JPH06340053A - Printing plate and printing method - Google Patents

Printing plate and printing method

Info

Publication number
JPH06340053A
JPH06340053A JP15258493A JP15258493A JPH06340053A JP H06340053 A JPH06340053 A JP H06340053A JP 15258493 A JP15258493 A JP 15258493A JP 15258493 A JP15258493 A JP 15258493A JP H06340053 A JPH06340053 A JP H06340053A
Authority
JP
Japan
Prior art keywords
ink
printing
printing plate
silicone resin
plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15258493A
Other languages
Japanese (ja)
Inventor
Masao Mogi
雅男 茂木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Inc
Original Assignee
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Printing Co Ltd filed Critical Toppan Printing Co Ltd
Priority to JP15258493A priority Critical patent/JPH06340053A/en
Publication of JPH06340053A publication Critical patent/JPH06340053A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/02Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/061Etching masks

Landscapes

  • Printing Methods (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)

Abstract

PURPOSE:To eliminate the pinhole like defect in an ink pattern formed by printing, to make film thickness sufficient, to make a surface smooth and to enhance etching resistance by forming the bottom surface of an ink receiving part from a silicone resin. CONSTITUTION:The silicone resin 3 becoming the bottom surface of an ink receiving part 10 is arranged by a method wherein hydrophilizing treatment is applied to the exposed part 1a of an alumnum substrate 1 not coated with a photosensitive resin 2 and an uncured silicone resin 3a compounded with a curing agent is uniformly applied to the surface of a roll 4 and this roll 4 is pressed to the moistened photosensitive resin 2 on the substrate 1 under rotation to form an uncured silicone resin layer 3b only on the surface of the photosensltive resin 2. The uncured silicone resin layer 3b is polymerized by heating to obtain a printing plate P1. The printing plate P1 is wetted with water and ink is applied to the moistened printing plate at a speed of 100mm/sec or less and transferred to perform printing.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、精細パターンを印刷形
成する技術に関するものであり、さらに詳しくはプリン
ト配線基板・TFT基板・IC基板などに、電気回路な
どをエッチング法によって形成するための、精細レジス
トパターンなどを作成する印刷版と印刷方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a technique for printing and forming a fine pattern, and more specifically, for forming an electric circuit or the like on a printed wiring board, a TFT substrate, an IC substrate, etc. by an etching method. The present invention relates to a printing plate and a printing method for creating a fine resist pattern and the like.

【0002】[0002]

【従来の技術】この種の技術として、平版や凸版を用い
るオフセット印刷法が既に工業化されている。電気回路
においては断線や短絡と云った欠陥があってはならない
ため、電気回路形成に使用されるレジストパターンには
幅や厚さに高い精度が要求される。このように高い解像
度が必要なものには、例えば砂目立てしたアルミニウム
基板の表面に感光性樹脂を所定の厚さに塗布して乾燥さ
せたプレセンシタイズ版(以下、PS版と呼ぶ)が用い
られ、また、印刷形成したインキパターンにピンホール
などの欠陥のない印刷が求められる時には樹脂凸版が使
用されている。
2. Description of the Related Art As a technique of this kind, an offset printing method using a planographic printing plate or a relief printing plate has already been industrialized. Since the electric circuit must not have defects such as disconnection and short circuit, the resist pattern used for forming the electric circuit is required to have high accuracy in width and thickness. For those requiring high resolution, for example, a presensitized plate (hereinafter referred to as PS plate) in which a photosensitive resin is applied to a surface of a grained aluminum substrate and dried, is used. Further, when it is required to print the ink pattern formed by printing without defects such as pinholes, the resin relief printing plate is used.

【0003】前記PS版を利用した印刷版としては、図
9に例示したように、アルミニウム基板1の一方の表面
に感光性樹脂2を所望のパターンに露光現像して残存さ
せ、印刷版P4としたものがある。このタイプの印刷版
では、アルミニウム基板1の露出部1aが親水性とな
り、パターン状に残した感光性樹脂2が親油性のインキ
受容部10となって、印刷版として機能する。
As a printing plate using the PS plate, as shown in FIG. 9, a photosensitive resin 2 is exposed and developed in a desired pattern on one surface of an aluminum substrate 1 to leave it, and a printing plate P4 is formed. There is something I did. In this type of printing plate, the exposed portion 1a of the aluminum substrate 1 becomes hydrophilic, and the photosensitive resin 2 left in a pattern form serves as an oleophilic ink receiving portion 10 to function as a printing plate.

【0004】すなわち、水で湿らせた印刷版P4に所要
のインキ(図示せず)をインキングすると、インキはア
ルミニウム基板1の水で湿った露出部1aには乗らず、
感光性樹脂2の上にのみ乗って比較的薄い被膜が形成さ
れるので、これを被印刷物(図示せず)に転写すること
により所望のインキパターンが印刷形成されることにな
るが、感光性樹脂2に乗っているインキが流動可能な状
態で転写すると、インキと感光性樹脂2とは親和性が高
いためインキの被膜は途中で分裂してしまうので、版上
にあるインキの全量を被印刷物の側に移し取ることはで
きない。
That is, when a required ink (not shown) is inked on the printing plate P4 moistened with water, the ink does not ride on the water-exposed exposed portion 1a of the aluminum substrate 1,
Since a relatively thin film is formed only on the photosensitive resin 2, a desired ink pattern is formed by printing by transferring this to a material to be printed (not shown). When the ink on the resin 2 is transferred in a fluid state, the ink and the photosensitive resin 2 have a high affinity and the ink film splits on the way, so the total amount of the ink on the plate is covered. It cannot be transferred to the side of the printed matter.

【0005】このため、印刷版上のインキ被膜にピンホ
ールなどの欠陥がなくても、被印刷物に転写したインキ
パターンにはピンホール状の欠陥が無数に生じていた
り、表面が凸凹してインキ膜厚も薄くなることから、エ
ッチング耐性が低下すると云った問題点があった。
Therefore, even if the ink film on the printing plate has no defects such as pinholes, the ink pattern transferred to the printing object has numerous pinhole-shaped defects, or the surface is uneven and the ink is uneven. Since the film thickness is thin, there is a problem that the etching resistance is lowered.

【0006】なお、上記欠陥の予防対策として、印刷回
数を1回ではなく2〜5回と多数回行ってインキ膜を厚
くする方法があるが、このようにしてもインキパターン
の表面を平滑にすることは困難であり、窪んでいる部分
のエッチング耐性は依然として低く、ピンホール状欠陥
の発生を完全に防止するには至っていない。
As a preventive measure against the above-mentioned defects, there is a method of thickening the ink film by performing printing 2 to 5 times instead of once, but even in this case, the surface of the ink pattern is smoothed. However, the etching resistance of the recessed portion is still low, and the occurrence of pinhole defects has not been completely prevented.

【0007】この印刷回数を増やす方法は、インキパタ
ーンの盛り上がった部分が転写時の圧力で潰れてしま
い、予め設定したパターンの寸法からはみ出し、エッチ
ングパターンが太ると云った欠陥を生じ易いので注意が
必要である。
In this method of increasing the number of printings, attention should be paid to the fact that the raised portion of the ink pattern is crushed by the pressure at the time of transfer, so that it is likely to cause a defect that the etching pattern is thickened by protruding from the preset pattern size. is necessary.

【0008】一方、版上にあるインキの凝集力をインキ
被膜が分裂しない程度に上げると、今度は親和性の高い
インキと版とが強固に接着して、インキを印刷版から被
印刷物の側に移し取ることができなくなると云った欠点
がある。
On the other hand, when the cohesive force of the ink on the plate is increased to such an extent that the ink film does not split, this time the ink having a high affinity and the plate are firmly adhered, and the ink is transferred from the printing plate to the side of the printing object. It has the drawback that it cannot be transferred to.

【0009】また、図10に示したように、シリコーン
樹脂3を感光性樹脂2の上に非画線部として配置するこ
とで、平版印刷における水を使用しないようにした印刷
版(例えば、東レ(株)製TAP版など)P5も周知で
ある。この印刷版P5では、シリコーン樹脂3の表面が
インキ反発(付着防止)層となり、現像によりシリコー
ン樹脂3が取り除かれて現れた感光性樹脂2の露出部2
aが親油性のインキ受容部10となって、印刷版として
機能する。
Further, as shown in FIG. 10, by disposing the silicone resin 3 on the photosensitive resin 2 as a non-image area, it is possible to prevent water from being used in lithographic printing. P5 manufactured by KK etc. is also well known. In this printing plate P5, the surface of the silicone resin 3 serves as an ink repulsion (anti-adhesion) layer, and the exposed portion 2 of the photosensitive resin 2 that appears after the silicone resin 3 has been removed by development.
a serves as the lipophilic ink receiving portion 10 and functions as a printing plate.

【0010】そして、この印刷版P5を用いてプリント
配線板のレジストパターンを印刷形成し、得られたレジ
ストパターンで銅箔をエッチングする技術が、特開昭6
0−208484号公報に提案されている。
A technique for printing a resist pattern on a printed wiring board by using this printing plate P5 and etching a copper foil with the obtained resist pattern is disclosed in Japanese Patent Laid-Open No.
No. 0-208484.

【0011】しかし、この印刷版P5においても、前記
印刷版P4と同様の欠点がある。
However, this printing plate P5 also has the same drawbacks as the printing plate P4.

【0012】また、図11に例示したように、基板上に
感光性樹脂2をパターン状に残存形成させた凸版タイプ
の印刷版P6を用いて、レジストパターンを形成し、プ
リント配線板などを加工することも行われている。
Further, as illustrated in FIG. 11, a resist pattern is formed using a letterpress type printing plate P6 in which the photosensitive resin 2 is left in a pattern on the substrate, and a printed wiring board or the like is processed. Things are also being done.

【0013】そして、この印刷版P6を用いる印刷にお
いても、被印刷物に移し取るレジストパターンにピンホ
ールなどの欠陥が発生しないように、印刷を多数重ねた
り、レジストパターンを厚く、または硬く形成してレジ
ストパターンのエッチング耐性を高める対策が講じら
れ、さらに版から被印刷物へのインキの転移率を増やし
たいと云った要求に応える方法として、版上のインキを
乾燥や紫外線照射により硬化させる技術が、例えば特開
昭55−43919号公報に開示されている。
Also in the printing using the printing plate P6, a large number of printings are formed or the resist pattern is formed thick or hard so that defects such as pinholes do not occur in the resist pattern transferred to the printing object. Measures to increase the etching resistance of the resist pattern have been taken, and as a method of responding to the demand to increase the transfer rate of ink from the plate to the printed material, the technique of curing the ink on the plate by drying or UV irradiation is For example, it is disclosed in JP-A-55-43919.

【0014】しかし、この凸版状の印刷版P6において
も、前記した平版の印刷版P4・P5における問題点と
同様の問題点があった。
However, this relief printing plate P6 also had the same problems as those of the above-mentioned planographic printing plates P4 and P5.

【0015】[0015]

【発明が解決しようとする課題】このため、ピンホール
状の欠陥や、表面に凹凸のない精細パターンを容易に形
成することこのできる印刷技術の開発が強く期待されて
いた。
Therefore, there has been a strong expectation for the development of a printing technique capable of easily forming a fine pattern having no pinhole-like defects or unevenness on the surface.

【0016】[0016]

【課題を解決するための手段】本発明は上記した従来技
術の課題を解決するためになされたもので、インキ受容
部の底面がシリコーン樹脂によって形成されたことを特
徴とする印刷版と、
The present invention has been made to solve the above-mentioned problems of the prior art, and a printing plate characterized in that the bottom surface of the ink receiving portion is formed of a silicone resin,

【0017】インキ受容部の底面がシリコーン樹脂によ
って形成された印刷版に、100mm/秒以下の速度で
インキングした後、このインキを転移させて印刷するこ
とを特徴とする印刷方法と、を提供し、前記従来技術の
課題を解決するものである。
A printing method is provided, which comprises inking a printing plate having a bottom surface of an ink receiving portion made of a silicone resin at a speed of 100 mm / sec or less, and then transferring and printing the ink. However, the problems of the above-mentioned conventional techniques are solved.

【0018】なお、本発明で云うインキ受容部の底面と
は、印刷版の外観上の凹部を意味するのではなく、イン
キを受容する部位の底、すなわち平面部を意味している
ので、凸版では盛り上がった面がインキ受容部の底面と
なる。
The bottom surface of the ink receiving portion in the present invention does not mean a concave portion on the external appearance of the printing plate, but the bottom portion of the ink receiving portion, that is, a flat portion, and therefore, the relief printing plate. Then, the raised surface becomes the bottom surface of the ink receiving portion.

【0019】[0019]

【作用】100mm/秒以下の速度でインキングするの
で、インキとの親和力が小さいシリコーン樹脂によって
底面が形成されているインキ受容部に、インキを確実に
供給することができる。こうして印刷版上に供給された
インキは、シリコーン樹脂から容易に剥離して被印刷物
の側に全量転写されるため、被印刷物の上に印刷形成さ
れたインキパターンには、ピンホール状欠陥などがない
し、膜厚が十分にあり、表面は平滑であるから耐エッチ
ング性が良好となる。
Since the ink is inked at a speed of 100 mm / sec or less, the ink can be reliably supplied to the ink receiving portion whose bottom surface is formed of the silicone resin having a low affinity with the ink. Since the ink thus supplied onto the printing plate is easily peeled off from the silicone resin and transferred to the side of the printing object, the ink pattern printed on the printing object may have pinhole-like defects. Or, since the film thickness is sufficient and the surface is smooth, the etching resistance is good.

【0020】[0020]

【実施例】以下、本発明の実施例を図面に基づいて、さ
らに詳細に説明する。
Embodiments of the present invention will now be described in more detail with reference to the drawings.

【0021】(実施例1)図1に示した第1の実施例で
ある印刷版P1は、砂目立てと電解研摩とが施された板
厚0.24mmのアルミニウム基板1の片側表面に、厚
さ約2μmの感光性樹脂2が線幅30μmのテストパタ
ーンに形成され、さらに、この感光性樹脂2の上に、感
光性樹脂との親和力よりインキ(図示せず)との親和力
の方が低いシリコーン樹脂3が、約5μmの厚さに形成
された構成であり、シリコーン樹脂3の部分がインキ受
容部10として機能する平版である。
(Embodiment 1) A printing plate P1 according to a first embodiment shown in FIG. 1 has a thickness of 0.24 mm on an aluminum substrate 1 which is grained and electropolished. The photosensitive resin 2 having a width of about 2 μm is formed in a test pattern having a line width of 30 μm, and the affinity with the ink (not shown) is lower than the affinity with the photosensitive resin on the photosensitive resin 2. The silicone resin 3 has a thickness of about 5 μm, and the portion of the silicone resin 3 is a planographic plate that functions as the ink receiving portion 10.

【0022】アルミニウム基板1の上に設けたテストパ
ターン状の感光性樹脂2は、例えば厚さ約2μmに感光
性樹脂が塗布された市販のPS版などを用いて、それ自
体は従来周知の露光現像処理によって形成される。
The photosensitive resin 2 in the form of a test pattern provided on the aluminum substrate 1 is, for example, a commercially available PS plate coated with a photosensitive resin having a thickness of about 2 μm. It is formed by development processing.

【0023】また、インキ受容部10の底面となるシリ
コーン樹脂3の配設は、先ず感光性樹脂2で被覆されて
いないアルミニウム基板1の露出部1aを親水化処理
(例えば、富士写真フィルム(株)製EU−3、GU−
7などを表面に塗布したのち水洗)し、水で湿った状態
にする。そして、図2のように、硬化剤を配合した未硬
化のシリコーン樹脂(例えば、東芝シリコーン(株)製
TSE3450など)3aをゴム製のロール4の表面に
5μmの厚さに均一に付け、これを水で湿らせている版
の感光性樹脂2に押し付けて回転させることによって、
感光性樹脂2の表面にのみ厚さ5μmの未硬化のシリコ
ーン樹脂層3bが形成される。
In order to dispose the silicone resin 3 on the bottom surface of the ink receiving portion 10, first, the exposed portion 1a of the aluminum substrate 1 not covered with the photosensitive resin 2 is hydrophilized (for example, Fuji Photo Film Co., Ltd. ) EU-3, GU-
After applying 7 etc. to the surface, it is washed with water) and made wet with water. Then, as shown in FIG. 2, an uncured silicone resin (for example, TSE3450 manufactured by Toshiba Silicone Co., Ltd.) containing a curing agent is uniformly attached to the surface of the rubber roll 4 to a thickness of 5 μm. Is pressed against the photosensitive resin 2 of the plate moistened with water and rotated,
An uncured silicone resin layer 3b having a thickness of 5 μm is formed only on the surface of the photosensitive resin 2.

【0024】そして、これを3時間に渡って130℃に
加熱・保持すると、未硬化のシリコーン樹脂層3bが重
合して、前記構成の印刷版P1が得られる。
When this is heated and held at 130 ° C. for 3 hours, the uncured silicone resin layer 3b is polymerized to obtain the printing plate P1 having the above-mentioned structure.

【0025】この印刷版P1を水で湿らせたのち、図3
のように紫外線硬化型オフセット印刷用のインキ6を付
けたロール5を、例えば100mm/秒の速度で回転さ
せて印刷版P1の表面に接触させると、インキ6がロー
ル5からシリコーン樹脂3を底面とするインキ受容部1
0の側に転移して、ピンホールなどの欠陥のないインキ
層6aが平滑な表面でもって形成されたが、水で湿った
アルミニウム基板1の露出部1aにはインキ6は全く転
移しなかった。
After moistening the printing plate P1 with water, the printing plate P1 shown in FIG.
When the roll 5 to which the ink 6 for UV-curable offset printing is attached is rotated at a speed of, for example, 100 mm / sec and brought into contact with the surface of the printing plate P1, the ink 6 rolls the silicone resin 3 on the bottom surface. Ink receiving part 1
The ink layer 6a was transferred to the side of 0 and was formed with a smooth surface without defects such as pinholes, but the ink 6 was not transferred to the exposed portion 1a of the aluminum substrate 1 wet with water. .

【0026】印刷版P1に形成されたインキ層6aに紫
外線を照射すると、重合が進ことによってインキの凝集
力は強くなり、インキ層6aと印刷版P1との親和力を
大きく上回るようになる。この状態で被印刷物(図示せ
ず)に印刷版P1の印刷面を所定の印圧で押し当て、両
者を引き離すと、インキ層6aは分裂することなく印刷
版P1から引き剥がされて全量が被印刷物の側に転移し
た。
When the ink layer 6a formed on the printing plate P1 is irradiated with ultraviolet rays, the polymerization proceeds to increase the cohesive force of the ink, and the affinity between the ink layer 6a and the printing plate P1 is greatly exceeded. In this state, the printing surface of the printing plate P1 is pressed against a printing material (not shown) with a predetermined printing pressure, and when the two are separated, the ink layer 6a is peeled off from the printing plate P1 without splitting and the entire amount is covered. Transferred to the print side.

【0027】このようにして印刷版P4から被印刷物の
上に転写形成されたインキパターンは、ピンホール状欠
陥などがないのはもちろん、厚みが十分にあり、しかも
表面が平滑であったため、耐エッチング性が極めて良好
であった。
The ink pattern transferred from the printing plate P4 onto the printing material in this manner has no pinhole-like defects, has a sufficient thickness, and has a smooth surface. The etching property was extremely good.

【0028】また、酸化重合型のオフセット印刷用イン
キを、前記ロール5を用いて印刷版P1に供給し、版表
面を180℃の温風に約30秒間曝した時にも、重合の
進展とインキ中の溶剤が揮発することにより、インキの
凝集力が版−インキ間の親和力を大きく上回った。この
ため、この場合も版上のインキは分裂することなく版か
ら全て剥がれ、被印刷物の側に欠陥を伴うことなく転移
した。
Further, when the oxidation polymerization type offset printing ink is supplied to the printing plate P1 by using the roll 5 and the plate surface is exposed to warm air of 180 ° C. for about 30 seconds, the progress of polymerization and the ink Due to the volatilization of the solvent therein, the cohesive force of the ink greatly exceeded the affinity between the plate and the ink. Therefore, in this case as well, the ink on the plate was completely peeled off from the plate without being split, and was transferred to the side of the material to be printed without causing defects.

【0029】(実施例2)図4に示した第2の実施例で
ある印刷版P2は、アルミニウム基板1の片側表面にシ
リコーン樹脂3が所望のテストパターンに形成された構
成であり、この場合はシリコーン樹脂3によって囲われ
たアルミニウム基板1の露出部1aが、インキ受容部1
0として機能する平版である。
(Embodiment 2) A printing plate P2 according to a second embodiment shown in FIG. 4 has a structure in which a silicone resin 3 is formed in a desired test pattern on one surface of an aluminum substrate 1. The exposed portion 1a of the aluminum substrate 1 surrounded by the silicone resin 3 is
It is a lithographic plate that functions as 0.

【0030】上記印刷版P2の一製造法を図5に基づい
て説明する。先ず、前記構成のアルミニウム基板1の片
側に感光性樹脂、例えばポジ型ホトレジスト(ヘキスト
ジャパン(株)製AZLP−10など;図示せず)を1
0μmの厚さに塗布し、これを元に従来周知の露光現像
法を用いて所望のパターンを、前記ホトレジストの未露
光部2Aによって残存形成する。
A method of manufacturing the printing plate P2 will be described with reference to FIG. First, a photosensitive resin such as a positive photoresist (AZLP-10 manufactured by Hoechst Japan Ltd .; not shown) is formed on one side of the aluminum substrate 1 having the above structure.
It is applied to a thickness of 0 μm, and based on this, a desired pattern is left and formed by the unexposed portion 2A of the photoresist by using a conventionally known exposure and development method.

【0031】そして、この残存しているホトレジストの
未露光部2Aに紫外線を照射し、こうして露光されたホ
トレジスト2B上に硬化剤を配合した未硬化のシリコー
ン樹脂(例えば、東芝シリコーン(株)製TSE345
0など)3aを盛り上げ、ホトレジスト2Bの表面に沿
ってドクタリングを行い、ホトレジスト2Bより高く盛
り上がっているシリコーン樹脂3aの余剰分を除去す
る。
Then, the unexposed portion 2A of the remaining photoresist is irradiated with ultraviolet rays, and an uncured silicone resin (for example, TSE345 manufactured by Toshiba Silicone Co., Ltd.) containing a curing agent is applied to the photoresist 2B thus exposed.
0) 3a is raised, and doctoring is performed along the surface of the photoresist 2B to remove the surplus portion of the silicone resin 3a which is raised higher than the photoresist 2B.

【0032】続いて、ホトレジスト用現像液1部と水1
0部とからなる溶液(図示せず)に約30秒間浸漬し、
ホトレジスト2Bの表面に付着している未硬化のシリコ
ーン樹脂3aを除去する。そして、水洗を行ったのち、
静置してシリコーン樹脂3aの硬化を待ち、最後にホト
レジスト2Bを現像液で溶解除去すれば、図4に示した
構成の印刷版P2が得られる。
Subsequently, 1 part of a photoresist developing solution and 1 part of water
Immerse in a solution (not shown) consisting of 0 parts for about 30 seconds,
The uncured silicone resin 3a adhering to the surface of the photoresist 2B is removed. And after washing with water,
By allowing the silicone resin 3a to stand still until it cures, and finally removing the photoresist 2B by dissolution with a developing solution, a printing plate P2 having the configuration shown in FIG. 4 is obtained.

【0033】この印刷版P2においても、前記印刷版P
1と同様にインキイングすることによって、版上に転移
したインキは分裂することなく全量が引き剥がされて被
印刷物の側に転移し、欠陥のないインキパターンが形成
された。
Also in this printing plate P2, the printing plate P
By inking in the same manner as in No. 1, the entire amount of the ink transferred on the plate was peeled off and transferred to the side of the material to be printed without splitting, and a defect-free ink pattern was formed.

【0034】(実施例3)図6に、第3の実施例である
印刷版P3の構造を示している。この印刷版P3は、例
えば0.25mmの鉄基材7の一方の表面に、厚さ0.
3mmの感光性樹脂2が100μmの線幅でテストパタ
ーン状に形成され、この表面にシリコーン樹脂3が2μ
mの厚さに配設されたものであり、このシリコーン樹脂
3の部分がインキ受容部10として機能する凸版であ
る。
(Embodiment 3) FIG. 6 shows the structure of a printing plate P3 according to a third embodiment. This printing plate P3 has, for example, a thickness of 0.
3 mm of photosensitive resin 2 is formed in a test pattern with a line width of 100 μm, and silicone resin 3 of 2 μm is formed on the surface.
The silicone resin 3 is disposed in a thickness of m and is a relief plate that functions as the ink receiving portion 10.

【0035】鉄基材7の上に設けたテストパターン状の
感光性樹脂2は、従来周知の露光現像処理によって形成
される。そして、図7に示すように、硬化剤を配合した
未硬化のシリコーン樹脂(例えば、東芝シリコーン
(株)製YR3365など)3aをゴム製ロール4の表
面に2μmの厚さに均一に付け、これを版表面に押し付
けて数回に渡り転がすことにより、感光性樹脂2の表面
に未硬化のシリコーン樹脂層3bが形成される。これを
3時間に渡って100℃に加熱・保持してシリコーン樹
脂層3bを硬化させると、図6に示した構造の印刷版P
3が得られる。
The test-patterned photosensitive resin 2 provided on the iron base 7 is formed by a conventionally known exposure and development process. Then, as shown in FIG. 7, an uncured silicone resin (for example, YR3365 manufactured by Toshiba Silicone Co., Ltd.) containing a curing agent is uniformly attached to the surface of the rubber roll 4 to a thickness of 2 μm. Is pressed against the surface of the plate and rolled several times to form an uncured silicone resin layer 3b on the surface of the photosensitive resin 2. When this is heated and held at 100 ° C. for 3 hours to cure the silicone resin layer 3b, the printing plate P having the structure shown in FIG.
3 is obtained.

【0036】上記印刷版P3に、図8に示したように、
紫外線硬化型オフセット印刷用のインキ6を付けたロー
ル5を、例えば100mm/秒の速度で回転させて印刷
版P3に接触させると、インキ6はシリコーン樹脂3を
底面とするインキ受容部10に転移してインキ層6aが
形成されたが、鉄基材7の露出部7aにはロール6の表
面が接触しなかったため、この部分へのインキ6の転移
は全くなかった。
On the printing plate P3, as shown in FIG.
When the roll 5 to which the ink 6 for UV-curing type offset printing is attached is rotated at a speed of 100 mm / sec and brought into contact with the printing plate P3, the ink 6 is transferred to the ink receiving portion 10 having the silicone resin 3 as the bottom surface. Then, the ink layer 6a was formed, but since the surface of the roll 6 did not contact the exposed portion 7a of the iron base material 7, there was no transfer of the ink 6 to this portion.

【0037】この印刷版P3に形成されたインキ層6a
に紫外線を照射すると、第1の実施例の場合と同様に重
合が進んでインキの凝集力が強まるので、被印刷物への
転写時にも分裂することがなく、全量が印刷版から引き
剥がされて、無欠陥の状態で被印刷物に転写された。ま
た、酸化重合型のインキの場合も、実施例1と同様に良
好な状態で印刷が実行された。
Ink layer 6a formed on this printing plate P3
When ultraviolet rays are radiated on the ink, the polymerization proceeds and the cohesive force of the ink is strengthened as in the case of the first embodiment. Therefore, the ink does not split even when it is transferred to the printing material, and the entire amount is peeled off from the printing plate. , Was transferred to the printing material in a defect-free state. Also, in the case of the oxidation polymerization type ink, printing was performed in a good state as in Example 1.

【0038】なお、本発明は上記実施例に限定されるも
のではないので、特許請求の範囲記載の趣旨に沿って適
宜の変形実施が可能である。
Since the present invention is not limited to the above-mentioned embodiments, appropriate modifications can be made in accordance with the spirit of the claims.

【0039】例えば、シリコーン樹脂3はインキ受容部
10の底面だけでなくその側面にも配設し、インキが被
印刷物側により転移し易いようにすることも可能であ
る。
For example, the silicone resin 3 can be provided not only on the bottom surface of the ink receiving portion 10 but also on the side surface thereof so that the ink is more easily transferred to the printed material side.

【0040】[0040]

【発明の効果】以上説明したように本発明によれば、プ
リント配線基板・TFT基板・IC基板などに、ピンホ
ール状などの欠陥のない精細なレジストパターンなどを
容易に印刷手法によって形成することが可能であるか
ら、電気回路などをエッチング法によって形成する製作
工程において顕著な効果を奏するものである。
As described above, according to the present invention, it is possible to easily form a fine resist pattern having no defects such as pinholes on a printed wiring board / TFT board / IC board by a printing method. Therefore, it has a remarkable effect in a manufacturing process of forming an electric circuit or the like by an etching method.

【図面の簡単な説明】[Brief description of drawings]

【図1】実施例1で用いた印刷版の説明図。FIG. 1 is an explanatory diagram of a printing plate used in Example 1.

【図2】実施例1で用いた印刷版の製造法の説明図。FIG. 2 is an explanatory view of a method for manufacturing the printing plate used in Example 1.

【図3】実施例1における印刷法の説明図。FIG. 3 is an explanatory diagram of a printing method according to the first embodiment.

【図4】実施例2で用いた印刷版の説明図。FIG. 4 is an explanatory diagram of a printing plate used in Example 2.

【図5】実施例2で用いた印刷版の製造法の説明図。FIG. 5 is an explanatory diagram of a method for manufacturing the printing plate used in Example 2.

【図6】実施例3で用いた印刷版の説明図。FIG. 6 is an explanatory diagram of a printing plate used in Example 3.

【図7】実施例3で用いた印刷版の製造法の説明図。FIG. 7 is an explanatory diagram of a method for manufacturing the printing plate used in Example 3.

【図8】実施例3における印刷法の説明図。FIG. 8 is an explanatory diagram of a printing method according to a third embodiment.

【図9】従来印刷版の説明図。FIG. 9 is an explanatory diagram of a conventional printing plate.

【図10】他の従来印刷版の説明図。FIG. 10 is an explanatory view of another conventional printing plate.

【図11】他の従来印刷版の説明図。FIG. 11 is an explanatory view of another conventional printing plate.

【符号の説明】[Explanation of symbols]

1 アルミニウム基板 1a 露出部 10 インキ受容部 2 感光性樹脂 2a 露出部 2A ホトレジスト(未露光部) 2B ホトレジスト(露光部) 3 シリコーン樹脂 3a シリコーン樹脂(未硬化) 3b シリコーン樹脂層 4・5 ロール 6 インキ 6a インキ層 7 鉄基材 7a 露出部 P1・P2・P3・P4・P5・P6 印刷版 DESCRIPTION OF SYMBOLS 1 Aluminum substrate 1a Exposed part 10 Ink receiving part 2 Photosensitive resin 2a Exposed part 2A Photoresist (unexposed part) 2B Photoresist (exposed part) 3 Silicone resin 3a Silicone resin (uncured) 3b Silicone resin layer 4/5 roll 6 Ink 6a Ink layer 7 Iron substrate 7a Exposed part P1, P2, P3, P4, P5, P6 Printing plate

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 インキ受容部の底面がシリコーン樹脂に
よって形成されたことを特徴とする印刷版。
1. A printing plate comprising a bottom surface of an ink receiving portion made of a silicone resin.
【請求項2】 インキ受容部の底面がシリコーン樹脂に
よって形成された印刷版に、100mm/秒以下の速度
でインキングした後、このインキを転移させて印刷する
ことを特徴とする印刷方法。
2. A printing method comprising inking a printing plate having a bottom surface of an ink receiving portion made of a silicone resin at a speed of 100 mm / sec or less, and then transferring the ink for printing.
JP15258493A 1993-06-01 1993-06-01 Printing plate and printing method Pending JPH06340053A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15258493A JPH06340053A (en) 1993-06-01 1993-06-01 Printing plate and printing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15258493A JPH06340053A (en) 1993-06-01 1993-06-01 Printing plate and printing method

Publications (1)

Publication Number Publication Date
JPH06340053A true JPH06340053A (en) 1994-12-13

Family

ID=15543661

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15258493A Pending JPH06340053A (en) 1993-06-01 1993-06-01 Printing plate and printing method

Country Status (1)

Country Link
JP (1) JPH06340053A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100957618B1 (en) * 2009-11-17 2010-05-13 디씨피 (주) Display coating plate
CN104284521A (en) * 2013-07-05 2015-01-14 Si弗莱克斯有限公司 Composite coating shielding method using ink detachment type
CN105813393A (en) * 2016-03-21 2016-07-27 东莞美维电路有限公司 Fabrication method of selective gold deposition plate

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100957618B1 (en) * 2009-11-17 2010-05-13 디씨피 (주) Display coating plate
CN104284521A (en) * 2013-07-05 2015-01-14 Si弗莱克斯有限公司 Composite coating shielding method using ink detachment type
CN104284521B (en) * 2013-07-05 2017-06-16 Si弗莱克斯有限公司 Using the composite deposite masking methods of exfoliated ink
CN105813393A (en) * 2016-03-21 2016-07-27 东莞美维电路有限公司 Fabrication method of selective gold deposition plate

Similar Documents

Publication Publication Date Title
EP0402942B1 (en) Method of printing fine patterns
US3511178A (en) Printing plate and method
US9023591B2 (en) Inkjet printable flexography substrate and method of using
US20180004081A1 (en) Printable Laminates for Flexo Plates, Methods of Making, and Methods of Using
JPH0511445A (en) Photosensitive recording element
US3682633A (en) Color proofing method
JPH04249189A (en) Method for forming fine regist pattern
US9174480B2 (en) Inkjet-printable flexography substrate, method of making, and method of using
JPH06340053A (en) Printing plate and printing method
JPH03280416A (en) Resist pattern forming method
JPH0647895A (en) Precise printing method and precise printer
US4396284A (en) Apparatus for making lithographic printing plates
JPH0319889A (en) Printing method of very fine patterns
US4338007A (en) Apparatus and process for making lithographic printing plate with reinforced image
JP3376618B2 (en) Intaglio production method
JP2935851B2 (en) Fine pattern printing method
JP2001129960A (en) Method for obtaining heat sensitive element by spraying coating
JPH07195810A (en) Offset printing
US4334769A (en) Apparatus for making a lithographic printing plate with reinforced image
US4451145A (en) Apparatus and process for making lithographic printing plate with reinforced image
JP2007083645A (en) Manufacturing method for blanket, and method and apparatus for forming pattern
JPH0834156A (en) Printing plate and printing method
JPH10511478A (en) Waterless lithographic plate manufacturing method
CN110027305A (en) A kind of method that resin liner is applied to single recessed machine printing
JPS61256686A (en) Conductive circuit board and manufacture thereof