JPH06331536A - Evaluation test method of contact property of ceramic thin film - Google Patents

Evaluation test method of contact property of ceramic thin film

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Publication number
JPH06331536A
JPH06331536A JP13930193A JP13930193A JPH06331536A JP H06331536 A JPH06331536 A JP H06331536A JP 13930193 A JP13930193 A JP 13930193A JP 13930193 A JP13930193 A JP 13930193A JP H06331536 A JPH06331536 A JP H06331536A
Authority
JP
Japan
Prior art keywords
thin film
ceramic thin
test piece
test
crack
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP13930193A
Other languages
Japanese (ja)
Inventor
Hiroshi Imawaka
寛 今若
Hatsuo Taira
初雄 平
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Steel Corp
Original Assignee
Nippon Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Steel Corp filed Critical Nippon Steel Corp
Priority to JP13930193A priority Critical patent/JPH06331536A/en
Publication of JPH06331536A publication Critical patent/JPH06331536A/en
Withdrawn legal-status Critical Current

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Abstract

PURPOSE:To simply evaluate the contact property of a ceramic thin film formed on the surface of a metal matrix by a method wherein the center of a test piece is impacted and bent at a prescribed angle to produce cracks in the ceramic thin film and its production range is measured. CONSTITUTION:A test piece 1 on which a ceramic thin film 2 is formed is impacted within a range in which a test-piece preform is not broken down, and the contact property of the thin film 2 can be evaluated. The less the thin film 2 is exfoliated or a crack 3 is produced the better the contact property of the thin film 2 is. The bend angle of the test piece 1 is desirably 2 to 8 deg. when the test piece 1 on which the thin film 2 is formed on the blow side is used. The damaged situation of the thin film 2 in the crack production region 3 produced around the blow center 4 of the test piece 1 after a test is observed by the naked eye of by using an optical microscope, and the production range L of the crack and the interval of cracks as required are measured. The dispersion of measurements which have been repeated 10 times under individual conditions is small at 10% or lower with reference to the individual mean values.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、金属母材表面に成膜し
たセラミック薄膜の密着性評価試験法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an adhesion evaluation test method for a ceramic thin film formed on the surface of a metal base material.

【0002】[0002]

【従来の技術】薄膜の静的な密着性評価試験法としては
オーム社、薄膜ハンドブック1983に薄膜に関する付
着状態を測定する方法が述べられており、薄膜の強度が
大きい場合には直接法が採用され、そのなかには後述す
る、引っかき法をはじめ、超音波法、電磁引っ張り法レ
ーザー破砕法、摩擦法、熱的方法、圧痕法、剪断法、折
り曲げ法などがある。
2. Description of the Related Art As a static adhesion evaluation test method for a thin film, a method for measuring the adhesion state of the thin film is described in Ohm Co., Ltd., Thin Film Handbook 1983. When the strength of the thin film is large, the direct method is adopted. Among them, there are a scratch method, an ultrasonic method, an electromagnetic pulling method, a laser crushing method, a friction method, a thermal method, an indentation method, a shearing method, and a bending method, which will be described later.

【0003】前記ハンドブックの329ページには引っ
かき法(scrach test)に関する記述があ
り、硬い針(stylus)を薄膜に垂直に押しつけて
荷重をかけて動かし、引っかきによって薄膜を基板から
ひきはがす方法について述べてある。
[0003] On page 329 of the above handbook, there is a description about the scratch test, which describes a method of pressing a stylus vertically against the thin film to apply a load, and then peeling the thin film from the substrate by scratching. There is.

【0004】この方法においては、表面に薄膜を成膜し
た基板に対して、垂直に針を押しつけた状態で横方向に
移動させるため、針による基板の窪み(indenta
tion)の縁の部分に大きな剪断応力がかかり、そこ
で剥離が進行する。
In this method, the needle is pressed vertically against the substrate having the thin film formed on its surface to move in the lateral direction, so that the indentation of the substrate by the needle (indenta).
A large shear stress is applied to the edge part of the section, and the peeling progresses there.

【0005】この方法で用いられる針は鋼、ダイアモン
ドなどの先端の曲率半径のわかったものが用いられる。
The needle used in this method is made of steel, diamond, or the like whose tip has a known radius of curvature.

【0006】付着の大きさを表すのに、普通は引っかき
傷をつくることの出来る荷重の値(g)をそのまま表示
することが多いが、物理的に意味のある値を求める必要
のあるときは、下記の式(1)、(2)により、窪みの
縁における剪断応力値fs(kg/mm2)を計算する。
In order to show the size of the adhesion, the load value (g) that can make a scratch is usually displayed as it is, but when it is necessary to obtain a physically meaningful value. The shear stress value f s (kg / mm 2 ) at the edge of the depression is calculated by the following equations (1) and (2).

【0007】[0007]

【数1】fs=aP/(r2―a21/2 ・・・(1)## EQU1 ## f s = aP / (r 2 −a 2 ) 1/2 (1)

【0008】[0008]

【数2】a=(W/πP)1/2 ・・・(2)[Formula 2] a = (W / πP) 1/2 (2)

【0009】r:針の先端の曲率半径(mm) P:針の先での静圧〜基板のブリネル硬度(kg/mm
2) W:針に加えられた荷重(kg) π:円周率
R: radius of curvature of tip of needle (mm) P: static pressure at tip of needle to Brinell hardness of substrate (kg / mm)
2 ) W: Load applied to the needle (kg) π: Circularity

【0010】[0010]

【発明が解決しようとする課題】従来技術は上記方法に
より薄膜の密着性を評価しているが、剥離開始位置を判
定する場合、光学顕微鏡等によりスクラッチ痕を詳細に
観察し、剥離開始位置を判定し、その位置の圧痕幅を測
定する必要がある。
The prior art evaluates the adhesion of the thin film by the above method, but when determining the peeling start position, the scratch mark is observed in detail by an optical microscope or the like to determine the peeling start position. It is necessary to judge and measure the indentation width at that position.

【0011】その際、剥離パターンは一様でないため、
剥離開始位置の特定には主観がはいり、測定データのば
らつきの原因となり易い。
At this time, since the peeling pattern is not uniform,
Identification of the peeling start position is subjectivity and tends to cause variations in measurement data.

【0012】その繁雑さを回避するため、スクラッチ試
験中の荷重変化の微分値から剥離開始位置を読み取った
り、連続記録したチャートから読み取る場合でも荷重変
化パターンが必ずしも明瞭でないため、測定データのば
らつきが大きかった。
In order to avoid the complexity, even if the peeling start position is read from the differential value of the load change during the scratch test, or the load change pattern is not always clear even when read from the continuously recorded chart, there is a variation in the measured data. It was great.

【0013】本発明の目的は、金属母材表面に成膜した
セラミック薄膜の密着性を簡便に評価する試験法を提供
することにある。
An object of the present invention is to provide a test method for easily evaluating the adhesion of a ceramic thin film formed on the surface of a metal base material.

【0014】[0014]

【課題を解決するための手段】本発明は、前記課題を解
決するために、金属母材の表面にセラミック薄膜を成膜
した試験片の長手方向中央部において短辺と平行にナイ
フエッジ状の衝撃を付与し、前記試験片を所定角度に曲
げて前記セラミック薄膜にクラックを発生させ、該クラ
ックの発生範囲を測定することによってセラミック薄膜
の密着性を評価することを特徴とするセラミック薄膜の
密着性評価試験法である。
In order to solve the above problems, the present invention provides a knife-edge-shaped test piece in which the ceramic thin film is formed on the surface of a metal base material in the central portion in the longitudinal direction in parallel with the short side. Adhesion of ceramic thin film characterized by evaluating the adhesion of the ceramic thin film by applying an impact, bending the test piece at a predetermined angle to generate a crack in the ceramic thin film, and measuring the range of occurrence of the crack. It is a sex evaluation test method.

【0015】発生するクラック幅は測定精度をよくする
ためには、クラック幅は広いほうが望ましいが、他方、
母材を大きく曲げると試験時に母材が破断し、試験部分
の薄膜の剥離や試験片破断、飛散時の衝撃によるセラミ
ック薄膜の二次損傷によって誤差が大きくなるので、母
材が破断しない範囲で、発生するクラックの範囲を適宜
選択すればよい。
The crack width is preferably wide in order to improve the measurement accuracy, but
If the base material is bent greatly, the base material will break during the test, and the error will increase due to peeling of the thin film in the test part, breakage of the test piece, and secondary damage to the ceramic thin film due to the impact during scattering. The range of the generated cracks may be appropriately selected.

【0016】[0016]

【作用】以下、本発明を詳細に説明する。The present invention will be described in detail below.

【0017】衝撃試験により試験片の母材が変形する
と、それに伴い試験片の表面に成膜されたセラミック薄
膜も母材の変形に応じて変形し、材料強度を超えると破
断にいたる。
When the base material of the test piece is deformed by the impact test, the ceramic thin film formed on the surface of the test piece is also deformed according to the deformation of the base material, and if the material strength is exceeded, the ceramic thin film is broken.

【0018】ここで、母材表面に成膜したセラミック薄
膜側から母材側に向って衝撃部分であるハンマーが衝突
する場合について説明する。
Here, a case where a hammer, which is an impact portion, collides from the ceramic thin film side formed on the surface of the base material toward the base material will be described.

【0019】ハンマーの衝突によって、母材がハンマー
の進行方向に変形すると、セラミック薄膜は母材の変形
に応じてセラミック薄膜内の母材側には引張応力が、外
表面側には圧縮応力を生ずる。
When the base material is deformed in the traveling direction of the hammer due to the impact of the hammer, the ceramic thin film exerts a tensile stress on the base material side in the ceramic thin film and a compressive stress on the outer surface side in accordance with the deformation of the base material. Occurs.

【0020】それぞれの応力がセラミック薄膜の材料強
度を超えると破断する。ハンマーの衝突により永久変形
するほどの外力が試験片に加わると、試験片は変形量が
最大になった後、弾性変形が開放されて永久変形がのこ
る。
When each stress exceeds the material strength of the ceramic thin film, it breaks. When an external force that is permanently deformed by a hammer collision is applied to the test piece, the test piece reaches the maximum deformation amount, and then the elastic deformation is released to allow the permanent deformation.

【0021】衝撃試験後の試験片表面のセラミック薄膜
にクラックを生ずるのは、前記の発生応力により、部分
的に膜の割れまたは剥離を生じ、これが前記の弾性変形
の開放によりクラックの幅を広くするものと考えられ
る。
The reason why the ceramic thin film on the surface of the test piece after the impact test is cracked is that the generated stress causes partial cracking or peeling of the film, which widens the crack due to the release of the elastic deformation. It is supposed to do.

【0022】また、母材が曲がった場合、母材とセラミ
ック薄膜の弾性率に差があると、母材とセラミック薄膜
の界面に剪断応力を生じ、その値が剪断強度を超えると
セラミック薄膜が剥離する。
When the base material is bent and there is a difference in elastic modulus between the base material and the ceramic thin film, shear stress is generated at the interface between the base material and the ceramic thin film, and when the value exceeds the shear strength, the ceramic thin film is formed. Peel off.

【0023】この剥離によって、周囲に生じていた応力
のうち、前記の剥離に伴うエネルギーに相当する部分が
開放される。
By this peeling, of the stress generated in the surroundings, the portion corresponding to the energy accompanying the peeling is released.

【0024】このように、母材とセラミック薄膜の剥離
は母材の曲がりのみならず、母材とセラミック薄膜の弾
性変形能の差によっても生ずるが、セラミック薄膜の剥
離あるいはクラックの発生がないものほどセラミック薄
膜の密着性に優れると言える。
As described above, the peeling of the base material and the ceramic thin film is caused not only by the bending of the base material but also by the difference in elastic deformability of the base material and the ceramic thin film, but the peeling or cracking of the ceramic thin film does not occur. It can be said that the better the adhesion of the ceramic thin film is.

【0025】本発明の試験法において、衝撃試験機とし
てシャルピー衝撃試験機を、試験形状としてシャルピー
試験片またはJIS標準曲げ試験片を用い、セラミック
薄膜を成膜した試験片にハンマーによって衝撃を付与す
ることが好ましい。
In the test method of the present invention, a Charpy impact tester is used as an impact tester, a Charpy test piece or a JIS standard bending test piece is used as a test shape, and a shock is applied to a test piece on which a ceramic thin film is formed by a hammer. It is preferable.

【0026】以上のように、本発明の方法によれば、試
験片の母材が破断しない範囲でセラミック薄膜を成膜し
た試験片に衝撃を与えることにより、セラミック薄膜の
密着性を評価できる。
As described above, according to the method of the present invention, the adhesion of the ceramic thin film can be evaluated by applying an impact to the test film on which the ceramic thin film is formed within the range where the base material of the test piece is not broken.

【0027】本発明による試験片の曲げ角度は打撃側に
セラミック薄膜を成膜した試験片を用いる場合、試験片
の曲げ角度は2度〜8度が望ましい。2度未満である
と、試験部のセラミック薄膜に生ずるクラック幅が小さ
く、測定ばらつきが大きくなる。
The bending angle of the test piece according to the present invention is preferably 2 to 8 degrees when the test piece having the ceramic thin film formed on the striking side is used. If it is less than 2 degrees, the crack width generated in the ceramic thin film in the test portion is small and the measurement variation is large.

【0028】また、8度を超えると試験部のセラミック
薄膜、特に打撃部の直撃を受けた部分のセラミック薄膜
の損傷が激しく、クラックの発生状況が判定できなかっ
たり、あるいは金属母材の衝撃値によっては、試験片が
破断し、打撃部付近のセラミック薄膜が剥離脱落するの
で、セラミック薄膜の損傷状況を観察できなくなること
がある。
If it exceeds 8 degrees, the ceramic thin film of the test part, especially the ceramic thin film of the part directly hit by the striking part, is severely damaged, and it is not possible to judge the state of crack occurrence, or the impact value of the metal base material. In some cases, the test piece breaks, and the ceramic thin film near the striking portion peels off. Therefore, it may not be possible to observe the damage state of the ceramic thin film.

【0029】なお、本発明に用いる試験片の曲げ角度を
2度〜8度とするためには、予め、母材のみからなる試
験片を用いて衝撃付与試験を行い、適宜母材の特性に応
じた衝撃荷重を与えればよい。
In order to set the bending angle of the test piece used in the present invention to 2 to 8 degrees, an impact applying test is performed in advance using a test piece made of only the base material, and the characteristics of the base material are appropriately determined. An appropriate impact load should be applied.

【0030】[0030]

【実施例】予め、3×4×40mmのJIS標準曲げ試
験片サイズで、SKD11製金属母材のみからなる試験
片を用いて4×40mmの面に衝撃荷重を与える衝撃試
験を行い、ハンマー振り上げ角度を変更することによっ
て曲げ角度が5度になるように試験条件を選定した。
[Example] In advance, an impact test in which a JIS standard bending test piece size of 3 × 4 × 40 mm is used and an impact load is applied to a surface of 4 × 40 mm using a test piece made only of a metal base material made of SKD11, and a hammer is swung up. The test conditions were selected so that the bending angle was 5 degrees by changing the angle.

【0031】この試験において、ハンマー長さは23c
mヽハンマー重心位置は17cm、ハンマー全重量は
1.26kg、ハンマー振り上げ角度は120度とし
た。
In this test, the hammer length is 23c.
The center of gravity of the m ヽ hammer was 17 cm, the total weight of the hammer was 1.26 kg, and the hammer swing-up angle was 120 degrees.

【0032】本発明の方法に用いた試験片は、3×4×
40mmのJIS標準曲げ試験片サイズで、SKD11
製母材上の4×40mmの一面にPVD法によりセラミ
ック薄膜を膜厚が5μmになるよう成膜したものを用
い、衝撃負荷条件は予め行った母材のみからなる試験片
をもちいて行った試験と同じ条件で衝撃試験を行った。
The test pieces used in the method of the present invention are 3 × 4 ×
JIS standard bending test piece size of 40mm, SKD11
A ceramic thin film having a thickness of 5 μm was formed by PVD method on one surface of a base material of 4 × 40 mm, and the impact load condition was performed in advance using a test piece composed of only the base material. An impact test was conducted under the same conditions as the test.

【0033】図1に本発明で用いた衝撃試験後の試験片
の代表例を斜視図として示す。図1において、1はSK
D11製でサイズ3×4×40mmの試験片、2は母材
の4×40mmの面にセラミック薄膜を5μm成膜した
セラミック薄膜の成膜面、ハッチングで示す3は試験片
の中央部に生じたクラック発生部である。
FIG. 1 is a perspective view showing a typical example of the test piece after the impact test used in the present invention. In FIG. 1, 1 is SK
A test piece made of D11 and having a size of 3 × 4 × 40 mm, 2 is a ceramic thin film deposition surface on which a ceramic thin film is deposited to a thickness of 5 μm on a 4 × 40 mm surface of a base material, and 3 shown by hatching occurs in the center of the test piece It is a cracked part.

【0034】試験片は衝撃試験によって、その中央が5
度に曲がるように衝撃荷重を選択した。
The test piece was subjected to an impact test and its center was 5
The impact load was selected so that it bends every time.

【0035】図2は、図1に示す試験片の中央部に発生
したクラック発生領域3の状況を、20倍に拡大した図
である。
FIG. 2 is a view in which the condition of the crack generation region 3 generated in the central portion of the test piece shown in FIG. 1 is magnified 20 times.

【0036】3は試験片中央部のクラック発生領域を示
し、4は試験片の中央部に加えた打撃中心であり、Lは
クラック発生範囲である。
Reference numeral 3 denotes a crack generation area in the center of the test piece, 4 is a center of impact applied to the center of the test piece, and L is a crack generation range.

【0037】試験後の試験片の打撃中心4を中心に生じ
たクラック発生領域3のセラミック薄膜の損傷状況を、
肉眼あるいは光学顕微鏡を用いて観察し、クラックの
発生範囲(L:距離mm)、および必要に応じクラッ
クの間隔を測定した。
After the test, the damage condition of the ceramic thin film in the crack generation region 3 centered around the striking center 4 of the test piece,
Observation with a naked eye or an optical microscope was performed to measure the crack occurrence range (L: distance mm) and, if necessary, the crack interval.

【0038】図2のクラック発生範囲(L)をセラミッ
ク薄膜組成を変えた試験片について測定した結果を図3
に示す。図3の横軸はセラミック薄膜の膜組成、縦軸は
クラック発生範囲(L)を示す。
The crack generation range (L) in FIG. 2 was measured for the test pieces with different ceramic thin film compositions.
Shown in. The horizontal axis of FIG. 3 represents the film composition of the ceramic thin film, and the vertical axis represents the crack generation range (L).

【0039】本発明の方法によれば、このクラック発生
範囲(L)は、セラミック薄膜組成によって変化するこ
とが明瞭に識別できる。
According to the method of the present invention, it can be clearly identified that the crack generation range (L) changes depending on the composition of the ceramic thin film.

【0040】即ち、Xの値の大きいほうがクラック発生
範囲の値が大となり、この場合TiNのセラミック薄膜
が密着性に優れることが判断できる。
That is, the larger the value of X, the larger the value of the crack generation range, and in this case, it can be determined that the TiN ceramic thin film has excellent adhesion.

【0041】更に、各条件において10回繰り返し行っ
た測定値のばらつきは、各々の平均値に対して10%以
下であった。これは後述する図4の引っかき試験法によ
る測定値のばらつきに比較し、小さい。
Further, the variation in the measured values repeated 10 times under each condition was 10% or less with respect to each average value. This is small compared to the dispersion of the measured values by the scratch test method of FIG. 4 described later.

【0042】比較のため、引っかき試験法によってセラ
ミック薄膜の密着性の比較を行った。
For comparison, the adhesion of ceramic thin films was compared by the scratch test method.

【0043】比較例に用いた金属母材材質およびセラミ
ック薄膜の成膜条件は、本実施例と同一条件とした。
The metal base material used in the comparative example and the film forming conditions of the ceramic thin film were the same as those in this example.

【0044】金属母材のサイズは25×25×5mmと
し、25×25mmの面にセラミック薄膜を成膜した。
比較のため、引っかき試験法によって求めた密着力の測
定結果を図4に示す。
The size of the metal base material was 25 × 25 × 5 mm, and a ceramic thin film was formed on the surface of 25 × 25 mm.
For comparison, FIG. 4 shows the measurement results of the adhesion force obtained by the scratch test method.

【0045】図4の横軸は、セラミック薄膜組成を、縦
軸はセラミック薄膜の密着力を示す。
The horizontal axis of FIG. 4 represents the composition of the ceramic thin film, and the vertical axis represents the adhesion of the ceramic thin film.

【0046】各組成における試験を10回繰り返し行っ
た測定値のばらつきは10〜30%程度であり、組成に
より変化し、組成と密着力との傾向も不明確であり、組
成との関係が判断困難である。
The variation of the measured value after repeating the test 10 times for each composition is about 10 to 30%, it varies depending on the composition, and the tendency between the composition and the adhesion is unclear, and the relationship with the composition is judged. Have difficulty.

【0047】なお、本発明は3×4×40mmの試験片
サイズ、金属母材の材質SKD11については以上の実
施例に限定されるものではなく、評価するセラミック薄
膜の性状に応じて適宜選択すればよい。
In the present invention, the test piece size of 3 × 4 × 40 mm and the material SKD11 of the metal base material are not limited to the above examples, and may be appropriately selected according to the properties of the ceramic thin film to be evaluated. Good.

【0048】また、クラック発生範囲は、前記の実施例
で示したようにクラック発生領域3全体でも、打撃中心
を境界とした片方、片方の長い方、短い方、これらの平
均値、のいづれを評価データとして用いてもよい。
As for the crack generation range, as shown in the above-mentioned embodiment, in the entire crack generation area 3, one of the boundaries with the center of impact as the boundary, one of the longer ones and the shorter one, and the average value thereof are selected. It may be used as evaluation data.

【0049】[0049]

【発明の効果】本発明によれば、従来、その評価法がな
かった衝撃荷重によるセラミック薄膜の密着性評価が可
能となり、従来法である引っかき試験法に比較し、簡便
でかつ、精度のよい測定値を得られるので、セラミック
薄膜の良否判定を評価できる優れた方法である。
According to the present invention, it is possible to evaluate the adhesion of a ceramic thin film by an impact load, which has not been available in the prior art, which is simpler and more accurate than the conventional scratch test method. Since the measured value can be obtained, it is an excellent method for evaluating the quality judgment of the ceramic thin film.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明で用いた衝撃試験後の試験片の実施例を
示す斜視図である。
FIG. 1 is a perspective view showing an example of a test piece after an impact test used in the present invention.

【図2】本発明による試験片のクラック発生領域の拡大
図で示す例である。
FIG. 2 is an example showing an enlarged view of a crack generation region of a test piece according to the present invention.

【図3】本発明による試験片のセラミック薄膜組成とセ
ラミック薄膜に生じたクラック発生範囲(L)の関係を
示す図である。
FIG. 3 is a diagram showing a relationship between a composition of a ceramic thin film of a test piece according to the present invention and a crack generation range (L) generated in the ceramic thin film.

【図4】従来法の引っかき試験法により求めたセラミッ
ク薄膜組成と、その密着力の関係を示す図である。
FIG. 4 is a diagram showing a relationship between a ceramic thin film composition obtained by a conventional scratch test method and its adhesion.

【符号の説明】[Explanation of symbols]

1 衝撃試験後の試験片 2 セラミック薄膜の成膜面 3 試験片中央部のクラック発生領域 4 打撃中心 L 片側のクラック発生範囲 1 Test piece after impact test 2 Deposition surface of ceramic thin film 3 Crack generation area at center of test piece 4 Impact center L Crack generation area on one side

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 金属母材の表面にセラミック薄膜を成膜
した試験片の長手方向中央部において短辺と平行にナイ
フエッジ状の衝撃を付与し、前記試験片を所定角度に曲
げて前記セラミック薄膜にクラックを発生させ、該クラ
ックの発生範囲を測定することによってセラミック薄膜
の密着性を評価することを特徴とするセラミック薄膜の
密着性評価試験法。
1. A test piece having a ceramic thin film formed on a surface of a metal base material is subjected to a knife-edge-like impact parallel to a short side at a central portion in a longitudinal direction of the test piece, and the test piece is bent at a predetermined angle. A test method for evaluating the adhesion of a ceramic thin film, characterized in that the adhesion of the ceramic thin film is evaluated by generating a crack in the thin film and measuring the range of occurrence of the crack.
【請求項2】 試験片の曲げ角度は2〜8度であること
を特徴とするセラミック薄膜の密着性評価試験法。
2. A test method for evaluating adhesion of a ceramic thin film, wherein the bending angle of the test piece is 2 to 8 degrees.
JP13930193A 1993-05-19 1993-05-19 Evaluation test method of contact property of ceramic thin film Withdrawn JPH06331536A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13930193A JPH06331536A (en) 1993-05-19 1993-05-19 Evaluation test method of contact property of ceramic thin film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13930193A JPH06331536A (en) 1993-05-19 1993-05-19 Evaluation test method of contact property of ceramic thin film

Publications (1)

Publication Number Publication Date
JPH06331536A true JPH06331536A (en) 1994-12-02

Family

ID=15242102

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13930193A Withdrawn JPH06331536A (en) 1993-05-19 1993-05-19 Evaluation test method of contact property of ceramic thin film

Country Status (1)

Country Link
JP (1) JPH06331536A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19718308C2 (en) * 1997-04-30 2001-05-23 Juergen Kosper Method for testing the bond strength of metal-ceramic systems
JP2011005894A (en) * 2009-06-23 2011-01-13 Sumitomo Rubber Ind Ltd Pneumatic tire

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19718308C2 (en) * 1997-04-30 2001-05-23 Juergen Kosper Method for testing the bond strength of metal-ceramic systems
JP2011005894A (en) * 2009-06-23 2011-01-13 Sumitomo Rubber Ind Ltd Pneumatic tire

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