JPH06346273A - Sludge inhibitor for tinning sulfuric acid bath and tinning method - Google Patents

Sludge inhibitor for tinning sulfuric acid bath and tinning method

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Publication number
JPH06346273A
JPH06346273A JP14161793A JP14161793A JPH06346273A JP H06346273 A JPH06346273 A JP H06346273A JP 14161793 A JP14161793 A JP 14161793A JP 14161793 A JP14161793 A JP 14161793A JP H06346273 A JPH06346273 A JP H06346273A
Authority
JP
Japan
Prior art keywords
tin
sulfuric acid
bath
sludge
plating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14161793A
Other languages
Japanese (ja)
Other versions
JP3466229B2 (en
Inventor
Hiromitsu Date
博充 伊達
Yashichi Oyagi
八七 大八木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Steel Corp
Original Assignee
Nippon Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Steel Corp filed Critical Nippon Steel Corp
Priority to JP14161793A priority Critical patent/JP3466229B2/en
Publication of JPH06346273A publication Critical patent/JPH06346273A/en
Application granted granted Critical
Publication of JP3466229B2 publication Critical patent/JP3466229B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

PURPOSE:To obtain a sludge inhibitor for a tinning sulfuric acid bath obtain and to provide a thinning method used for producing tin plate and a thin tinned steel sheet used for a can, a can cover, etc. CONSTITUTION:The objective sludge inhibitor for a tinning sulfuric acid bath is an arom. compd. soluble in a soln. and having two or more electron donative substituents including at least one hydroxy group. This sludge inhibitor is added to a sulfuric acid bath having 5-50g/l concn. of sulfuric acid and a steel sheet is electrolytically tinned with the sulfuric acid bath at 30-70 deg.C bath temp.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、缶、缶蓋、その他の用
途に使用される電気めっきブリキおよび薄錫めっき鋼板
の製造に用いる錫めっき硫酸浴のスラッジ抑制剤および
錫めっき方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a sludge inhibitor for a tin-plating sulfuric acid bath and a tin-plating method for use in the production of electroplated tinplate and thin tin-plated steel sheets used for cans, can lids and other applications. is there.

【0002】[0002]

【従来の技術】ブリキ等の錫めっき鋼板の製造に用いら
れる錫めっき浴としては、ハロゲン浴、フェロスタン浴
(フェノールスルホン酸浴)、アルカリ浴等が従来から
よく知られている。アルカリ浴は四価の錫である錫酸ナ
トリウムを錫源としているため、二価の錫を使用する他
の浴を用いた場合と同一付着量を得るためには、約2倍
の電気量が必要で、経済的理由から国内外を問わず、現
在これを使用している電気めっきラインはほとんどな
い。ハロゲン浴は高電流密度でのめっきが可能であると
いう利点がある一方、その腐食性のため、装置類のメン
テナンスが他の浴に比べて面倒であり、また不溶性陽極
を使用できないという欠点があり、広く使用されるに至
っていない。現在、世界中のほとんどのブリキライン
で、主にフェノールスルホン酸を酸成分とするフェロス
タン浴が採用されている。
2. Description of the Related Art As tin plating baths used for the production of tin-plated steel sheets such as tin plates, halogen baths, ferrostane baths (phenol sulfonic acid baths), alkali baths and the like have been well known. The alkaline bath uses tetravalent tin, sodium stannate, as the tin source. Therefore, in order to obtain the same amount of deposition as when using other baths using divalent tin, about twice the amount of electricity is required. It is necessary, and for economic reasons, there are few electroplating lines currently using it both in Japan and abroad. Halogen baths have the advantage that they can be plated at high current densities, but due to their corrosive nature they have the disadvantage that maintenance of equipment is more cumbersome than other baths and that insoluble anodes cannot be used. , Has not been widely used. At present, most of the tinplate lines in the world use a ferrostane bath mainly containing phenolsulfonic acid as an acid component.

【0003】[0003]

【発明が解決しようとする課題】フェロスタン浴から得
られたブリキは光沢等の外観、耐食性、加工性に優れて
おり、ここ数十年間、TFS−CT(ティンフリースチ
ール・クロムタイプ)やニッケルめっき鋼板等、他の容
器用表面処理鋼板が発明、実用化されたにも関わらず、
その需要は衰えることなく今日に至っている。しかし、
フェロスタン浴はブリキを製造上、理想的な錫めっき浴
というわけではなかった。それは、以下に述べる2つの
理由による。
Tinplate obtained from a ferrostan bath has excellent appearance such as gloss, corrosion resistance, and workability. For the last several decades, TFS-CT (tin-free steel chrome type) and nickel plating have been used. Despite the invention and practical application of surface-treated steel sheets for other containers such as steel sheets,
The demand continues to this day. But,
The ferrostane bath was not an ideal tin plating bath for tin production. This is due to the following two reasons.

【0004】第一は、その有害性である。めっき廃液は
多量のフェノールスルホン酸を含んでいるため廃棄前に
これを分解する処理工程が不可欠である。また、フェロ
スタン浴でのめっきは通常40〜45℃程度で行われる
が、この温度ではフェノールスルホン酸が若干揮発し、
局所排気をしているとはいえ、少量は作業者が吸い込ん
でしまう。
The first is its harmfulness. Since the plating waste liquid contains a large amount of phenolsulfonic acid, a treatment process for decomposing it before disposal is indispensable. Further, plating in a ferrostane bath is usually performed at about 40 to 45 ° C., but at this temperature, phenolsulfonic acid is slightly volatilized,
Even though local exhaust is performed, a small amount is inhaled by the worker.

【0005】第二は、コストが高いことである。ブリキ
製造のためにフェノールスルホン酸は工業的に大量生産
され、低価格となってはいるが、それでも硫酸のような
無機酸と比較すると非常に高価である。また、先に述べ
たように、廃液の処理が容易でなく、コストアップの一
因となっている。
Second, the cost is high. Phenolsulfonic acid is industrially mass-produced for manufacturing tinplate, and although the price is low, it is still very expensive as compared with inorganic acids such as sulfuric acid. Further, as described above, it is not easy to dispose of the waste liquid, which is one of the causes of cost increase.

【0006】以上の二点を克服するめっき浴としては硫
酸浴が考えられる。硫酸浴は従来バッチでの小ロットの
めっきには使用されてきた。その硫酸濃度は100g/
l以上である。このめっき浴をブリキ製造にそのまま用
いることは困難である。それは、硫酸が高濃度になる
と、めっきの析出効率が悪くなる、装置類の劣化が激し
くなる、等の問題があるためである。そこで硫酸濃度を
低くすることが容易に考えられるが、SnO2 を主成分
とするスラッジの生成が非常に多いという問題が生じ
る。
A sulfuric acid bath is considered as a plating bath that overcomes the above two points. Sulfuric acid baths have traditionally been used for small batch plating in batches. The sulfuric acid concentration is 100 g /
It is 1 or more. It is difficult to use this plating bath as it is for tin production. This is because when the concentration of sulfuric acid is high, there are problems such as poor plating deposition efficiency and severe deterioration of equipment. Therefore, it is easily conceivable to reduce the concentration of sulfuric acid, but there arises a problem that the amount of sludge containing SnO 2 as a main component is extremely large.

【0007】二価の錫イオンを含む錫めっき浴からは、
アノード酸化および酸素・空気による酸化により錫(I
I) が錫(IV)に酸化され、SnO2 を主成分とするス
ラッジが生成しやすい。SnO2 は実際上電析する錫と
しては働かず、通常これを回収・再生する。また、四価
の錫を電析に使用すると、二価の錫に比べて2倍の電気
量を必要とするため、見かけの電流効率が下がり、経済
的に不利になる。従来のフェロスタン浴では投入した錫
の5〜8%ほどがスラッジとして取り除かれている。フ
ェロスタン浴と同程度の酸濃度の硫酸浴では錫(II) は
更に不安定で、より多くのスラッジが生成するため、そ
のままではブリキ製造には不適であり、スラッジを抑制
する手段を講じる必要がある。そこで、本発明は、スラ
ッジの生成を抑制できる方法および低公害で低コストの
錫めっき方法の提供を目的とする。
From the tin plating bath containing divalent tin ions,
The tin (I
I) is oxidized to tin (IV), and sludge containing SnO 2 as a main component is easily generated. SnO 2 does not actually function as tin to be electrodeposited, but it is usually recovered and regenerated. Further, when tetravalent tin is used for electrodeposition, it requires twice as much electricity as divalent tin, resulting in a decrease in apparent current efficiency, which is economically disadvantageous. In the conventional ferrostan bath, about 5-8% of the added tin is removed as sludge. Tin (II) is more unstable in a sulfuric acid bath with an acid concentration similar to that of a ferrostane bath, and more sludge is produced, so it is not suitable for tin production as it is, and it is necessary to take measures to suppress sludge. is there. Therefore, an object of the present invention is to provide a method capable of suppressing the generation of sludge and a low-pollution, low-cost tin plating method.

【0008】[0008]

【課題を解決するための手段】本発明者らは、低公害、
低価格という点から酸成分として硫酸に着目し、良好な
めっき可能な電流の高電流密度化およびスラッジ生成の
低減法について種々検討した結果、本発明に至ったもの
である。本発明は、二つ以上の電子供与性置換基を有
し、そのうちの少なくとも一つがヒドロキシ基である溶
液溶解性の芳香族化合物である、錫めっき硫酸浴用スラ
ッジ抑制剤、および該スラッジ抑制剤を添加した硫酸濃
度5g/l以上50g/l以下の硫酸浴を用いて浴温3
0〜70℃で鋼板に電気錫めっきを施す方法、好ましく
は、該スラッジ抑制剤がヒドロキシ基のo−位またはp
−位に酸素がベンゼン環の炭素と結合する置換基を有す
る芳香族化合物であれば濃度範囲0.01〜2g/lで
使用し、酸素がベンゼン環の炭素と結合する置換基がヒ
ドロキシ基のm−位にある芳香族化合物およびベンゼン
環の炭素と結合する原子が窒素である芳香族化合物であ
れば濃度範囲0.1〜2g/lで使用する錫めっき方法
である。
The present inventors have found that low pollution,
The present invention has been achieved as a result of various studies focusing on sulfuric acid as an acid component from the viewpoint of low cost, and various methods for increasing the current density of a favorable platable current and reducing sludge formation. The present invention provides a sludge inhibitor for a tin-plating sulfuric acid bath, which is a solution-soluble aromatic compound having two or more electron-donating substituents, at least one of which is a hydroxy group, and the sludge inhibitor. Bath temperature 3 using the sulfuric acid bath with added sulfuric acid concentration of 5 g / l or more and 50 g / l or less
A method of electroplating a steel sheet at 0 to 70 ° C., preferably, the sludge inhibitor is the o-position or p of the hydroxy group.
An aromatic compound having a substituent in which oxygen is bonded to the carbon of the benzene ring at the -position is used in a concentration range of 0.01 to 2 g / l, and the substituent in which oxygen is bonded to the carbon of the benzene ring is a hydroxy group. This is a tin plating method in which the aromatic compound in the m-position and the aromatic compound in which the carbon atom of the benzene ring is nitrogen are used in a concentration range of 0.1 to 2 g / l.

【0009】[0009]

【作用】以下に本発明について詳細に説明する。スラッ
ジ生成量は浴中の硫酸濃度が高いほど少なくなる。硫酸
濃度を100g/l程度まで上げるとフェロスタン浴と
同程度のスラッジ生成量となるが、硫酸を高濃度とする
ことによる弊害が生じる。すなわち電解時に錫析出とと
もに水素発生が多くなるとともに電析した錫が溶解する
ようになり見かけのめっきの析出効率が低下する。ま
た、周囲の装置等の腐食が増加する。そこで、スラッジ
生成の抑制には硫酸の高濃度化でなく、他の薬品の作用
を利用する方が好ましい。このような作用を有する薬品
を種々検討したところ、ベンゼンの二以上の水素が置換
基に置き換わったもので、少なくとも置換基の位置がヒ
ドロキシ基(水酸基)であるものが上記作用を有するこ
とがわかった。
The present invention will be described in detail below. The amount of sludge produced decreases as the concentration of sulfuric acid in the bath increases. When the concentration of sulfuric acid is increased to about 100 g / l, the amount of sludge generated is about the same as that of the ferrostan bath, but the high concentration of sulfuric acid causes a harmful effect. That is, as the amount of hydrogen generated increases with the precipitation of tin during electrolysis, the deposited tin is dissolved and the apparent deposition efficiency of the plating decreases. In addition, the corrosion of the surrounding devices increases. Therefore, it is preferable to utilize the action of other chemicals instead of increasing the concentration of sulfuric acid to suppress the generation of sludge. When various chemical agents having such an action were examined, it was found that two or more hydrogen atoms of benzene were replaced by a substituent, and at least the position of the substituent was a hydroxy group (hydroxyl group) had the above action. It was

【0010】第二の置換基として効果ある置換基として
はヒドロキシ基、アミノ基、メトキシ基のような電子供
与性のE効果を有する置換基が有効であった。具体的に
は、モノヒドロキシフェニル化合物(o−ヒドロキシア
ニソール、m−ヒドロキシアニソール、p−ヒドロキシ
アニソール、o−アミノフェノール、m−アミノフェノ
ール、p−アミノフェノール等)、ジヒドロキシフェニ
ル化合物(カテコール、レゾルシノール、ヒドロキノ
ン、2,3−ヒドロキシ安息香酸、3,4−ジヒドロキ
シベンズアルデヒド、3,5−ジヒドロキシトルエン
等)、トリヒドロキシフェニル化合物(ピロガロール、
フロログルシン、没食子酸、没食子酸n−プロピル、
3,4,5−トリヒドロキシ安息香酸等)である。
As the substituent effective as the second substituent, a substituent having an electron-donating E effect such as a hydroxy group, an amino group and a methoxy group was effective. Specifically, monohydroxyphenyl compounds (o-hydroxyanisole, m-hydroxyanisole, p-hydroxyanisole, o-aminophenol, m-aminophenol, p-aminophenol, etc.), dihydroxyphenyl compounds (catechol, resorcinol, Hydroquinone, 2,3-hydroxybenzoic acid, 3,4-dihydroxybenzaldehyde, 3,5-dihydroxytoluene, etc., trihydroxyphenyl compound (pyrogallol,
Phloroglucin, gallic acid, n-propyl gallate,
3,4,5-trihydroxybenzoic acid).

【0011】さらに複数の置換基の位置は、互いにオル
ト位(o−)またはパラ位(p−)のものが低濃度でも
効果が大きいことが判明した。すなわち、m−ヒドロキ
シアニソールよりo−およびp−ヒドロキシアニソール
の方が、フロログルシンよりピロガロール、没食子酸等
の方が、また、m−アミノフェノールよりo−アミノフ
ェノール、p−アミノフェノールの方がスラッジ生成を
抑制する効果が大きい。置換基の種類としてはアミノ基
よりはメトキシ基、ヒドロキシ基の方がスラッジ抑制効
果は大きい。その他、2−メルカプトフェノール等のチ
ォフェノール類もスラッジ抑制効果があるが、悪臭のた
め、実用的ではない。
Further, it has been found that the positions of a plurality of substituents are ortho (o-) or para (p-) with respect to each other, and the effect is great even at low concentrations. That is, o- and p-hydroxyanisole were produced from m-hydroxyanisole, pyrogallol and gallic acid were produced from phloroglucin, and o-aminophenol and p-aminophenol were produced sludge from m-aminophenol. The effect of suppressing As the kind of the substituent, a methoxy group or a hydroxy group has a larger sludge suppressing effect than an amino group. Other than that, thiphenols such as 2-mercaptophenol also have a sludge suppressing effect, but they are not practical because of their bad odor.

【0012】必要とするスラッジ抑制剤の濃度は、上記
の理由によりその種類によって異なる。o−ヒドロキシ
アニソール、p−ヒドロキシアニソール、カテコール、
ヒドロキノン、ピロガロール、没食子酸、没食子酸n−
プロピル、2,3−ジヒドロキシ安息香酸、3,4,5
−トリヒドロキシ安息香酸、3,4−ジヒドロキシベン
ズアルデヒド等、ヒドロキシ基のo−位またはp−位に
酸素がベンゼン環の炭素と結合する置換基を有するスラ
ッジ抑制剤はスラッジ抑制効果が大きいため、0.01
g/lでスラッジ生成を抑制することができる。
The concentration of the sludge inhibitor required depends on its type for the above reasons. o-hydroxyanisole, p-hydroxyanisole, catechol,
Hydroquinone, pyrogallol, gallic acid, gallic acid n-
Propyl, 2,3-dihydroxybenzoic acid, 3,4,5
-Trihydroxybenzoic acid, 3,4-dihydroxybenzaldehyde and the like, a sludge inhibitor having a substituent in which oxygen bonds to carbon of a benzene ring at the o-position or p-position of a hydroxy group has a large sludge-inhibiting effect. .01
Sludge formation can be suppressed at g / l.

【0013】m−ヒドロキシアニソール、レゾルシノー
ル、フロログルシン、3,5−ジヒドロキシトルエン
等、酸素がベンゼン環の炭素と結合する置換基がヒドロ
キシ基のm−位にあるものおよびo−アミノフェノー
ル、m−アミノフェノール、p−アミノフェノール等、
ベンゼン環の炭素と結合する原子が窒素であるものは
0.1g/l以上の添加量が望ましい。これらスラッジ
抑制剤の濃度の上限は2g/lとする。これ以上の添加
は効果が飽和してしまうので、経済的な理由およびフェ
ノール類の使用を低減して低公害化を狙った本発明の主
旨に反するため避けるべきである。
M-Hydroxyanisole, resorcinol, phloroglucin, 3,5-dihydroxytoluene, etc., in which the substituent in which oxygen is bonded to the carbon of the benzene ring is at the m-position of the hydroxy group and o-aminophenol, m-amino Phenol, p-aminophenol, etc.
When the atom bonded to the carbon of the benzene ring is nitrogen, the addition amount of 0.1 g / l or more is desirable. The upper limit of the concentration of these sludge inhibitors is 2 g / l. The addition of more than this will saturate the effect, so it should be avoided because it is against the economic reason and the purpose of the present invention aimed at reducing pollution by reducing the use of phenols.

【0014】次に本発明のめっき方法について説明す
る。本発明のスラッジ抑制剤を添加した硫酸浴で錫めっ
きを施す鋼板は特に限定せず、用途により適切な鋼板を
用いればよい。前処理として電解アルカリ脱脂、硫酸酸
洗により表面の清浄、活性化を施す。また、用途によっ
てはニッケルめっきNi−Fe合金めっき等の下地めっ
きを施した鋼板を用いることも可能である。
Next, the plating method of the present invention will be described. The steel sheet to be tin-plated in a sulfuric acid bath containing the sludge inhibitor of the present invention is not particularly limited, and a suitable steel sheet may be used depending on the application. As a pretreatment, the surface is cleaned and activated by electrolytic alkaline degreasing and sulfuric acid pickling. Further, depending on the application, it is also possible to use a steel plate plated with a base such as nickel-plated Ni-Fe alloy plating.

【0015】錫めっきの浴温は30〜70℃で行う。3
0℃未満の浴温を得るには冷却のためのコストがかか
り、経済的でないばかりでなく、外観、耐食性の優れた
めっきが得られない。70℃を超える浴温での操業は、
装置類の腐食や鋼板の鉄溶出促進による浴の劣化が促進
されることおよび蒸気の発生が多くなり、作業環境が悪
くなることから避けるべきである。
The bath temperature for tin plating is 30 to 70 ° C. Three
In order to obtain a bath temperature of less than 0 ° C., the cost for cooling is high, which is not economical, and plating having excellent appearance and corrosion resistance cannot be obtained. Operation at bath temperatures above 70 ° C
It should be avoided because it accelerates the deterioration of the bath due to the corrosion of equipment and the accelerated elution of iron from the steel sheet, and the generation of steam increases, which worsens the working environment.

【0016】本発明のめっき浴を用いた電析の陰極電流
効率は良好であり、まためっき外観も良好であり、スラ
ッジ抑制剤のめっきへの悪影響は認められない。アノー
ドは溶性、不溶性のどちらでも使用できる。不溶性アノ
ードとしてはチタンを母材とし、白金めっきを施した従
来のものでよい。用途によっては錫めっき後の鋼板にリ
フロー処理を施す。従来のフェロスタン浴などではめっ
き液の希釈液がそのままフラックスになり得たので、通
常ドラッグアウト槽をストリップが通過するだけでフラ
ックス塗布の目的を達成している。しかし、本発明のめ
っき浴は希釈してもフラックスとして作用しないので、
極めて平滑で光沢の優れたブリキを必要とする場合は、
めっき、水洗後にフラックスを塗布する工程を入れるこ
とが望ましい。しかし、フラックスを塗布しないでリフ
ローしても、実用上十分な光沢を有するブリキを得るこ
とができる。
The cathode current efficiency of electrodeposition using the plating bath of the present invention is good, the appearance of the plating is also good, and no adverse effect of the sludge inhibitor on the plating is observed. The anode may be either soluble or insoluble. The insoluble anode may be a conventional one in which titanium is a base material and platinum is plated. Depending on the application, reflow treatment is applied to the steel plate after tin plating. In the conventional ferrostan bath and the like, the diluted solution of the plating solution can be directly used as the flux. Therefore, the purpose of flux application is usually achieved only by passing the strip through the dragout bath. However, since the plating bath of the present invention does not act as a flux even when diluted,
If you need a very smooth and glossy tinplate,
It is desirable to include a step of applying flux after plating and washing with water. However, even if the reflow is performed without applying the flux, a tin plate having practically sufficient gloss can be obtained.

【0017】本発明においてめっき浴の酸成分としては
硫酸を用いている。硫酸は、若干のミストが出るもの
の、本質的に不揮発性で作業環境や大気の汚染が少ない
上、廃液処理上の問題が、従来の有機スルホン酸を用い
る浴と比較して少なく、低価格である点も工業的に有利
である。硫酸濃度は5〜50g/lとする。5g/l未
満ではめっき光沢が優れないし、浴のpHが高く、電解
時に陰極近傍でさらにpHが高くなって錫が水酸化物ま
たは酸化物の形で沈殿してしまう。50g/l以上では
めっき性が飽和してしまうことに加え、電解時の水素発
生が多くなるとともに一旦析出した錫が若干溶解してし
まうために見かけの析出効率が下がり、経済的に好まし
くない。また、浴中への鉄の溶出量も多くなり、浴の長
期にわたる安定した使用ができなくなる。さらには腐食
性が高くなり、装置類への悪影響がある。
In the present invention, sulfuric acid is used as the acid component of the plating bath. Sulfuric acid produces a little mist, but is inherently non-volatile, has little pollution in the working environment and air, and has less problems in waste liquid treatment compared to conventional baths using organic sulfonic acid, and at a low price. Certain points are also industrially advantageous. The sulfuric acid concentration is 5 to 50 g / l. If it is less than 5 g / l, the plating gloss is not excellent, the pH of the bath is high, and the pH is further increased near the cathode during electrolysis, and tin precipitates in the form of hydroxide or oxide. When the amount is 50 g / l or more, the plating property is saturated, and the amount of hydrogen generated during electrolysis increases, and the tin that has been once deposited is slightly dissolved, so that the apparent deposition efficiency decreases, which is not economically preferable. In addition, the amount of iron eluted into the bath increases, making it impossible to use the bath stably for a long period of time. Furthermore, it becomes highly corrosive, which adversely affects the equipment.

【0018】建浴時の錫としては二価の錫塩を加える。
特に硫酸錫(II)として加えることが望ましい。操業中
は錫アノードを使用してアノードの溶解によって電解で
失われる錫(II)イオンを補給してもよいし、アノード
に白金めっきを施したチタン電極等の不溶性アノードを
使用し、錫(II)イオン補給は別の方法、例えば、めっ
き液中に金属錫粒を浸漬し、酸素または空気を吹き込ん
で酸素による酸化反応を利用してもよい。錫めっきの添
加剤は特に限定しない。有機スルホン酸浴で使用される
添加剤が同様に使用可能である。一例として、フェロス
タン浴で使用されるENSA(エトキシ化α−ナフトー
ルスルホン酸)が問題なく使用できる。
A divalent tin salt is added as tin during bathing.
It is particularly desirable to add it as tin (II) sulfate. During operation, a tin anode may be used to replenish the tin (II) ions lost by electrolysis due to the dissolution of the anode, or an insoluble anode such as a platinum electrode plated with platinum may be used to remove the tin (II ) Ion replenishment may be performed by another method, for example, by immersing metal tin particles in a plating solution and blowing oxygen or air into the plating solution to use an oxidation reaction by oxygen. The tin plating additive is not particularly limited. Additives used in organic sulfonic acid baths can be used as well. As an example, ENSA (ethoxylated α-naphthol sulfonic acid) used in ferrostane baths can be used without problems.

【0019】[0019]

【実施例】以下に本発明の実施例を説明する。実施例の
めっき浴に共通の組成は下記の通りである。 硫酸錫(II) 36.2g/l(錫として20g/l) 硫酸 16.7g/l ENSA 4.0g/l ここに記載していない実施例のめっき浴の条件について
は表1および表2に記載した。浴温は全て45℃に統一
した。以下に記した方法により、(1)スラッジ生成、
(2)錫溶解、(3)めっき性およびめっき鋼板特性に
ついて試験した。
EXAMPLES Examples of the present invention will be described below. The composition common to the plating baths of the examples is as follows. Tin (II) sulphate 36.2 g / l (20 g / l as tin) Sulfuric acid 16.7 g / l ENSA 4.0 g / l Table 1 and Table 2 show the conditions of the plating baths of the examples not described here. Described. All the bath temperatures were unified to 45 ° C. According to the method described below, (1) sludge generation,
(2) Tin dissolution, (3) Platability and plated steel sheet characteristics were tested.

【0020】(1)スラッジ生成試験 a)酸素によるスラッジ生成 内径105mm、高さ800mmの錫溶解槽に粒径2.
8mmの錫粒を5kg充填し、80リットルのめっき液
を60リットル/分で循環させ、1.5リットル/分の
酸素を吹き込んだ。溶解槽内圧力は2kgf/cm2
した。酸素吹き込み2時間後のめっき液2リットルをろ
過し、スラッジの重量を測定した。
(1) Sludge Generation Test a) Generation of Sludge by Oxygen A tin dissolution tank having an inner diameter of 105 mm and a height of 800 mm has a particle size of 2.
5 kg of 8 mm tin particles were filled, 80 liters of plating solution was circulated at 60 liters / minute, and oxygen was blown at 1.5 liters / minute. The pressure in the dissolution tank was 2 kgf / cm 2 . 2 liters of the plating solution after 2 hours of blowing oxygen was filtered and the weight of the sludge was measured.

【0021】b)電解によるスラッジ生成 めっき鋼板を静止させ、めっき液を循環させるめっきセ
ルに45℃のめっき液2リットルを循環させ、アノード
には白金めっきを施したチタンを用い、アノード電流密
度25A/dm2 で30000クーロンの電解を行って
スラッジ生成量を測定した。
B) Generation of sludge by electrolysis: The plated steel sheet is kept stationary, 2 liters of the plating solution at 45 ° C. is circulated in a plating cell in which the plating solution is circulated, and platinum-plated titanium is used as the anode, and the anode current density is 25 A. The amount of sludge produced was measured by electrolysis of 30,000 coulombs at / dm 2 .

【0022】(2)錫溶解試験 内径105mm、高さ800mmの錫溶解槽に粒径2.
8mmの錫粒を5kg充填し、80リットルのめっき液
を60リットル/分で循環させ、1.5リットル/分の
酸素を吹き込んだ。溶解槽内圧力は2kgf/cm2
した。2時間後の液中Sn2+をよう素滴定によって求め
た。
(2) Tin Dissolution Test In a tin dissolution tank having an inner diameter of 105 mm and a height of 800 mm, a particle size of 2.
5 kg of 8 mm tin particles were filled, 80 liters of plating solution was circulated at 60 liters / minute, and oxygen was blown at 1.5 liters / minute. The pressure in the dissolution tank was 2 kgf / cm 2 . Sn 2+ in the liquid after 2 hours was determined by iodometric titration.

【0023】(3)めっき性およびめっき鋼板特性 横型循環セルを用いて試験液(浴温45℃)を循環させ
て不溶性アノードとして白金めっきチタン電極を使用
し、25A/dm2 で50クーロン/dm2 の錫めっき
を行った。めっき性、めっき鋼板特性を下記の方法で評
価した。
(3) Platability and characteristics of plated steel sheet A test solution (bath temperature 45 ° C.) was circulated using a horizontal circulation cell and a platinum-plated titanium electrode was used as an insoluble anode, and 50 Coulomb / dm 2 at 25 A / dm 2. 2 tin plating was performed. The platability and the characteristics of the plated steel sheet were evaluated by the following methods.

【0024】a)陰極電流効率 めっき鋼板の錫付着量を希塩酸中での電解剥離によって
測定し、理論付着量に対する百分率を陰極電流効率とし
た。 b)耐食性 ATC試験 鋼板に錫めっきを施した後、260℃でリフロー処理
し、脱脂し、金属錫を電解剥離して試験片を作成した。
2.25cm2 の通電部を残してシールし、26.7℃
のトマトジュースに浸漬して、20時間後の試験片と錫
極間に流れるカップル電流を測定した。
A) Cathode current efficiency The amount of tin deposited on the plated steel sheet was measured by electrolytic stripping in dilute hydrochloric acid, and the percentage of the theoretical amount deposited was defined as the cathode current efficiency. b) Corrosion resistance ATC test A steel plate was tin-plated, then reflowed at 260 ° C, degreased, and electrolytically stripped of metallic tin to prepare a test piece.
Sealed leaving a 2.25 cm 2 current-carrying part, 26.7 ° C
Was immersed in the tomato juice and the couple current flowing between the test piece and the tin electrode after 20 hours was measured.

【0025】[0025]

【表1】 [Table 1]

【0026】[0026]

【表2】 [Table 2]

【0027】以上の試験結果は、表1に本発明例、表2
に比較例をそれぞれ示す。これらの結果から明らかなよ
うに、本発明の方法によればスラッジの生成を抑制して
良好な錫めっきを施すことが可能である。
The above test results are shown in Table 1 of the present invention and Table 2.
Comparative examples are shown in each. As is clear from these results, according to the method of the present invention, it is possible to suppress the generation of sludge and perform good tin plating.

【0028】[0028]

【発明の効果】本発明の方法によれば、低コスト、低公
害という魅力がある一方、スラッジ発生が多く、ブリキ
製造には実用的でないと考えられていた硫酸浴でもスラ
ッジの生成を抑制して錫めっきができるので、めっき廃
液の有害性が低減されて廃液の処理が容易となり、高価
な酸を浴に使わなくてすむので、製造コストも低くでき
る。
EFFECTS OF THE INVENTION According to the method of the present invention, while having the advantages of low cost and low pollution, sludge generation is suppressed even in a sulfuric acid bath which is considered not practical for tin production. Since tin plating can be carried out, the harmfulness of the plating waste liquid can be reduced, the waste liquid can be easily treated, and expensive acids can be dispensed with in the bath, so the manufacturing cost can be reduced.

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 二つ以上の電子供与性置換基を有し、そ
のうちの少なくとも一つがヒドロキシ基である電解液溶
解性の芳香族化合物である、錫めっき硫酸浴用スラッジ
抑制剤。
1. A sludge inhibitor for a tin-plating sulfuric acid bath, which is an electrolyte-soluble aromatic compound having two or more electron-donating substituents, at least one of which is a hydroxy group.
【請求項2】 請求項1に記載のスラッジ抑制剤を添加
した硫酸濃度5g/l以上50g/l以下の硫酸浴を用
いて浴温30〜70℃で鋼板に電気錫めっきを施すこと
を特徴とする錫めっき方法。
2. A steel sheet is electrotin-plated at a bath temperature of 30 to 70 ° C. using a sulfuric acid bath containing the sludge inhibitor according to claim 1 and having a sulfuric acid concentration of 5 g / l or more and 50 g / l or less. And tin plating method.
【請求項3】 スラッジ抑制剤が、ヒドロキシ基のo−
位またはp−位に酸素がベンゼン環の炭素と結合する置
換基を有する芳香族化合物であり、濃度範囲0.01〜
2g/lで使用する請求項2に記載の錫めっき方法。
3. The sludge inhibitor is a hydroxy group o-.
Is an aromatic compound having a substituent in which oxygen bonds to the carbon of the benzene ring at the p-position or p-position, and the concentration range is 0.01
The tin plating method according to claim 2, wherein the tin plating method is used at 2 g / l.
【請求項4】 スラッジ抑制剤が、酸素がベンゼン環の
炭素と結合する置換基がヒドロキシ基のm−位にある芳
香族化合物およびベンゼン環の炭素と結合する原子が窒
素である芳香族化合物であり、濃度範囲0.1〜2g/
lで使用する請求項2に記載の錫めっき方法。
4. The sludge inhibitor is an aromatic compound in which a substituent in which oxygen is bonded to a carbon of a benzene ring is in the m-position of a hydroxy group, and an aromatic compound in which an atom bonded to a carbon of the benzene ring is nitrogen. Yes, concentration range 0.1-2g /
The tin-plating method according to claim 2, wherein the tin-plating method is used in 1 l.
JP14161793A 1993-06-14 1993-06-14 Tin plating method Expired - Lifetime JP3466229B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14161793A JP3466229B2 (en) 1993-06-14 1993-06-14 Tin plating method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14161793A JP3466229B2 (en) 1993-06-14 1993-06-14 Tin plating method

Publications (2)

Publication Number Publication Date
JPH06346273A true JPH06346273A (en) 1994-12-20
JP3466229B2 JP3466229B2 (en) 2003-11-10

Family

ID=15296209

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5814202A (en) * 1997-10-14 1998-09-29 Usx Corporation Electrolytic tin plating process with reduced sludge production
WO1999019542A1 (en) * 1997-10-14 1999-04-22 Usx Engineers And Consultants, Inc. Electrolytic tin plating process with reduced sludge production
KR100805024B1 (en) * 2001-12-21 2008-02-20 주식회사 포스코 A Method for Increasing Dissolution Rate of Tin Granule
US7465384B2 (en) 2005-02-28 2008-12-16 Rohm And Haas Electronic Materials Llc Acid electrolytes

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5814202A (en) * 1997-10-14 1998-09-29 Usx Corporation Electrolytic tin plating process with reduced sludge production
WO1999019542A1 (en) * 1997-10-14 1999-04-22 Usx Engineers And Consultants, Inc. Electrolytic tin plating process with reduced sludge production
KR100805024B1 (en) * 2001-12-21 2008-02-20 주식회사 포스코 A Method for Increasing Dissolution Rate of Tin Granule
US7465384B2 (en) 2005-02-28 2008-12-16 Rohm And Haas Electronic Materials Llc Acid electrolytes

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