JPH06346096A - Fluorinated alcohol cleanser - Google Patents
Fluorinated alcohol cleanserInfo
- Publication number
- JPH06346096A JPH06346096A JP13127693A JP13127693A JPH06346096A JP H06346096 A JPH06346096 A JP H06346096A JP 13127693 A JP13127693 A JP 13127693A JP 13127693 A JP13127693 A JP 13127693A JP H06346096 A JPH06346096 A JP H06346096A
- Authority
- JP
- Japan
- Prior art keywords
- trifluoromethyl
- hexafluoropropan
- substrate
- cleaning
- cleaning agent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/50—Solvents
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Detergent Compositions (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は洗浄剤に関し、特に、半
導体製造工程で使用される基板等の洗浄に有効な洗浄剤
に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning agent, and more particularly to a cleaning agent effective for cleaning substrates and the like used in semiconductor manufacturing processes.
【０００２】[0002]
【従来の技術】ＩＣやＬＳＩ等の半導体の製造に用いら
れるウエハー等の基板、フォトリソグラフィー工程で使
用されるマスクやレチクル及びその前駆体としての石英
基板等の基板、ペリクルを製造する際に使用されるガラ
ス基板、さらには、光ディスクの製造に用いるスタンパ
ーの製造に使用される基板等は、その性質上極めてきれ
いに洗浄されている必要がある。2. Description of the Related Art Substrates such as wafers used in the manufacture of semiconductors such as ICs and LSIs, masks and reticles used in the photolithography process, substrates such as quartz substrates as their precursors, and pellicles The glass substrate used, and further the substrate used for manufacturing the stamper used for manufacturing the optical disc, need to be cleaned extremely cleanly due to its nature.
【０００３】このような基板の洗浄方法としては、従
来、超音波洗浄、ブラシ等によるこすり洗い又は硫酸−
過酸化水素水，水酸化アンモニウム−過酸化水素水等に
よる酸化洗浄等で大部分の汚れを除去した後、イソプロ
パノール、２，２，３，３，３−ペンタフルオロプロパ
ノール又はフロン等の洗浄溶媒蒸気中に基板を置き、基
板表面で蒸気を凝縮させて表面を洗い流し、基板の温度
が蒸気温度と等しくなった時点で乾燥状態となる蒸気洗
浄乾燥法が広く用いられている。As a method for cleaning such a substrate, conventionally, ultrasonic cleaning, scrubbing with a brush or sulfuric acid-
After removing most of the dirt by oxidative cleaning with hydrogen peroxide solution, ammonium hydroxide-hydrogen peroxide solution, etc., cleaning solvent vapor such as isopropanol, 2,2,3,3,3-pentafluoropropanol or CFC A vapor cleaning / drying method is widely used in which a substrate is placed inside, vapor is condensed on the substrate surface to wash away the surface, and the substrate is in a dry state when the temperature of the substrate becomes equal to the vapor temperature.
【０００４】[0004]
【発明が解決しようとする課題】しかしながら、上記の
洗浄乾燥法でイソプロパノールを用いた場合、イソプロ
パノールは可燃性であるため、洗浄工程中に火災，爆発
等の事故が発生しやすいという問題点がある。また、イ
ソプロパノール及び２，２，３，３，３−ペンタフルオ
ロプロパノールはその沸点が高く、エネルギー効率が悪
いという欠点がある。さらに、従来使用されてきたクロ
ロフルオロカーボンは大気中に放出された場合に、成層
圏のオゾン層を破壊し、その結果地球上の生態系に悪影
響を及ぼすことが指摘され、従来のこれらのフロンは生
産及び使用規制が実施されている。However, when isopropanol is used in the above washing / drying method, since isopropanol is flammable, an accident such as fire or explosion is likely to occur during the washing process. . Further, isopropanol and 2,2,3,3,3-pentafluoropropanol have the drawbacks of high boiling point and poor energy efficiency. Furthermore, it has been pointed out that conventionally used chlorofluorocarbons, when released into the atmosphere, destroy the ozone layer in the stratosphere, resulting in adverse effects on the earth's ecosystem. And usage restrictions are enforced.
【０００５】本発明は、以上の問題点に鑑みてなされた
ものであり、その目的は、火災や爆発等の事故を防止
し、消費エネルギーが少なく、しかも、地球上の生態系
に悪影響を及ぼさないような洗浄剤を提供することにあ
る。The present invention has been made in view of the above problems, and its purpose is to prevent accidents such as fires and explosions, consume less energy, and have an adverse effect on the ecosystem on the earth. It is to provide a cleaning agent that does not exist.
【０００６】[0006]
【課題を解決するための手段】本発明者等は、上記の如
き技術の現状に鑑み検討を重ねた結果、１，１，１，
３，３，３−ヘキサフルオロプロパン−２−オール、
１，１，１，３，３，４，４，４−オクタフルオロブタ
ン−２−オール、２−トリフルオロメチル−１，１，
１，３，３，３−ヘキサフルオロプロパン−２−オー
ル、２−トリフルオロメチル−１，１，１−トリフルオ
ロプロパン−２−オールが、不燃性で、かつ塩素原子を
含まないためオゾン層を破壊せず、大気寿命が短いため
地球温暖化への寄与を小さくすることができ、さらに、
低沸点であることから消費エネルギーの少ない極めて優
れた洗浄剤となることを見いだし、本発明を完成するに
至ったものである。Means for Solving the Problems As a result of repeated studies in view of the current state of the art as described above, the present inventors have found that 1, 1, 1,
3,3,3-hexafluoropropan-2-ol,
1,1,1,3,3,4,4,4-octafluorobutan-2-ol, 2-trifluoromethyl-1,1,
1,3,3,3-hexafluoropropan-2-ol and 2-trifluoromethyl-1,1,1-trifluoropropan-2-ol are nonflammable and do not contain chlorine atoms, so the ozone layer And its short atmospheric life can reduce the contribution to global warming.
The present invention has been completed by discovering that it has a low boiling point and thus becomes an extremely excellent cleaning agent with low energy consumption.
【０００７】すなわち、本発明は、１，１，１，３，
３，３−ヘキサフルオロプロパン−２−オール、１，
１，１，３，３，４，４，４−オクタフルオロブタン−
２−オール、２−トリフルオロメチル−１，１，１，
３，３，３−ヘキサフルオロプロパン−２−オール又は
２−トリフルオロメチル−１，１，１−トリフルオロプ
ロパン−２−オールの少なくともいずれか１種を使用す
ることを特徴とするフッ素化アルコール系洗浄剤であ
る。That is, the present invention is 1, 1, 1, 3,
3,3-hexafluoropropan-2-ol, 1,
1,1,3,3,4,4,4-octafluorobutane-
2-ol, 2-trifluoromethyl-1,1,1,
Fluorinated alcohol characterized by using at least any one of 3,3,3-hexafluoropropan-2-ol and 2-trifluoromethyl-1,1,1-trifluoropropan-2-ol It is a system cleaner.
【０００８】以下、本発明をさらに詳細に説明する。本
発明の洗浄剤として使用する１，１，１，３，３，３−
ヘキサフルオロプロパン−２−オール［分子式：ＣＦ3
ＣＨ（ＯＨ）ＣＦ3 ］、１，１，１，３，３，４，４，
４−オクタフルオロブタン−２−オール［分子式：ＣＦ
3 ＣＨ（ＯＨ）ＣＦ2 ＣＦ3 ］、２−トリフルオロメチ
ル−１，１，１，３，３，３−ヘキサフルオロプロパン
−２−オール［分子式：（ＣＦ3 ）3 ＣＯＨ］、２−ト
リフルオロメチル−１，１，１−トリフルオロプロパン
−２−オール［分子式：（ＣＦ3 ）2 （ＣＨ3 ）ＣＯ
Ｈ］は、それぞれ表１に示す物性値を有し、いずれも不
燃性であり、洗浄乾燥工程での火災、爆発等の危険がな
い。The present invention will be described in more detail below. 1,1,1,3,3,3-used as a cleaning agent of the present invention
Hexafluoropropan-2-ol [Molecular formula: CF 3
CH (OH) CF 3 ], 1,1,1,3,3,4,4,
4-octafluorobutan-2-ol [Molecular formula: CF
3 CH (OH) CF 2 CF 3], 2- trifluoromethyl-1,1,1,3,3,3-hexafluoro-2-ol [molecular formula: (CF 3) 3 COH] , 2- tri fluoromethyl-1,1,1-trifluoro-2-ol [molecular formula: (CF 3) 2 (CH 3) CO
H] each have the physical property values shown in Table 1 and are nonflammable, and there is no danger of fire, explosion, etc. in the washing and drying process.
【０００９】[0009]
【表１】 [Table 1]
【００１０】なお、比較のためフロン１１３［ＣＦＣ−
１１３］、２，２，３，３，３−ペンタフルオロプロパ
ノール［分子式：ＣＦ3 ＣＦ2 ＣＨ2 ＯＨ］及びイソプ
ロパノールの対応する物性値を表１にあわせて示す。For comparison, Freon 113 [CFC-
113], 2,2,3,3,3-pentafluoropropanol [molecular formula: CF 3 CF 2 CH 2 OH], and corresponding physical property values of isopropanol are also shown in Table 1.
【００１１】本発明の洗浄剤として使用する１，１，
１，３，３，３−ヘキサフルオロプロパン−２−オー
ル、１，１，１，３，３，４，４，４−オクタフルオロ
ブタン−２−オール、２−トリフルオロメチル−１，
１，１，３，３，３−ヘキサフルオロプロパン−２−オ
ール、２−トリフルオロメチル−１，１，１−トリフル
オロプロパン−２−オールは、それぞれ単独で使用して
も又はこれらの混合物として使用してもよい。混合して
使用する際の混合比は、混合する物質によっても異なり
特に限定するものではないが、製造法に起因する経済性
を考慮して混合することが好ましく、例えば、２種類の
混合物の場合には１：５〜５：１があげられる。なお、
回収再利用等の経済性の面からは、単独で用いることが
特に好ましい。1,1 used as the cleaning agent of the present invention
1,3,3,3-hexafluoropropan-2-ol, 1,1,1,3,3,4,4,4-octafluorobutan-2-ol, 2-trifluoromethyl-1,
1,1,3,3,3-hexafluoropropan-2-ol and 2-trifluoromethyl-1,1,1-trifluoropropan-2-ol may be used alone or in a mixture thereof. May be used as. The mixing ratio when mixed and used varies depending on the substances to be mixed and is not particularly limited, but it is preferable to mix them in consideration of economic efficiency due to the manufacturing method. For example, in the case of two kinds of mixtures Can be 1: 5 to 5: 1. In addition,
From the viewpoint of economy such as recovery and reuse, it is particularly preferable to use it alone.
【００１２】本発明の洗浄剤の洗浄対象となる被洗浄物
としては、１，１，１，３，３，３−ヘキサフルオロプ
ロパン−２−オール、１，１，１，３，３，４，４，４
−オクタフルオロブタン−２−オール、２−トリフルオ
ロメチル−１，１，１，３，３，３−ヘキサフルオロプ
ロパン−２−オール、２−トリフルオロメチル−１，
１，１−トリフルオロプロパン−２−オールに対して安
定なものからなるものであれば特に限定するものではな
いが、特に基板の洗浄に適している。基板としては、例
えば、ガラス、石英又はこれらの表面にクロム等を蒸着
させて被膜を形成したもの、樹脂又はこれらの上に回路
パターン等を有しているもの等をあげることができる。
このような被洗浄物としては具体的には、半導体の製造
に用いられるウエハー等の基板、フォトリソグラフィー
工程で使用されるマスクやレチクル及びその前駆体とし
ての石英基板、ペリクルを製造する際に使用されるガラ
ス基板並びに光ディスクの製造に用いるスタンパーの製
造に使用される基板等をあげることができる。The objects to be cleaned with the cleaning agent of the present invention include 1,1,1,3,3,3-hexafluoropropan-2-ol, 1,1,1,3,3,4. , 4, 4
-Octafluorobutan-2-ol, 2-trifluoromethyl-1,1,1,3,3,3-hexafluoropropan-2-ol, 2-trifluoromethyl-1,
Although it is not particularly limited as long as it is stable to 1,1-trifluoropropan-2-ol, it is particularly suitable for cleaning the substrate. As the substrate, for example, glass, quartz, or a substrate on which chromium or the like is vapor-deposited to form a film, resin, or a substrate having a circuit pattern or the like thereon can be used.
As such an object to be cleaned, specifically, a substrate such as a wafer used for manufacturing a semiconductor, a mask or a reticle used in a photolithography process, a quartz substrate as a precursor thereof, and a pellicle are used. The glass substrate and the substrate used for manufacturing a stamper used for manufacturing an optical disc can be used.
【００１３】本発明の洗浄剤による洗浄方法は特に限定
するものではなく、洗浄剤中に被洗浄物を浸漬したり、
被洗浄物に洗浄剤をスプレーしたりする方法などによる
こともできるが、特に蒸気洗浄が好ましい。蒸気洗浄法
は洗浄剤の蒸気中に被洗浄物を入れて被洗浄物表面を洗
浄した後乾燥させる。The cleaning method using the cleaning agent of the present invention is not particularly limited, and the object to be cleaned may be immersed in the cleaning agent,
A method of spraying a cleaning agent on the object to be cleaned can be used, but steam cleaning is particularly preferable. In the steam cleaning method, the object to be cleaned is put in the steam of the cleaning agent to clean the surface of the object to be cleaned and then dried.
【００１４】その具体的な方法としては、従来法と同様
に、洗剤水溶液や超純水中に被洗浄物を浸して超音波振
動で被洗浄物に付着している異物を除去する方法、洗剤
水溶液や超純水を用いてＰＶＡ発泡体等のブラシでこす
り洗いする方法又は硫酸−過酸化水素水，水酸化アンモ
ニウム−過酸化水素水等の溶液中に被洗浄物を浸して酸
化反応で有機物を除去する方法等の前処理法により大部
分の汚れを除去した後、本発明の１，１，１，３，３，
３−ヘキサフルオロプロパン−２−オール、１，１，
１，３，３，４，４，４−オクタフルオロブタン−２−
オール、２−トリフルオロメチル−１，１，１，３，
３，３−ヘキサフルオロプロパン−２−オール、２−ト
リフルオロメチル−１，１，１−トリフルオロプロパン
−２−オールの少なくともいずれか１種で表されるフッ
素化アルコールからなる洗浄剤の蒸気中に被洗浄物を置
き被洗浄物表面で蒸気を凝縮させて被洗浄物表面を洗い
流し、被洗浄物の温度が蒸気の温度と等しくなった時点
で乾燥状態となり、洗浄乾燥を終わる。このような方法
を採用した場合、洗浄乾燥された基板表面には洗浄剤は
残留しない。また、洗浄後の乾燥にかかる時間も短く、
短時間で乾燥することができる。As a concrete method thereof, as in the conventional method, a method of immersing an object to be cleaned in a detergent aqueous solution or ultrapure water to remove foreign matters adhering to the object to be cleaned by ultrasonic vibration, a detergent A method of scrubbing with a brush of PVA foam or the like using an aqueous solution or ultrapure water, or immersing an object to be cleaned in a solution of sulfuric acid-hydrogen peroxide solution, ammonium hydroxide-hydrogen peroxide solution or the like to carry out an organic reaction by an oxidation reaction. After removing most of the dirt by a pretreatment method such as a method of removing
3-hexafluoropropan-2-ol, 1,1,
1,3,3,4,4,4-octafluorobutane-2-
All, 2-trifluoromethyl-1,1,1,3
Vapor of a cleaning agent composed of a fluorinated alcohol represented by at least one of 3,3-hexafluoropropan-2-ol and 2-trifluoromethyl-1,1,1-trifluoropropan-2-ol An object to be cleaned is placed inside to condense steam on the surface of the object to be cleaned to wash away the surface of the object to be cleaned, and when the temperature of the object to be cleaned becomes equal to the temperature of the steam, a dry state is reached and the cleaning and drying is completed. When such a method is adopted, the cleaning agent does not remain on the surface of the washed and dried substrate. Also, it takes less time to dry after washing,
It can be dried in a short time.
【００１５】[0015]
【実施例】以下、実施例を用いて本発明を説明するが、
本発明はこれらの実施例に限定されるものではない。The present invention will be described below with reference to examples.
The invention is not limited to these examples.
【００１６】（実施例１〜４）レチクル用のガラス基板
について硫酸洗浄（１２０℃、５分）を行い、水洗（３
分）した後、さらに超音波洗浄（３分）を行った。この
予備洗浄の後、洗浄剤として表１に示す１，１，１，
３，３，３−ヘキサフルオロプロパン−２−オール（実
施例１）、１，１，１，３，３，４，４，４−オクタフ
ルオロブタン−２−オール（実施例２）、２−トリフル
オロメチル−１，１，１，３，３，３−ヘキサフルオロ
プロパン−２−オール（実施例３）、２−トリフルオロ
メチル−１，１，１−トリフルオロプロパン−２−オー
ル（実４例４）を用いて、蒸気乾燥法により基板の洗浄
乾燥を行い目視により観察した。その結果を表２に示
す。(Examples 1 to 4) A glass substrate for a reticle was washed with sulfuric acid (120 ° C, 5 minutes) and washed with water (3).
Then, ultrasonic cleaning (3 minutes) was further performed. After this pre-cleaning, 1, 1, 1, shown in Table 1 as a cleaning agent
3,3,3-hexafluoropropan-2-ol (Example 1), 1,1,1,3,3,4,4,4-octafluorobutan-2-ol (Example 2), 2- Trifluoromethyl-1,1,1,3,3,3-hexafluoropropan-2-ol (Example 3), 2-trifluoromethyl-1,1,1-trifluoropropan-2-ol (actual Using 4 Example 4), the substrate was washed and dried by the vapor drying method and visually observed. The results are shown in Table 2.
【００１７】（実施例５）洗浄剤として１，１，１，
３，３，４，４，４−オクタフルオロブタン−２−オー
ル（６０重量％）と２−トリフルオロメチル−１，１，
１，３，３，３−ヘキサフルオロプロパン−２−オール
（４０重量％）からなる混合物を用いた以外は実施例１
と同様にして行った。その結果を表２にあわせて示す。(Example 5) 1,1,1, as a cleaning agent
3,3,4,4,4-octafluorobutan-2-ol (60% by weight) and 2-trifluoromethyl-1,1,
Example 1 except that a mixture of 1,3,3,3-hexafluoropropan-2-ol (40% by weight) was used.
I went in the same way. The results are also shown in Table 2.
【００１８】（実施例６）洗浄剤として１，１，１，
３，３，３−ヘキサフルオロプロパン−２−オール（７
０重量％）と２−トリフルオロメチル−１，１，１，
３，３，３−ヘキサフルオロプロパン−２−オール（３
０重量％）からなる混合物を用いた以外は実施例１と同
様にして行った。その結果を表２にあわせて示す。(Example 6) 1,1,1, as a cleaning agent
3,3,3-hexafluoropropan-2-ol (7
0% by weight) and 2-trifluoromethyl-1,1,1,
3,3,3-hexafluoropropan-2-ol (3
The same procedure as in Example 1 was carried out except that a mixture of 0% by weight) was used. The results are also shown in Table 2.
【００１９】（参考例）洗浄剤としてイソプロパノール
を用いた以外は実施例１と同様にして行った。その結果
を表２にあわせて示す。但し、このイソプロパノールは
可燃性であるため、火災，爆発等の危険性がある。Reference Example The same procedure as in Example 1 was repeated except that isopropanol was used as the cleaning agent. The results are also shown in Table 2. However, since this isopropanol is flammable, there is a risk of fire and explosion.
【００２０】（比較例）洗浄剤として２，２，３，３，
３−ペンタフルオロプロパノールを用いた以外は実施例
１と同様にして行った。その結果を表２にあわせて示
す。Comparative Example 2, 2, 3, 3, as a cleaning agent
It carried out like Example 1 except having used 3-pentafluoro propanol. The results are also shown in Table 2.
【００２１】[0021]
【表２】 [Table 2]
【００２２】[0022]
【発明の効果】以上説明したように、本発明によれば不
燃性のフッ素化アルコールを使用するので、従来の方法
においてイソプロパノールを洗浄溶媒として用いた場合
に問題となる火災や爆発の危険を回避でき、また、２，
２，３，３，３−ペンタフルオロプロパノールよりいず
れも低沸点であることから、消費エネルギーが少なく、
かつ短時間で乾燥することができ、さらに従来の方法と
同等又はそれ以上の洗浄乾燥性で被洗浄物の洗浄乾燥を
行うことができる効果を有するものである。As described above, according to the present invention, a non-flammable fluorinated alcohol is used, so that the risk of fire and explosion which is a problem when isopropanol is used as a washing solvent in the conventional method is avoided. Yes, two
Since it has a lower boiling point than any of 2,3,3,3-pentafluoropropanol, it consumes less energy,
In addition, it has an effect that it can be dried in a short time, and that it can wash and dry an object to be washed with a washing and drying property equal to or higher than the conventional method.
───────────────────────────────────────────────────── フロントページの続き (71)出願人 000002200 セントラル硝子株式会社 山口県宇部市大字沖宇部5253番地 (71)出願人 000000044 旭硝子株式会社 東京都千代田区丸の内２丁目１番２号 (74)上記４名の代理人 弁理士 箕浦 清 (72)発明者 関屋 章 茨城県つくば市東１丁目１番地 工業技術 院物質工学工業技術研究所内 (72)発明者 高橋 満 東京都文京区本郷２−40−17 本郷若井ビ ル 財団法人地球環境産業技術研究機構内 (72)発明者 後藤 嘉彦 東京都文京区本郷２−40−17 本郷若井ビ ル 財団法人地球環境産業技術研究機構内 (72)発明者 須賀 淳雄 東京都文京区本郷２−40−17 本郷若井ビ ル 財団法人地球環境産業技術研究機構内 ─────────────────────────────────────────────────── ─── Continued Front Page (71) Applicant 000002200 Central Glass Co., Ltd. 5253 Oki Ube, Ube City, Yamaguchi Prefecture (71) Applicant 000000044 Asahi Glass Co., Ltd. 2-1-2 Marunouchi, Chiyoda-ku, Tokyo (74) Above 4 Attorneys Attorney Kiyoshi Minoura (72) Inventor Akira Sekiya 1-1-1 Higashi, Tsukuba-shi, Ibaraki Institute of Industrial Science and Technology (72) Inventor Mitsuru Takahashi 2-40-17 Hongo, Bunkyo-ku, Tokyo Hongo Wakai Building within the Institute for Global Environmental Industrial Technology (72) Inventor Yoshihiko Goto 2-40-17 Hongo Hongo, Bunkyo-ku, Tokyo Hongo Wakai Building Within the Institute for Global Environmental Engineering (72) Inventor Atsushi Suga Hongo Wakai 2-40-17 Hongo, Bunkyo-ku, Tokyo Within the Institute for Global Environmental Technology
Claims (1)
ロプロパン−２−オール、１，１，１，３，３，４，
４，４−オクタフルオロブタン−２−オール、２−トリ
フルオロメチル−１，１，１，３，３，３−ヘキサフル
オロプロパン−２−オール又は２−トリフルオロメチル
−１，１，１−トリフルオロプロパン−２−オールの少
なくともいずれか１種を使用することを特徴とするフッ
素化アルコール系洗浄剤。1. 1,1,1,3,3,3-hexafluoropropan-2-ol, 1,1,1,3,3,4
4,4-octafluorobutan-2-ol, 2-trifluoromethyl-1,1,1,3,3,3-hexafluoropropan-2-ol or 2-trifluoromethyl-1,1,1- A fluorinated alcohol-based detergent comprising at least one type of trifluoropropan-2-ol.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13127693A JP2651652B2 (en) | 1993-05-07 | 1993-05-07 | Fluorinated alcohol-based cleaning agent |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13127693A JP2651652B2 (en) | 1993-05-07 | 1993-05-07 | Fluorinated alcohol-based cleaning agent |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH06346096A true JPH06346096A (en) | 1994-12-20 |
| JP2651652B2 JP2651652B2 (en) | 1997-09-10 |
Family
ID=15054156
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13127693A Expired - Lifetime JP2651652B2 (en) | 1993-05-07 | 1993-05-07 | Fluorinated alcohol-based cleaning agent |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2651652B2 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1900801A1 (en) | 2006-09-14 | 2008-03-19 | FUJIFILM Corporation | Substrate water-removing agent, and water-removing method and drying method employing same |
| JP2013098303A (en) * | 2011-10-31 | 2013-05-20 | Central Glass Co Ltd | Cleaning and drying agent, and method of cleaning and drying substrate using the same |
| JP2015108041A (en) * | 2013-12-03 | 2015-06-11 | ダイキン工業株式会社 | Cleaning composition |
| WO2020132309A1 (en) * | 2018-12-21 | 2020-06-25 | Honeywell International Inc. | Solvent compositions containing 1,2,2-trifluoro-1-trifluoromethylcyclobutane (tfmcb) |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02286794A (en) * | 1989-04-28 | 1990-11-26 | Daikin Ind Ltd | Fluorinated alcoholic solvent |
| JPH0314898A (en) * | 1990-04-24 | 1991-01-23 | Mitsui Petrochem Ind Ltd | Detergent |
| JPH0327328A (en) * | 1989-06-23 | 1991-02-05 | Asahi Glass Co Ltd | Fluorinated hydrocarbon-based solvent composition |
| JPH0327329A (en) * | 1989-06-23 | 1991-02-05 | Asahi Glass Co Ltd | Fluorinated hydrocarbon-based solvent composition |
| JPH04127955A (en) * | 1990-09-20 | 1992-04-28 | Daikin Ind Ltd | Method for cleaning article surface |
| JPH04243504A (en) * | 1991-01-25 | 1992-08-31 | Asahi Chem Ind Co Ltd | Azeotropic composition for drainage |
-
1993
- 1993-05-07 JP JP13127693A patent/JP2651652B2/en not_active Expired - Lifetime
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02286794A (en) * | 1989-04-28 | 1990-11-26 | Daikin Ind Ltd | Fluorinated alcoholic solvent |
| JPH0327328A (en) * | 1989-06-23 | 1991-02-05 | Asahi Glass Co Ltd | Fluorinated hydrocarbon-based solvent composition |
| JPH0327329A (en) * | 1989-06-23 | 1991-02-05 | Asahi Glass Co Ltd | Fluorinated hydrocarbon-based solvent composition |
| JPH0314898A (en) * | 1990-04-24 | 1991-01-23 | Mitsui Petrochem Ind Ltd | Detergent |
| JPH04127955A (en) * | 1990-09-20 | 1992-04-28 | Daikin Ind Ltd | Method for cleaning article surface |
| JPH04243504A (en) * | 1991-01-25 | 1992-08-31 | Asahi Chem Ind Co Ltd | Azeotropic composition for drainage |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1900801A1 (en) | 2006-09-14 | 2008-03-19 | FUJIFILM Corporation | Substrate water-removing agent, and water-removing method and drying method employing same |
| JP2013098303A (en) * | 2011-10-31 | 2013-05-20 | Central Glass Co Ltd | Cleaning and drying agent, and method of cleaning and drying substrate using the same |
| JP2015108041A (en) * | 2013-12-03 | 2015-06-11 | ダイキン工業株式会社 | Cleaning composition |
| WO2020132309A1 (en) * | 2018-12-21 | 2020-06-25 | Honeywell International Inc. | Solvent compositions containing 1,2,2-trifluoro-1-trifluoromethylcyclobutane (tfmcb) |
| US11739243B2 (en) | 2018-12-21 | 2023-08-29 | Honeywell International Inc. | Azeotrope or azeotrope-like compositions of 1,2,2-trifluoro-1-trifluoromethylcyclobutane (TFMCB) and applications thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2651652B2 (en) | 1997-09-10 |
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