamber is 4m 3 ,
Evacuating room A with a vacuum pump of 223 m 3 / min and room B with a capacity of 32,000 l / sec, room A was 1 x 10 in only 25 minutes.
-2 Torr, chamber B reached a vacuum of 5 × 10 -4 Torr. This was 10 minutes shorter than when using the conventional packing. As the attachment portion of the partition wall 5, in addition to that shown in FIG.
As shown in FIG. 4, the self-expanding packing 1 may be arranged above and below the U-shaped partition wall receiver 9 ', and the partition wall 5 may be attached or detached by a guide roller or the like between them.
In this case, under normal pressure, there is a gap between the partition wall 5 and the self-expanding packing 1 as shown in FIG. 3, but under reduced pressure the expanded packing 1 as shown in FIG. The space is closed.

【考案の効果】[Effect of device]

以上説明したように本考案の真空蒸着装置は、隔壁とチ
ャンバー内壁に沿って形成した隔壁取着部との間に、常
圧下で装置駆動時のチャンバー内圧力を越える圧力で気
体が密封され、且つ常圧下で遊挿可能な弾性体からなる
中空自己膨張パッキンを挿設したので、1気圧の常圧下
で行う隔壁の着脱は隔壁とパッキンの間に十分な間隔が
あるため極めて容易であり、装置駆動時においては雰囲
気の減圧につれパッキンが膨張して当初開いていた隔壁
とパッキン間の間隔を完全に塞ぐために高い気密性が確
保される。 従って、本考案によれば隔壁の着脱を容易にするため
に、隔壁とパッキン間の間隔を設けてチャンバー内の
A、B両室の気密性を損なうとか、気密性を高めるため
に隔壁とパッキンの間隔を少なくしたために、隔壁着脱
時にパッキンを損傷して却って気密性を損なうといった
従来技術の問題を全て解消することができた。
As described above, in the vacuum deposition apparatus of the present invention, the gas is sealed between the partition wall and the partition wall attachment portion formed along the inner wall of the chamber at a pressure exceeding the chamber pressure when the apparatus is driven under normal pressure. And since a hollow self-expanding packing made of an elastic body that can be loosely inserted under normal pressure is inserted, it is extremely easy to attach and detach the partition wall under normal pressure of 1 atm because there is a sufficient space between the partition wall and the packing. When the apparatus is driven, the packing expands as the atmosphere is decompressed, and the gap between the partition and the packing that was originally opened is completely closed, so that high airtightness is ensured. Therefore, according to the present invention, in order to facilitate the attachment / detachment of the partition wall, a space is provided between the partition wall and the packing to impair the airtightness of both chambers A and B in the chamber, or to increase the airtightness of the partition wall and the packing. Since the space between the two is reduced, it is possible to solve all the problems of the prior art in which the packing is damaged when the partition is attached or detached and the airtightness is impaired.

【図面の簡単な説明】[Brief description of drawings]

第1図は本考案で使用する自己膨張パッキンの一部を断
面で示した斜視図、第2図は本考案の真空蒸着装置のチ
ャンバーの一例を示す縦断面図、第3図、第4図は隔壁
取り付け部の他の例を示すものである。 1……自己膨張パッキン 2……ゴム 3……中空部 4……チャンバー 5……隔壁 6……帯状基材 7……巻き送りロール 7′……巻き取りロール 8……プロセスドラム 9,9′……隔壁受け
FIG. 1 is a perspective view showing a cross section of a part of the self-expanding packing used in the present invention, and FIG. 2 is a vertical cross-sectional view showing an example of a chamber of a vacuum vapor deposition apparatus of the present invention, FIGS. Shows another example of the partition mounting portion. 1 ... Self-expanding packing 2 ... Rubber 3 ... Hollow part 4 ... Chamber 5 ... Partition 6 ... Strip-shaped substrate 7 ... Rewind roll 7 '... Winding roll 8 ... Process drum 9,9 ′ …… Partition wall receiver

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 【請求項1】減圧下で使用されるチャンバー内が隔壁に
よって帯状基材を搬出入する室と、前記帯状基材に金属
等を加熱、蒸発させて被着する蒸着室との2室に区画さ
れた真空蒸着装置において、前記隔壁とチャンバー内壁
に沿って形成した隔壁取着部との間に、常圧下で装置駆
動時のチャンバー内圧力を越える圧力で気体が密封さ
れ、且つ常圧下で遊挿可能な弾性体からなる中空状自己
膨張パッキンを挿設したことを特徴とする真空蒸着装
置。
1. A chamber used under reduced pressure is divided into two chambers, a chamber for loading and unloading a strip-shaped substrate by a partition wall and a vapor deposition chamber for heating and evaporating and depositing metal or the like on the strip-shaped substrate. In the vacuum vapor deposition apparatus described above, the gas is sealed between the partition wall and the partition wall attachment portion formed along the inner wall of the chamber at a pressure higher than the pressure in the chamber when the apparatus is driven under normal pressure, and the gas does not move under normal pressure. A vacuum vapor deposition apparatus having a hollow self-expanding packing made of an insertable elastic body.
JP1987178634U 1987-11-24 1987-11-24 Vacuum deposition equipment Expired - Lifetime JPH0640589Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1987178634U JPH0640589Y2 (en) 1987-11-24 1987-11-24 Vacuum deposition equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1987178634U JPH0640589Y2 (en) 1987-11-24 1987-11-24 Vacuum deposition equipment

Publications (2)

Publication Number Publication Date
JPH0182376U JPH0182376U (en) 1989-06-01
JPH0640589Y2 true JPH0640589Y2 (en) 1994-10-26

Family

ID=31470243

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1987178634U Expired - Lifetime JPH0640589Y2 (en) 1987-11-24 1987-11-24 Vacuum deposition equipment

Country Status (1)

Country Link
JP (1) JPH0640589Y2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0798992B2 (en) * 1990-06-11 1995-10-25 株式会社シンクロン Method of fixing and releasing substrate in vacuum chamber
JP2000133693A (en) * 1998-08-19 2000-05-12 Shibaura Mechatronics Corp Vacuum device and mechanism for driving the same
JP2010018828A (en) * 2008-07-09 2010-01-28 Asahi Kasei E-Materials Corp Vacuum deposition apparatus

Also Published As

Publication number Publication date
JPH0182376U (en) 1989-06-01

Similar Documents

Publication Publication Date Title
KR100302157B1 (en) Combination cryopump / getter pump and its regeneration method
US5161955A (en) High vacuum pump using bulk getter material
JPH0640589Y2 (en) Vacuum deposition equipment
JP2000133693A (en) Vacuum device and mechanism for driving the same
US4294678A (en) Apparatus and method for preventing contamination of sputtering targets
JP4767574B2 (en) Processing chamber and processing apparatus
US5114316A (en) Method of regenerating a vacuum pumping device
KR960005772A (en) Vacuum chamber for ultra-high vacuum at high temperatures
GB2264955A (en) High-vacuum coating apparatus having a partition wall
CN108474112B (en) Film forming apparatus
US6012600A (en) Pressure responsive clamp for a processing chamber
JP2914318B2 (en) How to replace the clean room filter
JP3236279U (en) Vacuum storage for sputtering target
US3953662A (en) Sealed container housing a mechanical filter
JP4521607B2 (en) External cathode electrode type sputtering system
KR20130031669A (en) Specimen conveyance apparatus
JPH04281833A (en) Method and device for reducing occurrence of fine particles caused by deflection of door or cover of high vacuum device
JPH0151543B2 (en)
WO1994018695A1 (en) Apparatus for heat treatment
JPH04169777A (en) Heat insulated box
US3940629A (en) Device for closing and opening vacuum x-ray film holders
JPH0355829Y2 (en)
JPH0711848A (en) Door sealing structure of closed room
JPH08140468A (en) Seed storing apparatus and seed-housing vacuum bag used therefor
JPH07240382A (en) Vacuum exhaust system directly coupled type vacuum treatment equipment