JPH06335932A - Manufacture of cast film - Google Patents

Manufacture of cast film

Info

Publication number
JPH06335932A
JPH06335932A JP12604093A JP12604093A JPH06335932A JP H06335932 A JPH06335932 A JP H06335932A JP 12604093 A JP12604093 A JP 12604093A JP 12604093 A JP12604093 A JP 12604093A JP H06335932 A JPH06335932 A JP H06335932A
Authority
JP
Japan
Prior art keywords
cast film
solvent
soln
solution
polymer material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12604093A
Other languages
Japanese (ja)
Inventor
Toshiaki Yatabe
俊明 谷田部
Aritami Yonemura
有民 米村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Teijin Ltd
Original Assignee
Teijin Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Teijin Ltd filed Critical Teijin Ltd
Priority to JP12604093A priority Critical patent/JPH06335932A/en
Publication of JPH06335932A publication Critical patent/JPH06335932A/en
Pending legal-status Critical Current

Links

Landscapes

  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Moulding By Coating Moulds (AREA)

Abstract

PURPOSE:To obtain a cast film with a high leveling condition, excellent flatness, no fine air bubble, excellent appearance, extremely less residual solvent and excellent mechanical properties by performing efficiently solvent evaporation from the inside of the cast film and a polymer soln. CONSTITUTION:In a method for manufacturing a cast film wherein after a soln, of a polymer material is applied on a substrate for the case film, the applied soln. is dried and the solvent in the soln. is removed, the polymer material soln. applied on the substrate is irradiated with IR rays to dry the applied soln. As the IR rays to be irradiated, such IR rays which have wave length being higher absorption factor in the solvent substance than in the polymer material in the soln.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、キャストフイルムの製
造方法に関し、さらに詳しくは、平滑性、厚み精度、透
明性に優れ外観欠点のない優れたキャストフイルムを生
産性良く製造する方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a cast film, and more particularly to a method for producing an excellent cast film which is excellent in smoothness, thickness accuracy and transparency and has no appearance defect with high productivity.

【0002】[0002]

【従来技術】高分子重合体材料から薄葉フイルムを製造
する方法として、高分子材料を溶媒に溶かした溶液を支
持体の表面に流延して、溶媒分を蒸発せしめるキャスト
製膜方法がある。この方法で得られた高分子重合体フイ
ルムを、キャストフイルムという。
2. Description of the Related Art As a method for producing a thin film from a polymer material, there is a cast film forming method in which a solution of a polymer material in a solvent is cast on the surface of a support to evaporate the solvent component. The polymer film obtained by this method is called a cast film.

【0003】従来、このキャストフイルムの製造方法に
は、プラスチックフイルムや金属製のエンドレスベルト
等の支持体上に、高分子重合体の溶液(以下高分子溶液
と略記)を塗布し、熱風等により加熱された乾燥ゾーン
中を通過させることによって、また補助的手段として支
持体を加熱乾燥させることによって溶媒を蒸散せしめ、
次いで製膜されたキャストフイルムを支持体から分離す
る方法があった。
Conventionally, in the method for producing a cast film, a polymer polymer solution (hereinafter abbreviated as polymer solution) is applied onto a support such as a plastic film or a metal endless belt, and then heated with air or the like. Evaporating the solvent by passing through a heated drying zone and by heat drying the support as an auxiliary means,
Then, there was a method of separating the film-formed cast film from the support.

【0004】[0004]

【発明が解決しようとする課題】従来の方法で製造した
キャストフイルムの物性は、同一の高分子重合体であっ
ても、使用する溶媒の種類、溶媒の蒸散速度(乾燥条
件)、流延条件(温湿度、高分子溶液濃度、ダイ/ベル
ト間精度等)、および熱処理条件加熱方法、張力等)等
によって著しい影響を受けるという課題を有する。
The physical properties of the cast film produced by the conventional method are as follows: even if they are the same polymer, the type of solvent used, the evaporation rate of the solvent (drying conditions), and the casting conditions. (Temperature and humidity, concentration of polymer solution, accuracy between die / belt, etc.), heat treatment condition heating method, tension, etc.) and the like.

【0005】特に乾燥条件と熱処理条件は、溶媒の蒸散
速度と残留溶媒濃度を支配しキャストフイルムの平坦
性、微小気泡等の外観欠点および機械特性に大きな影響
を与えるという課題を有する。
Particularly, the drying condition and the heat treatment condition have a problem that they govern the evaporation rate of the solvent and the concentration of the residual solvent, and have a great influence on the flatness of the cast film, appearance defects such as microscopic bubbles and mechanical properties.

【0006】本発明はかかる課題を解決したキャストフ
イルムの製造方法を得ることを目的とする。すなわち、
高分子溶液およびキャストフイルム内部からの溶媒蒸散
を効率的に行いレベリング状態の良い平坦性に優れ、微
小気泡が無く外観特性に優れ、また残留溶媒の極めて少
なく、機械特性の優れたキャストフイルムの製造方法を
得ることを目的とする。
An object of the present invention is to obtain a method for producing a cast film which solves the above problems. That is,
Efficient solvent evaporation from the polymer solution and the inside of the cast film, excellent leveling and flatness, excellent appearance characteristics without micro bubbles, extremely low residual solvent, and production of cast film with excellent mechanical properties Aim to get a way.

【0007】[0007]

【課題を解決するための手段】本発明にかかるキャスト
フイルムの製造方法は、高分子重合体材料の溶液をキャ
ストフイルム用の支持体上に塗布した後、塗布した溶液
を乾燥させて溶液中の溶媒分を除去してキャストフイル
ムを製造する方法において、塗布した溶液を乾燥させる
ために、支持体上に塗布した高分子重合体材料溶液に赤
外線を照射するものであって、かつ照射する赤外線とし
ては溶液中の高分子重合体材料よりも溶媒物質での吸収
率が高い波長の赤外線を用いることを特徴としている。
The method for producing a cast film according to the present invention comprises a step of applying a solution of a polymer material on a support for a cast film, and then drying the applied solution. In the method for producing a cast film by removing the solvent component, in order to dry the applied solution, the high molecular polymer material solution applied on the support is irradiated with infrared rays, and Is characterized by using infrared light having a wavelength having a higher absorptivity in a solvent substance than in a polymer material in a solution.

【0008】例えばポリカーボネートを主成分とする高
分子重合体からなるキャストフイルムを得るには、塗布
溶液の溶媒としては通常はメチレンクロライドが使用さ
れる。
For example, in order to obtain a cast film composed of a polymer having polycarbonate as a main component, methylene chloride is usually used as a solvent for the coating solution.

【0009】このメチレンクロライドにおける光の吸収
率は、波長約7.9μmを中心にして波長幅0.1μm
程の範囲で吸収率の鋭いピークと、波長約13.5μm
を中心に波長幅1μm程の範囲で吸収率のピークを有
し、それ以外の波長での吸収率はごくわずかなものとな
っている。一方ポリカーボネートは、波長約13.5μ
mを中心にした波長幅1μm程の範囲での光の吸収率は
少ない。
The absorption rate of light in this methylene chloride has a wavelength width of 0.1 μm with a wavelength of about 7.9 μm as the center.
A sharp peak of absorptivity and a wavelength of about 13.5 μm
There is a peak of absorptance in the range of about 1 μm in wavelength width centering on, and the absorptance at other wavelengths is extremely small. On the other hand, polycarbonate has a wavelength of about 13.5μ.
The absorption rate of light is small in a wavelength range of about 1 μm centering on m.

【0010】そこで、波長約13.5μmを中心に波長
幅1μm程の範囲に強度ピークをもつ波長選択された赤
外線を、この塗布溶液に照射すれば、選択的にメチレン
クロライドの加熱を行うことができる。
Therefore, by irradiating the coating solution with infrared rays having a wavelength peak of about 13.5 μm and having an intensity peak in the range of about 1 μm, the methylene chloride can be selectively heated. it can.

【0011】この効果により内部から効果的にメチレン
クロライドの蒸発を促進させ、表面の硬化スキン層の形
成を抑制せしめたレベリング効果の高い加熱乾燥を行う
ことができる。この効果は溶媒の蒸発領域のみならず拡
散領域においても有効でありキャストフイルムの最終残
留溶媒を効果的に減少せしめることができる。
Due to this effect, evaporation of methylene chloride can be effectively promoted from the inside, and heating and drying with a high leveling effect, which suppresses the formation of a hardened skin layer on the surface, can be carried out. This effect is effective not only in the evaporation region of the solvent but also in the diffusion region, and the final residual solvent of the cast film can be effectively reduced.

【0012】また、テトラヒドロフランを溶媒とする場
合には3.5μm、9.3μmおよび10.8μmのい
ずれかの吸収波長を、1,4―ジオキサンを溶媒とする
場合には11.5μm、16μmのいずれか吸収波長を
1.3―ジオキソランを溶媒とする場合には3.5μ
m、10.8μmの吸収波長を利用することにより同じ
効果を期待することができる。
Further, when tetrahydrofuran is used as a solvent, absorption wavelengths of 3.5 μm, 9.3 μm and 10.8 μm are used, and when 1,4-dioxane is used as a solvent, absorption wavelengths of 11.5 μm and 16 μm are used. 3.5 μ when either absorption wavelength is 1.3-dioxolane as solvent
The same effect can be expected by utilizing the absorption wavelength of m and 10.8 μm.

【0013】この様に本発明の目的を達成するために
は、キャストフイルムを形成する高分子重合体での吸収
が少なく、高分子溶液を構成する溶媒に吸収を有する特
定波長の赤外線をキャストフイルムの乾燥手段としてあ
るいは乾燥補助手段として用いることにより達成するこ
とができる。この方法はここに例示したポリカーボネー
ト樹脂以外に通常キャスト法で製膜されるセルローステ
リアセテート樹脂、ポリイミド樹脂、ポリアリレート樹
脂等にも適用することができる。
As described above, in order to achieve the object of the present invention, a cast film is used to cast infrared rays of a specific wavelength, which has a low absorption in the polymer forming the cast film and has an absorption in the solvent forming the polymer solution. Can be achieved by using it as a drying means or as a drying auxiliary means. This method can be applied to not only the polycarbonate resin exemplified here but also a cellulose teriacetate resin, a polyimide resin, a polyarylate resin, etc. which are usually formed by a casting method.

【0014】この方法を適用する場合キャストフイルム
を得ようとする高分子重合体の赤外吸収が少ない領域に
大きな吸収を有する溶媒を選択することが好ましい効果
が得られる。
When this method is applied, it is preferable to select a solvent having a large absorption in the region where the infrared absorption of the high molecular polymer to obtain the cast film is small.

【0015】[0015]

【実施例1】塗布溶液としては、メチレンクロライドが
50部、テトラヒドロフランが35部、そしてポリカー
ボネート樹脂が15部からなるものを用いた。
Example 1 As a coating solution, 50 parts of methylene chloride, 35 parts of tetrahydrofuran and 15 parts of polycarbonate resin were used.

【0016】この高分子溶液を、吐出巾1000mmの
キャスティングダイから、連続的にステンレス鏡面ベル
トの上にウェット厚み500μmとなる様に流延し、1
m/分のベルト速度で乾燥ゾーンの中を通した。
This polymer solution was continuously cast from a casting die having a discharge width of 1000 mm onto a stainless steel mirror belt so as to have a wet thickness of 500 μm.
It was passed through the drying zone at a belt speed of m / min.

【0017】第1乾燥ゾーンの温度は、メチレンクロラ
イドの沸点40℃よりも低い温度設定とし、風速は0.
1m/秒以下の雰囲気中で、波長10.8μmの炭酸ガ
スレーザーを照射した。しかる後、連続的につながる乾
燥ゾーンで昇温加熱し、ベルトから剥離してポリカーボ
ネートのキャスティングフイルムを製造した。
The temperature of the first drying zone is set to a temperature lower than the boiling point of 40 ° C. of methylene chloride, and the air velocity is 0.
The carbon dioxide gas laser having a wavelength of 10.8 μm was irradiated in an atmosphere of 1 m / sec or less. After that, the temperature was raised and heated in a continuously connected drying zone, and peeled from the belt to produce a polycarbonate casting film.

【0018】こうして得られたフイルムの残留溶媒濃度
は、7%であった。剥離後125℃の温度で30分乾燥
させたフイルム厚みは、50μm±1μm以下であっ
た。さらに、表面粗さ計反射法で見る表面平坦性は非常
に良好であった。
The residual solvent concentration of the film thus obtained was 7%. After peeling, the film thickness after drying at a temperature of 125 ° C. for 30 minutes was 50 μm ± 1 μm or less. Further, the surface flatness seen by the surface roughness meter reflection method was very good.

【0019】[0019]

【比較例1】塗布溶液としては、実施例1と同じ高分子
溶液を用いた。そして炭酸ガスレーザの照射を行わない
以外は、実施例1と同じ条件でキャスティングフイルム
を製造した。
Comparative Example 1 The same polymer solution as in Example 1 was used as the coating solution. Then, a casting film was manufactured under the same conditions as in Example 1 except that the carbon dioxide laser irradiation was not performed.

【0020】こうして得られたフイルムの残留溶媒濃度
は、15%であった。さらに実施例1と同一条で乾燥さ
せたフイルム厚みは、50μm±2μmであった。さら
に表面粗さ計、反射法で見る表面平坦性も実施例1より
悪くサザ波上の表面であった。
The residual solvent concentration of the film thus obtained was 15%. Further, the thickness of the film dried on the same strip as in Example 1 was 50 μm ± 2 μm. Further, the surface flatness seen by a surface roughness meter and a reflection method was worse than that in Example 1, and the surface was on a rough wave.

【0021】[0021]

【発明の効果】実施例1と比較例1の具体的例示に示し
た様に、本発明を適用することにより、非常に遅い風速
条件の乾燥ゾーンにおいて、効率的に溶媒蒸発を可能と
ならしめ、風に乱されることなくレベリングの良いかつ
残留溶媒の少いキャストフイルムを得ることができる。
As shown in the concrete examples of Example 1 and Comparative Example 1, by applying the present invention, it is possible to efficiently evaporate the solvent in the drying zone under a very low wind speed condition. It is possible to obtain a cast film having good leveling and less residual solvent without being disturbed by wind.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】高分子重合体材料の溶液をキャストフイル
ム用の支持体上に塗布した後、塗布した溶液を乾燥させ
て溶液中の溶媒分を除去してキャストフイルムを製造す
る方法において、塗布した溶液を乾燥させるために、支
持体上に塗布した高分子重合体材料溶液に赤外線を照射
するものであって、かつ照射する赤外線としては溶液中
の高分子重合体材料よりも溶媒物質での吸収率が高い波
長の赤外線を用いることを特徴とするキャストフイルム
の製造方法。
1. A method for producing a cast film by applying a solution of a high molecular weight polymer material on a support for cast film and then drying the applied solution to remove the solvent component in the solution. To irradiate the high molecular polymer material solution coated on the support with infrared rays in order to dry the solution, and the infrared ray to be irradiated is a solvent substance rather than the high molecular polymer material in the solution. A method for producing a cast film, which comprises using infrared rays having a high absorption rate.
JP12604093A 1993-05-27 1993-05-27 Manufacture of cast film Pending JPH06335932A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12604093A JPH06335932A (en) 1993-05-27 1993-05-27 Manufacture of cast film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12604093A JPH06335932A (en) 1993-05-27 1993-05-27 Manufacture of cast film

Publications (1)

Publication Number Publication Date
JPH06335932A true JPH06335932A (en) 1994-12-06

Family

ID=14925178

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12604093A Pending JPH06335932A (en) 1993-05-27 1993-05-27 Manufacture of cast film

Country Status (1)

Country Link
JP (1) JPH06335932A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20150035444A (en) * 2013-09-27 2015-04-06 후지필름 가부시키가이샤 Solution film forming method and facility
JP2015085680A (en) * 2013-09-27 2015-05-07 富士フイルム株式会社 Solution film-making method and installation
WO2015083839A1 (en) * 2013-12-06 2015-06-11 東レ・ダウコーニング株式会社 Silicone resin sheet, method for producing same, and semiconductor device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20150035444A (en) * 2013-09-27 2015-04-06 후지필름 가부시키가이샤 Solution film forming method and facility
JP2015085680A (en) * 2013-09-27 2015-05-07 富士フイルム株式会社 Solution film-making method and installation
TWI647084B (en) * 2013-09-27 2019-01-11 富士軟片股份有限公司 Solution film forming method and equipment
WO2015083839A1 (en) * 2013-12-06 2015-06-11 東レ・ダウコーニング株式会社 Silicone resin sheet, method for producing same, and semiconductor device

Similar Documents

Publication Publication Date Title
US4878973A (en) Process for producing a thin resin film
WO2009110152A1 (en) Transparent resin plate and method for producing the same
DE69913982D1 (en) METHOD FOR PRODUCING METAL SHEETS
ATE186240T1 (en) METHOD FOR PRODUCING A PLAIN SUPPORT MATERIAL COATED WITH A UV-CURED PAINT
CN111438859A (en) Patterned nano array template and preparation method and application thereof
JPH06335932A (en) Manufacture of cast film
EP1027702B1 (en) A method of manufacturing a stamper for producing optical discs, a stamper thus obtained and an optical disc obtained by using such a stamper
JP5697309B2 (en) Method for manufacturing localized plasmon resonance sensor
JP2009276511A (en) Antireflection resin and production method of the same
Woodward et al. Micropatterning of plasma fluorinated super-hydrophobic surfaces
JPS5917656B2 (en) Pattern formation method
US5308567A (en) Method for the preparation of a resin membrane
JPH11320671A (en) Manufacture of and device for stretched film
US2203596A (en) Process for the manufacture of transparent foils, films, and threads of cellulose formate
JPH05193052A (en) Cellulose ester laminated film and production thereof
KR102212483B1 (en) Nanoimprint based plasmonic surface fabrication process for optical amplification of NIR specific wavelengths band
RU2081001C1 (en) Method of decorating surface manufacture
JPS58104674A (en) Method of making light-permeable film having rugged surface
JPH0317902B2 (en)
JP2007160603A (en) Manufacturing method of mold for molding optical member
Chichkov et al. Direct-write micro-and nanostructuring with femtosecond lasers
JPH0623330A (en) Method for cleaning glass matrix
JPH05317797A (en) Rotary coating
JPH0889770A (en) Production of gas separation membrane
JPH0365274A (en) Manufacture of coated paper