JPH0632627A - Method for processing glass substrate and production of flat display - Google Patents

Method for processing glass substrate and production of flat display

Info

Publication number
JPH0632627A
JPH0632627A JP20946592A JP20946592A JPH0632627A JP H0632627 A JPH0632627 A JP H0632627A JP 20946592 A JP20946592 A JP 20946592A JP 20946592 A JP20946592 A JP 20946592A JP H0632627 A JPH0632627 A JP H0632627A
Authority
JP
Japan
Prior art keywords
glass substrate
thin
wall part
electrode
hole
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP20946592A
Other languages
Japanese (ja)
Inventor
Yuichi Iwase
祐一 岩瀬
Tadashi Kiyomiya
正 清宮
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP20946592A priority Critical patent/JPH0632627A/en
Publication of JPH0632627A publication Critical patent/JPH0632627A/en
Withdrawn legal-status Critical Current

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  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
  • Manufacture Of Electron Tubes, Discharge Lamp Vessels, Lead-In Wires, And The Like (AREA)

Abstract

PURPOSE:To form a through-hole in a glass substrate by cutting a circular groove in a state where a thin-wall part is left on one main surface of the glass substrate and then breaking the thin-wall part. CONSTITUTION:A cylindrical drill 5 rotating at a high speed in the circumferential direction is brought into contact with a chip attaching position of a glass substrate 8 for cathode panel from the face on the opposite side of an electrode forming face to continue to cut the contact face and a circular groove 6 is cut in a state where several 10 to 100mum thickness is left on the electrode-forming face side of the glass substrate without passing through the glass substrate 8 in the glass substrate 8. Various kinds of processing are carried out on the left smooth face of the glass substrate 8 in order to form the electrode and a cathode panel is prepared. Then, the thin-wall part is sucked with a vacuum suction device so as to encircle the thin-wall part from the electrode forming face of the glass substrate 8 and the glass thin-wall part is broken by suction force and passed through a chip tube-attaching hole and a part encircled by the groove 6 and broken pieces of the glass thin-wall part are sucked. Then, a chip tube is attached to the chip tube attaching hole to provide a flat display free from the possibility of pollution and breakage of the element.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、ガラス基板に孔を開け
る加工方法に関するものであり、特に、フラットディス
プレイのチップ管取付孔加工等の製造方法に関するもの
である。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for forming a hole in a glass substrate, and more particularly to a manufacturing method for forming a hole for attaching a chip tube of a flat display.

【0002】[0002]

【従来の技術】例えば、フラットディスプレイの製造工
程において、ガラス基板には電極形成のための種々の加
工の他に真空吸引するための孔を設ける必要があるのだ
が、その方法としては、予め貫通孔が設けられた基板に
所定の加工をするか、または、基板面に所定の加工を施
した後貫通孔を設けるか、のいずれかが主に採用されて
いる。
2. Description of the Related Art For example, in a manufacturing process of a flat display, it is necessary to provide a hole for vacuum suction in a glass substrate in addition to various processing for forming an electrode. It is mainly adopted that either a predetermined processing is performed on a substrate provided with a hole or a through hole is provided after a predetermined processing is performed on a substrate surface.

【0003】しかし、フラットディスプレイを製作する
において、電極形成の種々の工程の前にガラス基板に孔
を設けておくと、レジストスピンコート、成膜、エッチ
ング等電極形成のための種々の工程に際し、その孔が支
障となる。また、上記の電極形成のための工程が完了し
た後に孔を設けると、その孔開け加工の際に発生するゴ
ミによって、完成した素子を汚染、破壊する虞れがあ
る。
However, in manufacturing a flat display, if holes are formed in a glass substrate before various steps for forming electrodes, various steps for forming electrodes such as resist spin coating, film formation and etching are performed. The hole becomes an obstacle. Further, if the holes are formed after the above-mentioned steps for forming the electrodes are completed, there is a possibility that the completed element may be contaminated and destroyed by dust generated during the hole forming process.

【0004】そこで、図6に示す断面図のように、ガラ
ス基板108の厚み方向中途部まで孔106を開け、平
滑面として残された面に上記電極形成のための種々の工
程を施してから、薄肉として残された部分を破壊して貫
通孔を設けるという方法も考えられる。しかし、貫通孔
として除去されるガラス基板部分全体を薄肉にすると、
真空パネル製作プロセス中の真空チャック、熱衝撃等の
作用によってガラスの薄肉部分が破損する虞れがある等
問題がある。
Therefore, as shown in the cross-sectional view of FIG. 6, a hole 106 is formed up to a middle portion in the thickness direction of the glass substrate 108, and various processes for forming the above electrode are performed on the surface left as a smooth surface. Alternatively, a method of breaking the portion left as a thin wall to form a through hole is also conceivable. However, if the entire glass substrate part that is removed as a through hole is thinned,
There is a problem that the thin-walled portion of the glass may be damaged by the action of a vacuum chuck, thermal shock, etc. during the vacuum panel manufacturing process.

【0005】[0005]

【発明が解決しようとする課題】本発明は、かかる実情
に鑑みて提案されたものである。このように、他の工程
に対して支障となったりすることがないようなガラス基
板への孔開けの加工方法を提供することを目的とするも
のであり、さらには、チップ管取付孔加工の工程が、ガ
ラス基板自身を傷つけたり、他の工程に対して支障とな
ったりすることがないようなフラットディスプレイの製
造方法を提供することを目的とするものである。
The present invention has been proposed in view of such circumstances. As described above, it is an object of the present invention to provide a processing method for forming a hole in a glass substrate that does not hinder other steps, and further, to process a chip tube mounting hole. It is an object of the present invention to provide a method for manufacturing a flat display in which the steps do not damage the glass substrate itself or hinder other steps.

【0006】[0006]

【課題を解決するための手段】本発明は、上述の目的を
達成するために、ガラス基板の一主面より当該ガラス基
板に薄肉部分を残して円環状の溝を切り、その後上記薄
肉部分を破壊して上記ガラス基板に貫通孔を設けること
を特徴とするものである。また、本願第2の発明である
フラットディスプレイの製造方法は、ガラス基板のチッ
プ管取付位置に電極形成面とは反対側の面より当該ガラ
ス基板に薄肉部分を残して円環状の溝を切り、上記ガラ
ス基板上に電極形成のための所定の工程を施した後、続
いて上記電極形成面側より真空吸引によって上記薄肉部
分を破壊して除去しチップ管取付孔を設けることを特徴
とするものである。
In order to achieve the above-mentioned object, the present invention cuts an annular groove from a main surface of a glass substrate while leaving a thin portion on the glass substrate, and thereafter cutting the thin portion. It is characterized in that the glass substrate is broken to provide a through hole. Further, the flat display manufacturing method according to the second invention of the present application is such that an annular groove is cut from the surface of the glass substrate opposite to the electrode formation surface at the chip tube mounting position, leaving a thin portion in the glass substrate, After performing a predetermined step for forming an electrode on the glass substrate, subsequently, the thin-walled portion is destroyed and removed by vacuum suction from the electrode forming surface side to provide a chip tube mounting hole. Is.

【0007】本発明を適用して、ガラス基板の一主面よ
り薄肉部分を残して溝を切り、これとは反対側の面を平
滑面として加工を施した後、上記薄肉部分を破壊して貫
通孔を設けると、孔を設けるための工程によってこれと
は反対側の面への加工は何ら制限されることがない。例
えば、フラットディスプレイを製作するにおいて、ガラ
ス基板に薄肉部分を残して円環状の溝を切っておけば、
ガラス基板の片面は平滑面として存在し、この平滑面に
対してレジストスピンコート、成膜、エッチング等電極
形成のための種々の工程を施すことができる。そして、
上記の電極形成のための工程が完了した後に、上記電極
形成面側より真空吸引によって上記薄肉部分を破壊す
る。破壊に伴うガラス破片等のゴミは吸引器中に吸引さ
れ、除去されるため、基板面に完成した素子を汚染、破
壊することなくガラス基板にチップ管取付のための孔が
貫通する。
By applying the present invention, a groove is cut leaving a thin portion from the one main surface of the glass substrate, the surface opposite to this is processed as a smooth surface, and the thin portion is broken. When the through hole is provided, the process for forming the hole does not limit the processing on the opposite surface. For example, when manufacturing a flat display, if you cut the annular groove leaving a thin portion on the glass substrate,
One surface of the glass substrate exists as a smooth surface, and various steps such as resist spin coating, film formation, and etching for electrode formation can be performed on this smooth surface. And
After the step for forming the electrode is completed, the thin portion is broken by vacuum suction from the electrode forming surface side. Dust such as glass fragments accompanying the destruction is sucked into the suction device and removed, so that the hole for attaching the chip tube penetrates through the glass substrate without contaminating or destroying the completed element on the substrate surface.

【0008】[0008]

【作用】ガラス基板の片面より薄肉部分を残して円環状
の溝を切るため、これとは反対側の面は平滑面として残
される。従って、平滑面に対してしか行えないような微
細な加工等を施すことが可能である。溝は円環状に設け
られるため薄肉部分の面積が少なく、ガラス基板表面に
歪みが生じ難く、ガラス基板の温度分布の乱れも最小限
に抑えられる。
Since the annular groove is cut while leaving a thinner portion than one surface of the glass substrate, the surface on the opposite side is left as a smooth surface. Therefore, it is possible to perform fine processing that can be performed only on a smooth surface. Since the groove is provided in an annular shape, the area of the thin portion is small, distortion is unlikely to occur on the surface of the glass substrate, and disturbance of the temperature distribution of the glass substrate can be minimized.

【0009】また、ガラス基板の薄肉部分は容易に破っ
て孔を開けることができ、特に、真空吸引の圧力によっ
てガラス薄肉部分を破壊すると、孔が貫通する際に生じ
るゴミは吸引器によって吸引されるのでゴミが基板上に
付着したり基板を傷つけることがない。
Further, the thin portion of the glass substrate can be easily broken to form a hole. Particularly, when the thin glass portion is broken by the pressure of vacuum suction, dust generated when the hole penetrates is sucked by the suction device. Therefore, dust does not adhere to the substrate or damage the substrate.

【0010】[0010]

【実施例】以下、本発明を適用した実施例について図面
を参照しながら説明する。なお、本実施例ではFED
(フィールドエミッションディスプレイ)用フラットデ
ィスプレイのチップ管取付孔の加工法に本発明を適用し
た。
Embodiments of the present invention will be described below with reference to the drawings. In this embodiment, the FED
The present invention is applied to a method of processing a chip tube mounting hole of a flat display for (field emission display).

【0011】FED用フラットディスプレイは、図2に
示すように、電子を放出する陰極パネル1と、蛍光面で
ある前面パネル4と、そのパネル1と4の間に真空を作
りだすための真空引き用チップ管3とからなり、このチ
ップ管3は陰極パネル1に設けられたチップ管取付孔2
の位置に取付けられて構成されている。陰極パネル1と
前面パネル4の拡大図を図4、5に示す。
The FED flat display, as shown in FIG. 2, is a cathode panel 1 which emits electrons, a front panel 4 which is a phosphor screen, and a vacuum drawing for creating a vacuum between the panels 1 and 4. And a tip tube 3 which is provided in the cathode panel 1 and has a tip tube mounting hole 2
It is configured to be installed at the position. An enlarged view of the cathode panel 1 and the front panel 4 is shown in FIGS.

【0012】図4に示すように、陰極パネル用ガラス基
板8の上に制御線9が設けられ、さらにその上に円錐形
状の陰極10を設け、この陰極10を中心として開口部
14が設けられた絶縁体11が形成されている。また、
この絶縁体11の上に、前記円錐形状の陰極10の尖頭
部の近傍にその端部が形成されたゲート電極12があ
り、以上のようにして陰極パネル1は形成されている。
なお、陰極10は図5のようにマトリックス状に配置さ
れている。一方、陰極パネル1に対向する前面パネル4
は、ガラス基板16に蛍光ストライプ15を塗布してな
っている。
As shown in FIG. 4, a control line 9 is provided on a glass substrate 8 for a cathode panel, a conical cathode 10 is further provided on the control line 9, and an opening 14 is provided around the cathode 10. Insulator 11 is formed. Also,
On this insulator 11, there is a gate electrode 12 whose end is formed in the vicinity of the tip of the conical cathode 10, and the cathode panel 1 is formed as described above.
The cathodes 10 are arranged in a matrix as shown in FIG. On the other hand, the front panel 4 facing the cathode panel 1
Is a glass substrate 16 coated with fluorescent stripes 15.

【0013】このような構造のFED用フラットディス
プレイにおいて、制御線9とゲート電極12の間に電圧
を印加すると、制御線9から陰極10に電位が供給さ
れ、電解強度の高い尖頭部から電子が放出される。放出
された電子は、開口部14を通って、図中矢印のように
前面パネル4の蛍光ストライプ15に入射し、蛍光体ド
ットを発光させる。
In the FED flat display having such a structure, when a voltage is applied between the control line 9 and the gate electrode 12, a potential is supplied from the control line 9 to the cathode 10, and an electron is emitted from the tip with high electrolytic strength. Is released. The emitted electrons pass through the opening 14 and enter the fluorescent stripe 15 of the front panel 4 as indicated by an arrow in the figure, causing the fluorescent dots to emit light.

【0014】以下に、陰極パネル1に真空引き用チップ
管3の取付孔2を開ける方法を中心にして、FED用フ
ラットディスプレイの製造方法について説明する。
A method of manufacturing a flat display for FED will be described below, focusing on a method of forming the mounting hole 2 of the chip tube 3 for vacuuming in the cathode panel 1.

【0015】図1に示すように、陰極パネル用ガラス基
板8のチップ管取付位置に、円筒状のドリル5を電極形
成面の反対側の面から接触させる。ドリル5は円周方向
に高速で回転しており、ガラス基板8の接触面を削り続
けるためガラス基板8に円環状の溝6を切る。溝6はガ
ラス基板8を貫通せず、ガラス基板8の電極形成面側に
は数10〜100μm程度の厚みが残される。
As shown in FIG. 1, a cylindrical drill 5 is brought into contact with the tip tube mounting position of the glass substrate 8 for the cathode panel from the surface opposite to the electrode forming surface. The drill 5 rotates at high speed in the circumferential direction, and cuts an annular groove 6 in the glass substrate 8 in order to continue cutting the contact surface of the glass substrate 8. The groove 6 does not penetrate the glass substrate 8, and a thickness of several tens to 100 μm is left on the electrode formation surface side of the glass substrate 8.

【0016】そして、ガラス基板8の平滑面として残っ
た面に、上述のような電極形成のための種々の加工(制
御線9や絶縁体11の形成、電子ビーム蒸着等による陰
極物質の形成、スピンコート法による電子級レジストの
塗布、エッチング等)を施し陰極パネル1を作成する。
Then, on the surface of the glass substrate 8 which remains as a smooth surface, various processes for forming the above-mentioned electrodes (formation of control lines 9 and insulators 11, formation of a cathode material by electron beam evaporation, etc., The cathode panel 1 is prepared by applying an electronic grade resist by a spin coating method, etching, etc.).

【0017】その後、図3のようにガラス基板8の電極
(図示せず。)形成面から、上記円環状の溝6が設けら
れたことによって薄肉となっている部分を囲むようにし
て、真空吸引機の吸引口7を当てて吸引する。この吸引
力によりガラス薄肉部分は破壊されてチップ管取付孔2
が貫通する。溝6で囲まれた部分や、破壊されたガラス
薄肉部分の破片は、真空吸引器に吸引されることにな
る。
After that, as shown in FIG. 3, a vacuum suction machine is formed so as to surround the electrode (not shown) forming surface of the glass substrate 8 so as to surround the thinned portion due to the provision of the annular groove 6. The suction port 7 is applied to suck. The thin portion of the glass is broken by this suction force and the tip tube mounting hole 2
Penetrates. The fragments surrounded by the groove 6 and the broken glass thin-walled parts are sucked by the vacuum suction device.

【0018】なお、必要に応じて、真空吸引と同時にガ
ラス基板8の電極形成面の反対側の面(溝6を設けた
面)から溝6に囲まれた部分を軽く打撃し、破壊を助け
てやっても良い。
If necessary, simultaneously with vacuum suction, the portion surrounded by the groove 6 is lightly hit from the surface of the glass substrate 8 opposite to the electrode forming surface (the surface provided with the groove 6) to assist the destruction. You can do it.

【0019】上述のようにして陰極パネル1にチップ管
取付孔2が設けられると、チップ管3が取り付けられ、
前面パネル4と対向して組み立てられてFED用フラッ
トディスプレイとなる。
When the tip tube mounting hole 2 is provided in the cathode panel 1 as described above, the tip tube 3 is mounted,
It is assembled to face the front panel 4 to form a flat display for FED.

【0020】なお、本発明は、上述のFED用フラット
ディスプレイのチップ管取付孔の加工法として非常に有
効であるが、これに限らず、VFD(蛍光表示管)等の
フラットパネルディスプレイのパネル孔の加工法として
利用できる。さらに、真空マイクロチップス等の真空を
必要とするデバイスにも適用可能な技術である。
Although the present invention is very effective as a method for processing the chip tube mounting hole of the flat display for FED described above, the present invention is not limited to this, and the panel hole of a flat panel display such as a VFD (fluorescent display tube) is used. Can be used as a processing method. Furthermore, the technique can be applied to devices that require a vacuum such as vacuum microchips.

【0021】また、本発明は、片面を平坦面として活か
したい場合の孔開け法として広く利用できる他、気体や
液体等物質の注入又は吸引のための孔を貫通させる工程
が、上記物質の注入又は吸引の工程と同時に行うことが
できる孔開け方法として用いてもよい。即ち、気体や液
体等物質の注入または吸引のための孔を設けたいとき、
予め基板に薄肉部分を残して円環状の溝を切っておくと
注入又は吸引の圧力によって、上記薄肉部分が破壊さ
れ、その瞬間から注入又は吸引を始めることができると
いうものである。
Further, the present invention can be widely used as a perforating method when it is desired to utilize one surface as a flat surface, and the step of penetrating a hole for injecting or sucking a substance such as gas or liquid is performed by injecting the substance. Alternatively, it may be used as a perforation method that can be performed simultaneously with the suction step. That is, when you want to provide a hole for injecting or sucking a substance such as gas or liquid,
If the annular groove is cut in advance while leaving the thin portion on the substrate, the thin portion is destroyed by the pressure of injection or suction, and the injection or suction can be started from that moment.

【0022】ところで、本発明において、溝を切る工具
は円環状のものとは限らない。例えば、円環を4分割し
たような形状のものでも同様の加工は可能となる。溝の
形状も円環状とは限らない。例えば6角形のような多角
形状でも構わない。また、円環状の溝を一列に並べて長
円形にすることも可能である。ガラスの薄肉部分が残る
ように加工するのであれば、任意の形状で構わない。
By the way, in the present invention, the tool for cutting the groove is not limited to the annular tool. For example, the same processing is possible even if the ring is divided into four. The shape of the groove is not limited to the annular shape. For example, a polygonal shape such as a hexagon may be used. It is also possible to arrange annular grooves in a line to form an oval shape. Any shape may be used as long as the thin portion of the glass is processed.

【0023】破壊方法も真空吸引によるとは限らない。
上記のように物質を注入する際の圧力を用いても構わな
いし、これら吸引又は注入の圧力が不十分であれば、こ
れに打撃等の衝撃を与えてもよい。また、薄肉部分をバ
ーナーで焼き切る、工具で叩き割る等の方法も考えられ
る。さらに、孔を開ける対象もガラスに限らず、セラミ
ックス、金属などにも適用できる。
The breaking method is not limited to vacuum suction.
The pressure at the time of injecting the substance may be used as described above, and if the suction or injection pressure is insufficient, it may be given a shock such as a blow. It is also possible to use a burner to burn out the thin portion or a tool to break it. Furthermore, the object to be punched is not limited to glass, but can be applied to ceramics, metals, and the like.

【0024】[0024]

【発明の効果】以上の実施例で示したように、ガラス基
板に薄肉を残して溝を切ると、片面は全くの平滑面とし
て残り、しかも、ガラス基板表面に歪みが生じ難く温度
分布の乱れも最小限に抑えられているので、ガラス基板
に電極を形成するための種々の工程のような基板の表面
状態が大きく影響する微細な加工も可能である。
As shown in the above examples, when the glass substrate is left thin and the groove is cut, one side remains as a completely smooth surface, and the glass substrate surface is not easily distorted to disturb the temperature distribution. Since it is also minimized, it is possible to perform fine processing such as various steps for forming electrodes on a glass substrate, which are greatly affected by the surface condition of the substrate.

【0025】さらに、真空吸引の圧力によってガラス薄
肉部分を破壊すると、孔が貫通する際に生じるゴミは吸
引器によって吸引されるため、このゴミによってガラス
基板上に完成した素子を汚染したり、破壊したりする心
配がない。このように、孔開けの工程が、ガラス基板自
身を傷つけたり、他の工程に対して支障となったりする
ことがないようなフラットディスプレイの製造方法を提
供することができる。
Further, when the thin glass portion is broken by the vacuum suction pressure, dust generated when the hole penetrates is sucked by the suction device, so that the dust contaminates or destroys the completed element on the glass substrate. There is no need to worry. As described above, it is possible to provide a method for manufacturing a flat display in which the hole forming step does not damage the glass substrate itself or hinder other steps.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明を適用して溝を設けたガラス基板とドリ
ルの斜視断面図である。
FIG. 1 is a perspective sectional view of a glass substrate and a drill in which a groove is provided by applying the present invention.

【図2】フラットディスプレイの主要構成部を示す概略
斜視図である。
FIG. 2 is a schematic perspective view showing main components of a flat display.

【図3】薄肉部分を真空吸引によって破壊する様子を示
す模式図である。
FIG. 3 is a schematic diagram showing how a thin portion is broken by vacuum suction.

【図4】フラットディスプレイにおける陰極パネルと前
面パネルの構造を模式的に示した拡大断面図である。
FIG. 4 is an enlarged sectional view schematically showing the structures of a cathode panel and a front panel in a flat display.

【図5】フラットディスプレイにおける陰極パネルと前
面パネルの構造を模式的に示した拡大斜視図である。
FIG. 5 is an enlarged perspective view schematically showing structures of a cathode panel and a front panel in a flat display.

【図6】従来の方法で薄肉部分を残して溝を設けた基板
の斜視断面図である。
FIG. 6 is a perspective sectional view of a substrate in which a groove is provided by leaving a thin portion by a conventional method.

【符号の説明】 1・・・陰極パネル 2・・・チップ管取付孔 3・・・チップ管 4・・・前面パネル 5・・・ドリル 6・・・溝 7・・・真空吸引器吸引口 8・・・陰極パネル用ガラス基板 9・・・制御線 10・・・陰極 11・・・絶縁体 12・・・ゲート電極 14・・・開口部 15・・・蛍光ストライプ 16・・・前面パネル用ガラス基板[Explanation of Codes] 1 ... Cathode panel 2 ... Tip tube mounting hole 3 ... Tip tube 4 ... Front panel 5 ... Drill 6 ... Groove 7 ... Vacuum suction device suction port 8 ... Glass substrate for cathode panel 9 ... Control line 10 ... Cathode 11 ... Insulator 12 ... Gate electrode 14 ... Opening 15 ... Fluorescent stripe 16 ... Front panel Glass substrate

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 ガラス基板の一主面より当該ガラス基板
に薄肉部分を残して円環状の溝を切り、その後上記薄肉
部分を破壊することにより上記ガラス基板に貫通孔を設
けることを特徴とするガラス基板の加工方法。
1. A through hole is provided in the glass substrate by cutting an annular groove from the main surface of the glass substrate, leaving a thin portion in the glass substrate, and then breaking the thin portion. Glass substrate processing method.
【請求項2】 ガラス基板のチップ管取付位置に電極形
成面とは反対側の面より当該ガラス基板に薄肉部分を残
して円環状の溝を切り、上記ガラス基板上に電極形成の
ための所定の工程を施した後、続いて上記電極形成面側
より真空吸引によって上記薄肉部分を破壊して除去しチ
ップ管取付孔を設けることを特徴とするフラットディス
プレイの製造方法。
2. A ring-shaped groove is cut from the surface of the glass substrate opposite to the electrode formation surface at the chip tube mounting position, leaving a thin portion in the glass substrate, and a predetermined electrode for forming an electrode is formed on the glass substrate. After performing the step (1), subsequently, the thin-walled portion is destroyed and removed by vacuum suction from the electrode formation surface side to provide a chip tube mounting hole, and a method for manufacturing a flat display.
JP20946592A 1992-07-15 1992-07-15 Method for processing glass substrate and production of flat display Withdrawn JPH0632627A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20946592A JPH0632627A (en) 1992-07-15 1992-07-15 Method for processing glass substrate and production of flat display

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20946592A JPH0632627A (en) 1992-07-15 1992-07-15 Method for processing glass substrate and production of flat display

Publications (1)

Publication Number Publication Date
JPH0632627A true JPH0632627A (en) 1994-02-08

Family

ID=16573322

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20946592A Withdrawn JPH0632627A (en) 1992-07-15 1992-07-15 Method for processing glass substrate and production of flat display

Country Status (1)

Country Link
JP (1) JPH0632627A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005097107A (en) * 2003-09-25 2005-04-14 Schott Ag Process for producing openings in certain areas of glass/glass-ceramic body
JP2008269846A (en) * 2007-04-17 2008-11-06 Nippon Electric Glass Co Ltd Glass substrate for flat panel display

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005097107A (en) * 2003-09-25 2005-04-14 Schott Ag Process for producing openings in certain areas of glass/glass-ceramic body
JP2008269846A (en) * 2007-04-17 2008-11-06 Nippon Electric Glass Co Ltd Glass substrate for flat panel display

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